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JPS5694517A - Manufacture for thin film head - Google Patents

Manufacture for thin film head

Info

Publication number
JPS5694517A
JPS5694517A JP17201779A JP17201779A JPS5694517A JP S5694517 A JPS5694517 A JP S5694517A JP 17201779 A JP17201779 A JP 17201779A JP 17201779 A JP17201779 A JP 17201779A JP S5694517 A JPS5694517 A JP S5694517A
Authority
JP
Japan
Prior art keywords
film
etching
coil
gap
gap length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17201779A
Other languages
Japanese (ja)
Inventor
Kazuhiko Amemori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17201779A priority Critical patent/JPS5694517A/en
Publication of JPS5694517A publication Critical patent/JPS5694517A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)

Abstract

PURPOSE: To form desired gap length suitable for high density recording easily with high accuracy, by increasing the electromagnetic conversion efficiency through multilayer construction for coil use conductive film.
CONSTITUTION: After a lower magnetic substance 2 is formed to a glass base 1 and an isolation film 3 is formed, a conductive film 8 for coil is formed on the film 3. In forming a conductive film 8 for coil, a conductor film 21 for etching end marker made of aluminum is formed on the insulation film 3 other than said conductor film 8 at the same time. While the insulating film corresponding to the desired gap length is formed on the gap forming section on the conductor film 21, a shutter 22 is fitted to this part to avoide the formation of insulation film for further lamination. The formation of gap is made by etching. When etching progresses, the conductor film 21 is foamed and changed visually, then if the etching is stopped in this case, the gap with desired gap length can be formed.
COPYRIGHT: (C)1981,JPO&Japio
JP17201779A 1979-12-27 1979-12-27 Manufacture for thin film head Pending JPS5694517A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17201779A JPS5694517A (en) 1979-12-27 1979-12-27 Manufacture for thin film head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17201779A JPS5694517A (en) 1979-12-27 1979-12-27 Manufacture for thin film head

Publications (1)

Publication Number Publication Date
JPS5694517A true JPS5694517A (en) 1981-07-31

Family

ID=15933973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17201779A Pending JPS5694517A (en) 1979-12-27 1979-12-27 Manufacture for thin film head

Country Status (1)

Country Link
JP (1) JPS5694517A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62219216A (en) * 1986-03-19 1987-09-26 Hitachi Ltd Thin film magnetic head and its production
JPH01118209A (en) * 1987-10-30 1989-05-10 Matsushita Electric Ind Co Ltd Production of thin film magnetic head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62219216A (en) * 1986-03-19 1987-09-26 Hitachi Ltd Thin film magnetic head and its production
JPH01118209A (en) * 1987-10-30 1989-05-10 Matsushita Electric Ind Co Ltd Production of thin film magnetic head

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