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JPS5616690A - Chromium plating method - Google Patents

Chromium plating method

Info

Publication number
JPS5616690A
JPS5616690A JP9121379A JP9121379A JPS5616690A JP S5616690 A JPS5616690 A JP S5616690A JP 9121379 A JP9121379 A JP 9121379A JP 9121379 A JP9121379 A JP 9121379A JP S5616690 A JPS5616690 A JP S5616690A
Authority
JP
Japan
Prior art keywords
controlling
plating bath
concentration
sulfuric acid
trivalent chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9121379A
Other languages
Japanese (ja)
Inventor
Tetsuya Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP9121379A priority Critical patent/JPS5616690A/en
Publication of JPS5616690A publication Critical patent/JPS5616690A/en
Pending legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE: To enable to use the ferrite electrode for anode, by controlling the quantity of trivalent chromium produced in plating bath by controlling each concentration of chromic anhydride, sodium silicofluoride and sulfuric acid in the plating bath.
CONSTITUTION: Quantity of trivalent chromium produced in plating path by electrolytic reaction, is controlled by controlling each concentration of chromic anhydride, sodium silicofluoride and sulfuric acid in the plating bath, on occasion of using the ferrite electrode as the anode material. On this occasion, the quantity of the trivalent chromium can be remarkably decreased by controlling the concentration of chromic anhydride at about ≤150g/l and tht of sodium silicofluoride and sulfuric acid at about ≤1g/l in the plating bath.
COPYRIGHT: (C)1981,JPO&Japio
JP9121379A 1979-07-17 1979-07-17 Chromium plating method Pending JPS5616690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9121379A JPS5616690A (en) 1979-07-17 1979-07-17 Chromium plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9121379A JPS5616690A (en) 1979-07-17 1979-07-17 Chromium plating method

Publications (1)

Publication Number Publication Date
JPS5616690A true JPS5616690A (en) 1981-02-17

Family

ID=14020136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9121379A Pending JPS5616690A (en) 1979-07-17 1979-07-17 Chromium plating method

Country Status (1)

Country Link
JP (1) JPS5616690A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03270702A (en) * 1990-03-20 1991-12-02 Smc Corp Filter element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03270702A (en) * 1990-03-20 1991-12-02 Smc Corp Filter element

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