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JPS57136321A - Manufacture of resist stencil mask for lift-off - Google Patents

Manufacture of resist stencil mask for lift-off

Info

Publication number
JPS57136321A
JPS57136321A JP56021542A JP2154281A JPS57136321A JP S57136321 A JPS57136321 A JP S57136321A JP 56021542 A JP56021542 A JP 56021542A JP 2154281 A JP2154281 A JP 2154281A JP S57136321 A JPS57136321 A JP S57136321A
Authority
JP
Japan
Prior art keywords
resist
lift
pattern
stencil mask
onto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56021542A
Other languages
Japanese (ja)
Other versions
JPH0145218B2 (en
Inventor
Koji Yamada
Hiroyuki Mori
Mikio Hirano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56021542A priority Critical patent/JPS57136321A/en
Publication of JPS57136321A publication Critical patent/JPS57136321A/en
Publication of JPH0145218B2 publication Critical patent/JPH0145218B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

PURPOSE:To form a resist pattern stably even at a low temperature by shaping an Al layer onto a substrate through evaporation and manufacturing the resist stencil mask on the Al layer as a mask for the lift-off. CONSTITUTION:Al 23 is formed onto insulating film SiO 22 shaped onto the semiconductor substrate 21 in the thickness of 10-200Angstrom through vacuum evaporation. The Al is spin-coated with an Az1350J resist 24, and the surface is pre- baked at the low temperature of 70 deg.C. The surface is exposed by the pattern, immersed in a chlorbenzene liquid for ten min., and developed. Accordingly, the closely adhesive property of the Al 23 and the Az1350J resist film 24 can be improved remarkably, and the minute pattern can stably be formed even in a low- temperature process.
JP56021542A 1981-02-18 1981-02-18 Manufacture of resist stencil mask for lift-off Granted JPS57136321A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56021542A JPS57136321A (en) 1981-02-18 1981-02-18 Manufacture of resist stencil mask for lift-off

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56021542A JPS57136321A (en) 1981-02-18 1981-02-18 Manufacture of resist stencil mask for lift-off

Publications (2)

Publication Number Publication Date
JPS57136321A true JPS57136321A (en) 1982-08-23
JPH0145218B2 JPH0145218B2 (en) 1989-10-03

Family

ID=12057860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56021542A Granted JPS57136321A (en) 1981-02-18 1981-02-18 Manufacture of resist stencil mask for lift-off

Country Status (1)

Country Link
JP (1) JPS57136321A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60130183A (en) * 1983-12-19 1985-07-11 Agency Of Ind Science & Technol Resist stencil mask for manufacturing josephson ic
JPH0294807A (en) * 1988-09-30 1990-04-05 Mitsubishi Mining & Cement Co Ltd Manufacture of surface acoustic wave device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5158072A (en) * 1974-11-18 1976-05-21 Matsushita Electric Ind Co Ltd HANDOTAISOCHINOSEIZOHOHO
JPS5330799A (en) * 1976-09-01 1978-03-23 Fujitsu Ltd Resist exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5158072A (en) * 1974-11-18 1976-05-21 Matsushita Electric Ind Co Ltd HANDOTAISOCHINOSEIZOHOHO
JPS5330799A (en) * 1976-09-01 1978-03-23 Fujitsu Ltd Resist exposure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60130183A (en) * 1983-12-19 1985-07-11 Agency Of Ind Science & Technol Resist stencil mask for manufacturing josephson ic
JPH0526358B2 (en) * 1983-12-19 1993-04-15 Kogyo Gijutsuin
JPH0294807A (en) * 1988-09-30 1990-04-05 Mitsubishi Mining & Cement Co Ltd Manufacture of surface acoustic wave device
JPH0524684B2 (en) * 1988-09-30 1993-04-08 Mitsubishi Materials Corp

Also Published As

Publication number Publication date
JPH0145218B2 (en) 1989-10-03

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