JPS56121779A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS56121779A JPS56121779A JP2510680A JP2510680A JPS56121779A JP S56121779 A JPS56121779 A JP S56121779A JP 2510680 A JP2510680 A JP 2510680A JP 2510680 A JP2510680 A JP 2510680A JP S56121779 A JPS56121779 A JP S56121779A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- layer
- thermal head
- heating part
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 abstract 6
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 238000005299 abrasion Methods 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Electronic Switches (AREA)
Abstract
PURPOSE: To obtain the thermal head having high efficiency and long lifetime by lessening the sheet resistance value of the heating part (a part held between a pair of opposed electrodes) of a heating resistor at the central part thereof and thereby uniformalizing the distribution of temperature of the heating part.
CONSTITUTION: A pair of electrodes 3 and 4 are provided in opposition to each other on a heating resistor layer 2 provided on an insulated substrate 1 and thereby the heating part 2' is formed between two electrodes, and further thereon an abrasion resisting layer 5 covering the whole surface is provided. In the thermal head thus formed, the sheet resistance value is lessened by attaching a low-resistance layer 6 on the central part between the electrodes 3 and 4 of the abovementioned heating part 2'. In the formation of the aforesaid low-resistance layer 6, the electrodes 3 and 4 are formed conventionally by laminating upper-layer electrodes 3b and 4b of an Au film on lower-layer electrodes 3a and 4a of a Cr film, and on the occassion of formation of the lower-layer electrodes, it is convenient to take a method wherein the low-resistance layer is formed simultaneously and of the same material.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2510680A JPS56121779A (en) | 1980-02-29 | 1980-02-29 | Thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2510680A JPS56121779A (en) | 1980-02-29 | 1980-02-29 | Thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56121779A true JPS56121779A (en) | 1981-09-24 |
Family
ID=12156665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2510680A Pending JPS56121779A (en) | 1980-02-29 | 1980-02-29 | Thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56121779A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013028136A (en) * | 2011-07-29 | 2013-02-07 | Kyocera Corp | Thermal head, and thermal printer having the same |
-
1980
- 1980-02-29 JP JP2510680A patent/JPS56121779A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013028136A (en) * | 2011-07-29 | 2013-02-07 | Kyocera Corp | Thermal head, and thermal printer having the same |
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