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JPH07107946B2 - Optical semiconductor device - Google Patents

Optical semiconductor device

Info

Publication number
JPH07107946B2
JPH07107946B2 JP61025857A JP2585786A JPH07107946B2 JP H07107946 B2 JPH07107946 B2 JP H07107946B2 JP 61025857 A JP61025857 A JP 61025857A JP 2585786 A JP2585786 A JP 2585786A JP H07107946 B2 JPH07107946 B2 JP H07107946B2
Authority
JP
Japan
Prior art keywords
optical semiconductor
semiconductor device
inp
light emitting
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61025857A
Other languages
Japanese (ja)
Other versions
JPS62185387A (en
Inventor
博行 中野
慎也 佐々木
捷樹 田中
克之 井本
稔 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61025857A priority Critical patent/JPH07107946B2/en
Publication of JPS62185387A publication Critical patent/JPS62185387A/en
Publication of JPH07107946B2 publication Critical patent/JPH07107946B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

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  • Die Bonding (AREA)
  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、精密な位置精度でマウントが可能な光半導体
素子に関する。
TECHNICAL FIELD The present invention relates to an optical semiconductor device that can be mounted with precise positional accuracy.

〔発明の背景〕[Background of the Invention]

従来の半導体レーザやホトダイオードなどの光半導体素
子は、例えば光通信光素子工学(米津宏雄著,工学図
書)のp.240やp.416に記載のような構造となつており、
素子の側面はスクライブして作られるための素子の外形
寸法には大きなばらつきがある。したがつて、素子の発
光部または受光部の位置をマウントに対して精度良く位
置決めすることが不可能であつた。
Conventional optical semiconductor devices such as semiconductor lasers and photodiodes have structures such as those described in p.240 and p.416 of optical communication optical device engineering (Hiroo Yonezu, Engineering Book),
Since the side surface of the element is made by scribing, there are large variations in the external dimensions of the element. Therefore, it is impossible to accurately position the light emitting portion or the light receiving portion of the device with respect to the mount.

〔発明の目的〕[Object of the Invention]

本発明の目的は、位置精度良くマウントに固着可能な発
光部を有する光半導体素子を提供することにある。
An object of the present invention is to provide an optical semiconductor element having a light emitting portion that can be fixed to a mount with high positional accuracy.

〔発明の概要〕[Outline of Invention]

光通信に用いる半導体レーザは光フアイバと効率良く結
合させるために、発光部を精度良く位置決めする必要が
ある。この際、チツプの外壁を利用して機械精度でチツ
プをマウントすることが望ましい。このため、発光部か
らの外壁の位置を精度良く決定できるホトリソグラフイ
ー技術などを利用することに着目した。
In the semiconductor laser used for optical communication, it is necessary to position the light emitting portion with high precision in order to efficiently couple with the optical fiber. At this time, it is desirable to mount the chip with mechanical accuracy using the outer wall of the chip. For this reason, we focused on using photolithography technology that can accurately determine the position of the outer wall from the light emitting unit.

〔発明の実施例〕Example of Invention

以下、本発明の実施例を第1図により説明する。 An embodiment of the present invention will be described below with reference to FIG.

この図は従来の埋め込みヘテロ形半導体レーザの上部の
活性層の両側にV溝を形成したものである。図におい
て、1はp側電極、2はp+一拡散領域、3はInGaAsPキ
ヤツプ層、4はp−InPクラツド層、5はInGaAsP活性
層、6はn−InPクラツド層、7はn−InP基板、8はn
側電極、9はn−InPブロツク層、10はp−InPブロツク
層である。本実施例ではV溝を利用して位置決めをす
る。すなわち、2本の逆V型のストライブ状突起を有し
たマウントに第1図の素子をはめ込む形となる。このた
め、活性層5近傍の台形リツジ形状部にかかる外力が低
減されるばかりでなく、V溝で位置決めするため、極め
て精密な位置精度が実現できる。
In this figure, a V groove is formed on both sides of the active layer above the conventional buried hetero semiconductor laser. In the figure, 1 is a p-side electrode, 2 is a p + diffusion region, 3 is an InGaAsP cap layer, 4 is a p-InP cladding layer, 5 is an InGaAsP active layer, 6 is an n-InP cladding layer, and 7 is n-InP. Substrate, 8 is n
A side electrode, 9 is an n-InP block layer, and 10 is a p-InP block layer. In this embodiment, the V-groove is used for positioning. That is, the element shown in FIG. 1 is fitted into a mount having two inverted V-shaped stripe-shaped protrusions. Therefore, not only the external force applied to the trapezoidal ridge shape portion near the active layer 5 is reduced, but also the V groove is used for positioning, so that extremely precise position accuracy can be realized.

〔発明の効果〕〔The invention's effect〕

本発明によれば、発光部を有する光半導体素子を位置精
度良くマウントに固着することができる効果がある。
According to the present invention, there is an effect that the optical semiconductor element having the light emitting portion can be fixed to the mount with high positional accuracy.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例を示す図である。 1……p側電極、2……p+−拡散領域、3……InGaAsP
キヤツプ層、4……p−InPクラツド層、5……InGaAsP
活性層、6……n−InPクラツド層、7……n−InP基
板、8……n側電極、9……n−InPブロツク層、10…
…p−InPブロツク層。
FIG. 1 is a diagram showing an embodiment of the present invention. 1 ... p-side electrode, 2 ... p + -diffusion region, 3 ... InGaAsP
Cap layer, 4 ... p-InP cladding layer, 5 ... InGaAsP
Active layer, 6 ... n-InP cladding layer, 7 ... n-InP substrate, 8 ... n side electrode, 9 ... n-InP block layer, 10 ...
... p-InP block layer.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 井本 克之 東京都国分寺市東恋ヶ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 前田 稔 東京都国分寺市東恋ヶ窪1丁目280番地 株式会社日立製作所中央研究所内 (56)参考文献 特開 昭54−14181(JP,A) 特開 昭50−79286(JP,A) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Katsuyuki Imoto 1-280 Higashi Koigakubo, Kokubunji, Tokyo Inside Central Research Laboratory, Hitachi, Ltd. (72) Minoru Maeda 1-280 Higashi Koigakubo, Kokubunji, Tokyo Hitachi Ltd. Central Research Laboratory (56) References JP-A-54-14181 (JP, A) JP-A-50-79286 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】発光部を有する光半導体素子において、上
記光半導体素子の発光部の両側に、それぞれ位置決めの
ためのV溝を形成したことを特徴とする光半導体素子。
1. An optical semiconductor element having a light emitting portion, wherein V grooves for positioning are formed on both sides of the light emitting portion of the optical semiconductor element.
JP61025857A 1986-02-10 1986-02-10 Optical semiconductor device Expired - Lifetime JPH07107946B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61025857A JPH07107946B2 (en) 1986-02-10 1986-02-10 Optical semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61025857A JPH07107946B2 (en) 1986-02-10 1986-02-10 Optical semiconductor device

Publications (2)

Publication Number Publication Date
JPS62185387A JPS62185387A (en) 1987-08-13
JPH07107946B2 true JPH07107946B2 (en) 1995-11-15

Family

ID=12177489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61025857A Expired - Lifetime JPH07107946B2 (en) 1986-02-10 1986-02-10 Optical semiconductor device

Country Status (1)

Country Link
JP (1) JPH07107946B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5303793B2 (en) * 2010-03-10 2013-10-02 Nttエレクトロニクス株式会社 Photodiode

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5414181A (en) * 1977-07-04 1979-02-02 Fujitsu Ltd Semiconductor laser unit

Also Published As

Publication number Publication date
JPS62185387A (en) 1987-08-13

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