JPS5920233A - Manufacture of 1,2-dichloroethane - Google Patents
Manufacture of 1,2-dichloroethaneInfo
- Publication number
- JPS5920233A JPS5920233A JP58115309A JP11530983A JPS5920233A JP S5920233 A JPS5920233 A JP S5920233A JP 58115309 A JP58115309 A JP 58115309A JP 11530983 A JP11530983 A JP 11530983A JP S5920233 A JPS5920233 A JP S5920233A
- Authority
- JP
- Japan
- Prior art keywords
- ethylene
- gas
- waste gas
- acetaldehyde
- dichloroethane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title description 8
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 claims description 58
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 48
- 239000005977 Ethylene Substances 0.000 claims description 48
- 239000002912 waste gas Substances 0.000 claims description 40
- 239000007789 gas Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 29
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 26
- 229910052760 oxygen Inorganic materials 0.000 claims description 26
- 239000001301 oxygen Substances 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 20
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 10
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- 230000003197 catalytic effect Effects 0.000 claims description 7
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 238000007872 degassing Methods 0.000 claims description 5
- 238000012432 intermediate storage Methods 0.000 claims description 5
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 2
- 239000012495 reaction gas Substances 0.000 claims description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 1
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229910002092 carbon dioxide Inorganic materials 0.000 description 7
- 239000001569 carbon dioxide Substances 0.000 description 6
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 6
- 238000007792 addition Methods 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001514 alkali metal chloride Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- MKDSZDXMLSNRDV-UHFFFAOYSA-N ethene;gold Chemical compound [Au].C=C MKDSZDXMLSNRDV-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- -1 ethylene, ethylene Chemical group 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/093—Preparation of halogenated hydrocarbons by replacement by halogens
- C07C17/15—Preparation of halogenated hydrocarbons by replacement by halogens with oxygen as auxiliary reagent, e.g. oxychlorination
- C07C17/152—Preparation of halogenated hydrocarbons by replacement by halogens with oxygen as auxiliary reagent, e.g. oxychlorination of hydrocarbons
- C07C17/156—Preparation of halogenated hydrocarbons by replacement by halogens with oxygen as auxiliary reagent, e.g. oxychlorination of hydrocarbons of unsaturated hydrocarbons
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
1.2〜ジクロルエタンは工業的大川生産物であり、こ
れは主として塩化ビニルを裏道するために熱的に分解さ
れる。1.2−ジクロルエタンの取得は主として接触量
のルイス酸、大ていは塩化鉄(【l)の存在で塩素をエ
チレンに直接付加することにより行なわれる。この反応
はガス相でも通常大部分が1.2−ジクロルエタンであ
る液相でも実施され、その際一般に液相反応が優れてい
る。DETAILED DESCRIPTION OF THE INVENTION 1.2~Dichloroethane is an industrial Okawa product, which is mainly thermally decomposed to backtrack vinyl chloride. 1.2-Dichloroethane is obtained primarily by direct addition of chlorine to ethylene in the presence of a catalytic amount of a Lewis acid, usually iron chloride ([l)]. The reaction is carried out both in the gas phase and also in the liquid phase, which is usually predominantly 1,2-dichloroethane, with liquid phase reactions generally being preferred.
1.2−ジクロルエタンの塩化ビニルへの熱的分解の際
に塩化水素が生じるので、その再使用のためにエチレン
の直接塩素化の他に大ていは、銅含有触媒の存在でエチ
レンと酸素または空気および塩化水素との反応も実施さ
れる。この反応をエチレンのオキシクaリネーションと
表示する。この第2反応器中では中でも通常”重合級°
′として供給されるエチレンが使用される。もちろん余
り純度の高くないエチレンを使用することも可能である
。Since hydrogen chloride is produced during the thermal decomposition of 1.2-dichloroethane to vinyl chloride, for its reuse, besides the direct chlorination of ethylene, ethylene and oxygen or Reactions with air and hydrogen chloride are also carried out. This reaction is referred to as oxychlorination of ethylene. In this second reactor, there is typically a “polymerization grade”.
Ethylene supplied as ' is used. Of course, it is also possible to use ethylene that is not very pure.
エチレンと酸素とからのアセトアルデヒドの接触的製造
では汚染のために大ていはその後使用されず、焼却され
る廃がスが生じる。The catalytic production of acetaldehyde from ethylene and oxygen results in waste that is often not subsequently used due to contamination and is incinerated.
本発明の目的は、エチレンと酸素からのアセトアルデヒ
ドの接触的製造(例えば西ドイツ国ltケ許第1118
183号明細1の方法による)からの廃ガスの経済的か
つ環境相客的利用である。その際反応および粗製アセト
アルデヒドの中間貯蔵の脱気からの廃がスを焼却するの
が公知である。しかし廃ガス中の高いエチレン金層のた
めに廃ガスを利用するのが方法の経済性を高める点で望
ましい。かかる利用が西ドイツ国特許第1148536
号、同第1154450号および同第1156.159
5号明細書に記載されている。その際西ドイツ国特許第
1148566号および同第1154450号明細書に
よればエチレン含有廃ガスをアセトアルデヒドにする後
反応°が実施され、西ドイツ同第1156695号ψJ
細4tによれば廃ガスからエチレンが単離される。2つ
の方法は投資およびエネルギー的に経費がかかる。The object of the present invention is to provide a method for the catalytic production of acetaldehyde from ethylene and oxygen (e.g.
183 specification 1)) is an economical and environmentally friendly use of the waste gas. In this case, it is known to incinerate the waste gas from the degassing of the reaction and intermediate storage of the crude acetaldehyde. However, due to the high ethylene gold layer in the waste gas, it is desirable to utilize the waste gas to increase the economics of the process. Such utilization is covered by West German Patent No. 1148536.
No. 1154450 and No. 1156.159
It is described in the specification of No. 5. According to DE 1148 566 and DE 1154 450, a post-reaction of the ethylene-containing waste gas into acetaldehyde is carried out;
According to Hoso 4T, ethylene is isolated from waste gas. Both methods are expensive in terms of investment and energy.
ところでアセトアルデヒド製造装置からエチレン含有廃
ガスを僅かな経費で除去することが目」能な方法が判明
した。装入された不活性ガスおよび形成された副生成物
を排出する必要のために生じ、かつエチレン58〜70
111*%を含有する。有利に粗製アセトアルデヒドの
貯蔵から発生する他の廃ガスを包含してもよい。それは
アルデヒド製造の際に加圧下に洗浄水中に溶けたガスで
あり、これが粗製アルデヒドの殆ど無加圧の貯蔵時に放
出され、かっc2H4−含量50〜60重jk%を有1
)る廃ガスを与える。By the way, a method has been discovered that is capable of removing ethylene-containing waste gas from an acetaldehyde production plant at a small cost. arises due to the need to discharge the charged inert gas and the by-products formed, and ethylene 58-70
Contains 111*%. Other waste gases, preferably arising from storage of crude acetaldehyde, may also be included. It is a gas dissolved under pressure in the wash water during aldehyde production, which is released during almost pressure-free storage of the crude aldehyde, and which has a c2H4 content of 50-60% by weight.
) gives waste gas.
エチレンと塩化水素および酸素または空気または酸素濃
度の高い空気との反応(オキシクロリネーション)は公
知方法により180〜650°Gで、有利に200〜2
50°Cで更にアルカリ金縞クロリドを含んでいてもよ
い銅含有触媒の存在で行なわれる。The reaction of ethylene with hydrogen chloride and oxygen or air or oxygen-enriched air (oxychlorination) is carried out by known methods at 180-650°G, preferably at 200-200°G.
It is carried out at 50° C. in the presence of a copper-containing catalyst which may additionally contain alkali gold-streaked chloride.
犬゛Cいは銅塩の形状の銅並びに場合によりアルカリ金
属クロリドは有利に不活性、微細な材料、例えは酸化ア
ルミニウムに吸着される。触媒粒子は反応室中でいわゆ
る固定床−とじて積み重ねられるかまたは流動形で存在
してよい(西ドイツ国特許出願公告第1518930号
、同第1518931号、同第1518932号明細書
、西ドイツ国特許公開第262<5133号明細書、西
ドイツ国特許第271’8878号、同第274240
9号明細11、ヨーロッパ特許第0005176号明細
lJ)。Copper in the form of copper salts and optionally alkali metal chlorides are preferably adsorbed on inert, finely divided materials, such as aluminum oxide. The catalyst particles can be stacked in a so-called fixed bed or in fluidized form in the reaction chamber (see German Patent Application No. 1518930, German Patent Application No. 1518931, German Patent Application No. 1518932, West German Patent Application No. No. 262<5133, West German Patent No. 271'8878, West German Patent No. 274240
No. 9 Specification 11, European Patent No. 0005176 Specification lJ).
詳細には本発明は温度200〜25000および圧力1
.7〜5バールでキャリヤ上の塩化銅(■)を含有する
触媒の存在で、かつ場合により窒素の添加下圧エチレン
を塩化水素および酸素または空気でオキシクロリネーシ
ョノし、その際1゜2−ジクロルエタンを反応ガスから
凝縮分離し、かつ酸素使用の場合には残ガスを主として
循環でオキシクロリネーション帯域に戻すことにより1
.2−ジクロルエタンを製造する方法に関し、該方法は
エチレンの少なくとも一部分をエチl/ンと酸素からア
セトアルデヒドを製造するための接触的方法から得られ
るエチレン含有廃ガスの形状で使用することより成る。In detail, the present invention has a temperature of 200 to 25,000 and a pressure of 1
.. Ethylene is oxychlorinated with hydrogen chloride and oxygen or air at 7 to 5 bar in the presence of a catalyst containing copper chloride (■) on a carrier and optionally with the addition of nitrogen, at 1°2 - by condensing off the dichloroethane from the reaction gas and, in the case of oxygen, returning the residual gas mainly by circulation to the oxychlorination zone;
.. A process for producing 2-dichloroethane, the process comprising using at least a portion of the ethylene in the form of an ethylene-containing waste gas obtained from a catalytic process for producing acetaldehyde from ethyl chloride and oxygen.
更だ本発明の次の優れた実施形が挙げられる:a)エチ
レン含有廃ガスとしてアセトアルデヒドを製造するため
の接触方法の反応部からの反応廃ガスを使用する;
b)エチレン含有廃ガスとして粗製アセトアルデヒドの
中間貯蔵器の脱気からの貯蔵廃ガスを使用する:
C)エチレン含有廃ガスとしてアセトアルデヒドを製造
する接触方法の反応部からの反応廃ガスおよび粗製アセ
トアルデヒドの中間貯蔵器の脱気からの貯M発ガスの混
合物を使用する:
d)次の重潰幅の組成:
アルゴン 11〜18係
酸 素 6.5〜5チ
窒 素 2〜9俤
二酸化炭素 10〜22幅エチレン
57〜70優
な有するエチレン含有廃がスを使用する:θ)アセトア
ルデヒドを製造する接触方法力・らのエチレン含有廃ガ
スを圧縮してオキシクロリネーション系の圧力1.7〜
5バールよりも1〜4パール高い圧力にし、乾燥し、か
つオキシクロリネーション系に供給する。Furthermore, the following advantageous embodiments of the invention may be mentioned: a) using the reaction waste gas from the reaction part of the contact process for producing acetaldehyde as the ethylene-containing waste gas; b) using crude as the ethylene-containing waste gas using the stored waste gas from the degassing of an intermediate storage of acetaldehyde: C) the reaction waste gas from the reaction part of the catalytic process for producing acetaldehyde as ethylene-containing waste gas and the degassing of the intermediate storage of crude acetaldehyde; Use a mixture of stored gases: d) Composition with the following width: Argon 11-18% Oxygen 6.5-5% Nitrogen 2-9% Carbon dioxide 10-22% Ethylene
Using an ethylene-containing waste gas having an excellent pressure of 57 to 70: θ) Contact method for producing acetaldehyde The ethylene-containing waste gas is compressed to a pressure of 1.7 to 1.7 in an oxychlorination system.
Pressure is increased to 1 to 4 bar above 5 bar, dried and fed to the oxychlorination system.
本発明による方法はエチレンをベースとする、アセトア
ルデヒドの製造からの、かつアセトアルデヒドの精製で
利用される貯蔵容器からの廃ガスの経済的な使用を可能
にする。もう1つの利点は、アセトアルデヒドにするた
めのエチレンと酸素との接触的反応からの廃ガスは乾燥
および圧縮を除く他の処理を実施する必要がなく、直接
他のガスと一緒にオキシクロリネーション反応器に装入
できることである。その際アルデヒド処理条件の変動が
生成される1、2−ジクロルエタンの質または収率に影
響しない。The process according to the invention allows an economical use of ethylene-based waste gases from the production of acetaldehyde and from storage vessels utilized in the purification of acetaldehyde. Another advantage is that the waste gas from the catalytic reaction of ethylene and oxygen to acetaldehyde does not need to undergo any other treatment except drying and compression, and can be directly combined with other gases into the oxychlorination reaction. It can be loaded into a container. Variations in the aldehyde treatment conditions do not affect the quality or yield of the 1,2-dichloroethane produced.
以下アセトアルデヒド(第1図)および1゜2−ジクロ
ルエタン(第2図)のj!!!造装置のフローシートを
もとに本発明方法を説明する:水性/塩酸性触媒溶液(
例えばOu(J 210 ucJ、。Below, j! of acetaldehyde (Figure 1) and 1゜2-dichloroethane (Figure 2). ! ! The method of the present invention will be explained based on the flow sheet of the production equipment: aqueous/hydrochloric acid catalyst solution (
For example, Ou(J 210 ucJ,.
PdCj2)を充填し、かつ例えば4.5バールの圧力
下にある反応器1中に導管2を介して酸素を。Oxygen via conduit 2 into a reactor 1 filled with PdCj2) and under a pressure of, for example, 4.5 bar.
かつ導管3を介し℃導管4および5によって導かれた新
しいエチレンもしくは循環ガス(組成は下記参照)の混
合物を導入する。その際エチレン対酸素のモル比は2:
1である。反応器1中でエチレンと酸素は130°Cで
反応してアセトアルデヒドになる。エチレンはいずれの
通過の際にも65〜40係反応し、アセトアルデヒドに
なる選択性は95%である。残りの5%は6憾が副生成
物に、かつ2CI)が廃ガス損失圧分れる。導管4から
新しいエチレンを添加することにより系内の圧力を維持
する。添加される酸素の封は循環ガス中の酸素の濃度に
よって制御され、この濃度は9容Jl係を下回らなけれ
ばならない。and a mixture of fresh ethylene or recycle gas (composition see below) is introduced via conduit 3, which is conducted by °C conduits 4 and 5. At that time, the molar ratio of ethylene to oxygen is 2:
It is 1. In reactor 1, ethylene and oxygen react at 130°C to form acetaldehyde. Ethylene undergoes 65 to 40 reactions during each pass, with a selectivity of 95% to acetaldehyde. The remaining 5% is divided into 6 by-products and 2 CI) as waste gas pressure loss. The pressure in the system is maintained by adding fresh ethylene through conduit 4. The addition of oxygen is controlled by the concentration of oxygen in the circulating gas, which must be below 9 liters.
ガス状反応混合物を霧捕集器6中で導管Tおよび3を経
て反応器に戻される触媒液から分離し、かつ冷却器8に
4き、ここで大部分の反応熱を取出し、かつ水蒸気のほ
ぼ1/2を凝縮する。The gaseous reaction mixture is separated in a fog collector 6 from the catalyst liquid which is returned to the reactor via conduits T and 3 and passed to a cooler 8 where most of the heat of reaction is removed and the water vapor is removed. Condense approximately 1/2.
110°Cの熱い凝縮物をポンプ9を用いて反応器1に
供給する。冷却器8を出た、尚熱い全アセトアルデヒド
を有するガスはもう1つの冷却器10を通過し、ここで
大部分のアセトアルデヒドを水で凝縮する。約25°C
のガスはこの冷却器10を出て、充填体を充填された洗
浄塔11に下方から流入し、ここで残留アセトアルデヒ
ドが洗い出される。循環ガスを圧縮機(水封じポンプ1
2)によって導管5および3を介して反応器1に戻す。Hot condensate at 110° C. is fed to reactor 1 using pump 9. The gas leaving the cooler 8, still hot, with all the acetaldehyde passes through another cooler 10, where most of the acetaldehyde is condensed with water. Approximately 25°C
The gas leaves this cooler 10 and flows from below into a cleaning tower 11 filled with packing bodies, where residual acetaldehyde is washed out. Circulating gas is compressed (water seal pump 1)
2) is returned to reactor 1 via conduits 5 and 3.
これは次の組成(重負悌)を有している:アルゴン12
〜18、酸素4〜5、窒素2〜8、二酸化炭素10〜2
0、エチ1/ン58〜70.(−の他(メタン、エタン
、塩化メチレン、塩化エチレン)0.2〜1.45゜循
環ガス中のエチレン濃度な一定に保ら、かつ不活性ガス
の濃度増加を回避するために不断に若干量のガスを取出
さなければならないっこのいわゆる反応器がスは循環ガ
スと同じ組成を有し、かつ圧縮機13−を用いて圧カフ
バールにされる。It has the following composition: Argon 12
~18, oxygen 4-5, nitrogen 2-8, carbon dioxide 10-2
0, ethi 1/in 58-70. (-Others (methane, ethane, methylene chloride, ethylene chloride) 0.2 to 1.45°) To keep the ethylene concentration in the circulating gas constant and to avoid an increase in the concentration of inert gas, This so-called reactor gas from which a quantity of gas has to be taken off has the same composition as the recycle gas and is brought to pressure by means of a compressor 13-.
冷却器10および洗浄塔11から共通の導管14を介し
て流出する粗製アセトアルデヒドを粗製アルデヒド容器
15内に中間貯蔵する。これは溶けた循環ガスを含有し
、該ガスは粗製アルデヒドの貯蔵時に1.5パール下に
大部分が発生する。アセトアルデヒドを除去するために
洗浄液16を通過させた後このいわゆる貯蔵廃ガスは次
の組成(重fiil:%)を有する:アルゴン2〜6、
酸素0.5〜1.5、窒素6〜20、二酸化炭素25〜
35、エタン150〜60、その他(メタン、エタン、
塩化メチレン、塩化エチレン)11〜2.65゜これを
圧縮機17で圧縮し′C圧カフバールにし、かつ13で
圧縮された反応器ガスと合一づ−ろ。反応器ガスと貯R
廃ガスは重に比で約(7〜8)=1で混合され、そのた
めに廃ガスdI合物の側的組成は反応器ガスのそれと余
り違わない。The crude acetaldehyde leaving the cooler 10 and the washing tower 11 via a common line 14 is intermediately stored in a crude aldehyde container 15 . This contains dissolved cycle gas, which is mostly generated under 1.5 par during storage of the crude aldehyde. After passing through a cleaning liquid 16 to remove the acetaldehyde, this so-called stored waste gas has the following composition (heavy fill:%): argon 2-6,
Oxygen 0.5-1.5, Nitrogen 6-20, Carbon dioxide 25-
35, Ethane 150-60, Others (methane, ethane,
Methylene chloride, ethylene chloride) 11 to 2.65° is compressed in a compressor 17 to a C pressure cuff bar, and combined with the compressed reactor gas in 13. Reactor gas and storage R
The waste gas is mixed in a ratio of approximately (7-8)=1, so that the lateral composition of the waste gas dI compound does not differ significantly from that of the reactor gas.
屏ガス混合物は水の蒸気圧に相応して12°Cまでは尚
若干の湿分を付着しておlノ、そのために廃ガス混合物
を乾燥18に導き、次いでアルゴン約11〜18係、酸
素6.5〜5幅、窒素2〜9q6、二酸化炭素10〜2
2係、エチレン57〜70%、その他(メタン、エタン
、塩化メチレン、塩化エチレン)0.2〜1.8%の組
成(重刑係)のものは導管19な経て1,2−ジクロル
エタンを製造するだめのオキシクロリネーション装置(
第2図)K入る。The waste gas mixture still retains some moisture up to 12°C, corresponding to the vapor pressure of water, and for this purpose the waste gas mixture is passed through drying 18 and then heated with about 11 to 18 parts of argon and about 18 parts of oxygen. 6.5-5 width, nitrogen 2-9q6, carbon dioxide 10-2
Section 2, those with a composition of 57 to 70% ethylene and 0.2 to 1.8% of others (methane, ethane, methylene chloride, ethylene chloride) (heavy penalty section) go through conduit 19 to produce 1,2-dichloroethane. Sudame's oxychlorination device (
Figure 2) Enter K.
導管19から廃ガス混合物を、かつ導管20から塩化水
素を新しいエチレンのための導管21に供給し、−緒に
オキシクロリネーション反応器22の下方部分に供給し
、22でエチレン、塩化水素おJ、び酸素を200〜2
50 ’Oおよび1.7〜5バールで流動する触媒粒子
の存在で反応させる。触媒は例えばキャリヤとしてのA
l2O3上の0u(J2およびK(Jがら成る。反応器
22を出るガス混合物な冷却塔23内できわめて希釈し
たアルカリ液を導管24から噴霧することにより約90
°OK冷却する。冷却されたがス混合物を更に水冷却器
25中でかつ塩水冷却器26中で10°Cに冷却し、そ
の際粗製1゜2−ジクロルエタンおよび水が凝縮し、か
つ捕集容器27に達し、ここで2相への分離が起きる。The waste gas mixture from line 19 and hydrogen chloride from line 20 are fed into line 21 for fresh ethylene and together with the lower part of the oxychlorination reactor 22, where ethylene, hydrogen chloride and , and oxygen to 200~2
The reaction is carried out in the presence of flowing catalyst particles at 50'O and 1.7-5 bar. The catalyst is e.g. A as a carrier.
0u (J2 and K (J) on l2O3. The gas mixture leaving the reactor 22 is approximately
°OK Cool down. The cooled gas mixture is further cooled to 10° C. in a water cooler 25 and in a brine cooler 26, with the crude 1° 2-dichloroethane and water condensing and reaching the collection vessel 27; Separation into two phases takes place here.
凝縮されなかったガスは圧縮機28および4管29を経
て循環ガスとして反応器22に戻される。この循環ガス
は窒素、二酸化炭素、−酸化炭素、酸素および少量の1
,2−ジクロルエタンおよびエチレンな含有する。循環
ガスに導管30から新しい酸素を供給する。その上に燃
焼可能外の濃度を一定如保っために循環ガスに窒素を導
管31から添加する。既に圧縮機28の前で反応器−の
定圧保持な介して添加される望累州並びにエタン/のC
OおよびCO2への燃焼に相当する循環ガスの一部を連
続的に取出し、1.2−ジクロルエタン回収装置32内
で1゜2−ジクロルエタンを分離し、かつ焼却に送る。The uncondensed gas is returned to the reactor 22 as a circulating gas via the compressor 28 and the four pipes 29. This cycle gas consists of nitrogen, carbon dioxide, carbon oxide, oxygen and a small amount of carbon dioxide.
, 2-dichloroethane and ethylene. The circulating gas is supplied with fresh oxygen via conduit 30. In addition, nitrogen is added to the circulating gas through conduit 31 in order to keep the concentration above combustible constant. Already before the compressor 28, the C and ethane/C added through the constant pressure maintenance of the reactor are added.
A portion of the circulating gas corresponding to the combustion to O and CO2 is continuously removed, the 1.2-dichloroethane is separated off in a 1.2-dichloroethane recovery device 32 and sent to incineration.
捕集容器27の上方の水相を導管24を介して冷起塔2
3に戻す。この水相に導管33からアルカリ液を導管2
4に添加する。エチレンのオキシクロリネーションの際
にその都度新しく形成されろ反応水を冷却塔23の底部
で28’f34を介して取出1〜。反応水は1.2−ジ
クロルエタ/でlλ化されているので、これを系圧力(
1,7〜5バール)で塔35内で160 ’Oを上回る
温度に加熱し、逃失する水蒸気および1゜2−ジクロル
エタンを導管36を経て冷却器24+C送り、かつ1,
2−ジクロルエタンおよびエチレンを分離した水を塔3
5の底部で流路内に排出する。The aqueous phase above the collection container 27 is passed through the conduit 24 to the cooling tower 2.
Return to 3. An alkaline solution is introduced into this aqueous phase from conduit 33 through conduit 2.
Add to 4. The reaction water, which is newly formed in each case during the oxychlorination of ethylene, is taken off at the bottom of the cooling tower 23 via 28'f34. Since the reaction water has been converted to lλ with 1,2-dichloroethane/
1,7-5 bar) to a temperature above 160'O in column 35, the escaping water vapor and 1°2-dichloroethane are sent via conduit 36 to condenser 24+C, and 1,
The water from which 2-dichloroethane and ethylene were separated is sent to column 3.
5 into the flow channel.
アルデヒド排ガスとともに導管19から装入された不活
性ガスおよび副生成物は殆ど作用を受けずに、かつまた
オキシクロリネーションに不利な作用を与えずにオキシ
クロリネーション反応器22を去る。例しいエチレンと
アセトアルデヒド処理の廃ガスからのエチレンは同じ変
換車および同じ収率で反応して1,2−ジクロルエタン
になる。導管31から添加される窒素員はアセトアルデ
ヒド廃ガス中に既に含まれている不活性ガスの量に応じ
て変わる。この方法によってエチレンおよび1.2−ジ
クロルエタンの損失は62から燃焼へと排出されるオキ
シクロリネーションの廃ガス中で一定にとどまり、その
際導管19からアセトアルデヒド廃ガスが使用されるか
されないかは重要ではない。The inert gas and by-products introduced through line 19 together with the aldehyde exhaust gas leave the oxychlorination reactor 22 almost unaffected and without any adverse effect on the oxychlorination. Exemplary ethylene and ethylene from the acetaldehyde treatment waste gas react to 1,2-dichloroethane with the same conversion vehicle and the same yield. The amount of nitrogen added through conduit 31 varies depending on the amount of inert gas already contained in the acetaldehyde waste gas. With this method, the loss of ethylene and 1,2-dichloroethane remains constant in the oxychlorination waste gas discharged from 62 to the combustion, irrespective of whether acetaldehyde waste gas is used from line 19 or not. isn't it.
例 1
第1図および第2図に関する記載のようにして処理する
。圧縮機13によって次の組成(重:11%)の反応器
ガス450kl?/hが圧縮される:Ar : 15.
45.02 : 4.78、N2 : 3.0 。Example 1 Process as described with respect to FIGS. 1 and 2. Compressor 13 supplies 450kl of reactor gas with the following composition (weight: 11%)? /h is compressed: Ar: 15.
45.02: 4.78, N2: 3.0.
Do2: 12.77.02H4163,33、OH,
:0.02C2H6: 0.1.0)13C2:0.4
5.02H5C1:o、i 0圧縮機17によって次の
組成(爪礒係)の貯蔵廃がス59ky/hが圧縮される
:
Ar : 3.63.02 : 0.97 : l’2
: 6−95.002: 31.9、C2H4: 5
4.55、OH,:0.005.02H6: 0.07
5.0H3CJ : 1.53、C2H3CJ : 0
.39゜
次の組成(重i%):Ar: 14.08.02:4.
64、N2 : 3−46.002: 14@98 %
02H4’62.32、OH4: 0.02、C2H
6: 0.1、CHsCJ−: 0.57.02H5c
J : 0.13 を有する廃ガスの混合物(509
kl?/h )を導管19を介してオキシクロリネーシ
ョン装置に供給する。Do2: 12.77.02H4163,33,OH,
:0.02C2H6: 0.1.0)13C2:0.4
5.02H5C1: o, i 0 The compressor 17 compresses 59 ky/h of stored waste with the following composition: Ar: 3.63.02: 0.97: l'2
: 6-95.002: 31.9, C2H4: 5
4.55, OH,: 0.005.02H6: 0.07
5.0H3CJ: 1.53, C2H3CJ: 0
.. 39° The following composition (weight i%): Ar: 14.08.02:4.
64, N2: 3-46.002: 14@98%
02H4'62.32, OH4: 0.02, C2H
6: 0.1, CHsCJ-: 0.57.02H5c
J: a mixture of waste gases with 0.13 (509
kl? /h) is fed to the oxychlorination device via conduit 19.
反応器22内の反応は4バールおよび23°Cで行なわ
れる。新しいエチレン、塩化水素、酸素、室床の添加量
並びに変換率および収率を次表に挙げる。冷却塔23中
に導管24から噴射されるきわめて希釈されたアルカリ
液は60°Cの1重景係−水性苛性ソーダ液である。The reaction in reactor 22 takes place at 4 bar and 23°C. The amounts of fresh ethylene, hydrogen chloride, oxygen, and chamber additions as well as conversion rates and yields are listed in the following table. The highly dilute alkaline liquid injected from conduit 24 into cooling tower 23 is aqueous caustic soda at 60°C.
例 2(比較例)
例1と同様にして処理するが、導管19から廃ガスの供
給を行なわない。例1と同じC2)14:HCJ、 ’
: C2のモル比1 : 1.92 : 0.63を維
持し得るには塩化水素量および酸累量を相応して減少さ
せる。詳細は表から明らかである。EXAMPLE 2 (COMPARATIVE EXAMPLE) The process is carried out as in Example 1, but no waste gas is supplied through conduit 19. Same as Example 1 C2) 14:HCJ,'
:C2 molar ratio of 1:1.92:0.63, the amount of hydrogen chloride and the amount of acid accumulated are reduced accordingly. Details are clear from the table.
例 6
エチレンのオキシクロリネーションを例1と同様にして
実施するが、酸素を空気の形で使用し、かつ循環下に導
かず、反応器を1度通過の原理により処理する。空−気
の高窒素含量のために廃ガス量が著量であるので、エチ
レン損失は循環方法の場合よりも高い。詳細は表に挙げ
る。Example 6 The oxychlorination of ethylene is carried out analogously to Example 1, but the oxygen is used in the form of air and is not introduced into circulation, but the reactor is treated on the one-pass principle. Ethylene losses are higher than in the circulation process since the amount of waste gas is significant due to the high nitrogen content of the air. Details are listed in the table.
例 4(比較例)
例6と同様に処理するが、導管19からの廃ガスの供給
は行なわない。例3と同じ、02H4:HC,L:02
のモル比= 1 : 1.89 : 0.86を維持
するために相応して塩化水素量および空気量を下げる。Example 4 (comparative example) The procedure is as in Example 6, but no waste gas is supplied via conduit 19. Same as example 3, 02H4:HC,L:02
In order to maintain the molar ratio of = 1: 1.89: 0.86, the amount of hydrogen chloride and the amount of air are reduced accordingly.
詳細は表に挙げる。Details are listed in the table.
例1と2、かつ例3と4の比較によれば、本発明により
それぞれ8.45 =1の1.2−ジクロルエタンが形
成されることな示す、それというのもアセトアルデヒド
作条のエチレン含有廃ガスをエチレン源として付加的に
オキシクロリネーション装置に供給し、かつ従来のよう
に経費のかかる後処理または環境の負荷−トに燃焼する
必要がないからである。Comparison of Examples 1 and 2 and Examples 3 and 4 shows that 8.45 = 1 of 1,2-dichloroethane is formed according to the invention, since the ethylene-containing waste of the acetaldehyde operation is This is because there is no need to additionally supply the gas as an ethylene source to the oxychlorination plant and to combust it for expensive post-treatment or environmental burden as in the past.
第1図はアセトアルデヒド装置のフローシートを示し、
かつ!g2図は1.2−ジクロルエタン製造のフローシ
ートラ示ス。
1・・・反応器、8.10・・・冷却器、13.17・
・・圧縮機、18・・・乾燥、19・・・導管、22・
・・オキシクロリネーション反応器Figure 1 shows the flow sheet of the acetaldehyde equipment,
and! Figure g2 shows a flow sheet truss for producing 1,2-dichloroethane. 1... Reactor, 8.10... Cooler, 13.17.
... Compressor, 18... Drying, 19... Conduit, 22.
・・Oxychlorination reactor
Claims (1)
ルでキャリヤ上の塩化銅tutを含有する触媒の存在で
、かつ場合により窒素の添加下にエチレンを塩化水素お
よび酸素または空気でオキシクロリネーションし、その
際1.2−ジクロルエタンを反応ガスから凝縮分離し。 かつ酸素使用の場合には残ガスを主として循環でオキシ
クロリネーション帯域に戻すことにより1.2−ジクロ
ルエタンを製造するための方法において、エチレンの少
なくとも一部分をエチレンと酸素からアセトアルデヒド
な製造するための接触的方法から得られるエチレン含有
廃ガスの形状で使用することを特徴とする、1.2−ジ
クロルエタンの製法。 2、 エチレン含有廃ガスとして7セトアルデヒドを製
造するための接触的方法の反応部からの反応部ガスを使
用する、特i!′1;肋求の範囲棺1項記載の方法。 6、 エチレン含有廃ガスとし”U411製アセトアル
デヒドの中間貯蔵器の脱気からの貯蔵屏ガスを便用1−
る、特許請求の範囲第1項記載の方法。 4、 エチレン含有局ガスとしてアセトアルデヒド′を
製造するための接触方法の反応部力)らの反応部ガスお
よび粗製アセトアルデヒドの中間貯蔵器の脱気からの貯
蔵楠ガスj))混合物を特徴する特許請求の範囲第1項
記載の方法。 5、次の重1fiqbの組成: アルゴン 11〜18幅 酸 素 6.5〜5幅 窒 素 2〜9係 一酸化炭素 10〜22係エチレン
57〜70% その他(メタン、エタン、塩化メチレン、塩化エチレン
)0.2〜1.8係を有スるエチL/7ち有ルbガスな
使用する、% ff’f B?l求の範囲第1項〜第4
項のいずれが1項記411この方法。 6,7セトアルヂヒドを製造するための接触方法からの
エブレン含有廃ガスを圧縮してオキシクロリネーション
系内の圧力1.7〜5バールよりも1〜4バール高い圧
力にし、乾燥し、かつオキシクロリオーション糸に供給
する、特許請求の範囲第1項〜第5項のいずれが1項記
載の方法。Claims: 1. Ethylene is converted to hydrogen chloride and oxygen in the presence of a catalyst containing copper chloride on a carrier at a temperature of 200-250° C. and a pressure of 1.7-5 par, and optionally with the addition of nitrogen. Alternatively, oxychlorination with air can be carried out, with 1,2-dichloroethane being condensed and separated from the reaction gas. and in the case of using oxygen, the residual gas is mainly recycled back to the oxychlorination zone to produce 1,2-dichloroethane. A process for producing 1,2-dichloroethane, characterized in that it is used in the form of an ethylene-containing waste gas obtained from a conventional process. 2. Using the reaction section gas from the reaction section of the catalytic process for producing 7cetaldehyde as ethylene-containing waste gas, especially i! '1; Scope of request The method described in item 1. 6. Use the stored waste gas from the degassing of the U411 acetaldehyde intermediate storage as waste gas containing ethylene.1-
The method according to claim 1, wherein the method comprises: 4. Claims characterized by a mixture of the reaction part gas of the contact process for producing acetaldehyde' as ethylene-containing local gas and the storage gas j)) from the degassing of an intermediate storage of crude acetaldehyde The method described in item 1. 5. Composition of the following weight 1fiqb: Argon, 11-18% oxygen, 6.5-5% nitrogen, 2-9% carbon monoxide, 10-22% ethylene
57-70% Others (methane, ethane, methylene chloride, ethylene chloride) with a ratio of 0.2-1.8% ff'f B? Range 1st to 4th term of l search
Which of the following terms is 1? 411 This method. The ebrene-containing waste gas from the catalytic process for producing 6,7 acetaldihyde is compressed to a pressure of 1 to 4 bar above the pressure of 1.7 to 5 bar in the oxychlorination system, dried and The method according to any one of claims 1 to 5, wherein the method is supplied to a machine yarn.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE32260423 | 1982-07-12 | ||
DE19823226042 DE3226042A1 (en) | 1982-07-12 | 1982-07-12 | Process for the preparation of 1,2-dichloroethane |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5920233A true JPS5920233A (en) | 1984-02-01 |
Family
ID=6168261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58115309A Pending JPS5920233A (en) | 1982-07-12 | 1983-06-28 | Manufacture of 1,2-dichloroethane |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5920233A (en) |
AU (1) | AU555622B2 (en) |
CA (1) | CA1201729A (en) |
DE (1) | DE3226042A1 (en) |
IT (1) | IT1172398B (en) |
MX (1) | MX161306A (en) |
Cited By (3)
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---|---|---|---|---|
US4946357A (en) * | 1989-10-30 | 1990-08-07 | James Harrison | Diverter chute assembly for molding machine |
JP2009275014A (en) * | 2008-05-16 | 2009-11-26 | Tosoh Corp | Method of preparing 1,2-dichloroethane |
JP2011513270A (en) * | 2008-02-28 | 2011-04-28 | ソルベイ(ソシエテ アノニム) | Method for producing at least one ethylene derivative compound |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2096095A1 (en) * | 2008-02-28 | 2009-09-02 | SOLVAY (Société Anonyme) | Process for the manufacture of at least one ethylene derivative compound |
EP2130814A1 (en) * | 2008-06-03 | 2009-12-09 | SOLVAY (Société Anonyme) | Process for the manufacture of at least one ethylene derivative compound |
EA201290428A1 (en) * | 2009-12-03 | 2013-01-30 | Солвей Са | METHOD FOR OBTAINING AT LESS THAN ONE DERIVATIVE COMPOUND OF ETHYLENE |
WO2011067231A1 (en) * | 2009-12-03 | 2011-06-09 | Solvay Sa | Process for the manufacture of at least one ethylene derivative compound |
DE102011108211A1 (en) | 2011-07-21 | 2013-01-24 | Thyssenkrupp Uhde Gmbh | A process for concentrating aqueous liquor and apparatus therefor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0053335A1 (en) * | 1980-11-28 | 1982-06-09 | Hoechst Aktiengesellschaft | Process for the preparation of 1,2-dichloroethane |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2603477C3 (en) * | 1976-01-30 | 1983-02-03 | Hoechst Ag, 6000 Frankfurt | Process for the removal of impurities from 1,2-dichloroethane obtained by oxychlorination |
DE2733502C3 (en) * | 1977-07-25 | 1980-09-25 | Wacker-Chemie Gmbh, 8000 Muenchen | Process for the production of 1,2-dichloroethane from ethylene-containing residual gases which originate from an oxychlorination |
US4151212A (en) * | 1978-07-07 | 1979-04-24 | Ppg Industries, Inc. | Purification of ethylene dichloride |
-
1982
- 1982-07-12 DE DE19823226042 patent/DE3226042A1/en active Granted
-
1983
- 1983-06-03 CA CA000429652A patent/CA1201729A/en not_active Expired
- 1983-06-20 IT IT48537/83A patent/IT1172398B/en active
- 1983-06-28 JP JP58115309A patent/JPS5920233A/en active Pending
- 1983-07-11 MX MX197990A patent/MX161306A/en unknown
- 1983-07-11 AU AU16729/83A patent/AU555622B2/en not_active Ceased
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0053335A1 (en) * | 1980-11-28 | 1982-06-09 | Hoechst Aktiengesellschaft | Process for the preparation of 1,2-dichloroethane |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4946357A (en) * | 1989-10-30 | 1990-08-07 | James Harrison | Diverter chute assembly for molding machine |
JP2011513270A (en) * | 2008-02-28 | 2011-04-28 | ソルベイ(ソシエテ アノニム) | Method for producing at least one ethylene derivative compound |
JP2009275014A (en) * | 2008-05-16 | 2009-11-26 | Tosoh Corp | Method of preparing 1,2-dichloroethane |
Also Published As
Publication number | Publication date |
---|---|
AU1672983A (en) | 1984-01-19 |
IT1172398B (en) | 1987-06-18 |
AU555622B2 (en) | 1986-10-02 |
IT8348537A0 (en) | 1983-06-20 |
DE3226042A1 (en) | 1984-01-12 |
DE3226042C2 (en) | 1990-11-22 |
CA1201729A (en) | 1986-03-11 |
MX161306A (en) | 1990-09-05 |
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