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JPS57156067A - Resist coater - Google Patents

Resist coater

Info

Publication number
JPS57156067A
JPS57156067A JP4029581A JP4029581A JPS57156067A JP S57156067 A JPS57156067 A JP S57156067A JP 4029581 A JP4029581 A JP 4029581A JP 4029581 A JP4029581 A JP 4029581A JP S57156067 A JPS57156067 A JP S57156067A
Authority
JP
Japan
Prior art keywords
resist
wafer
cup
stuck
circumferential edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4029581A
Other languages
Japanese (ja)
Inventor
Hiroshi Maejima
Hiroto Nagatomo
Susumu Nanko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4029581A priority Critical patent/JPS57156067A/en
Publication of JPS57156067A publication Critical patent/JPS57156067A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent the decrease in the yield owing to production of dust by resist in a device for coating and developing resist on wafers on a rotary susceptor by providing a means of removing the resist stuck on the circumferential edge part of the wafer.
CONSTITUTION: In a resist coater consisting of upper and lower cups 10, 12, a wafer 14 which is a semiconductor substrate is placed on a spin head 16 having a vacuum chucking function on a revolving shaft 18 penetrating through the cup 12. Resist 24 is supplied through a resist supply nozzle 22 above the wafer. An oscillating lever 28 is fitted with a fitting bracket 26 to the inside surface near the central part of the cup 10 oscillatably in arrow directions, and a roller 30 having porous structure is fitted rotatably to the front side of the leading end of the lever 38, whereby the resist stuck on the circumferential edge part is removed.
COPYRIGHT: (C)1982,JPO&Japio
JP4029581A 1981-03-23 1981-03-23 Resist coater Pending JPS57156067A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4029581A JPS57156067A (en) 1981-03-23 1981-03-23 Resist coater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4029581A JPS57156067A (en) 1981-03-23 1981-03-23 Resist coater

Publications (1)

Publication Number Publication Date
JPS57156067A true JPS57156067A (en) 1982-09-27

Family

ID=12576611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4029581A Pending JPS57156067A (en) 1981-03-23 1981-03-23 Resist coater

Country Status (1)

Country Link
JP (1) JPS57156067A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6369564A (en) * 1986-09-10 1988-03-29 Dainippon Screen Mfg Co Ltd Spin coater for substrate
US4738229A (en) * 1984-12-10 1988-04-19 Toyota Jidosha Kabushiki Kaisha Internal combustion engine air intake system with variable effective length
JP2006332185A (en) * 2005-05-24 2006-12-07 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337706A (en) * 1976-09-18 1978-04-07 Nisshin Oil Mills Ltd:The Production of fatty acids
JPS5512750A (en) * 1978-07-12 1980-01-29 Mitsubishi Electric Corp Resist application device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337706A (en) * 1976-09-18 1978-04-07 Nisshin Oil Mills Ltd:The Production of fatty acids
JPS5512750A (en) * 1978-07-12 1980-01-29 Mitsubishi Electric Corp Resist application device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4738229A (en) * 1984-12-10 1988-04-19 Toyota Jidosha Kabushiki Kaisha Internal combustion engine air intake system with variable effective length
JPS6369564A (en) * 1986-09-10 1988-03-29 Dainippon Screen Mfg Co Ltd Spin coater for substrate
JPH0468027B2 (en) * 1986-09-10 1992-10-30 Dainippon Screen Mfg
JP2006332185A (en) * 2005-05-24 2006-12-07 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method

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