JPH07110403A - Composite optical component - Google Patents

Abstract

PURPOSE:To obtain strong adhesion of joined faces of glass and resin by successively joining a glass substrate, optical film and energy-setting resin layer in such a manner that interface of the optical film in contact with the energy- setting resin layer consists of AlF3, MgF2 or mixture of these. CONSTITUTION:The lens 1 consists of glass having 1.74 refractive index and <=5% SiO2 content. An optical film 2 is formed on one surface of the lens 1 where no resin layer 4 is to be formed. The optical film 2 is formed by electron beam heating vapor deposition of MgF2 and has a function as an antireflection film of the glass surface. The other surface of the lens where a resin layer 4 is to be formed is coated with an optical film 3. The optical film 3 is formed by electron beam heating vapor deposition of AlF3, on which a UV-curing urethane acrylate resin layer 4 having an aspherical surface is formed. Further, an optical film 5 is formed on the resin layer 4. The optical film 5 consists of SiO2 and cerium oxide (CeO2) formed by electron beam heating vapor deposition and has a function as an antireflection film.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite type optical component in which glass and resin are bonded together.

In recent years, in an optical device such as a camera, by using an aspherical lens having the same action as a compound lens composed of a plurality of lenses, the number of lenses of the optical device is reduced, the size and weight are reduced, and the cost is reduced. Is being promoted.
As an optical component having such an aspherical surface, for example, as disclosed in JP-A-59-12412, a composite optical component in which a resin layer is formed on the surface of glass is known.

By the way, in such a composite type optical component, a stress is generated due to the curing shrinkage of the resin and the difference in the coefficient of linear expansion between the glass and the resin, so that sufficient adhesive strength is required at the bonding surface between the glass and the resin. There is. Therefore, as a conventional method for ensuring the adhesive strength of the bonding surface, it is known to form a resin layer after treating the surface of glass with a silane coupling agent, as disclosed in JP-A-54-6006. Has been.

[0004]

Generally, silane coupling agents do not have a surface treatment effect on all inorganic substances, but have a surface treatment effect on silicon oxides such as SiO ₂ . . On the other hand, S in the glass
There are many cases where the content of iO ₂ is low. Therefore, in such a glass, there is a serious problem that sufficient bonding strength cannot be obtained at the bonding surface between the glass and the resin even if the surface treatment of the silane coupling agent is performed as in the prior art.

The present invention has been made in view of the above conventional problems, and provides a composite optical component having a sufficient adhesive strength on a bonding surface between a glass and a resin, even if the glass has a low SiO ₂ content. The purpose is to provide.

[0006]

In order to achieve the above object, the present inventors have developed various optical film materials on the surface of a glass substrate having a low SiO ₂ content for the purpose of increasing the adhesive strength of the bonding surface. Was formed into a film, and the surface treatment effect of the silane coupling agent was examined. As a result, among the optical film materials, A
_{lF 3, MgF 2, CeF 3} , the surface treatment effect of the silane coupling agent to the fluoride and mixtures containing these such as NdF ₃ was found high.

That is, in the composite type optical component of the present invention, the glass substrate, the optical film consisting of at least one layer, and the energy curable resin layer are bonded in this order, and contacted with the energy curable resin layer in the optical film. The surface is AlF ₃ ,
It is characterized by being MgF ₂ , CeF ₃ , NdF ₃ or a mixture containing them.

Here, each layer constituting the optical film can be formed by means such as vacuum deposition, ion plating, and sputtering. AlF ₃ , Mg used in the present invention
The optical film materials such as F ₂ , CeF ₃ and NdF ₃ may be used alone, or may be a mixture of these materials mixed with each other or a mixture of a small amount of other materials. The composite optical component of the present invention is made of Si
The same effect can be obtained regardless of the content of O ₂ , and the type of glass substrate is not particularly limited.

In the above structure, AlF ₃ , MgF ₂ , C is formed in the layer of the optical film formed on the surface of the glass substrate in contact with the resin.
Since eF ₃ , NdF ₃ or a mixture containing these is used, the surface treatment effect of the silane coupling agent is high, and the adhesive strength of the resin layer can be sufficiently obtained.

Further, AlF ₃ , MgF ₂ , CeF ₃ , formed on the surface of the glass substrate of the composite optical component of the present invention,
Since NdF ₃ or a mixture containing these, and each layer constituting the optical film have very good adhesion to glass, no problem occurs in the strength of the bonding surface.

[0011]

Example 1 FIG. 1 shows a cross section of a composite optical component of Example 1 of the present invention. The lens 1 is made of glass material LAH61.
It is made by (Ohara Co., Ltd.). The glass material has a refractive index of 1.74 and a SiO ₂ content of 5% or less. An optical film 2 is formed on the surface of the lens 1 on which the resin layer 4 is not formed. Hereinafter, a method for forming the optical film 2 will be described. First, the lens 1 is set in a vacuum deposition apparatus having a chamber diameter of 800 mm with the surface on which the resin layer 4 is not formed facing down, and then the inside of the vacuum deposition chamber is set to 3 × 1.
Evacuate to a vacuum of 0 ^-3 Pa or less. Substrate heating at 300 ° C
I went there. After that, MgF ₂ is vapor-deposited with an electron beam to an optical thickness of 130 nm by an electron beam vapor deposition method to form a first layer. This optical film 2 functions as an antireflection film on the glass surface. An optical film 3 is formed on the surface of the lens 1 on which the resin layer 4 is molded. Hereinafter, a method for forming the optical film 3 will be described. First, the lens 1 is set in a vacuum deposition apparatus with the surface on the side where the resin layer 4 is molded facing down, and then the inside of the vacuum deposition chamber is evacuated to a vacuum of 3 × 10 ⁻³ Pa or less. The substrate was heated at 300 ° C. afterwards,
AlF ₃ is vapor-deposited by electron beam heating to have an optical film thickness of 15 nm to form a first layer. Table 1 shows the configuration of the optical film 3 of this example.

[0012]

[Table 1]

A UV-curable urethane acrylate resin layer 4 having an aspherical shape is formed on the surface of the optical film 3 thus obtained. Hereinafter, a method for forming the resin layer 4 will be described. First, a silane coupling agent “KBM-503” (manufactured by Shin-Etsu Chemical Co., Ltd.) diluted with ethanol was spin-coated on the surface of the optical film 3, and then 110 ° C., 2
Surface treatment is performed by drying under the condition of 0 minutes. After that, a proper amount of liquid UV-curable urethane acrylate resin is applied to the central portion of the lens 1, and a mold formed in a desired shape such as an aspherical surface is gently applied so that air bubbles do not enter the resin. When pressed, the thickness of the resin layer 4 is 100μ at the center
Stop at m. Next, ultraviolet rays (mainly 365 nm) are irradiated from the lower part of the lens 1 by a high pressure mercury lamp,
After the resin is cured, the mold is released.

An optical film 5 is formed on the upper surface of the molded resin layer 4. Hereinafter, a method of forming the optical film 5 will be described in the same manner. First, the lens 1 is set in a vacuum vapor deposition apparatus with the surface of the molded resin layer 4 facing down, and then the inside of the vacuum vapor deposition chamber is evacuated to a vacuum of 1 × 10 ⁻³ Pa or less. The substrate was not heated. After that, SiO ₂ is vapor-deposited to an optical film thickness of 60 nm by an electron heating vapor deposition method to form a first layer. Next, cerium oxide (CeO ₂ ) is vapor-deposited by an electron beam heating vapor deposition method so as to have an optical film thickness of 35 nm to form a second layer. Subsequently, SiO ₂ is vapor-deposited to an optical thickness of 185 nm by an electron beam heating vapor deposition method to form a third layer. The optical film 5 functions as an antireflection film on the surface of the resin layer. The composite optical component of this embodiment is manufactured through the above steps.

[0015]

Example 2 In this example, the same conditions as in Example 1 were used except for the optical film 3. Hereinafter, a method for forming the optical film 3 will be described. First, after exhausting and heating the substrate under the same conditions as in Example 1, MgF ₂ was deposited by an electron beam heating vapor deposition method.
The first layer is formed by vapor deposition to an optical thickness of 10 nm.
Table 2 shows the configuration of the optical film 3 of this example.

[0016]

[Table 2]

[0017]

[Embodiment 3] Also in this embodiment, the same conditions as in Embodiment 1 are used except for the optical film 3. Hereinafter, a method for forming the optical film 3 will be described. First, after exhausting and heating the substrate under the same conditions as in Example 1, NdF ₃ is vapor-deposited by electron beam heating to an optical film thickness of 20 nm to form a first layer. Table 3 shows the configuration of the optical film 3 of this example.

[0018]

[Table 3]

[0019]

Example 4 In this example, the same conditions as in Example 1 were carried out except for the optical film 3. Hereinafter, a method for forming the optical film 3 will be described. First, after exhausting and heating the substrate under the same conditions as in Example 1, a mixture in which NdF ₃ and AlF ₃ were mixed at a weight ratio of 8: 2 was prepared by an electron beam heating vapor deposition method.
The first layer is formed by vapor deposition with an optical film thickness of 30 nm.
Table 4 shows the configuration of the optical film 3 of this example.

[0020]

[Table 4]

[0021]

Fifth Embodiment In this embodiment, the same conditions as in the first embodiment are performed except for the lens 1 and the optical film 3. The lens 1 of this embodiment is
It is made of glass material LAL60 (manufactured by OHARA CORPORATION). The refractive index of this glass material is 1.83, and the content of SiO ₂ is 5% or less. Next, a method for forming the optical film 3 will be described. First, after exhausting and heating the substrate under the same conditions as in Example 1, CeF ₃ is vapor-deposited to an optical thickness of 130 nm by an electron beam heating vapor deposition method to form a first layer.
Table 5 shows the configuration of the optical film 3 of this example.

[0022]

[Table 5]

Since the glass used in this example has a higher refractive index than resin, reflection at the interface between glass and resin cannot be ignored in the conventional structure, but in this example, the optical film 3 is made of glass. Since it also functions as an antireflection film on the interface of the resin, problems in optical performance such as flare and reduction in transmittance hardly occur.

[0024]

Example 6 In this example, the same conditions as in Example 5 were used except for the optical films 3 and 5. Hereinafter, a method for forming the optical film 3 will be described. After exhausting and heating the substrate in the same manner as in Example 5, CeF ₃ was deposited by an electron beam heating vapor deposition method.
The first layer is formed by vapor deposition to an optical thickness of 150 nm. Subsequently AlF ₃ by electron beam evaporation method, to form a second layer and to 15nm deposited an optical film thickness. Table 6 shows the configuration of the optical film 3 of this example.

[0025]

[Table 6]

Next, a method of forming the optical film 5 will be described. First, after setting and evacuating the substrate in the same manner as the optical film 5 of Example 1, SiO ₂ is vapor-deposited to an optical film thickness of 25 nm by an electron beam heating vapor deposition method to form a first layer. next,
Tungsten oxide (WO ₃ ) is vapor-deposited by electron beam heating to an optical thickness of 30 nm to form a second layer. Then, SiO ₂ is vapor-deposited to have an optical film thickness of 47 nm by an electron beam heating vapor deposition method to form a third layer. Further, WO ₃ is vapor-deposited to an optical thickness of 250 nm by an electron beam heating vapor deposition method to form a fourth layer. Finally, Si
O ₂ was made into an optical film thickness of 12 by electron beam heating vapor deposition.
A second layer is formed by vapor deposition of 2 nm. Also in this embodiment, since the optical film 3 also functions as an antireflection film at the interface between the glass and the resin as in the case of the fifth embodiment, problems in optical performance such as flare and reduction in transmittance are unlikely to occur.

[0027]

Example 7 This example was carried out under the same conditions as in Example 5 except for the optical film 3. Hereinafter, a method for forming the optical film 3 will be described. First, after exhausting and heating the substrate in the same manner as in Example 5, MgF ₂ is vapor-deposited to an optical film thickness of 10 nm by the electron beam heating vapor deposition method to form the first layer. Then Ce
F ₃ was made to have an optical film thickness of 10 by electron beam heating vapor deposition.
A second layer is formed by vapor deposition of 5 nm. Table 7 shows the configuration of the optical film of this example.

[0028]

[Table 7]

Also in this embodiment, the optical film 3 functions as an antireflection film on the interface between the glass and the resin as in the case of the fifth embodiment, so that problems in optical performance such as flare and reduction in transmittance are unlikely to occur.

[0030]

[Embodiment 8] In this embodiment, the same conditions as in Embodiment 5 are used except for the optical film 3. Hereinafter, a method for forming the optical film 3 will be described. First, after exhausting and heating the substrate in the same manner as in Example 5, MgF ₂ is vapor-deposited to an optical film thickness of 45 nm by an electron beam heating vapor deposition method to form a first layer. Then, zirconium oxide (ZrO ₂ ) and tantalum oxide (Ta
_A mixture in which ₂ O ₅ ) is mixed in a weight ratio of 9: 1 is vapor-deposited by an electron beam heating vapor deposition method to have an optical thickness of 40 nm to form a second layer. Further, AlF ₃ is vapor-deposited to an optical thickness of 40 nm by an electron beam heating vapor deposition method to form a third layer. Table 8 shows the constitution of the optical film of this example.

[0031]

[Table 8]

In this embodiment as well, since the optical film 3 also functions as an antireflection film at the interface between glass and resin as in the case of the fifth embodiment, problems in optical performance such as flare and reduction in transmittance are unlikely to occur.

[0033]

[Comparative Example 1] In Comparative Example 1, the glass material LAH6 is used for the lens 1.
No. 0, the resin layer 3 was formed under the same conditions as in Example 1 without forming the optical film 3 on the surface of the lens 1 on which the resin was to be molded to obtain a composite optical component. Table 9 shows the configuration of this comparative example.

[0034]

[Table 9]

[0035]

[Evaluation Example] The composite optical components of Examples 1 to 8 and Comparative Example 1 were evaluated for thermal shock resistance by the following method. (Thermal shock resistance) The results of evaluating the thermal shock resistance of the composite optical components of Examples 1 to 8 and Comparative Example 1 in a cycle in which the temperature was alternately left for 30 minutes in an environment of −50 ° C. and 90 ° C. It is as shown in Table 10. As can be seen from the results in Table 10, the composite type optical component of the present invention has very high durability and no peeling of resin or film occurs.

[0036]

[Table 10]

Next, FIGS. 2 to 6 show the reflection characteristics at the interface between the glass and the resin layer in the composite optical components of Examples 5 to 8 and Comparative Example 1. As can be seen from the figure, in the composite optical components of Examples 5 to 8, the reflection at the interface between the glass and the resin layer is effectively prevented in the visible range (400 to 700 nm) as compared with the comparative example.

[0038]

As described above, the composite optical component of the present invention
According to this, the energy curable resin is applied to the surface of the glass substrate.
At least the contact layer is AlF₃, MgF₂, CeF₃，
NdF ₃Or one or more layers consisting of a mixture containing them
Since the optical film of₂Is low in content
Even if the glass is a good one, the contact surface between the glass and the resin should have sufficient contact.
It can have a wear strength.

[Brief description of drawings]

FIG. 1 is a sectional view of a composite optical component of the present invention.

2 is a reflection characteristic diagram of Example 5. FIG.

3 is a reflection characteristic diagram of Example 6. FIG.

FIG. 4 is a reflection characteristic diagram of Example 7.

5 is a reflection characteristic diagram of Example 8. FIG.

6 is a reflection characteristic diagram of Comparative Example 1. FIG.

[Explanation of symbols]

 1 lens 2,3 optical film 4 resin layer 5 optical film

Claims (1)

[Claims] 1. A glass substrate, an optical film having at least one layer, and an energy curable resin layer are sequentially bonded, and a surface of the optical film in contact with the energy curable resin layer is aluminum fluoride or fluorinated. A composite optical component characterized by being magnesium, cerium fluoride, neodymium fluoride or a mixture containing these.