[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JPS5630771A - Manufacture of photoreceptor - Google Patents

Manufacture of photoreceptor

Info

Publication number
JPS5630771A
JPS5630771A JP10635579A JP10635579A JPS5630771A JP S5630771 A JPS5630771 A JP S5630771A JP 10635579 A JP10635579 A JP 10635579A JP 10635579 A JP10635579 A JP 10635579A JP S5630771 A JPS5630771 A JP S5630771A
Authority
JP
Japan
Prior art keywords
film
electrode
znse
substrate
upper electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10635579A
Other languages
Japanese (ja)
Inventor
Takuo Shibata
Kazufumi Ogawa
Takao Chikamura
Yutaka Miyata
Shinji Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10635579A priority Critical patent/JPS5630771A/en
Publication of JPS5630771A publication Critical patent/JPS5630771A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/222Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN heterojunction

Landscapes

  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To recover the increase of a dark current in a photoreceptor by forming an electrode on a substrate, coating ZnSe, ZnCd or the like thereon as a film, further coating an alloy film made of Zn, Cd, In, Te or the like thereon, etching it, heat treating it, and mounting an upper electrode thereon. CONSTITUTION:An electrode 2 is formed on a substrate 1 made of glass or the like, and the first film 3 made of ZnSe, ZnS, CdS, ZnTe, CdSe, ZnCd or the like is coated thereon. Then, an alloy film 4 of (ZnCdTe)(InTe) containing Zn, Cd, In, Te as main ingredients is coated thereon, unnecessary portion is physically or chemically etched and removed, is heat treated at 500-600 deg.C, and an upper electrode 5 is mounted on the film 4. Or, an electrode 2' is formed on an Si substrate 1', ZnSe film 3', CdTe film 4a', (ZnTe)(InTe) alloy film 4b' are laminated thereon, is similarly treated to the above, and an upper electrode 5' is then mounted thereon. The heat treatment is thus excuted after the etching in said manner, and the reduction in a light current can be consequently recovered.
JP10635579A 1979-08-20 1979-08-20 Manufacture of photoreceptor Pending JPS5630771A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10635579A JPS5630771A (en) 1979-08-20 1979-08-20 Manufacture of photoreceptor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10635579A JPS5630771A (en) 1979-08-20 1979-08-20 Manufacture of photoreceptor

Publications (1)

Publication Number Publication Date
JPS5630771A true JPS5630771A (en) 1981-03-27

Family

ID=14431450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10635579A Pending JPS5630771A (en) 1979-08-20 1979-08-20 Manufacture of photoreceptor

Country Status (1)

Country Link
JP (1) JPS5630771A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002093654A1 (en) * 2001-05-15 2002-11-21 Acrorad Co.,Ltd. Semiconductor radiation detecting element

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002093654A1 (en) * 2001-05-15 2002-11-21 Acrorad Co.,Ltd. Semiconductor radiation detecting element
JP2002344000A (en) * 2001-05-15 2002-11-29 Acrorad Co Ltd Semiconductor radiation detector
US6975012B2 (en) 2001-05-15 2005-12-13 Acrorad Co., Ltd. Semiconductor radiation detector having voltage application means comprises InxCdyTez on CdTe semiconductor substrate

Similar Documents

Publication Publication Date Title
SE9403609L (en) Process for making thin film solar cells
JPS5630771A (en) Manufacture of photoreceptor
EP0060487A1 (en) Plugged pinhole thin film and method of making same
JPS57166083A (en) Thin film type photoelectric conversion element
JPS56167240A (en) Photoelectric converter
JPS5788044A (en) Manufacture of glass mask
JPS57147634A (en) Photomask blank
JPS5766677A (en) Solar battery cell and manufacture thereof
JPS5421272A (en) Metal photo mask
JPS5728329A (en) Manufacturing method of semiconductor
JPS56116034A (en) Photomask
JPS57105739A (en) Production of mask
JPS57113233A (en) Manufacture of semiconductor device
JPS54143646A (en) Photosensitive plate for electrophotography
JPS57161836A (en) Manufacture of liquid-crystal cell substrate having patterned orientation-treated film
JPS5745289A (en) Production of multidimentional semiconductor device
JPS54126557A (en) Electrochromic display element
JPS5498586A (en) Photo conductive element
JPS5618340A (en) Manufacture of pickup tube target
JPS57122439A (en) Optical mask
JPS56161640A (en) Semiconductor diffusion method
JPS551152A (en) Method of fabricating photoconducting element
JPS6488549A (en) Photomask
JPS56296A (en) Production of watch or clock dial plate
JPS577044A (en) Manufacture of target for image pickup tube