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JPS5727168A - Equipment for wet treatment - Google Patents

Equipment for wet treatment

Info

Publication number
JPS5727168A
JPS5727168A JP10250680A JP10250680A JPS5727168A JP S5727168 A JPS5727168 A JP S5727168A JP 10250680 A JP10250680 A JP 10250680A JP 10250680 A JP10250680 A JP 10250680A JP S5727168 A JPS5727168 A JP S5727168A
Authority
JP
Japan
Prior art keywords
substrate
porous material
liquid
liquid medicine
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10250680A
Other languages
Japanese (ja)
Other versions
JPS6238034B2 (en
Inventor
Hideyuki Hirose
Tomoaki Tsuboka
Masayasu Tsunematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10250680A priority Critical patent/JPS5727168A/en
Publication of JPS5727168A publication Critical patent/JPS5727168A/en
Publication of JPS6238034B2 publication Critical patent/JPS6238034B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Nozzles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To perform high quality wet treatments on the surface of substrates on which a film having a weak mechanical strength is formed, by making the discharge port of nozzles which supply liquid medicines upon the substrate, with a porous material.
CONSTITUTION: A slit 8b is installed on the bottom surface of the main body of a nozzle 8, and a porous material 9 is fixed to the surface so that the porous material 9 will cover the slit 8b. This porous material 9 is positioned near a substrate 1 and a liquid medicine 3 is supplied to the main body of the nozzle 8 from the liquid medicine supplying port of the main body of nozzle 8 while a vacuum chuck 5 is being rotated at a low speed. The liquid medicine 3 flows out from the porous material 9 and adheres on the surface of the substrate 1 because of the surface tension. Then, a liquid film standing up as a lense is formed on the whole surface of the substrate 1 and the wet treatment is performed. When the liquid medicine 3 becomes old, the old liquid is discharged to the outside of the substrate 1 with a centrifugal force, and the film of the liquid medicine 3 formed on the substrate 1 is always replaced with new liquid under a quiet condition.
COPYRIGHT: (C)1982,JPO&Japio
JP10250680A 1980-07-28 1980-07-28 Equipment for wet treatment Granted JPS5727168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10250680A JPS5727168A (en) 1980-07-28 1980-07-28 Equipment for wet treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10250680A JPS5727168A (en) 1980-07-28 1980-07-28 Equipment for wet treatment

Publications (2)

Publication Number Publication Date
JPS5727168A true JPS5727168A (en) 1982-02-13
JPS6238034B2 JPS6238034B2 (en) 1987-08-15

Family

ID=14329278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10250680A Granted JPS5727168A (en) 1980-07-28 1980-07-28 Equipment for wet treatment

Country Status (1)

Country Link
JP (1) JPS5727168A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method
JPS59112872A (en) * 1982-12-16 1984-06-29 Matsushita Electric Ind Co Ltd Rotary coater
JPS59145525A (en) * 1983-02-09 1984-08-21 Matsushita Electronics Corp Resist development
JPS59154361U (en) * 1983-04-04 1984-10-16 三菱レイヨン株式会社 Coating device
JPS61104825A (en) * 1984-10-29 1986-05-23 Akira Nakajima Device for integrating continuous plastic filament
JPS63260040A (en) * 1987-04-16 1988-10-27 Yamaguchi Nippon Denki Kk Fixing of semiconductor element
US4838289A (en) * 1982-08-03 1989-06-13 Texas Instruments Incorporated Apparatus and method for edge cleaning
JPH01253235A (en) * 1988-03-31 1989-10-09 Sigma Gijutsu Kogyo Kk Method and device for substrate treatment
EP1610363A1 (en) * 2003-04-01 2005-12-28 Tokyo Electron Limited Method of heat treatment and heat treatment apparatus
JP2012142425A (en) * 2010-12-28 2012-07-26 Tdk Corp Slurry supply device and coating device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method
US4838289A (en) * 1982-08-03 1989-06-13 Texas Instruments Incorporated Apparatus and method for edge cleaning
JPS59112872A (en) * 1982-12-16 1984-06-29 Matsushita Electric Ind Co Ltd Rotary coater
JPS59145525A (en) * 1983-02-09 1984-08-21 Matsushita Electronics Corp Resist development
JPH0144011B2 (en) * 1983-02-09 1989-09-25 Matsushita Electronics Corp
JPS59154361U (en) * 1983-04-04 1984-10-16 三菱レイヨン株式会社 Coating device
JPS61104825A (en) * 1984-10-29 1986-05-23 Akira Nakajima Device for integrating continuous plastic filament
JPS63260040A (en) * 1987-04-16 1988-10-27 Yamaguchi Nippon Denki Kk Fixing of semiconductor element
JPH01253235A (en) * 1988-03-31 1989-10-09 Sigma Gijutsu Kogyo Kk Method and device for substrate treatment
EP1610363A1 (en) * 2003-04-01 2005-12-28 Tokyo Electron Limited Method of heat treatment and heat treatment apparatus
EP1610363A4 (en) * 2003-04-01 2008-05-14 Tokyo Electron Ltd Method of heat treatment and heat treatment apparatus
US7537448B2 (en) 2003-04-01 2009-05-26 Tokyo Electron Limited Thermal processing method and thermal processing unit
JP2012142425A (en) * 2010-12-28 2012-07-26 Tdk Corp Slurry supply device and coating device

Also Published As

Publication number Publication date
JPS6238034B2 (en) 1987-08-15

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