JPS5575224A - Annealing furnace - Google Patents
Annealing furnaceInfo
- Publication number
- JPS5575224A JPS5575224A JP14780078A JP14780078A JPS5575224A JP S5575224 A JPS5575224 A JP S5575224A JP 14780078 A JP14780078 A JP 14780078A JP 14780078 A JP14780078 A JP 14780078A JP S5575224 A JPS5575224 A JP S5575224A
- Authority
- JP
- Japan
- Prior art keywords
- discharge lamp
- sectional area
- specimen table
- cross
- length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Vertical, Hearth, Or Arc Furnaces (AREA)
Abstract
PURPOSE: To facilitate the treatment of only a thin film or a surface film such as a silicon wafer and the like, by providing a specimen table, a mirror, and a flashing discharge lamp in a frame body, and specifying the area of the irradiated portion of the specimen table as 12 times or less of the cross-sectional area of the flashing discharge lamp including an arc axis.
CONSTITUTION: In a frame body 3, which is divided into 2 parts, i.e., an upper body 3a and a lower body 3b for the convenience of fabrication and handling; are provided a straight-tubular shaped flashing discharge lamp 1, whose arc length is L and diameter is d; a mirror 2 which covers said lamp; and a specimen table 4 which is located at the bottom. If the length L of the discharge lamp 1 is 160mm and the diameter d thereof is 6mm, L×d=9.6cm2. Then, if the dimensions of the specimen table 4 which is of a long rectangular shape along the length of the arc are 16cm×6cm, the cross-sectional area is 96cm2, which is specified as 12 times or less of the cross-sectional area of 9.6cm2 of the discharge lamp 1. In this constitution, only the temperature of the surface of the specimen can be raised instantaneously. In the case of a silicon wafer, the lattice defects can be removed without changing the density distribution of the impurities.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14780078A JPS5575224A (en) | 1978-12-01 | 1978-12-01 | Annealing furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14780078A JPS5575224A (en) | 1978-12-01 | 1978-12-01 | Annealing furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5575224A true JPS5575224A (en) | 1980-06-06 |
Family
ID=15438492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14780078A Pending JPS5575224A (en) | 1978-12-01 | 1978-12-01 | Annealing furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5575224A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3139712A1 (en) | 1980-10-09 | 1982-05-13 | Ushio Denki K.K., Tokyo | Annealing device |
| JPS57147237A (en) * | 1981-03-06 | 1982-09-11 | Sony Corp | Heat treatment device |
| JP2004536457A (en) * | 2001-07-20 | 2004-12-02 | ウェーハマスターズ・インコーポレイテッド | Flash annealing |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50133532A (en) * | 1974-04-10 | 1975-10-22 | ||
| JPS5334302B2 (en) * | 1972-02-20 | 1978-09-20 |
-
1978
- 1978-12-01 JP JP14780078A patent/JPS5575224A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5334302B2 (en) * | 1972-02-20 | 1978-09-20 | ||
| JPS50133532A (en) * | 1974-04-10 | 1975-10-22 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3139712A1 (en) | 1980-10-09 | 1982-05-13 | Ushio Denki K.K., Tokyo | Annealing device |
| JPS57147237A (en) * | 1981-03-06 | 1982-09-11 | Sony Corp | Heat treatment device |
| JPH0377657B2 (en) * | 1981-03-06 | 1991-12-11 | Sony Corp | |
| JP2004536457A (en) * | 2001-07-20 | 2004-12-02 | ウェーハマスターズ・インコーポレイテッド | Flash annealing |
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