JPH07170066A - Additive process printed wiring board adhesive agent and manufacture of wiring board by use thereof - Google Patents
Additive process printed wiring board adhesive agent and manufacture of wiring board by use thereofInfo
- Publication number
- JPH07170066A JPH07170066A JP23195994A JP23195994A JPH07170066A JP H07170066 A JPH07170066 A JP H07170066A JP 23195994 A JP23195994 A JP 23195994A JP 23195994 A JP23195994 A JP 23195994A JP H07170066 A JPH07170066 A JP H07170066A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- wiring board
- adhesive agent
- weight
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000853 adhesive Substances 0.000 title claims abstract description 77
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000000654 additive Substances 0.000 title claims abstract description 12
- 230000000996 additive effect Effects 0.000 title claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 230000001070 adhesive effect Effects 0.000 claims abstract description 71
- 229920005989 resin Polymers 0.000 claims abstract description 24
- 239000011347 resin Substances 0.000 claims abstract description 24
- 239000003822 epoxy resin Substances 0.000 claims abstract description 16
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 15
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 239000011256 inorganic filler Substances 0.000 claims abstract description 8
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 8
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 8
- 238000007766 curtain coating Methods 0.000 claims abstract description 4
- 238000007747 plating Methods 0.000 claims description 17
- 229920000459 Nitrile rubber Polymers 0.000 claims description 12
- 238000007788 roughening Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 238000007772 electroless plating Methods 0.000 claims description 8
- -1 amine salt Chemical class 0.000 claims description 6
- 238000007598 dipping method Methods 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 4
- 239000012790 adhesive layer Substances 0.000 claims description 3
- 150000003014 phosphoric acid esters Chemical class 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000004080 punching Methods 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 24
- 229910052802 copper Inorganic materials 0.000 abstract description 23
- 239000010949 copper Substances 0.000 abstract description 23
- 239000011147 inorganic material Substances 0.000 abstract description 6
- 239000011368 organic material Substances 0.000 abstract description 6
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000002131 composite material Substances 0.000 abstract description 3
- 229910019142 PO4 Inorganic materials 0.000 abstract 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 abstract 1
- 239000010452 phosphate Substances 0.000 abstract 1
- 238000001723 curing Methods 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical group CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N triethylamine Natural products CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- HHWADTQVDUQGSB-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanol;octadecyl dihydrogen phosphate Chemical compound OCCN(CCO)CCO.CCCCCCCCCCCCCCCCCCOP(O)(O)=O HHWADTQVDUQGSB-UHFFFAOYSA-N 0.000 description 1
- YQQCJMHMIWRGQD-UHFFFAOYSA-N 2-aminoethanol;dioctyl hydrogen phosphate Chemical compound NCCO.CCCCCCCCOP(O)(=O)OCCCCCCCC YQQCJMHMIWRGQD-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- KPVWDKBJLIDKEP-UHFFFAOYSA-L dihydroxy(dioxo)chromium;sulfuric acid Chemical compound OS(O)(=O)=O.O[Cr](O)(=O)=O KPVWDKBJLIDKEP-UHFFFAOYSA-L 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- NRZWYNLTFLDQQX-UHFFFAOYSA-N p-tert-Amylphenol Chemical compound CCC(C)(C)C1=CC=C(O)C=C1 NRZWYNLTFLDQQX-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- YDVDUENYRYEFLW-UHFFFAOYSA-K sodium dihydroxy(dioxo)chromium sulfuric acid fluoride Chemical compound [F-].[Na+].OS(O)(=O)=O.O[Cr](O)(=O)=O YDVDUENYRYEFLW-UHFFFAOYSA-K 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- OHRVKCZTBPSUIK-UHFFFAOYSA-N tridodecyl phosphate Chemical compound CCCCCCCCCCCCOP(=O)(OCCCCCCCCCCCC)OCCCCCCCCCCCC OHRVKCZTBPSUIK-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、無電解めっきで析出し
た銅との接着力に優れたアディティブ法プリント配線板
用接着剤及びその製造法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive for an additive printed wiring board excellent in adhesive strength to copper deposited by electroless plating and a method for producing the same.
【0002】[0002]
【従来の技術】従来、アディティブ法によるプリント配
線板は、接着剤付き絶縁基材に無電解めっきで必要な配
線パターンを形成するものである。例えば、めっき触媒
などを含有する絶縁基材上にめっき触媒を含有する接着
剤層を浸漬法やカーテンコートにより形成し、150℃
〜190℃の温度で30分〜60分加熱して硬化させ
る。次いで、回路形成部以外をめっきレジストでマスク
し、無電解めっき銅との接着性を向上するための前処理
としてクロム硫酸などの酸化性エッチング液で回路形成
部の接着剤表面を選択的に化学粗化する。その後、中和
及び水洗工程を経て無電解銅めっき液に浸漬し、回路部
に銅を析出させて配線パターンを形成する。2. Description of the Related Art Conventionally, a printed wiring board by an additive method is one in which a necessary wiring pattern is formed on an insulating base material with an adhesive by electroless plating. For example, an adhesive layer containing a plating catalyst is formed on an insulating base material containing a plating catalyst by a dipping method or curtain coating, and the temperature is set to 150 ° C.
It is cured by heating at a temperature of 190 ° C for 30 minutes to 60 minutes. Next, mask the parts other than the circuit forming part with a plating resist, and selectively chemistry of the adhesive surface of the circuit forming part with an oxidizing etchant such as chromic sulfuric acid as a pretreatment to improve adhesion with electroless plated copper. Roughen. After that, it is immersed in an electroless copper plating solution through a neutralization and washing process to deposit copper in the circuit portion to form a wiring pattern.
【0003】このようなアディティブ法プリント配線板
用接着剤としては、特公昭48−24250号公報、特
公昭45−9843号公報、特公昭55−16391号
公報、特公平1−53910号公報などに開示されてい
るように、一般にめっき銅との接着性が良いアクリロニ
トリルブタジエンゴムを主成分とし、かつ耐熱性を確保
するためにアルキルフェノール樹脂でアクリロニトリル
ブタジエンゴムを架橋し、また電気特性を確保するため
にエポキシ樹脂を配合することが知られている。さら
に、接着剤塗膜の補強や化学粗化時の接着剤凹凸増加
(めっき銅とのアンカリング効果による接着性向上)の
ために無機充填剤を配合した接着剤が提案されている。Examples of such adhesives for printed wiring boards of the additive method include those disclosed in Japanese Patent Publication Nos. 48-24250, 45-9843, 55-16391, and 1-53910. As disclosed, in general, acrylonitrile butadiene rubber having good adhesion to plated copper is the main component, and in order to ensure heat resistance, the acrylonitrile butadiene rubber is cross-linked with an alkylphenol resin, and in order to ensure electrical properties. It is known to compound an epoxy resin. Further, an adhesive containing an inorganic filler has been proposed in order to reinforce the adhesive coating film and increase the unevenness of the adhesive during chemical roughening (improve the adhesiveness due to the anchoring effect with plated copper).
【0004】また、最近では接着剤付き積層板の製造法
として、従来の絶縁基板を出発源とするものから、接着
剤層を絶縁基板の成型時に同時に形成する手法(以下、
1段法という。)が、製造コストや均一膜厚性、低表面
粗さなどの点から見直されつつある。Recently, as a method of manufacturing a laminated board with an adhesive, a method of forming an adhesive layer at the same time as molding an insulating substrate from a conventional starting method using an insulating substrate (hereinafter, referred to as
It is called the one-step method. ) Is being reviewed from the viewpoints of manufacturing cost, uniform film thickness, low surface roughness, etc.
【0005】[0005]
【発明が解決しようとする課題】ところで、近年、電子
機器の小型化や多機能化に伴い、プリント配線板はより
配線密度を増す必要が生じており、配線幅の細線化が急
激に進行している。具体的には、2〜3年前は150μ
mの配線幅が主流であったが、現在は100μmが主流
となりつつあり、近いうちに75μmあるいは50μm
の配線幅に発展する可能性がある。このような背景か
ら、従来の製造法あるいは1段法により製造したアディ
ティブ配線板において、めっき銅との接着力が重要にな
ることはいうまでもない。By the way, in recent years, with the miniaturization and multi-functionalization of electronic devices, it has become necessary to increase the wiring density of printed wiring boards, and the wiring width has rapidly become thinner. ing. Specifically, 150μ 2-3 years ago
The wiring width of m was the mainstream, but now 100 μm is becoming the mainstream, and soon 75 μm or 50 μm.
There is a possibility that it will develop to the wiring width of. From such a background, it goes without saying that the adhesive force with the plated copper is important in the additive wiring board manufactured by the conventional manufacturing method or the one-step method.
【0006】しかしながら、この1段法を用いる場合
は、熱硬化性樹脂のプリプレグと接着剤とを一体成型す
る際に、プリプレグに含まれる熱硬化性樹脂が加熱、加
圧時に混合する現象(以下、マイグレーションと略す)
が発生し、無電解めっき銅との接着力低下を引き起こす
ので、接着剤シートの硬化を進めておき、プリプレグと
加熱、加圧する手法が取り入れられたりする。ただし、
接着剤の硬化が進むために粗化されにくくなり、無電解
めっき銅との接着力は通常の手法で作製した接着剤付き
積層板を出発源としたものと比較して、約7割〜8割程
低下するという課題がある。However, when this one-step method is used, when the prepreg of the thermosetting resin and the adhesive are integrally molded, the thermosetting resin contained in the prepreg is mixed during heating and pressurization (hereinafter , Abbreviated as migration)
Occurs, which causes a decrease in the adhesive strength with the electroless plated copper. Therefore, a method of preliminarily curing the adhesive sheet and applying prepreg, heating, and pressure may be adopted. However,
Roughening is less likely to occur as the curing of the adhesive progresses, and the adhesive strength with the electroless plated copper is about 70% to 8% as compared with the case where a laminated plate with an adhesive produced by a usual method is used as a starting source. There is a problem that it will drop relatively.
【0007】本発明は、めっき銅との接着力が高いアデ
ィティブ配線板用接着剤及びその製造法を提供するもの
である。The present invention provides an adhesive for an additive wiring board having a high adhesive strength with plated copper and a method for producing the same.
【0008】[0008]
【議題を解決するための手段】本発明の絶縁基板の回路
形成面に設ける接着剤は、その組成がエポキシ樹脂、ア
クリロニトリルブタジエンゴム、アルキルフェノール樹
脂、及び無機充填剤を主成分とする組成物100重量部
に対して、アルキル基の炭素数が6〜18までのトリ又
はジ又はモノ長鎖りん酸エステルとアミン塩よりなる内
部離型剤を0.05〜5.0重量%含有することを特徴
とする。The adhesive provided on the circuit-forming surface of the insulating substrate of the present invention has a composition of 100 parts by weight of a composition containing an epoxy resin, acrylonitrile butadiene rubber, an alkylphenol resin, and an inorganic filler as main components. 0.05 to 5.0% by weight of an internal release agent consisting of a tri-, di- or mono-long-chain phosphoric acid ester having 6 to 18 carbon atoms in the alkyl group and an amine salt with respect to parts. And
【0009】この内部離型剤は、紙フェノール積層板を
熱プレス圧着で製造する際に、鏡板(ステンレス鏡板)
との離型を行う目的で、紙フェノール積層板構成樹脂に
数%添加されるものを用いることができる。この内部離
型剤は、アルキル基の炭素数及びりん酸とのエステル結
合のアルキル基の数により、分子量の異なる離型剤が得
られる。このようなものとしては、モノステアリールり
ん酸エステルトリエタノールアミン塩、ジオクチールり
ん酸エステルモノエタノールアミン塩、又はトリラウリ
ールりん酸エステルトリエチルアミン塩などがある。こ
の内部離型剤の添加量は、エポキシ樹脂、アクリロニト
リルブタジエンゴム、アルキルフェノール樹脂、及び無
機充填剤を主成分とする組成物に対して0.05〜5.
0重量%の範囲が好ましく、0.05重量%未満ではめ
っき銅との接着力向上効果が小さく、5.0重量%以上
になると耐熱性が低下するからである。This internal release agent is an end plate (stainless end plate) when a paper phenol laminated plate is manufactured by hot press bonding.
For the purpose of releasing from the resin, a resin added by several% to the resin constituting the paper phenol laminate can be used. With this internal release agent, a release agent having a different molecular weight can be obtained depending on the number of carbon atoms in the alkyl group and the number of alkyl groups in the ester bond with phosphoric acid. Examples thereof include monostearyl phosphate triethanolamine salt, dioctyl phosphate monoethanolamine salt, and trilauryl phosphate triethylamine salt. The amount of the internal mold release agent added is 0.05 to 5 with respect to the composition containing the epoxy resin, the acrylonitrile butadiene rubber, the alkylphenol resin, and the inorganic filler as the main components.
This is because the range of 0% by weight is preferable, and if it is less than 0.05% by weight, the effect of improving the adhesive strength with the plated copper is small, and if it is 5.0% by weight or more, the heat resistance decreases.
【0010】本発明に用いるエポキシ樹脂としては、ビ
スフェノールA型、ノボラック型、ビスフェノールF
型、又は脂環式型などがあるが、耐熱性や耐めっき液性
などの点からビスフェノールA型又はノボラック型が好
ましく、その配合量は10〜65重量%が好ましい。1
0重量%未満であると、耐熱性が低下し、65重量%を
超えると、めっき銅との接着力が低下する。また、この
エポキシ樹脂の硬化剤として、イミダゾール系、アミン
系、フェノール系、ジシアンジアミドなどの潜在性硬化
剤系など、通常のエポキシ樹脂の効果剤を用いることが
でき、特に限定されるものではない。The epoxy resin used in the present invention includes bisphenol A type, novolac type and bisphenol F type.
Although there are molds, alicyclic molds and the like, bisphenol A type or novolac type is preferable from the viewpoint of heat resistance and plating solution resistance, and the compounding amount thereof is preferably 10 to 65% by weight. 1
If it is less than 0% by weight, the heat resistance is lowered, and if it exceeds 65% by weight, the adhesive force with the plated copper is lowered. As a curing agent for this epoxy resin, a general curing agent for an epoxy resin such as an imidazole-based, amine-based, phenol-based or latent curing agent-based curing agent such as dicyandiamide can be used and is not particularly limited.
【0011】アクリロニトリルブタジエンゴムとして
は、アクリロニトリルの含有量が15〜50重量%の範
囲であれば特に制限するものではなく、カルボキシル基
を含有したアクリロニトリルブタジエンゴムも使用でき
る。アクリロニトリルの含有量が、15重量%未満であ
ると、接着剤混合物としての相溶性が低下し、また、5
0重量%を超えると、吸水し易くなるため、絶縁特性が
低下する。その配合量は、10〜60重量%が好まし
く、10重量%未満であると、塗膜形成性や粗化性が低
下し、60重量%を超えると耐熱性が低下する。The acrylonitrile butadiene rubber is not particularly limited as long as the content of acrylonitrile is in the range of 15 to 50% by weight, and acrylonitrile butadiene rubber containing a carboxyl group can also be used. When the content of acrylonitrile is less than 15% by weight, the compatibility as an adhesive mixture is lowered, and 5
When it exceeds 0% by weight, water is easily absorbed, so that the insulating property is deteriorated. The blending amount is preferably 10 to 60% by weight, and when it is less than 10% by weight, coating film forming property and roughening property are deteriorated, and when it exceeds 60% by weight, heat resistance is decreased.
【0012】本発明において、アルキルフェノール樹脂
は、アクリロニトリルブタジエンゴムを熱架橋するため
に用いられる。このようなアルキルフェノール樹脂とし
ては、アルキル基の種類、反応基の種類及び分子量分布
によって各種あるが、パラターシャリーブチルフェノー
ル、パラターシャリーアミルフェノール、パラフェニル
フェノール、及びパラセカンダリーブチルフェノールな
どが使用できる。その配合量は、2〜30重量%の範囲
が好ましく、2重量%未満であると、耐熱性が十分でな
く、30重量%を超えると、粗化が十分に行えずめっき
銅との接着性が低い。In the present invention, the alkylphenol resin is used to thermally crosslink the acrylonitrile butadiene rubber. As such an alkylphenol resin, there are various kinds depending on the kind of alkyl group, kind of reactive group and molecular weight distribution, but paratertiary butylphenol, paratertiary amylphenol, paraphenylphenol, para-secondary butylphenol and the like can be used. The blending amount is preferably in the range of 2 to 30% by weight, and when it is less than 2% by weight, heat resistance is not sufficient, and when it exceeds 30% by weight, roughening cannot be sufficiently performed and adhesiveness to plated copper is not sufficient. Is low.
【0013】無機充填剤としては、炭酸カルシウム、ケ
イ酸マグネシウム、ケイ酸アルミニウム、水酸化アルミ
ニウム、焼成ハイドロタルサイト、酸化シリカなどが使
用でき、1種又は2種以上混合しても良い。その配合量
は、10〜50重量%が好ましく、10重量%未満の場
合、粗化性及び耐熱性が共に十分でなく、50重量%を
超えると、粗化性と耐熱性が向上せず、経済的に無意味
である。As the inorganic filler, calcium carbonate, magnesium silicate, aluminum silicate, aluminum hydroxide, calcined hydrotalcite, silica oxide and the like can be used, and one kind or a mixture of two or more kinds may be used. The blending amount is preferably 10 to 50% by weight, and when it is less than 10% by weight, the roughening property and the heat resistance are both insufficient, and when it exceeds 50% by weight, the roughening property and the heat resistance are not improved, It is economically meaningless.
【0014】本発明において、接着剤中に無電解銅めっ
きの析出核となるめっき触媒を含有することができる。
めっき触媒としては、元素周期率表の8、1B及び2B
属の金属の塩あるいは酸化物が使用できる。例えば、白
金、パラジウム、錫などの化合物が用いられ、固体粒子
あるいは有機溶剤に溶解又は他の樹脂と共に溶解分散さ
せた溶液状態として接着剤中に混合することができる。
めっき触媒の接着剤中への配合量は、2〜15重量%の
範囲が好ましく、2重量%未満であると、無電解めっき
により銅が析出せず、15重量%を超えると、絶縁特性
が低下し、かつ経済的でない。In the present invention, the adhesive may contain a plating catalyst which becomes a precipitation nucleus of electroless copper plating.
As the plating catalyst, 8, 1B and 2B in the periodic table of the elements are used.
A metal salt or oxide of a genus metal can be used. For example, compounds such as platinum, palladium, and tin are used, and they can be mixed in the adhesive in the form of a solution in which they are dissolved in solid particles or an organic solvent or dissolved and dispersed with another resin.
The content of the plating catalyst in the adhesive is preferably in the range of 2 to 15% by weight, and when it is less than 2% by weight, copper does not deposit due to electroless plating. Deteriorating and not economical.
【0015】上記接着剤の各成分は、有機溶媒中で混練
混合され溶液状混合物に調整されるが、有機溶剤として
は、トルエン、メチルエチルケトン、アセトン、メチル
イソブチルケトン、キシレン、ジエチレングリコールモ
ノメチルエーテル、ジエチレングリコールモノメチルエ
ーテルアセテート、及び酢酸エチルなどのうちから1種
以上が使用できる。The respective components of the adhesive are kneaded and mixed in an organic solvent to prepare a solution-like mixture. The organic solvent is toluene, methyl ethyl ketone, acetone, methyl isobutyl ketone, xylene, diethylene glycol monomethyl ether, diethylene glycol monomethyl. One or more of ether acetate and ethyl acetate can be used.
【0016】本発明では、接着剤を絶縁基板の表面に形
成する手法としては、以下の2通りの手法を用いること
ができる。第1は、接着剤を離型支持体に塗布、乾燥
し、得られた接着剤シートを熱硬化性樹脂を含浸したプ
リプレグの両側に配し、加熱加圧して一体成型により接
着剤付き絶縁基板を製造するものである。離型支持体と
しては、離型処理したアルミ箔、銅箔等の金属箔の他
に、ポリピレンフィルム、ポリエチレンフィルム、トリ
アセテートフィルム、ポリエステルフィルム、フッ化ビ
ニル系フィルム等に離型処理したフィルムが使用でき
る。この離型支持体に、例えば、接着剤を膜厚20〜1
20μmの範囲で塗布し、120℃〜180℃の温度で
2分〜20分乾燥及び予備的硬化を行う。得られた接着
剤シートを回路形成面となるように配し、熱硬化性樹脂
(例えば、エポキシ樹脂、フェノール樹脂、ポリイミド
樹脂等)を無機質又は有機質又は無機質と有機質の複合
物からなる基材に含浸したプリプレグと、全体を加熱、
加圧して製造する。この際の加熱、加圧及び時間の条件
は、140℃〜200℃の温度で、圧力20〜100k
g/cm2、時間30〜120分間で成型することが好
ましい。温度が140℃以下では成型性が不十分であ
り、200℃以上では、そり、変色等の問題が生じる。
圧力も同様に、20kg/cm2未満では成形性が不十
分であり、100kg/cm2を超えると、そり、変色
等の問題が生じる。また、時間は、30分以下では成型
性が不十分であり、90分以上では硬化が進みすぎて粗
化されにくくなる。In the present invention, the following two methods can be used to form the adhesive on the surface of the insulating substrate. First, an adhesive is applied to a release support, dried, and the obtained adhesive sheet is placed on both sides of a prepreg impregnated with a thermosetting resin, and heated and pressed to integrally mold the insulating substrate with the adhesive. Is manufactured. As the release support, in addition to release-treated aluminum foil, metal foil such as copper foil, a release-treated film such as a polypropylene film, a polyethylene film, a triacetate film, a polyester film, or a vinyl fluoride film is used. Can be used. An adhesive, for example, having a film thickness of 20 to 1 is applied to the release support.
It is applied in the range of 20 μm, and dried and preliminary cured at a temperature of 120 ° C. to 180 ° C. for 2 minutes to 20 minutes. The obtained adhesive sheet is arranged so as to be a circuit forming surface, and a thermosetting resin (eg, epoxy resin, phenol resin, polyimide resin, etc.) is used as a base material made of an inorganic material or an organic material or a composite material of an inorganic material and an organic material. The impregnated prepreg and the whole are heated,
It is manufactured by applying pressure. The conditions of heating, pressurization and time at this time are a temperature of 140 ° C. to 200 ° C. and a pressure of 20 to 100 k.
Molding is preferably performed at g / cm 2 for 30 to 120 minutes. If the temperature is 140 ° C or lower, moldability is insufficient, and if the temperature is 200 ° C or higher, problems such as warpage and discoloration occur.
Similarly, if the pressure is less than 20 kg / cm 2 , the moldability is insufficient, and if it exceeds 100 kg / cm 2 , problems such as warpage and discoloration occur. Further, if the time is 30 minutes or less, the moldability is insufficient, and if it is 90 minutes or more, the curing is excessively promoted and roughening is less likely to occur.
【0017】また第2の手法は、熱硬化性樹脂(例え
ば、エポキシ樹脂、フェノール樹脂、ポリイミド樹脂
等)を無機質又は有機質又は無機質と有機質の複合物か
らなる基材に含浸したプリプレグを所定枚数重ねて全体
を加熱、加圧して作製した絶縁基板に、前記接着剤を浸
漬法又はカーテンコートを用いて塗布、乾燥して接着剤
付き積層板を製造する。接着剤を塗布した後の乾燥は、
100℃〜150℃の温度で15分〜45分間行い、硬
化を150℃〜200℃の温度で30分〜90分行って
作製する。なお、接着剤の膜厚は、20〜50μmとな
るようにすることが好ましい。膜厚を、20μm以下と
すると、めっき銅との接着力が低下し、50μmを超え
ると、接着剤の使用量が増加し、経済的でない。The second method is to stack a predetermined number of prepregs in which a thermosetting resin (eg, epoxy resin, phenol resin, polyimide resin, etc.) is impregnated into a base material made of an inorganic material or an organic material or a composite material of an inorganic material and an organic material. The adhesive is applied to an insulating substrate produced by heating and pressurizing the whole with a dipping method or curtain coating, followed by drying to produce a laminate with an adhesive. Drying after applying the adhesive,
It is produced by performing the curing at a temperature of 100 ° C. to 150 ° C. for 15 minutes to 45 minutes and the curing at a temperature of 150 ° C. to 200 ° C. for 30 minutes to 90 minutes. The film thickness of the adhesive is preferably 20 to 50 μm. When the film thickness is 20 μm or less, the adhesive force with the plated copper is reduced, and when it exceeds 50 μm, the amount of the adhesive used is increased, which is not economical.
【0018】本発明の絶縁基板中にも、接着剤と同よう
な無電解用めっき触媒を含有することができる。その含
有量は、2〜15重量%の範囲が好ましく、その理由
も、接着剤と同じである。The insulating substrate of the present invention may also contain an electroless plating catalyst similar to the adhesive. The content is preferably in the range of 2 to 15% by weight, and the reason is the same as that of the adhesive.
【0019】無電解めっきを析出させるに際しては、接
着剤表面を化学的に粗化して接着に適した形状にする。
化学的粗化に用いる処理液は、クロム酸−硫酸、クロム
酸−硫酸−フッ化ナトリウム、ホウフッ化水素酸−重ク
ロム酸、アルカリ過マンガン酸系などが使用できる。When depositing the electroless plating, the surface of the adhesive is chemically roughened to a shape suitable for adhesion.
As the treatment liquid used for the chemical roughening, chromic acid-sulfuric acid, chromic acid-sulfuric acid-sodium fluoride, borofluoric acid-dichromic acid, alkaline permanganate, or the like can be used.
【0020】無電解めっき浴としては、一般の銅をめっ
き膜として形成できるものが使用される。As the electroless plating bath, a bath capable of forming general copper as a plating film is used.
【0021】配線板の電子部品搭載穴や導通のための穴
あけは、パンチプレスあるいはNCドリルマシンを使用
して行われる。Holes for mounting electronic parts on the wiring board and holes for conduction are formed using a punch press or an NC drill machine.
【0022】パターン形成は、めっきレジストをスクリ
ーン印刷、あるいはフォトマスクを紫外線硬化し現像し
て形成する。これらめっきレジストの形成は、化学的粗
化処理工程の前あるいは処理した後で行われる。The pattern is formed by screen-printing a plating resist or UV-curing and developing a photomask. The formation of these plating resists is performed before or after the chemical roughening treatment step.
【0023】[0023]
【作用】めっき銅と接着力の高いアディティブ法プリン
ト配線板として、エポキシ樹脂、アクリロニトリルブタ
ジエンゴム、アルキルフェノール樹脂、無機充填剤を主
成分とする組成物に、アルキル基の炭素数が6〜18ま
でのトリ又はジ又はモノりん酸エステルとアミン塩から
なる紙フェノール積層板用内部離型剤を加えた接着剤を
用いることが有効であることを見出した。[Function] As an additive method printed wiring board having high adhesion to plated copper, a composition containing epoxy resin, acrylonitrile butadiene rubber, alkylphenol resin, and an inorganic filler as a main component and having an alkyl group having 6 to 18 carbon atoms It has been found that it is effective to use an adhesive containing an internal mold release agent for paper phenol laminates consisting of tri-, di- or mono-phosphate ester and amine salt.
【0024】この内部離型剤による接着力の向上は、そ
の原理が明らかではないが、硬化時の高温時に親水基を
樹脂表面側にして移行する離型剤の作用が、アディティ
ブ法プリント配線板用接着剤において、接着剤表面に出
現した親水基と、その表面に析出されるめっき銅との化
学的な結合力が増加したものと推測される。Although the principle of the improvement of the adhesive force by the internal release agent is not clear, the action of the release agent which transfers the hydrophilic group to the resin surface side at the time of high temperature during curing is caused by the additive method printed wiring board. It is presumed that the chemical bonding force between the hydrophilic group appearing on the surface of the adhesive and the plated copper deposited on the surface of the adhesive for use in the adhesive increased.
【0025】[0025]
【実施例】・ビスフェノールA型エポキシ樹脂 エピコート1001(油化シェルエポキシ株式会社製,
商品名):15重量部 ・アクリロニトリルブタジエンゴム ニポール1031(日本ゼオン株式会社製,商品名)・
・・・・:50重量部 ・アルキルフェノール樹脂 ヒタノール2400(日立化成工業株式会社製,商品
名)・・・:10重量部 ・無機添加剤(ケイ酸ジルコニウム) ミクロパックス(白水化学株式会社製,商品名)・・・
・・・・:20重量部 ・エポキシ樹脂の硬化剤 2エチル4メチルイミダゾール・・・・・・・・・・・
・・・・:0.1 重量部 ・無電解めっき用触媒 塩化パラジウムの樹脂混合物・・・・・・・・・・・・
・・・・: 4重量部 に対して、表1に示すように、それぞれ、りん酸エステ
ルのアルキル基の炭素数が異なる内部離型剤を0.5重
量部添加し、ニーダを用いて混練し、及びメチルエチル
ケトンに溶解して20%の濃度の接着剤を作製した。こ
の接着剤を用いて、1段法により製造した接着剤付き積
層板と、浸漬法により製造した接着剤付き積層板を製造
した。[Example] Bisphenol A type epoxy resin Epicoat 1001 (manufactured by Yuka Shell Epoxy Co., Ltd.,
Product name): 15 parts by weight-Acrylonitrile butadiene rubber Nipol 1031 (manufactured by Nippon Zeon Co., Ltd., product name)-
・ ・ ・ ・: 50 parts by weight ・ Alkylphenol resin Hitanol 2400 (manufactured by Hitachi Chemical Co., Ltd., product name) ・ ・ ・: 10 parts by weight ・ Inorganic additive (zirconium silicate) Micropax (manufactured by Shiramizu Chemical Co., Ltd., product) Name)···
・ ・ ・ ・: 20 parts by weight ・ Curing agent for epoxy resin 2 Ethyl 4 methyl imidazole
・ ・ ・ ・: 0.1 parts by weight ・ Catalyst for electroless plating Palladium chloride resin mixture ・ ・ ・
···: To 4 parts by weight, as shown in Table 1, 0.5 parts by weight of internal release agents having different carbon numbers of the alkyl groups of the phosphoric acid ester were added, and kneading was performed using a kneader. And was dissolved in methyl ethyl ketone to prepare an adhesive having a concentration of 20%. Using this adhesive, a laminated board with an adhesive produced by the one-step method and a laminated board with an adhesive produced by the dipping method were produced.
【0026】(製法1)1段法は以下の方法で行った。
すなわち、前記接着剤を両面離型処理した、厚さ75μ
mのポリエステルフィルムの片面に、膜厚40μm塗布
し、170℃−15分間熱処理して接着剤フィルムを得
た。次いで、厚さ0.2mmのガラスクロスにめっき触
媒入りエポキシ樹脂を含浸して半硬化したプリプレグG
E−168(日立化成工業株式会社製、商品名)を作製
し、所定枚数重ね、前記の接着剤フィルムをプリプレグ
の両外側となるように重ね合わせ、鏡板を介して、17
0℃−50kg/cm2−60分間の条件で成型し、接
着剤付き積層板を得た。(Production Method 1) The one-step method was carried out by the following method.
That is, a thickness of 75 μ obtained by subjecting the adhesive to a release treatment on both sides.
A film having a thickness of 40 μm was applied to one surface of a polyester film having a thickness of m and heat-treated at 170 ° C. for 15 minutes to obtain an adhesive film. Next, a 0.2 mm thick glass cloth was impregnated with an epoxy resin containing a plating catalyst to be semi-cured prepreg G.
E-168 (manufactured by Hitachi Chemical Co., Ltd., trade name) was produced, a predetermined number of the layers were laminated, and the above adhesive films were laminated so as to be on both outer sides of the prepreg, and then, through an end plate, 17
Molding was carried out under the conditions of 0 ° C.-50 kg / cm 2 -60 minutes to obtain a laminated plate with an adhesive.
【0027】(製法2)また、浸漬法は、以下の方法で
行った。すなわち、前記接着剤を所定の粘度に調整す
る。次いで、0.2mmのガラスクロスにめっき触媒入
りエポキシ樹脂を含浸して半硬化したプリプレグGE−
168(日立化成工業株式会社製、商品名)を作製し、
所定枚数重ね、鏡板と離型フィルムを介して170℃−
50kg/cm2−60分間の条件で成型し、積層板L
E−168(日立化成工業株式会社製、商品名)を得
た。この積層板を前記接着剤中に浸漬し、速度10mm
/分で引き上げ、膜厚25μm塗布した。次いで、12
0℃−30分間熱処理した後、170℃−60分間硬化
して接着剤付き積層板を得た。(Production method 2) The immersion method was carried out by the following method. That is, the adhesive is adjusted to have a predetermined viscosity. Then, a 0.2 mm glass cloth was impregnated with an epoxy resin containing a plating catalyst to be semi-cured prepreg GE-
168 (manufactured by Hitachi Chemical Co., Ltd., trade name)
After stacking a specified number of sheets, 170 ° C through the end plate and release film
Molded under the condition of 50 kg / cm 2 -60 minutes to obtain a laminated plate L
E-168 (manufactured by Hitachi Chemical Co., Ltd., trade name) was obtained. This laminate is dipped in the adhesive and the speed is 10 mm.
The coating film was pulled up at a speed of about 1 / min to apply a film thickness of 25 μm. Then 12
After heat treatment at 0 ° C. for 30 minutes, it was cured at 170 ° C. for 60 minutes to obtain a laminated board with an adhesive.
【0028】そして、上記接着剤付き絶縁基板に、めっ
き用レジストであるSR−3000(日立化成工業株式
会社製,商品名)をラミネートし、紫外線露光、現像し
て試験パターンを作製した。Then, SR-3000 (trade name, manufactured by Hitachi Chemical Co., Ltd.), which is a resist for plating, was laminated on the insulating substrate with the adhesive, exposed to ultraviolet rays and developed to prepare a test pattern.
【0029】次に、クロム/硫酸/フッ化ナトリウム
(クロム酸40g/l,濃硫酸300ml/l,フッ化
ナトリウム10g/l)の粗化液に、40℃−10分間
浸漬して、接着剤露出部分のみ選択的に化学粗化し、そ
の後中和、水洗した。さらに、無電解銅めっき浴である
CC−41液(日立化成工業株式会社製,商品名)に投
入して、めっき銅を35μm析出させた後、160℃−
60分アニーリングを行い、アディティブ法プリント配
線板を得た。Then, it is immersed in a roughening solution of chromium / sulfuric acid / sodium fluoride (chromic acid 40 g / l, concentrated sulfuric acid 300 ml / l, sodium fluoride 10 g / l) at 40 ° C. for 10 minutes to form an adhesive. Only the exposed part was chemically roughened, then neutralized and washed with water. Furthermore, after pouring into CC-41 liquid (made by Hitachi Chemical Co., Ltd., trade name) which is an electroless copper plating bath to deposit 35 μm of plated copper, 160 ° C.-
Annealing was performed for 60 minutes to obtain an additive method printed wiring board.
【0030】上記実施例の接着剤配合において、比較例
として紙フェノール積層板用離型剤を添加しない配合に
ついて、実施例と同ようにしてテストパターンを作製し
た。実施例と比較例の結果を表1に示す。A test pattern was prepared in the same manner as in the above-mentioned examples, except that, as a comparative example, a release agent for a paper phenol laminate was not added as a comparative example. The results of Examples and Comparative Examples are shown in Table 1.
【0031】[0031]
【表1】 [Table 1]
【0032】[0032]
【発明の効果】以上に説明したように、エポキシ樹脂、
アクリロニトリルブタジエンゴム、アルキルフェノール
樹脂、無機充填剤系の接着剤組成物に内部離型剤を添加
することにより、耐熱性や電気特性を損なうことなく、
めっき銅との接着力に優れたアディティブ法プリント配
線板用接着剤を提供することができる。As described above, the epoxy resin,
Acrylonitrile butadiene rubber, alkylphenol resin, by adding an internal mold release agent to the inorganic filler-based adhesive composition, without impairing heat resistance and electrical characteristics,
It is possible to provide an adhesive for an additive-type printed wiring board, which has an excellent adhesion to plated copper.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 加賀谷 隆志 栃木県芳賀郡二宮町久下田4133番 日立エ ーアイシー株式会社二宮工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Takashi Kagaya 4133 No. 4133 Kushita, Ninomiya-machi, Haga-gun, Tochigi Prefecture Hitachi AIC Corporation Ninomiya Factory
Claims (6)
て、その組成がエポキシ樹脂、アクリロニトリルブタジ
エンゴム、アルキルフェノール樹脂、及び無機充填剤を
主成分とする組成物に対して、アルキル基の炭素数が6
〜18までのトリ又はジ又はモノ長鎖りん酸エステルと
アミン塩よりなる内部離型剤を0.05〜5.0重量%
含有することを特徴とするアディティブ法プリント配線
板用接着剤。1. An adhesive formed on the surface of an insulating substrate, the composition of which includes an epoxy resin, an acrylonitrile butadiene rubber, an alkylphenol resin, and an inorganic filler as a main component, and an alkyl group carbon. The number is 6
0.05 to 5.0% by weight of an internal release agent consisting of a tri-, di- or mono-long-chain phosphoric acid ester up to 18 and an amine salt
An adhesive for an additive method printed wiring board, characterized by containing.
燥した接着剤シート。2. An adhesive sheet in which the adhesive of claim 1 is applied to a release support and dried.
積層板。3. A laminated board provided with the adhesive of claim 1 on a circuit forming surface.
を含浸したプリプレグの両側に配し、140℃〜200
℃の温度、圧力20〜100kg/cm2 で30〜12
0分間一体成型して得られる接着剤層を回路形成面に設
けた接着剤付き積層板。4. The adhesive sheet according to claim 2 is placed on both sides of a prepreg impregnated with a thermosetting resin, and the temperature is 140 ° C. to 200 ° C.
30 to 12 at a temperature of ℃ and pressure of 20 to 100 kg / cm 2 .
A laminated board with an adhesive in which an adhesive layer obtained by integrally molding for 0 minutes is provided on a circuit forming surface.
面に、浸漬法又はカーテンコート法により形成した接着
剤付き積層板。5. A laminated board with an adhesive, wherein the adhesive according to claim 1 is formed on a circuit forming surface of an insulating substrate by a dipping method or a curtain coating method.
を、穴あけ、めっきレジスト形成、粗化、無電解めっき
を行うプリント配線板の製造方法。6. A method for producing a printed wiring board, which comprises punching, forming a plating resist, roughening, and electroless plating the laminate with an adhesive according to any one of claims 3, 4, and 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23195994A JP3536937B2 (en) | 1993-09-30 | 1994-09-28 | Additive method adhesive for printed wiring board and method for manufacturing wiring board using the adhesive |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5-243455 | 1993-09-30 | ||
JP24345593 | 1993-09-30 | ||
JP23195994A JP3536937B2 (en) | 1993-09-30 | 1994-09-28 | Additive method adhesive for printed wiring board and method for manufacturing wiring board using the adhesive |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07170066A true JPH07170066A (en) | 1995-07-04 |
JP3536937B2 JP3536937B2 (en) | 2004-06-14 |
Family
ID=26530204
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23195994A Expired - Fee Related JP3536937B2 (en) | 1993-09-30 | 1994-09-28 | Additive method adhesive for printed wiring board and method for manufacturing wiring board using the adhesive |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3536937B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011074210A (en) * | 2009-09-30 | 2011-04-14 | Panasonic Electric Works Co Ltd | Resin composition, prepreg, metal foil-clad laminate, and printed wiring board |
WO2013146647A1 (en) * | 2012-03-26 | 2013-10-03 | 日本ゼオン株式会社 | Curable resin composition, film, multilayer film, prepreg, laminate, cured product, and composite body |
-
1994
- 1994-09-28 JP JP23195994A patent/JP3536937B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011074210A (en) * | 2009-09-30 | 2011-04-14 | Panasonic Electric Works Co Ltd | Resin composition, prepreg, metal foil-clad laminate, and printed wiring board |
WO2013146647A1 (en) * | 2012-03-26 | 2013-10-03 | 日本ゼオン株式会社 | Curable resin composition, film, multilayer film, prepreg, laminate, cured product, and composite body |
JPWO2013146647A1 (en) * | 2012-03-26 | 2015-12-14 | 日本ゼオン株式会社 | Curable resin composition, film, laminated film, prepreg, laminate, cured product, and composite |
Also Published As
Publication number | Publication date |
---|---|
JP3536937B2 (en) | 2004-06-14 |
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