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JPS56163265A - Vapor depositing apparatus - Google Patents

Vapor depositing apparatus

Info

Publication number
JPS56163265A
JPS56163265A JP6612680A JP6612680A JPS56163265A JP S56163265 A JPS56163265 A JP S56163265A JP 6612680 A JP6612680 A JP 6612680A JP 6612680 A JP6612680 A JP 6612680A JP S56163265 A JPS56163265 A JP S56163265A
Authority
JP
Japan
Prior art keywords
crucible
electron beams
depositing
vapor
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6612680A
Other languages
Japanese (ja)
Other versions
JPS5910992B2 (en
Inventor
Shigeru Kanbara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Toyo Electronics Industry Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd, Toyo Electronics Industry Corp filed Critical Rohm Co Ltd
Priority to JP6612680A priority Critical patent/JPS5910992B2/en
Publication of JPS56163265A publication Critical patent/JPS56163265A/en
Publication of JPS5910992B2 publication Critical patent/JPS5910992B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To perform assured vapor deposition at a controlled vapor depositing speed by projecting electron beams on a part of a crucible made of high m.p. material to heat the crucible and melting and evaporating a depositing material in the crucible by the temp. rise. CONSTITUTION:Electron beams emitted from a filament 4 are defected by the magnetic field of a coil 7 in a base frame 1, and they fly toward the position of a crucible 2 set like the arrows. The crucible 2 is used as an anode, and high voltage is applied between the crucible 2 and the filament 4. When a depositing material 3 has low electric conductivity, electron beams do not directly hit the material 3 and hit the edge of the curcible 2. When the material 3 is sublimable with a little energy, the beams are projected on the edge of the crucible 2. Since the crucible 2 is made of material having a higher m.p. than copper, it is heated to a high temp. without melting, and the material 3 is melted and evaporated by the heat. The vapor is then deposited on a body to be deposited.
JP6612680A 1980-05-19 1980-05-19 Vapor deposition equipment Expired JPS5910992B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6612680A JPS5910992B2 (en) 1980-05-19 1980-05-19 Vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6612680A JPS5910992B2 (en) 1980-05-19 1980-05-19 Vapor deposition equipment

Publications (2)

Publication Number Publication Date
JPS56163265A true JPS56163265A (en) 1981-12-15
JPS5910992B2 JPS5910992B2 (en) 1984-03-13

Family

ID=13306860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6612680A Expired JPS5910992B2 (en) 1980-05-19 1980-05-19 Vapor deposition equipment

Country Status (1)

Country Link
JP (1) JPS5910992B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6347361A (en) * 1986-08-15 1988-02-29 Toobi:Kk Evaporation device for ion plating
JPS63149961U (en) * 1987-02-19 1988-10-03
JPS6468470A (en) * 1987-09-09 1989-03-14 Ulvac Seimaku Plasma electron beam heating source
WO2022058437A1 (en) * 2020-09-17 2022-03-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Apparatus and method for separating hard carbon layers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6347361A (en) * 1986-08-15 1988-02-29 Toobi:Kk Evaporation device for ion plating
JPS63149961U (en) * 1987-02-19 1988-10-03
JPS6468470A (en) * 1987-09-09 1989-03-14 Ulvac Seimaku Plasma electron beam heating source
WO2022058437A1 (en) * 2020-09-17 2022-03-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Apparatus and method for separating hard carbon layers

Also Published As

Publication number Publication date
JPS5910992B2 (en) 1984-03-13

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