JPS5467792A - Elastic surface wave element - Google Patents
Elastic surface wave elementInfo
- Publication number
- JPS5467792A JPS5467792A JP13488477A JP13488477A JPS5467792A JP S5467792 A JPS5467792 A JP S5467792A JP 13488477 A JP13488477 A JP 13488477A JP 13488477 A JP13488477 A JP 13488477A JP S5467792 A JPS5467792 A JP S5467792A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- input
- output transducer
- way
- surface wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012212 insulator Substances 0.000 abstract 2
- 230000007547 defect Effects 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02921—Measures for preventing electric discharge due to pyroelectricity
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02228—Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02637—Details concerning reflective or coupling arrays
- H03H9/02653—Grooves or arrays buried in the substrate
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
PURPOSE:To prevent the occurrence of electrical short-circuit defects of respective electrodes and increase the scale of integration by forming the electrodes of an input- output transducer alternately through insulator. CONSTITUTION:Only the one-way electrodes 5A, 7A of an input-output transducer are formed on a piezoelectric body 1 and an insulation film 6 is formed over the entire surface on this piezoelectric body 1 and electrodes 5A, 7A. The remaining one-way electrodes 5B, 7B of the input-output transducer are formed on the film 6. Even if any electrically short-circuited portions are caused in the one-way electrodes having been formed first, the electrical short-circuiting with the second electrodes is prevented by the insulator 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13488477A JPS5467792A (en) | 1977-11-09 | 1977-11-09 | Elastic surface wave element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13488477A JPS5467792A (en) | 1977-11-09 | 1977-11-09 | Elastic surface wave element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5467792A true JPS5467792A (en) | 1979-05-31 |
JPS6142891B2 JPS6142891B2 (en) | 1986-09-24 |
Family
ID=15138749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13488477A Granted JPS5467792A (en) | 1977-11-09 | 1977-11-09 | Elastic surface wave element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5467792A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09153758A (en) * | 1995-09-29 | 1997-06-10 | Toshiba Corp | Surface acoustic wave device |
JP2008078739A (en) * | 2006-09-19 | 2008-04-03 | Fujitsu Media Device Kk | Elastic wave device and filter |
CN110868181A (en) * | 2019-11-29 | 2020-03-06 | 清华大学 | Thin film material surface acoustic wave device with GS layered electrode and preparation method and application thereof |
CN111010126A (en) * | 2019-12-12 | 2020-04-14 | 无锡市好达电子有限公司 | Surface acoustic wave filter structure of layered electrode and preparation method thereof |
CN112383288A (en) * | 2020-11-16 | 2021-02-19 | 清华大学 | Temperature-compensated packaging-free surface acoustic wave device and preparation method thereof |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2013108608A1 (en) * | 2012-01-20 | 2015-05-11 | パナソニックIpマネジメント株式会社 | Elastic wave sensor |
-
1977
- 1977-11-09 JP JP13488477A patent/JPS5467792A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09153758A (en) * | 1995-09-29 | 1997-06-10 | Toshiba Corp | Surface acoustic wave device |
JP2008078739A (en) * | 2006-09-19 | 2008-04-03 | Fujitsu Media Device Kk | Elastic wave device and filter |
CN110868181A (en) * | 2019-11-29 | 2020-03-06 | 清华大学 | Thin film material surface acoustic wave device with GS layered electrode and preparation method and application thereof |
WO2021103579A1 (en) * | 2019-11-29 | 2021-06-03 | 清华大学 | Thin film material surface acoustic wave device with gs layered electrode, preparation method therefor and use thereof |
CN111010126A (en) * | 2019-12-12 | 2020-04-14 | 无锡市好达电子有限公司 | Surface acoustic wave filter structure of layered electrode and preparation method thereof |
CN112383288A (en) * | 2020-11-16 | 2021-02-19 | 清华大学 | Temperature-compensated packaging-free surface acoustic wave device and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6142891B2 (en) | 1986-09-24 |
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