[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JPH1126554A - Vacuum tweezers - Google Patents

Vacuum tweezers

Info

Publication number
JPH1126554A
JPH1126554A JP18771097A JP18771097A JPH1126554A JP H1126554 A JPH1126554 A JP H1126554A JP 18771097 A JP18771097 A JP 18771097A JP 18771097 A JP18771097 A JP 18771097A JP H1126554 A JPH1126554 A JP H1126554A
Authority
JP
Japan
Prior art keywords
suction
suction pad
pad
wafer
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18771097A
Other languages
Japanese (ja)
Inventor
Noriko Ashizawa
典子 芦澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP18771097A priority Critical patent/JPH1126554A/en
Publication of JPH1126554A publication Critical patent/JPH1126554A/en
Pending legal-status Critical Current

Links

Landscapes

  • Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
  • Manipulator (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a pair of vacuum tweezers which adheres a suction object well by a suction pad, even if the object such as a wafer warps and bends, enables stable holding and significantly enhances operability and reliability. SOLUTION: This pair of tweezers is provided with a first suction pad 2 which a first suction planar part 4 formed of a resin, etc., and a second suction pad 3 with a second suction planar part 5 provided so as to enclose the outer circumference of the first suction pad and is formed of a bendable member. The first suction pad has a first recessed part 6. The first recessed part is depressurized during suction, and the second suction pad 2 is provided with a second recessed part 7, which is communicated to the first recessed part 6 and the second recessed part is also depressurized during the suction.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、真空ピンセットに
関し、特に真空ピンセットの吸着パッドに関するる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to vacuum tweezers, and more particularly, to a vacuum tweezer suction pad.

【0002】[0002]

【従来の技術】図4に、従来の真空ピンセットの構成の
一例を示す。一般に、真空ピンセットは、図4に示すよ
うに、開閉バルブ15を設けたハンドル14と、真空ホ
ース16と、ウェハ等吸着物に接する吸着パッド10を
備えて構成されている。図4において、11は吸着平
面、12は吸引凹部、13は吸引口を示している。
2. Description of the Related Art FIG. 4 shows an example of the structure of a conventional vacuum tweezer. In general, as shown in FIG. 4, the vacuum tweezers include a handle 14 provided with an opening / closing valve 15, a vacuum hose 16, and a suction pad 10 in contact with a suction object such as a wafer. In FIG. 4, 11 indicates a suction plane, 12 indicates a suction recess, and 13 indicates a suction port.

【0003】図5は、図4に示した吸着バッド部の断面
構成を示す図である。図5を参照すると、吸着パッド1
0は、吸着平面11と、吸引凹部12を有し、吸引口1
3で真空引きする構造とされており、吸着平面部11を
ウェハ等吸着物に密着させて負圧とし、ウェハ等吸着物
をハンドリングするものである。
FIG. 5 is a diagram showing a sectional configuration of the suction pad portion shown in FIG. Referring to FIG. 5, the suction pad 1
0 has a suction plane 11 and a suction recess 12, and has a suction port 1.
The vacuum is drawn in step 3, and the suction flat portion 11 is brought into close contact with an adsorbate such as a wafer to create a negative pressure, thereby handling the adsorbate such as a wafer.

【0004】[0004]

【発明が解決しようとする課題】上記した従来技術は下
記記載の問題点を有している。
The above-described prior art has the following problems.

【0005】(1)第一の問題点は、従来の吸着パッド
は、ウェハ等吸着物に反り等のある場合、図7に示すよ
うに、吸着パッド10の吸着平面部11とウェハ等吸着
物18の間にスキマ(隙間)Aが発生して、吸着パッド
10の吸着平面部11でウェハ等吸着物18を密着させ
にくく、このためウェハ等吸着物を吸着できない可能性
がある、ということである。
(1) The first problem is that the conventional suction pad, when the adsorbate such as a wafer has a warp or the like, as shown in FIG. A gap (a gap) A is generated between the suction pads 18, and it is difficult for the suction object 18 such as a wafer to adhere to the suction plane portion 11 of the suction pad 10, so that there is a possibility that the suction object such as a wafer cannot be suctioned. is there.

【0006】その理由は、吸着パッドのウェハ等吸着物
と密着する吸着平面部11の材料が、主に樹脂よりなり
且つ平面度が保たれているため、ウェハ等吸着物の反り
に追従できず、保持可能な負圧を得られないからであ
る。
[0006] The reason is that the material of the suction flat portion 11 of the suction pad, which is in close contact with the adsorbate such as the wafer, is mainly made of resin and the flatness is maintained, so that it is impossible to follow the warp of the adsorbate such as the wafer. This is because a negative pressure that can be maintained cannot be obtained.

【0007】なお、例えば実開平3−17632号公報
には、吸引口を複数設けた構成の真空ピンセットが提案
されているが、この構成においても、ウェハ等吸着物に
反りがある場合には、上記の通り、ウェハ等吸着物の反
りに追従できず、保持可能な負圧を得られない。
[0007] For example, Japanese Utility Model Laid-Open Publication No. Hei 3-17632 proposes a vacuum tweezer having a structure in which a plurality of suction ports are provided. As described above, it is not possible to follow the warpage of the adsorbate such as a wafer, and it is not possible to obtain a negative pressure that can be held.

【0008】(2)第二の問題点は、従来の吸着パッド
10は、ウェハ等吸着物18を吸引保持している場合、
ウェハの自重によってウェハがたわみ、図8に示すよう
に、スキマBが発生して負圧が維持されず、ウェハ等吸
着物の落下してしまう、可能性が高い、ということであ
る。
(2) The second problem is that the conventional suction pad 10 sucks and holds an adsorbate 18 such as a wafer.
As shown in FIG. 8, there is a high possibility that the wafer warps due to the weight of the wafer and a gap B is generated, the negative pressure is not maintained, and the adsorbed material such as the wafer falls.

【0009】その理由は、吸着パッドのウェハ等の吸着
物と密着する吸着平面部の材料が、主に樹脂であり、平
面度が保たれているため、ウェハ等吸着物のたわみに追
従できないからである。
The reason for this is that the material of the suction flat portion of the suction pad that is in close contact with the suction material such as the wafer is mainly resin and the flatness thereof is maintained, so that the material of the suction pad cannot follow the deflection of the suction material such as the wafer. It is.

【0010】前記第一及び第二の問題点の解決を図るこ
とを意図した従来の真空ピンセットとして、例えば実開
平6−52149号公報には、図6に示すような構成の
吸着パッド(ヘッド)が提案されている。これは、硬い
材料の吸引凹部の内周を取り巻くようにゴム等弾性材の
スカート17を設け、スカート17は吸着パッド10を
ウェハ等吸着物に近づけるとウェハ吸着物に吸い着きウ
ェハ等吸着物を吸着平面部11に引き寄せるものであ
る。しかしながら、この吸着パッドにおいては、スカー
トの無いものよりも吸引面積が少なくなり、吸引力は低
下する。
As a conventional vacuum tweezer intended to solve the first and second problems, for example, Japanese Unexamined Utility Model Publication No. 6-52149 discloses a suction pad (head) having a structure as shown in FIG. Has been proposed. In this method, a skirt 17 made of an elastic material such as rubber is provided so as to surround an inner periphery of a suction concave portion made of a hard material. It is drawn to the suction plane portion 11. However, the suction area of this suction pad is smaller than that of the suction pad without a skirt, and the suction force is reduced.

【0011】(3)第三の問題点は、従来の吸着パッド
は、ウェハ等吸着物に接する時の衝撃で、ウェハ等吸着
物にキズ等を付ける可能性が高い、ということである。
(3) The third problem is that the conventional suction pad has a high possibility of scratching the adsorbed material such as a wafer due to an impact when coming into contact with the adsorbed material such as a wafer.

【0012】その理由は、真空ピンセットで吸着する際
は、ウェハ等吸着物に吸着パッドの外形部から接触し始
めることが多く、この吸着パッドの外形部の材料が、主
に樹脂で硬い材料のため、ウェハ等吸着物に接する時に
衝撃を発生しやすいからである。
[0012] The reason for this is that when suction is performed with vacuum tweezers, the suction material such as a wafer often starts to come into contact with the external portion of the suction pad, and the material of the external portion of the suction pad is mainly made of a resin hard material. Therefore, an impact is likely to occur when coming into contact with an adsorbate such as a wafer.

【0013】吸着パッドの吸引凹部の内側にゴムのスカ
ートを設けた、上記実開平6−52149号公報に記載
の真空ピンセットにおいては、外形部は硬い材料である
ため、上記の通り、ウェハ等吸着物に接する時に衝撃を
発生しやすい。また、上記実開平3−17632号公報
に記載の真空ピンセットにおいても、外形部はフッ素樹
脂であるため、上記の通りウェハ等吸着物に接する時に
衝撃を発生しやすい。
In the vacuum tweezers described in Japanese Utility Model Application Laid-Open No. 6-52149, in which a rubber skirt is provided inside the suction concave portion of the suction pad, since the outer portion is made of a hard material, as described above, the wafer and the like are suctioned. It is easy to generate an impact when touching an object. Also, in the vacuum tweezers described in Japanese Utility Model Application Laid-Open No. 3-17632, since the outer portion is made of fluororesin, as described above, an impact is likely to occur when coming into contact with an adsorbent such as a wafer.

【0014】したがって、本発明は、上記問題点に鑑み
てなされたものであって、その目的は、ウェハ等吸着物
に反り及びたわみがある場合にも、吸着物を吸着パッド
で良好に密着させ、安定した保持を可能とし、操作性、
信頼性を特段に向上する真空ピンセットを提供すること
にある。
SUMMARY OF THE INVENTION Accordingly, the present invention has been made in view of the above problems, and an object of the present invention is to make an adsorbent adhere well with an adsorbent pad even when the adsorbent such as a wafer is warped or bent. , Stable holding, operability,
It is an object of the present invention to provide a vacuum tweezer which particularly improves reliability.

【0015】[0015]

【課題を解決するための手段】前記目的を達成するた
め、本発明の真空ピンセットは、平面部を有する第一吸
着パッドと、前記第一吸着パッドの外周に設けた可撓性
の第二吸着パッドと、を備えて構成される。
To achieve the above object, a vacuum tweezer of the present invention comprises a first suction pad having a flat portion, and a flexible second suction pad provided on the outer periphery of the first suction pad. And a pad.

【0016】[0016]

【発明の実施の形態】本発明の好ましい実施の形態につ
いて以下に説明する。本発明の真空ピンセットは、その
好ましい実施の形態において、吸着パッドは、樹脂等よ
りなる平面部(図1の4)を有する第一吸着パッド(図
1の2と、その外周に設けたゴム等可撓性材料よりなる
第二吸着パッド(図1の3)と、を備え、第一吸着パッ
ド(図1の2)は第一吸引凹部(図1、及び図3の6参
照)を有し、第一吸引口(図1、図3の8参照)で負圧
する構造とされ、第二吸着パッド(図1の3)は、第二
吸着平面部(図1、図3の5)と第二吸引凹部(図1、
図3の7)を有し、第二吸引凹部に連通する第二吸引口
(図1、図3の9)を第一吸着パッドに設けて負圧にす
る構造とされている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below. In the vacuum tweezers of the present invention, in a preferred embodiment, the suction pad is a first suction pad (2 in FIG. 1) having a flat portion (4 in FIG. 1) made of resin or the like, and rubber or the like provided on the outer periphery thereof A second suction pad (3 in FIG. 1) made of a flexible material, and the first suction pad (2 in FIG. 1) has a first suction recess (see 6 in FIGS. 1 and 3). The first suction port (see FIG. 1, FIG. 3, 8) has a structure in which a negative pressure is applied, and the second suction pad (3, FIG. 1) is connected to the second suction flat portion (5, FIG. 1, FIG. 3). Two suction recesses (Fig. 1,
3), and a second suction port (9 in FIGS. 1 and 3) communicating with the second suction recess is provided in the first suction pad to make a negative pressure.

【0017】本発明の実施の形態においては、樹脂等の
平面部を有する第一吸着パッドと、その外周に設けたゴ
ム等可撓性材料の第二吸着パッドとにより構成すること
により、ウェハ等吸着物に反りのある場合及びウェハ等
吸着物の自重によりハンドリング時にたわみが発生した
場合に、前記第二吸着パッドがそれらに追従できるた
め、吸着パッドと、ウェハ等吸着物の密着を容易にし、
吸着保持時の負圧を維持できる。
In the embodiment of the present invention, a wafer or the like is constituted by a first suction pad having a flat portion made of resin or the like and a second suction pad made of a flexible material such as rubber provided on the outer periphery thereof. If the adsorbate is warped and if deflection occurs during handling due to the weight of the adsorbate such as a wafer, the second suction pad can follow them, thus facilitating adhesion between the suction pad and the adsorbate such as a wafer,
Negative pressure during suction holding can be maintained.

【0018】[0018]

【実施例】上記した本発明の実施の形態について更に詳
細に説明すべく、本発明の実施例を図面を参照して以下
に説明する。図1は、本発明の一実施例の真空ピンセッ
トの構成を示す図であり、吸着パッドの吸着面側から見
た平面図である。図2は、図1のC−D−E線の断面図
である。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram showing an embodiment of the present invention; FIG. 1 is a diagram showing a configuration of vacuum tweezers according to one embodiment of the present invention, and is a plan view seen from a suction surface side of a suction pad. FIG. 2 is a sectional view taken along line C-D-E of FIG.

【0019】図1を参照すると、本発明の一実施例にお
いて、吸着パッド1は、第一吸着パッド2と第二吸着パ
ッド3とからなり、第一吸着パッド2は、第一吸着平面
部4と第一吸引凹部6を有し、第一吸引口8で負圧する
構造である。そして第一吸着パッド2の外周部に、第二
吸着パッド3を設けている。第二吸着パッド3は、第二
吸着平面部5と第二吸引凹部7を有し、第二吸引凹部7
に連通する第二吸引口9を、第一吸着パッド2に設けて
負圧にする構造とされている。なお、図1において、1
4はハンドル、15は開閉バルブ、16は真空ホースで
ある。
Referring to FIG. 1, in one embodiment of the present invention, the suction pad 1 includes a first suction pad 2 and a second suction pad 3, and the first suction pad 2 is And a first suction recess 6, and a negative pressure is applied at the first suction port 8. The second suction pad 3 is provided on the outer peripheral portion of the first suction pad 2. The second suction pad 3 has a second suction flat portion 5 and a second suction recess 7, and the second suction recess 7.
The first suction pad 2 is provided with a second suction port 9 communicating with the first suction pad 2 so as to generate a negative pressure. In FIG. 1, 1
4 is a handle, 15 is an opening / closing valve, and 16 is a vacuum hose.

【0020】第一吸着パッド2は、従来技術のものと同
様、樹脂材料で形成される。この樹脂材料として、例え
ばフッ素系樹脂を用いることが望ましい。
The first suction pad 2 is formed of a resin material as in the prior art. It is desirable to use, for example, a fluorine-based resin as the resin material.

【0021】第二吸着パッド3は、可撓性のある材料で
形成される。たとえば、ゴム系材料が望ましい。より詳
細には、例えば硬度ショアA40度以下、弾性率23.
53×102Mpa以上、伸び率200%以上のゴム系
材料が望ましい。
The second suction pad 3 is formed of a flexible material. For example, a rubber-based material is desirable. More specifically, for example, hardness Shore A 40 degrees or less, elastic modulus 23.
A rubber-based material having 53 × 10 2 Mpa or more and an elongation of 200% or more is desirable.

【0022】なお、第二吸着パッド3の外形(平面形
状)は、図1に示した円(円盤型)に限定されるもので
はない。
The outer shape (planar shape) of the second suction pad 3 is not limited to the circle (disc type) shown in FIG.

【0023】次に、本発明の一実施例の動作について説
明する。図3は、本発明の一実施例の動作を説明するた
めの断面図である。吸着パッド1の吸着面側ををウェハ
等吸着物18に近づけると、第一吸引口8から空気が吸
引され、第一吸引凹部6が負圧になり、第一吸着平面部
4が、ウェハ等吸着物18に吸着する。これと同時に、
第二吸引口9から空気が吸引され、第二吸引凹部7が負
圧になり、第二吸着平面部5が、ウェハ等吸着物18に
追従した状態で吸着する。
Next, the operation of one embodiment of the present invention will be described. FIG. 3 is a cross-sectional view for explaining the operation of one embodiment of the present invention. When the suction surface side of the suction pad 1 is brought close to the suction object 18 such as a wafer, air is sucked from the first suction port 8, the first suction recess 6 becomes a negative pressure, and the first suction flat portion 4 is moved to the wafer or the like. It adsorbs on the adsorbate 18. At the same time,
The air is sucked from the second suction port 9, the second suction concave portion 7 becomes a negative pressure, and the second suction flat portion 5 is suctioned while following the suction object 18 such as a wafer.

【0024】その後、ウェハ等吸着物18の他の容器等
への移し替え時、ウェハ等吸着物18の自重や動作中の
風圧等によりたわみが発生した場合にも、第二吸着平面
部5がウェハ等吸着物に追従し、負圧状態を保つ。
After that, when the adsorbent 18 such as a wafer is transferred to another container or the like, the second adsorbing flat portion 5 is kept in place even when the adsorbent 18 such as the wafer is bent due to its own weight or wind pressure during operation. Follow the adsorbed material such as wafer and maintain negative pressure.

【0025】上記したように本発明の一実施例によれ
ば、吸着パッドに、ゴム等可撓性の材料の第二吸着パッ
ドを付加したことにより、ウェハ等の吸着物自体の反り
や、たわみに追従できる。例えば外形φ300mm、t
=300μmの大口径ウェハにおいても、安定したハン
ドリングが可能である。また吸着パッドがウェハ等吸着
物に接する時の衝撃等が特段に緩和されキズ等の発生を
防止できる。
As described above, according to one embodiment of the present invention, the second suction pad made of a flexible material such as rubber is added to the suction pad, so that the suction object itself such as a wafer is warped or bent. Can follow. For example, outer diameter φ300mm, t
= Stable handling is possible even with a large diameter wafer of 300 μm. In addition, the impact or the like when the suction pad comes into contact with the suction object such as a wafer is particularly reduced, and the occurrence of scratches or the like can be prevented.

【0026】[0026]

【発明の効果】以上説明したように、本発明によれば下
記記載の効果を奏する。
As described above, according to the present invention, the following effects can be obtained.

【0027】(1)本発明の第一の効果は、ウェハ等の
吸着物自体の反りや、たわみに追従でき、例えば外形φ
300mm、t=300μmの大口径ウェハに対しても
安定したハンドリングが可能である、とういうことであ
る。
(1) The first effect of the present invention is that it can follow the warp or deflection of the adsorbed material itself such as a wafer.
It means that stable handling is possible even for a large-diameter wafer having a diameter of 300 mm and t = 300 μm.

【0028】その理由は、本発明においては、ゴム等可
撓性の材料の第二吸着パッドが、ウェハ等の吸着物自体
の反りやたわみに追従できるからである。
The reason for this is that, in the present invention, the second suction pad made of a flexible material such as rubber can follow the warp or deflection of the suction object itself such as a wafer.

【0029】(2)本発明の第二の効果は、吸着パッド
がウェハ等吸着物に接する時の衝撃はなく、キズ等の発
生を防止できる、ということである。
(2) A second effect of the present invention is that there is no impact when the suction pad comes into contact with a suction object such as a wafer, and the occurrence of scratches and the like can be prevented.

【0030】その理由は、本発明においては、ゴム等可
撓性の材料の第二吸着パッドを外周部に設けているた
め、衝撃を吸収できるからである。
The reason is that, in the present invention, since the second suction pad made of a flexible material such as rubber is provided on the outer peripheral portion, the impact can be absorbed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の真空ピンセットの構成を示
す図であり、吸着パッドの吸着面側から見た平面図であ
る。
FIG. 1 is a diagram showing a configuration of vacuum tweezers according to one embodiment of the present invention, and is a plan view as viewed from a suction surface side of a suction pad.

【図2】本発明の一実施例の吸着パッドの構成を示す図
であり、図1のC−D−E線に沿った断面図である。
FIG. 2 is a diagram showing a configuration of a suction pad according to one embodiment of the present invention, and is a cross-sectional view taken along the line C-D-E of FIG.

【図3】本発明の一実施例の動作を説明するための図で
あり、真空ピンセットにてウェハ等の吸着物を保持して
いる状態を示す断面図である。
FIG. 3 is a view for explaining the operation of one embodiment of the present invention, and is a cross-sectional view showing a state in which a suction object such as a wafer is held by vacuum tweezers.

【図4】従来の真空ピンセットの構成を示す図であり、
吸着面側から見た平面図である。
FIG. 4 is a diagram showing a configuration of a conventional vacuum tweezer;
It is the top view seen from the adsorption side.

【図5】従来の真空ピンセットの吸着パッドの断面図で
ある。
FIG. 5 is a cross-sectional view of a suction pad of a conventional vacuum tweezer.

【図6】実開平6−52149号公報記載の真空ピンセ
ットの吸着パッドの断面図である。
FIG. 6 is a sectional view of a suction pad of a vacuum tweezer described in Japanese Utility Model Laid-Open No. 6-52149.

【図7】ウェハ等の吸着物に反りがあるときの従来の吸
着パッドとの関係を模式的に示した断面図である。
FIG. 7 is a cross-sectional view schematically showing a relationship with a conventional suction pad when a suction object such as a wafer is warped.

【図8】ウェハ等の吸着物にたわみがあるときの従来の
吸着パッドとの関係を模式的に示した断面図である。
FIG. 8 is a cross-sectional view schematically showing a relationship with a conventional suction pad when a suction object such as a wafer has a deflection.

【符号の説明】[Explanation of symbols]

1 真空ピンセットの吸着パッド 2 第一吸着パッド 3 第二吸着パッド 4 第一吸着平面部 5 第二吸着平面部 6 第一吸引凹部 7 第二吸引凹部 8 第一吸引口 9 第二吸引口 10 吸着パッド 11 吸着平面部 12 吸引凹部 13 吸引口 14 ハンドル 15 開閉弁 16 真空ホース 17 スカート 18 ウェハ等吸着物 A スキマ B スキマ DESCRIPTION OF SYMBOLS 1 Vacuum tweezers suction pad 2 First suction pad 3 Second suction pad 4 First suction flat part 5 Second suction flat part 6 First suction recess 7 Second suction recess 8 First suction port 9 Second suction port 10 Suction Pad 11 Suction plane part 12 Suction recess 13 Suction port 14 Handle 15 Open / close valve 16 Vacuum hose 17 Skirt 18 Wafer or other adsorbed material A Skimmer B Skimmer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】平面部を有する第一吸着パッドと、 前記第一吸着パッドの外周に設けた可撓性の第二吸着パ
ッドと、 を備えて構成されてなることを特徴とする真空ピンセッ
ト。
1. A vacuum tweezer, comprising: a first suction pad having a flat portion; and a flexible second suction pad provided on an outer periphery of the first suction pad.
【請求項2】真空ピンセットの吸着パッドが、 第一吸着平面部を有する第一吸着パッドと、 前記第一吸着パッドの前記第一吸引平面部の外周を囲繞
するように設けられ可撓性部材よりなる第二吸着平面部
を有する第二吸着パッドと、 を備え、 前記第一吸着パッドは、第一吸引凹部を有し、吸引時に
該第一吸引凹部が負圧とされ、 前記第二吸着パッドは、前記第一吸引凹部に連通してな
る第二吸引凹部を備え、吸引時に前記第二吸引凹部も負
圧とされる、ことを特徴とする真空ピンセット。
2. A flexible member, wherein a suction pad of vacuum tweezers is provided to surround a first suction pad having a first suction flat portion, and an outer periphery of the first suction flat portion of the first suction pad. A second suction pad having a second suction flat surface portion, wherein the first suction pad has a first suction recess, and the first suction recess is set to a negative pressure during suction, and Vacuum tweezers, wherein the pad includes a second suction recess communicating with the first suction recess, and the second suction recess is also set to a negative pressure during suction.
【請求項3】前記第一吸着パッドが樹脂よりなる、こと
を特徴とする請求項1又は2に記載の真空ピンセット。
3. The vacuum tweezers according to claim 1, wherein the first suction pad is made of a resin.
【請求項4】前記第二吸着パッドがゴム系材料よりな
る、ことを特徴とする請求項1又は2に記載の真空ピン
セット。
4. The vacuum tweezers according to claim 1, wherein the second suction pad is made of a rubber-based material.
JP18771097A 1997-06-27 1997-06-27 Vacuum tweezers Pending JPH1126554A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18771097A JPH1126554A (en) 1997-06-27 1997-06-27 Vacuum tweezers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18771097A JPH1126554A (en) 1997-06-27 1997-06-27 Vacuum tweezers

Publications (1)

Publication Number Publication Date
JPH1126554A true JPH1126554A (en) 1999-01-29

Family

ID=16210823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18771097A Pending JPH1126554A (en) 1997-06-27 1997-06-27 Vacuum tweezers

Country Status (1)

Country Link
JP (1) JPH1126554A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018157221A (en) * 2014-03-06 2018-10-04 カスケード マイクロテック インコーポレイテッドCascade Microtech,Incorporated Wafer handling end effector

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018157221A (en) * 2014-03-06 2018-10-04 カスケード マイクロテック インコーポレイテッドCascade Microtech,Incorporated Wafer handling end effector

Similar Documents

Publication Publication Date Title
JP5017983B2 (en) Suction pad for plate
JP5163541B2 (en) Vacuum suction pad
JPS63114870A (en) Vacuum-absorbing method for wafer
JPH1126554A (en) Vacuum tweezers
US20210252719A1 (en) Grabbing Device
JP4094859B2 (en) Laser diode device and its mounting device
JPH05315434A (en) Semiconductor wafer retainer
JPH04188840A (en) Die bonding method
CN214643745U (en) Vacuum adsorption type annular tail end clamp holder
JPS6049113A (en) Negative pressure type suction disc
JP2002184835A (en) Suction pad
JP4655272B2 (en) Substrate adsorption device and substrate transfer device using the same
JPH09216186A (en) Vacuum suction pad for sheet glass
JP3164629B2 (en) Vacuum chuck stage for semiconductor wafer
JP2005311040A (en) Absorption chuck for wafer
JPH0911172A (en) Vacuum cup
TWI833414B (en) Wafer adsorption method
KR102130475B1 (en) Picker structure and package separator including the same
JPS5848914A (en) Wafer pincette
JPH1148297A (en) Product gripping part for disk-like resin molding
KR100344938B1 (en) vacuum suction cylinder
JP3118319B2 (en) Fixed plate for wafer polishing
KR20060075601A (en) Wafer lift pin which is able to vacuum absorption
JP2527709Y2 (en) Transport parts for semiconductor manufacturing equipment
JPS6167931A (en) Chucking device for die-bonding semiconductor pellet

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20000509