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JPS5557237A - Signal conversion type storage element - Google Patents

Signal conversion type storage element

Info

Publication number
JPS5557237A
JPS5557237A JP13021578A JP13021578A JPS5557237A JP S5557237 A JPS5557237 A JP S5557237A JP 13021578 A JP13021578 A JP 13021578A JP 13021578 A JP13021578 A JP 13021578A JP S5557237 A JPS5557237 A JP S5557237A
Authority
JP
Japan
Prior art keywords
film
sio
storage element
exposured
signal conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13021578A
Other languages
Japanese (ja)
Inventor
Yoichi Murayama
Tadao Shima
Tadashi Hoshiyama
Kozo Ichikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP13021578A priority Critical patent/JPS5557237A/en
Publication of JPS5557237A publication Critical patent/JPS5557237A/en
Pending legal-status Critical Current

Links

Landscapes

  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)

Abstract

PURPOSE: To eliminate the attenuation of storaged electric charges and improve the reading characteristics by removing thin-film part located in the neighbourhood of the storage element.
CONSTITUTION: On all the surface of P-type or N-type silicon substrate 1, SiO2 film is formed by the process of heat-oxidation and on the film, a photoresist film is coated. After baking process, it is covered with a photomask of the requested pattern and exposured. The developing is made and the SiO2 film is exposured partially. The SiO2 isolation film 2 is obtainable as a storage element. The surface of the storage 2 is painted again by a photoresist film and the baking process is performed. Then, by the eying adjusting alignment exposure and the further development, the exposured surface of the substrate 1 and the resist film on the hem part of the element 2 being removed, the etching of SiO2 film is carried out by making the remaining resist film as a mask. Due to this, it can be achieved to enhance the reading performance.
COPYRIGHT: (C)1980,JPO&Japio
JP13021578A 1978-10-23 1978-10-23 Signal conversion type storage element Pending JPS5557237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13021578A JPS5557237A (en) 1978-10-23 1978-10-23 Signal conversion type storage element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13021578A JPS5557237A (en) 1978-10-23 1978-10-23 Signal conversion type storage element

Publications (1)

Publication Number Publication Date
JPS5557237A true JPS5557237A (en) 1980-04-26

Family

ID=15028833

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13021578A Pending JPS5557237A (en) 1978-10-23 1978-10-23 Signal conversion type storage element

Country Status (1)

Country Link
JP (1) JPS5557237A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9334143B2 (en) 2010-07-02 2016-05-10 Gogou Co., Ltd. Manipulation apparatus, and movement apparatus equipped with this manipulation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9334143B2 (en) 2010-07-02 2016-05-10 Gogou Co., Ltd. Manipulation apparatus, and movement apparatus equipped with this manipulation apparatus

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