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JPH0234181B2 - - Google Patents

Info

Publication number
JPH0234181B2
JPH0234181B2 JP56069651A JP6965181A JPH0234181B2 JP H0234181 B2 JPH0234181 B2 JP H0234181B2 JP 56069651 A JP56069651 A JP 56069651A JP 6965181 A JP6965181 A JP 6965181A JP H0234181 B2 JPH0234181 B2 JP H0234181B2
Authority
JP
Japan
Prior art keywords
group
molding material
molding
formula
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56069651A
Other languages
Japanese (ja)
Other versions
JPS57184242A (en
Inventor
Muneasa Torii
Kenichi Tateno
Masami Yokozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd, Matsushita Electric Works Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56069651A priority Critical patent/JPS57184242A/en
Publication of JPS57184242A publication Critical patent/JPS57184242A/en
Publication of JPH0234181B2 publication Critical patent/JPH0234181B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/296Organo-silicon compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は電子部品を封止する成形材料に関する
もので、その目的とするところは加湿時における
表面抵抗率の低下を防止し、電圧印加時の表面漏
れ電流の発生をなくし電子部品の耐湿性を向上せ
しめることにある。 近年、各種電子部品においては、その低コスト
化と生産性向上のため、プラスチツクによる封止
がなされるようになつてきた。これらの電子部品
には例えばトランジスタ等がある。これらプラス
チツクによる封止方法としては、注型、圧縮成
形、射出成形、トランスフアー成形などが用いら
れており、生産性を向上させるため量産性、作業
性に優れた射出、トランスフアー成形法が多用さ
れている。また一般に、これらの電子部品は小型
であり50〜200個取りといつた非常に多数個取り
の成形がなされている。このため、封止用材料に
は多数個取り成形を満足させるためシリコン樹脂
成形材料、エポキシ樹脂成形材料、不飽和ポリエ
ステル樹脂成形材料等の熱硬化性樹脂成形材料が
使用されているがシリコン樹脂成形材料は機械的
強度が低く、金属との密着が弱い欠点があり、不
飽和ポリエステル樹脂成形材料は耐摩耗性、耐湿
性に劣る欠点があり、エポキシ樹脂成形材料は材
料保存性、耐湿性に劣る欠点があつた。 本発明は、上記欠点を解決するもので、材料保
存性を改良したエポキシ樹脂成形材料に特定の有
機シリコン化合物を添加することによつて耐湿性
を著るしく向上せしめることができたものであ
る。本発明に用いる特定の有機シリコン化合物の
量は特に限定するものではないが好ましくは0.01
〜3重量%(以下単に%と記す)が望ましい。 以下本発明を詳細に説明する。 本発明に用いられるエポキシ樹脂は、ビスフエ
ノールA型エポキシ樹脂、ノボラツク型エポキシ
樹脂、レゾール型エポキシ樹脂、ハロゲン化エポ
キシ樹脂、グリシジルエステル型エポキシ樹脂、
高分子型エポキシ樹脂等で、硬化剤としては、ア
ミン型硬化剤、脂肪族ポリアミン、ポリアミド樹
脂、芳香族ジアミン、酸無水物硬化剤、ルイス酸
錯化合物、芳香族ポリアミン、ポリカルポン酸、
ポリカルボン酸ヒドラジド、三弗化ホウ素モノエ
チルアミン、ジシアンジアミド、イミダゾール、
フエノール樹脂、メラミン樹脂、アクリル樹脂、
ユリア樹脂、イソシアネート等で、充填剤として
は、ガラス繊維、金属ウイスカー、炭素繊維、ケ
ブラー繊維、ポリエステル繊維、ポリアミド繊
維、パルプ、アスベスト、珪酸カルシウム、バラ
イト、マイカ、クレー、セリサイト、アルミナ、
硫化モリブデン、炭酸カルシウム、珪酸、塩基性
炭酸マグネシウム、炭酸マグネシウム、水酸化カ
ルシウム、水酸化アルミニウム、三酸化アンチモ
ン、タルク、酸化チタン等で、添加剤としては、
ステアリン酸、ステアリン酸亜鉛、ステアリン酸
カルシウム、ワツクス等の離型剤やカーボンブラ
ツク、酸化鉄等の着色剤等を用いるものである。
更に上記エポキシ樹脂成形材料に式1で表わされ
る有機シリコン化合物を添加してなるものであ
る。有機シリコン化合物の量は特に限定するもの
でないが好ましくは0.01〜3%が望ましい。即ち
有機シリコン化合物の量が0.01%未満では耐湿性
向上効果が少なくなる傾向にあり、3%をこえる
と金属との密着性が低下する傾向にあるからであ
る。 (式1に於てRは水素基、メチル基、フエニル基
を示すが、更に一部のRを水酸基、アミノ基、エ
ポキシ基で変性したものであることが好ましい。
即ち耐湿性向上効果が大きくなる傾向にあるから
である。) 上記のように本発明は、エポキシ樹脂、硬化
剤、充填剤、添加剤からなる材料保存性のよいエ
ポキシ樹脂成形材料に特定の有機シリコン化合物
を添加してなることを特徴とするものであるから
トランスフアー成形や射出成形による電子部品の
多数個取りの成形に適することは勿論、注形、圧
縮成形にも適用でき、又特定の有機シリコン化合
物たとえば、前記の式〔1〕の末端または、側鎖
のRのメチル基、フエニル基を示し、これらRの
一部が水素基、水酸基に置き換えられたものまた
は、アミノ基、エポキシ基で変性されたもので、
具体的には、水素基変性シリコーン、シラノール
変性シリコーン、アミノ変性シリコーン、エポキ
シ変性シリコーンなどにおいては、水素基、また
は、水酸基、アミノ基、エポキシ基の反応基がエ
ポキシ樹脂のエポキシ基と反応することにより耐
湿性を向上せしめることができたものである。 次に本発明を実施例と比較例とにより具体的に
説明する。 実施例 1乃至5 第1表の配合表に従つて材料を配合、混合、混
練して電子部品封止用成形材料を得た。
The present invention relates to a molding material for sealing electronic components, and its purpose is to prevent a decrease in surface resistivity during humidification, eliminate surface leakage current when voltage is applied, and improve the moisture resistance of electronic components. The purpose is to improve. In recent years, various electronic components have been encapsulated with plastic in order to reduce costs and improve productivity. These electronic components include, for example, transistors. Casting, compression molding, injection molding, transfer molding, etc. are used as sealing methods with these plastics, and injection and transfer molding methods, which are superior in mass production and workability, are often used to improve productivity. has been done. Generally, these electronic components are small and are molded in a large number of molds, such as 50 to 200 molds. For this reason, thermosetting resin molding materials such as silicone resin molding materials, epoxy resin molding materials, and unsaturated polyester resin molding materials are used as sealing materials to satisfy multi-cavity molding. The material has the drawbacks of low mechanical strength and weak adhesion to metals, unsaturated polyester resin molding materials have poor abrasion resistance and moisture resistance, and epoxy resin molding materials have poor material preservation and moisture resistance. There were flaws. The present invention solves the above-mentioned drawbacks, and by adding a specific organosilicon compound to an epoxy resin molding material with improved material storage stability, the moisture resistance can be significantly improved. . The amount of the specific organosilicon compound used in the present invention is not particularly limited, but is preferably 0.01
~3% by weight (hereinafter simply referred to as %) is desirable. The present invention will be explained in detail below. The epoxy resins used in the present invention include bisphenol A type epoxy resins, novolac type epoxy resins, resol type epoxy resins, halogenated epoxy resins, glycidyl ester type epoxy resins,
Polymer-type epoxy resins, etc., and curing agents include amine-type curing agents, aliphatic polyamines, polyamide resins, aromatic diamines, acid anhydride curing agents, Lewis acid complex compounds, aromatic polyamines, polycarboxylic acids,
Polycarboxylic acid hydrazide, boron trifluoride monoethylamine, dicyandiamide, imidazole,
Phenol resin, melamine resin, acrylic resin,
Urea resin, isocyanate, etc., and fillers include glass fiber, metal whiskers, carbon fiber, Kevlar fiber, polyester fiber, polyamide fiber, pulp, asbestos, calcium silicate, barite, mica, clay, sericite, alumina,
Additives include molybdenum sulfide, calcium carbonate, silicic acid, basic magnesium carbonate, magnesium carbonate, calcium hydroxide, aluminum hydroxide, antimony trioxide, talc, titanium oxide, etc.
Mold release agents such as stearic acid, zinc stearate, calcium stearate, wax, and coloring agents such as carbon black and iron oxide are used.
Further, an organic silicon compound represented by formula 1 is added to the above-mentioned epoxy resin molding material. Although the amount of the organosilicon compound is not particularly limited, it is preferably 0.01 to 3%. That is, if the amount of the organic silicon compound is less than 0.01%, the effect of improving moisture resistance tends to decrease, and if it exceeds 3%, the adhesion to metal tends to decrease. (In Formula 1, R represents a hydrogen group, a methyl group, or a phenyl group, but it is preferable that a part of R is further modified with a hydroxyl group, an amino group, or an epoxy group.
That is, this is because the effect of improving moisture resistance tends to be greater. ) As mentioned above, the present invention is characterized in that a specific organic silicon compound is added to an epoxy resin molding material with good material preservation, which is composed of an epoxy resin, a curing agent, a filler, and an additive. Not only is it suitable for molding multiple electronic parts by transfer molding or injection molding, but it can also be applied to cast molding and compression molding. Indicates a methyl group or phenyl group in the side chain R, and a part of these R is replaced with a hydrogen group or hydroxyl group, or modified with an amino group or an epoxy group,
Specifically, in hydrogen group-modified silicones, silanol-modified silicones, amino-modified silicones, epoxy-modified silicones, etc., hydrogen groups, or reactive groups such as hydroxyl groups, amino groups, and epoxy groups react with the epoxy groups of epoxy resins. This made it possible to improve moisture resistance. Next, the present invention will be specifically explained using Examples and Comparative Examples. Examples 1 to 5 Molding materials for encapsulating electronic components were obtained by blending, mixing, and kneading materials according to the formulation table in Table 1.

【表】【table】

【表】 上記のようにして実施例1及び2と実施例4及
び5で得られた成形材料をトランスフアー成形機
を用いて金型温度160℃、成形圧力50Kg/cm2、硬
化時間2分の条件で成形品を成形し、又実施例3
で得られた成形材料については注型成形し160℃
で30分間硬化させて成形品を得た。 比較例 実施例1から有機シリコン化合物を除去したも
のを実施例1と同様に処理して成形品を得た。 実施例1乃至5及び比較例の成形品の表面漏れ
電流試験及び表面撥水試験をおこなつた結果は第
2表に示すように本発明の電子部品封止用成形材
料から得られた成形品の表面漏れ電流は少なく、
又表面撥水性がよく本発明による電子部品封止用
成形材料の優れていることを確認した。
[Table] The molding materials obtained in Examples 1 and 2 and Examples 4 and 5 as described above were molded using a transfer molding machine at a mold temperature of 160°C, a molding pressure of 50 Kg/cm 2 , and a curing time of 2 minutes. A molded product was molded under the conditions of Example 3.
The molding material obtained is cast and molded at 160℃.
The molded product was obtained by curing for 30 minutes. Comparative Example A molded article was obtained from Example 1 with the organosilicon compound removed and treated in the same manner as in Example 1. The results of the surface leakage current test and surface water repellency test of the molded products of Examples 1 to 5 and Comparative Examples are as shown in Table 2. The surface leakage current of
It was also confirmed that the molding material for encapsulating electronic components according to the present invention has good surface water repellency.

【表】【table】

Claims (1)

【特許請求の範囲】 1 エポキシ樹脂、硬化剤、充填剤、添加剤から
なるエポキシ樹脂成形材料に式〔1〕で表される
有機シリコン化合物を添加してなることを特徴と
する電子部品封止用成形材料。 (式〔1〕においてRはメチル基、フエニル基を
示す) 2 有機シリコン化合物の添加量が0.01〜3重量
%であることを特徴とする特許請求の範囲第1項
記載の電子部品封止用成形材料。 3 式〔1〕で表される有機シリコン化合物の末
端のRまたは、側鎖のRの一部が水酸基、アミノ
基、エポキシ基で変性されたものであることを特
徴とする特許請求の範囲第1項または、第2項記
載の電子部品封止用成形材料。
[Claims] 1. Electronic component encapsulation characterized by adding an organic silicon compound represented by formula [1] to an epoxy resin molding material consisting of an epoxy resin, a curing agent, a filler, and an additive. molding material. (In formula [1], R represents a methyl group or a phenyl group) 2. For encapsulating an electronic component according to claim 1, wherein the amount of the organic silicon compound added is 0.01 to 3% by weight. Molding material. 3. Claim No. 3, characterized in that the terminal R or side chain R of the organosilicon compound represented by formula [1] is partially modified with a hydroxyl group, an amino group, or an epoxy group. The molding material for encapsulating electronic components according to item 1 or 2.
JP56069651A 1981-05-08 1981-05-08 Molding material for sealing electronic part Granted JPS57184242A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56069651A JPS57184242A (en) 1981-05-08 1981-05-08 Molding material for sealing electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56069651A JPS57184242A (en) 1981-05-08 1981-05-08 Molding material for sealing electronic part

Publications (2)

Publication Number Publication Date
JPS57184242A JPS57184242A (en) 1982-11-12
JPH0234181B2 true JPH0234181B2 (en) 1990-08-01

Family

ID=13408952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56069651A Granted JPS57184242A (en) 1981-05-08 1981-05-08 Molding material for sealing electronic part

Country Status (1)

Country Link
JP (1) JPS57184242A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59129252A (en) * 1983-01-14 1984-07-25 Matsushita Electric Works Ltd Epoxy resin molding material
US4719255A (en) * 1984-08-23 1988-01-12 Kabushiki Kaisha Toshiba Epoxy resin composition for encapsulation of semi-conductor device
JPS6166712A (en) * 1984-09-11 1986-04-05 Mitsubishi Electric Corp Epoxy resin composition for sealing semiconductor
JPS61127723A (en) * 1984-11-27 1986-06-16 Sumitomo Bakelite Co Ltd Molded article of luminescent or receiving element
JPS61183314A (en) * 1985-02-12 1986-08-16 Sumitomo Bakelite Co Ltd Epoxy resin composition
JPH0782960B2 (en) * 1987-04-03 1995-09-06 松下電器産業株式会社 Metallized film capacitors
US4847154A (en) * 1987-05-29 1989-07-11 Basf Corporation Thermosetting resin systems containing secondary amine-terminated siloxane modifiers
JPH0610247B2 (en) * 1987-09-07 1994-02-09 住友ベークライト株式会社 Liquid epoxy resin composition
JP2660012B2 (en) * 1988-09-13 1997-10-08 株式会社東芝 Rubber-modified phenolic resin, epoxy resin composition, and resin-encapsulated semiconductor device
JPH0776257B2 (en) * 1988-09-29 1995-08-16 日東電工株式会社 Semiconductor device
JP2859640B2 (en) * 1989-05-19 1999-02-17 日東電工株式会社 Semiconductor device
JPH05175259A (en) * 1991-12-25 1993-07-13 Sumitomo Bakelite Co Ltd Tablet manufacturing method of semiconductor sealing epoxy resin composition
JP2002322343A (en) * 2001-04-24 2002-11-08 Hitachi Chem Co Ltd Thermosetting resin composition and method for producing the same
JP4539118B2 (en) * 2004-02-27 2010-09-08 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
JP2011144386A (en) * 2011-03-18 2011-07-28 Hitachi Chem Co Ltd Thermosetting resin composition and method for producing the same
JP2012031431A (en) * 2011-11-04 2012-02-16 Hitachi Chem Co Ltd Thermosetting resin composition and method of producing the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710621A (en) * 1980-06-24 1982-01-20 Toshiba Corp Catalyst for polymerizing epoxy compound

Also Published As

Publication number Publication date
JPS57184242A (en) 1982-11-12

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