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JPS56152239A - Cleaning and drying device and cartridge used therefor - Google Patents

Cleaning and drying device and cartridge used therefor

Info

Publication number
JPS56152239A
JPS56152239A JP5487080A JP5487080A JPS56152239A JP S56152239 A JPS56152239 A JP S56152239A JP 5487080 A JP5487080 A JP 5487080A JP 5487080 A JP5487080 A JP 5487080A JP S56152239 A JPS56152239 A JP S56152239A
Authority
JP
Japan
Prior art keywords
plate
cleaning
jet holes
conveying
conveyor belt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5487080A
Other languages
Japanese (ja)
Other versions
JPS6028385B2 (en
Inventor
Yoshiaki Minegishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KURESEN SANGYO KK
Original Assignee
KURESEN SANGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KURESEN SANGYO KK filed Critical KURESEN SANGYO KK
Priority to JP55054870A priority Critical patent/JPS6028385B2/en
Publication of JPS56152239A publication Critical patent/JPS56152239A/en
Publication of JPS6028385B2 publication Critical patent/JPS6028385B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To automate cleaning and drying steps in a consistent basis by forming a V-shaped groove perpendicularly crossing with the conveying direction at the top of a conveyor belt for carrying an erected plate and forming a pair of guide members having jet holes at both tip sides of the plate. CONSTITUTION:A rectangular stepped part 38 perpendicularly crossing with the conveying direction is formed on the top surface of a conveyor belt 37 for conveying an erected plate 11 such as a photomask for manufacturing a semiconductor, a reticle, a wafer or the like, V-shaped grooves 39 are formed on the conveying route surface A-A of the plate, a pair of guide members 13 having jet holes 35 are arranged in parallel at both top sides of the plate, and pure water or clean air is injected from the jet holes to perform the cleaning or the drying. Since the cleaning and the drying steps can be thus automated thoroughly and the overall plate can be simultaneously treated, the treating time can be largely shortened.
JP55054870A 1980-04-26 1980-04-26 washing drying equipment Expired JPS6028385B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55054870A JPS6028385B2 (en) 1980-04-26 1980-04-26 washing drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55054870A JPS6028385B2 (en) 1980-04-26 1980-04-26 washing drying equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP10236784A Division JPS6012736A (en) 1984-05-21 1984-05-21 Cartridge mainly used for cleaning or drying device

Publications (2)

Publication Number Publication Date
JPS56152239A true JPS56152239A (en) 1981-11-25
JPS6028385B2 JPS6028385B2 (en) 1985-07-04

Family

ID=12982613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55054870A Expired JPS6028385B2 (en) 1980-04-26 1980-04-26 washing drying equipment

Country Status (1)

Country Link
JP (1) JPS6028385B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506687A (en) * 1982-06-10 1985-03-26 Circuit Services Corporation Printed circuit processing apparatus
JPS61183185U (en) * 1985-05-09 1986-11-15
US5718763A (en) * 1994-04-04 1998-02-17 Tokyo Electron Limited Resist processing apparatus for a rectangular substrate
US5751307A (en) * 1994-04-12 1998-05-12 Moore Business Forms, Inc. Print cartridge cleaning apparatus and method using water and air
JP2004174308A (en) * 2002-11-25 2004-06-24 Kawaju Plant Kk Sheet material washing equipment
JP2009105447A (en) * 2009-02-09 2009-05-14 Kawasaki Plant Systems Ltd Plate material washing equipment and its high pressure solution spray washing apparatus
KR101065329B1 (en) * 2009-03-24 2011-09-16 세메스 주식회사 Apparatus for transferring a substrate and apparatus for cleaning a substrates having the same
CN110694991A (en) * 2019-10-22 2020-01-17 长江存储科技有限责任公司 Wafer cleaning device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108405425B (en) * 2018-03-12 2021-03-02 西安交通大学医学院第二附属医院 Orthopedics machinery washs structure with disinfection function
CN108480278B (en) * 2018-04-11 2021-05-18 绍兴文理学院 Rotary type washing equipment for photovoltaic silicon wafers

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506687A (en) * 1982-06-10 1985-03-26 Circuit Services Corporation Printed circuit processing apparatus
JPS61183185U (en) * 1985-05-09 1986-11-15
US5718763A (en) * 1994-04-04 1998-02-17 Tokyo Electron Limited Resist processing apparatus for a rectangular substrate
US5853803A (en) * 1994-04-04 1998-12-29 Tokyo Electron Limited Resist processing method and apparatus
US5751307A (en) * 1994-04-12 1998-05-12 Moore Business Forms, Inc. Print cartridge cleaning apparatus and method using water and air
JP2004174308A (en) * 2002-11-25 2004-06-24 Kawaju Plant Kk Sheet material washing equipment
JP2009105447A (en) * 2009-02-09 2009-05-14 Kawasaki Plant Systems Ltd Plate material washing equipment and its high pressure solution spray washing apparatus
JP4606498B2 (en) * 2009-02-09 2011-01-05 カワサキプラントシステムズ株式会社 Board cleaning equipment and high-pressure liquid spray cleaning equipment
KR101065329B1 (en) * 2009-03-24 2011-09-16 세메스 주식회사 Apparatus for transferring a substrate and apparatus for cleaning a substrates having the same
CN110694991A (en) * 2019-10-22 2020-01-17 长江存储科技有限责任公司 Wafer cleaning device

Also Published As

Publication number Publication date
JPS6028385B2 (en) 1985-07-04

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