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JPS56163265A - Vapor depositing apparatus - Google Patents

Vapor depositing apparatus

Info

Publication number
JPS56163265A
JPS56163265A JP6612680A JP6612680A JPS56163265A JP S56163265 A JPS56163265 A JP S56163265A JP 6612680 A JP6612680 A JP 6612680A JP 6612680 A JP6612680 A JP 6612680A JP S56163265 A JPS56163265 A JP S56163265A
Authority
JP
Japan
Prior art keywords
crucible
electron beams
depositing
vapor
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6612680A
Other languages
English (en)
Other versions
JPS5910992B2 (ja
Inventor
Shigeru Kanbara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Toyo Electronics Industry Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd, Toyo Electronics Industry Corp filed Critical Rohm Co Ltd
Priority to JP6612680A priority Critical patent/JPS5910992B2/ja
Publication of JPS56163265A publication Critical patent/JPS56163265A/ja
Publication of JPS5910992B2 publication Critical patent/JPS5910992B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6612680A 1980-05-19 1980-05-19 蒸着装置 Expired JPS5910992B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6612680A JPS5910992B2 (ja) 1980-05-19 1980-05-19 蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6612680A JPS5910992B2 (ja) 1980-05-19 1980-05-19 蒸着装置

Publications (2)

Publication Number Publication Date
JPS56163265A true JPS56163265A (en) 1981-12-15
JPS5910992B2 JPS5910992B2 (ja) 1984-03-13

Family

ID=13306860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6612680A Expired JPS5910992B2 (ja) 1980-05-19 1980-05-19 蒸着装置

Country Status (1)

Country Link
JP (1) JPS5910992B2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6347361A (ja) * 1986-08-15 1988-02-29 Toobi:Kk イオンプレ−テイング蒸発装置
JPS63149961U (ja) * 1987-02-19 1988-10-03
JPS6468470A (en) * 1987-09-09 1989-03-14 Ulvac Seimaku Plasma electron beam heating source
WO2022058437A1 (de) * 2020-09-17 2022-03-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Vorrichtung und verfahren zum abscheiden harter kohlenstoffschichten

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6347361A (ja) * 1986-08-15 1988-02-29 Toobi:Kk イオンプレ−テイング蒸発装置
JPS63149961U (ja) * 1987-02-19 1988-10-03
JPS6468470A (en) * 1987-09-09 1989-03-14 Ulvac Seimaku Plasma electron beam heating source
WO2022058437A1 (de) * 2020-09-17 2022-03-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Vorrichtung und verfahren zum abscheiden harter kohlenstoffschichten

Also Published As

Publication number Publication date
JPS5910992B2 (ja) 1984-03-13

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