JPH01135023A - Elimination of organic matter - Google Patents
Elimination of organic matterInfo
- Publication number
- JPH01135023A JPH01135023A JP29201687A JP29201687A JPH01135023A JP H01135023 A JPH01135023 A JP H01135023A JP 29201687 A JP29201687 A JP 29201687A JP 29201687 A JP29201687 A JP 29201687A JP H01135023 A JPH01135023 A JP H01135023A
- Authority
- JP
- Japan
- Prior art keywords
- jig
- organic matter
- gas
- treated
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000005416 organic matter Substances 0.000 title claims abstract description 14
- 230000008030 elimination Effects 0.000 title abstract 3
- 238000003379 elimination reaction Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 claims description 8
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 4
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、有機物の除去方法に係り、特に非円形被処理
物の角部の有機物除去に好適な方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for removing organic matter, and particularly to a method suitable for removing organic matter from corners of non-circular objects.
ウェハ上のレジスト膜上にオゾン等のガス流を供給して
、上記レジスト膜を酸化除去する技術が知られている。A known technique is to supply a gas flow such as ozone onto a resist film on a wafer to oxidize and remove the resist film.
このような有機物除去方法において、ガスを被処理物の
中央付近から流す場合、被処理物の中心により近い縁部
分に、より多くガスが流れるため、遠い縁部分にはガス
がほとんど流れない。このため上記ふい部分では４１機
物除去速度が小さくなり問題があった。In such an organic matter removal method, when gas is caused to flow from near the center of the object to be treated, more gas flows to the edges closer to the center of the object, and almost no gas flows to the edges farther away. For this reason, there was a problem in that the speed of removing 41 aircraft objects was low in the above-mentioned wiping portion.
他に特開昭６１−２７６３５のような技＋ｌｔｒがある
が、これはガスを横から流しており、この場合、中央付
近からガスを流すよりも除去速度が小さくなる。There is also a technique +ltr as disclosed in Japanese Patent Application Laid-open No. 61-27635, but in this technique the gas is flowed from the side, and in this case, the removal rate is lower than when the gas is flowed from around the center.
上記の従来技術では例えば角形の被処理物の角部の有機
物除去が考慮されておらず、本発明はこの点を改ｒキす
ることを［１的としてなされたものである。The above-mentioned prior art does not take into account the removal of organic matter from the corners of a rectangular object to be treated, and the present invention has been developed with the aim of resolving this point.
［問題点を解決するための手段〕
本発明は、被処理物の中心から被処理物の最遠部までの
距離を半径とする円内において被処理物と同じ高さにな
るように治具を設置することにより、ガス流通厚さの増
化をはかり、最１・ｈ部の有機物除去速度を上げ、前記
問題点を解決したものである。[Means for Solving the Problems] The present invention provides a jig that is set at the same height as the workpiece within a circle whose radius is the distance from the center of the workpiece to the farthest part of the workpiece. By installing this, the thickness of the gas flow is increased, the rate of organic matter removal at the maximum 1·h area is increased, and the above-mentioned problems are solved.
上述の如き治具の使用によれば、ガスの流通厚さを同一
とすることにより、ガスが、近い縁部に流出することな
く、全面にわたって、均一に流れるため、有機物除去速
度が改善される。By using the jig as described above, by making the gas flow thickness the same, the gas flows uniformly over the entire surface without leaking to the nearby edges, improving the organic matter removal rate. .
本発明の一実施例を第１図を参照して説明する。 An embodiment of the present invention will be described with reference to FIG.
第１図において１は角形の非処理物、２は治具、３は石
英製の円板でガス導入用のノズルがついている。４は紫
外線ランプである。In FIG. 1, 1 is a rectangular unprocessed object, 2 is a jig, and 3 is a quartz disc with a nozzle for introducing gas. 4 is an ultraviolet lamp.
この時、治具２がなければ、ガスはａ方向に流れにくく
、ｂ方向に流れ易い。このため角部３の有機物の除去速
度が低かった。At this time, if the jig 2 is not present, the gas is difficult to flow in the direction a, and tends to flow in the direction b. Therefore, the rate of removal of organic matter from the corner portion 3 was low.
本発明により治具２をつけると、ガス流通厚さが均一に
なるため、ガスがａ方向にもｂ方向にも均一に流れ、角
部の有機物除去速度を改善できた。By attaching the jig 2 according to the present invention, the gas flow thickness becomes uniform, so that the gas flows uniformly in both the a direction and the b direction, thereby improving the organic matter removal rate at the corners.
なお、治具は円形に限らず、被処理物の中心から最遠部
までの距離を半径とした内外はどのような形状でもその
効果は同等である。Note that the jig is not limited to a circular shape, and the effect is the same no matter what shape the jig has inside or outside, with the radius being the distance from the center of the object to the farthest part.
本発明によれば、角形の被処理物においても十分均一に
有機物の除去ができる。According to the present invention, organic matter can be removed sufficiently uniformly even from a rectangular workpiece.
第１図は本発明の一実施態様を示す有機物除去装置の・
１１而図および側面図である。
１・・・被処理物、２・・・治具、３・・・石英円板、
４・・・紫外線ランプ。FIG. 1 shows an example of an organic matter removal device showing one embodiment of the present invention.
11 and a side view. 1... Workpiece, 2... Jig, 3... Quartz disk,
4...Ultraviolet lamp.
Claims (1)
、被処理物表面の有機物を除去する方法において、被処
理物の中心から被処理物の最遠部までの距離を半径とす
る円内においてガス流通厚さが同一となるように治具を
設けたことを特徴とした有機物除去方法。1. In a method of flowing a gas such as ozone over the surface of a non-circular workpiece to remove organic matter from the workpiece, the radius is the distance from the center of the workpiece to the farthest part of the workpiece. A method for removing organic matter characterized by providing a jig so that the gas flow thickness is the same within the circle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29201687A JPH01135023A (en) | 1987-11-20 | 1987-11-20 | Elimination of organic matter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29201687A JPH01135023A (en) | 1987-11-20 | 1987-11-20 | Elimination of organic matter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01135023A true JPH01135023A (en) | 1989-05-26 |
Family
ID=17776435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29201687A Pending JPH01135023A (en) | 1987-11-20 | 1987-11-20 | Elimination of organic matter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01135023A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5812336A (en) * | 1981-07-16 | 1983-01-24 | Nec Corp | Vacuum chuck |
| JPS62154632A (en) * | 1985-12-27 | 1987-07-09 | Chlorine Eng Corp Ltd | Removal of organic film |
| JPS62165330A (en) * | 1986-01-16 | 1987-07-21 | Hitachi Ltd | Removal of organic photoresist film |
-
1987
- 1987-11-20 JP JP29201687A patent/JPH01135023A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5812336A (en) * | 1981-07-16 | 1983-01-24 | Nec Corp | Vacuum chuck |
| JPS62154632A (en) * | 1985-12-27 | 1987-07-09 | Chlorine Eng Corp Ltd | Removal of organic film |
| JPS62165330A (en) * | 1986-01-16 | 1987-07-21 | Hitachi Ltd | Removal of organic photoresist film |
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