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JPH0347578A - Liquid flow type ultrasonic washing apparatus - Google Patents

Liquid flow type ultrasonic washing apparatus

Info

Publication number
JPH0347578A
JPH0347578A JP18175389A JP18175389A JPH0347578A JP H0347578 A JPH0347578 A JP H0347578A JP 18175389 A JP18175389 A JP 18175389A JP 18175389 A JP18175389 A JP 18175389A JP H0347578 A JPH0347578 A JP H0347578A
Authority
JP
Japan
Prior art keywords
liquid
main body
lower wall
injection port
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18175389A
Other languages
Japanese (ja)
Other versions
JP2549735B2 (en
Inventor
Naoaki Sakurai
直明 桜井
Yoshihide Suwa
好英 諏訪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1181753A priority Critical patent/JP2549735B2/en
Publication of JPH0347578A publication Critical patent/JPH0347578A/en
Application granted granted Critical
Publication of JP2549735B2 publication Critical patent/JP2549735B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Special Spraying Apparatus (AREA)

Abstract

PURPOSE:To stably inject a washing solution in a stripe form by a method wherein the widths of the flow passages of liquid inflow and discharge parts are respectively expanded and contracted gradually and the lower walls from a liquid jet orifice to a liquid inlet and a liquid outlet are erected in a curved surface state and, further, the height of the flow passage to the outlet is gradually contracted. CONSTITUTION:A main body 21 is formed from a liquid inflow part 22, a liquid discharge part 23 and a section 44 having the same width as the main body 21 and a jet orifice 24 is opened to a lower wall 25 and a vibration mechanism 29 is mounted to an upper wall and a vibration plate 38 is fixed to the upper wall so as to be flush with the inner surface thereof. The flow passage widths of the inflow part 22 and the discharge part 23 are gradually expanded and contracted and the lower wall 25 is erected toward the outlet and inlet parts in a curved form and, further, the height of the flow passage to a section 44 is gradually contracted. By the above mentioned constitution, ultrasonic waves are stably carried on a washing solution by the formation of a laminar flow state, the prevention of the adhesion of air bubbles to the vibration plate 38, the application of directionality due to a curved surface and the throttling effect of the outlet part to make it possible to inject a sufficient amount of the washing solution in a stripe form.

Description

【発明の詳細な説明】 [発明の目的コ (産業上の利用分野) 本発明は、流液式超音波洗浄装置に関するものである。[Detailed description of the invention] [Object of the invention] (Industrial application field) The present invention relates to a fluid type ultrasonic cleaning device.

(従来の技術) 半導体装置、液晶表示装置等の製造においては、多数回
のエツチング工程がなされ、その都度洗浄することが行
われている。
(Prior Art) In the manufacture of semiconductor devices, liquid crystal display devices, etc., etching steps are performed many times, and cleaning is performed each time.

上述した洗浄工程では、従来より第3図に示す構造の超
音波洗浄装置が使用されている。即ち、第3図において
本体1は一端が砲弾形をなし、その端部には噴射口2が
開口されている。振動板3は、前記噴射口2と反対側の
前記本体1の内部に設けられ、かつ振動子4は前記噴射
口2と反対側の前記振動板3の面に取り付けられている
。前記振動子4は、リード線5を通して図示しない超音
波発振器に接続されている。洗浄液の導入管6は、前記
噴射口2と振動板3の間に位置する前記本体1の側壁に
挿着されている。かかる構成の装置によれば、導入管6
から洗浄液を本体1内に導入し、振動子4で振動させた
振動板3の音波にのせて本体lの噴射口 2から噴射さ
せる。
In the above-mentioned cleaning process, an ultrasonic cleaning apparatus having the structure shown in FIG. 3 has conventionally been used. That is, in FIG. 3, the main body 1 has one end shaped like a bullet, and the injection port 2 is opened at the end. The diaphragm 3 is provided inside the main body 1 on the side opposite to the injection port 2, and the vibrator 4 is attached to the surface of the diaphragm 3 on the opposite side to the injection port 2. The vibrator 4 is connected to an ultrasonic oscillator (not shown) through a lead wire 5. A cleaning liquid introduction pipe 6 is inserted into a side wall of the main body 1 located between the injection port 2 and the diaphragm 3. According to the device having such a configuration, the introduction pipe 6
A cleaning liquid is introduced into the main body 1 from the main body 1, and is ejected from the injection port 2 of the main body 1 on the sound waves of the diaphragm 3 vibrated by the vibrator 4.

しかしながら、上述した構成の洗浄装置の噴射口2は丸
形で、洗浄範囲が狭いため、液晶表示装置の製造に用い
られる大面積のガラス基板等を洗浄するのには不向きで
あった。
However, the injection port 2 of the above-described cleaning device is round and has a narrow cleaning range, making it unsuitable for cleaning large-area glass substrates used in the manufacture of liquid crystal display devices.

このようなことから、最近、大面積の被処理基板に対し
て洗浄が可能な流液式超音波洗浄装置として第4図に示
す構造のものが知られている。即ち、第4図において本
体11の内部には垂直方向に延びる隔壁12が配置され
ている。3つの邪魔板13は、前記隔壁12で区画され
た本体11内に水平方向に設けられて層流室14を形成
している。前記奇数番目の邪魔板13は前記本体11内
面と離間し、偶数番目の邪魔板13は前記隔壁12と離
間して配置されている。洗浄液の導入管15は、前記本
体11に前記層流室14の前段部と連通ずるように設け
られている。細長状の噴射口16は、前記本体11の底
面に前記層流室14の後段部と連通ずるように開孔され
ている。振動機構17は、前記隔壁12で区画された本
体11の別の空間内に設けられ、かつ該振動機構17の
振動板18は前記噴射口16と対向するように配置され
ている。
For this reason, a liquid-flow type ultrasonic cleaning apparatus having a structure shown in FIG. 4 has recently been known as a liquid-flow type ultrasonic cleaning apparatus capable of cleaning a large area of a substrate to be processed. That is, in FIG. 4, a vertically extending partition wall 12 is arranged inside the main body 11. The three baffle plates 13 are provided horizontally within the main body 11 partitioned by the partition wall 12 to form a laminar flow chamber 14. The odd-numbered baffle plates 13 are spaced apart from the inner surface of the main body 11, and the even-numbered baffle plates 13 are spaced apart from the partition wall 12. A cleaning liquid introduction pipe 15 is provided in the main body 11 so as to communicate with the front section of the laminar flow chamber 14 . The elongated injection port 16 is formed in the bottom surface of the main body 11 so as to communicate with the rear part of the laminar flow chamber 14 . The vibration mechanism 17 is provided in a separate space of the main body 11 divided by the partition wall 12, and the vibration plate 18 of the vibration mechanism 17 is arranged to face the injection port 16.

上述した第4図図示の構成によれば、導入管15から洗
浄液を本体11の層流室14内に導入すると、洗浄液は
矢印に示すように複数の邪魔板13を迂回することによ
り層流状態となって本体11底面に開孔された細長状の
噴射口1Bに移動し、振動機構17で振動させた振動板
3の音波にのせて前記噴射口16から帯状となって噴射
させる。しかしながら、かかる構造の洗浄装置では層流
室14で層流化された洗浄液がその後段の噴射口16が
開孔された付近で本体11内面に衝突して乱れが生じる
。このため、振動板18で発生した音波を安定的に洗浄
液にのせて噴射口16から噴射することができなくなる
問題があった。また、洗浄液中に巻き込まれた気泡が振
動板18に付着すると、構造上、洗浄液の流れにより該
気泡を振動板18から離脱できないため、振動効果及び
装置寿命を損なう問題があった。
According to the configuration shown in FIG. 4 described above, when the cleaning liquid is introduced into the laminar flow chamber 14 of the main body 11 from the introduction pipe 15, the cleaning liquid bypasses the plurality of baffle plates 13 as shown by the arrows, thereby forming a laminar flow state. The liquid then moves to the elongated injection port 1B formed on the bottom surface of the main body 11, and is ejected in a band shape from the injection port 16 on the sound waves of the diaphragm 3 vibrated by the vibration mechanism 17. However, in the cleaning device having such a structure, the cleaning liquid made into a laminar flow in the laminar flow chamber 14 collides with the inner surface of the main body 11 near where the injection port 16 in the subsequent stage is opened, causing turbulence. For this reason, there is a problem in that the sound waves generated by the diaphragm 18 cannot be stably loaded onto the cleaning liquid and ejected from the injection port 16. Furthermore, if air bubbles caught in the cleaning liquid adhere to the diaphragm 18, the air bubbles cannot be removed from the diaphragm 18 due to the flow of the cleaning liquid due to the structure, resulting in a problem that the vibration effect and the life of the device are impaired.

(発明が解決しようとする課題) 本発明は、上記従来の課題を解決するためになされたも
ので、噴射口から洗浄液を帯状に安定して噴射でき、大
面積の被処理基板への洗浄に適した流液式超音波洗浄装
置を提供しようとするものである。
(Problems to be Solved by the Invention) The present invention has been made to solve the above-mentioned conventional problems, and it is capable of stably spraying a cleaning liquid in a strip shape from a spray nozzle, and is suitable for cleaning large-area substrates. The present invention aims to provide a suitable fluid-flow type ultrasonic cleaning device.

[発明の構成〕 (課題を解決するための手段) 本発明に係わる流液式超音波洗浄装置は、前段に液体流
入部、後段に液体排出部を有する内部に液体が流通する
本体と、この本体の下壁に該本体の長手方向と直交する
ように開孔された細長状の液体噴射口と、この噴射口と
対向する前記本体上壁に該本体内を流通する液体と接触
するように取り付けられ、前記液体に超音波を印加する
振動板とを具備し、前記液体流入部は入口から前記本体
に向かつて流路幅が暫時拡大された形状をなし、前記本
体は下壁が前記噴射口の位置から前記液体排出部に向か
って曲面状に立ち上がった形状をなし、かつ前記液体排
出部は下壁が前記本体の立ち上がり下壁と一体化されて
曲面状に立ち上がり、流路高さが暫時縮小した形状をな
すことを特徴とするものである。
[Structure of the Invention] (Means for Solving the Problems) A fluid-flowing ultrasonic cleaning device according to the present invention includes a main body having a liquid inflow section at a front stage and a liquid discharge section at a rear stage, through which a liquid flows, and An elongated liquid injection port is formed in the lower wall of the main body so as to be perpendicular to the longitudinal direction of the main body, and an elongated liquid injection port is formed in the upper wall of the main body opposite to the injection port so as to come into contact with the liquid flowing inside the main body. a diaphragm attached to the body to apply an ultrasonic wave to the liquid, the liquid inflow portion has a shape in which the width of the flow path is temporarily expanded from the inlet toward the main body, and the main body has a lower wall that is connected to the injector. The liquid discharge part has a shape that rises in a curved shape from the position of the mouth toward the liquid discharge part, and the lower wall of the liquid discharge part is integrated with the rising lower wall of the main body and rises in a curved shape, and the height of the flow path is increased. It is characterized by having a temporarily reduced shape.

また、本発明に係わる流液式超音波洗浄装置は前記噴射
口の位置から前記液体流入部に向かう前記本体の下壁部
分を少なくとも曲面状に立ち上がった形状としたことを
特徴とするものである。
Further, the liquid type ultrasonic cleaning device according to the present invention is characterized in that a lower wall portion of the main body extending from the position of the injection port toward the liquid inflow portion has at least a curved shape. .

更に、本発明に係わる流液式超音波洗浄装置は前記振動
板より前記液体流入部側に流路幅が一定の区域を設けた
ことを特徴とするものである。
Further, the liquid-flow type ultrasonic cleaning device according to the present invention is characterized in that a region having a constant width of the flow path is provided closer to the liquid inlet than the diaphragm.

(作用) 本発明によれば、液体流入部は入口から本体に向かつて
流路幅を暫時拡大した形状となっているため、該入口か
ら洗浄液を供給すると底面に細長状の液体噴射口が開孔
され、上面に前記噴射口と対向して振動板が配置された
前記本体内を層流状態で導入できる。また、前記本体は
底面が前記噴射口の位置から前記液体排出部に向かって
曲面状に立ち上がった形状をなし、かつ液体排出部は底
面が前記本体の立ち上がり底面と一体化されて曲面状に
立ち上がり、流路高さが暫時縮小した形状をなすため、
前記本体内に供給された洗浄液の一部は常に前記振動板
の液接触面を流通して振動板への気泡の付着を防止でき
る。従って、振動板で発生した超音波を安定的に洗浄液
にのせて細長状の液体噴射口から帯状に噴射でき、大面
積の被処理基板への洗浄に適した流液式超音波洗浄装置
を得ることができる。しかも、液体排出部を前述した形
状とすることによって該排出部からの洗浄液の排出を絞
ることができる。その結果、液体排出部から排出される
洗浄液の排出量と噴射口から噴射される洗浄液の噴射量
との比を同等、或いは噴射量が多くなるようにできるた
め、洗浄液の供給量を少なくしても噴射口から十分な量
の洗浄液を噴射することができ、ランニングコスト等の
低減化を達成できる。
(Function) According to the present invention, the liquid inlet has a shape in which the width of the flow path is temporarily expanded from the inlet toward the main body, so that when cleaning liquid is supplied from the inlet, an elongated liquid jet port opens at the bottom. A laminar flow can be introduced into the main body which has holes and a diaphragm is disposed on the upper surface facing the injection port. Further, the main body has a shape in which a bottom surface rises in a curved shape from the position of the injection port toward the liquid discharge section, and the bottom surface of the liquid discharge section is integrated with the rising bottom surface of the main body and rises in a curved shape. , because the flow path height is temporarily reduced,
A part of the cleaning liquid supplied into the main body always flows through the liquid contact surface of the diaphragm, thereby preventing air bubbles from adhering to the diaphragm. Therefore, it is possible to stably load the ultrasonic waves generated by the diaphragm onto the cleaning liquid and spray it in the form of a strip from the elongated liquid jet port, thereby obtaining a flowing liquid type ultrasonic cleaning device suitable for cleaning large-area substrates. be able to. Moreover, by forming the liquid discharge part in the above-described shape, the discharge of the cleaning liquid from the discharge part can be restricted. As a result, the ratio of the amount of cleaning fluid discharged from the liquid discharge part to the amount of cleaning fluid injected from the injection port can be made equal or larger, so the amount of cleaning fluid supplied can be reduced. Also, a sufficient amount of cleaning liquid can be injected from the injection port, and running costs can be reduced.

また、前記噴射口の位置から前記液体流入部に向かう前
記本体の下壁部分を少な(とも曲面状に立ち上がった形
状とすることによって、前記曲面状に傾斜した本体の底
面が洗浄液の案内部として作用するため、細長状の液体
噴射口から洗浄液を帯状にかつ高い指向性を持たせて噴
射でき、被処理基板の洗浄効率が著しく向上された流液
式超音波洗浄装置を得ることができる。
In addition, by forming the lower wall portion of the main body from the position of the injection port toward the liquid inflow portion into a curved shape, the bottom surface of the main body, which is inclined in the curved shape, can serve as a guide portion for the cleaning liquid. Therefore, it is possible to spray the cleaning liquid from the elongated liquid injection port in a belt shape with high directivity, and it is possible to obtain a flowing liquid type ultrasonic cleaning apparatus in which cleaning efficiency of the substrate to be processed is significantly improved.

更に、前記振動板より前記液体流入部側に流路幅が一定
の区域を設けることによって、洗浄液を本体内をより一
層良好な層流状態で導入することができる。
Furthermore, by providing a region with a constant flow path width closer to the liquid inlet than the diaphragm, the cleaning liquid can be introduced into the main body in an even better laminar flow state.

(実施例) 以下、本発明の実施例を第1図(a)、(b)及び第2
図を参照して詳細に説明する。
(Example) Examples of the present invention will be described below in Figures 1 (a), (b) and 2.
This will be explained in detail with reference to the drawings.

本体21は、前後段が開孔されて内部に液体が流通する
ものである。前記本体21の前段に液体流入部22、後
段には、液体排出部23を一体的に取り付けられている
。細長状の噴射口24は、前記本体21の下壁25に該
本体21の長手方向と直交するように開孔されている。
The main body 21 has holes in the front and rear stages so that liquid can flow therein. A liquid inlet part 22 is integrally attached to the front stage of the main body 21, and a liquid discharge part 23 is integrally attached to the rear stage. The elongated injection port 24 is formed in the lower wall 25 of the main body 21 so as to be perpendicular to the longitudinal direction of the main body 21 .

矩形状の穴26は、第2図に示すすように前記噴射口2
4に対向する前記本体21の上壁27に開孔され、かつ
該穴26周辺の前記上壁27には段差部28が形成され
ている。振動機構29は、振動子支持部材30を備え、
かつ該支持部材30は前記本体21の上壁27の段差部
28にネジ31及びナツト32により上壁27下面と面
一となるように固定されている。0リング33は、前記
上壁27の段差部28と前記支持部材30の間に介装さ
れている。前記支持部材30の中心付近の上面には、周
囲にネジが切られた突起部34が設けられ、かつ該突起
部34の中心から下面にかけて二段の穴35a 、 3
5bが貫通されている。前記上段の穴35aは、ネジ切
り加工されている。前記下段の穴35bの開口部を含む
前記支持部材30下面には、振動板を収納するための矩
形状四部36が形成されている。圧電素子37は、前記
下段の穴35b内に圧入されている。振動板38は、前
記矩形状凹部36内に収納されていると共に前記該圧電
素子37の下面に固定されている。つまり、前記振動板
38は前記上壁27の下面と面一に、かつ前記本体21
内を流通する洗浄液と接触するように固定されている。
The rectangular hole 26 is connected to the injection port 2 as shown in FIG.
A hole is formed in the upper wall 27 of the main body 21 facing the hole 26, and a stepped portion 28 is formed in the upper wall 27 around the hole 26. The vibration mechanism 29 includes a vibrator support member 30,
The support member 30 is fixed to the stepped portion 28 of the upper wall 27 of the main body 21 by screws 31 and nuts 32 so as to be flush with the lower surface of the upper wall 27. The O-ring 33 is interposed between the stepped portion 28 of the upper wall 27 and the support member 30. A protrusion 34 with a thread cut around the periphery is provided on the upper surface near the center of the support member 30, and two-stage holes 35a and 3 extend from the center of the protrusion 34 to the lower surface.
5b is penetrated. The upper hole 35a is threaded. Four rectangular parts 36 for accommodating a diaphragm are formed on the lower surface of the support member 30 including the opening of the lower hole 35b. The piezoelectric element 37 is press-fitted into the lower hole 35b. The diaphragm 38 is housed within the rectangular recess 36 and is fixed to the lower surface of the piezoelectric element 37. That is, the diaphragm 38 is flush with the lower surface of the upper wall 27 and the main body 21
It is fixed in such a way that it comes into contact with the cleaning fluid flowing through it.

中空状の押さえ部材39は、前記穴35a 、 35b
に亘って挿入され、かつダブルナツト40は前記上段の
穴35aに螺合されて前記押さえ部材39を押圧してい
る。ソケット41は、前記本体21の上壁27の突起部
34に螺合されている。リード線42は、前記圧電素子
37に接続され、前記押さえ部材39、ダブルナツト4
0及びソケット41を通して外部に延出され、図示しな
い発振器に接続されている。
The hollow holding member 39 has the holes 35a and 35b.
The double nut 40 is inserted into the upper hole 35a and presses the pressing member 39. The socket 41 is screwed into the protrusion 34 of the upper wall 27 of the main body 21 . The lead wire 42 is connected to the piezoelectric element 37, and is connected to the pressing member 39 and the double nut 4.
0 and the socket 41, and is connected to an oscillator (not shown).

前記液体流入部22は、流路幅が入口43から前記本体
21に向かって暫時拡大された形状をなしている。前記
液体流入部22と本体21の振動機構29の取り付は位
置までの間には、流路幅が一定の区域44を形−成して
いる。この区域44から前記噴射口24に亘る下壁25
部分は、曲面状に傾斜した形状をなしている。前記噴射
口24から前記液体排出部23に向かう前記本体21の
下壁25部分は、曲面状に立ち上がった形状をなし、か
つ前記液体排出部23の下壁は前記本体21の立ち上が
り下壁25と一体化されて曲面状に立ち上がり、流路高
さが暫時縮小した形状をなしている。また、前記液体排
出部23は流路幅が出口45に向かって暫時縮小した形
状をなしている。なお、前記入口43及び出口45には
洗浄液導入管、洗浄液排出管(いずれも図示せず)が連
結されている。
The liquid inflow portion 22 has a shape in which the flow path width is temporarily expanded from the inlet 43 toward the main body 21 . A region 44 having a constant flow path width is formed between the liquid inflow portion 22 and the mounting position of the vibration mechanism 29 of the main body 21. A lower wall 25 extending from this area 44 to the injection port 24
The portion has a curved and inclined shape. A lower wall 25 portion of the main body 21 extending from the injection port 24 to the liquid discharge part 23 has a curved shape, and the lower wall of the liquid discharge part 23 is in contact with the rising lower wall 25 of the main body 21. It is integrated into a curved surface and has a shape in which the height of the flow path is temporarily reduced. Further, the liquid discharge portion 23 has a shape in which the flow path width is temporarily reduced toward the outlet 45. Note that a cleaning liquid inlet pipe and a cleaning liquid discharge pipe (both not shown) are connected to the inlet 43 and the outlet 45.

このような構成によれば、導入管から洗浄液を液体流入
部22に導入すると、該導入部22は流路幅が入口43
から前記本体21に向かって暫時拡大された形状をなし
、かつ振動機構29との境界に本体21と同幅の区域4
4を形成しているため、前記洗浄液は層流状態で流路幅
が一定な本体21内に導入される。この状態でリード線
42を通して振動機構29の圧電素子37を振動させと
、振動板38は安定して振動し、該振動板38に対向し
て本体21の下壁25に開孔された細長状の噴射口24
から洗浄液が超音波にのって帯状に噴射される。この噴
射に際して細長上の噴射口24近傍の下壁25は、曲面
上に立ち上がった形状をなし、洗浄液の案内部として作
用するため、細長状の液体噴射口24から洗浄液を帯状
にかつ高い指向性を持たせて噴射される。
According to such a configuration, when the cleaning liquid is introduced into the liquid inlet portion 22 from the introduction pipe, the flow path width of the introduction portion 22 is equal to the width of the inlet 43.
The area 4 has a shape that is temporarily enlarged toward the main body 21 and has the same width as the main body 21 at the boundary with the vibration mechanism 29.
4, the cleaning liquid is introduced into the main body 21 in a laminar flow state with a constant channel width. In this state, when the piezoelectric element 37 of the vibration mechanism 29 is vibrated through the lead wire 42, the diaphragm 38 vibrates stably. injection port 24
Cleaning liquid is sprayed in a belt shape by ultrasonic waves. During this injection, the lower wall 25 near the elongated liquid injection port 24 has a curved shape and acts as a guiding part for the cleaning liquid, so that the cleaning liquid is distributed from the elongated liquid injection port 24 in a belt shape and with high directivity. It is injected with a .

また、本体21内に流入された洗浄液は前記噴射口24
から前記液体排出部23に向かう前記本体21の下壁2
5部分が曲面状に立ち上がった形状をなし、かつ前記液
体排出部23の下壁が前記本体21の立ち上がり下壁2
5と一体化されて曲面状に立ち上がり、流路高さが暫時
縮小した形状をなしているため、洗浄液の一部は常に前
記本体21及び排出部23の土壁を流通する、つまり前
記上壁の下面と面一に設けられた前記振動板38の液接
触面を流通し、振動板38への気泡の付着が防止される
Further, the cleaning liquid that has flowed into the main body 21 is
The lower wall 2 of the main body 21 facing the liquid discharge part 23 from
The lower wall of the liquid discharge part 23 is the raised lower wall 2 of the main body 21.
5 and rises in a curved shape, and has a shape in which the flow path height is temporarily reduced, a part of the cleaning liquid always flows through the earthen wall of the main body 21 and the discharge section 23, that is, the upper wall. The liquid flows through the liquid contact surface of the diaphragm 38, which is provided flush with the lower surface of the diaphragm 38, thereby preventing air bubbles from adhering to the diaphragm 38.

更に、液体排出部23の下壁を曲面状に立ち上がる形状
とし、かつ出口45に向けて流路幅を暫時縮小する形状
とすることによって、該排出部23からの洗浄液の排出
が絞られ、ここからの洗浄液の排出量と前記噴射口24
から噴射される洗浄液の噴射量との比を同等、或いは噴
射量が多くなるよう制御され、洗浄液の供給量を少なく
しても噴射口24から十分な量の洗浄液が噴射される。
Furthermore, by forming the lower wall of the liquid discharge part 23 in a shape that rises in a curved shape and in which the width of the flow path is temporarily reduced toward the outlet 45, the discharge of the cleaning liquid from the discharge part 23 is throttled. The amount of cleaning liquid discharged from the injection port 24
The ratio of the injection amount of the cleaning liquid injected from the injection port 24 is controlled to be the same or to be increased, so that even if the supply amount of the cleaning liquid is reduced, a sufficient amount of cleaning liquid is injected from the injection port 24.

従って、振動板38で発生した超音波を安定的に洗浄液
にのせて細長状の噴射口24から帯状に噴射でき、大面
積のガラス基板等の被処理基板を良好かつ効率よく洗浄
でき、しかも洗浄液の供給量を少なくしても噴射口から
十分な量の洗浄液を噴射することができ、ランニングコ
スト等の低減化を達成できる。
Therefore, the ultrasonic waves generated by the diaphragm 38 can be stably applied to the cleaning liquid and ejected in a strip form from the elongated injection port 24, and the substrate to be processed such as a large area glass substrate can be cleaned well and efficiently. Even if the supply amount is reduced, a sufficient amount of cleaning liquid can be injected from the injection port, and running costs can be reduced.

なお、振動板の取り付は構造は上記実施例のように圧電
素子で固定する場合に限定されない。
Note that the mounting structure of the diaphragm is not limited to the case where it is fixed using a piezoelectric element as in the above embodiment.

[発明の効果] 以上詳述した如く、本発明によれば細長状の噴射口から
洗浄液を帯状に安定して噴射でき、ひいては液晶表示素
子や半導体装置の製造工程における大面積のガラス基板
や半導体基板などの被処理基板への効率的な洗浄に適し
た流液式超音波洗浄装置を提供できる。
[Effects of the Invention] As described in detail above, according to the present invention, cleaning liquid can be stably sprayed in a strip shape from an elongated spray nozzle, and can be used for large-area glass substrates and semiconductors in the manufacturing process of liquid crystal display elements and semiconductor devices. A liquid-flow type ultrasonic cleaning device suitable for efficiently cleaning a substrate to be processed such as a substrate can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は(a)本発明の一実施例を示す流液式超音波洗
浄装置の断面図、同図(b)は同図(a)の平面図、第
2図は第1図の洗浄装置の要部拡大断面図、第3図及び
第4図はそれぞれ従来の流液式超音波洗浄装置の断面図
である。 21・・・本体、22・・・液体流入部、23・・・液
体排出部、24・・・細長状の噴射口、25・・・下壁
、27・・・上壁、29・・・振動機構、30・・・振
動子支持部材、37・・・圧電素子、38・・・振動板
、43・・・入口、44・・・区域、45・・・出口。
Figure 1 is (a) a cross-sectional view of a fluid-type ultrasonic cleaning device showing an embodiment of the present invention, Figure (b) is a plan view of Figure (a), and Figure 2 is the cleaning shown in Figure 1. An enlarged sectional view of the main part of the apparatus, FIGS. 3 and 4 are sectional views of a conventional fluid-type ultrasonic cleaning apparatus. DESCRIPTION OF SYMBOLS 21... Main body, 22... Liquid inflow part, 23... Liquid discharge part, 24... Elongated injection port, 25... Lower wall, 27... Upper wall, 29... Vibration mechanism, 30... Vibrator support member, 37... Piezoelectric element, 38... Vibration plate, 43... Inlet, 44... Area, 45... Exit.

Claims (3)

【特許請求の範囲】[Claims] (1)前段に液体流入部、後段に液体排出部を有する内
部に液体が流通する本体と、この本体の下壁に該本体の
長手方向と直交するように開孔された細長状の液体噴射
口と、この噴射口と対向する前記本体上壁に該本体内を
流通する液体と接触するように取り付けられ、前記液体
に超音波を印加する振動板とを具備し、前記液体流入部
は入口から前記本体に向かって流路幅が暫時拡大された
形状をなし、前記本体は下壁が前記噴射口の位置から前
記液体排出部に向かって曲面状に立ち上がった形状をな
し、かつ前記液体排出部は下壁が前記本体の立ち上がり
下壁と一体化されて曲面状に立ち上がり、流路高さが暫
時縮小した形状をなすことを特徴とする流液式超音波洗
浄装置。
(1) A main body with a liquid inlet in the front stage and a liquid discharge part in the rear stage, through which liquid flows, and a slender liquid jet hole formed in the lower wall of the main body so as to be perpendicular to the longitudinal direction of the main body. a diaphragm attached to the upper wall of the main body facing the injection port so as to be in contact with the liquid flowing in the main body and applying ultrasonic waves to the liquid; The width of the flow path is temporarily expanded from the main body toward the main body; A fluid-flow type ultrasonic cleaning device characterized in that the lower wall is integrated with the rising lower wall of the main body and rises in a curved shape, and the flow path height is temporarily reduced.
(2)前記噴射口の位置から前記液体流入部に向かう前
記本体の下壁部分を少なくとも曲面状に立ち上がった形
状としたことを特徴とする請求項1記載の流液式超音波
洗浄装置。
(2) The liquid-flowing ultrasonic cleaning device according to claim 1, wherein a lower wall portion of the main body extending from the position of the injection port toward the liquid inflow portion has at least a curved shape.
(3)前記振動板より前記液体流入部側に流路幅が一定
の区域を設けたことを特徴とする請求項1記載の流液式
超音波洗浄装置。
(3) The fluid-flowing ultrasonic cleaning device according to claim 1, further comprising a region having a constant channel width on the liquid inflow portion side from the diaphragm.
JP1181753A 1989-07-14 1989-07-14 Flow-through ultrasonic cleaning device Expired - Fee Related JP2549735B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1181753A JP2549735B2 (en) 1989-07-14 1989-07-14 Flow-through ultrasonic cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1181753A JP2549735B2 (en) 1989-07-14 1989-07-14 Flow-through ultrasonic cleaning device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6304620A Division JP2566125B2 (en) 1994-12-08 1994-12-08 Flow-through ultrasonic cleaning device

Publications (2)

Publication Number Publication Date
JPH0347578A true JPH0347578A (en) 1991-02-28
JP2549735B2 JP2549735B2 (en) 1996-10-30

Family

ID=16106286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1181753A Expired - Fee Related JP2549735B2 (en) 1989-07-14 1989-07-14 Flow-through ultrasonic cleaning device

Country Status (1)

Country Link
JP (1) JP2549735B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0556285U (en) * 1992-01-07 1993-07-27 株式会社カイジョー Ultrasonic cleaning equipment
US6240938B1 (en) 1996-05-29 2001-06-05 Steag Microtech Gmbh Device for treating substrates in a fluid container
DE19742680B4 (en) * 1997-09-26 2006-03-02 Siltronic Ag Cleaning process for disc-shaped material
JP2017195335A (en) * 2016-04-22 2017-10-26 株式会社荏原製作所 Substrate cleaning device
US11676827B2 (en) 2016-03-08 2023-06-13 Ebara Corporation Substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0556285U (en) * 1992-01-07 1993-07-27 株式会社カイジョー Ultrasonic cleaning equipment
US6240938B1 (en) 1996-05-29 2001-06-05 Steag Microtech Gmbh Device for treating substrates in a fluid container
DE19742680B4 (en) * 1997-09-26 2006-03-02 Siltronic Ag Cleaning process for disc-shaped material
US11676827B2 (en) 2016-03-08 2023-06-13 Ebara Corporation Substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus
JP2017195335A (en) * 2016-04-22 2017-10-26 株式会社荏原製作所 Substrate cleaning device

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