JP2000203874A - Glass for substrate - Google Patents
Glass for substrateInfo
- Publication number
- JP2000203874A JP2000203874A JP11182346A JP18234699A JP2000203874A JP 2000203874 A JP2000203874 A JP 2000203874A JP 11182346 A JP11182346 A JP 11182346A JP 18234699 A JP18234699 A JP 18234699A JP 2000203874 A JP2000203874 A JP 2000203874A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- substrate
- thermal expansion
- sro
- bao
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、破壊の進行に対す
る抵抗力が大きい基板用ガラス、すなわち破壊じん性の
大きな基板用ガラスに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass for a substrate having a high resistance to the progress of breaking, that is, a glass for a substrate having a high breaking toughness.
【０００２】[0002]
【従来の技術】近年、カラープラズマディスプレイパネ
ル（以下カラーＰＤＰという。）に代表される大型フラ
ットディスプレイパネルが普及しつつあり、その基板と
して使用されるガラスも多種多様化している。従来よ
り、通常のソーダ石灰ガラスが大型フラットディスプレ
イパネル用基板として広く使用されてきた。その理由の
ひとつは、無機シール材料をはじめとして、パネルの構
成部材として使用される様々なガラスフリット材料の熱
膨張係数をソーダ石灰ガラスの熱膨張係数と整合させや
すいからであった。2. Description of the Related Art In recent years, large flat display panels typified by color plasma display panels (hereinafter referred to as color PDPs) have become widespread, and glass used as substrates thereof has been diversified. Conventionally, ordinary soda-lime glass has been widely used as a substrate for a large flat display panel. One of the reasons is that it is easy to match the thermal expansion coefficients of various glass frit materials used as components of the panel, including the inorganic sealing material, with the thermal expansion coefficient of soda-lime glass.
【０００３】一方、大型フラットディスプレイパネル製
造工程の熱処理プロセスにおけるガラス基板の変形や熱
収縮を小さくするために、基板用ガラスの耐熱性向上へ
の強い要求がある。そのため、ソーダ石灰ガラスと同等
の熱膨張係数を有し、かつ、より高い歪点（約５５０℃
以上）を有し、かつ、電気絶縁性を高めるためにアルカ
リ含有量を低く抑えた、いわゆる高歪点ガラスが基板と
して広く使用されている。On the other hand, in order to reduce deformation and thermal shrinkage of a glass substrate in a heat treatment process in a large flat display panel manufacturing process, there is a strong demand for improving heat resistance of glass for a substrate. Therefore, it has a thermal expansion coefficient equivalent to that of soda-lime glass, and has a higher strain point (about 550 ° C.).
So-called high strain point glass having the above-mentioned characteristics and having a low alkali content in order to enhance electrical insulation is widely used as a substrate.
【０００４】また、情報記録媒体用基板、特に磁気ディ
スク（ハードディスク）用基板として、表面の平滑性
や、耐衝撃性などの機械的強度が優れているために、ガ
ラス基板が実用化されている。Further, as substrates for information recording media, particularly substrates for magnetic disks (hard disks), glass substrates have been put to practical use because of their excellent surface smoothness and mechanical strength such as impact resistance. .
【０００５】[0005]
【発明が解決しようとする課題】しかし、これらの高歪
点ガラスはソーダ石灰ガラスと比較すると脆く、製造工
程中に割れやすい問題があった。また、前記高歪点ガラ
スは比重が大きく、大型フラットディスプレイパネルの
軽量化が困難である問題もあった。However, these high strain point glasses are more brittle than soda-lime glass, and have a problem that they are easily broken during the manufacturing process. In addition, the high strain point glass has a large specific gravity, so that it is difficult to reduce the weight of a large flat display panel.
【０００６】これらの問題を解決すべく、密度が小さく
かつキズがつきにくい、フラットパネルディスプレイ用
基板に好適な基板用ガラスが提案されている（特開平９
−３０１７３３）。しかし、キズがつきにくいという特
性は、破壊の起点となるキズがパネルの製造工程におい
てつく場合に対しては有効であるが、キズが前記製造工
程前の切断等の加工処理中につく場合には必ずしも有効
とはいえない。そして切断等の加工処理中にガラスのエ
ッジ部にはすでに破壊起点となりうるキズが多数存在し
ているのが通常である。In order to solve these problems, there has been proposed a glass for a substrate suitable for a substrate for a flat panel display, which has a small density and is hardly scratched (Japanese Patent Laid-Open No. 9-1997).
-301733). However, the property that scratches are unlikely to be formed is effective when the scratches that are the starting points of destruction are formed during the panel manufacturing process, but when the scratches are formed during processing such as cutting before the manufacturing process. Is not always effective. Usually, during processing such as cutting, a large number of scratches that can serve as fracture starting points already exist at the edge of the glass.
【０００７】また、磁気ディスク用基板としてガラスを
用いる場合にも、円形加工、芯抜き、内外周面面取り
（チャンファリング）、等多くの加工処理が必要とな
る。これらの加工処理中に、やはりガラスのエッジ部等
に破壊起点となりうるキズが多数発生し、製造工程にお
いてのみならず磁気ディスク使用時にもそのキズを破壊
起点としてガラスが割れる問題があった。特に、最近で
は読み書き（ｒｅａｄ／ｗｒｉｔｅ）速度向上のためデ
ィスク回転の高速化が提言されており、この場合ガラス
が割れる問題はより重要となる。Also, when glass is used as a substrate for a magnetic disk, many processing operations such as circular processing, core cutting, chamfering of inner and outer peripheral surfaces are required. During these processings, a large number of scratches can be formed at the edge of the glass and the like, which can serve as a starting point of breakage, and there has been a problem that the glass is broken using the scratches as a starting point of breakage not only in the manufacturing process but also when using a magnetic disk. In particular, recently, it has been proposed to increase the disk rotation speed in order to improve the read / write speed, and in this case, the problem of breaking the glass becomes more important.
【０００８】このような場合にガラスの割れを防止する
ためには、本質的に引張応力による破壊の進行に対する
抵抗力すなわち破壊じん性が高い基板用ガラスを提供す
る必要があった。本発明は以上の課題を解決し、高いガ
ラス転移点を有し、かつ熱膨張係数がソーダ石灰ガラス
と同等であるとともに、破壊の進行に対する抵抗力すな
わち破壊じん性が高く、製造工程で、または使用中に割
れにくい基板用ガラスの提供を目的とする。In such a case, in order to prevent the glass from cracking, it was necessary to provide a glass for a substrate having essentially high resistance to the progress of fracture due to tensile stress, ie, high fracture toughness. The present invention solves the above problems, has a high glass transition point, has a thermal expansion coefficient equivalent to that of soda-lime glass, and has high resistance to the progress of fracture, that is, high fracture toughness, An object of the present invention is to provide a glass for a substrate that is not easily broken during use.
【０００９】[0009]
【課題を解決するための手段】本発明は、重量％表示で
実質的に、 ＳｉＯ2 ４５〜６５、 Ａｌ2 Ｏ3 ６〜２０、 Ｂ2 Ｏ3 ０．５〜 ６、 ＭｇＯ ２〜 ５、 ＣａＯ １〜１０、 ＳｒＯ ０〜 ６．５、 ＢａＯ ０〜 ２、 ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ １０〜１７、 ＺｒＯ2 ０〜 ７、 Ｎａ2 Ｏ＋Ｋ2 Ｏ ７〜１５、 からなる基板用ガラスを提供する。According to the present invention, there are provided, in terms of% by weight, substantially: SiO 2 45 to 65, Al 2 O 3 6 to 20, B 2 O 3 0.5 to 6, MgO 2 to 5, Provided is a substrate glass comprising: CaO 1 to 10, SrO 0 to 6.5, BaO 0 to 2, MgO + CaO + SrO + BaO 10 to 17, ZrO 2 0 to 7, and Na 2 O + K 2 O 7 to 15.
【００１０】[0010]
【発明の実施の形態】本発明でいう基板用ガラスとは、
カラーＰＤＰ、プラズマアドレス液晶（ＰＡＬＣ）、フ
ィールドエミッションディスプレイ（ＦＥＤ）等のフラ
ットパネルディスプレイ用の基板や、磁気ディスク等の
情報記録媒体用の基板に用いられるガラスである。本発
明の基板用ガラスはフロート成形に適する。BEST MODE FOR CARRYING OUT THE INVENTION The glass for a substrate according to the present invention is
Glass used for a substrate for a flat panel display such as a color PDP, a plasma addressed liquid crystal (PALC), and a field emission display (FED), and a substrate for an information recording medium such as a magnetic disk. The glass for a substrate of the present invention is suitable for float molding.
【００１１】本発明の基板用ガラスは、重量％表示で実
質的に、 ＳｉＯ2 ４５〜６５、 Ａｌ2 Ｏ3 １０〜２０、 Ｂ2 Ｏ3 １〜 ６、 ＭｇＯ ２〜 ５、 ＣａＯ １〜１０、 ＳｒＯ ０〜 ４．５、 ＢａＯ ０〜 ２、 ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ １０〜１７、 ＺｒＯ2 ０〜 ５、 Ｎａ2 Ｏ＋Ｋ2 Ｏ ７〜１５、 からなることが好ましい。The glass for a substrate according to the present invention is substantially expressed in terms of% by weight: SiO 2 45 to 65, Al 2 O 3 10 to 20, B 2 O 3 1 to 6, MgO 2 to 5, CaO 1 to 10 , SrO 0~ 4.5, BaO 0~ 2 , MgO + CaO + SrO + BaO 10~17, ZrO 2 0~ 5, Na 2 O + K 2 O 7~15, preferably made of.
【００１２】本発明における組成の限定理由は以下のと
おりである（以下では特記しないかぎり重量％を単に％
と表記する。）。ＳｉＯ2 はネットワークフォーマーで
あり必須である。６５％超では５０〜３５０℃の平均熱
膨張係数（以下単に熱膨張係数という。）が小さくなり
すぎるおそれがある。好ましくは５９％以下、より好ま
しくは５５％以下、特に好ましくは５４％以下である。
４５％未満では耐熱性および化学的耐久性が低下するお
それがある。好ましくは５０％以上である。[0012] The reasons for limiting the composition in the present invention are as follows (hereinafter, unless otherwise specified, weight% is simply referred to as%
Notation. ). SiO 2 is a network former and is essential. If it exceeds 65%, the average coefficient of thermal expansion at 50 to 350 ° C (hereinafter simply referred to as the coefficient of thermal expansion) may be too small. It is preferably at most 59%, more preferably at most 55%, particularly preferably at most 54%.
If it is less than 45%, heat resistance and chemical durability may decrease. Preferably it is 50% or more.
【００１３】Ａｌ2 Ｏ3 はガラス転移点を高くし、また
耐熱性を高くする効果があり、必須成分である。２０％
超では熱膨張係数が小さくなりすぎるおそれがあり、ま
た溶融ガラスの粘度が高くなりすぎてフロート成形が困
難になる。好ましくは１６％以下である。６％未満では
前記効果が小さい。好ましくは１０％以上、より好まし
くは１２％以上である。なお、溶融ガラスが直接接触す
る部分にＡＺＳ（Ａｌ2 Ｏ3 −ＺｒＯ2 −ＳｉＯ2 ）系
電鋳煉瓦が使用されているガラス溶融窯において本発明
の基板用ガラスを溶融する場合は、Ａｌ2 Ｏ3 の含有量
は６％以上１０％未満であることが好ましい。１０％以
上ではＡＺＳ系電鋳煉瓦に対する溶融ガラスの侵食性が
大きくなるおそれがある。Al 2 O 3 has an effect of increasing the glass transition point and heat resistance, and is an essential component. 20%
If it is too high, the coefficient of thermal expansion may be too small, and the viscosity of the molten glass may be too high to make float molding difficult. Preferably it is 16% or less. If it is less than 6%, the effect is small. It is preferably at least 10%, more preferably at least 12%. In the case of melting glass substrate of the present invention in a glass melting furnace in which the molten glass is direct contact with AZS in part (Al 2 O 3 -ZrO 2 -SiO 2) based electroforming brick is used, Al 2 The content of O 3 is preferably at least 6% and less than 10%. If it is 10% or more, the erosion of the molten glass on the AZS-based electroformed brick may be increased.
【００１４】Ｂ2 Ｏ3 は破壊じん性を高くし、またガラ
ス溶解時の溶融ガラスの粘度を低下させる効果があり、
必須成分である。６％超では熱膨張係数が小さくなりす
ぎる、または、ガラス溶解時のＢ2 Ｏ3 揮散が多くなり
すぎるおそれがある。好ましくは５％以下である。０．
５％未満では前記効果が小さい。好ましくは１％以上、
より好ましくは２％以上である。前記効果を大きくする
ためには２．６〜５％とすることが好ましい。なお、ガ
ラス溶解窯炉材の揮散Ｂ2 Ｏ3 による損傷を抑制するた
めには、０．５〜２．５％とすることが好ましく、０．
５〜１％未満とすることがより好ましい。B 2 O 3 has the effect of increasing the fracture toughness and reducing the viscosity of the molten glass when the glass is melted.
It is an essential component. If it exceeds 6%, the coefficient of thermal expansion may be too small, or the volatilization of B 2 O 3 during melting of the glass may be too large. Preferably it is 5% or less. 0.
If it is less than 5%, the effect is small. Preferably 1% or more,
It is more preferably at least 2%. In order to increase the effect, the content is preferably set to 2.6 to 5%. In order to suppress the damage of the furnace material of the glass melting furnace due to volatilization B 2 O 3 , the content is preferably 0.5 to 2.5%.
More preferably, it is less than 5 to 1%.
【００１５】ＭｇＯは破壊じん性を高くし、またガラス
溶解時の溶融ガラスの粘度を低下させる効果があり、必
須成分である。５％超ではガラスが不安定になるおそれ
がある。好ましくは４％以下である。２％未満では前記
効果が小さい。好ましくは３％以上である。MgO has an effect of increasing fracture toughness and lowering the viscosity of molten glass when the glass is melted, and is an essential component. If it exceeds 5%, the glass may be unstable. Preferably it is 4% or less. If it is less than 2%, the effect is small. It is preferably at least 3%.
【００１６】ＣａＯは熱膨張係数を大きくし、またガラ
ス溶解時の溶融ガラスの粘度を低下させる効果があり、
必須成分である。１０％超ではガラスが不安定になるお
それがある。好ましくは９％以下である。１％未満では
前記効果が小さい。好ましくは５％以上、より好ましく
は６％以上である。CaO has the effect of increasing the coefficient of thermal expansion and reducing the viscosity of the molten glass when the glass is melted.
It is an essential component. If it exceeds 10%, the glass may be unstable. Preferably it is 9% or less. If it is less than 1%, the effect is small. It is preferably at least 5%, more preferably at least 6%.
【００１７】ＳｒＯは必須ではないが、熱膨張係数を大
きくし、またガラス溶解時の溶融ガラスの粘度を低下さ
せる効果があり、６．５％までは添加してもよい。６．
５％超では比重が大きくなりすぎるおそれがある。好ま
しくは４．５％以下、より好ましくは４％以下、特に好
ましくは３％以下である。SrO is not essential, but has the effect of increasing the coefficient of thermal expansion and reducing the viscosity of the molten glass when the glass is melted, and may be added up to 6.5%. 6.
If it exceeds 5%, the specific gravity may be too large. It is preferably at most 4.5%, more preferably at most 4%, particularly preferably at most 3%.
【００１８】ＢａＯは必須ではないが、熱膨張係数を大
きくし、またガラス溶解時の溶融ガラスの粘度を低下さ
せる効果があり、２％までは添加してもよい。２％超で
は比重が大きくなりすぎるおそれがある。好ましくは１
％以下である。Although BaO is not essential, it has the effect of increasing the coefficient of thermal expansion and reducing the viscosity of the molten glass when the glass is melted, and may be added up to 2%. If it exceeds 2%, the specific gravity may be too large. Preferably 1
% Or less.
【００１９】ＳｒＯおよびＢａＯの合量は７％以下であ
ることが好ましい。７％超では比重が大きくなりすぎる
おそれがある。より好ましくは６％以下、特に好ましく
は５％以下である。The total amount of SrO and BaO is preferably at most 7%. If it exceeds 7%, the specific gravity may be too large. It is more preferably at most 6%, particularly preferably at most 5%.
【００２０】ＭｇＯ、ＣａＯ、ＳｒＯおよびＢａＯの合
量は１０〜１７％である。１７％超ではガラスが不安定
になるおそれがある。好ましくは１５％以下である。１
０％未満ではガラス溶解時の溶融ガラスの粘度が高くな
りすぎるおそれがある。好ましくは１２％以上である。The total amount of MgO, CaO, SrO and BaO is 10 to 17%. If it exceeds 17%, the glass may be unstable. Preferably it is 15% or less. 1
If it is less than 0%, the viscosity of the molten glass at the time of melting the glass may be too high. It is preferably at least 12%.
【００２１】ＺｒＯ2 は必須ではないが、破壊じん性を
高くし、ガラス転移点を高くし、また耐アルカリ性を向
上させるために７％までは添加してもよい。７％超では
ガラスが不安定になり、またガラスが傷つきやすくなる
おそれがある。好ましくは５％以下、より好ましくは４
％以下である。なお、アルカリ性洗浄液を用いたガラス
基板洗浄が行われる場合は、ＺｒＯ2 は５％超７％以下
であることが好ましい。ZrO 2 is not essential, but may be added up to 7% in order to increase the fracture toughness, increase the glass transition point, and improve the alkali resistance. If it exceeds 7%, the glass becomes unstable and the glass may be easily damaged. Preferably not more than 5%, more preferably 4%
% Or less. When the glass substrate is cleaned using an alkaline cleaning liquid, ZrO 2 is preferably more than 5% and 7% or less.
【００２２】Ｎａ2 ＯおよびＫ2 Ｏは、熱膨張係数を大
きくし、またガラス溶解時の溶融ガラスの粘度を低下さ
せる効果を有する成分であり、それらの合量は７〜１５
％である。１５％超では化学的耐久性および電気絶縁性
が低下するおそれがある。好ましくは１３％以下であ
る。７％未満では前記効果が小さい。好ましくは９％以
上である。Na 2 O and K 2 O are components having an effect of increasing the coefficient of thermal expansion and decreasing the viscosity of the molten glass when the glass is melted.
%. If it exceeds 15%, chemical durability and electrical insulation may be reduced. Preferably it is 13% or less. If it is less than 7%, the effect is small. It is preferably at least 9%.
【００２３】Ｎａ2 Ｏは１〜１０％であることが好まし
い。１０％超では電気絶縁性が低下するおそれがある。
より好ましくは７％以下、特に好ましくは６％以下であ
る。１％未満では、Ｋ2 Ｏとの共存による混合アルカリ
効果（電気絶縁性の向上）が小さくなる、または、ガラ
ス溶解時の溶融ガラスの粘度を高くするおそれがある。The content of Na 2 O is preferably 1 to 10%. If it exceeds 10%, the electrical insulation may be reduced.
It is more preferably at most 7%, particularly preferably at most 6%. If it is less than 1%, the mixed alkali effect (improved electrical insulation) due to the coexistence with K 2 O may be reduced, or the viscosity of the molten glass at the time of melting the glass may be increased.
【００２４】Ｋ2 Ｏは５〜１４％であることが好まし
い。１４％超では電気絶縁性が低下するおそれがある。
５％未満では、熱膨張係数が小さくなる、または、ガラ
ス転移点が低下するおそれがある。好ましくは７％以上
である。K 2 O is preferably 5 to 14%. If it exceeds 14%, the electrical insulation may be reduced.
If it is less than 5%, the coefficient of thermal expansion may be low, or the glass transition point may be low. It is preferably at least 7%.
【００２５】本発明のガラスは上記成分の他に、ＳＯ
3 、Ａｓ2 Ｏ3 、Ｓｂ2 Ｏ3 、等の清澄剤、Ｆｅ2 Ｏ
3 、ＮｉＯ、ＣｏＯ、等の着色剤を適宜含有しうる。ま
た、電子線等によるブラウニングを防止するために、Ｔ
ｉＯ2 、ＣｅＯ2 をそれぞれ２％以下、合量で２％以
下、の範囲で添加できる。The glass of the present invention has, in addition to the above components, SO
3, As 2 O 3, Sb 2 O 3, fining agents and the like, Fe 2 O
3 , a coloring agent such as NiO, CoO, etc. may be appropriately contained. Further, in order to prevent browning due to an electron beam or the like, T
iO 2 and CeO 2 can be added in a range of 2% or less, respectively, in a total amount of 2% or less.
【００２６】さらに、溶解性を改善するためにＺｎＯを
添加してもよいが、５％以上添加するとフロート成形を
行うフロートバス内で還元されて欠点を生じるおそれが
ある。また、Ｎａ2 Ｏ、Ｋ2 Ｏと同様の効果を得るため
に、Ｌｉ2 Ｏを添加してもよい。ただし、過度の添加は
ガラス転移点の低下をもたらすおそれがあるため、２％
以下とすることが好ましい。Further, ZnO may be added in order to improve the solubility, but if it is added in an amount of 5% or more, it may be reduced in a float bath for performing float forming and may cause defects. Li 2 O may be added in order to obtain the same effect as Na 2 O and K 2 O. However, since excessive addition may cause a decrease in the glass transition point, 2%
It is preferable to set the following.
【００２７】本発明のガラスの破壊じん性は、製造工程
で、または使用中に割れにくいものとするために０．７
０ＭＰａ・ｍ1/2 以上であることが好ましい。本発明の
ガラスの比重は、軽量化のために２．６５未満、特には
２．６以下であることが好ましい。[0027] The fracture toughness of the glass of the present invention is set at 0.7 to make it less likely to break during the manufacturing process or during use.
It is preferably 0 MPa · m 1/2 or more. The specific gravity of the glass of the present invention is preferably less than 2.65, particularly preferably 2.6 or less for weight reduction.
【００２８】本発明のガラスのガラス転移点は、ガラス
基板の熱変形または熱収縮が起りにくくするために、６
００℃以上とすることが好ましい。これは歪点が約５５
０℃以上であることに相当する。本発明のガラスの熱膨
張係数は、ソーダ石灰ガラスと同程度の７５×１０-7〜
９５×１０-7／℃、特には８０×１０-7〜９０×１０-7
／℃であることが好ましい。The glass transition point of the glass of the present invention is 6 in order to prevent the glass substrate from being thermally deformed or contracted.
The temperature is preferably set to 00 ° C. or higher. This means that the strain point is about 55
This corresponds to a temperature of 0 ° C. or higher. The thermal expansion coefficient of the glass of the present invention is 75 × 10 −7 which is almost the same as that of soda-lime glass.
95 × 10 −7 / ° C., particularly 80 × 10 −7 to 90 × 10 −7
/ ° C.
【００２９】本発明の基板用ガラスを用いたガラス基板
は、たとえば次のような方法で製造できる。すなわち、
通常使用される各成分の原料を目標成分になるように調
合し、これを溶解炉に連続的に投入し、１５００〜１６
５０℃に加熱して溶解する。この溶融ガラスをフロート
法により所定の板厚に成形し、徐冷後切断することによ
って、透明なガラス基板を得る。A glass substrate using the glass for a substrate of the present invention can be manufactured, for example, by the following method. That is,
The raw materials of each component usually used are prepared so as to become the target components, and the raw materials are continuously charged into a melting furnace, and are mixed at 1500 to 16
Heat to 50 ° C to dissolve. This molten glass is formed into a predetermined thickness by a float method, gradually cooled, and then cut to obtain a transparent glass substrate.
【００３０】[0030]
【実施例】表の上段に重量％表示で示した組成となるよ
うに原料を調合して白金るつぼに入れ、１５５０〜１６
５０℃に加熱し４〜５時間溶解した。その間白金スター
ラにより２時間撹拌しガラスの均質化を行った。次いで
溶融ガラスを流し出して板状に成形後、徐冷を行った。
表のＲＯ合量およびＭ2 Ｏ合量の欄にはそれぞれ、Ｍｇ
Ｏ、ＣａＯ、ＳｒＯ、ＢａＯの合量、およびＮａ2 Ｏ、
Ｋ2 Ｏの合量を重量％表示で示す。EXAMPLES The raw materials were prepared so as to have the composition shown by weight% in the upper part of the table, put into a platinum crucible,
The mixture was heated to 50 ° C. and dissolved for 4 to 5 hours. During this time, the mixture was stirred with a platinum stirrer for 2 hours to homogenize the glass. Next, the molten glass was poured out, formed into a plate shape, and then gradually cooled.
In the columns of the amount of RO and the amount of M 2 O in the table, respectively,
O, CaO, SrO, the total amount of BaO, and Na 2 O,
The total amount of K 2 O is shown by weight%.
【００３１】得られたガラスについて、比重、破壊じん
性（単位：ＭＰａ・ｍ1/2 ）、熱膨張係数（単位：１０
-7／℃）、ガラス転移点（単位：℃）を、また一部のガ
ラスについては歪点（単位：℃）、溶融状態での粘度
η、および比抵抗ρ（単位：Ω・ｃｍ）も測定した。測
定結果を表に示す。表のｌｏｇη＝４、ｌｏｇη＝２、
の欄に示されているのは、粘度ηがそれぞれ１０4 ポア
ズ、１０2 ポアズ、となる温度（単位：℃）である。前
者はフロート成形性の指標、後者はガラス溶解性の指標
である。また、表のｌｏｇρの欄に示されているのは、
１５０℃におけるρの常用対数である。ρは電気絶縁性
の指標であり、１５０℃においてｌｏｇρが９．５以上
であることが好ましい。About the obtained glass, specific gravity, fracture toughness (unit: MPa · m 1/2 ), thermal expansion coefficient (unit: 10)
-7 / ° C), glass transition point (unit: ° C), and for some glasses, strain point (unit: ° C), viscosity η in the molten state, and specific resistance ρ (unit: Ω · cm). It was measured. The measurement results are shown in the table. In the table, logη = 4, logη = 2,
Are temperatures (unit: ° C.) at which the viscosity η becomes 10 4 poise and 10 2 poise, respectively. The former is an index of float moldability, and the latter is an index of glass solubility. Also, what is shown in the log ρ column of the table is
Common logarithm of ρ at 150 ° C. ρ is an index of electrical insulation, and it is preferable that log ρ at 150 ° C. is 9.5 or more.
【００３２】上記各種測定の方法を以下に示す。 比重：泡を含まない約３０ｇのガラス塊についてアルキ
メデス法により測定した。 破壊じん性：Ｉｎｔ．Ｊ．Ｆｒａｃｔｕｒｅ，１６（１
９８０）１３７〜１４１に記載のシェブロンノッチ法に
より測定した。すなわち、厚さ８ｍｍ、幅８ｍｍ、長さ
８０ｍｍの試験片の中央部にシェブロン型ノッチを形成
した。テンシロン型強度試験装置を用いて、スパン６４
ｍｍに支持した試験片のノッチ先端から安定破壊が起こ
るようにクロスヘッド速度０．００５ｍｍ／分で４点曲
げ試験を行った。上スパンは１６ｍｍとした。なお、水
分によるガラスの疲労効果を避けるため、乾燥Ｎ2 雰囲
気中で測定を行った。The methods for the various measurements are described below. Specific gravity: Measured by an Archimedes method for about 30 g of a glass lump containing no bubbles. Fracture toughness: Int. J. Fracture, 16 (1
980) 137-141. That is, a chevron-type notch was formed at the center of a test piece having a thickness of 8 mm, a width of 8 mm, and a length of 80 mm. Using a Tensilon type strength tester, the span 64
A four-point bending test was performed at a crosshead speed of 0.005 mm / min so that a stable fracture occurred from the notch tip of the test piece supported in mm. The upper span was 16 mm. The measurement was performed in a dry N 2 atmosphere in order to avoid the fatigue effect of the glass due to moisture.
【００３３】熱膨張係数：示差熱膨張計を用いて、石英
ガラスを参照試料として室温から５℃／分の割合で昇温
した際のガラスの伸び率を測定した。測定はガラスが軟
化してもはや伸びが観測されなくなる温度すなわち屈伏
点まで行い、５０〜３５０℃の平均の線熱膨張係数を算
出した。 歪点：ＪＩＳ Ｒ３１０３に規定されている方法により
測定した。 ガラス転移点：上記熱膨張係数測定時に得られた熱膨張
曲線における屈曲点に相当する温度を読み取りガラス転
移点とした。 溶融状態での粘度：回転円筒法により測定した。 比抵抗：ＡＳＴＭ Ｃ６５７に規定されている方法によ
り測定した。Thermal expansion coefficient: Using a differential thermal dilatometer, the elongation of glass was measured when the temperature was raised at a rate of 5 ° C./min from room temperature using quartz glass as a reference sample. The measurement was performed up to the temperature at which the glass was softened and the elongation was no longer observed, that is, the yield point, and the average linear thermal expansion coefficient at 50 to 350 ° C. was calculated. Strain point: Measured by the method specified in JIS R3103. Glass transition point: The temperature corresponding to the inflection point in the thermal expansion curve obtained at the time of measuring the thermal expansion coefficient was read and taken as the glass transition point. Viscosity in molten state: measured by a rotating cylinder method. Specific resistance: measured by a method specified in ASTM C657.
【００３４】表から明らかなように、本発明の実施例で
ある例１〜１３のガラスの破壊じん性は０．７０ＭＰａ
・ｍ1/2 以上であり、破壊の進行に対する抵抗力が高く
なっている。また、比重も２．６５未満であり、ガラス
基板の軽量化が容易である。一方、比較例である例１
４、１５のガラスはそれぞれカラーＰＤＰ用基板、磁気
ディスク用基板として公知のガラスであるが、破壊じん
性が０．７０ＭＰａ・ｍ1/2 未満であり、破壊の進行に
対する抵抗力が低く、製造工程中でまたは使用中に割れ
る確率が高い。As is clear from the table, the fracture toughness of the glasses of Examples 1 to 13 which are examples of the present invention is 0.70 MPa.
-It is m 1/2 or more, and the resistance to the progress of destruction is high. In addition, the specific gravity is less than 2.65, and the weight reduction of the glass substrate is easy. On the other hand, Example 1 which is a comparative example
Glasses Nos. 4 and 15 are known as a substrate for a color PDP and a substrate for a magnetic disk, respectively, but have a fracture toughness of less than 0.70 MPa · m 1/2 , a low resistance to the progress of fracture, and High probability of cracking during process or use.
【００３５】[0035]
【表１】 [Table 1]
【００３６】[0036]
【表２】 [Table 2]
【００３７】[0037]
【発明の効果】本発明によれば、ソーダ石灰ガラスと同
程度の熱膨張係数を有し、軽量かつ高歪点であり、破壊
じん性が高いガラス基板を提供できる。このガラス基板
をフラットディスプレイパネルに用いることにより、フ
ラットディスプレイパネルの製造工程中のガラスの割れ
が減少する、ガラス基板の熱変形または熱収縮が小さく
なる、パネルの構成部材として使用されるガラスフリッ
ト材料の熱膨張係数との整合が容易になる、パネルが軽
量化される、等の効果が得られる。According to the present invention, it is possible to provide a glass substrate having a thermal expansion coefficient similar to that of soda-lime glass, a light weight, a high strain point, and a high fracture toughness. By using this glass substrate for a flat display panel, glass breakage during the manufacturing process of the flat display panel is reduced, thermal deformation or thermal shrinkage of the glass substrate is reduced, and a glass frit material used as a component of the panel. And the panel can be made lighter.
【００３８】また、このガラス基板を磁気ディスクに用
いることにより、製造時または使用時のガラスの割れが
減少するとともに、金属製固定治具の熱膨張係数との整
合が容易になる。さらに、磁性層（磁気記録層）の熱処
理温度を上げることができ、その結果磁性層の保磁力が
高くなり磁気記録媒体の高記録密度化が可能となる。Further, by using this glass substrate for a magnetic disk, cracks in glass during manufacturing or use are reduced, and matching with the coefficient of thermal expansion of a metal fixing jig is facilitated. Further, the heat treatment temperature of the magnetic layer (magnetic recording layer) can be increased, and as a result, the coercive force of the magnetic layer increases, and the recording density of the magnetic recording medium can be increased.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中島 哲也 神奈川県横浜市神奈川区羽沢町1150番地 旭硝子株式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Tetsuya Nakajima 1150 Hazawacho, Kanagawa-ku, Yokohama-shi, Kanagawa Prefecture Inside Asahi Glass Co., Ltd.
Claims (4)
である請求項１に記載の基板用ガラス。2. The glass for a substrate according to claim 1, which has a fracture toughness of 0.70 MPa · m 1/2 or more.
２に記載の基板用ガラス。3. The glass for a substrate according to claim 1, wherein the specific gravity is less than 2.65.
〜３５０℃の平均熱膨張係数が７５×１０-7〜９５×１
０-7／℃である請求項１、２または３に記載の基板用ガ
ラス。4. The glass transition point is at least 600 ° C.
The average coefficient of thermal expansion at ~ 350 ° C is 75 × 10 -7 to 95 × 1
The glass for a substrate according to claim 1, 2 or 3, wherein the temperature is 0 -7 / ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18234699A JP4151161B2 (en) | 1998-08-11 | 1999-06-28 | Substrate glass |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22730498 | 1998-08-11 | ||
| JP10-308981 | 1998-10-29 | ||
| JP30898198 | 1998-10-29 | ||
| JP10-227304 | 1998-10-29 | ||
| JP18234699A JP4151161B2 (en) | 1998-08-11 | 1999-06-28 | Substrate glass |
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| Publication Number | Publication Date |
|---|---|
| JP2000203874A true JP2000203874A (en) | 2000-07-25 |
| JP4151161B2 JP4151161B2 (en) | 2008-09-17 |
Family
ID=27325146
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18234699A Expired - Fee Related JP4151161B2 (en) | 1998-08-11 | 1999-06-28 | Substrate glass |
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| Country | Link |
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| JP (1) | JP4151161B2 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005015328A (en) * | 2003-06-06 | 2005-01-20 | Nippon Sheet Glass Co Ltd | Glass composition including zirconium, chemically strengthened glass article, glass substrate for magnetic recording medium, and method of producing glass sheet |
| JP2006137631A (en) * | 2004-11-11 | 2006-06-01 | Nippon Electric Glass Co Ltd | Glass substrate and its manufacturing method |
| US7595273B2 (en) | 2004-04-28 | 2009-09-29 | Hoya Corporation | Glass substrate for information recording medium, process for producing the glass substrate, information recording medium, and process for producing the same |
| JP2011057547A (en) * | 2010-09-17 | 2011-03-24 | Hoya Corp | Glass substrate for display, method for producing the same, and display using the same |
| JP2011195450A (en) * | 2011-07-01 | 2011-10-06 | Hoya Corp | Glass substrate for mobile liquid crystal display and method for producing the same, and mobile liquid crystal display using the same |
| JP2012229154A (en) * | 2012-06-11 | 2012-11-22 | Hoya Corp | Glass substrate for display, method for producing the same, and display using the same |
| TWI380967B (en) * | 2007-08-31 | 2013-01-01 | Asahi Glass Co Ltd | Glass plate and manufacturing method thereof, and manufacturing method of TFT panel |
| JP2013500938A (en) * | 2009-08-03 | 2013-01-10 | ピーピージー インダストリーズ オハイオ，インコーポレイテッド | Glass composition and fiber made from glass composition |
| US9446983B2 (en) | 2009-08-03 | 2016-09-20 | Ppg Industries Ohio, Inc. | Glass compositions and fibers made therefrom |
| US9593038B2 (en) | 2009-08-03 | 2017-03-14 | Ppg Industries Ohio, Inc. | Glass compositions and fibers made therefrom |
| CN115108719A (en) * | 2014-09-03 | 2022-09-27 | 日本电气硝子株式会社 | Supporting glass substrate and laminate using same |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09301732A (en) * | 1996-01-24 | 1997-11-25 | Asahi Glass Co Ltd | Glass composition for substrate |
| JPH11100226A (en) * | 1997-09-30 | 1999-04-13 | Central Glass Co Ltd | Substrate glass for display device |
| JPH11180727A (en) * | 1997-12-22 | 1999-07-06 | Central Glass Co Ltd | Substrate glass composition for display device |
| JPH11310433A (en) * | 1998-04-27 | 1999-11-09 | Central Glass Co Ltd | Substrate glass for display device |
-
1999
- 1999-06-28 JP JP18234699A patent/JP4151161B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09301732A (en) * | 1996-01-24 | 1997-11-25 | Asahi Glass Co Ltd | Glass composition for substrate |
| JPH11100226A (en) * | 1997-09-30 | 1999-04-13 | Central Glass Co Ltd | Substrate glass for display device |
| JPH11180727A (en) * | 1997-12-22 | 1999-07-06 | Central Glass Co Ltd | Substrate glass composition for display device |
| JPH11310433A (en) * | 1998-04-27 | 1999-11-09 | Central Glass Co Ltd | Substrate glass for display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4656863B2 (en) * | 2003-06-06 | 2011-03-23 | Ｈｏｙａ株式会社 | Zirconium-containing glass composition, chemically strengthened glass article, glass substrate for magnetic recording medium, and method for producing glass plate |
| JP2005015328A (en) * | 2003-06-06 | 2005-01-20 | Nippon Sheet Glass Co Ltd | Glass composition including zirconium, chemically strengthened glass article, glass substrate for magnetic recording medium, and method of producing glass sheet |
| US7595273B2 (en) | 2004-04-28 | 2009-09-29 | Hoya Corporation | Glass substrate for information recording medium, process for producing the glass substrate, information recording medium, and process for producing the same |
| JP2006137631A (en) * | 2004-11-11 | 2006-06-01 | Nippon Electric Glass Co Ltd | Glass substrate and its manufacturing method |
| JP4716245B2 (en) * | 2004-11-11 | 2011-07-06 | 日本電気硝子株式会社 | Glass substrate and manufacturing method thereof |
| TWI380967B (en) * | 2007-08-31 | 2013-01-01 | Asahi Glass Co Ltd | Glass plate and manufacturing method thereof, and manufacturing method of TFT panel |
| US9593038B2 (en) | 2009-08-03 | 2017-03-14 | Ppg Industries Ohio, Inc. | Glass compositions and fibers made therefrom |
| JP2013500938A (en) * | 2009-08-03 | 2013-01-10 | ピーピージー インダストリーズ オハイオ，インコーポレイテッド | Glass composition and fiber made from glass composition |
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| US9556059B2 (en) | 2009-08-03 | 2017-01-31 | Hong Li | Glass compositions and fibers made therefrom |
| JP2017154970A (en) * | 2009-08-03 | 2017-09-07 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッドＰＰＧ Ｉｎｄｕｓｔｒｉｅｓ Ｏｈｉｏ，Ｉｎｃ． | Glass compositions and fibers made of glass compositions |
| US9862638B2 (en) | 2009-08-03 | 2018-01-09 | Ppg Industries Ohio, Inc. | Methods to make glass compositions and fibers made therefrom |
| US10377663B2 (en) | 2009-08-03 | 2019-08-13 | Ppg Industries Ohio, Inc. | Methods to make glass compositions and fibers made therefrom |
| US10487007B2 (en) | 2009-08-03 | 2019-11-26 | Ppg Industries Ohio, Inc. | Glass compositions and fibers made therefrom |
| JP2011057547A (en) * | 2010-09-17 | 2011-03-24 | Hoya Corp | Glass substrate for display, method for producing the same, and display using the same |
| JP2011195450A (en) * | 2011-07-01 | 2011-10-06 | Hoya Corp | Glass substrate for mobile liquid crystal display and method for producing the same, and mobile liquid crystal display using the same |
| JP2012229154A (en) * | 2012-06-11 | 2012-11-22 | Hoya Corp | Glass substrate for display, method for producing the same, and display using the same |
| CN115108719A (en) * | 2014-09-03 | 2022-09-27 | 日本电气硝子株式会社 | Supporting glass substrate and laminate using same |
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