JPS5850541A - Manufacture of printing plate of photosensitive resin relief printing - Google Patents
Manufacture of printing plate of photosensitive resin relief printingInfo
- Publication number
- JPS5850541A JPS5850541A JP56148706A JP14870681A JPS5850541A JP S5850541 A JPS5850541 A JP S5850541A JP 56148706 A JP56148706 A JP 56148706A JP 14870681 A JP14870681 A JP 14870681A JP S5850541 A JPS5850541 A JP S5850541A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- film
- resin layer
- printing
- contact screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はI!!1線部の密層強度がすぐれた感光性樹は
第1図に示すように、ガラス板lの上にネガチプ2を置
き、カバー用透明フィルム3を重ねた後、全面に感光性
樹脂層4を塗設し、更に感光性樹脂凸版の基材となるフ
ィルム5を密書せしめ、フィルム5とコンタクトスクリ
ーン6の膜面8が接するようにコンタクトスクリーンを
重ねた上にガラス板7を置き、ガラス板1側より玉露光
を行、なう工程と、ガラス板7側よりバック露光を行な
う工程とを行ない、例えば、硼酸ナトリウム、界面活性
剤等を含む弱アルカリ水溶液等、若しくは溶剤等を用い
て未硬化部分を洗い落とす方法等により現像を行ない、
更に第2図に示すようなuii+線部9を形成すると共
に非画線部に尖角部10を形成するものである。ことで
尖角部10はバック露光の露光緻を調整することKより
、画線部9よりも低くなるよう形成され、画線部と非画
線部の高さの差が少なく、万一、非画線部にインキが供
給されてもインキが溜まりにくく、又、印刷されても小
さい点が印刷されるため目立たないという、いわゆる「
ケラ付き」の防止の役割を担っている。DETAILED DESCRIPTION OF THE INVENTION The present invention is based on I! ! As shown in Fig. 1, a photosensitive resin with excellent dense layer strength in the 1-line portion is made by placing a negative chip 2 on a glass plate 1, overlaying a transparent cover film 3, and then applying a photosensitive resin layer 4 on the entire surface. A film 5, which will be a base material for a photosensitive resin letterpress, is coated on top of the contact screen, and a glass plate 7 is placed on top of the contact screen so that the film 5 and the film surface 8 of the contact screen 6 are in contact with each other. A step of performing a single exposure from the glass plate 7 side and a step of back exposure from the glass plate 7 side are carried out. Develop by washing off the hardened parts, etc.
Further, a uii+ line portion 9 as shown in FIG. 2 is formed, and a pointed corner portion 10 is formed in the non-printing portion. By adjusting the exposure precision of the back exposure, the sharp corner part 10 is formed to be lower than the image area 9, and the difference in height between the image area and the non-image area is small, so that even if Even if ink is supplied to non-print areas, ink does not accumulate easily, and even when printed, small dots are printed so they are not noticeable.
It plays the role of preventing keratin.
以上のような従来の感光性樹脂凸版は一線部。Conventional photosensitive resin letterpress printing as described above is a one-line part.
特に細かい点や細い線、文字等の一線部に過大な印圧が
かかると一線部が基材のフィルムに沿った方向に伸ばさ
れ、印圧がなくなると元に戻る伸縮を繰り返すために2
万回以上の印刷では剥落しやすく好ましくないものであ
る。In particular, if excessive printing pressure is applied to a line part such as a fine point, thin line, or character, the line part will stretch in the direction along the base film, and when the printing pressure is removed, it will repeat the expansion and contraction, returning to its original state.
Printing more than 10,000 times is undesirable because it tends to peel off.
かかる感光性樹脂凸版の欠点を除くためKは、基材のフ
ィルムと画線部との密着強度をプライマー等の使用によ
り同上させる方法もあるが工程が増加し煩雑であり、又
、l1iII線部自体の硬度を向上させて変形しにくく
する事を試みるとインキの付雀性が低下する等の欠点が
ある。In order to eliminate such drawbacks of photosensitive resin letterpress printing, there is a method of increasing the adhesion strength between the base film and the image area by using a primer, etc., but this increases the number of steps and is complicated. If an attempt is made to improve the hardness of the ink to make it less likely to deform, there are drawbacks such as a decrease in ink adhesion.
本発明者は従来の材料、工程を大巾に変更することなく
1画線部の密書性を向上せんと研究し九結果、先に説明
した非画線部に尖角部を設けるだけでなく、尖角部の高
さより史に低い硬化樹脂層を形成することにより画線部
の基材との密着強度を補強すると同時に過大な印圧がか
かったときの1線部の変形を抑制する働きがあることを
見出し、かかる事実に基づき本発明を完成し7たもので
ある。The present inventor conducted research to improve writing performance in a single drawing area without making major changes to conventional materials and processes, and as a result, in addition to providing a sharp corner in the non-printing area as described above, By forming a cured resin layer that is lower than the height of the sharp edge, it strengthens the adhesion of the printed area to the base material and at the same time suppresses the deformation of the single line area when excessive printing pressure is applied. Based on this fact, we have completed the present invention.
以下、本発明を更に詳しく説明する。The present invention will be explained in more detail below.
本発明の各工程は散乱露光する工程を除いては従来の工
程と同様であり、まず、平面性を付与するため、例えば
厚み10麿の平面性のすぐれた透明かつ無色のガラス板
を下に置き、その上に必要な線、文字等若しくは写真を
網かけしたネガチプフィルムをその膜面(乳剤面)が上
になるように置き1次に11記羊ガチプと後述の感光性
樹脂層とが直接接触しないように通常、厚み20虜程度
の透明なポリプロピレン等のフィルム5でカバーし。Each process of the present invention is the same as the conventional process except for the step of scattering exposure. First, in order to provide flatness, a transparent and colorless glass plate with excellent flatness, for example, 10 mm thick, is placed underneath. Then place a negative chip film with the necessary lines, letters, etc. or photographs shaded on it so that the film side (emulsion side) is facing up. 1. Next, add the sheep paste described in 11 and the photosensitive resin layer described below. It is usually covered with a transparent polypropylene film 5 about 20 mm thick to prevent direct contact.
更にその上に重ねて感光性樹脂層1に塗設する。感光性
樹脂としては公知の、不飽和ポリエステルとアクリルモ
ノマー、ポリアミド共重合体、ポリウレタンとアクリル
モノマー、ポリビニルアルコールとアクリルモノマー、
アルコール溶性ポリアミドとアクリルモノマー、ポリビ
ニルピロリF7とアクリルモノマー、合成ゴムとアクリ
ルモノマー等のモノマー、オリゴマー若しくはプレポリ
マーを用いることができ、光重合開始剤としてハイドロ
キノン、ベンゾイン、アントラキノン、ベンゾインメチ
ルエーテル、ベンゾインエチルエーテル等、安定剤とし
てP−フェ△レンレアミン、P−メトキシフェノール等
を適宜添加してなるものを用い、例えば樹脂をバケット
に保持し、カバーフィルム上に均一の厚みにスキージを
用いて塗希する方法や、樹脂をカバーフィルム上に置き
上下から平定盤により圧紬し均一の厚み圧する等の方法
により塗布して好ましくは厚みが0.55〜α6xaK
なるようiける。次に前記感光性樹脂層の上を感光性樹
脂凸版の基材となるものとして、例えjfポリエステル
樹脂に増感剤等を添加してなるプライマーヲ塗布したポ
リエステルフィルム等のフィルる。Further, the photosensitive resin layer 1 is coated on top of the photosensitive resin layer 1. Known photosensitive resins include unsaturated polyester and acrylic monomer, polyamide copolymer, polyurethane and acrylic monomer, polyvinyl alcohol and acrylic monomer,
Monomers, oligomers or prepolymers such as alcohol-soluble polyamide and acrylic monomer, polyvinylpyrroli F7 and acrylic monomer, synthetic rubber and acrylic monomer can be used, and as a photopolymerization initiator hydroquinone, benzoin, anthraquinone, benzoin methyl ether, benzoin ethyl Ether or the like is used as a stabilizer, with the appropriate addition of P-phereamine, P-methoxyphenol, etc., and for example, the resin is held in a bucket and applied to a uniform thickness on the cover film using a squeegee. Preferably, the resin is applied to a thickness of 0.55 to α6xaK by placing the resin on the cover film and pressing it from above and below with a flat surface plate to obtain a uniform thickness.
I can do it. Next, on the photosensitive resin layer, a polyester film or the like coated with a primer made of JF polyester resin with a sensitizer added thereto is filled as a base material for a photosensitive resin relief plate.
コンタクトスクリーンを介して散乱露光するには、散乱
光源を用いる方法と非散乱光源を用いる方法とがあり、
非散乱光源を用いる方法にはディフーージ、ンシートを
用いて入射光を散乱させる方法若しくはコンタクトスク
リーンの膜面を光源側とすることKよりコンタクトスク
リーンの基材の厚みを利用して入射光を散乱させる方法
等のいずれでもよいが、既存の光源である非散乱光源を
用いて精度のよい散乱露光を確実に行なえる方法として
、コンタクトスクリーンの膜面8を第3図示のごとく光
源側とする方法及び第4図示のごとくコンタクトスクリ
ーンの膜面8は光源の反対側とし、コンタクトスクリー
ンと感光性樹脂凸版との間にディフ、−ジ、ンンー)1
1を介して行なう方法が望ましい。There are two methods for scattering exposure through a contact screen: using a scattering light source and using a non-scattered light source.
Methods using a non-scattered light source include scattering the incident light using a diffuser sheet, or using the thickness of the base material of the contact screen to scatter the incident light. Any method may be used, but as a method that can reliably perform scattering exposure with high precision using an existing non-scattered light source, there are two methods: As shown in Figure 4, the film surface 8 of the contact screen is on the opposite side of the light source, and there is a difference between the contact screen and the photosensitive resin letterpress.
1 is preferable.
上記において、コンタクトスクリーンの基材の厚みを利
用して入射光を散乱させるための必要な該基材の犀みは
100〜200/a であり、又、ディフュージョン
シートは練り込み型、サンドマシト型若しくはエンボス
型のいずれでもよく、厚み100〜200μ攪のものが
使用しうる。In the above, the necessary thickness of the base material of the contact screen to scatter incident light using the thickness of the base material is 100 to 200/a. Any embossed type may be used, and one with a thickness of 100 to 200 μm may be used.
コンタクトスクリーンを介して散乱露光する光源は本質
的には王庭先の光源と同種の波長の光を発するものが使
用でき、例えば、超高圧水銀灯、側圧水銀灯、低比水銀
灯、カーボンアーク、クセノンアーク、メタルハライド
ランプ等及びその他の光源が使用でき、又、露光皺は、
その他の条件によっても異なるが、主露光の0.5〜1
.5倍金目安に適宜調整しうる。The light source used for scattering exposure through the contact screen can be one that emits light of essentially the same wavelength as the light source at the front end, such as an ultra-high pressure mercury lamp, a lateral pressure mercury lamp, a low ratio mercury lamp, a carbon arc, a xenon arc, Metal halide lamps and other light sources can be used, and exposure wrinkles can be
Although it varies depending on other conditions, 0.5 to 1 of the main exposure
.. It can be adjusted as appropriate to the 5x gold standard.
以上のようKしてコンタクトスクリーンを介して散乱露
光することkより、コンタクトスクリーンの光学濃度の
最低部分を通る光はその真下の感光性樹脂凸版の基材に
接する部分の感光性樹脂を硬化させ、コンタクトスクリ
ーンのその他の部分を通る光及び前記し九方法により散
乱し走光は感光性樹脂凸版の基材に接する部分を全域に
わたって硬化させ、しかる後、現像を行なうことKより
。By performing scattering exposure through the contact screen as described above, the light passing through the lowest optical density part of the contact screen hardens the photosensitive resin in the part directly below it that contacts the base material of the photosensitive resin letterpress. The light passing through other parts of the contact screen and the light scattered by the method described above are cured over the entire area of the photosensitive resin letterpress in contact with the substrate, and then developed.
第5図示のごとく図像部9及び主露光によりては露光さ
れない部分、即ち、非画像部にコンタクトスクリーンを
介しての散乱露光IK応じた一線部の高さよりも低い尖
角部10’及び樹脂層12を形成する。As shown in FIG. 5, the icon part 9 and the part that is not exposed during the main exposure, that is, the non-image part, are provided with a pointed part 10' and a resin layer whose height is lower than the height of the line part according to the scattering exposure IK through the contact screen. form 12.
上記における現像は感光性樹脂凸版を構成する感光性樹
脂によっても異なるが、例えば、硼酸ナトリウム等の弱
アルカリ液若しくは水等を用いて、未硬化部を洗浄除去
することKよって行なえる。Although the above development differs depending on the photosensitive resin constituting the photosensitive resin relief printing plate, it can be carried out, for example, by washing and removing the uncured portions using a weak alkaline solution such as sodium borate, water, or the like.
本発明は以上の構成からなり、従って過大な印圧下にお
いても画線部の変形は一線部のみならず。The present invention has the above-mentioned configuration, and therefore, even under excessive printing pressure, deformation of the print area occurs not only in the single line area.
非画線部に形成された硬化樹脂層にも及ぶから変形が吸
収され、過大な印圧の負荷・除去を繰り返しても画線部
が剥落しK<<、特に細かい点や細い線及び細い文字等
の剥落が防止でき、印刷上の支障がないばかりか、従来
よりも細がい、若しくは細い画線部を設けて印刷するこ
とが出来、しがも各工程祉既存の設備、材料を用いて行
なうことができ、工程の増加する煩雑さもないという利
点がある。The deformation is absorbed because it extends to the cured resin layer formed in the non-image area, and even if excessive printing pressure is applied and removed repeatedly, the image area will peel off, especially fine points, thin lines, and fine lines. Not only can characters and other objects be prevented from peeling off and there is no problem with printing, but it is also possible to print with thinner or finer lines than before, and it is possible to use existing equipment and materials for each process. It has the advantage that it can be carried out without increasing the complexity of the process.
以下、本発明を史に具体的に示す実施例を掲げる。Examples that specifically illustrate the present invention are listed below.
実施例
厚み10■のガラス板上にペースの厚み100μ荒 の
ネガチプフィルムを置き、岸み2oμmt7)ホリフロ
ビレンヵバーフィルムでネガチフフィルムを覆い、カバ
ーフィルムの上に不飽和ポリエステル系感光性樹脂を厚
み0.55 IImになるよう塗布し1次に100μm
liの予めポリエステル系ブライマーを塗布してな、る
沓すエステルフィルムヲフライマー面が樹脂に接するよ
うにして載置し、更にその上に厚み200μ票の線数8
5線/1nch のコンタクトスクリーンを膜面が外側
になるよう重ね次に超高圧水銀灯を用いコンタクトスク
リーン膜面側より約30秒間(約69(jmJK相当)
露光し、更に反対−から同様の光諒を用いて約50秒間
(約900 mJに相当)l!光し、以上の露光後、蕗
光済の樹脂と共にポリニスシルフィルムをカバーフィル
ムから剥離し、硼酸ナトリウム1−水溶液にて江浄し、
未使化樹脂を託い落とし、乾燥後。Example: Place a negative film with a thickness of 100 μm on a glass plate with a thickness of 10 μm, cover the negative film with a holiflovirene cover film, and place an unsaturated polyester photosensitive film on the cover film. Apply the resin to a thickness of 0.55 IIm, and then apply the resin to a thickness of 100μm.
After applying a polyester-based brimer in advance, place the ester film so that the ester film is in contact with the resin, and then place a 200μ thick sheet of 8 lines on top of it so that the ester film is in contact with the resin.
Layer the 5-wire/1nch contact screens so that the film side is on the outside, and then use an ultra-high pressure mercury lamp to open the contact screen from the film side for about 30 seconds (approximately 69 (equivalent to JMJK)
Exposure to light, then use the same light from the opposite direction for about 50 seconds (equivalent to about 900 mJ) l! After the above exposure, the polyvarnish film was peeled off from the cover film together with the exposed resin, and cleaned with a 1-aqueous sodium borate solution.
After removing unused resin and drying.
J!に樹脂の硬化を完全にするため、約50秒間の追加
露光を行なった。J! In order to completely cure the resin, additional exposure was performed for about 50 seconds.
得られた刷版をシリンダーにとりつけて印刷を行なった
ところ、50万回印刷を行なっても細かい11ill線
部が剥落することがなかった。When the obtained printing plate was attached to a cylinder and printing was performed, the fine 11ill line portion did not peel off even after 500,000 times of printing.
模式的断面図、第2図は第1図の方法によって製造され
る刷版の模式的断面図、第3図及び#!4図は本発明の
実施態様を示す模式的断面図、第5図は第3図若しくt
j、第4図の示す方法により製造される刷版の模式的断
面図である。A schematic sectional view, FIG. 2 is a schematic sectional view of a printing plate manufactured by the method shown in FIG. 1, FIG. 3, and #! 4 is a schematic sectional view showing an embodiment of the present invention, and FIG. 5 is a schematic cross-sectional view showing an embodiment of the present invention.
j, is a schematic cross-sectional view of a printing plate manufactured by the method shown in FIG. 4;
1・・・・・・・・・カラス板
2・・・・・・・・・ネガテプ
3・・・・・・・・・透明フィルム
4・・・・・・・・・感光性樹脂層
5・・・・・・・・・透明フィルム
6・・・・・・・・・コンタクトスクリーン7・・・・
・・・・・ガラス板
9・・・・・・・・・画線部
10、10’・・・尖角部
11・・・・・・・・・ディフュージョンシート12・
・・・・・・・・硬化樹脂層
牙1図
才2図
牙3図
牙4図
牙δ図1...... Glass plate 2... Negatep 3... Transparent film 4... Photosensitive resin layer 5 ......Transparent film 6...Contact screen 7...
...Glass plate 9... Image area 10, 10'... Pointed corner part 11... Diffusion sheet 12.
・・・・・・・・・Hardened resin layer Fang 1 Fig. 2 Fig. 2 Fang 3 Fig. Fang 4 Fig. Fang δ
Claims (1)
散乱露光することにより、非画線部に画線部の46さよ
りも低い尖角部及び硬化樹脂層を形成することを特徴と
する感光性樹脂凸版の刷中 版製造方法。 (2) fi 乱麺光はコンタクトスクリーンの狭面を
先遣方法。 (3)散乱露光は光透過性基材とコンタクトスクリーン
との間にディフェージ冒ンシートを配置して行ない、コ
ンタクトスクリーンの膜面はディフュージョンシート側
に密書させることを特徴[Claims] 0) Forming a sharp edge portion and a cured resin layer in the non-image area with a height lower than 46 mm in the image area by performing scattering exposure from the light-transmitting substrate side through a contact screen. A method for producing a printing plate for a photosensitive resin letterpress plate, characterized by the following. (2) fi Ranmen Hikari uses the narrow side of the contact screen as an advance method. (3) The scattering exposure is performed by placing a diffusion sheet between the light-transmitting substrate and the contact screen, and the film surface of the contact screen is covered with the diffusion sheet side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56148706A JPS5850541A (en) | 1981-09-22 | 1981-09-22 | Manufacture of printing plate of photosensitive resin relief printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56148706A JPS5850541A (en) | 1981-09-22 | 1981-09-22 | Manufacture of printing plate of photosensitive resin relief printing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5850541A true JPS5850541A (en) | 1983-03-25 |
JPH0233142B2 JPH0233142B2 (en) | 1990-07-25 |
Family
ID=15458769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56148706A Granted JPS5850541A (en) | 1981-09-22 | 1981-09-22 | Manufacture of printing plate of photosensitive resin relief printing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5850541A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006162886A (en) * | 2004-12-06 | 2006-06-22 | Fujikura Ltd | Method for forming permanent resist layer |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52120002A (en) * | 1976-03-31 | 1977-10-08 | Asahi Chemical Ind | New printing plate making method |
JPS53115304A (en) * | 1977-05-13 | 1978-10-07 | Toppan Printing Co Ltd | Halftone gravure engraving method |
-
1981
- 1981-09-22 JP JP56148706A patent/JPS5850541A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52120002A (en) * | 1976-03-31 | 1977-10-08 | Asahi Chemical Ind | New printing plate making method |
JPS53115304A (en) * | 1977-05-13 | 1978-10-07 | Toppan Printing Co Ltd | Halftone gravure engraving method |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006162886A (en) * | 2004-12-06 | 2006-06-22 | Fujikura Ltd | Method for forming permanent resist layer |
JP4486872B2 (en) * | 2004-12-06 | 2010-06-23 | 株式会社フジクラ | Method for manufacturing printed wiring board |
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JPH0233142B2 (en) | 1990-07-25 |
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