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JPH11180727A - Substrate glass composition for display device - Google Patents

Substrate glass composition for display device

Info

Publication number
JPH11180727A
JPH11180727A JP9352645A JP35264597A JPH11180727A JP H11180727 A JPH11180727 A JP H11180727A JP 9352645 A JP9352645 A JP 9352645A JP 35264597 A JP35264597 A JP 35264597A JP H11180727 A JPH11180727 A JP H11180727A
Authority
JP
Japan
Prior art keywords
glass
temperature
thermal expansion
coefficient
melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9352645A
Other languages
Japanese (ja)
Inventor
Nobuya Kuriyama
延也 栗山
Hiroshi Machishita
汎史 町下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP9352645A priority Critical patent/JPH11180727A/en
Publication of JPH11180727A publication Critical patent/JPH11180727A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Glass Compositions (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

PROBLEM TO BE SOLVED: To produce the substrate glass for the display device suitable to a melting and floating forming method including a directly energizing melting, having a moderate heat performance, being a low density glass and particularly suitable for PDP. SOLUTION: The glass is incorporated with 61-65 SiO2 , 9-13 Al2 O3 , 0.5-3.5 ZrO2 , 71-78 SiO2 +Al2 O3 +ZrO2 , 1-6 MgO, 3-9 CaO, 1-5 SrO, 0-5 BaO, 10-15 MgO+ CaO+SrO+BaO, 0-3 Li2 O, 7-10 Na2 O, 1-5 K2 O, 9-14 Li2 O+Na2 O+K2 O by wt.%, and the glass has a specific density of <=2.60 and a distortion point of >=570 deg.C, 10<4> poise temp. of <=1200 deg.C, a temp. difference of poise temp.-devitrification temp. of >=10 deg.C and a coefficient of thermal expansion from room temp. to 300 deg.C of >=80×10<-7> / deg.C.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種表示装置用基
板ガラス、特にプラズマディスプレイパネル (PDP)
用基板ガラスとして好適なガラス組成物であって、電気
溶融法を含めた溶融、およびフロート法による成形 (製
板) が容易な表示装置用基板ガラス組成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate glass for various display devices, and particularly to a plasma display panel (PDP).
The present invention relates to a glass composition suitable for a substrate glass for a display, which is easy to be formed by melting including an electric melting method and forming (plate making) by a float method.

【0002】[0002]

【従来技術および解決すべき課題】従来、表示装置用基
板ガラスとしては、ソーダ石灰シリカ系ガラスが用いら
れるケースが多い。一例としてPDP用ガラス基板にお
いては、ガラス基板にニッケルやアルミニウム等の電極
や絶縁塗膜等をスクリーン印刷などにより施し、 500℃
を越える温度での焼成を繰返してパネルを製作する。基
板ガラスは電極や塗膜との熱膨張率が異なるとそれらの
亀裂や剥離を生じ易いので、熱膨張率を整合させる必要
があり、前記ソーダ石灰シリカ系ガラスにおいては熱膨
張率が90×10 -7/℃近くと、電極や塗膜との熱膨張率に
近い点において有用であるが、歪点が510℃近辺の温度
であるため繰返し焼成に際して熱変形を生じ易く、製作
歩留りを著しく悪化させるという問題がある。
2. Description of the Related Art Conventionally, a display device
As the sheet glass, soda-lime-silica glass is used.
There are many cases. As an example, PDP glass substrates
In addition, electrodes such as nickel and aluminum
And insulation coating by screen printing etc., 500 ℃
The panel is manufactured by repeating firing at a temperature exceeding. Base
If the sheet glass has a different coefficient of thermal expansion from the electrode or coating,
Cracks and delamination are likely to occur, so it is necessary to match the coefficient of thermal expansion
There is a thermal expansion in the soda-lime-silica glass.
90 × 10 -7/ ° C near the coefficient of thermal expansion with electrodes and coatings
Useful at close points, but with strain points around 510 ° C
Therefore, thermal deformation easily occurs during repeated firing,
There is a problem that the yield is remarkably deteriorated.

【0003】特開平3−40933 号公報には、SiO2成分、
Al2O3 成分、CaO 等の2価金属酸化物、Na2O等のアルカ
リ金属酸化物、ZrO2成分等よりなる基板用ガラス組成物
であって、600 ℃付近の熱処理においても殆ど変形せ
ず、また熱膨張率もソーダ石灰シリカ系ガラスと殆ど変
わらないガラスが開示されている。概してこの成分系で
は2価金属酸化物が過多で、ガラスの比重を増大させる
上に、ガラス融液の高温粘度を上昇し、均質化、清澄性
を悪化し、また、成形性も難化するという危惧がある。
均質化、清澄性を改善するためには溶融促進・清澄剤と
してのSO3 、Sb2O3 、またはAs2O3 を過剰に添加する必
要があるが、例えば直接通電溶融の場合においてはそれ
らが電極と反応して電極を変質劣化させたり、ガラスに
着色を与えたりするという危惧がある。
[0003] JP-A-3-40933 discloses a SiO 2 component,
A glass composition for substrates consisting of Al 2 O 3 components, divalent metal oxides such as CaO, alkali metal oxides such as Na 2 O, ZrO 2 components, etc., which are almost deformed even at a heat treatment at around 600 ° C. A glass having a coefficient of thermal expansion almost equal to that of soda-lime-silica glass is disclosed. In general, this component system contains an excess of divalent metal oxides, which increases the specific gravity of the glass, increases the high-temperature viscosity of the glass melt, deteriorates homogeneity and clarity, and makes molding difficult. There is a fear that.
In order to improve homogenization and clarity, it is necessary to add an excessive amount of SO 3 , Sb 2 O 3 , or As 2 O 3 as a melting accelerating / fining agent. However, there is a fear that the electrode reacts with the electrode to cause deterioration and deterioration of the electrode or to give coloring to the glass.

【0004】特開平7−257937号公報には、SiO2成分、
Al2O3 成分、CaO 等2価金属酸化物、K2O 等アルカリ金
属酸化物、ZrO2成分等よりなり、PDP用基板に適用す
るガラス組成物が開示されている。しかし、ネットワー
クフォーマーとしてのSiO2成分が低く、その分ガラス形
成が不安定で、失透が生じ易い。またガラス比重を増大
し易く、特に大サイズの表示装置においては装置の重量
が増大し、その取扱を困難とするという危惧がある。
Japanese Patent Application Laid-Open No. 7-257937 discloses an SiO 2 component,
A glass composition comprising an Al 2 O 3 component, a divalent metal oxide such as CaO, an alkali metal oxide such as K 2 O, a ZrO 2 component, and the like, and applied to a PDP substrate is disclosed. However, since the SiO 2 component as a network former is low, glass formation is correspondingly unstable, and devitrification tends to occur. Further, there is a concern that the specific gravity of the glass is easily increased, and particularly in the case of a large-sized display device, the weight of the device is increased, making it difficult to handle.

【0005】特表平9−507207号公報には、ネットワー
クフォーマーであるSiO2成分や、Al 2O3 成分、B2O3
分、ZrO2成分と、2価金属酸化物、およびアルカリ金属
酸化物を含み、歪点がソーダ石灰系ガラスより高く、熱
膨張率がソーダ石灰系ガラス並に高い、基板ガラスや耐
火ガラスとして好適なガラス組成物が開示されている。
しかし、SiO2成分等の割合が低く、相対的に2価金属酸
化物、アルカリ金属酸化物等が高く、前記同様ガラス形
成が不安定で、失透が生じ易く、またガラス比重を増大
する。
[0005] Japanese Patent Publication No. 9-507207 discloses a network.
SiO, the performerTwoIngredients and Al TwoOThree Ingredient, BTwoOThreeSuccess
Min, ZrOTwoComponent, divalent metal oxide, and alkali metal
Contains oxides, has a higher strain point than soda-lime glass,
The expansion coefficient is as high as soda-lime glass.
A glass composition suitable as fire glass is disclosed.
However, SiOTwoLow ratio of components, etc., relatively divalent metal acid
Oxides, alkali metal oxides, etc.
Unstable in composition, easy to devitrify, and increased glass specific gravity
I do.

【0006】本発明はそれら従来技術における問題点に
鑑みて種々検討の末、完成に達したものであり、直接通
電溶融を含めた溶融、フロート法成形に適し、適度な熱
特性を有し、比較的低比重のガラスであって、特にPD
P用として好適な表示装置用基板ガラス組成物を提供す
るものである。
The present invention has been accomplished after various studies in view of the problems in the prior art, and has been completed. The present invention is suitable for melting including direct electric current melting and float molding, and has appropriate thermal characteristics. A glass with relatively low specific gravity, especially PD
A substrate glass composition for a display device suitable for P is provided.

【0007】[0007]

【課題を解決するための手段】本発明は、wt%で、SiO2
61〜65、Al2O3 9〜13、ZrO2 0.5〜3.5 、SiO2+Al 2O
3 +ZrO2 71〜78、MgO 1〜6、CaO 3〜9、SrO 1〜
5、BaO 0〜5、MgO+CaO +Sr0 +BaO 10〜15、Li2O
0〜3、Na2O 7〜10、K2O 1〜5、Li2O+Na2O+K2O
9〜14の範囲で含有し、ガラス比重が2.60以下、ガラ
スの歪点が 570℃以上、ガラスの104 ポイズ温度(ガラ
ス粘度が104 ポイズになる温度で、成形作業をするうえ
で基準となる)が1200℃以下であり、104 ポイズ温度−
失透温度の温度差が10℃以上、かつガラスの室温から 3
00℃における熱膨張率が80×10-7/℃以上である表示装
置用基板ガラス組成物である。である表示装置用基板ガ
ラス組成物である。
SUMMARY OF THE INVENTION The present invention relates to a method for preparing SiO.sub.Two
 61-65, AlTwoOThree 9-13, ZrOTwo 0.5-3.5, SiOTwo+ Al TwoO
Three + ZrOTwo 71-78, MgO 1-6, CaO 3-9, SrO 1
5, BaO 0-5, MgO + CaO + Sr0 + BaO 10-15, LiTwoO
 0-3, NaTwoO 7-10, KTwoO 1-5, LiTwoO + NaTwoO + KTwoO
 9-14, glass specific gravity 2.60 or less, glass
The strain point of the glass is 570 ° C or higher,Four Poise temperature (gala
Viscosity is 10Four At the temperature that becomes poise, molding work
Is less than 1200 ° C and 10Four Poise temperature-
Devitrification temperature difference of 10 ° C or more and from room temperature of glass 3
The coefficient of thermal expansion at 00 ° C is 80 × 10-7Display devices that are at least / ° C
It is a mounting substrate glass composition. Display device substrate
It is a lath composition.

【0008】[0008]

【発明の実施の形態】以下の各成分において‘%’表示
はwt%のことをあらわす。本発明の成分系において、Si
O2はガラスのネットワークフォーマーとして作用する主
成分であり、ガラス中61%未満ではガラスを安定して形
成し難く、失透を生じさせ易く、またガラスの歪点が低
下し、耐水性、耐薬品性を悪化させ、ガラス比重を増大
する傾向にある。他方65%を越えるとガラス融液の高温
粘度が高くなり、フロート法成形が困難になる。従って
61〜65%の範囲で導入する。
BEST MODE FOR CARRYING OUT THE INVENTION In the following components, "%" indicates wt%. In the component system of the present invention, Si
O 2 is a main component acting as a network former of glass. If it is less than 61% in the glass, it is difficult to form the glass stably, it is easy to cause devitrification, and the strain point of the glass is lowered, It tends to deteriorate chemical resistance and increase glass specific gravity. On the other hand, if it exceeds 65%, the high-temperature viscosity of the glass melt becomes high, and it becomes difficult to form by a float method. Therefore
Introduce in the range of 61-65%.

【0009】Al2O3 はガラスネットワークの一翼を担う
もので、ガラスを安定して形成でき、ガラスの歪点、粘
度を上昇して耐熱性を向上し、またガラスの耐薬品性、
耐水性を向上する。Al2O3 がガラス中9%未満であると
ガラスの歪点が低下し、他方13%を超えるとガラス融液
の高温粘度が高くなり、失透傾向が増大し、フロート法
成形が困難になる。従って9〜13%の範囲で導入する。
Al 2 O 3 plays a role in the glass network and can form the glass in a stable manner, raises the strain point and viscosity of the glass to improve the heat resistance, and also improves the chemical resistance of the glass,
Improves water resistance. If the Al 2 O 3 content is less than 9% in the glass, the strain point of the glass decreases, while if it exceeds 13%, the high-temperature viscosity of the glass melt increases, the tendency to devitrify increases, and the float method molding becomes difficult. Become. Therefore, it is introduced in the range of 9 to 13%.

【0010】ZrO2はガラスの耐水性、耐薬品性を向上す
る。またガラスの歪点を上昇させ、失透の発生を抑える
作用を有するので 0.5%以上含有させるのがよく、他方
3.5%を超えると逆に失透傾向が増大し、ガラスの溶融
およびフロート法成形を困難とするとともにガラス比重
を増大させる。従って 0.5〜 3.5%の範囲で導入する。
ZrO 2 improves the water resistance and chemical resistance of glass. Also, it has the effect of raising the strain point of the glass and suppressing the occurrence of devitrification.
If it exceeds 3.5%, on the contrary, the tendency of devitrification increases, making it difficult to melt and float-mold the glass and increasing the specific gravity of the glass. Therefore, it is introduced in the range of 0.5 to 3.5%.

【0011】なお、ガラス中SiO2+Al2O3 +ZrO2を71%
未満とし、相対的に2価成分酸化物やアルカリ金属酸化
物を過量に含ませると、ガラス比重が増大するので好ま
しくない。またSiO2+Al2O3 +ZrO2を78%を越えて含有
すると、熱膨張率が低下する上に、ガラス融液の高温粘
度が高くなり、フロート法成形が困難になる。従って71
〜78wt%の範囲とし、好適には74〜77%の範囲とする。
It is to be noted that SiO 2 + Al 2 O 3 + ZrO 2 in glass is 71%
It is not preferable that the content is less than the above value and the excess of the divalent component oxide or alkali metal oxide increases the glass specific gravity. Further, when the content of SiO 2 + Al 2 O 3 + ZrO 2 exceeds 78%, the coefficient of thermal expansion is reduced and the high-temperature viscosity of the glass melt is increased, making the float molding difficult. Therefore 71
7878 wt%, preferably 74-77%.

【0012】本成分系において、SiO2同様のネットワー
クフォーマーであり、ガラスを安定して形成するB2O3
適宜導入することができる。B2O3は高温粘度を下げてガ
ラス溶融を容易にする。ただし歪点と熱膨張率を低下す
る傾向にあり、導入量は2%以下とすべきである。
In this component system, it is a network former similar to SiO 2 , and B 2 O 3 for stably forming glass can be appropriately introduced. B 2 O 3 lowers the high temperature viscosity and facilitates glass melting. However, the strain point and the coefficient of thermal expansion tend to decrease, and the amount to be introduced should be 2% or less.

【0013】MgO は失透温度を低下させ、また他の二価
成分酸化物に比べガラスの歪点を上昇させ、適度に調整
するうえで有用であるが、ガラス中1%未満であると上
記作用に乏しく、6%を越えて含有すると、ガラスの熱
膨張率を低下させ、失透傾向が大きくなる。従って1〜
6%の範囲で導入する。
[0013] MgO lowers the devitrification temperature and raises the strain point of the glass as compared with other divalent component oxides, and is useful for moderate adjustment. The effect is poor, and if the content exceeds 6%, the coefficient of thermal expansion of the glass is reduced, and the tendency of devitrification is increased. Therefore 1
Introduce in the range of 6%.

【0014】CaO は主要な2価成分酸化物として、SiO2
やAl2O3 を主体とするガラスにおける融液の高温粘度を
下げ、またその適度な導入により失透の発生を抑制する
作用を有するが、ガラス中3%未満ではその作用が不充
分であり、他方9%を超えると失透傾向が大きくなり、
またガラス比重を増大する。従って3〜9%の範囲で導
入する。
CaO is SiO 2 as a main divalent component oxide.
, Al 2 O 3, or the lower the high temperature viscosity of the melt in the glass mainly comprising, also has the effect of suppressing the occurrence of devitrification due to its moderate introduced, is insufficient its effect in the glass less than 3% On the other hand, if it exceeds 9%, the tendency of devitrification increases,
It also increases the glass specific gravity. Therefore, it is introduced in the range of 3 to 9%.

【0015】SrO はCaO とともにガラス融液の高温粘度
を下げ、また失透の発生を抑制する作用を有し、ガラス
の熱膨張率、歪点を調整するうえで有用であるが、ガラ
ス中1%未満ではその作用が不充分であり、5%を越え
て導入すると比重が増大するので好ましくなく、従って
1〜5%の範囲で導入する。
SrO, together with CaO, has the effect of lowering the high-temperature viscosity of the glass melt and suppressing the occurrence of devitrification, and is useful in adjusting the coefficient of thermal expansion and strain point of glass. If it is less than 5%, its effect is insufficient, and if it exceeds 5%, the specific gravity increases, which is not preferable. Therefore, it is introduced in the range of 1 to 5%.

【0016】BaO はCaO 等とともにでガラス融液の高温
粘度を下げ失透の発生を抑制する作用を有するので適宜
導入することができるが、ガラス中5%を超えるとガラ
スの歪点が低下し過ぎ、ガラスの比重を増大する。従っ
て5%以下の範囲で随時導入する。
BaO, together with CaO and the like, has the effect of lowering the high-temperature viscosity of the glass melt and suppressing the occurrence of devitrification, so that it can be appropriately introduced. However, if it exceeds 5% in the glass, the strain point of the glass decreases. Too much, increasing the specific gravity of the glass. Therefore, it is introduced as needed in the range of 5% or less.

【0017】さらに、上記組成範囲内において、2価金
属酸化物 (CaO 、MgO 、BaO 、SrO)の合計を10〜15%の
範囲とすることによって、ガラスの溶融性を良好な範囲
に維持しつつ、粘度−温度勾配を適度として成形性を良
好とし、耐熱性、化学的耐久性等に優れ、適切な範囲の
熱膨張率を有するガラスを得ることができる。2価金属
酸化物の合計が15%を越えると、ガラスの熱膨張率が上
昇するとともに失透傾向が増大し、化学的耐久性が低下
し、またガラス比重が増大する。10%未満では、高温粘
度が上昇して溶融および成形を困難とし、熱膨張率が低
下する。
Further, by keeping the total of the divalent metal oxides (CaO, MgO, BaO, SrO) in the above composition range in the range of 10 to 15%, the melting property of the glass is maintained in a good range. In addition, it is possible to obtain a glass having an appropriate viscosity-temperature gradient, good moldability, excellent heat resistance, chemical durability and the like, and a thermal expansion coefficient in an appropriate range. When the total amount of the divalent metal oxides exceeds 15%, the coefficient of thermal expansion of the glass increases, the tendency of devitrification increases, the chemical durability decreases, and the specific gravity of the glass increases. If it is less than 10%, the high temperature viscosity increases to make melting and molding difficult, and the coefficient of thermal expansion decreases.

【0018】Li2Oは強力なガラス溶融剤として作用する
が、ガラスの熱膨張率を低下させ、また歪点も低下させ
る傾向があるので、ガラス中3%以下の範囲で適宜導入
するものである。
Although Li 2 O acts as a strong glass-melting agent, it tends to lower the coefficient of thermal expansion of the glass and also lower the strain point. Therefore, Li 2 O is appropriately introduced in a range of 3% or less in the glass. is there.

【0019】Na2OはK2O とともに主要なガラス溶融剤と
して作用し、またガラスの熱膨張率を適度な高さに維持
するうえで不可欠である。Na2Oがガラス中7%未満であ
ると、ガラス溶融が不充分となり、均質性、清澄性も損
なう。他方10%を超えるとガラスの歪点が低下し過ぎ、
耐水性、耐薬品性も劣化する。従って7〜10%の範囲で
導入する。
Na 2 O, together with K 2 O, acts as a main glass melting agent, and is indispensable for maintaining the coefficient of thermal expansion of the glass at an appropriate level. If Na 2 O is less than 7% in the glass, glass melting becomes insufficient, and homogeneity and clarity are also impaired. On the other hand, if it exceeds 10%, the strain point of the glass becomes too low,
Water resistance and chemical resistance also deteriorate. Therefore, it is introduced in the range of 7 to 10%.

【0020】K2O は上記理由、およびNa2Oとの混合アル
カリ効果によりアルカリイオンのガラス中での移動を抑
制し、ガラスの体積抵抗率を高める。2%未満であると
それら作用が不充分であり、5%を超えると熱膨張率が
過大となり、また歪点も低下し過ぎるため、2〜5%の
範囲とする。また、ガラス比重をより低くするうえで
は、2〜4%の範囲とするのがよい。
K 2 O suppresses migration of alkali ions in the glass due to the above-mentioned reason and the mixed alkali effect with Na 2 O, and increases the volume resistivity of the glass. If it is less than 2%, their effects are insufficient, and if it exceeds 5%, the coefficient of thermal expansion becomes excessive and the strain point is too low. In order to further reduce the glass specific gravity, it is preferable to set the range of 2 to 4%.

【0021】前記アルカリ金属酸化物 (Li2O、Na2O、K2
O ) の量に関し、そのガラス中の合計量を9〜14%とす
ることにより、ガラスの歪点、熱膨張率、高温粘度およ
び失透温度を適切な範囲に維することができる。アルカ
リ金属酸化物の合計量が9%未満では熱膨張率が低下
し、失透傾向が増大する。14%を越えるとガラスの歪点
が低下し過ぎるうえに、比重を増大し、体積抵抗率が低
下する。従って9〜14%の範囲とするものであるが、特
にガラスの易溶融性を考慮すれば、12〜14%の範囲がよ
い。
The alkali metal oxides (Li 2 O, Na 2 O, K 2
By setting the total amount of O 2) in the glass to 9 to 14%, the strain point, the coefficient of thermal expansion, the high-temperature viscosity and the devitrification temperature of the glass can be kept in appropriate ranges. If the total amount of the alkali metal oxides is less than 9%, the coefficient of thermal expansion decreases, and the tendency to devitrify increases. If it exceeds 14%, the strain point of the glass will be too low, and the specific gravity will increase, and the volume resistivity will decrease. Accordingly, the range is set to 9 to 14%, but the range is preferably set to 12 to 14% in consideration of easy melting property of glass.

【0022】本発明において、原料バッチ中に塩化物、
フッ化物を導入するのが望ましく、例えばCaF2、MgF2
NaCl、CaCl2 等の金属フッ化物、塩化物を導入すること
により、ガラス融液の粘度、表面張力を降下させ溶融、
清澄性を向上し、かつ電気溶融法を採用した場合におい
ては電極を変質劣化させないうえで有効であるが、フッ
素、または塩素分として原料バッチのガラス換算量 (酸
化物)100重量%に対して0.5 重量%以下外挿添加するの
が肝要であり、0.5 重量%を超えると炉材の侵食等が激
しくなる傾向があるうえに、ガラスの歪点を低下させ
る。
In the present invention, chloride,
It is desirable to introduce fluoride, for example CaF 2 , MgF 2 ,
By introducing metal fluorides and chlorides such as NaCl and CaCl 2 to lower the viscosity and surface tension of the glass melt,
It is effective to improve the clarity and to prevent the electrode from being deteriorated and deteriorated when the electro-melting method is used. However, the amount of fluorine or chlorine is 100% by weight of the raw material batch in terms of glass (oxide) in terms of glass. It is important to add 0.5 wt% or less extrapolated, and if it exceeds 0.5 wt%, the erosion of the furnace material tends to be severe and the strain point of the glass is lowered.

【0023】さらにガラスの溶融、清澄性を向上させる
原料としては硝酸塩の導入が好ましい。すなわち例えば
硝酸バリウム、硝酸ナトリウム、硝酸カリウム等の原料
形態で原料バッチ中に導入するが、硝酸塩の殆どはガラ
スの初期溶融の過程で酸素を発生し、S 、FeおよびTiの
ようなガラス中の微量還元成分を酸化状態に維持するた
め、これら還元成分がモリブデン等の電極と反応して電
極が損耗するような弊害を抑制する。
Further, nitrate is preferably introduced as a raw material for improving the melting and refining properties of the glass. That is, for example, barium nitrate, sodium nitrate, and potassium nitrate are introduced into a raw material batch in the form of raw materials, but most of nitrates generate oxygen during the initial melting of the glass, and trace amounts of S, Fe, and Ti in the glass. In order to maintain the reduced components in an oxidized state, the adverse effects such that these reduced components react with an electrode of molybdenum or the like to wear the electrodes are suppressed.

【0024】硝酸塩はNO3 として原料バッチのガラス換
算量 (酸化物)100重量%に対して4重量%以下、さらに
望ましくは 1〜 4重量%の範囲で外挿添加するのが好ま
しい。 4重量%を超えると原料バッチの溶解速度が過大
となり、安定した溶融状態を得るのが困難となる。前記
塩化物、フッ化物または硝酸塩は必要に応じ適宜導入す
るもので、両者を併存させてもよい。
The nitrate is preferably extrapolated as NO 3 in an amount of 4% by weight or less, more preferably in the range of 1 to 4% by weight, based on 100% by weight (oxide) in terms of glass of the raw material batch. If it exceeds 4% by weight, the dissolution rate of the raw material batch becomes excessive, and it is difficult to obtain a stable molten state. The above-mentioned chloride, fluoride or nitrate is appropriately introduced as needed, and both may be used together.

【0025】本発明において、直接通電による電気溶融
法を採用する場合は、汎用されるモリブデン等の電極と
反応して合金を形成したりするようなことは避けねばな
らず、従って原料バッチ中に清澄剤としてのAs2O3 、Sb
2O3 およびS分、硫酸塩(ガラス中に一部SO3 として残
留する) は少量(0.3%以下)に留めるべきである。ま
た、反応性を有するZnO 原料の混入は避けた方がよい。
In the present invention, when the electric melting method by direct energization is employed, it is necessary to avoid forming an alloy by reacting with a commonly used electrode such as molybdenum. As 2 O 3 , Sb as fining agent
The 2 O 3 and S content, sulfates (partially remaining as SO 3 in the glass) should be kept in small amounts (0.3% or less). It is better to avoid the incorporation of a reactive ZnO raw material.

【0026】さらにフロート法成形による量産を容易と
し、成形時の窒素および水素等の還元雰囲気下で揮発し
たり、ガラスに着色を与えないようにするために、PbO
、ZnO 等の揮発成分の混入も避けるべきである。
Further, in order to facilitate mass production by float molding, and to prevent volatilization under a reducing atmosphere such as nitrogen and hydrogen during molding and to prevent coloring of the glass, PbO is used.
Volatile components such as ZnO and ZnO should be avoided.

【0027】本発明においては、ガラス比重を2.60以下
としたことにより、特に大サイズ化しつつあるPDP等
の表示装置の軽量化、取扱容易性を高めることができ
る。また、ガラスの歪点 (ガラスが粘度1014.5ポイズを
示す温度) を 570℃以上としたことにより、500 ℃を越
える各種繰返し熱処理に対しても基板ガラスが歪んだり
することがなく、更に熱膨張率 (室温〜300 ℃) を80×
10-7/℃以上に、かつ90×10-7/℃付近まで調整するこ
とができるので、厚膜等(熱膨張率は、その組成にもよ
るが略80〜90×10-7/℃である) との熱膨張率差を僅少
とし、又は無くし、それらとの密着性を良好としたガラ
スが得られる。加えて成形作業をするうえで基準となる
ガラス粘度である104 ポイズになる温度を、1200℃以下
とすることができ、失透温度を104 ポイズ温度より10℃
以上低くしたことにより、成形作業を容易とするもので
ある。
In the present invention, by setting the glass specific gravity to 2.60 or less, it is possible to increase the weight and ease of handling of a display device such as a PDP, which is becoming larger in size. In addition, by setting the glass strain point (the temperature at which the glass exhibits a viscosity of 10 14.5 poise) to 570 ° C or higher, the substrate glass does not become distorted even after various heat treatments exceeding 500 ° C, and the thermal expansion is further improved. Rate (room temperature to 300 ° C)
Since it can be adjusted to 10 -7 / ° C or more and up to around 90 × 10 -7 / ° C, a thick film or the like (the coefficient of thermal expansion depends on the composition, but is approximately 80 to 90 × 10 -7 / ° C) A glass having a small or no difference in the coefficient of thermal expansion from the above and having good adhesion to them is obtained. In addition, the temperature at which the glass viscosity becomes 10 4 poise, which is the reference for molding work, can be set to 1200 ° C. or less, and the devitrification temperature is 10 ° C. lower than 10 4 poise temperature.
The above lowering facilitates the molding operation.

【0028】[0028]

【実施例】珪砂、水酸化アルミニウム、無水硼酸、炭酸
マグネシウム、炭酸カルシウム、炭酸バリウム、炭酸ス
トロンチウム、ジルコン砂、炭酸リチウム、炭酸ナトリ
ウム、炭酸カリウム、フッ化カルシウムおよび硝酸バリ
ウムよりなる調合原料を白金製耐火坩堝に充填し電気炉
内で1500℃、約 4時間加熱溶融した。次に溶融ガラスを
鋳型に流し込み、約 200mm□×35mm厚の大きさのガラス
ブロックとし、 630℃に保持した電気炉に移入して該炉
内で徐冷した。
[Example] Platinum was used as a raw material composed of silica sand, aluminum hydroxide, boric anhydride, magnesium carbonate, calcium carbonate, barium carbonate, strontium carbonate, zircon sand, lithium carbonate, sodium carbonate, potassium carbonate, calcium fluoride, and barium nitrate. The mixture was filled in a refractory crucible and melted by heating at 1500 ° C for about 4 hours in an electric furnace. Next, the molten glass was poured into a mold to form a glass block having a size of about 200 mm □ × 35 mm, transferred to an electric furnace maintained at 630 ° C., and gradually cooled in the furnace.

【0029】原料調合に基づくガラス (酸化物) 組成を
表1、表2に示す。なおいずれのケースにおいても、Ca
F2のかたちで導入されるF 分、Ba(NO3)2のかたちで導入
されるNO3 分についてはガラス酸化物成分計100 wt%に
対する外挿添加・導入量 (wt%) としてF 0.2 %、NO3
0.3 %と共通とした。
Tables 1 and 2 show the glass (oxide) composition based on the raw material preparation. In each case, Ca
Regarding the F component introduced in the form of F 2 and the NO 3 component introduced in the form of Ba (NO 3 ) 2 , the amount of extrapolated addition / introduction (wt%) relative to 100 wt% of the total glass oxide component is F 0.2 %, NO 3
Common with 0.3%.

【0030】これらのガラス試料について、室温〜 300
℃における平均熱膨張率( X10-7/℃) 、歪点 (ガラス
が粘度1014.5ポイズを示す温度) 、転移点(熱膨張率測
定に際する温度−膨張量勾配の変化 <転移> 点)、溶融
温度(ガラスが粘度102 ポイズを示す温度)、成形温度
(ガラスが粘度104 ポイズを示す温度=104 ポイズ温
度)、失透温度(ガラスを一定温度に2時間維持して失
透が生ずる上限温度)、作業温度範囲(上記成形温度−
失透温度)、およびガラス比重を測定した。それらの結
果を表1(実施例)、表2(実施例、比較例)に示す。
For these glass samples, room temperature to 300
Average coefficient of thermal expansion in ° C (X10 -7 / ° C), strain point (temperature at which glass exhibits a viscosity of 10 14.5 poise), transition point (change in temperature-expansion gradient when measuring thermal expansion coefficient <transition> point) , (the temperature at which the glass exhibits a viscosity of 10 2 poises) melt temperature, mold temperature
(Temperature glass exhibits a viscosity of 10 4 poise = 10 4 poise temperature), (upper limit temperature devitrification occurs maintained 2 hours glass at a constant temperature) the devitrification temperature, the working temperature range (the molding temperature -
Devitrification temperature), and glass specific gravity. The results are shown in Table 1 (Example) and Table 2 (Example, Comparative Example).

【0031】 〔表1・実施例〕 実 施 例 (wt%) 1 2 3 4 5 6 7 SiO2* 62.1 62.5 62.6 62.8 61.3 60.8 60.6 Al2O3* 9.6 9.6 9.7 9.7 11.9 11.9 11.8 ZrO2* 2.5 2.5 2.5 2.5 2.5 2.3 2.5B2O3 0 0 0 0 0 0 0 *小計 74.2 74.6 74.8 75.0 75.7 75.0 74.9 Li2O 0 0 0 0 0.5 0.5 0 Na2O 8.1 8.2 8.2 8.2 8.2 8.2 8.1K2O 4.5 4.5 4.5 4.6 3.0 2.9 4.5 小計 12.6 12.7 12.7 12.8 11.7 11.6 12.6 MgO 2.0 2.0 2.5 3.1 2.0 2.5 3.0 CaO 7.6 7.7 7.0 6.1 7.7 7.7 6.6 SrO 1.6 3.1 3.1 3.1 3.1 3.2 3.0BaO 2.1 0 0 0 0 0 0 小計 13.3 12.7 12.5 12.3 12.7 13.4 12.6 熱膨張率(X10ー7/・c) 83 85 82 82 82 83 83 歪点 581 580 573 575 573 574 593 転移点 620 620 610 612 605 610 632 溶融温度 1554 1576 1576 1594 1596 1599 1594 成形温度 1138 1142 1146 1156 1160 1173 1152 失透温度 1120 1129 1108 1100 1110 1109 1120 作業温度範囲 18 13 38 56 50 64 32 比重 2.59 2.58 2.59 2.59 2.59 2.59 2.59 (注:各成分、小計のwt%表示において下位数値は四捨五入した)[Table 1 Example] Example (wt%) 1 2 3 4 5 6 7 SiO 2 * 62.1 62.5 62.6 62.8 61.3 60.8 60.6 Al 2 O 3 * 9.6 9.6 9.7 9.7 11.9 11.9 11.8 ZrO 2 * 2.5 2.5 2.5 2.5 2.5 2.3 2.5 B 2 O 3 0 0 0 0 0 0 0 * Subtotal 74.2 74.6 74.8 75.0 75.7 75.0 74.9 Li 2 O 0 0 0 0 0.5 0.5 0 Na 2 O 8.1 8.2 8.2 8.2 8.2 8.2 8.1 K 2 O 4.5 4.5 4.5 4.6 3.0 2.9 4.5 Subtotal 12.6 12.7 12.7 12.8 11.7 11.6 12.6 MgO 2.0 2.0 2.5 3.1 2.0 2.5 3.0 CaO 7.6 7.7 7.0 6.1 7.7 7.7 6.6 SrO 1.6 3.1 3.1 3.1 3.1 3.2 3.0 BaO 2.1 0 0 0 0 0 0 0 Subtotal 13.3 12.7 12.5 12.3 12.7 13.4 12.6 thermal expansion coefficient (X10 over 7 / · c) 83 85 82 82 82 83 83 strain point 581 580 573 575 573 574 593 transition 620 620 610 612 605 610 632 melt temperature 1554 1576 1576 1594 1596 1599 1594 molding Temperature 1138 1142 1146 1156 1160 1173 1152 Devitrification temperature 1120 1129 1108 1100 1110 1109 1120 Working temperature range 18 13 38 56 50 64 32 Specific gravity 2.59 2.58 2.59 2.59 2.59 2.59 2.59 (Note: Lower numerical values in each component, subtotal wt% display) Is rounded

【0032】 〔表2・実施例、比較例〕 実 施 例 比 較 例 (wt%) 8 9 1 2 3 4 5 SiO2* 61.3 63.4 67.1 65.0 61.5 54.0 57.7 Al2O3* 10.0 9.8 6.1 12.0 9.5 9.0 6.5 ZrO2* 2.5 2.5 1.3 2.0 2.5 3.7 3.0 B2O3 1.3 0 0 0 0 0 0 *小計 73.8 75.7 74.5 79.0 73.5 66.7 67.2 Li2O 0 0 0 0 0 0 0 Na2O 7.6 8.3 7.3 7.0 8.0 4.0 4.5 K2O 4.7 4.6 2.7 2.0 4.5 9.0 6.6 小計 12.3 12.9 10.0 9.0 12.5 13.0 11.1 MgO 2.0 5.4 3.6 4.0 2.0 3.0 1.8 CaO 7.5 3.0 9.8 8.0 7.5 7.7 5.1 SrO 3.1 3.1 0 0 0 0 7.0 BaO 0 0 2.1 0 4.5 9.6 8.0 小計 12.6 11.5 15.5 12.0 14.0 20.3 21.9 熱膨張率(X10ー7/・c) 82 82 77 72 83 85 81 歪点 575 589 592 631 598 603 581 転移点 622 630 634 670 623 637 627 溶融温度 1575 1600 1590 1650 1557 1506 1538 成形温度 1130 1194 1170 1225 1130 1129 1135 失透温度 1115 1106 1175 1202 1129 1115 1065 作業温度範囲 15 88 ー5 23 1 14 70 比重 2.59 2.58 2.62 2.52 2.59 2.74 2.77 (注:各成分、小計のwt%表示において下位数値は四捨五入した)[Table 2-Examples and Comparative Examples]Example Comparative example (wt%) 8 9 1 2 3 4 5 SiOTwo* 61.3 63.4 67.1 65.0 61.5 54.0 57.7 AlTwoOThree* 10.0 9.8 6.1 12.0 9.5 9.0 6.5 ZrOTwo* 2.5 2.5 1.3 2.0 2.5 3.7 3.0 B 2 O 3 1.3 0 0 0 0 0 0 * Subtotal 73.8 75.7 74.5 79.0 73.5 66.7 67.2 LiTwoO 0 0 0 0 0 0 0 NaTwoO 7.6 8.3 7.3 7.0 8.0 4.0 4.5 K 2 O 4.7 4.6 2.7 2.0 4.5 9.0 6.6 Subtotal 12.3 12.9 10.0 9.0 12.5 13.0 11.1 MgO 2.0 5.4 3.6 4.0 2.0 3.0 1.8 CaO 7.5 3.0 9.8 8.0 7.5 7.7 5.1 SrO 3.1 3.1 0 0 0 0 7.0 BaO 0 0 2.1 0 4.5 9.6 8.0 Subtotal 12.6 11.5 15.5 12.0 14.0 20.3 21.9 Thermal expansion coefficient (X10-7/ ・ C) 82 82 77 72 83 85 81 Strain point 575 589 592 631 598 603 581 Transition point 622 630 634 670 623 637 627 Melting temperature 1575 1600 1590 1650 1557 1506 1538 Molding temperature 1130 1194 1170 1225 1130 1129 1135 Devitrification temperature 1115 1106 1175 1202 1129 1115 1065 Working temperature range 15 88 -5 23 1 14 70 Specific gravity 2.59 2.58 2.62 2.52 2.59 2.74 2.77

【0033】表1、表2中実施例NO.1〜 NO.9は本発明
におけるガラスであり、102 ポイズ温度が1600℃以下で
あって、電気溶融等により、容易に溶融、清澄化でき
る。10 4 ポイズ温度を1200℃以下とし、失透温度を104
ポイズ温度より10℃以上低くしたことにより、成形性も
容易としフロート法成形に適する。ガラスの歪点は570
℃以上で耐熱性が良好である。熱膨張率は80×10-7/℃
以上で電極や厚膜との熱膨張率に近似している。またガ
ラス比重を2.60以下としたことにより、大サイズ化しつ
つある表示装置の軽量化、取扱容易性を高めることがで
きる。更に、表示しないが体積抵抗率も109 Ω.cm 以上
で電気絶縁性に優れ、表示装置用基板ガラス、殊にPD
P用の基板ガラスとして好適である。
Examples 1 to 9 in Tables 1 and 2 show the present invention.
Is the glass inTwo When poise temperature is below 1600 ℃
It can be easily melted and clarified by electric melting, etc.
You. Ten Four Poise temperature is 1200 ° C or less and devitrification temperature is 10Four 
Moldability is also reduced by lowering the poise temperature by 10 ° C or more.
Easy and suitable for float molding. The strain point of the glass is 570
Good heat resistance above ℃. The coefficient of thermal expansion is 80 × 10-7/ ℃
The above approximates the coefficient of thermal expansion with the electrode and the thick film. In addition
By reducing the specific gravity of the lath to 2.60 or less, the size has been increased.
Display devices can be made lighter and easier to handle.
Wear. Furthermore, although not indicated, the volume resistivity is 109 Ω.cm or more
Excellent in electrical insulation and substrate glass for display device, especially PD
It is suitable as a substrate glass for P.

【0034】[0034]

【発明の効果】本発明のガラスは、ガラスの熱膨張率、
歪点、ガラス比重等の点で表示装置用基板ガラス、特に
PDP用の基板ガラスとして好適であり、またガラスの
溶融性も良好で、直接通電法による溶融およびフロート
法による成形に適し、均質なガラスを連続的に低いコス
トで製造することができ、量産に適するという効果を奏
する。
The glass of the present invention has a coefficient of thermal expansion of glass,
In terms of strain point, glass specific gravity, etc., it is suitable as a substrate glass for display devices, in particular, a substrate glass for PDP, and has a good melting property of glass, and is suitable for melting by a direct current method and molding by a float method, Glass can be manufactured continuously at a low cost, which is advantageous for mass production.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】wt%で、SiO2 61〜65、Al2O3 9〜13、Zr
O2 0.5〜3.5 、SiO2+Al2O3 +ZrO271〜78、MgO 1〜
6、CaO 3〜9、SrO 1〜5、BaO 0〜5、MgO +CaO
+Sr0 +BaO 10〜15、Li2O 0〜3、Na2O 7〜10、K2
O 1〜5、Li2O+Na2O+K2O9〜14の範囲で含有し、ガ
ラス比重が2.60以下、ガラスの歪点が 570℃以上、ガラ
スの104 ポイズ温度が1200℃以下であり、104 ポイズ温
度−失透温度の温度差が10℃以上、かつガラスの室温か
ら 300℃における熱膨張率が80×10-7/℃以上であるこ
とを特徴とする表示装置用基板ガラス組成物。
(1) In terms of wt%, SiO 2 61-65, Al 2 O 3 9-13, Zr
O 2 0.5-3.5, SiO 2 + Al 2 O 3 + ZrO 2 71-78, MgO 1-
6, CaO 3-9, SrO 1-5, BaO 0-5, MgO + CaO
+ Sr0 + BaO 10~15, Li 2 O 0~3, Na 2 O 7~10, K 2
O 1 to 5, incorporated within a range of Li 2 O + Na 2 O + K 2 O9~14, glass specific gravity of 2.60 or less, the strain point of the glass is 570 ° C. or higher, 10 4 poise temperature of the glass is at 1200 ° C. or less, 10 4 A substrate glass composition for a display device, wherein the temperature difference between the poise temperature and the devitrification temperature is 10 ° C. or more, and the coefficient of thermal expansion of the glass from room temperature to 300 ° C. is 80 × 10 −7 / ° C. or more.
JP9352645A 1997-12-22 1997-12-22 Substrate glass composition for display device Pending JPH11180727A (en)

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