JPS55158299A - Manufacture of support for lithographic plate - Google Patents
Manufacture of support for lithographic plateInfo
- Publication number
- JPS55158299A JPS55158299A JP6721179A JP6721179A JPS55158299A JP S55158299 A JPS55158299 A JP S55158299A JP 6721179 A JP6721179 A JP 6721179A JP 6721179 A JP6721179 A JP 6721179A JP S55158299 A JPS55158299 A JP S55158299A
- Authority
- JP
- Japan
- Prior art keywords
- aqueous solution
- support
- ampere
- aluminum plate
- sulfuric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
PURPOSE: To obtain the support for lithograph having a uniform minute uneven face, by electrolyzing the aluminum plate in the aqueous solution containing nitric acid at first and next, electroyzing in the aqueous solution of sulfuric acid by alternating current.
CONSTITUTION: Electrolysis, that is, electrolytic etching is carried out in the aqueous solution containing nitric acid by alternating the current at first at the time of manufacturing the support for lithograph making the surface of aluminum plate electrolytically porous. Concentration of nitric acid is about 0.1W4wt%. Temperature of electrolytic bath is about 10W45°C (especially 15W45°C). Further, voltage: 1W50 volt (especially, 2W30volt), current density: 10W80 ampere/dm2 (especially, 10W80 ampere), amount of electricity: 100W30,000 coulomb/dm2 (especially, 100W 18,000 coulomb). Next, alternating current is turned on the aluminum plate in the aqueous solution of sulfuric acid and anode oxidation treatment is carried out. Concentration of sulfuric acid: 10W50wt%, liquid temperature: 5W70°C, current density: 0.5W60 ampere/dm2, voltage: 1W100 volt, time of electrolysis: 5 secondsW 40 minutes.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6721179A JPS55158299A (en) | 1979-05-30 | 1979-05-30 | Manufacture of support for lithographic plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6721179A JPS55158299A (en) | 1979-05-30 | 1979-05-30 | Manufacture of support for lithographic plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55158299A true JPS55158299A (en) | 1980-12-09 |
Family
ID=13338341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6721179A Pending JPS55158299A (en) | 1979-05-30 | 1979-05-30 | Manufacture of support for lithographic plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55158299A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5367507A (en) * | 1976-11-27 | 1978-06-16 | Nippon Keikinzoku Sougou Kenki | Method of producing offset printing aluminum rough plate |
-
1979
- 1979-05-30 JP JP6721179A patent/JPS55158299A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5367507A (en) * | 1976-11-27 | 1978-06-16 | Nippon Keikinzoku Sougou Kenki | Method of producing offset printing aluminum rough plate |
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