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JPS55145176A - Regeneration of copper chloride etching waste solution by electrolysis and recovering method of copper - Google Patents

Regeneration of copper chloride etching waste solution by electrolysis and recovering method of copper

Info

Publication number
JPS55145176A
JPS55145176A JP5274079A JP5274079A JPS55145176A JP S55145176 A JPS55145176 A JP S55145176A JP 5274079 A JP5274079 A JP 5274079A JP 5274079 A JP5274079 A JP 5274079A JP S55145176 A JPS55145176 A JP S55145176A
Authority
JP
Japan
Prior art keywords
copper
soln
etching waste
electrolytic cell
electrolysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5274079A
Other languages
Japanese (ja)
Other versions
JPS5617429B2 (en
Inventor
Yoshio Nakano
Saburo Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KAGAKU GIJUTSU SHINKOUKAI
DIC Corp
Original Assignee
KAGAKU GIJUTSU SHINKOUKAI
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KAGAKU GIJUTSU SHINKOUKAI, Dainippon Ink and Chemicals Co Ltd filed Critical KAGAKU GIJUTSU SHINKOUKAI
Priority to JP5274079A priority Critical patent/JPS55145176A/en
Publication of JPS55145176A publication Critical patent/JPS55145176A/en
Publication of JPS5617429B2 publication Critical patent/JPS5617429B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

PURPOSE:To precipitate and to recover metallic copper of high grade, by conducting electrolysis while controlling the sum of concentrations of cuprous and cupric ions in the cathodic chamber of an electrolytic cell. CONSTITUTION:Copper chloride etching waste soln. is electrolyzed by maintaining the composition of the soln. in the cathodic chamber of an electrolytic cell at a sum of concentrations of cuprous and cupric ions, which are converted into theat of copper, not higher than 65g/l. The control of the copper ion concentration is performed by means of an absorbance meter using change in photopermeability of the cathodic chamber soln. The copper is precipitated and recovered as metallic copper by the following reactions, CuCl2 CuCl, CuCl Cu, etc. The soln. having been treated is circulated to the electrolytic cell. Hence, metallic copper contg. little Cl is continuously recovered at a high efficiency, thereby regenerating preferably the etching waste soln.
JP5274079A 1979-04-28 1979-04-28 Regeneration of copper chloride etching waste solution by electrolysis and recovering method of copper Granted JPS55145176A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5274079A JPS55145176A (en) 1979-04-28 1979-04-28 Regeneration of copper chloride etching waste solution by electrolysis and recovering method of copper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5274079A JPS55145176A (en) 1979-04-28 1979-04-28 Regeneration of copper chloride etching waste solution by electrolysis and recovering method of copper

Publications (2)

Publication Number Publication Date
JPS55145176A true JPS55145176A (en) 1980-11-12
JPS5617429B2 JPS5617429B2 (en) 1981-04-22

Family

ID=12923316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5274079A Granted JPS55145176A (en) 1979-04-28 1979-04-28 Regeneration of copper chloride etching waste solution by electrolysis and recovering method of copper

Country Status (1)

Country Link
JP (1) JPS55145176A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238494A (en) * 1984-05-11 1985-11-27 Mitsui Mining & Smelting Co Ltd Method for removing chlorine in wet electrolytic refining of metal
JPH05179466A (en) * 1991-12-27 1993-07-20 Tsurumi Soda Kk Method and equipment for recovering metal from halogenated metal
JPH05179463A (en) * 1991-12-27 1993-07-20 Tsurumi Soda Kk Method and device for etching
KR20030064177A (en) * 2002-01-26 2003-07-31 대한민국(충남대학교) A method of preparing copper powder from waste etchant
SG104920A1 (en) * 1999-04-07 2004-07-30 Shipley Co Llc Processes and apparatus for recovery and removal of copper from fluids
CN113493915A (en) * 2020-04-01 2021-10-12 健鼎（湖北）电子有限公司 Regeneration method and system of acidic etching waste liquid

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008127266A (en) * 2006-11-24 2008-06-05 Nittetsu Mining Co Ltd Method for producing cupric oxide from copper etching waste liquid

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238494A (en) * 1984-05-11 1985-11-27 Mitsui Mining & Smelting Co Ltd Method for removing chlorine in wet electrolytic refining of metal
JPH0425352B2 (en) * 1984-05-11 1992-04-30 Mitsui Mining & Smelting Co
JPH05179466A (en) * 1991-12-27 1993-07-20 Tsurumi Soda Kk Method and equipment for recovering metal from halogenated metal
JPH05179463A (en) * 1991-12-27 1993-07-20 Tsurumi Soda Kk Method and device for etching
SG104920A1 (en) * 1999-04-07 2004-07-30 Shipley Co Llc Processes and apparatus for recovery and removal of copper from fluids
KR20030064177A (en) * 2002-01-26 2003-07-31 대한민국(충남대학교) A method of preparing copper powder from waste etchant
CN113493915A (en) * 2020-04-01 2021-10-12 健鼎（湖北）电子有限公司 Regeneration method and system of acidic etching waste liquid

Also Published As

Publication number Publication date
JPS5617429B2 (en) 1981-04-22

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