JPH0324658B2 - - Google Patents
Info
- Publication number
- JPH0324658B2 JPH0324658B2 JP57072916A JP7291682A JPH0324658B2 JP H0324658 B2 JPH0324658 B2 JP H0324658B2 JP 57072916 A JP57072916 A JP 57072916A JP 7291682 A JP7291682 A JP 7291682A JP H0324658 B2 JPH0324658 B2 JP H0324658B2
- Authority
- JP
- Japan
- Prior art keywords
- mol
- emulsion
- developer
- silver
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000839 emulsion Substances 0.000 claims description 54
- -1 silver halide Chemical class 0.000 claims description 47
- 229910052709 silver Inorganic materials 0.000 claims description 37
- 239000004332 silver Substances 0.000 claims description 37
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 28
- 239000003795 chemical substances by application Substances 0.000 claims description 24
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 19
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 13
- 238000012545 processing Methods 0.000 claims description 9
- 150000003283 rhodium Chemical class 0.000 claims description 7
- 230000005070 ripening Effects 0.000 claims description 7
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 6
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 6
- 239000000084 colloidal system Substances 0.000 claims description 5
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical compound C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 description 25
- 108010010803 Gelatin Proteins 0.000 description 22
- 229920000159 gelatin Polymers 0.000 description 22
- 239000008273 gelatin Substances 0.000 description 22
- 235000019322 gelatine Nutrition 0.000 description 22
- 235000011852 gelatine desserts Nutrition 0.000 description 22
- 239000000243 solution Substances 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 239000000975 dye Substances 0.000 description 12
- 238000011161 development Methods 0.000 description 11
- 230000018109 developmental process Effects 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 229920001515 polyalkylene glycol Polymers 0.000 description 9
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 206010070834 Sensitisation Diseases 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 229920000578 graft copolymer Polymers 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000008313 sensitization Effects 0.000 description 4
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 150000001565 benzotriazoles Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- AOSZTAHDEDLTLQ-AZKQZHLXSA-N (1S,2S,4R,8S,9S,11S,12R,13S,19S)-6-[(3-chlorophenyl)methyl]-12,19-difluoro-11-hydroxy-8-(2-hydroxyacetyl)-9,13-dimethyl-6-azapentacyclo[10.8.0.02,9.04,8.013,18]icosa-14,17-dien-16-one Chemical compound C([C@@H]1C[C@H]2[C@H]3[C@]([C@]4(C=CC(=O)C=C4[C@@H](F)C3)C)(F)[C@@H](O)C[C@@]2([C@@]1(C1)C(=O)CO)C)N1CC1=CC=CC(Cl)=C1 AOSZTAHDEDLTLQ-AZKQZHLXSA-N 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 2
- 229940126657 Compound 17 Drugs 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 229910021604 Rhodium(III) chloride Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 235000000346 sugar Nutrition 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 125000004964 sulfoalkyl group Chemical group 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 150000003536 tetrazoles Chemical class 0.000 description 2
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- IWZSHWBGHQBIML-ZGGLMWTQSA-N (3S,8S,10R,13S,14S,17S)-17-isoquinolin-7-yl-N,N,10,13-tetramethyl-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1H-cyclopenta[a]phenanthren-3-amine Chemical compound CN(C)[C@H]1CC[C@]2(C)C3CC[C@@]4(C)[C@@H](CC[C@@H]4c4ccc5ccncc5c4)[C@@H]3CC=C2C1 IWZSHWBGHQBIML-ZGGLMWTQSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- YLVACWCCJCZITJ-UHFFFAOYSA-N 1,4-dioxane-2,3-diol Chemical compound OC1OCCOC1O YLVACWCCJCZITJ-UHFFFAOYSA-N 0.000 description 1
- SIQZJFKTROUNPI-UHFFFAOYSA-N 1-(hydroxymethyl)-5,5-dimethylhydantoin Chemical compound CC1(C)N(CO)C(=O)NC1=O SIQZJFKTROUNPI-UHFFFAOYSA-N 0.000 description 1
- FYBFGAFWCBMEDG-UHFFFAOYSA-N 1-[3,5-di(prop-2-enoyl)-1,3,5-triazinan-1-yl]prop-2-en-1-one Chemical compound C=CC(=O)N1CN(C(=O)C=C)CN(C(=O)C=C)C1 FYBFGAFWCBMEDG-UHFFFAOYSA-N 0.000 description 1
- SAVMNSHHXUMFRQ-UHFFFAOYSA-N 1-[bis(ethenylsulfonyl)methoxy-ethenylsulfonylmethyl]sulfonylethene Chemical compound C=CS(=O)(=O)C(S(=O)(=O)C=C)OC(S(=O)(=O)C=C)S(=O)(=O)C=C SAVMNSHHXUMFRQ-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- DBHJVDJOBHPDRW-UHFFFAOYSA-N 2,4-dichloro-1,3,5-triazine;sodium Chemical compound [Na].ClC1=NC=NC(Cl)=N1 DBHJVDJOBHPDRW-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- YKUDHBLDJYZZQS-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one Chemical compound OC1=NC(Cl)=NC(Cl)=N1 YKUDHBLDJYZZQS-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical class C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical class N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- PHBQDVOLZRHPOJ-UHFFFAOYSA-N 3-ethenylsulfonyl-n-[(3-ethenylsulfonylpropanoylamino)methyl]propanamide Chemical compound C=CS(=O)(=O)CCC(=O)NCNC(=O)CCS(=O)(=O)C=C PHBQDVOLZRHPOJ-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- AJKLCDRWGVLVSH-UHFFFAOYSA-N 4,4-bis(hydroxymethyl)-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CO)(CO)CN1C1=CC=CC=C1 AJKLCDRWGVLVSH-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- GIQKIFWTIQDQMM-UHFFFAOYSA-N 5h-1,3-oxazole-2-thione Chemical compound S=C1OCC=N1 GIQKIFWTIQDQMM-UHFFFAOYSA-N 0.000 description 1
- ORZRMRUXSPNQQL-UHFFFAOYSA-N 6-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2C=NNC2=C1 ORZRMRUXSPNQQL-UHFFFAOYSA-N 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- FGHHBEZSBZFDJN-UHFFFAOYSA-N Cc1nc2nccc(O)n2n1 Chemical compound Cc1nc2nccc(O)n2n1 FGHHBEZSBZFDJN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- 229920002085 Dialdehyde starch Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical class OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 241000981595 Zoysia japonica Species 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- RUSUZAGBORAKPY-UHFFFAOYSA-N acetic acid;n'-[2-(2-aminoethylamino)ethyl]ethane-1,2-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.NCCNCCNCCN RUSUZAGBORAKPY-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000005599 alkyl carboxylate group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-N bromoacetic acid Chemical class OC(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- SRPOMGSPELCIGZ-UHFFFAOYSA-N disulfino carbonate Chemical compound OS(=O)OC(=O)OS(O)=O SRPOMGSPELCIGZ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- JOXWSDNHLSQKCC-UHFFFAOYSA-N ethenesulfonamide Chemical class NS(=O)(=O)C=C JOXWSDNHLSQKCC-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FBPFZTCFMRRESA-UHFFFAOYSA-N hexane-1,2,3,4,5,6-hexol Chemical class OCC(O)C(O)C(O)C(O)CO FBPFZTCFMRRESA-UHFFFAOYSA-N 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- AKCUHGBLDXXTOM-UHFFFAOYSA-N hydroxy-oxo-phenyl-sulfanylidene-$l^{6}-sulfane Chemical compound SS(=O)(=O)C1=CC=CC=C1 AKCUHGBLDXXTOM-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 230000002458 infectious effect Effects 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Chemical class 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002545 isoxazoles Chemical class 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 125000005439 maleimidyl group Chemical class C1(C=CC(N1*)=O)=O 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- 229950005308 oxymethurea Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- UOULCEYHQNCFFH-UHFFFAOYSA-M sodium;hydroxymethanesulfonate Chemical compound [Na+].OCS([O-])(=O)=O UOULCEYHQNCFFH-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 150000008130 triterpenoid saponins Chemical class 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
- G03C1/043—Polyalkylene oxides; Polyalkylene sulfides; Polyalkylene selenides; Polyalkylene tellurides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/15—Lithographic emulsion
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Description
本発明はハロゲン化銀写真感光材料現像方法に
関し、更にくわしくは実質的に明室と呼び得る環
境下で取扱うことが可能な写真感光材料現像方法
に関する。
印刷用製版工程において、比較的低感度の感光
材料を使用する密着露光工程(いわゆる返し工
程)を明るい部屋で行ないたいという要望に答
え、近年ハロゲン化銀を感光素子として用いなが
ら、実質的に明室と呼び得る環境下で取扱うこと
が可能な写真感光材料が開発されてきている。こ
れは、可視光線に対する感度を極度に(従来の約
1/104)低下させた感光材料を実質的に紫外線を
含まない安全光下で柴外線を多量に含む光源にて
露光することにより達成される。
一方いわゆる返し工程には単純な一枚密着返し
(一枚の現像処理ずみフイルムを原稿として、返
し用感光材料を密着露光・現像してネガ像/ポジ
像変換を行なう)のみでなく、いわゆる抜き文字
と呼ばれる高度な画像変換作業が行なわれる。こ
の抜き文字とは印刷物においてインクが網点状に
紙にのつている部分(網点部)及びインクが全面
に紙にのつている部分(ベタ部分と称するの中に
あるインクののらない文字・記号などの部分を称
する。より具体的に写真製版工程における抜き文
字の作り方を述べるならば、第1図に示すごとく
透明もしくは半透明の貼付ベース3(通常数
10μm厚のポリエチレンテレフタレートが使用さ
れる)に網点の形成された現像処理ずみフイルム
(網点原稿)4を貼付けたものと、同様に貼付ベ
ース1に文字や記号などのいわゆる線画ポジ像の
形成された現像処理ずみフイルム(線画原稿)2
を貼付けたものとを重ね合せたものを原稿とし、
その網点画像部に返し用感光材料5の乳剤面を密
着させて露光現像処理して網点画像中に線画の白
抜け部分を形成させるものである。この工程にお
いて重要な点は、網点画像及び線画が各々その網
点面積及び画線巾に従つてネガ/ポジ像変換が行
なわれなければならないことである。例えば50%
の黒面積を有する網点画像は50%の白面積に、
50μmの黒線巾を有する線画は50μmの白線巾に正
確に変換されなければならない。しかるに第1図
にて明きらかな如く、網点画像は返し用感光材料
の乳剤面に直接密着させて露光するのに対し、線
画像は網点原稿4(通常約110μmの厚さを有す)
及び当該網点原稿用の貼付ベース3(数100μm
厚)を中間に介して返し用感光材料に露光される
こととなる。すなわち線画像は数100μmの透明も
しくは半透明のスペーサを介したボケ露光となつ
て返し用感光材料に与えられることになる。この
ため通常の露光量(網点面積を忠実にネガ/ポジ
変換させる露光量)を与えるとボケ露光の影響に
より線画像の白線巾が細くなつてしまう。一方ボ
ケ露光の影響を少なくし線画像の線巾を忠実にネ
ガ/ポジ変換させるべく露光量を小さくすると網
点面積が露光不足のため細くなつてしまう。この
現象には感光材料のみならず、露光光源の寄与が
大きい。すなわち露光光源が点光源と呼べる程小
さいならば前記ボケ露光の程度が小さくなるから
である。しかるに本発明の如き明室用感光材料で
は大光量の露光装置を用いなければならぬため、
従来の暗室型露光装置より光源が大きく、抜文字
品質が劣化する原因となつていた。
かかる抜き文字品質の劣化をなくす手段につい
ては今までほとんど報告がなく、また従来印刷用
感光材料の改良において目的とされた特性改良
(例えば増感、網点品質の改良、特性曲線の硬調
化など)とは全く目的が異なるためどのような手
段をとるべきかについては全く知られていなかつ
た。
明室で取扱うことのできるハロゲン化銀感光材
料については例えば特開昭56−125734号、同56−
149030号、同56−149031号等に多量のロジウム塩
を添加して粒子形成した乳剤例が記述されている
が、これらの公知例には抜き文字品質を改良する
技術は何ら記述されていない。また、これらの公
知例には現像液中にポリアルキレンオキサイド類
を添加することが開示されているが、後述する実
施例1に併記した比較試料が示す結果から明ら
かなように、現像液のみにポリアルキレンオキサ
イド類を添加しても抜き文字品質の改良は達成で
きない。
一方近年迅速かつ安定な処理でリス現像に匹敵
する画質を得ようとする試みが多く為されている
が高度な画像変換作業である抜文字工程も同様の
迅速安定処理で行ないたいとの要請が強まつてき
た。この要請に対する具体的技術についても従来
まつたく知られていなかつた。
本発明の目的は安定な処理液を用いて迅速に良
好な抜き文字画像を得る方法を提供することであ
る。
本発明の上記目的は全ハロゲン化銀の少なくと
も80モル%が塩化銀より成り、平均粒子サイズが
0.4μm以下であり、かつ乳剤製造の第一熟成終了
前の任意の時期に銀1モルあたり1×10-6モル以
上の水溶性ロジウム塩を含有せしめたハロゲン化
銀乳剤を含有し、当該乳剤層もしくは少なくとも
ひとつの親水性コロイド層中に分子量が少なくと
も600のポリアルキレンオキサイド又はその誘導
体を銀1モルあたり1×10-5ないし1×10-2モル
含有することを特徴とするハロゲン化銀感光材料
をジヒドロキシベンゼン系現像主薬を0.05ないし
0.5モル/含有し補助現像主薬が0.05g/以
下であり、遊離の亜硫酸イオン濃度を0.25モル/
以上含有し5又は6ニトロインダゾールを20
mg/以上含有し現像液のPHを10.5以上にするの
に充分な量のアルカリを含有する現像液で処理す
ることにより達成された。
本発明において用いられるハロゲン化銀感光材
料中のハロゲン化銀は塩化銀、塩臭化銀、沃塩化
銀、沃臭塩化銀より成るもので少なくとも80モル
%が塩化銀から成ることが好ましく、さらに90モ
ル%以上が塩化銀から成ることが好ましく、特に
95モル%以上が塩化銀から成ることが好ましい。
ハロゲン化銀の平均粒子サイズは0.4μm以下で
あることが好ましく特に0.3μm以下が好ましい。
平均粒径とは、ハロゲン化銀写真科学の分野の専
門家には常用されており、容易に理解される用語
である。粒径とは粒子が球状又は球に近似できる
粒子の場合には粒子直径を意味する。粒子が立方
体である場合には稜長×√4/πを粒径とする。平
均粒子投影面積にもとずく代数平均又は幾何平均
により求める。平均粒径を求める方法の詳細につ
いては、C.E.MeesとT.H.James著:ザ セオリ
ー オブ ザ フオトグラフイツク プロセス
(The theory of the photographic process),
3rd ed.p.36〜p.43,(1966年,McMillan社刊)
を参照すればよい。
本発明において用いられる水溶性ロジウム塩は
代表的にはロジウムクロライド、ロジウムトリク
ロライド、ロジウムアンモニウムクロライドなど
が用いられるが、さらに錯塩を用いることもでき
る。本発明におけるロジウム塩の添加時間は乳剤
製造時の第一熟成終了前に限定され、特に粒子形
成中に添加されるのが望ましく、その添加量は銀
1モルあたり1×10-6モル以上が望ましく、さら
に1×10-5以上が望ましく、5×10-5ないし1×
10-3の範囲が特に好ましい。
本発明における可溶性銀塩と可溶性ハロゲン塩
を反応させる形式としては片側混合法、同時混合
法、それらの組合せなどのいずれを用いてもよ
い。
粒子を銀イオン過剰の下において形成させる方
法(いわゆる逆混合法)を用いることもできる。
同時混合法の一つの形式としてハロゲン化銀の生
成される液相中のpAgを一定に保つ方法、すなわ
ちいわゆるコントロールド・ダブルジエツト法を
用いることができ、この方法によると、結晶形が
規則的で粒子サイズが均一に近いハロゲン化銀乳
剤がえられる。
粒子形成は酸性下で行なうことが好ましい。
我々の実験では中性及びアルカリ性下では本発明
の効果は減少することがわかつた。好ましいPH範
囲はPH6以下であり、さらに好ましくは5以下で
ある。
写真乳剤の結合剤または保護コロイドとして
は、ゼラチンを用いるのが有利であるが、それ以
外の親水性コロイドも用いることができる。たと
えばゼラチン誘導体、ゼラチンと他の高分子との
グラフトポリマー、アルブミン、カゼイン等の蛋
白質;ヒドロキシエチルセルロース、カルボキシ
メチルセルロース、セルローズ硫酸エステル類等
の如きセルロース誘導体、アルギン酸ソーダ、澱
粉誘導体などの糖誘導体;ポリビニルアルコー
ル、ポリビニルアルコール部分アセタール、ポリ
−N−ビニルピロリドン、ポリアクリル酸、ポリ
メタクリル酸、ポリアクリルアミド、ポリビニル
イミダゾール、ポリビニルピラゾール等の単一あ
るいは共重合体の如き多種の合成親水性高分子物
質を用いることができる。
ゼラチンとしては石灰処理ゼラチンのほか、酸
処理ゼラチンを用いてもよく、ゼラチン加水分解
物、ゼラチン酵素分解物も用いることができる。
ゼラチン誘導体としては、ゼラチンにたとえば酸
ハライド、酸無水物、イソシアナート類、ブロモ
酢酸、アルカンサルトン類、ビニルスルホンアミ
ド類、マレインイミド化合物類、ポリアルキレン
オキシド類、エポキシ化合物類等種々の化合物を
反応させて得られるものが用いられる。その具体
例は米国特許2614928号、同3132945号、同
3186846号、同3312553号、英国特許861414号、同
1033189号、同1005784号、特公昭42−26845号な
どに記載されている。
前記ゼラチン・グラフトポリマーとしては、ゼ
ラチンにアクリル酸、メタアクリル酸、それらの
エステル、アミドなどの誘導体、アクリロニトリ
ル、スチレンなどの如き、ビニル系モノマーの単
一(ホモ)または共重合体をグラフトさせたもの
を用いることができる。ことに、ゼラチンとある
程度相溶性のあるポリマーたとえばアクリル酸、
メタアクリル酸、アクリルアミド、メタアクリル
アミド、ヒドロキシアルキルメタアクリレート等
の重合体とのグラフトポリマーが好ましい。これ
らの例は米国特許2763625号、同2831767号、同
2956884号などに記載がある。代表的な合成親水
性高分子物質はたとえば西独特許出願(OLS)
2312708号、米国特許3620751号、同3879205号、
特公昭43−7561号に記載のものである。
本発明の方法で用いるハロゲン化銀乳剤は化学
増感していても、していなくとも良い。明室での
取扱い性を良化する観点からは化学増感していな
い方がむしろ望ましい。化学増感する場合は通常
のイオウ増感、還元増感及び金増感のいずれかも
しくはそれらの組合わせが用いられる。
本発明に用いるポリアルキレンオキサイド化合
物は、炭素数2〜4のアルキレンオキサイド、た
とえばエチレンオキサイド、プロピレン−1,2
−オキサイド、ブチレン−1,2−オキサイドな
ど、好ましくはエチレンオキサイドの少くとも10
単位から成るポリアルキレンオキサイドと、水、
脂肪族アルコール、芳香族アルコール、脂肪酸、
有機アミン、ヘキシトール誘導体などの活性水素
原子を少くとも1個有する化合物との縮合物ある
いは二種以上のポリアルキレンオキサイドのブロ
ツクコポリマーなどを包含する。すなわち、ポリ
アルキレンオキサイド化合物として、具体的には
ポリアルキレングリコール類
ポリアルキレングリコールアルキルエーテル類
ポリアルキレングリコールアリールエーテル類
ポリアルキレングリコール(アルキルアリー
ル)
エーテル類
ポリアルキレングリコールエステル類
ポリアルキレングリコール脂肪酸アミド類
ポリアルキレングリコールアミン類
ポリアルキレングリコール・ブロツク共重合体
ポリアルキレングリコールグラフト重合物
などを用いることができる。分子量は600以上で
あることが必要である。
ポリアルキレンオキサイド鎖は分子中に一つと
は限らず、二つ以上含まれてもよい。その場合
個々のポリアルキレンオキサイド鎖が10より少い
アルキレンオキサイド単位から成つてもよいが、
分子中のアルキレンオキサイド単位の合計は少く
とも10でなければならない。分子中に二つ以上の
ポリアルキレンオキサイド鎖を有する場合、それ
らの各々は異るアルキレンオキサイド単位、たと
えばエチレンオキサイドとプロピレンオキサイド
から成つていてもよい。本発明で用いるポリアル
キレンオキサイド化合物は、好ましくは14以上
100までのアルキレンオキサイド単位を含むもの
である。
本発明で用いるポリアルキレンオキサイド化合
物の具体例をあげると次の如くである。
ポリアルキレンオキサイド化合物例
−1 HO(CH2CH2O)90H
−2 C4H9O(CH2CH2O)15H
−3 C12H25O(CH2CH2O)15H
−4 C18H37O(CH2CH2O)15H
−5 C18H37O(CH2CH2O)40H
−6 C8H17CH=CHC8H16O(CH2CH2O)15H
など特開昭50−156423号、特開昭52−108130号お
よび特開昭53−3217号に記載されたポリアルキレ
ンオキサイド化合物を用いることができる。これ
らのポリアルキレンオキサイド化合物は一種類の
みを用いても、二種類以上組合せて用いてもよ
い。
これらのポリアルキレンオキサイド化合物をハ
ロゲン化銀乳剤に添加する場合には、適当な濃度
の水溶液としてあるいは水と混和しうる低沸点の
有機溶媒に溶解して、塗布前の適当な時期、好ま
しくは、化学熟成の後に乳剤に添加することがで
きる。乳剤に加えずに非感光性の親水性コロイド
層、たとえば中間層、保護層、フイルター層など
に添加してもよい。
本発明に用いられるポリアルキレンオキシド化
合物は、ハロゲン化銀1モルあたり1×10-5モル
ないし1×10-2モルの範囲が望ましい。
また本発明においては通常カブリ防止剤として
用いられるベントリアゾール化合物および/また
はメルカプト系化合物を併用すると抜文字画質が
さらに良化することが発見された。これらの化合
物は感光材料中に含有された場合にのみ有効であ
つた。この効果は単なるカブリ防止効果ではな
く、かつ特性曲線を硬調化する効果でもなく抜文
字品質を良化するものであつた。好ましい化合物
の1つは、アルキル基(メチル、エチル、ヘプチ
ルなど)、アルコキシ基、ハロゲン原子、アシル
基、アシルアミノ基、カルバモイル基、スルフア
モイル基、アリール基などから選ばれる一つ又は
それ以上の置換基で置換されても良いベンゾトリ
アゾール化合物であつて特に炭素数1〜3のアル
キル置換ベンゾトリアゾールが有効であつた。か
つその有効添加量範囲は銀1モルあたり1×10-4
ないし1×10-2モルであり、特に好ましいのは5
×10-4ないし5×10-3モルであつた。
好ましい化合物の他の1つは下記の如き一般式
で表わされるものであつた。
式中Mは水素原子、−NH4基、アルカリ金属原
子をあらわし、
Xは−NR基、イオウ原子、酸素原子をあらわ
し、
Rは水素原子、置換されてよいアルキル基、置
換されてよいアリール基、置換されてよいアラル
キル基をあらわし、Zは5員複素環(例えばテト
ラゾール、トリアゾール、イミダゾール、チアジ
アゾール)又はベンゼン環と縮合した5員の複素
環(例えばベンズイミダゾール、ベンズチアゾー
ル、ベンズオキサゾール)を形成するのに必要な
原子群をあらわしこれらの複素環はアルキル基、
アルコキシ基、カルボキシ基、スルホ基、ヒドロ
キシル基、アミノ基、ニトロ基、ハロゲン原子、
カルバモイル基、アルキルチオ基、メルカプト基
などで置換されていてもよい。これらの中で好ま
しいのはZがテトラゾール、トリアゾール、チア
ジアゾール、ベンズイミダゾール、ベンズチアゾ
ールであらわされる化合物であり、最も好ましい
のはテトラゾール化合物である。好ましい化合物
の具体例を以下に示す。
The present invention relates to a method for developing a silver halide photographic light-sensitive material, and more particularly to a method for developing a photographic light-sensitive material that can be handled in an environment that can be essentially called a bright room. In the printing plate-making process, in response to the desire to perform the contact exposure process (so-called return process) using a relatively low-sensitivity photosensitive material in a bright room, in recent years, silver halide has been used as a photosensitive element and Photographic materials that can be handled in what can be called a "room environment" have been developed. This is achieved by exposing a photosensitive material whose sensitivity to visible light has been extremely reduced (approximately 1/10 4 of conventional light) to a light source containing a large amount of Shiba rays under safe light that contains virtually no ultraviolet rays. be done. On the other hand, the so-called return process involves not only simple one-sheet contact return (using a single developed film as an original, contact exposure and development of the return photosensitive material to convert a negative image to a positive image); Advanced image conversion work called characters is performed. These cut-out characters are the parts of printed matter where ink is covered in a halftone pattern (halftone dots) and the parts where ink is spread all over the paper (solid parts).・It refers to parts such as symbols.More specifically, to describe how to make cut-out characters in the photolithography process, as shown in Figure 1, a transparent or translucent pasting base 3 (usually a number
10 μm thick polyethylene terephthalate (polyethylene terephthalate is used) is pasted with a developed film (halftone dot original) 4 on which halftone dots are formed, and similarly a so-called line image positive image such as letters and symbols is formed on the pasting base 1. Developed film (line drawing original) 2
The pasted version and the superimposed version are the manuscript.
The emulsion surface of the photosensitive material 5 for return is brought into close contact with the halftone dot image area, and exposed and developed to form blank portions of line drawings in the halftone dot image. An important point in this process is that the halftone dot image and the line drawing must undergo negative/positive image conversion according to their halftone dot area and line width, respectively. For example 50%
A halftone image with a black area of 50% white area,
A line drawing with a black line width of 50 μm must be accurately converted to a white line width of 50 μm. However, as is clear from FIG. 1, the halftone image is exposed by directly contacting the emulsion surface of the return photosensitive material, whereas the line image is exposed using the halftone dot original 4 (usually having a thickness of about 110 μm). )
and pasting base 3 for the halftone original (several 100 μm
The photosensitive material for return is exposed to light through the intermediate layer (thickness). In other words, the line image becomes blurred exposure via a transparent or semi-transparent spacer of several 100 μm and is applied to the photosensitive material for return. For this reason, if a normal exposure amount (an exposure amount that faithfully converts the halftone dot area from negative to positive) is applied, the white line width of the line image will become narrower due to the effect of blurring exposure. On the other hand, if the exposure amount is reduced in order to reduce the influence of blurred exposure and to faithfully convert the line width of a line image from negative to positive, the halftone dot area becomes thin due to insufficient exposure. Not only the photosensitive material but also the exposure light source greatly contributes to this phenomenon. That is, if the exposure light source is small enough to be called a point light source, the degree of blurred exposure will be reduced. However, in the photosensitive material for bright room use as in the present invention, an exposure device with a large amount of light must be used.
The light source is larger than that of conventional darkroom type exposure equipment, which causes deterioration in the quality of printed characters. Until now, there have been almost no reports on means to eliminate such deterioration in the quality of cut-out characters, and there have been few reports on methods to eliminate such deterioration in the quality of cut-out characters. ), the purpose of which was completely different from that of the previous one, so there was no knowledge of what measures should be taken. Regarding silver halide photosensitive materials that can be handled in a bright room, see, for example, JP-A-56-125734 and JP-A-56-125734.
Examples of emulsions in which grains are formed by adding a large amount of rhodium salt are described in No. 149030 and No. 56-149031, but these known examples do not describe any technique for improving the quality of cut-out characters. In addition, these known examples disclose that polyalkylene oxides are added to the developer, but as is clear from the results of the comparative sample included in Example 1, which will be described later, it is not possible to add polyalkylene oxides to the developer alone. Even if polyalkylene oxides are added, improvement in cutout character quality cannot be achieved. On the other hand, in recent years, many attempts have been made to obtain image quality comparable to that of lithography through rapid and stable processing, but there is a growing demand for the same rapid and stable processing to be performed in the character extraction process, which is an advanced image conversion process. It's getting stronger. Until now, the specific technology to meet this request was not well known. An object of the present invention is to provide a method for quickly obtaining a good cutout character image using a stable processing liquid. The above objects of the present invention are such that at least 80 mol% of the total silver halide consists of silver chloride and the average grain size is
0.4 μm or less, and contains a water-soluble rhodium salt of 1 x 10 -6 mol or more per mol of silver at any time before the completion of the first ripening of emulsion production, and the emulsion Silver halide photosensitive material, characterized in that the layer or at least one hydrophilic colloid layer contains a polyalkylene oxide or a derivative thereof having a molecular weight of at least 600 in an amount of 1×10 -5 to 1×10 -2 mol per mol of silver. The material is dihydroxybenzene-based developing agent from 0.05 to
0.5 mol/contains, the auxiliary developing agent is 0.05 g/or less, and the free sulfite ion concentration is 0.25 mol/
Contains more than 20 5 or 6 nitroindazoles
This was achieved by treatment with a developer containing a sufficient amount of alkali to raise the pH of the developer to 10.5 or higher. The silver halide in the silver halide photosensitive material used in the present invention is composed of silver chloride, silver chlorobromide, silver iodochloride, and silver iodobromochloride, and preferably at least 80 mol% is composed of silver chloride. It is preferable that 90 mol% or more consists of silver chloride, especially
Preferably, 95 mol% or more consists of silver chloride. The average grain size of silver halide is preferably 0.4 μm or less, particularly preferably 0.3 μm or less.
Average grain size is a term commonly used and easily understood by those skilled in the field of silver halide photographic science. Particle size means the particle diameter in the case of particles that are spherical or can be approximated to a sphere. When the particle is cubic, the particle size is defined as the edge length x √4/π. Determined by algebraic mean or geometric mean based on the average particle projected area. For more information on how to determine average particle size, see CEMees and TH James: The theory of the photographic process,
3rd ed.p.36-p.43, (1966, published by McMillan)
Please refer to . The water-soluble rhodium salt used in the present invention is typically rhodium chloride, rhodium trichloride, rhodium ammonium chloride, etc., but complex salts can also be used. The time for adding the rhodium salt in the present invention is limited to before the end of the first ripening during emulsion production, and it is particularly desirable to add it during grain formation, and the amount added is 1 x 10 -6 mol or more per mol of silver. Desirably, more preferably 1×10 -5 or more, 5×10 -5 to 1×
A range of 10 −3 is particularly preferred. In the present invention, the soluble silver salt and the soluble halogen salt may be reacted by any method such as a one-sided mixing method, a simultaneous mixing method, or a combination thereof. It is also possible to use a method in which particles are formed in an excess of silver ions (so-called back-mixing method).
One type of simultaneous mixing method is a method in which the pAg in the liquid phase in which silver halide is produced is kept constant, that is, the so-called controlled double-jet method. A silver halide emulsion with nearly uniform grain size can be obtained. Preferably, particle formation is carried out under acidic conditions.
Our experiments have shown that the effectiveness of the present invention decreases under neutral and alkaline conditions. The preferred pH range is 6 or less, more preferably 5 or less. Gelatin is advantageously used as a binder or protective colloid in photographic emulsions, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; cellulose derivatives such as hydroxyethyl cellulose, carboxymethyl cellulose, and cellulose sulfates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol , polyvinyl alcohol partial acetal, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, polyvinylpyrazole, etc., single or copolymers thereof. Can be done. As the gelatin, in addition to lime-treated gelatin, acid-treated gelatin may be used, and gelatin hydrolysates and gelatin enzymatically decomposed products can also be used.
As gelatin derivatives, various compounds such as acid halides, acid anhydrides, isocyanates, bromoacetic acids, alkanesultones, vinyl sulfonamides, maleimide compounds, polyalkylene oxides, and epoxy compounds can be added to gelatin. The product obtained by the reaction is used. Specific examples are U.S. Patent No. 2614928, U.S. Patent No. 3132945,
3186846, 3312553, British Patent No. 861414,
It is described in No. 1033189, No. 1005784, and Japanese Patent Publication No. 42-26845. The gelatin graft polymer is a gelatin grafted with a single (homo) or copolymer of vinyl monomers such as acrylic acid, methacrylic acid, derivatives thereof such as esters and amides, acrylonitrile, styrene, etc. can be used. In particular, polymers with some degree of compatibility with gelatin, such as acrylic acid,
Graft polymers with polymers such as methacrylic acid, acrylamide, methacrylamide, hydroxyalkyl methacrylate are preferred. Examples of these are U.S. Pat.
It is described in issues such as No. 2956884. Typical synthetic hydrophilic polymer substances include West German patent applications (OLS)
No. 2312708, U.S. Patent No. 3620751, U.S. Patent No. 3879205,
This is described in Japanese Patent Publication No. 7561/1973. The silver halide emulsion used in the method of the present invention may or may not be chemically sensitized. From the viewpoint of improving handling properties in a bright room, it is rather preferable that the film is not chemically sensitized. In the case of chemical sensitization, any one of ordinary sulfur sensitization, reduction sensitization, and gold sensitization or a combination thereof is used. The polyalkylene oxide compound used in the present invention is an alkylene oxide having 2 to 4 carbon atoms, such as ethylene oxide, propylene-1,2
- oxide, such as butylene-1,2-oxide, preferably ethylene oxide.
Polyalkylene oxide consisting of units, water,
aliphatic alcohols, aromatic alcohols, fatty acids,
It includes condensates with compounds having at least one active hydrogen atom, such as organic amines and hexitol derivatives, and block copolymers of two or more types of polyalkylene oxides. That is, as polyalkylene oxide compounds, specifically, polyalkylene glycols polyalkylene glycol alkyl ethers polyalkylene glycol aryl ethers polyalkylene glycol (alkylaryl) ethers polyalkylene glycol esters polyalkylene glycol fatty acid amides polyalkylene Glycolamines, polyalkylene glycol block copolymers, polyalkylene glycol graft polymers, etc. can be used. The molecular weight needs to be 600 or more. The number of polyalkylene oxide chains is not limited to one in the molecule, and two or more may be included. In that case, the individual polyalkylene oxide chains may consist of fewer than 10 alkylene oxide units, but
The total number of alkylene oxide units in the molecule must be at least 10. If there is more than one polyalkylene oxide chain in the molecule, each of them may consist of different alkylene oxide units, such as ethylene oxide and propylene oxide. The polyalkylene oxide compound used in the present invention is preferably 14 or more.
Contains up to 100 alkylene oxide units. Specific examples of the polyalkylene oxide compounds used in the present invention are as follows. Polyalkylene oxide compound example-1 HO (CH 2 CH 2 O) 90 H −2 C 4 H 9 O (CH 2 CH 2 O) 15 H −3 C 12 H 25 O (CH 2 CH 2 O) 15 H − 4 C 18 H 37 O (CH 2 CH 2 O) 15 H −5 C 18 H 37 O (CH 2 CH 2 O) 40 H −6 C 8 H 17 CH=CHC 8 H 16 O (CH 2 CH 2 O ) 15H Polyalkylene oxide compounds described in JP-A-50-156423, JP-A-52-108130, and JP-A-53-3217 can be used. These polyalkylene oxide compounds may be used alone or in combination of two or more. When these polyalkylene oxide compounds are added to a silver halide emulsion, they are added as an aqueous solution of an appropriate concentration or dissolved in a low boiling point organic solvent that is miscible with water, and added at an appropriate time before coating, preferably. It can be added to the emulsion after chemical ripening. It may be added to non-photosensitive hydrophilic colloid layers, such as intermediate layers, protective layers, filter layers, etc., instead of being added to the emulsion. The amount of the polyalkylene oxide compound used in the present invention is preferably in the range of 1×10 −5 mol to 1×10 −2 mol per mol of silver halide. Furthermore, in the present invention, it has been discovered that the quality of printed characters can be further improved when a bentriazole compound and/or a mercapto compound, which are commonly used as antifoggants, are used in combination. These compounds were effective only when included in photosensitive materials. This effect was not simply an effect of preventing fog, nor was it an effect of making the characteristic curve sharper, but rather improving the quality of drawn characters. One of the preferred compounds includes one or more substituents selected from alkyl groups (methyl, ethyl, heptyl, etc.), alkoxy groups, halogen atoms, acyl groups, acylamino groups, carbamoyl groups, sulfamoyl groups, aryl groups, etc. Of the benzotriazole compounds which may be substituted with , alkyl-substituted benzotriazoles having 1 to 3 carbon atoms were particularly effective. And its effective addition amount range is 1×10 -4 per mole of silver.
to 1×10 -2 mol, particularly preferably 5
The amount was from ×10 −4 to 5×10 −3 mol. Another preferred compound was represented by the following general formula. In the formula, M represents a hydrogen atom, -NH4 group, or an alkali metal atom; , represents an optionally substituted aralkyl group, and Z forms a 5-membered heterocycle (e.g., tetrazole, triazole, imidazole, thiadiazole) or a 5-membered heterocycle fused with a benzene ring (e.g., benzimidazole, benzthiazole, benzoxazole) These heterocycles represent alkyl groups,
Alkoxy group, carboxy group, sulfo group, hydroxyl group, amino group, nitro group, halogen atom,
It may be substituted with a carbamoyl group, an alkylthio group, a mercapto group, etc. Preferred among these are compounds in which Z is represented by tetrazole, triazole, thiadiazole, benzimidazole, or benzthiazole, and most preferred are tetrazole compounds. Specific examples of preferred compounds are shown below.
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
当該化合物の有効添加量範囲は銀1モルあたり
5×10-5ないし5×10-3モルの範囲であつた。
本発明の写真乳剤にはフイルター染料として、
あるいはイラジエーシヨン防止その他種々の目的
で、水溶性染料を含有してよい。このような染料
にはオキソノール染料、ヘミオキソノール染料、
スチリル染料、メロシアニン染料、シアニン染料
及びアゾ染料が包含される。中でもオキソノール
染料;ヘミオキソノール染料及びメロシアニン染
料が有用である。用い得る染料の具体例は英国特
許584609号、同1177429号、特開昭48−85130号、
同49−99620号、同49−114420号、米国特許
2274782号、同2533472号、同2956879号、同
3148187号、同3177078号、同3247127号、同
3540887号、同3575704号、同3653905号、同
3718472号に記載されたものである。
本発明の写真乳剤には無機または有機の硬膜剤
を含有してよい。例えばクロム塩(クロム明ば
ん、酢酸クロムなど)、アルデヒド類(ホルムア
ルデヒド、グリオキサール、グリタールアルデヒ
ドなど)、N−メチロール化合物(ジメチロール
尿素、メチロールジメチルヒダントインなど)、
ジオキサン誘導体(2,3−ジヒドロキシジオキ
サンなど)、活性ビニル化合物(1,3,5−ト
リアクリロイル−ヘキサヒドロ−s−トリアジ
ン、ビス(ビニルスルホニル)メチルエーテル、
N,N′−メチレンビス−〔β−(ビニルスルホニ
ル)プロピオンアミド〕など)、活性ハロゲン化
合物(2,4−ジクロル−6−ヒドロキシ−s−
トリアジンなど)、ムコハロゲン酸類(ムコクロ
ル酸、ムコフエノキシクロル酸など)イソオキサ
ゾール類、ジアルデヒドでん粉、2−クロル−6
−ヒドロキシトリアジニル化ゼラチンなどを、単
独または組合せて用いることができる。その具体
例は、米国特許1870354号、同2080019号、同
2726162号、同2870013号、同2983611号、同
2992109号、同3047394号、同3057723号、同
3103437号、同3321313号、同3325287号、同
3362827号、同3539644号、同3543292号、英国特
許676628号、同825544号、同1270578号、ドイツ
特許872153号、同1090427号、特公昭34−7133号、
同46−1872号などに記載がある。
本発明の写真乳剤には塗布助剤、帯電防止、ス
ベリ性改良、乳化分散、接着防止および写真特性
改良など種々の目的で種々の公知の界面活性剤を
含んでもよい。
たとえばサポニン(ステロイド系)、ポリアル
キレングリコールアルキルアミンまたはアミド
類、シリコーンのポリエチレンオキサイド付加物
類)、グリシドール誘導体(たとえばアルケニル
コハク酸ポリグリセリド、アルキルフエノールポ
リグリセリド)、多価アルコールの脂肪酸エステ
ル類、糖のアルキルエステル類、同じくウレタン
類またはエーテル類などの非イオン性界面活性
剤;トリテルペノイド系サポニン、アルキルカル
ボン酸塩、アルキルスルフオン酸塩、アルキルベ
ンゼンスルフオン酸塩、アルキルナフタレンスル
フオン酸塩、アルキル硫酸エステル類、アルキル
リン酸エステル類、N−アシル−N−アルキルタ
ウリン類、スルホコハク酸エステル類、スルホア
ルキルポリオキシエチレンアルキルフエニルエー
テル類、ポリオキシエチレンアルキルリン酸エス
テル類などのような、カルボキシ基、スルホ基、
ホスホ基、硫酸エステル基、燐酸エステル基等の
酸性基を含むアニオン界面活性剤;アミノ酸類、
アミノアルキルスルホン酸類、アミノアルキル硫
酸または燐酸エステル類、アルキルベタイン類、
アミンイミド類、アミンオキシド類などの両性界
面活性剤;アルキルアミン塩類、脂肪族あるいは
芳香族第4級アンモニウム塩類、ピリジニウム、
イミダゾリウムなどの複素環第4級アンモニウム
塩類、および脂肪族または複素環を含むホスホニ
ウムまたはスルホニウム塩類などのカチオン界面
活性剤を用いることができる。
これらの界面活性剤の具体例は米国特許
2240472号、同2831766号、同3158484号、同
3210191号、同3294540号、同3507660号、英国特
許1012495号、同1022878号、同1179290号、同
1198450号、特開昭50−117414号、米国特許
2739891号、同2823123号、同3068101号、同
3415649号、同3666478号、同3756828号、英国特
許1397218号、米国特許3133816号、同3441413号、
同3475174号、同3545974号、同3726683号、同
3843368号、ベルギー特許731126号、英国特許
1138514号、同1159825号、同1374780号、特公昭
40−378号、同40−379号、同43−13822号、米国
特許2288226号、同2944900号、同3253919号、同
3671247号、同3772021号、同3589906号、同
3666478号、同3754924号、西独特許出願
OLS1961638号、特開昭50−59025号などに記載
のものである。
本発明の写真乳剤には寸度安定性の改良などの
目的で水不溶または難溶性合成ポリマーの分散物
を含むことができる。たとえばアルキル(メタ)
アクリレート、アルコキシアクリル(メタ)アク
リレート、グリシジル(メタ)アクリレート、
(メタ)アクリルアミド、ビニルエステル(例え
ば酢酸ビニル)、アクリロニトリル、オレフイン、
スチレンなどの単独もしくは組合わせ、またはこ
れらとアクリル酸、メタアクリル酸、α,β−不
飽和ジカルボン酸、ヒドロキシアルキル(メタ)
アクリレート、スルフオアルキル(メタ)アクリ
レート、スチレンスルフオン酸などの組合せを単
量体成分とするポリマーを用いることができる。
たとえば、米国特許2376005号、同2739137号、同
2853457号、同3062674号、同3411911号、同
3488708号、同3525620号、同3607290号、同
3635715号、同3645740号、英国特許1186699号、
同1307373号に記載のものを用いることができる。
本発明の現像液に用いられる現像主薬としては
ジヒドロキシベンゼン系現像主薬、1−フエニル
−3−ピラゾリドン系現像主薬、p−アミノフエ
ノール系現像主薬などがあり、これらを単独又は
組合せて(例えば1−フエニル−3−ピラゾリド
ン類とジヒドロキシベンゼン類又はp−アミノフ
エノール類とジヒドロキシベンゼン類)用いるこ
とができる。また本発明の感光材料はカルボニル
ビサルフアイトなどの亜硫酸イオンバツフアーと
ハイドロキノンを用いたいわゆる伝染現像液で処
理されても良い。
上記において、ジヒドロキシベンゼン系現像主
薬としては、例えばハイドロキノン、クロロハイ
ドロキノン、ブロモハイドロキノン、イソプロピ
ルハイドロキノン、トルヒドロハイドロキノン、
メチルハイドロキノン、2,3−ジクロロハイド
ロキノン、2,5−ジメチルハイドロキノンなど
があり、1−フエニル−3−ピラゾリドン系現像
主薬としては1−フエニル−3−ピラゾリドン、
4,4−ジメチル−1−フエニル−3−ピラゾリ
ドン、4−ヒドロキシメチル−4−メチル−1−
フエニル−3−ピラゾリドン、4,4−ジヒドロ
キシメチル−1−フエニル−3−ピラゾリドンな
どがあり、p−アミノフエノール系現像主薬とし
てはp−アミノフエノール、N−メチル−p−ア
ミノフエノールなどが用いられる。
現像液には保恒剤として遊離の亜硫酸イオンを
与える化合物、例えば亜硫酸ナトリウム、亜硫酸
カリウム、メタ重亜硫酸カリウム、重亜硫酸ナト
リウム等が添加される。伝染現像液の場合は現像
液中でほとんどが遊離の亜硫酸イオンを与えない
ホルムアルデヒド重亜硫酸ナトリウムを用いても
良い。
本発明に用いる現像液のアルカリ剤としては水
酸化カリウム、水酸化ナトリウム、炭酸カリウ
ム、炭酸ナトリウム、酢酸ナトリウム、第三リン
酸カリウム、ジエタノールアミン、トリエタノー
ルアミン等が用いられる。現像液のPHは通常9以
上、好ましくは9.7以上に設定される。
現像液にはカブリ防止剤又は現像抑制剤として
知られている有機化合物を含んでも良い。その例
としてはアゾール類たとえばベンゾチアゾリウム
塩、ニトロインダゾール類、ニトロベンズイミダ
ゾール類、クロロベンズイミダゾール類、ブロモ
ベンズイミダゾール類、メルカプトチアゾール
類、メルカプトベンゾチアゾール類、メルカプト
ベンズイミダゾール類、メルカプトチアジアゾー
ル類、アミノトリアゾール類、ベンゾトリアゾー
ル類、ニトロベンゾトリアゾール類、メルカプト
テトラゾール類(特に1−フエニル−5−メルカ
プトテトラゾール)など;メルカプトピリミジン
類;メルカプトトリアジン類;たとえばオキサゾ
リンチオンのようなチオケト化合物;アザインデ
ン類、たとえばトリアザインデン類、テトラアザ
インデン類(特に4−ヒドロキシ置換(1,3,
3a,7)テトラザインデン類)、ペンタアザイン
デン類など;ベンゼンチオスルフオン酸、ベンゼ
ンスルフイン酸、ベンゼンスルフオン酸アミド、
2−メルカプトベンツイミダゾール−5−スルフ
オン酸ナトリウムなどがある。
本発明の感光材料を処理する現像液は補助現像
主薬(例えば1−フエニル−3−ピラゾリドン類
又はp−アミノフエノール類)を全く含まないか
又は0.05g/以下に抑え、主現像主薬としてジ
ヒドロキシベンゼン類を0.05〜0.5モル/(特
に0.1〜0.4モル/)含有する現像液であつて、
誘離の亜硫酸イオン濃度が0.25モル/以上あ
り、5−又は6−ニトロインダゾールを20mg/
以上含有し、かつPHを10.5以上(特に11.5以上)
にするに十分な量のアルカリを含有する現像液で
ある。この中でも補助現像主薬を含まないジヒド
ロキシベンゼン類(特にハイドロキノン)単独の
使用が好ましい。
この現像液は本発明の感光材料を使つて抜き文
字作業を行う場合に優れた抜き文字品質を有する
返し画像を迅速に形成することを可能し、かつ亜
硫酸イオンを多量に含有し得るので極めて安定で
ある。
本発明に使用し得る現像液には前述したと同種
のポリアルキレンオキサイドを現像抑制剤として
含有させるのが好ましい。例えば分子量1000〜
10000のポリエチレンオキサイドなどを0.1〜10
g/の範囲で含有させることができる。
本発明に使用し得る現像液には硬水軟化剤とし
てニトリロトリ酢酸、エチレンジアミンテトラア
セテイツクアシド、トリエチレンテトラアミンヘ
キサアセテイツクアシド、ジエチレンテトラアミ
ンペンタアセテツクアシド等を添加することが好
ましい。
定着液としては一般に用いられる組成のものを
用いることができる。
定着剤としてはチオ硫酸塩、チオシアン酸塩の
ほか、定着剤としての効果が知られている有機硫
黄化合物を用いることができる。
定着液には硬膜剤として水溶性アルミニウム塩
を含んでもよい。
定着液には硫化剤としてエチレンジアミン四酢
酸と三価の鉄イオンとの錯体を含むこともでき
る。
処理温度や処理時間は適宜設定されるが普通18
℃〜50℃の処理温度が適当であり、一方いわゆる
自動現像機を用いた15〜120秒の迅速処理を行う
のが好ましい。
本発明の感光材料はそのハロゲン組成、平均粒
子サイズ、ロジウム塩添加量がそれぞれ所定の値
を持つ故に返し用感光材料として求められる明室
取扱い性及び紫外線に富む光源で焼きつけたとき
に高感度、硬調な画像を与え得るし、その上にポ
リアルキレンオキサイド化合物又はその誘導体を
含むが故に抜き文字作業において網点面積を忠実
にネガ/ポジ変換させる露光量において線画像の
線巾も忠実にネガ/ポジ変換できるという予測し
得ない効果を奏する。
また本発明の感光材料を前述した特定の組成を
有する現像液で処理する本発明の現像方法は画質
の優れた抜き文字画像を迅速に形成することを可
能にし、その上現像液が安定であるため長期にわ
たつての使用が可能になるという優れた利点を持
つ。
以下、実施例により本発明を更に詳しく説明す
る。
実施例 1
液:水600ml、ゼラチン18g、PH3.0
液:AgNO3200g、水800ml
上記液及び液を用い以下の方法により7種
類の乳剤A〜Gを調製した。
1 乳剤A(Br5モル%、粒子サイズ0.25μ、Rh1
×10-4モル/モル銀)A
液:KBr7g、NaCl69g、NH4RhCl640mg、
水800ml
42℃に保つた液中に液と液を同時に一定
の速度で30分間で添加した。この乳剤を当業界
でよく知られた常法で可溶性塩類を除去した後
ゼラチンを加え化学熟成せずに安定剤として2
−メチル−4−ヒドロキシ−1,3,3a,7
−テトラアザインデンを添加した。この乳剤の
平均粒子サイズは0.25μmであり、乳剤の収量
は1Kg、含有するゼラチン量は60gであつた。
2 乳剤B(Br15モル%、粒子サイズ0.25μ、Rh1
×10-4モル/モル銀)B
液:KBr21g、NaCl62g、NH4RhCl640
mg、水800ml
乳剤Aと同様の方法でA液の代りにB液を
用いて乳剤3を調製した。
3 乳剤C(Br30モル%、粒子サイズ0.25μ、Rh1
×10-4モル/モル銀)C
液:KBr42g、NaCl52g、NH4RhCl640
mg、水800ml
乳剤Aと同様の方法でA液の代りにC液を
用いて乳剤Cを調製した。
4 乳剤D(Br15モル%、粒子サイズ0.45μ、Rh1
×10-4モル/モル銀)
乳剤Bの調製方法のうち液の温度を65℃に
変更し、他は乳剤Bと同様の方法で乳剤Dを調
製した。乳剤Dは乳剤Bに対し粒子サイズのみ
が0.45μmとなつている他は同一組成である。
5 乳剤E(Br5モル%、粒子サイズ0.25μ、Rh1
×10-4モル/モル銀・水洗後添加)E
液:KBr7g、NaCl69g、水800ml
乳剤Aと同様の方法でE液を使つて粒子形
成及び可溶性塩類を除去した後ゼラチンを加
え、さらに1%NH4RhCl6水溶液4c.c.(40mg相
当)を添加した後化学熟成せずに安定剤として
2−メチル−4−ヒドロキシ−1,3,3a,
7−テトラアザインデンを添加した。
6 乳剤F(Br5モル%、粒子サイズ0.25μ、Rh1
×10-7モル/モル銀)F
液:KBr7g、NaCl69g、NH4RhCl60.04
mg、水800ml
乳剤Aと同様の方法でA液の代りにFを用
いて乳剤Bを調製した。
7 乳剤G(Br5モル%、粒子サイズ0.25μ、Rh2
×10-6モル/モル銀)G
液:KBr7g、NaCl69g、NH4RhCl60.8mg、
水800ml
乳剤Aと同様の方法でA液の代りにG液を
用いて乳剤Gを調製した。
これらの乳剤に硬膜剤2−ヒドロキシ−4,6
−ジクロロ−1,3−5−トリアジン・ナトリウ
ム塩及びポリアルキレンオキサイド化合物−7
を1×10-4モル/モル銀添加してポリエチレンテ
レフタレートフイルム上に1m2あたり銀量4.5g
になるように塗布した。
このようにして作成したフイルム試料を各々フ
イルムA〜フイルムGとする。
さらに乳剤Aに対し同様に硬膜剤及びポリアル
キレンオキサイド化合物−19を50g乳剤あたり
16mg(1.0×10-4モル/モル銀)添加して同様に
塗布したフイルム試料をフイルムHとする。
さらに乳剤Aに対し同様に硬膜剤を添加してポ
リアルキレンオキサイド化合物を添加せずに塗布
したフイルム試料をフイルムとする。
第1図の構成から成る原稿を用いて大日本スク
リーン社製P−607型プリンターで露光した後富
士写真フイルム社製リス現像液HS−1をFG−
25L自動現像機に入れて最適現像時間(27℃、1
分40秒)で処理した。さらに下記現像液を富士
写真フイルム社製自動現像機FG−25RAに入れ
て最適現像時間(38℃、20秒)で処理した。
(現像液)
臭化カリウム 2.0g
水酸化カリウム 20g
炭酸カリウム 35g
亜硫酸カリウム 80g
ハイドロキノン 20g
トリエチレングリコール 30g
ポリエチレングリコール(分子量4000) 2.0g
5−ニトロインダゾール 0.1g
水を加えて 1
(PH11.7)
結果を表1に示す。 The effective addition amount range of the compound was from 5 x 10 -5 to 5 x 10 -3 moles per mole of silver. In the photographic emulsion of the present invention, as a filter dye,
Alternatively, a water-soluble dye may be contained for various purposes such as prevention of irradiation. Such dyes include oxonol dyes, hemioxonol dyes,
Included are styryl dyes, merocyanine dyes, cyanine dyes and azo dyes. Among them, oxonol dyes; hemioxonol dyes and merocyanine dyes are useful. Specific examples of dyes that can be used include British Patent No. 584609, British Patent No. 1177429, Japanese Patent Application Laid-open No. 1985-85130,
No. 49-99620, No. 49-114420, U.S. Patent
No. 2274782, No. 2533472, No. 2956879, No.
No. 3148187, No. 3177078, No. 3247127, No. 3148187, No. 3177078, No. 3247127, No.
No. 3540887, No. 3575704, No. 3653905, No.
It is described in No. 3718472. The photographic emulsion of the present invention may contain an inorganic or organic hardening agent. For example, chromium salts (chromium alum, chromium acetate, etc.), aldehydes (formaldehyde, glyoxal, glitaraldehyde, etc.), N-methylol compounds (dimethylol urea, methylol dimethylhydantoin, etc.),
Dioxane derivatives (2,3-dihydroxydioxane, etc.), active vinyl compounds (1,3,5-triacryloyl-hexahydro-s-triazine, bis(vinylsulfonyl)methyl ether,
N,N'-methylenebis-[β-(vinylsulfonyl)propionamide], etc.), active halogen compounds (2,4-dichloro-6-hydroxy-s-
triazine, etc.), mucohalogen acids (mucochloric acid, mucophenoxychloroic acid, etc.), isoxazoles, dialdehyde starch, 2-chloro-6
-Hydroxytriazinylated gelatin and the like can be used alone or in combination. Specific examples include U.S. Patent No. 1870354, U.S. Patent No. 2080019, U.S. Patent No.
No. 2726162, No. 2870013, No. 2983611, No. 2983611, No.
No. 2992109, No. 3047394, No. 3057723, No.
No. 3103437, No. 3321313, No. 3325287, No. 3321313, No. 3325287, No.
No. 3362827, No. 3539644, No. 3543292, British Patent No. 676628, No. 825544, No. 1270578, German Patent No. 872153, No. 1090427, Japanese Patent Publication No. 34-7133,
It is described in No. 46-1872, etc. The photographic emulsion of the present invention may contain various known surfactants for various purposes such as coating aids, antistatic properties, improving slipperiness, dispersing emulsions, preventing adhesion, and improving photographic properties. For example, saponins (steroids), polyalkylene glycol alkylamines or amides, silicone polyethylene oxide adducts), glycidol derivatives (e.g. alkenylsuccinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols, sugars. alkyl esters, nonionic surfactants such as urethanes or ethers; triterpenoid saponins, alkyl carboxylates, alkyl sulfonates, alkylbenzenesulfonates, alkylnaphthalenesulfonates, alkyl sulfates Carboxy groups such as esters, alkyl phosphates, N-acyl-N-alkyl taurines, sulfosuccinates, sulfoalkyl polyoxyethylene alkyl phenyl ethers, polyoxyethylene alkyl phosphates, etc. , sulfo group,
Anionic surfactants containing acidic groups such as phospho groups, sulfate ester groups, phosphate ester groups; amino acids,
Aminoalkyl sulfonic acids, aminoalkyl sulfates or phosphoric esters, alkyl betaines,
Amphoteric surfactants such as amine imides and amine oxides; alkyl amine salts, aliphatic or aromatic quaternary ammonium salts, pyridinium,
Cationic surfactants such as heterocyclic quaternary ammonium salts such as imidazolium, and phosphonium or sulfonium salts containing aliphatic or heterocycles can be used. Specific examples of these surfactants are listed in the U.S. patent.
No. 2240472, No. 2831766, No. 3158484, No.
No. 3210191, No. 3294540, No. 3507660, British Patent No. 1012495, No. 1022878, No. 1179290, British Patent No.
No. 1198450, Japanese Unexamined Patent Publication No. 117414, US patent
No. 2739891, No. 2823123, No. 3068101, No.
No. 3415649, No. 3666478, No. 3756828, British Patent No. 1397218, US Patent No. 3133816, No. 3441413,
Same No. 3475174, No. 3545974, No. 3726683, Same No.
No. 3843368, Belgian Patent No. 731126, British Patent
No. 1138514, No. 1159825, No. 1374780, Tokko Akira
No. 40-378, No. 40-379, No. 43-13822, U.S. Patent No. 2288226, No. 2944900, No. 3253919,
No. 3671247, No. 3772021, No. 3589906, No.
No. 3666478, No. 3754924, West German patent application
This is described in OLS1961638, Japanese Patent Application Laid-open No. 50-59025, etc. The photographic emulsion of the present invention may contain a dispersion of a water-insoluble or sparingly soluble synthetic polymer for purposes such as improving dimensional stability. For example alkyl (meta)
Acrylate, alkoxy acrylic (meth)acrylate, glycidyl (meth)acrylate,
(meth)acrylamide, vinyl ester (e.g. vinyl acetate), acrylonitrile, olefin,
Styrene etc. alone or in combination, or together with acrylic acid, methacrylic acid, α,β-unsaturated dicarboxylic acid, hydroxyalkyl (meth)
Polymers containing a combination of acrylate, sulfoalkyl (meth)acrylate, styrene sulfonic acid, etc. as monomer components can be used.
For example, US Patent No. 2376005, US Patent No. 2739137,
No. 2853457, No. 3062674, No. 3411911, No.
No. 3488708, No. 3525620, No. 3607290, No.
No. 3635715, No. 3645740, British Patent No. 1186699,
The one described in No. 1307373 can be used. The developing agents used in the developer of the present invention include dihydroxybenzene-based developing agents, 1-phenyl-3-pyrazolidone-based developing agents, p-aminophenol-based developing agents, etc. Phenyl-3-pyrazolidones and dihydroxybenzenes or p-aminophenols and dihydroxybenzenes) can be used. The light-sensitive material of the present invention may also be processed with a so-called infectious developer using a sulfite ion buffer such as carbonyl bisulfite and hydroquinone. In the above, examples of the dihydroxybenzene-based developing agent include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, toluhydrohydroquinone,
Examples of 1-phenyl-3-pyrazolidone-based developing agents include methylhydroquinone, 2,3-dichlorohydroquinone, 2,5-dimethylhydroquinone, and 1-phenyl-3-pyrazolidone.
4,4-dimethyl-1-phenyl-3-pyrazolidone, 4-hydroxymethyl-4-methyl-1-
Examples include phenyl-3-pyrazolidone, 4,4-dihydroxymethyl-1-phenyl-3-pyrazolidone, etc., and p-aminophenol, N-methyl-p-aminophenol, etc. are used as p-aminophenol developing agents. . A compound that provides free sulfite ions, such as sodium sulfite, potassium sulfite, potassium metabisulfite, and sodium bisulfite, is added to the developer as a preservative. In the case of a contagious developer, sodium formaldehyde bisulfite may be used, which provides almost no free sulfite ions in the developer. As the alkaline agent for the developer used in the present invention, potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, sodium acetate, tribasic potassium phosphate, diethanolamine, triethanolamine, etc. are used. The pH of the developer is usually set to 9 or higher, preferably 9.7 or higher. The developer solution may also contain organic compounds known as antifoggants or development inhibitors. Examples include azoles such as benzothiazolium salts, nitroindazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, Aminotriazoles, benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles (especially 1-phenyl-5-mercaptotetrazole), etc.; mercaptopyrimidines; mercaptotriazines; thioketo compounds, such as oxazolinthione; azaindenes, e.g. triazaindenes, tetraazaindenes (especially 4-hydroxy substituted (1,3,
3a, 7) Tetrazaindenes), pentaazaindenes, etc.; benzenethiosulfonic acid, benzenesulfonic acid, benzenesulfonic acid amide,
Examples include sodium 2-mercaptobenzimidazole-5-sulfonate. The developer for processing the photosensitive material of the present invention does not contain any auxiliary developing agent (for example, 1-phenyl-3-pyrazolidones or p-aminophenols) or contains only 0.05 g or less, and dihydroxybenzene is used as the main developing agent. A developer containing 0.05 to 0.5 mol/(especially 0.1 to 0.4 mol/) of
The induced sulfite ion concentration is 0.25 mol/or more, and 5- or 6-nitroindazole is 20 mg/
or more, and has a pH of 10.5 or more (especially 11.5 or more)
This is a developer containing a sufficient amount of alkali to Among these, it is preferable to use dihydroxybenzenes (especially hydroquinone) alone without containing an auxiliary developing agent. This developer can quickly form a return image with excellent cutout quality when cutting out characters using the photosensitive material of the present invention, and is extremely stable as it can contain a large amount of sulfite ions. It is. It is preferable that the developer that can be used in the present invention contains the same type of polyalkylene oxide as described above as a development inhibitor. For example, molecular weight 1000~
10000 polyethylene oxide etc. 0.1~10
It can be contained within a range of g/g/. It is preferable to add nitrilotriacetic acid, ethylenediaminetetraacetate acid, triethylenetetraamine hexaacetate acid, diethylenetetraamine pentaacetate acid, etc. as a water softener to the developer that can be used in the present invention. As the fixer, one having a commonly used composition can be used. As the fixing agent, in addition to thiosulfates and thiocyanates, organic sulfur compounds known to be effective as fixing agents can be used. The fixing solution may contain a water-soluble aluminum salt as a hardening agent. The fixer can also contain a complex of ethylenediaminetetraacetic acid and trivalent iron ions as a sulfurizing agent. Processing temperature and processing time are set appropriately, but usually18
Processing temperatures of .degree. C. to 50.degree. C. are suitable, while rapid processing of 15 to 120 seconds using so-called automatic processors is preferred. The light-sensitive material of the present invention has a halogen composition, an average particle size, and an amount of rhodium salt added, each of which has a predetermined value, so that it has good handleability in a bright room, which is required as a return light-sensitive material, and high sensitivity when printed with a light source rich in ultraviolet rays. It can give a high-contrast image, and since it contains a polyalkylene oxide compound or its derivative, the line width of the line image can also be faithfully converted from negative to positive at the exposure dose that faithfully converts the halftone dot area to negative/positive in character cutting work. It has the unpredictable effect of being able to perform positive conversion. Further, the developing method of the present invention, in which the photosensitive material of the present invention is processed with a developer having the above-described specific composition, makes it possible to quickly form cut-out character images of excellent image quality, and furthermore, the developer is stable. Therefore, it has the excellent advantage of being able to be used for a long period of time. Hereinafter, the present invention will be explained in more detail with reference to Examples. Example 1 Liquid: 600 ml of water, 18 g of gelatin, PH3.0 Liquid: 200 g of AgNO 3 , 800 ml of water Using the above liquids and solutions, seven types of emulsions A to G were prepared by the following method. 1 Emulsion A (Br5 mol%, grain size 0.25μ, Rh1
×10 -4 mol/mol silver) Solution A : 7 g of KBr, 69 g of NaCl, 40 mg of NH 4 RhCl 6 ,
The two liquids were added simultaneously at a constant rate over 30 minutes to 800 ml of water kept at 42°C. After removing soluble salts from this emulsion using a conventional method well known in the art, gelatin was added as a stabilizer without chemical ripening.
-Methyl-4-hydroxy-1,3,3a,7
- Tetraazaindene was added. The average grain size of this emulsion was 0.25 μm, the yield of the emulsion was 1 kg, and the amount of gelatin contained was 60 g. 2 Emulsion B (Br15 mol%, grain size 0.25μ, Rh1
×10 -4 mol/mol silver) B solution: KBr21g, NaCl62g, NH 4 RhCl 6 40
mg, water 800ml Emulsion 3 was prepared in the same manner as Emulsion A , using Solution B instead of Solution A. 3 Emulsion C (Br30 mol%, grain size 0.25μ, Rh1
×10 -4 mol/mol silver) C solution: KBr42g, NaCl52g, NH 4 RhCl 6 40
mg, water 800ml Emulsion C was prepared in the same manner as Emulsion A , using Solution C instead of Solution A. 4 Emulsion D (Br15 mol%, grain size 0.45μ, Rh1
×10 -4 mol/mol silver) Emulsion D was prepared in the same manner as Emulsion B except that the temperature of the liquid was changed to 65°C. Emulsion D has the same composition as Emulsion B except that the grain size is 0.45 μm. 5 Emulsion E (Br5 mol%, grain size 0.25μ, Rh1
×10 -4 mol/mole silver, added after washing with water) Solution E : 7 g of KBr, 69 g of NaCl, 800 ml of water After removing grain formation and soluble salts using Solution E in the same manner as Emulsion A, add gelatin and add 1% more After adding 4 c.c. (equivalent to 40 mg) of NH 4 RhCl 6 aqueous solution, 2-methyl-4-hydroxy-1,3,3a was added as a stabilizer without chemical ripening.
7-tetraazaindene was added. 6 Emulsion F (Br5 mol%, grain size 0.25μ, Rh1
×10 -7 mol/mol silver) F solution: KBr7g, NaCl69g, NH 4 RhCl 6 0.04
mg, water 800ml Emulsion B was prepared in the same manner as Emulsion A, using F in place of A. 7 Emulsion G (Br5 mol%, grain size 0.25μ, Rh2
×10 -6 mol/mol silver) G solution: KBr 7 g, NaCl 69 g, NH 4 RhCl 6 0.8 mg,
800 ml of water Emulsion G was prepared in the same manner as Emulsion A , using Solution G instead of Solution A. A hardener 2-hydroxy-4,6 is added to these emulsions.
-Dichloro-1,3-5-triazine sodium salt and polyalkylene oxide compound-7
1×10 -4 mol/mol silver was added to the polyethylene terephthalate film to give an amount of 4.5 g of silver per 1 m 2 .
It was applied so that The film samples prepared in this manner are referred to as Film A to Film G, respectively. Furthermore, a hardening agent and polyalkylene oxide compound-19 were added per 50g of emulsion to emulsion A.
A film sample coated in the same manner with the addition of 16 mg (1.0 x 10 -4 mol/mol silver) is referred to as Film H. Furthermore, a film sample was obtained by coating Emulsion A with a hardening agent but without adding a polyalkylene oxide compound. After exposure using a P-607 printer manufactured by Dainippon Screen Co., Ltd. using an original with the configuration shown in Figure 1, FG-1 was applied with Lith developer HS-1 manufactured by Fuji Photo Film Co., Ltd.
Put it in a 25L automatic processor and wait for the optimum development time (27℃, 1
minutes and 40 seconds). Further, the following developer was placed in an automatic processor FG-25RA manufactured by Fuji Photo Film Co., Ltd., and processed at the optimum developing time (38° C., 20 seconds). (Developer) Potassium bromide 2.0g Potassium hydroxide 20g Potassium carbonate 35g Potassium sulfite 80g Hydroquinone 20g Triethylene glycol 30g Polyethylene glycol (molecular weight 4000) 2.0g 5-nitroindazole 0.1g Add water 1 (PH11.7) Results are shown in Table 1.
【表】
表−1における抜文字画質5とは第1図の如き
原稿を用いて50%の網点面積が返し用感光材料上
に50%の網点面積となる様な適正露光した時
30μm巾の文字が再現される画質を言い非常に良
好な抜文字画質である。一方抜文字画質1とは同
様な適性露光を与えた時150μm巾以上の文字しか
再現することのできない画質を言い良くない抜文
字品質であり、5と1の間に官能評価で4〜2の
ランクを設けた。2以上が実用し得るレベルであ
る。
表−1から明きらかなようにAgCl80%以上、
ロジウム塩10-6モル/モル銀以上、ロジウム塩と
第一熟成終了以前に添加、かつポリアルキレンオ
キサイド化合物存在下でのみ良好な抜文字品質を
示すことがわかる。
実施例 2
液:水1000ml、ゼラチン20g、PH=4.0。
液:AgNO3200g、水600ml。
液:KBr4.2g、NaCl75g、
RhCl320mg、水600ml。
45℃に保つた液のゼラチン水溶液中に液と
液を同時に一定の速度で30分間で添加した。こ
の乳剤を当業界でよく知られた常法で可溶性塩類
を除去した後ゼラチンを加えて化学熟成せずに安
定剤として2−メチル−4−ヒドロキシ−1,
3,3a,7−テトラアザインデンを添加した。
この乳剤の平均粒子サイズは0.28μmであり乳剤
の収量は1Kg、含有するゼラチン量は70gであつ
た。この乳剤に硬膜剤2−ヒドロキシ−4,6−
ジクロロ−1,3,5−トリアジン・ナトリウム
塩を加えた後、ポリエチレンテレフタレートフイ
ルム上に1m2当り銀量4.5gになるように塗布し
た。このようにして作成したフイルム試料をフイ
ルムJとする。
フイルムKの作成:Jと同じ方法で試料を作成
する際ポリアルキレンオキサイド化合物−17
を2×10-4モル/モルAg含ませた本発明のフ
イルム試料を作りこれをフイルムKとした。
フイルムLの作成:Jと同じ方法で試料を作成
する際ポリアルキレンオキサイド化合物−17
を2×10-4モル/モルAg及び5−メチルベン
ゾトリアゾール3×10-3モル/モルAg含ませ
た本発明のフイルム試料を作りこれをフイルム
Lとした。
フイルムMの作成:Jと同じ方法で試料を作成
する際ポリアルキレンオキサイド化合物例−
17を2×10-4モル/モルAg及び1−フエニル
5−メルカプトテトラゾールを4×10-4モル/
モルAg含ませた本発明のフイルム試料を作り
これをフイルムMとした。
フイルムNの作成:Jと同じ方法で試料を作成
する際ポリアルキレンオキサイド化合物例−
17を2×10-4モル/モルAg及び5−メチルベ
ンゾトリアゾール3×10-3モル/モルAg及び
1−フエニル−5−メルカプトテトラゾール4
×10-4モル/モルAg含ませた本発明のフイル
ム試料を作りこれをフイルムNとした。
第1図の構成からなる原稿を用いて大日本スク
リーン製P−607型プリンターで露光した後、次
の組成7種類の現像液でFG25RA自動現像機
(富士写真フイルム株式会社製)を用いて現像、
定着、水洗、乾燥した。さらに現像液の安定性を
比較するために自動現像機に現像液を入れたまま
4日経時させたのち同様の方法で現像処理した。[Table] The cutout image quality 5 in Table 1 is when an original as shown in Figure 1 is used and properly exposed so that 50% of the halftone dot area becomes 50% of the halftone dot area on the photosensitive material for return.
This refers to the image quality in which characters with a width of 30 μm are reproduced, and the image quality is very good. On the other hand, cut-out character image quality 1 refers to an image quality that can only reproduce characters with a width of 150 μm or more when given the same appropriate exposure, and is poor cut-out character quality, with a sensory evaluation of 4 to 2 between 5 and 1. A rank was established. A value of 2 or higher is a practical level. As is clear from Table 1, AgCl80% or more,
It can be seen that good drawing quality is exhibited only when the rhodium salt is 10 -6 mol/mol silver or more, added before the end of the first ripening, and in the presence of the polyalkylene oxide compound. Example 2 Liquid: 1000 ml of water, 20 g of gelatin, PH=4.0. Liquid: 200g of AgNO 3 , 600ml of water. Liquid: KBr4.2g, NaCl75g, RhCl3 20mg, water 600ml. The two liquids were added simultaneously at a constant rate over a period of 30 minutes into an aqueous gelatin solution kept at 45°C. After removing the soluble salts from this emulsion by a conventional method well known in the art, gelatin was added to the emulsion and 2-methyl-4-hydroxy-1, 2-methyl-4-hydroxy-1,
3,3a,7-tetraazaindene was added.
The average grain size of this emulsion was 0.28 μm, the yield of the emulsion was 1 kg, and the amount of gelatin contained was 70 g. This emulsion was added with a hardening agent, 2-hydroxy-4,6-
After adding dichloro-1,3,5-triazine sodium salt, it was coated on a polyethylene terephthalate film at a silver content of 4.5 g per m 2 . The film sample prepared in this way is referred to as film J. Preparation of film K: When preparing a sample using the same method as J, polyalkylene oxide compound-17
A film sample of the present invention containing 2×10 -4 mol/mol Ag was prepared and designated as film K. Preparation of film L: When preparing a sample using the same method as J, polyalkylene oxide compound-17
A film sample of the present invention containing 2 x 10 -4 mol/mol Ag and 3 x 10 -3 mol/mol Ag of 5-methylbenzotriazole was prepared and designated as film L. Preparation of film M: Example of polyalkylene oxide compound when preparing a sample using the same method as J.
17 to 2×10 -4 mol/mol Ag and 1-phenyl-5-mercaptotetrazole to 4×10 -4 mol/mol
A film sample of the present invention containing molar Ag was prepared and designated as film M. Preparation of film N: Example of polyalkylene oxide compound when preparing a sample using the same method as J.
17 to 2 x 10 -4 mol/mol Ag and 5-methylbenzotriazole 3 x 10 -3 mol/mol Ag and 1-phenyl-5-mercaptotetrazole 4
A film sample of the present invention containing ×10 −4 mol/mol Ag was prepared and designated as film N. After exposing with a P-607 printer made by Dainippon Screen using the original with the configuration shown in Figure 1, it was developed using an FG25RA automatic developing machine (manufactured by Fuji Photo Film Co., Ltd.) with the following seven types of developer composition. ,
Fixed, washed with water, and dried. Furthermore, in order to compare the stability of the developer, the developer was left in an automatic processor for 4 days and then developed in the same manner.
【表】【table】
【表】【table】
【表】
ここで言う適正現像時間とは現像温度32℃にて
5秒毎に現像時間をとりその現像液とフイルムと
の組合せで最も良い抜き文字画質を与える現像時
間を意味する。
ここでいう抜き文字画質5とは添付図−1の如
き原稿を用いて50%の網点面積が返し用感光材料
に50%の網点面積となる様な適正露光した時
30μm巾の文字が再現される画質を言い非常によ
い抜き文字画質である。一方抜き文字画質1とは
同様な適正露光を与えた時150μm巾以上の文字し
か再現することのできない画質を言いよくない抜
き文字画質である。
4日経日した時の感度とは上述のように適正露
光を与えるのに必要な露光時間を新液時に必要な
露光時間と比較して示したものである。
表2から明らかなようにフイルムNo.1(比較試
料)ではいづれの現像液でもよい抜き文字画質は
得られない。一方本発明の試料フイルムNo.2、
3、4、5ではフイルムNo.1よりもいづれの現像
液A、B、C、D、E、F、Gでも抜き文字画質
は良化している。中でも特に好しい現像液として
掲げた現像液Cでは非常によい抜き文字画質を与
えることは明らかである。現像液Dには補助現像
主薬として1−フエニル−3−ピラゾリドンを
0.2g/含有されており現像液Cよりは抜き文
字画質が劣ることは明らかである。また現像液E
は亜硫酸イオン濃度が低いために4日経時させた
時の現像液感度の低下が大きく安定な現像液を与
えない。現像液Fは現像液Cに較べてPHが低く、
抜き文字画質が現像Cよりは悪くなるとともに現
像時間が長くなる。またさらに現像液Gでは5−
ニトロインダゾールの代りに5−メチルベンゾリ
アゾールを用いた場合であり抜き文字画質が現像
液Cには及ばない。従つて短い現像時間で良い抜
き文字画質を与え、安定な現像液として現像液C
の場合に特に好しい結果が得られることは表2か
ら明らかである。[Table] The term "appropriate development time" as used herein refers to the development time at which the development temperature is 32° C. and the development time is taken every 5 seconds to give the best cutout character image quality for the combination of the developer and the film. The cutout character image quality 5 here refers to when a document as shown in attached figure 1 is properly exposed so that 50% of the halftone dot area becomes 50% of the halftone dot area on the photosensitive material for return.
This refers to the image quality in which characters with a width of 30 μm are reproduced, and is a very good cutout character image quality. On the other hand, cutout character image quality 1 refers to an image quality that can only reproduce characters with a width of 150 μm or more when given the same appropriate exposure, and is a poor cutout character image quality. The sensitivity after 4 days is a comparison of the exposure time required to provide proper exposure with the exposure time required when using a new solution, as described above. As is clear from Table 2, with film No. 1 (comparative sample), good cutout character image quality could not be obtained with either developer. On the other hand, sample film No. 2 of the present invention,
For films No. 3, 4, and 5, the quality of the extracted characters was better than that for film No. 1 with all of the developers A, B, C, D, E, F, and G. It is clear that developer C, which has been cited as a particularly preferred developer, provides very good cutout character image quality. Developer solution D contains 1-phenyl-3-pyrazolidone as an auxiliary developing agent.
0.2g/contains, and it is clear that the quality of cut-out characters is inferior to that of developer C. Also, developer E
Since the sulfite ion concentration is low, the developer sensitivity decreases significantly after aging for 4 days, and a stable developer cannot be obtained. Developer F has a lower pH than Developer C,
The cutout character image quality is worse than development C, and the development time is longer. Furthermore, in developer G, 5-
This is the case when 5-methylbenzoliazole is used instead of nitroindazole, and the quality of cut-out characters is not as good as that of developer C. Therefore, developer C provides good cutout character image quality with a short development time and is a stable developer.
It is clear from Table 2 that particularly favorable results are obtained in the case of .
第1図は抜き文字作業を用いる原稿と返し用感
光材料の関係を示す図面である。
図中1,3は貼付ベース、2は線画ポジ像が形
成されたフイルム(線画原稿)、4は網点画像が
形成されたフイルム(網点原稿)及び5は返し用
感光材料を示す。
FIG. 1 is a diagram showing the relationship between an original for which cut-out text is used and a photosensitive material for return. In the figure, 1 and 3 indicate a pasting base, 2 a film on which a line drawing positive image is formed (line drawing original), 4 a film on which a halftone dot image is formed (halftone dot original), and 5 a photosensitive material for return.
Claims (1)
銀より成り、平均粒子サイズが0.4μm以下であ
り、かつ乳剤製造の第1熟成終了前の任意の時期
に銀1モル当り1×10-6より多くの水溶性ロジウ
ム塩を含有せしめたハロゲン化銀乳剤を含有する
乳剤層を有し、更に該乳剤層または他の親水性コ
ロイド層中に分子量が少なくとも600のポリアル
キレンオキサイド又はその誘導体を銀1モル当り
1×10-5乃至1×10-2モル含有するハロゲン化銀
写真感光材料を露光後に、ジヒドロキシベンゼン
系現像主薬を0.05乃至0.5モル/含有し、補助
現像主薬を0乃至0.05g/含有し、遊離の亜硫
酸イオンを0.25モル/以上含有し、5−又は6
−ニトロインダゾールを20mg/以上含有し、か
つPHを10.5以上にするに十分な量のアルカリを含
有する現像液で処理することを特徴とする現像方
法。1 At least 80 mol % of the total silver halide consists of silver chloride, the average grain size is not more than 0.4 μm, and at any time before the end of the first ripening of emulsion production, the concentration is less than 1 × 10 -6 per mole of silver. It has an emulsion layer containing a silver halide emulsion containing many water-soluble rhodium salts, and further contains a polyalkylene oxide or a derivative thereof having a molecular weight of at least 600 in the emulsion layer or other hydrophilic colloid layer. After exposing a silver halide photographic light-sensitive material containing 1 x 10 -5 to 1 x 10 -2 mol per mol, a dihydroxybenzene developing agent is contained in a range of 0.05 to 0.5 mol/mole, and an auxiliary developing agent is contained in an amount of 0 to 0.05 g/mole. and contains 0.25 mol/or more of free sulfite ions, 5- or 6-
- A developing method characterized by processing with a developer containing 20 mg/or more of nitroindazole and a sufficient amount of alkali to raise the pH to 10.5 or more.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57072916A JPS58190943A (en) | 1982-04-30 | 1982-04-30 | Silver halide photosensitive material and its developing method |
GB08310066A GB2120800B (en) | 1982-04-30 | 1983-04-14 | Silver halide photographic materials and process of developing them |
US06/489,907 US4452882A (en) | 1982-04-30 | 1983-04-29 | Silver halide photographic materials and process of developing them |
DE19833315589 DE3315589A1 (en) | 1982-04-30 | 1983-04-29 | PHOTOGRAPHIC, LIGHT-SENSITIVE SILVER HALOGENIDE MATERIAL AND METHOD FOR TREATING THE MATERIAL |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57072916A JPS58190943A (en) | 1982-04-30 | 1982-04-30 | Silver halide photosensitive material and its developing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58190943A JPS58190943A (en) | 1983-11-08 |
JPH0324658B2 true JPH0324658B2 (en) | 1991-04-03 |
Family
ID=13503147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57072916A Granted JPS58190943A (en) | 1982-04-30 | 1982-04-30 | Silver halide photosensitive material and its developing method |
Country Status (4)
Country | Link |
---|---|
US (1) | US4452882A (en) |
JP (1) | JPS58190943A (en) |
DE (1) | DE3315589A1 (en) |
GB (1) | GB2120800B (en) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59210437A (en) * | 1983-05-16 | 1984-11-29 | Konishiroku Photo Ind Co Ltd | Photosensitive silver halide material |
JPS59212826A (en) * | 1983-05-18 | 1984-12-01 | Konishiroku Photo Ind Co Ltd | Preparation of silver halide photographic emulsion |
JPS6083028A (en) * | 1983-10-13 | 1985-05-11 | Fuji Photo Film Co Ltd | Photosensitive silver halide material and formation of very high contrast negative image using it |
JPS60258537A (en) * | 1984-06-05 | 1985-12-20 | Fuji Photo Film Co Ltd | Formation of high-contrast negative image |
US4666827A (en) * | 1984-07-16 | 1987-05-19 | Mitsubishi Paper Mills, Ltd. | Silver halide photographic emulsion |
JPS6224243A (en) * | 1985-04-30 | 1987-02-02 | Fuji Photo Film Co Ltd | Silver halide emulsion |
JP2510852B2 (en) * | 1985-09-20 | 1996-06-26 | 富士写真フイルム株式会社 | Silver halide photographic material |
JPS6280640A (en) * | 1985-10-04 | 1987-04-14 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JPS62124554A (en) * | 1985-11-25 | 1987-06-05 | Konishiroku Photo Ind Co Ltd | Silver halide photographic sensitive material |
JP2522644B2 (en) * | 1986-01-14 | 1996-08-07 | 富士写真フイルム株式会社 | Silver halide photographic material |
GB2190214B (en) * | 1986-03-11 | 1989-11-08 | Fuji Photo Film Co Ltd | Method of forming an image on photosensitive material |
JPS62212651A (en) * | 1986-03-14 | 1987-09-18 | Fuji Photo Film Co Ltd | High-contrast negative image forming method |
JPS62235939A (en) * | 1986-04-07 | 1987-10-16 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JPS62240952A (en) * | 1986-04-14 | 1987-10-21 | Konika Corp | Silver halide photographic sensitive material superior in dimension, production, and storage stabilities |
JP2546645B2 (en) * | 1986-04-24 | 1996-10-23 | コニカ株式会社 | Silver halide color photographic light-sensitive material |
JPH0687147B2 (en) * | 1986-04-30 | 1994-11-02 | コニカ株式会社 | Image forming method |
JPH0656474B2 (en) * | 1986-06-20 | 1994-07-27 | 富士写真フイルム株式会社 | Silver halide emulsion for photography |
JPS6340154A (en) * | 1986-08-05 | 1988-02-20 | Fuji Photo Film Co Ltd | Processing method for silver halide color photographic sensitive material |
JPS6363044A (en) * | 1986-09-04 | 1988-03-19 | Fuji Photo Film Co Ltd | Color image forming method |
JPH0652382B2 (en) * | 1986-10-20 | 1994-07-06 | 富士写真フイルム株式会社 | Silver halide photographic light-sensitive material and image forming method using the same |
JP2515115B2 (en) * | 1987-01-26 | 1996-07-10 | 富士写真フイルム株式会社 | Negative type silver halide photographic light-sensitive material |
JP2618631B2 (en) * | 1987-03-19 | 1997-06-11 | 富士写真フイルム株式会社 | Silver halide photographic material |
JP2601272B2 (en) * | 1987-04-28 | 1997-04-16 | コニカ株式会社 | Silver halide photographic light-sensitive material that does not deteriorate sensitivity and photographic performance of fog even in rapid processing, and that rot and decomposition by bacteria and mold are well prevented. |
JPS63306436A (en) * | 1987-06-08 | 1988-12-14 | Konica Corp | Negative type silver halide photographic sensitive material handleable in daylight room and having satisfactory return characteristic |
JPH0687148B2 (en) * | 1987-12-18 | 1994-11-02 | 富士写真フイルム株式会社 | Method for developing silver halide photographic light-sensitive material |
DE3842091A1 (en) * | 1987-12-14 | 1989-07-13 | Fuji Photo Film Co Ltd | IMAGING PROCESS |
JPH0239039A (en) * | 1988-07-28 | 1990-02-08 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JP2699003B2 (en) * | 1988-10-28 | 1998-01-19 | コニカ株式会社 | Processing method of silver halide photographic material |
US5013640A (en) * | 1989-06-15 | 1991-05-07 | Eastman Kodak Company | Preparation of low viscosity small-particle photographic dispersions in gelatin |
US5147773A (en) * | 1991-05-14 | 1992-09-15 | Eastman Kodak Company | Process of preparing a reduced dispersity tabular grain emulsion |
US5147771A (en) * | 1991-05-14 | 1992-09-15 | Eastman Kodak Company | Process of preparing a reduced dispersity tabular grain emulsion |
US5171659A (en) * | 1991-05-14 | 1992-12-15 | Eastman Kodak Company | Process of preparing a reduced dispersity tabular grain emulsion |
US5147772A (en) * | 1991-05-14 | 1992-09-15 | Eastman Kodak Company | Process of preparing a reduced dispersity tabular grain emulsion |
JPH05307220A (en) * | 1992-04-30 | 1993-11-19 | Mitsubishi Paper Mills Ltd | Silver halide photographic sensitive material |
US5252449A (en) * | 1992-09-25 | 1993-10-12 | E. I. Du Pont De Nemours And Company | Photographic silver halide emulsions with improved bright room tolerance |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549298A (en) * | 1978-10-04 | 1980-04-09 | Tanezou Tanaka | Preparation of ruler |
JPS58159529A (en) * | 1982-03-02 | 1983-09-21 | Konishiroku Photo Ind Co Ltd | Photographic silver halide emulsion |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2448060A (en) * | 1945-08-30 | 1948-08-31 | Eastman Kodak Co | Photographic emulsions sensitized with salts of metals of group viii of the periodicarrangement of the elements |
BE524121A (en) * | 1952-11-08 | |||
US3294540A (en) * | 1963-12-17 | 1966-12-27 | Eastman Kodak Co | Lith-type emulsions with block co-polymers |
US3488709A (en) * | 1966-12-02 | 1970-01-06 | Eastman Kodak Co | Stabilizing silver halide emulsions with cadmium bromide |
JPS56765B2 (en) * | 1974-06-06 | 1981-01-09 | ||
JPS51106423A (en) * | 1975-03-17 | 1976-09-21 | Konishiroku Photo Ind | ARUGONREEZAAKOROKOYOHAROGENKAGINSHASHINNYUZAI |
GB1535016A (en) * | 1977-10-17 | 1978-12-06 | Ilford Ltd | Monodispersed emulsions |
JPS56125734A (en) * | 1980-03-05 | 1981-10-02 | Konishiroku Photo Ind Co Ltd | Silver halide emulsion |
JPS56149030A (en) * | 1980-04-22 | 1981-11-18 | Konishiroku Photo Ind Co Ltd | Photographic silver halide emulsion |
JPS56149031A (en) * | 1980-04-22 | 1981-11-18 | Konishiroku Photo Ind Co Ltd | Photographic silver halide emulsion |
JPS5729041A (en) * | 1980-07-29 | 1982-02-16 | Fuji Photo Film Co Ltd | Photographic sensitive silver halide material |
-
1982
- 1982-04-30 JP JP57072916A patent/JPS58190943A/en active Granted
-
1983
- 1983-04-14 GB GB08310066A patent/GB2120800B/en not_active Expired
- 1983-04-29 US US06/489,907 patent/US4452882A/en not_active Expired - Lifetime
- 1983-04-29 DE DE19833315589 patent/DE3315589A1/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549298A (en) * | 1978-10-04 | 1980-04-09 | Tanezou Tanaka | Preparation of ruler |
JPS58159529A (en) * | 1982-03-02 | 1983-09-21 | Konishiroku Photo Ind Co Ltd | Photographic silver halide emulsion |
Also Published As
Publication number | Publication date |
---|---|
JPS58190943A (en) | 1983-11-08 |
GB8310066D0 (en) | 1983-05-18 |
GB2120800B (en) | 1985-10-16 |
DE3315589A1 (en) | 1983-11-03 |
GB2120800A (en) | 1983-12-07 |
DE3315589C2 (en) | 1992-07-09 |
US4452882A (en) | 1984-06-05 |
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