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JPH01106472A - Solar cell - Google Patents

Solar cell

Info

Publication number
JPH01106472A
JPH01106472A JP62264373A JP26437387A JPH01106472A JP H01106472 A JPH01106472 A JP H01106472A JP 62264373 A JP62264373 A JP 62264373A JP 26437387 A JP26437387 A JP 26437387A JP H01106472 A JPH01106472 A JP H01106472A
Authority
JP
Japan
Prior art keywords
sio2
semiconductor layer
resin
islands
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62264373A
Other languages
Japanese (ja)
Inventor
Koji Minami
浩二 南
Kaneo Watanabe
渡邉 金雄
Masayuki Iwamoto
岩本 正幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP62264373A priority Critical patent/JPH01106472A/en
Publication of JPH01106472A publication Critical patent/JPH01106472A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To facilitate providing a light scattering structure at the boundary between a translucent electrode and a semiconductor layer by a simple process by a method wherein islands made of silicon oxide are formed dispersed on the surface of the transparent electrode brought into contact with the semiconductor layer. CONSTITUTION:A silicon oxide island 14 has a particle shape with a height approximately 500Angstrom and is made of SiO2. The islands 14 are formed on the surface 11a of a translucent electrode 11 before a semiconductor layer 12 is formed. In other words, mixture composed of resin such as acrylic resin, phenolic resin or epoxy resin and 1-30wt.% of SiO2 paste mixed with the resin is prepared first. For this purpose, the recommended SiO2 paste is composed of organic solvent and 50-90wt.% of glass powder (SiO2) mixed with the solvent. Then the mixture is applied to the translucent electrode surface 11a uniformly with a thickness about 50-200mum by screen printing and baked in the air at 400-600 deg.C. As a result, only SiO2 in the mixture is left and scattered to form the islands.

Description

【発明の詳細な説明】 ((イ)産業上の利用分野 不発明は太陽を池に関するり (口」 従来の技術 第2図は特公昭62−7716号公報にも記載されてい
る従来の太陽電mt−示し、巾は透光性基板、+21 
ハ透光性電極、13+はアモルファスシリコン半導体層
、14+は背面電極であり、半導体$ 131と接する
透光性電極;21の表面(2a)は凹凸状になっている
DETAILED DESCRIPTION OF THE INVENTION ((a) Invention in the field of industrial application is related to the sun as a pond.) Conventional technology Figure 2 shows the conventional solar technology described in Japanese Patent Publication No. 7716/1983. Electric mt- is shown, width is transparent substrate, +21
(c) A transparent electrode; 13+ is an amorphous silicon semiconductor layer; 14+ is a back electrode; the surface (2a) of the transparent electrode in contact with the semiconductor $131 is uneven;

斯る太陽t7tljcめっては、図中矢線で示す如く、
基板中に垂直に入射しt光は、透光性電極表面(2a)
の凹凸に工9散乱されて半導体層+3+中勿斜めに通過
し、この結果、半導体1m 131中での入射光の光路
長が長くなって発生電流が増大するという特徴がある。
Such a sun t7tljc, as shown by the arrow in the figure,
The light incident perpendicularly into the substrate is exposed to the transparent electrode surface (2a).
The light is scattered by the unevenness of the semiconductor layer and passes diagonally through the semiconductor layer.As a result, the optical path length of the incident light in the semiconductor 1m becomes longer and the generated current increases.

Pl  発明が解決し工つとする問題点上記従来の構造
において、透光性電極表面(2a)全凹凸状に加工する
作業は少しく煩雑であり。
Pl Problems to be Solved by the Invention In the above-mentioned conventional structure, the work of processing the light-transmitting electrode surface (2a) into a completely uneven shape is a little complicated.

従って本発明は、エリ簡便な作業?適応し得る新規な太
陽ta槽構造提供するものである。
Therefore, does the present invention simplify the work? A novel and adaptable solar tank structure is provided.

に)問題点全解決する友めの手段 不発明の太陽電池は、第1図に示す如く、透光性基板(
出土に透光性電極σ11、非単結晶半導体!(121及
び背面電極03ケ噴層しt構成において、半導体層(1
21と接する透光性電極表面C11a)に酸化シリコン
の島Ut−分散形成し定ことを特徴とする□(ホ)作 
用 第1図中、矢線で示す様に、基板(【(舅に垂直に八つ
次光のうち、酸化シリコン烏(14J’?r−通るもの
は分散されて半導体層a21中を斜めに通過する。
2) A friendly means to solve all the problems The uninvented solar cell has a transparent substrate (
Excavated transparent electrode σ11, non-single crystal semiconductor! (121 and back electrode 03 are injected) In the t configuration, the semiconductor layer (1
□(e) production characterized by forming silicon oxide islands Ut-dispersed on the transparent electrode surface C11a) in contact with 21.
As shown by the arrow in FIG. pass.

(へ)実施例 不発明の実施例を示す第1図全参照するに、基板1tJ
lは透光性ガラスからなり、透光性電極Qllは基板1
llJ上に2UOOA厚さのITO膜と50OA厚さの
SSn0zと全順次被着し友ものである□半i体l@n
はアモルファスシリコンからなり、透光性電極表面(l
la)に20OA厚さのP型層と、5000賃厚さの1
型層と、1000χ厚さのn型層と金順次積智して形成
されている□背面電極Q31は、半導体1021に構成
する前記n型層表面にAtとT1と全順次被着してなり
、2000Aの厚みケ有する。
(v) Embodiment Referring to FIG. 1 showing an embodiment of the invention, the substrate 1tJ
1 is made of translucent glass, and the translucent electrode Qll is the substrate 1
ITO film with a thickness of 2UOOA and SSn0z with a thickness of 50OA are all sequentially deposited on llJ.
is made of amorphous silicon, and has a transparent electrode surface (l
la) with a P-type layer of 20 OA thickness and 1 layer of 5000 OA thickness.
The back electrode Q31 is formed by sequentially depositing a mold layer, an n-type layer with a thickness of 1000χ, and gold.The back electrode Q31 is formed by sequentially depositing At and T1 on the surface of the n-type layer constituting the semiconductor 1021. , has a thickness of 2000A.

本実施例の特徴とする酸化シリコン島t14:は500
χ高さの粒形状SiO2から構成され、それは半導体@
azの形成前に透光性電極表面(lla)に形成される
。即ち、まずアクリル樹脂、フェノール樹脂あるいはエ
ポキシ樹脂等の樹脂に5102ベースト全1〜30 W
t95の割合で均一に混合した混合物全準備するりこの
ための8102ペーストとしては、有機溶剤にガラス粉
末(SiOz)i50〜9QWt96混合したものが適
当であるり次に、前記混合物を、スクリーン印刷にLり
透光性電極表面(lla)上に50〜200μmの厚さ
で均一に塗布し、大気中で400へ600 ’cで焼成
するりこの結果、前記混合物中の8102のみが島状に
分散して残留するり 不実施例の太陽電池にあっては、半導体層(12+の屈
折率3.5に対して酸化シリコン島Iのそれは165で
あり、この屈折率差にエリ島Iと半導体層(121との
境界で光が散乱する。二って、半導体層σ3内全進む光
の距離が大となり、発生電流が増大するO不実施例太i
t池と、島α4のみがない同構造の太陽TL池と全比較
すると、後者に対し前者の℃絡電流は5〜1096増大
し友□ (ト]  発明の効果 本発明太陽お池の構造に工れば、簡単な作業にて透光性
電・雨と半導体層との境界に光散乱構造を設けることが
可能となる□・
The silicon oxide island t14, which is a feature of this embodiment, is 500
It is composed of grain-shaped SiO2 with a height of χ, which is a semiconductor @
It is formed on the transparent electrode surface (lla) before the formation of az. That is, first, a resin such as acrylic resin, phenolic resin, or epoxy resin is coated with 5102 base at a total of 1 to 30 W.
A suitable 8102 paste for this purpose is a mixture of glass powder (SiOz) i50 to 9QWt96 in an organic solvent.Next, the mixture is screen printed. It was applied uniformly to a thickness of 50 to 200 μm on the transparent electrode surface (lla) and baked at 400 to 600 'C in the air. As a result, only 8102 in the mixture was dispersed in the form of islands. In the non-example solar cell that remains, the refractive index of the semiconductor layer (12+) is 3.5, whereas that of the silicon oxide island I is 165, and this refractive index difference between the semiconductor layer and the semiconductor layer (Light is scattered at the boundary with 121. Second, the distance that the light travels within the semiconductor layer σ3 increases, and the generated current increases.
When comparing the solar TL pond with the solar TL pond of the same structure without only the island α4, the circuit current of the former increases by 5 to 1096 compared to the latter. Once constructed, it becomes possible to provide a light-scattering structure at the boundary between the transparent conductive layer and the semiconductor layer with simple work.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は、夫々本発明実施例及び従来例金示
す断面図である0
1 and 2 are cross-sectional views showing an embodiment of the present invention and a conventional example, respectively.

Claims (1)

【特許請求の範囲】[Claims] (1)透光性基板上に透光性電極、非単結晶半導体層及
び背面電極を積層した太陽電池において、前記半導体層
と接する前記透光性電極の表面に酸化シリコンの島を分
散形成したことを特徴とする太陽電池。
(1) In a solar cell in which a transparent electrode, a non-single crystal semiconductor layer, and a back electrode are laminated on a transparent substrate, islands of silicon oxide are dispersed and formed on the surface of the transparent electrode in contact with the semiconductor layer. A solar cell characterized by:
JP62264373A 1987-10-20 1987-10-20 Solar cell Pending JPH01106472A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62264373A JPH01106472A (en) 1987-10-20 1987-10-20 Solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62264373A JPH01106472A (en) 1987-10-20 1987-10-20 Solar cell

Publications (1)

Publication Number Publication Date
JPH01106472A true JPH01106472A (en) 1989-04-24

Family

ID=17402251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62264373A Pending JPH01106472A (en) 1987-10-20 1987-10-20 Solar cell

Country Status (1)

Country Link
JP (1) JPH01106472A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5230746A (en) * 1992-03-03 1993-07-27 Amoco Corporation Photovoltaic device having enhanced rear reflecting contact
US5370747A (en) * 1991-11-25 1994-12-06 Sanyo Electric Co., Ltd. Photovoltaic device
US5421909A (en) * 1992-03-03 1995-06-06 Canon Kabushiki Kaisha Photovoltaic conversion device
US5656098A (en) * 1992-03-03 1997-08-12 Canon Kabushiki Kaisha Photovoltaic conversion device and method for producing same
WO2000028603A1 (en) 1998-11-06 2000-05-18 Pacific Solar Pty. Limited TEXTURING OF GLASS BY SiO2 FILM
WO2006005889A1 (en) * 2004-07-07 2006-01-19 Saint-Gobain Glass France Photovoltaic solar cell and solar module
EP1653519A1 (en) * 2004-10-29 2006-05-03 Mitsubishi Heavy Industries, Ltd. Photoelectric conversion device
EP1670065A1 (en) * 2004-12-10 2006-06-14 Mitsubishi Heavy Industries, Ltd. Light-scattering film and optical device using the same
DE102004032810B4 (en) * 2004-07-07 2009-01-08 Saint-Gobain Glass Deutschland Gmbh Photovoltaic solar cell with a layer of light-scattering properties and solar module
JP2010073799A (en) * 2008-09-17 2010-04-02 National Institute Of Advanced Industrial Science & Technology Silicon-based solar cell
WO2011013719A1 (en) * 2009-07-29 2011-02-03 旭硝子株式会社 Transparent conductive substrate for solar cell, and solar cell
EP2752885A1 (en) * 2011-09-02 2014-07-09 Showa Shell Sekiyu K.K. Thin film solar cell and manufacturing method therefor
EP2315257A3 (en) * 2009-10-20 2015-04-29 Industrial Technology Research Institute Solar cell device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144476A (en) * 1984-08-08 1986-03-04 Hitachi Maxell Ltd Semiconductor photoelectric conversion device
JPS61116886A (en) * 1984-11-13 1986-06-04 Sanyo Electric Co Ltd Manufacture of photovoltaic device
JPS6269407A (en) * 1985-09-20 1987-03-30 三洋電機株式会社 Surface roughing of transparent conducting film
JPS6269408A (en) * 1985-09-20 1987-03-30 三洋電機株式会社 Surface roughing of transparent conducting film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144476A (en) * 1984-08-08 1986-03-04 Hitachi Maxell Ltd Semiconductor photoelectric conversion device
JPS61116886A (en) * 1984-11-13 1986-06-04 Sanyo Electric Co Ltd Manufacture of photovoltaic device
JPS6269407A (en) * 1985-09-20 1987-03-30 三洋電機株式会社 Surface roughing of transparent conducting film
JPS6269408A (en) * 1985-09-20 1987-03-30 三洋電機株式会社 Surface roughing of transparent conducting film

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5370747A (en) * 1991-11-25 1994-12-06 Sanyo Electric Co., Ltd. Photovoltaic device
US5421909A (en) * 1992-03-03 1995-06-06 Canon Kabushiki Kaisha Photovoltaic conversion device
US5656098A (en) * 1992-03-03 1997-08-12 Canon Kabushiki Kaisha Photovoltaic conversion device and method for producing same
US5230746A (en) * 1992-03-03 1993-07-27 Amoco Corporation Photovoltaic device having enhanced rear reflecting contact
EP1142031A4 (en) * 1998-11-06 2007-11-21 Csg Solar Ag TEXTURING OF GLASS BY SiO 2? FILM
WO2000028603A1 (en) 1998-11-06 2000-05-18 Pacific Solar Pty. Limited TEXTURING OF GLASS BY SiO2 FILM
EP1142031A1 (en) * 1998-11-06 2001-10-10 Pacific Solar Pty Ltd TEXTURING OF GLASS BY SiO 2? FILM
DE102004032810B4 (en) * 2004-07-07 2009-01-08 Saint-Gobain Glass Deutschland Gmbh Photovoltaic solar cell with a layer of light-scattering properties and solar module
US7994420B2 (en) 2004-07-07 2011-08-09 Saint-Gobain Glass France Photovoltaic solar cell and solar module
WO2006005889A1 (en) * 2004-07-07 2006-01-19 Saint-Gobain Glass France Photovoltaic solar cell and solar module
JP2008506249A (en) * 2004-07-07 2008-02-28 サン−ゴバン グラス フランス Solar cell and solar module
EP1653519A1 (en) * 2004-10-29 2006-05-03 Mitsubishi Heavy Industries, Ltd. Photoelectric conversion device
AU2005200581B2 (en) * 2004-10-29 2011-07-28 Mitsubishi Heavy Industries, Ltd. Photoelectric conversion device
JP2006128478A (en) * 2004-10-29 2006-05-18 Mitsubishi Heavy Ind Ltd Photoelectric converter
US8129611B2 (en) 2004-12-10 2012-03-06 Mitsubishi Heavy Industries, Ltd. Light-scattering film and optical device using the same
EP1670065A1 (en) * 2004-12-10 2006-06-14 Mitsubishi Heavy Industries, Ltd. Light-scattering film and optical device using the same
AU2005242176B2 (en) * 2004-12-10 2011-08-11 Mitsubishi Heavy Industries, Ltd. Light-scattering film and optical device using the same
JP2010073799A (en) * 2008-09-17 2010-04-02 National Institute Of Advanced Industrial Science & Technology Silicon-based solar cell
WO2011013719A1 (en) * 2009-07-29 2011-02-03 旭硝子株式会社 Transparent conductive substrate for solar cell, and solar cell
CN102473742A (en) * 2009-07-29 2012-05-23 旭硝子株式会社 Transparent conductive substrate for solar cell and solar cell
EP2315257A3 (en) * 2009-10-20 2015-04-29 Industrial Technology Research Institute Solar cell device
EP2752885A1 (en) * 2011-09-02 2014-07-09 Showa Shell Sekiyu K.K. Thin film solar cell and manufacturing method therefor
EP2752885A4 (en) * 2011-09-02 2015-04-01 Showa Shell Sekiyu Thin film solar cell and manufacturing method therefor
US9450116B2 (en) 2011-09-02 2016-09-20 Showa Shell Sekiyu K.K. Thin film solar cell and manufacturing method therefor

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