JPH01223448A - Method for processing photosensitive material - Google Patents

Abstract

PURPOSE:To make it possible to process a negative type and/or a positive type PS plate with a same automatic processing machine by specifying the composition of a developer. CONSTITUTION:The image-likely exposed photosensitive material such as the PS plate is processed by supplying the photosensitive material in the developer which has not substantially been used, transferring the photosensitive material to the automatic processing machine. The developer is composed of the developer contg. at least an alkaline agent such as sodium silicate, an org. solvent such as ethylene glycol monophenyl ether, an anionic surfactant such as alkyl naphthalene sulfonic acid salts, a water soluble reducing agent such as a sulfite, a nonionic surfactant such as polyethylene glycol type compd. and/or a cationic surfactant such as a polymer contg. quarternary ammonium salts.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for processing photosensitive materials, and more specifically, the present invention relates to a method for processing photosensitive materials, and more particularly, it relates to a method for processing photosensitive materials, and more particularly, it relates to processing methods for processing photosensitive materials, and more specifically, for processing negative-working and/or positive-working photosensitive lithographic printing plates in the same automatic processor. It relates to a method that can be processed by.

[Background of the Inventionffi] An automatic developing machine is generally used to develop a large number of imagewise exposed photosensitive lithographic printing plates (hereinafter referred to as "88 plates"). In such an automatic developing machine,
Conventionally, a large amount of developer was stored in a storage tank, which was then supplied to the 88 plate through a nozzle using a pump, and was further circulated. However, with this method, fatigue over time,
Since the activity of the stored developer decreases due to process fatigue, etc., a method has been used to compensate for this by supplying a replenisher. However, in the above method, it is difficult to detect the activity level to determine whether to replenish the liquid, and the activity level of the phenomenon liquid constantly fluctuates because replenishment is not performed correctly, resulting in unstable processing. .

On the other hand, in the development process for the 88 plate, the negative PS plate and the positive 88 plate generally need to be processed with dedicated developers, so separate automatic developing machines have been used. Japanese Patent Application Laid-Open No. 58-223150 is an attempt to make a negative PS plate and a positive 88 plate a common phenomenon in one automatic presenter am.
As shown in Japanese Patent No. 59-91446, a two-story automatic developing machine having two developing tanks is known.

Also, JP-A-60-64351, JP-A-60-214
Publication No. 3594 also includes a technique in which a negative developing section and a positive developing section are arranged in series in the transport direction. However, all of the above-mentioned techniques have the disadvantage that they are difficult to put into practical use because the automatic processor becomes large and complicated.

[Object of the Invention] The object of the present invention is to improve the drawbacks of the prior art mentioned above and to provide a method that can process a negative 18th plate and/or a positive PS plate in the same developing tank. be.

A further object of the present invention is to provide a method for processing photosensitive materials that allows stable processing over a long period of time.

[Structure 1 of the Invention] As a result of intensive research, the present inventors have found that the above object is to use an automatic developing machine to automatically convey imagewise exposed photosensitive materials and to use substantially unused developing solution. In the method of processing by supplying on the photosensitive material during development, the developing solution contains at least (1) an alkaline agent, (2) an organic solvent, (3) an anionic surfactant, and (4) a water-soluble reducing agent. and (5) it has been found that the present invention can be achieved by a method for processing a photosensitive material characterized by containing a nonionic surfactant and/or a cationic surfactant.

[Specific Structure of the Invention] In the photosensitive material targeted by the present invention, irradiation with actinic rays causes a change in solubility between the image area and the non-image area, and this physical property change causes the non-image area to be developed. There is a so-called wash-off type photosensitive material that is washed during the process. Examples of such photosensitive materials include PS plates, color blue films, photo mask films, print 1 to wiring resists, contact lenses, films, etc., but the present invention is particularly effective for PS plates. .

In the present invention, the developer to be supplied may be a substantially unused developer.

The term "substantially unused developing solution" as used herein means a developing solution that has the same developing ability as an unused developing solution, and includes completely unused developing solution. It is also possible to mix and use a used developer within a range that does not reduce the quality of the plate.For example, during development, a used developer can be supplied to the printing plate from a part of the developer supply means along with an unused developer. Although it is possible to use a method such as carrying out development using the same method, it is most preferable to use a completely unused solution.

Since the present invention employs a new solution supply method in which a necessary amount of developing solution is supplied onto the photosensitive material each time it is processed, a stable development finish can always be obtained.

Examples of methods for supplying the developer onto the photosensitive material include a jetting method, a dropping method, and a coating method.

Specifically, there are methods of supplying from a shower pipe, nozzle, etc., and methods of applying with a wire bar, blade, etc. After supplying the developer, even better uniform development can be achieved by rubbing the photosensitive material with a sponge, brush, or the like.

Since the developing solution is wasted, it is preferable to use it in as small an amount as possible, but if it is too small, uneven development or poor development will occur.

The developer used in the present invention contains an alkaline agent, an organic solvent, an anionic surfactant, a water-soluble reducing agent, and a nonionic surfactant and/or a cationic surfactant.

1i of the present invention! The alkaline agents used in e-liquid include storium silicate, potassium silicate, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate, dibasic potassium phosphate, and tribasic phosphate. Inorganic alkaline agents such as ammonium, ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc., mono-, di- or triethanolamine and tetraalkylammonium hydroxide. Organic alkaline agents and organic ammonium silicates are useful. Among these, alkali silicates are most preferred. The alkaline agent contained in the developer is preferably used in a range of 0.05 to 20% by weight, more preferably 0.1 to 10% by weight.
1! %.

The organic solvent used in the present invention preferably has a solubility in water of 10% by weight or less at 20°C, and examples of such organic solvents include ethyl acetate, propyl acetate, butyl acetate, amyl acetate, benzyl acetate, and ethylene. glycol monobutyl acetate-I, butyl lactate,
Carboxylic acid esters such as butyl levulinate: Ketones such as ethyl butyl ketone: ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol, n-amyl alcohol, methyl Alcohols such as amyl alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; halogenated hydrocarbons such as methylene dichloride, ethylene dichloride, and monochlorobenzene. One or more of these organic solvents may be used. Among these organic IIs, ethylene glycol monophenyl ether, ethylene glycol benzyl ether and benzyl alcohol are particularly preferred.

The organic solvent is an excellent additive for improving the developability of both negative and positive plates.

Further, as the anionic surfactant used in the present invention, higher alcohol (Ca~C22) Wa f1
g Ester salts [e.g., sodium salt of lauryl alcohol sulfate, octyl alcohol sulfate-1
・Nosu 1 helium salt, ammonium salt of lauryl alcohol sulfate, [T-Ball B-81J (product name: Seal Chemical Co., Ltd.), disodium alkyl sulfate 1, etc.], aliphatic alcohol phosphate ester salts (
For example, sodium salt of cedyl alcohol phosphate ester, etc.), alkylaryl sulfonates (for example,
dodecylbenzenesulfonic acid sodium salt, isopropylnaphthalenesulfonic acid sodium salt, sinapthaline disulfonic acid sodium salt, metanitropenpinesulfonic acid sodium salt, etc.), sulfonate salts of alkylamides (for example, C17H33CONCH2 CH2
SOa Na, etc.), and sulfonic acid salts of dibasic fatty acid esters (eg, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.). Among these, alkylnaphthalene sulfonates are particularly preferably used.

The concentration of the anionic surfactant is preferably 0, 2 to 1
A range of 0% by weight, especially from 1 to 5ffiffi, is preferred.

Further, the developer according to the present invention contains a water-soluble reducing agent, and this water-soluble reducing agent may be organic or j! ! Contains a machine reducing agent.

Examples of organic reducing agents include phenolic compounds such as hydroquinone, methol, and methoxyquinone, and amine compounds such as phenylenediamine and phenylhydrazine. Examples of inorganic reducing agents include sodium sulfite, potassium fAM, and ammonium 1iiiite. , sulfites such as sodium hydrogen sulfite and potassium hydrogen sulfite, phosphates such as monolithium phosphite, potassium phosphite, sodium hydrogen phosphite, potassium hydrogen phosphite, sodium hydrogen sulfite, potassium hydrogen sulfite, etc. , hydrazine,
Examples include sodium thiosulfate and sodium dithionite, but the reducing agent that is particularly effective in the present invention is sulfite.

In the present invention, the meaning of water solubility of water-soluble reducing agents includes alkali solubility, and these water-soluble reducing agents preferably have a content of 0.1 to 10i[%, more preferably 0.5 to 10%]. Contained within the range of 5%.

Furthermore, the developer according to the present invention contains a nonionic and/or cationic surfactant.

Various compounds can be used as the above-mentioned nonionic surfactant, but they can be roughly divided into polyethylene glycol compounds and polyhydric alcohol compounds, with polyethylene glycol compounds being more preferably used. be done. Among them, oxyethylene units have a repeating structure of 3 or more, and the HLB value (Hydroohi
A nonionic surfactant having a le-Lipophile Balance) of 5 or more, more preferably 10 to 20 is suitable. That is, the above-mentioned preferred nonionic surfactant is represented by the following general formula.

8O-(CH2CHtO)nH (where n, I, a, b, C, X, Y are all 1 to 40
represents an integer. ) Specific examples of the compound represented by the above-mentioned symbol are as follows.

For example, polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether,
Polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxybrobylene cetyl ether, polyoxyethylene polyoxybutyrene behenyl ether, polyoxyethylene phenyl ether , polyoxyethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearamide, polyoxyethylene oleic acid amide, polyoxyethylene castor oil, polyoxyethylene abiethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate,
Polyoxyethylene glyceryl monooleate, polyoxyethylene glyceryl monostearate, polyoxyethylene brobylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct , octylphenol polyoxyethylene polyquaternary dipropylene adduct, glycerol monostearate 1, sorbitan monolaurate, polyoxyethylene sorbitan monolaurate, and the like.

The amount of these nonionic surfactants added is preferably 0.001-5ffiffi%, more preferably 0.01-1. Ol [% range.

Moreover, the weight average molecular weight of these nonionic surfactants is preferably in the range of 300 to so, ooo, particularly preferably in the range of 500 to so, ooo.

According to the present invention, the nonionic surfactants according to the present invention are used alone, but two or more types may be used in combination. On the other hand, the cationic surfactant according to the present invention includes various compounds, including wired amine compounds and quaternary ammonium salt compounds.

Examples of organic amine compounds include polyoxyethylene alkylamine, N-alkylpropylene diamine, and N-alkylpropylene diamine.
-Alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine oxide, alkylimidacyline, 1-
Hydroxyethyl-2-alkylimidacyline, 1-acetylaminoethyl-2-alkylimidacyline, 2-
Examples include alkyl-4-methyl-4- and droxymethyloxazoline. Examples of quaternary ammonium salt compounds include long chain primary amine salts, alkyltrimethylammonium salts, dialkyldimethylammonium salts, alkylmethylammonium salts, alkyldimethylbenzylammonium salts, alkylpyridinium salts, and alkylquinolinium salts. , alkylisoquinolinium salts, alkylpyridinium salts, stearamidemethylpyridinium salts, acylaminoethyldiethylamine salts, acylaminoethylmethyldiethylammonium salts, alkylamidoprobyl dimethylbenzyl ammonium salts, fatty acid polyethylene polyamide acylamino Ethylpyridinium salt, acylcolaminoformylmethylpyridinium salt,
Stearooxymethylpyridinium salt, fatty acid triethanolamine, fatty acid triethanolamine II, trioxyethylene fatty acid triethanolamine, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p-isooctylphenoxyethoxyethyldimethylbenzylammonium salt, etc. There is. Among these compounds, cationic surfactants such as water-soluble quaternary ammonium salts are particularly effective, and include alkyltrimethylammonium salts, alkyldimethylbenzylammonium salts, ethylene oxide-added ammonium salts, and the like. Polymers having cationic components as repeating units are also generally cationic surfactants and are effective. In particular, a polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic monomer can be suitably used.

The amount of the cationic surfactant added is preferably in the range of 0.001 to 5% by weight, more preferably 0.01 to 1.0% by weight, as is the case with the nonionic surfactant.

The average molecular weight of the signal is in the range of 300 to so.ooo, particularly preferably in the range of 500 to so.ooo.

These cationic surfactants can also be used alone, but 2
F! One or more may be used in combination.

Furthermore, according to the present invention, the effects of the present invention can be obtained even when a nonionic surfactant and a cationic surfactant are used in combination.

The following additives can be added to the phenomenon liquid according to the present invention in order to further improve the developing performance.

Example Eva, NaC1, K described in Special R [58-75152]
Neutral salts such as Cl and KBr, chelating agents such as EDTA and NTA described in JP-A No. 58-190952, JP-A No. 59-Sho.
(Co (NH3)61CI! described in No. 121336)
Complexes such as No. 3, sodium flukylnaphthalenesulfonate, N-tetradecyl- described in JP-A No. 50-51324
Anionic or amphoteric surfactants such as N,N-dihydroxyethylbetaine, p described in JP-A-55-95946
-Cationic polymers such as methyl chloride quaternary products of dimethylaminomethylpolystyrene, JP-A-1988-
Ampholytic polymer electrolytes such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in No. 142528, reducing inorganic salts described in JP-A-57-192952, lithium chloride as described in JP-A-58-59444, etc. Inorganic lithium compound, Special Publication No. 50-344
Examples include organolithium compounds such as lithium benzoate described in No. 42, organometallic surfactants containing Si, Ti, etc. described in JP-A-59-75255, organoboron compounds described in JP-A-59-84241, etc. .

The image forming layer of the 88th plate according to the present invention contains a photosensitive substance, and the physical and chemical properties of the photosensitive substance change upon exposure or subsequent development treatment. Things that cause differences in solubility,
Those in which there is a difference in the adhesive strength between molecules before and after exposure, those in which there is a difference in affinity for water and oil due to exposure or subsequent development processing, and those in which image areas can be formed by electrophotography, and 55-166645, etc. can be used.

Typical photosensitive substances include, for example, photosensitive diazo compounds, photosensitive azide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that polymerize with acid catalysts, and C-0- that decomposes with acids. Examples include compounds having a C-group.

Typical positive-type compounds that become alkali-soluble upon exposure include 0-quinonediazide compounds, acid-decomposable ether compounds, and ester compounds. Aromatic diazonium salts are examples of negative-type compounds whose solubility decreases upon exposure to light.

Specific examples of 0-quinonediazide compounds include, for example, JP-A Nos. 47-5303, 448-63802, 1048
-63803, 49-38701, 56-10
No. 44, No. 56-1045, Special Publication No. 41-11222
No. 43-28403, No. 45-9610, No. 4
No. 9-17481, U.S. Pat. No. 2,797,213, U.S. Pat. No. 3,046.120, U.S. Pat.
, No. 454,400, No. 3.544.323, No. 3,
No. 573,917, No. 3,674.495, No. 3,7
No. 85,825, British Patent No. 1,227,602,
No. 1,251,345, No. 1, 267, 005,
1,329,888, 1,330,932, German Patent No. 854,890, etc. Examples of acid-decomposable compounds include Japanese Patent Application Laid-Open No. 60-3754.
9, No. 60-10247, No. 60-3625, etc., and PS using these compounds alone or in combination as a photosensitive component.
The present invention can be preferably applied at least to plates.

These photosensitive components include O-quinonediazidecarboxylic acid esters of aromatic human O-oxy compounds or O-quinonediazidecarboxylic acid esters of aromatic human O-oxy compounds and O-quinonediazidecarboxylic acid esters of aromatic human oxygen compounds and
-Includes quinonediazide sulfonic acid or 0-quinonediazidecarboxylic acid amide, and also includes those in which these 0-quinonediazide compounds are used alone, and those in which they are mixed with an alkali-soluble resin and this mixture is provided as a photosensitive layer. .

Alkali-soluble resins include novolak-type phenolic resins, and specifically include phenol formaldehyde resins, cresol formaldehyde resins, phenol-cresol mixed formaldehyde resins, cresol xylenol mixed formaldehyde resins, and the like. Furthermore, as described in JP-A-50-125806, in addition to the above-mentioned phenol resin, phenol or cresol substituted with an alkyl group having 3 to 8 carbon atoms such as t-butylphenol formaldehyde resin and formaldehyde are used. It is also possible to use a condensate of the same.

If necessary, additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer containing an 0-quinonediazide compound as a photosensitive component.

The present invention is applicable to the amount per unit area of the photosensitive layer containing the O-quinonediazide compound as a photosensitive component, preferably in the range of about 0.5 to 7 a/f.

There is no particular need to change the image exposure of the positive type 88 plate to which the method of the present invention is applied, and a conventional method may be used.

Typical photosensitive components of the negative photosensitive layer are diazo compounds, such as diazo resins which are condensates of diazonium salts and/or p-diazophenylamine and formaldehyde, as described in Japanese Patent Publication No. 7364/1983. Copolymerization of 3-methoxydiphenylamine-4-diazonium chloride, 4-nitrodiphenylamine, and formaldehyde described in Japanese Patent Publication Sho, 49-a8001@ Diazo resin consisting of an organic solvent soluble salt of a condensate, 2-methoxy-4-hydroxy- of a condensate of p-diazodiphenylamine and formaldehyde
Examples include 5-benzoylbenzenesulfonate, tetrafluoroborate of a condensate of p-diazophenylamine and formaldehyde, and hexafluorophosphate. The present invention can be preferably applied at least to negative crab PS plates containing these as photosensitive components. ``In addition to the use of these diazo compounds alone, the present invention can also be applied to those used in combination with various resins in order to improve the physical properties of the photosensitive layer. Such resins include, in addition to sealac and polyvinyl alcohol derivatives, copolymers having an alcoholic hydroxyl group in lll1tB described in JP-A-5O-1t8802;
Examples include a copolymer having phenolic water II in its III chain, which is described in JP-A-55-155355.

These resins include a copolymer containing at least 5011% of the structural unit represented by the following symbol, -Momonea R1 (wherein, R1 represents a hydrogen atom or a methyl group, and R2 represents a hydrogen atom or a methyl group). , an ethyl group or a chloromethyl group, and n is an integer of 1 to 10) and 1 to 80 mol% of a single unit having an aromatic hydroxyl group, and an acrylic ester and/or a methacrylic ester. Included are polymer compounds having a monomer unit content of 5 to 90 mol % and an acid value of 10 to 20 G.

Additives such as dyes, plasticizers, components imparting printout performance, etc. can be added to the photosensitive layer of the negative 18 plate to which the developer and development method of the present invention are applied.

The coating opening per unit area of the photosensitive layer is at least 0.1
The present invention can be applied in the range of ~7 U/f.

Supports used for the above PS plates include paper, plastic (e.g. polyethylene, polypropylene, polystyrene, etc.) laminated paper, aluminum (including aluminum alloys), zinc, copper, etc. metal bottom plates, diacetic acid. Films of plastics such as cellulose, cellulose triacetate, cellulose diopionate, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyvinyl acetal, etc., paper laminated or vapor-deposited with metals as mentioned above, or chrome plated. Examples include steel plates, among which aluminum and aluminum-coated composite supports are particularly preferred.

Further, the surface of the aluminum material is preferably roughened for the purpose of increasing water retention and improving adhesion to the photosensitive layer.

Examples of surface roughening methods include generally known methods such as brush polishing, ball polishing, electrolytic etching, chemical etching, liquid honing, and sandblasting, and combinations thereof. Preferably, brush polishing, electrolytic etching, and chemical Target etching and liquid honing are mentioned, of which surface roughening methods especially involving the use of electrolytic etching are particularly preferred. Furthermore, as the electrolytic bath used in 'Ji etching, an aqueous solution containing an acid, an alkali, or a salt thereof, or an aqueous solution containing a volatile solvent is used, and among these, especially hydrochloric acid, nitric acid, or a salt thereof. An electrolytic solution containing the following is preferred. Further, the roughened aluminum plate is desmutted with an acid or alkali aqueous solution, if necessary.

It is desirable that the aluminum plate thus obtained be anodized, and particularly preferably, a method of treatment in a bath containing sulfuric acid or phosphoric acid can be mentioned. Further, if necessary, a sealing treatment and other surface treatments such as immersion in a regulated potassium zirconate aqueous solution can be performed.

In addition, the development method using the developer according to the present invention includes, in addition to the development process, if necessary, after the development process, a development stop process (the stop process solution includes a disposable method or a recycle method), an insensitive resin. Each individual treatment step of the chemical treatment step, the development stop treatment step, the desensitization treatment step that follows it, and the current 6
; It may include a treatment step in which a treatment step and a desensitization treatment are combined, or a treatment step in which a development stop treatment step and a desensitization treatment step are combined, for example, as disclosed in JP-A-54-8001.

In addition, when developing the negative type and positive type PS plates in the present invention with the same developer solution, conditions other than the developer composition (e.g., development temperature, development time, etc.) may be changed between the negative type and positive type. Optional.

[Examples] Hereinafter, the present invention will be explained in more detail with reference to specific examples.

Example 1 A JIS1050 aluminum plate with a thickness of 0.24-2
% sodium hydroxide aqueous solution, degreased, electrochemically roughened in a dilute hydrochloric acid solution, thoroughly washed, and then anodized in a diluted hydrochloric acid solution.
．． An oxide film of 5 (1,/f) was formed on the surface of the aluminum plate.

After washing the obtained aluminum plate with water and drying, a photosensitive solution having the following composition was coated to give a dry thickness of 2.5 mm (J/f) and dried to obtain a positive PS plate.The size of the plate was 1003x.
It was set to 800n+m.

(Photosensitive liquid) Naphthoquinone-1,2-diazide(2)-5-sulfonic acid ester of resorcinol-benzaldehyde resin (described in Example 1 of JP-A-56-1044)...1 part Cresol-phenol-formaldehyde resin...3 parts ter
Putuquinone of t-butylphenol-benzaldehyde resin.

1.2-Diazide(2)-5-sulfonic acid ester (described in Example 1 of JP-A-60-31138)...0.1 part Crystal violet (B, A, S, F, [dye] ...0.05
Part: Ethylene glycol monomethyl ether... 20 parts A transparent positive film was adhered to the obtained positive type 98 plate, and a 70 ca was heated using a 2 kW metal halide lamp.
Exposure was performed for 60 seconds from a + distance.

In addition, a JIS 1050 aluminum plate with a thickness of 0.24 mm+ was degreased by immersing it in a 20% aqueous solution of 1 to 1 lithium phosphoric acid, the surface was electrochemically roughened in a dilute nitric acid solution, and after thorough cleaning, it was degreased. 1 by anodizing in a sulfuric acid solution.
．． An oxide film of 5 Q/f was formed on the surface of the aluminum plate.

The obtained aluminum plate is roughly immersed in an aqueous solution of sodium metasilicate for pore sealing treatment, washed with water, and dried. After that, the following photosensitive liquid is applied to a drying degree of 2, OQ/f, and dried. A negative type 88 plate was obtained.

(Photosensitive liquid) Hexafluorophosphate of a condensate of p-diazodiphenylamine and paraformaldehyde...1 part N-(
4-Hydroxyphenylmethacrylamide copolymer (described in Example 1 of Japanese Patent Publication No. 57-43890)...
・10 parts Victoria Pure Blue BOH (manufactured by Hodogaya Chemical@, dye) ... 0.2 parts ethylene glycol monomethyl ether ... 100 parts This negative type 88 plate was adhered to a transparent negative film and 2 kilowatts Exposure was carried out for 30 seconds using a metal halide lamp from a distance of 7 cm.

The above-exposed positive type and negative type 88 plates were developed using the automatic developing machine shown in FIG. 1 using the developer described below.

Developer solution I - Sodium silicate (JIS Sodium Silicate No. 3) 5 parts by weight - Sodium hydroxide 211 parts - Phenyl Cellosolve 11 ifli parts - Perex N B
-L (Product name: Anionic surfactant manufactured by Kao Corporation) 101
1 part/Anhydrous sodium sulfite 1f! [Part 1・
Emulgen 141 (Product name: Kao nonionic surfactant) 0.1
f! Quantity/Water: 120 parts by weight In FIG. 1, when the 88 plate 1 is conveyed to the developing section by the conveyor roller 2, the developer liquid supplies the 88 plate from between the two plate supply ports 5 from the tank 3 with the pump 4. 1. The supply amount is P
The S version was set at 200.1 per volt. Preferably, the temperature is controlled at this time.

Thereafter, the 88 plate is immersed in a developer, rubbed with a brush 7, and then squeezed. The developer is stored in a waste liquid tank 8 and discarded. Next, it is washed with water and the gum is removed, but at this time, rinsing may be performed instead of gum. Alternatively, it may be gummed or rinsed immediately after development without washing with water.

Both the negative 88th plate and the positive 98th plate prepared above were
When the sheets were randomly processed, good images were obtained with a similar finish on all the plates.

[Effects of the Invention gA] As explained above in detail, by the method of the present invention, it was possible to stably develop the negative 88th plate and/or the positive 98th plate in the same development tank.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of the automatic processor used in Examples and Comparative Examples. Main reference numbers> 1...Photosensitive material 2...Transport port-ra 3...
Storage tank 4... Pump 5... Developer supply port 6... Presser skewer 0-rough... Brush roller 8
...Waste, liquid tank 9...Nozzle

Claims (1)

[Claims] A method in which an imagewise exposed photosensitive material is automatically conveyed using an automatic developing machine, and a substantially unused developer is supplied onto the photosensitive material at the time of development. , at least (1) an alkaline agent, (2) an organic solvent, (
3) anionic surfactant, (4) water-soluble reducing agent and (
5) A method for processing a photosensitive material, characterized by containing a nonionic surfactant and/or a cationic surfactant.