JPH11120942A - Cathode-ray tube - Google Patents
Cathode-ray tubeInfo
- Publication number
- JPH11120942A JPH11120942A JP28550697A JP28550697A JPH11120942A JP H11120942 A JPH11120942 A JP H11120942A JP 28550697 A JP28550697 A JP 28550697A JP 28550697 A JP28550697 A JP 28550697A JP H11120942 A JPH11120942 A JP H11120942A
- Authority
- JP
- Japan
- Prior art keywords
- ray tube
- transmittance
- value
- antireflection film
- cathode ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Landscapes
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は,フェースプレート
の前面パネル(フェースパネル)の外表面に、反射防止
膜として機能し、かつ漏洩電場(AEF;Alternating
electric field)を防止する導電膜を有する陰極線管に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an outer surface of a front panel (face panel) of a face plate, which functions as an anti-reflection film and has a leakage electric field (AEF; Alternating).
The present invention relates to a cathode ray tube having a conductive film for preventing electric field.
【0002】[0002]
【従来の技術】近年、TVブラウン管やコンピューター
のCRTのような陰極線管では、内部の電子銃と偏向ヨ
ーク付近から発生した電磁波が漏洩して、周辺の電子機
器や人体に悪影響を与えることが懸念されている。そし
て、このような電磁波(電場)の漏洩を防止するため
に、陰極線管のフェースパネルの外表面に導電膜を形成
し、表面抵抗値を下げることが必要とされている。2. Description of the Related Art In recent years, in a cathode ray tube such as a TV cathode ray tube or a CRT of a computer, there is a concern that electromagnetic waves generated from the vicinity of an internal electron gun and a deflection yoke may leak and adversely affect peripheral electronic devices and the human body. Have been. In order to prevent such leakage of the electromagnetic wave (electric field), it is necessary to form a conductive film on the outer surface of the face panel of the cathode ray tube to lower the surface resistance.
【0003】また、導電膜を構成する導電材料の比抵抗
が小さいほど、良好な導電性が得られるため、金属微粒
子や金属化合物微粒子の膜を用いることで、有効に漏洩
電場(AEF)の発生が防止されることが知られてい
る。Further, since the smaller the specific resistance of the conductive material constituting the conductive film is, the better the conductivity is obtained, the use of a film of metal fine particles or metal compound fine particles effectively generates a leak electric field (AEF). Is known to be prevented.
【0004】[0004]
【発明が解決しようとする課題】しかし、一般に金属微
粒子や金属化合物微粒子の膜は、薄膜であっても可視光
域に吸収を持つため、抵抗値を下げるために膜厚を厚く
すると、光の透過率が低下し、陰極線管の輝度が低下す
るという問題があった。However, since a film of metal fine particles or metal compound fine particles generally has absorption in the visible light region even if it is a thin film, if the film thickness is increased to reduce the resistance value, the light emission of the light is reduced. There is a problem that the transmittance is reduced and the luminance of the cathode ray tube is reduced.
【0005】本発明は、このような問題を解決するため
になされたもので、AEF防止に有効な低抵抗を有し、
かつ高輝度、高コントラストが得られる反射防止膜を備
えた陰極線管を提供することを目的とする。The present invention has been made to solve such a problem, and has a low resistance effective for preventing AEF.
It is another object of the present invention to provide a cathode ray tube having an antireflection film capable of obtaining high brightness and high contrast.
【0006】[0006]
【課題を解決するための手段】本発明の陰極線管は、フ
ェ−スプレ−トの前面パネルの外表面に、導電性微粒子
からなる少なくとも1層の導電層を有し、かつ該導電層
を含めた2層以上の積層による反射防止膜を有する陰極
線管において、前記反射防止膜が70%以上の光透過率T
を有するとともに、該反射防止膜のパネル水平端間の電
気抵抗値Rが、1×106 Ω以下であることを特徴とす
る。A cathode ray tube according to the present invention has at least one conductive layer made of conductive fine particles on an outer surface of a front panel of a face plate. In a cathode ray tube having an antireflection film formed by stacking two or more layers, the antireflection film has a light transmittance T of 70% or more.
And an electrical resistance value R between the horizontal ends of the panel of the antireflection film is 1 × 10 6 Ω or less.
【0007】本発明の陰極線管においては、導電性微粒
子からなる導電層を高屈折率層(屈折率 2以上)とし、
その上にシリカ(SiO2 )等からなる屈折率が 2以下
の低屈折率の層を設けた2層または3層以上の反射防止
膜が、フェースパネルの外表面に設けられている。反射
防止膜の各層の膜厚は、設計波長λのl/4(l/4λ)と
設定されている。このような反射防止膜を形成するに
は、フェースパネルの外表面に、導電性微粒子からなる
塗布層を形成した後、その直上に、ケイ酸塩を主成分と
する塗布層を形成し、これらの層を同時に焼成する方法
が採られる。In the cathode ray tube of the present invention, the conductive layer made of conductive fine particles is a high refractive index layer (with a refractive index of 2 or more),
On the outer surface of the face panel, there are provided two or three or more antireflection films on which a low-refractive-index layer made of silica (SiO 2 ) or the like having a refractive index of 2 or less is provided. The film thickness of each layer of the antireflection film is set to 1/4 (1 / 4λ) of the design wavelength λ. In order to form such an anti-reflection film, a coating layer composed of conductive fine particles is formed on the outer surface of the face panel, and then a coating layer mainly composed of silicate is formed immediately above the coating layer. Are fired simultaneously.
【0008】ここで、導電性微粒子としては、銀のよう
な金属の微粒子、または酸化錫や銀化合物のような金属
化合物の微粒子が使用され、銀化合物としては、例えば
酸化銀、硝酸銀、酢酸銀、安息香酸銀、臭素酸銀、臭化
銀、炭酸銀、塩化銀、クロム酸銀、クエン酸銀、シクロ
ヘキサン酪酸銀等が挙げられる。Here, as the conductive fine particles, fine particles of a metal such as silver or fine particles of a metal compound such as tin oxide or a silver compound are used. Examples of the silver compound include silver oxide, silver nitrate, and silver acetate. Silver benzoate, silver bromate, silver bromide, silver carbonate, silver chloride, silver chromate, silver citrate, silver cyclohexane butyrate, and the like.
【0009】本発明では、このような反射防止膜におい
て、AEFの大きさと密接に関連しする電気抵抗値とし
て、パネルの水平端間の抵抗値R(以下、H端間抵抗値
と示す。)を用い、この値を 1×106 Ω以下の範囲に限
定するとともに、十分な輝度を得るために、反射防止膜
の光透過率Tを70%以上とする。なお、H端間抵抗値R
は、パネルの短辺(垂直辺)の中点であるH端の間の電
気抵抗値であり、その測定は、フェースパネルの両短辺
のH端にあるいわゆるトンボ部の直上に、はんだ等で端
子を作製し、これらの端子間の抵抗値を測定することに
より行なわれる。In the present invention, in such an antireflection film, a resistance value R between horizontal edges of the panel (hereinafter referred to as an H-end resistance value) is an electric resistance value closely related to the size of AEF. The value is limited to a range of 1 × 10 6 Ω or less, and the light transmittance T of the antireflection film is set to 70% or more in order to obtain a sufficient luminance. Note that the H end-to-end resistance value R
Is the electrical resistance value between the H-ends, which are the midpoints of the short sides (vertical sides) of the panel. The measurement is performed by placing solder or the like directly above the so-called register marks at the H-ends on both short sides of the face panel. Is performed by measuring the resistance value between these terminals.
【0010】前記したH端間抵抗値Rの範囲は、以下に
示す測定結果から決定されたものである。The above-mentioned range of the H-end resistance value R is determined from the following measurement results.
【0011】すなわち、各種の導電性微粒子を主成分と
する導電層の直上に、SiO2 を主成分とする層を設け
た2層反射防止膜を形成し、これらの反射防止膜のH端
間抵抗値RとAEF(VLF帯)値とをそれぞれ測定し
た。なお、AEF値の測定は、TCO(スウェーデン安
全評議会のガイドライン)の所定の方法により行なっ
た。これらの測定結果を、図1に示す。That is, a two-layer antireflection film having a layer mainly composed of SiO 2 is formed immediately above a conductive layer mainly composed of various kinds of conductive fine particles. The resistance value R and the AEF (VLF band) value were measured. The measurement of the AEF value was performed by a predetermined method of TCO (Guideline of Swedish Safety Council). FIG. 1 shows the measurement results.
【0012】図1のグラフから、このような2層反射防
止膜では、H端間抵抗値Rが小さくなるほどAEF値が
低くなることがわかる。また、AEF防止に有効なH端
間抵抗値Rとして、 1×106 Ω以下、より望ましくは 1
×104 Ω以下の範囲が設定される。さらに、TCOによ
るAEF値は、1.0V/m以下であるので、AEF−TCO
対応では、反射防止膜のH端間抵抗値Rを 1×105 Ω以
下にしなければならないことがわかる。From the graph of FIG. 1, it can be seen that, in such a two-layer antireflection film, the AEF value decreases as the H end-to-end resistance value R decreases. In addition, the resistance R between H ends effective for preventing AEF is 1 × 10 6 Ω or less, more preferably 1 × 10 6 Ω or less.
A range of × 10 4 Ω or less is set. Further, since the AEF value by TCO is 1.0 V / m or less, the AEF-TCO
In response, it can be seen that the resistance R between H ends of the antireflection film must be 1 × 10 5 Ω or less.
【0013】また、反射防止膜の光透過率Tに関して
は、従来から、透過率Tが80%のときに、画面の明部
(発光部)と暗部(非発光部)との輝度の比であるコン
トラストが最良となることが知られている。すなわち、
反射防止膜の透過率Tが80%未満の場合には、明部の輝
度が低すぎるため、コントラストが低くなり、反対に透
過率が80%を越えた場合には、明部と暗部の輝度がとも
に高くなりすぎるため、コントラストは透過率が80%の
ときよりもかえって低くなることが知られている。した
がって本発明では、反射防止膜の透過率を80%としたと
き、最もコントラストの高い画面が得られる。Further, regarding the light transmittance T of the antireflection film, conventionally, when the transmittance T is 80%, the ratio of the brightness of the bright portion (light emitting portion) to the brightness of the dark portion (non-light emitting portion) of the screen. It is known that certain contrasts are best. That is,
When the transmittance T of the anti-reflection film is less than 80%, the brightness of the bright part is too low, so that the contrast is low. Conversely, when the transmittance exceeds 80%, the brightness of the bright part and the dark part is low. Are both too high, so that the contrast is known to be lower than when the transmittance is 80%. Therefore, in the present invention, when the transmittance of the antireflection film is set to 80%, a screen having the highest contrast can be obtained.
【0014】さらに本発明においては、このような反射
防止膜のH端間抵抗値Rの安定性を表す数値として、透
過率Tに対するRの対数の微分値 d(logR)/ dTを考
え、この値が 1以下になるような反射防止膜を設けるこ
とが望ましい。すなわち、種々の強制環境下において、
反射防止膜の透過率Tは± 1%程度変化することがある
うえに、製造の際のばらつきを考慮すると、透過率Tは
設定値に対して上下に2%程度変動するため、透過率T
の変化分に対するH端間抵抗値R(の対数)の変化分 d
(logR)/ dTが大きすぎる反射防止膜では、環境の変
化等により透過率が変化した場合に、H端間抵抗値Rが
1×106 Ω以上となり、AEF対応でなくなってしまう
おそれがある。Further, in the present invention, a differential value d (logR) / dT of the logarithm of R with respect to the transmittance T is considered as a numerical value indicating the stability of the resistance R between H ends of such an antireflection film. It is desirable to provide an antireflection film having a value of 1 or less. That is, under various forced environments,
The transmittance T of the anti-reflection film may vary by about ± 1%, and the transmittance T fluctuates by about 2% up and down with respect to a set value in consideration of manufacturing variations.
Change in H end-to-end resistance R (logarithm of) with respect to change in d
In an antireflection film having an excessively large (logR) / dT, when the transmittance changes due to a change in the environment or the like, the resistance R between the H ends is reduced.
The resistance becomes 1 × 10 6 Ω or more, and there is a possibility that AEF is not supported.
【0015】したがって、環境条件等の変化に対応して
安定したAEF防止がなされる陰極線管を得るには、特
に d(logR)/ dTが 1以下の反射防止膜を設けること
が望ましい。Therefore, in order to obtain a cathode ray tube capable of stably preventing AEF in response to changes in environmental conditions and the like, it is particularly desirable to provide an antireflection film having d (logR) / dT of 1 or less.
【0016】[0016]
【発明の実施の形態】以下、本発明の実施例を図面に基
づいて説明する。Embodiments of the present invention will be described below with reference to the drawings.
【0017】図2は、本発明の一実施例であるカラー陰
極線管の構造を示す斜視図である。実施例のカラー陰極
線管は、図に示すように、パネル1およびこのパネル1
に一体に接合されたファンネル2からなる外囲器を有
し、パネル1に組み込まれたフェースパネル3の内面に
は、青、緑、赤にそれぞれ発光する3色蛍光体層と、こ
の3色蛍光体層の間隙部を埋める黒色の光吸収層(ブラ
ックマトリックス)とからなる蛍光面4が形成されてい
る。3色蛍光体層は、青、緑、赤の各蛍光体をPVA、
界面活性剤、純水等とともに分散させたスラリーを、通
常の方法でフェースパネル3の内面に塗布することによ
り得られる。また、3色蛍光体層の形状は、ストライプ
状でもドット状でも良いが、図2ではドット状とした。FIG. 2 is a perspective view showing the structure of a color cathode ray tube according to one embodiment of the present invention. As shown in the figure, the color cathode ray tube of the embodiment includes a panel 1 and the panel 1.
A three-color phosphor layer that emits blue, green, and red light, respectively, is provided on an inner surface of the face panel 3 incorporated in the panel 1 and a funnel 2 integrally formed with the funnel 2. The phosphor screen 4 is formed of a black light absorbing layer (black matrix) that fills the gap between the phosphor layers. The three-color phosphor layer is composed of PVA, blue, green, and red phosphors.
The slurry is obtained by applying a slurry dispersed together with a surfactant, pure water and the like to the inner surface of the face panel 3 by an ordinary method. The shape of the three-color phosphor layer may be a stripe shape or a dot shape.
【0018】そして、このような蛍光面4に対向してそ
の内側に、多数の電子ビーム通過孔の形成されたシャド
ウマスク5が装着されている。また、ファンネル2のネ
ック部6の内部には、蛍光面4に電子ビームを照射する
ための電子銃7が配設されており、電子銃7から放出さ
れた電子ビームが、シャドウマスク5の通過孔を通って
蛍光面4に衝突し、3色蛍光体層を励起・発光させるよ
うに構成されている。さらに、フェースパネル3の外表
面には、以下に示す導電性反射防止膜8が形成されてい
る。A shadow mask 5 having a large number of electron beam passage holes formed therein is mounted opposite to and inside the fluorescent screen 4. An electron gun 7 for irradiating the phosphor screen 4 with an electron beam is disposed inside the neck portion 6 of the funnel 2, and the electron beam emitted from the electron gun 7 passes through the shadow mask 5. It is configured to collide with the phosphor screen 4 through the hole to excite and emit the three-color phosphor layer. Further, a conductive antireflection film 8 described below is formed on the outer surface of the face panel 3.
【0019】図2に示した陰極線管を、A−A´に沿っ
て切断した断面を、図3に示す。この図に示すように、
フェースパネル3の外表面上に、銀化合物微粒子のよう
な導電性微粒子9を含む導電層10と、SiO2 を主成
分として含む第2の層11とから構成された導電性反射
防止膜8が形成されている。そして、このような導電性
反射防止膜8は、80%の光透過率Tを有し、かつパネル
のH端間抵抗値Rが 1×106 Ω以下となっている。ま
た、H端間抵抗値Rの対数の透過率Tに対する微分値 d
(logR)/ dTが、 1以下となっている。FIG. 3 shows a cross section of the cathode ray tube shown in FIG. 2 cut along the line AA '. As shown in this figure,
On the outer surface of the face panel 3, a conductive antireflection film 8 composed of a conductive layer 10 containing conductive fine particles 9 such as silver compound fine particles and a second layer 11 containing SiO 2 as a main component is provided. Is formed. The conductive anti-reflection film 8 has a light transmittance T of 80% and a resistance value R between H ends of the panel of 1 × 10 6 Ω or less. Also, the differential value d of the logarithm of the H end-to-end resistance value R with respect to the transmittance T
(logR) / dT is 1 or less.
【0020】このように構成される実施例のカラー陰極
線管では、導電性反射防止膜8において、AEFの発生
を防止するために有効な低抵抗が安定して実現されるう
えに、高いコントラストが得られる。In the color cathode ray tube of the embodiment constructed as described above, the conductive anti-reflection film 8 stably realizes a low resistance effective for preventing the generation of AEF and has a high contrast. can get.
【0021】次に、具体的に実施例を挙げて本発明をさ
らに詳しく説明するが、本発明は以下の実施例に限定さ
れるものではない。Next, the present invention will be described in more detail with reference to specific examples, but the present invention is not limited to the following examples.
【0022】実施例1〜3 下層用塗布液として、銀の微粒子、Ag2 O、AgNO
3 、AgClなどの銀化合物の微粒子、酸化錫の微粒子
をそれぞれ水100gに溶解し、種々の濃度の銀微粒子分散
液(a)、銀化合物微粒子分散液(b)、酸化錫微粒子
分散液(c)をそれぞれ調製した。Examples 1 to 3 Silver fine particles, Ag 2 O, AgNO
3. Dissolve silver compound fine particles such as AgCl and tin oxide fine particles in 100 g of water, respectively, and disperse silver fine particle dispersion liquid (a), silver compound fine particle dispersion liquid (b) and tin oxide fine particle dispersion liquid (c) at various concentrations. ) Was prepared respectively.
【0023】また、上層用塗布液として、メチルシリケ
ート 8重量部、硝酸0.03重量部、エタノ一ル 500重量部
および水15重量部からなるシリケート溶液を調製した。A silicate solution comprising 8 parts by weight of methyl silicate, 0.03 parts by weight of nitric acid, 500 parts by weight of ethanol and 15 parts by weight of water was prepared as an upper layer coating solution.
【0024】次に、組立て終了後の陰極線管フェースパ
ネル(17インチパネル)の外表面を、酸化セリウムによ
りバフ研磨し、ゴミ、ほこり、油分等を除去した後、前
記した下層用塗布液を、スピンコート法により塗布し成
膜した。なお、実施例1では銀微粒子分散液(a)を塗
布し、実施例2では銀化合物微粒子分散液(b)を塗布
した。また、実施例3では酸化錫微粒子分散液(c)を
塗布した。塗布条件は、パネル(塗布面)温度を45℃、
回転速度を液注入時80rpm-5sec、液振りきり(成膜)時
150rpm- 80secとした。次いで、下層塗膜の上に上層用
塗布液を、液注入時80rpm-5sec、液振りきり時 150rpm-
80secの条件でスピンコート法により塗布し成膜した
後、上下層を 210℃の温度で30分間焼成した。Next, the outer surface of the cathode ray tube face panel (17-inch panel) after the assembly is finished is buffed with cerium oxide to remove dust, dust, oil and the like. A film was formed by coating by spin coating. In Example 1, the silver fine particle dispersion (a) was applied, and in Example 2, the silver compound fine particle dispersion (b) was applied. In Example 3, the tin oxide fine particle dispersion (c) was applied. The application conditions are panel (application surface) temperature of 45 ° C,
The rotation speed is 80rpm-5sec at the time of liquid injection, and at the time of liquid sweeping (film formation)
150 rpm-80 sec. Then, the upper layer coating solution on the lower layer coating film, 80rpm-5sec at the time of liquid injection, 150rpm-
After coating and film formation by spin coating under the conditions of 80 sec, the upper and lower layers were baked at a temperature of 210 ° C. for 30 minutes.
【0025】次いで、実施例1〜3でそれぞれ得られた
表面処理膜について、パネルのH端間抵抗値Rと光透過
率Tとをそれぞれ測定した。H端間抵抗値の測定は、17
インチパネルの両H端に、それぞれAGC製セラソルザ
により特殊はんだを付けて端子を作製し、これらの端子
間の抵抗値をテスターにより測定することにより行なっ
た。また、 MINOLTA CM-1000(ミノルタ社製)を使用し
て、パネルの表面処理前の外光反射率Y0 と表面処理膜
の外光反射率Yとをそれぞれ測定し、(Y/Y0 )1/2
の値を膜透過率とした。測定結果を、H端間抵抗値Rを
透過率Tに対してプロットして、図4に示す。Next, with respect to the surface-treated films obtained in Examples 1 to 3, the H-end resistance R and the light transmittance T of the panel were measured. The measurement of the resistance between H ends is 17
A special solder was attached to both H ends of the inch panel using an AGC Cerasolzer to form terminals, and the resistance between these terminals was measured by a tester. Also, using MINOLTA CM-1000 (manufactured by Minolta), the external light reflectance Y 0 of the panel before surface treatment and the external light reflectance Y of the surface treatment film were measured, and (Y / Y 0 ) 1/2
Was defined as the membrane transmittance. The measurement results are shown in FIG. 4 in which the resistance R between the ends is plotted against the transmittance T.
【0026】図4のグラフから、実施例1〜3でそれぞ
れ得られた表面処理膜は、いずれも70%以上の光透過率
Tを有し、高輝度を得ることができるうえに、H端間抵
抗値Rが 1×106 Ω以下の領域があり、AEF防止に有
効な高い導電性を持つことがわかった。特に、実施例2
で得られた表面処理膜は、透過率Tが80%以下の場合に
1×104 Ω以下、透過率Tが85%の場合に 1×106 Ω以
下と、AEF−TCOに対応した極めて高い導電性を有
していることがわかった。また、実施例2の表面処理膜
では、H端間抵抗値Rの対数の透過率Tに対する微分値
d(logR)/ dTが 1以下となっており、環境条件等が
変化した場合にもAEF防止が安定的になされることが
わかった。From the graph of FIG. 4, it can be seen that the surface treatment films obtained in Examples 1 to 3 each have a light transmittance T of 70% or more, can obtain high luminance, and have an H end. There was a region where the inter-resistance value R was 1 × 10 6 Ω or less, and it was found that the film had high conductivity effective for preventing AEF. In particular, Example 2
When the transmittance T is 80% or less,
1 × 10 4 Ω or less, the transmittance T is found to have a 1 × 10 6 Ω or less in the case of 85%, a very high conductivity corresponding to AEF-TCO. In the surface treatment film of Example 2, the differential value of the logarithm of the resistance value R between the ends H with respect to the transmittance T was obtained.
d (logR) / dT was 1 or less, indicating that AEF prevention was stably performed even when environmental conditions and the like changed.
【0027】[0027]
【発明の効果】以上の説明から明らかなように、本発明
によれば、高輝度、高コントラストで、環境条件等の変
化に対して安定でAEF防止に有効な低抵抗の反射防止
膜が得られ、高性能の陰極線管を得ることができる。As is apparent from the above description, according to the present invention, a low-reflection antireflection film having high luminance, high contrast, stable against changes in environmental conditions and the like, and effective in preventing AEF is obtained. As a result, a high-performance cathode ray tube can be obtained.
【図1】反射防止膜のH端間抵抗値とAEF値との関係
を表わすグラフ。FIG. 1 is a graph showing a relationship between a resistance value between H ends of an antireflection film and an AEF value.
【図2】本発明の一実施例であるカラー陰極線管の構造
を示す斜視図。FIG. 2 is a perspective view showing the structure of a color cathode ray tube according to one embodiment of the present invention.
【図3】図2の陰極線管をA−A´に沿って切断した断
面図。FIG. 3 is a cross-sectional view of the cathode ray tube of FIG. 2 cut along AA ′.
【図4】実施例で得られた反射防止膜において、H端間
抵抗値と透過率とをそれぞれ測定した結果を示すグラ
フ。FIG. 4 is a graph showing the results of measuring the resistance between H ends and the transmittance of the antireflection film obtained in the example.
3………フェースパネル 4………蛍光面 5………シャドウマスク 8………導電性反射防止膜 9………導電性微粒子 10………導電層 11………SiO2 を主成分とする第2の層3 and mainly composed of ......... face panel 4 ......... phosphor screen 5 ......... shadow mask 8 ......... conductive antireflection film 9 ......... conductive particles 10 ......... conductive layer 11 ......... SiO 2 Second layer
Claims (3)
に、導電性微粒子からなる少なくとも1層の導電層を有
し、かつ該導電層を含めた2層以上の積層による反射防
止膜を有する陰極線管において、 前記反射防止膜が70%以上の光透過率Tを有するととも
に、該反射防止膜のパネル水平端間の電気抵抗値Rが、
1×106 Ω以下であることを特徴とする陰極線管。1. An anti-reflection film having at least one conductive layer made of conductive fine particles on an outer surface of a front panel of a face plate, and a laminate of two or more layers including the conductive layer. In the cathode ray tube, the antireflection film has a light transmittance T of 70% or more, and the electric resistance value R between the horizontal ends of the panel of the antireflection film is:
A cathode ray tube characterized by being 1 × 10 6 Ω or less.
Rが、透過率Tが80%以下の場合に 1×104 Ω以下、透
過率Tが85%の場合に 1×106 Ω以下の値を示し、かつ
この水平端間抵抗値Rの対数の透過率Tに対する微分値
d(logR)/dTが、 1以下であることを特徴とする請
求項1記載の陰極線管。Wherein the electrical resistance R between the horizontal edge of the antireflection film, 1 × 10 4 Omega hereinafter the transmittance T of 80% or less, the transmittance T is 1 × 10 in the case of 85% 6 Ω or less, and the differential value of the logarithm of the horizontal end-to-end resistance value R with respect to the transmittance T
2. The cathode ray tube according to claim 1, wherein d (logR) / dT is 1 or less.
ることを特徴とする請求項1記載の陰極線管。3. The cathode ray tube according to claim 1, wherein the transmittance T of the antireflection film is 80%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28550697A JPH11120942A (en) | 1997-10-17 | 1997-10-17 | Cathode-ray tube |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28550697A JPH11120942A (en) | 1997-10-17 | 1997-10-17 | Cathode-ray tube |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11120942A true JPH11120942A (en) | 1999-04-30 |
Family
ID=17692418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28550697A Abandoned JPH11120942A (en) | 1997-10-17 | 1997-10-17 | Cathode-ray tube |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11120942A (en) |
-
1997
- 1997-10-17 JP JP28550697A patent/JPH11120942A/en not_active Abandoned
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