[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JPS5857843U - フオトレジスト湿式現像装置 - Google Patents

フオトレジスト湿式現像装置

Info

Publication number
JPS5857843U
JPS5857843U JP1981153669U JP15366981U JPS5857843U JP S5857843 U JPS5857843 U JP S5857843U JP 1981153669 U JP1981153669 U JP 1981153669U JP 15366981 U JP15366981 U JP 15366981U JP S5857843 U JPS5857843 U JP S5857843U
Authority
JP
Japan
Prior art keywords
photoresist film
developer
laser light
substrate
electrical signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1981153669U
Other languages
English (en)
Other versions
JPH0238283Y2 (ja
Inventor
文雄 松井
指田　光章
Original Assignee
パイオニア株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by パイオニア株式会社 filed Critical パイオニア株式会社
Priority to JP1981153669U priority Critical patent/JPS5857843U/ja
Priority to US06/434,478 priority patent/US4501480A/en
Priority to FR828217300A priority patent/FR2514927B1/fr
Priority to GB08229719A priority patent/GB2108710B/en
Priority to DE3238528A priority patent/DE3238528C2/de
Publication of JPS5857843U publication Critical patent/JPS5857843U/ja
Application granted granted Critical
Publication of JPH0238283Y2 publication Critical patent/JPH0238283Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】
第１図は本考案の一実施例現像装置を示すブロック図、
第２図は第１図の装置において霧状現像液の浮遊し得る
領域とレーザ光伝播領域とを仕切る仕切手段の一例を示
す斜視図、第３図及び第４図はそれぞれ該仕切手段の他
の例を示す略側面図及び略正面図である。 主要部分の符号の説明、１・・・・・・処理槽、３・・
・・・・ターンテーブル、８・・・・・・レーザ光源、
９・・・・・・ハーフミラ−１１０，１２・・・・・・
光電変換器、１８・・・・・・仕切筒、１９・・・・・
・仕切スクリーン。

Claims (5)

    【実用新案登録請求の範囲】
  1. （１）透明な基盤の平坦な側面上のフォトレジスト膜に
    現像液を接触させて前記フォトレジスト膜の渦巻状径路
    をなして不連続的に感光した部分を溶解除去することに
    より前記フォトレジスト膜に不連続的なピットの列を形
    成する現像装置であって、前記基盤を回転させるための
    回転駆動手段と、前記フォトレジスト膜上に前記現像液
    を供給して前記フォトレジスト膜に沿って前記現像液を
    接触させるための現像液供給手段と、前記フォトレジス
    ト膜に対して所定角度傾斜した方向から所定波長のレー
    ザ光を前記フォトレジスト膜に照射するレーザ光源と、
    前記レーザ光源により発生されて前記フォトレジスト膜
    で所定方向に回折して前記基盤を透過した光を検出して
    受光量に応じた電気信号を発生する光電変換器と、前記
    レーザ光源から前記フォトレジスト膜に到るレーザ光の
    伝播径路を前記現像液から隔絶する仕切手段とを含み、
    前記電気信号を検出して当該電気信号が所定値に達した
    とき前記フォトレジスト膜に対する前記現像液の供給を
    停止させるようになされたことを特徴とする装置。
  2. （２）前記仕切手段は、前記レーザ光の伝播径路を囲む
    筒状の部材を含むことを特徴とする実用新案登録請求の
    範囲第１項記載の装置。
  3. （３）前記仕切手段は、前記レーザ光伝播径路と前記現
    像液供給手段の現像液排出部との間に配置された板状の
    部材を含むことを特徴とする実用新案登録請求の範囲第
    １項記載の装置。
  4. （４）前記板状の部材は該部材上の液体をその側部へ案
    内する溝を有することを特徴とする実用新案登録請求の
    範囲第３項記載の装置。
  5. （５）前記仕切手段は、前記レーザ光源により発生され
    たレーザ光を前記フォトレジスト膜へ導く光学繊維から
    なることを特徴とする実用新案登録請求の範囲第１項記
    載の装置。
JP1981153669U 1981-10-16 1981-10-16 フオトレジスト湿式現像装置 Granted JPS5857843U (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP1981153669U JPS5857843U (ja) 1981-10-16 1981-10-16 フオトレジスト湿式現像装置
US06/434,478 US4501480A (en) 1981-10-16 1982-10-15 System for developing a photo-resist material used as a recording medium
FR828217300A FR2514927B1 (fr) 1981-10-16 1982-10-15 Dispositif de developpement d'un materiau photosensible utilise comme milieu d'enregistrement
GB08229719A GB2108710B (en) 1981-10-16 1982-10-18 System for developing a photo-resist material used as a recording medium
DE3238528A DE3238528C2 (de) 1981-10-16 1982-10-18 Vorrichtung zum Steuern der Entwicklerflüssigkeitszufuhr für eine Fotoresistplattenentwicklungseinrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1981153669U JPS5857843U (ja) 1981-10-16 1981-10-16 フオトレジスト湿式現像装置

Publications (2)

Publication Number Publication Date
JPS5857843U true JPS5857843U (ja) 1983-04-19
JPH0238283Y2 JPH0238283Y2 (ja) 1990-10-16

Family

ID=15567578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1981153669U Granted JPS5857843U (ja) 1981-10-16 1981-10-16 フオトレジスト湿式現像装置

Country Status (5)

Country Link
US (1) US4501480A (ja)
JP (1) JPS5857843U (ja)
DE (1) DE3238528C2 (ja)
FR (1) FR2514927B1 (ja)
GB (1) GB2108710B (ja)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4647172A (en) * 1985-05-17 1987-03-03 Gca Corporation Resist development method
US5006720A (en) * 1988-07-28 1991-04-09 Transtechnology Corporation Light sensor apparatus for sheet transport
US5196285A (en) * 1990-05-18 1993-03-23 Xinix, Inc. Method for control of photoresist develop processes
JP3070113B2 (ja) * 1991-03-07 2000-07-24 ソニー株式会社 フォトレジストの現像処理装置
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method
GB9307239D0 (en) * 1993-04-07 1993-06-02 Nimbus Communications Int Ltd Method and apparatus for process control
US5416552A (en) * 1994-01-28 1995-05-16 Surface Tek, Inc. Apparatus and method for replenishing developer
US5988896A (en) * 1996-10-26 1999-11-23 Applied Science Fiction, Inc. Method and apparatus for electronic film development
US6069714A (en) 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
US6017688A (en) 1997-01-30 2000-01-25 Applied Science Fiction, Inc. System and method for latent film recovery in electronic film development
EP1086577B1 (en) 1998-02-23 2002-09-18 Applied Science Fiction, Inc. Progressive area scan in electronic film development
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
TW495389B (en) * 1999-06-29 2002-07-21 Applied Science Fiction Inc Slot coater device for applying developer to film for electronic film development
EP1232418B1 (en) 1999-08-17 2004-10-13 Eastman Kodak Company Method and system for using calibration patches in electronic film processing
WO2001045042A1 (en) * 1999-12-17 2001-06-21 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
AU2743701A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. System and method for digital film development using visible light
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6864973B2 (en) 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
US20010030685A1 (en) * 1999-12-30 2001-10-18 Darbin Stephen P. Method and apparatus for digital film processing using a scanning station having a single sensor
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
AU2463501A (en) * 1999-12-30 2001-07-24 Applied Science Fiction, Inc. Methods and apparatus for transporting and positioning film in a digital film processing system
WO2001050197A1 (en) 1999-12-30 2001-07-12 Applied Science Fiction, Inc. System and method for digital color dye film processing
AU2742701A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
US6664034B2 (en) * 1999-12-31 2003-12-16 Eastman Kodak Company Digital film processing method
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
WO2001057796A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Method, system, and software for signal processing using pyramidal decomposition
WO2001057797A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Method, system and software for signal processing using sheep and shepherd artifacts
US6786655B2 (en) 2000-02-03 2004-09-07 Eastman Kodak Company Method and system for self-service film processing
US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
AU2001238021A1 (en) * 2000-02-03 2001-08-14 Applied Science Fiction Match blur system and method
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
US6599036B2 (en) 2000-02-03 2003-07-29 Applied Science Fiction, Inc. Film processing solution cartridge and method for developing and digitizing film
US20060182337A1 (en) * 2000-06-28 2006-08-17 Ford Benjamin C Method and apparatus for improving the quality of reconstructed information
US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
CN1474997A (zh) * 2000-09-21 2004-02-11 Ӧ�ÿ�ѧ��˾ 动态图像校正及成像系统
US20020146171A1 (en) * 2000-10-01 2002-10-10 Applied Science Fiction, Inc. Method, apparatus and system for black segment detection
US6778696B1 (en) * 2000-10-12 2004-08-17 Eastman Kodak Company Integrated traditional and digital photographic processing system with exchanged feedback control
US6888997B2 (en) * 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
WO2002065210A2 (en) 2001-02-09 2002-08-22 Eastman Kodak Company Digital film processing solutions and method of digital film processing
US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
US20060192857A1 (en) * 2004-02-13 2006-08-31 Sony Corporation Image processing device, image processing method, and program

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3388652A (en) * 1965-05-27 1968-06-18 Technical Operations Inc Photographic processing control
US3663724A (en) * 1969-11-14 1972-05-16 Chemcut Corp Built-in type speed control for conveyorized continuous etcher
GB1280625A (en) * 1970-02-26 1972-07-05 Nat Res Dev Method of forming fringe pattern images
US3702277A (en) * 1970-09-23 1972-11-07 Zenith Radio Corp Control system for mask etching apparatus
US3995959A (en) * 1975-04-21 1976-12-07 Shaber Gary S Method and apparatus for determining the operational status of a photographic film processor
US3953265A (en) * 1975-04-28 1976-04-27 International Business Machines Corporation Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
US4119989A (en) * 1977-01-03 1978-10-10 Pitney-Bowes, Inc. System for controlling concentration of developer solution
US4128325A (en) * 1977-05-31 1978-12-05 Pako Corporation Automatic density measurement calibration for photographic replenishment system
US4180830A (en) * 1977-06-28 1979-12-25 Rca Corporation Depth estimation system using diffractive effects of the grooves and signal elements in the grooves
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4136940A (en) * 1977-12-19 1979-01-30 Rca Corporation Resist development control system
FR2509484B1 (fr) * 1981-07-08 1986-06-13 Pioneer Electronic Corp Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement
GB8719137D0 (en) * 1987-08-13 1987-09-23 Proform Uk Ltd Roofing valleys

Also Published As

Publication number Publication date
GB2108710B (en) 1985-06-12
JPH0238283Y2 (ja) 1990-10-16
GB2108710A (en) 1983-05-18
FR2514927A1 (fr) 1983-04-22
US4501480A (en) 1985-02-26
DE3238528A1 (de) 1983-05-05
DE3238528C2 (de) 1984-08-16
FR2514927B1 (fr) 1989-05-12

Similar Documents

Publication Publication Date Title
JPS5857843U (ja) フオトレジスト湿式現像装置
IT8148391A0 (it) Soluzione di sviluppo per pellicole fotosensibili contenenti uno strato di photoresist su un substrato rivestito con alluminio e procedimento di impiego
JPS62127786A (ja) 画像形成装置
JPS6115072U (ja) レジスト塗布装置
RU95121761A (ru) Способ исследования оптического диска оригинала и устройство для его осуществления
JPH0617551Y2 (ja) 記録装置における書込みヘツドの位置決め機構
JPS5814343A (ja) フオトレジスト湿式現像方法及び装置
JPS5337001A (en) Information recorder
US1497851A (en) Method and means for making lantern slides
JPS5987052U (ja) 直接ポジカラ−写真用現像処理装置
JPS58147121A (ja) 画像形成系
JPS5845533U (ja) 照度分布測定装置
JPS6327844A (ja) フオトレジスト膜現像方法及びその装置
JPS6040034U (ja) 光学式情報記録又は再生装置
JPS5915964A (ja) 画像表示装置
JPS6124750U (ja) 静電記録装置
JPS6243368U (ja)
JPS6481928A (en) Exposing device
JPS6094661U (ja) レジスト塗布装置
JPS6452237A (en) Manufacture of stamper
JPS6111164U (ja) 静電記録装置
JPS57182764A (en) Toner applicator part for electrostatic printer of liquid development system
JPS5828854U (ja) スリツト露光方式の複写機の露光装置
JPS6266441A (ja) 記録原盤現像装置
JPS5862357U (ja) 画像形成装置における画像濃度検出装置