JPH0641664B2 - Chemical processing equipment - Google Patents
Chemical processing equipmentInfo
- Publication number
- JPH0641664B2 JPH0641664B2 JP61057654A JP5765486A JPH0641664B2 JP H0641664 B2 JPH0641664 B2 JP H0641664B2 JP 61057654 A JP61057654 A JP 61057654A JP 5765486 A JP5765486 A JP 5765486A JP H0641664 B2 JPH0641664 B2 JP H0641664B2
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- concentration
- liquid
- treatment
- chemical liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06B—TREATING TEXTILE MATERIALS USING LIQUIDS, GASES OR VAPOURS
- D06B23/00—Component parts, details, or accessories of apparatus or machines, specially adapted for the treating of textile materials, not restricted to a particular kind of apparatus, provided for in groups D06B1/00 - D06B21/00
- D06B23/24—Means for regulating the amount of treating material picked up by the textile material during its treatment
- D06B23/28—Means for regulating the amount of treating material picked up by the textile material during its treatment in response to a test conducted on the treating material
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Treatment Of Fiber Materials (AREA)
- Accessories For Mixers (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は,複数の薬液からなる処理液を収容した処理槽
内に,プラスチックフィルム,布帛等の被処理物を浸漬
させて薬液処理する装置に関し,特に,各薬液の供給量
を自動制御し得る薬液処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention is an apparatus for treating a chemical liquid by immersing an object to be treated such as a plastic film or a cloth in a treatment tank containing a treatment liquid composed of a plurality of chemical liquids. In particular, the present invention relates to a chemical liquid processing device capable of automatically controlling the supply amount of each chemical liquid.
(従来の技術) 例えば,プラスチックフィルム,布帛,繊維等の仕上げ
加工として,糊抜,漂白等の薬液処理が行われる。この
ような薬液処理は,糊抜剤,漂白剤等の薬液が収容され
た処理槽内に布帛等の帯状の被処理物を連続的に浸漬さ
せることにより行われる。被処理物中の余剰の薬液は,
圧搾ローラにて除去される。薬液処理物の品質を一定に
保つためには,処理槽内の薬液濃度を常時一定に保つ必
要がある。処理液濃度が変化すると,連続的に処理され
る被処理物は均一に処理されえず,品質に変動をきた
す。(Prior Art) For example, a chemical treatment such as desizing or bleaching is performed as a finishing process for a plastic film, a cloth, a fiber, or the like. Such a chemical treatment is performed by continuously immersing a strip-shaped object to be treated such as cloth in a treatment tank containing a chemical such as a desizing agent and a bleaching agent. The surplus chemical liquid in the processed material is
It is removed by the pressing roller. In order to keep the quality of the chemical treatment product constant, it is necessary to keep the chemical concentration in the treatment tank constant at all times. When the concentration of the treatment liquid changes, the continuously processed object cannot be uniformly processed, resulting in a change in quality.
従来,処理液は,複数の薬液を,一旦予備タンク内へ投
入して所定濃度に調整されていた。このような調整方法
では, 処理液濃度を調整するために大型の予備タンクを必要
とする; 処理槽内にて被処理物を薬液処理するに際し,処理液
の濃度が変化した場合に,被処理物の処理を中断させる
ことなく処理液を所定の濃度に調整することは容易では
ない; 処理条件が変更されて薬液の種類,処方(組成比率)
が変更される場合には,予備タンク内にて新たに処理液
を調整する必要がある; 複数の薬液を混合しなければならないので,混合時に
主剤が分解・沈澱等を起こすような場合には,安定した
濃度が得られない, 等の問題があった。Conventionally, a plurality of chemicals have been once charged into the spare tank as the treatment liquid and adjusted to a predetermined concentration. Such an adjustment method requires a large reserve tank to adjust the concentration of the treatment liquid; when the treatment liquid is treated with the chemical liquid in the treatment tank and the concentration of the treatment liquid changes, the treatment target It is not easy to adjust the treatment liquid to a predetermined concentration without interrupting the treatment of the substance; the treatment conditions are changed and the type and prescription (composition ratio) of the chemical liquid
In case of change, it is necessary to newly adjust the processing liquid in the spare tank; multiple chemical liquids must be mixed, so if the main agent decomposes or precipitates during mixing, However, there was a problem that a stable concentration could not be obtained.
近時,センサーやコンピュータの発達に伴って,導電率
計,比重計,定電流分極電位差計等を利用して,処理槽
内の薬液濃度を検出し,予め設定された薬液濃度との偏
差を解消するために必要な薬液を,直接処理槽へ供給す
るという方法が開発されている。この方法によれば,大
型の予備タンクは不要になり,薬液処理中の濃度変化に
対しても濃度調整が可能となる。また,処理条件の変更
に伴い薬液の種類が変更される場合には処理槽内へ送給
する薬液を変更すればよいが,各薬液の組成比率を変更
する場合には容易に対処できない。さらに,薬液の混合
時に主剤が分解・沈澱する場合には,処理液濃度の安定
した調整が困難である。Recently, with the development of sensors and computers, conductivity meter, pycnometer, constant current polarization potentiometer, etc. are used to detect the chemical concentration in the treatment tank, and the deviation from the preset chemical concentration is detected. A method has been developed in which the chemical solution required to solve the problem is directly supplied to the processing tank. According to this method, a large spare tank is unnecessary, and the concentration can be adjusted even if the concentration changes during the chemical treatment. Further, when the type of chemical liquid is changed due to the change of the processing condition, the chemical liquid to be fed into the processing tank may be changed, but it is not easy to deal with it when the composition ratio of each chemical liquid is changed. Furthermore, if the main agent decomposes / precipitates when the chemicals are mixed, it is difficult to stably adjust the concentration of the treatment liquid.
(発明が解決しようとする問題点) 本発明は,上記従来の問題を解決するものであり,その
目的は,被処理物を薬液処理するに際し,処理槽内の処
理液を所望の濃度に安定的に調整できる薬液処理装置を
提供することにある。本発明の他の目的は,薬液の組成
比率を変更する場合にも容易に処理液の濃度を調整でき
る薬液処理装置を提供することにある。(Problems to be Solved by the Invention) The present invention is to solve the above-mentioned conventional problems, and an object thereof is to stabilize the treatment liquid in a treatment tank at a desired concentration when treating an object with a chemical solution. The purpose of the present invention is to provide a chemical treatment device that can be adjusted in a mechanical manner. Another object of the present invention is to provide a chemical liquid processing apparatus that can easily adjust the concentration of the processing liquid even when the composition ratio of the chemical liquid is changed.
(問題点を解決するための手段) 本発明は,複数の薬液からなる処理液を収容した処理槽
内に,被処理物を連続的に浸漬させて薬液処理する装置
において,各薬液を循環路を介して該処理槽に供給する
薬液供給ポンプと,処理液中の所定の薬液の濃度検出器
と,その薬液の処理液中の濃度を設定する濃度設定器
と,処理液中の各薬液の組成比率を設定する薬液比率設
定器と,前記濃度検出器による薬液濃度と前記濃度設定
器による設定濃度との偏差を解消するために必要なその
薬液の供給量を演算すると共に,該供給量に基づき,前
記薬液比率設定器の設定組成比率に対応させて他の薬液
の供給量を演算し,前記各薬液供給ポンプをその演算供
給量となるように制御する演算制御器と,を具備してな
り,そのことにより上記目的が達成される。(Means for Solving Problems) In the present invention, in a device for treating a chemical solution by continuously immersing an object to be treated in a treatment tank containing a treatment solution composed of a plurality of chemical solutions, each chemical solution is circulated. A chemical solution supply pump for supplying the chemical solution to the treatment tank via a liquid, a concentration detector for a predetermined chemical solution in the treatment solution, a concentration setter for setting the concentration of the chemical solution in the treatment solution, and A chemical liquid ratio setter that sets the composition ratio, and calculates the supply amount of the chemical liquid necessary to eliminate the deviation between the chemical liquid concentration by the concentration detector and the set concentration by the concentration setter. Based on the set composition ratio of the chemical liquid ratio setting device, the other chemical liquid supply amount is calculated, and the arithmetic controller for controlling each chemical liquid supply pump to the calculated supply amount. The above purpose is achieved by that. .
(実施例) 以下に本発明の実施例について説明する。(Examples) Examples of the present invention will be described below.
本発明の薬液処理装置は,第1図に示すように,処理槽
11と,薬液タンク21,22,23と,これら各タンク内に収
容された薬液を処理槽11へ送給する薬液ポンプ31,32,
33とを有する。As shown in FIG. 1, the chemical liquid processing apparatus of the present invention has a processing tank.
11, chemical liquid tanks 21, 22, 23, and chemical liquid pumps 31, 32 for feeding the chemical liquids stored in these tanks to the processing tank 11,
With 33.
処理槽11には,各薬液タンク21,22,23内の薬液にて構
成される処理液が収容される。該処理液は,例えば布帛
を糊抜精錬処理するべく用いられる。この処理槽11は,
薬液タンク21,22および23と循環路12を介して接続され
ている。該循環路12には処理液を循環させるための循環
ポンプ51が配設されている。循環路12には,さらに,上
記薬液タンク内の薬液がこの循環路12内で順次均一に混
ざるように,ミキサー41および42が配設されている。循
環路12には,また,処理槽11からの固形分を濾別するた
めのフィルター52が,例えば処理槽11と循環ポンプ51と
の間に介装されている。循環路12には,また,処理液中
の所定の薬液(例えば,本実施例では水酸化ナトリウ
ム)の濃度を連続的に検出する濃度検出器60が配設され
ている。The processing bath 11 contains a processing liquid composed of the chemicals in the chemical liquid tanks 21, 22, and 23. The treatment liquid is used, for example, for desizing and refining a cloth. This processing tank 11 is
It is connected to the chemical liquid tanks 21, 22 and 23 via the circulation path 12. A circulation pump 51 for circulating the processing liquid is arranged in the circulation path 12. The circulation path 12 is further provided with mixers 41 and 42 so that the chemicals in the chemical solution tank are sequentially and uniformly mixed in the circulation path 12. In the circulation path 12, a filter 52 for filtering the solid content from the processing tank 11 is installed, for example, between the processing tank 11 and the circulation pump 51. The circulation path 12 is also provided with a concentration detector 60 for continuously detecting the concentration of a predetermined chemical liquid (for example, sodium hydroxide in this embodiment) in the treatment liquid.
薬液タンク21,22,23には,糊板精錬に必要な薬液が収
容され,例えば薬液タンク21には水酸化ナトリウム21
が,薬液タンク22および23には助剤AおよびBがそれぞ
れ収容される。助剤Aとしては,例えば,非イオン性の
ノニオン性化合物(例えばポリオキシエチレンアルキル
フェニルエーテル)が用いられ,助剤Bとしては,例え
ば柔軟剤としての非イオン性オルガノシリコン化合物が
用いられる。The chemical liquid tanks 21, 22, and 23 contain the chemical liquids necessary for smelt refining. For example, the chemical liquid tanks 21 have sodium hydroxide 21
However, auxiliaries A and B are stored in the chemical liquid tanks 22 and 23, respectively. As the auxiliary A, for example, a nonionic nonionic compound (for example, polyoxyethylene alkylphenyl ether) is used, and as the auxiliary B, for example, a nonionic organosilicon compound as a softening agent is used.
循環路12は,余剰の処理液を系外へ排出するためのタン
ク54が設けられている。このタンク54への処理液の排出
は流量制御弁53を介して行われる。また,処理槽11に
は,流量制御弁56を介して水が供給される構成となって
おり,供給される水量により処理槽11内の処理液濃度が
調整される。The circulation path 12 is provided with a tank 54 for discharging excess processing liquid to the outside of the system. The discharge of the processing liquid to the tank 54 is performed via the flow rate control valve 53. Water is supplied to the treatment tank 11 via the flow control valve 56, and the concentration of the treatment liquid in the treatment tank 11 is adjusted by the amount of water supplied.
処理槽11内の処理濃度は,演算制御装置70により連続的
に制御される。該演算制御装置70には処理槽11から循環
路12を通って循環される処理液の水酸化ナトリウム濃度
を検出する濃度検出器60の出力が入力されている。ま
た,この該演算制御装置70には,処理液の水酸化ナトリ
ウム濃度を,所望の値に設定するための濃度設定器72の
出力が与えられている。さらに,この演算制御器70には
水酸化ナトリウムと残りの各助剤AおよびBの処理液に
おける組成比率を設定する薬液比率設定器72の出力も与
えられている。The processing concentration in the processing tank 11 is continuously controlled by the arithmetic and control unit 70. The output of a concentration detector 60 for detecting the sodium hydroxide concentration of the treatment liquid circulated from the treatment tank 11 through the circulation path 12 is input to the arithmetic and control unit 70. The arithmetic and control unit 70 is also provided with the output of a concentration setting device 72 for setting the sodium hydroxide concentration of the treatment liquid to a desired value. Further, the arithmetic controller 70 is also supplied with the output of a chemical liquid ratio setting device 72 for setting the composition ratio of the treatment liquid of sodium hydroxide and the remaining auxiliary agents A and B.
一方,演算制御器70の出力は薬液タンク21,22,23内の
各薬液をそれぞれ循環路12から処理槽11内に供給する薬
液ポンプ31,32,33に与えられている。それゆえ,演算
制御器70は各薬液ポンプ31,32,33の供給量を制御しう
る。また,演算制御器70の出力は,処理液を循環させる
循環ポンプ51,処理槽11へ供給される水量を調整する流
量制御弁56,および処理槽11内の処理液のタンク54に排
出される量を制御する流量制御弁53にそれぞれ与えられ
ている。それゆえ,演算制御器70は,循環ポンプ51によ
る処理液の循環流量,各流量制御弁56および53の流量を
それぞれ制御しうる。On the other hand, the output of the arithmetic and control unit 70 is given to chemical liquid pumps 31, 32, and 33 that supply the chemical liquids in the chemical liquid tanks 21, 22, and 23 from the circulation path 12 into the processing tank 11. Therefore, the arithmetic controller 70 can control the supply amount of each chemical liquid pump 31, 32, 33. The output of the arithmetic and control unit 70 is discharged to the circulation pump 51 for circulating the treatment liquid, the flow control valve 56 for adjusting the amount of water supplied to the treatment tank 11, and the treatment liquid tank 54 in the treatment tank 11. Each is provided to a flow control valve 53 that controls the amount. Therefore, the arithmetic and control unit 70 can control the circulation flow rate of the processing liquid by the circulation pump 51 and the flow rates of the flow rate control valves 56 and 53, respectively.
このような構成の薬液処理装置では,演算制御器70は,
まず,各薬液ポンプ31,32,33および水量調整のための
流量制御弁56を制御して,水酸化ナトリウム,助剤A,
Bおよび水をそれぞれ所定量だけ処理槽11内に供給し,
所定の濃度の処理液を調整する。次いで,該処理液に,
例えば布帛を連続的に浸漬させ,該布帛を糊板精錬処理
する。そして,この糊板精錬処理の間に,処理液濃度が
変動すると,演算制御器70は濃度調整のための制御を行
う。In the chemical liquid processing device having such a configuration, the arithmetic controller 70 is
First, by controlling the chemical liquid pumps 31, 32, 33 and the flow rate control valve 56 for adjusting the amount of water, sodium hydroxide, auxiliary agent A,
B and water are supplied to the treatment tank 11 in predetermined amounts,
A treatment solution having a predetermined concentration is prepared. Then, in the treatment liquid,
For example, the cloth is continuously dipped, and the cloth is subjected to a glue plate refining treatment. Then, if the treatment liquid concentration fluctuates during the glue plate refining process, the arithmetic controller 70 performs control for concentration adjustment.
演算制御器70による制御は次のように行われる。演算制
御器70には,濃度設定器71にて処理液中の水酸化ナトリ
ウム濃度が予め設定されており,また薬液比率設定器72
にて水酸化ナトリウムおよび各助剤A,Bの組成比率が
設定されている。この組成比率は,例えば水酸化ナトリ
ウム 100に対し,各助剤AおよびBは,それぞれ10,10
と設定される。The control by the arithmetic and control unit 70 is performed as follows. In the arithmetic controller 70, the sodium hydroxide concentration in the treatment liquid is preset by the concentration setting device 71, and the chemical liquid ratio setting device 72
In, the composition ratio of sodium hydroxide and each of the auxiliary agents A and B is set. This composition ratio is, for example, 100% of sodium hydroxide, 10 and 10 of the respective auxiliaries A and B, respectively.
Is set.
演算制御器70は,まず循環路12を通流する処理液中の水
酸化ナトリウム濃度を,濃度検出器60により連続的に検
出し,その検出濃度と,濃度設定器71にて設定された水
酸化ナトリウム濃度とを比較して検出濃度の設定濃度に
対する偏差を求める。次いで,演算制御器70はその偏差
を解消するために必要な水酸化ナトリウム量を演算し,
その演算量が供給量となるように薬液ポンプ31を制御す
る。さらに,演算制御器70は,演算された水酸化ナトリ
ウムの供給量に基づいて,薬液比率設定器72にて設定さ
れた各薬液の組成比率に対応させて,各助剤AおよびB
の供給量を演算する。つまり,各助剤AおよびBの組成
比率が水酸化ナトリウム100 に対してそれぞれ10および
10であるので,演算された水酸化ナトリウムの供給量に
対して,各助剤AおよびBの供給量は,それぞれその 1
/10および 1/10とされる。演算制御器70は,各助剤Aお
よびBの供給量がその演算量となるように薬液ポンプ32
および33を連続的に制御する。The arithmetic and control unit 70 first continuously detects the sodium hydroxide concentration in the treatment liquid flowing through the circulation path 12 by the concentration detector 60, and detects the detected concentration and the water set by the concentration setting unit 71. The deviation of the detected concentration from the set concentration is calculated by comparing with the sodium oxide concentration. Next, the arithmetic controller 70 calculates the amount of sodium hydroxide required to eliminate the deviation,
The chemical liquid pump 31 is controlled so that the calculated amount becomes the supply amount. Further, the arithmetic and control unit 70 makes the auxiliary agents A and B correspond to the composition ratios of the respective chemical liquids set by the chemical liquid ratio setting unit 72 based on the calculated supply amount of sodium hydroxide.
Calculate the supply amount of. In other words, the composition ratio of each of the auxiliaries A and B is 10 and 100 for sodium hydroxide, respectively.
Since the calculated supply amount of sodium hydroxide is 10, the supply amount of each auxiliary A and B is 1
/ 10 and 1/10. The arithmetic and control unit 70 controls the chemical liquid pump 32 so that the supply amount of each of the auxiliary agents A and B becomes the calculated amount.
And 33 continuously controlled.
薬液ポンプ31から送給される水酸化ナトリウムは,循環
路12内へ送給され,処理液とミキサー41にて混合され
る。そして,水酸化ナトリウムが混入された処理液は,
薬液ポンプ32および33から送給される各助剤AおよびB
とミキサー42にて混合されて処理槽11内に投入される。The sodium hydroxide fed from the chemical pump 31 is fed into the circulation path 12 and mixed with the treatment liquid in the mixer 41. Then, the treatment liquid mixed with sodium hydroxide is
Auxiliary agents A and B delivered from the chemical pumps 32 and 33
And mixed by a mixer 42 and charged into the processing tank 11.
水酸化ナトリウム,各薬剤AおよびBの処方(組成比
率)が変更された場合には,薬液比率設定器72にてその
組成比率が新たに設定され,各薬液ポンプ31〜33の処理
量はその設定比率に対応して変更されて,処理液は速や
かに所定の組成比率とされる。When the prescription (composition ratio) of sodium hydroxide and each drug A and B is changed, the composition ratio is newly set by the drug solution ratio setting device 72, and the processing amount of each drug pump 31-33 is the same. The treatment liquid is changed according to the set ratio, and the processing liquid is promptly made to have a predetermined composition ratio.
第2図は,本発明の他の実施例の模式図である。本実施
例は,布帛を過酸化水素漂白処理する装置に関する。薬
液タンク24には,例えば過酸化水素(H2O2)が収容さ
れ,薬液タンク25および26には,それぞれ助剤Eおよび
Fが収容されている。薬液タンク27には,水酸化ナトリ
ウムが収容されており薬液タンク28にはケイ酸ナトリウ
ム(Na2SiO3)が収容され,さらに薬液タンク29には助
剤Gが収容されている。助剤Eとしては,例えば非イオ
ン性のノニオン化合物が用いられ,助剤Fとしては,例
えば柔軟剤としての非イオン性のオルガノシリコン化合
物が用いられる。さらに助剤Gとしては,例えば撥水剤
としての非イオン性の有機フッ素化合物が用いられる。
各薬液タンク24〜29内の薬液は,それぞれ,各薬液ポン
プ34〜39にて循環路12から処理槽11へ送給される。上記
各薬液タンク内の薬液が循環路12を通って処理槽11へ供
給されるに際し,各薬液が循環路にて順次均一に混ざる
ように,循環路12にミキサーが適宜配置されている。例
えば,薬液ポンプ34および35にて送給される薬液は,循
環路12内の処理液とミキサー44にて混合される。各薬液
ポンプ36〜39にて送給される薬液は,それぞれミキサー
45〜48にて循環路12内の処理液とそれぞれ混合される。
これら薬液ポンプ34〜39は演算制御器70にてそれぞれ制
御される。FIG. 2 is a schematic view of another embodiment of the present invention. This example relates to an apparatus for bleaching a fabric with hydrogen peroxide. Hydrogen peroxide (H 2 O 2 ) is stored in the chemical liquid tank 24, and auxiliary agents E and F are stored in the chemical liquid tanks 25 and 26, respectively. The chemical solution tank 27 contains sodium hydroxide, the chemical solution tank 28 contains sodium silicate (Na 2 SiO 3 ), and the chemical solution tank 29 contains an auxiliary agent G. As the auxiliary agent E, for example, a nonionic nonionic compound is used, and as the auxiliary agent F, for example, a nonionic organosilicon compound as a softening agent is used. Further, as the auxiliary agent G, for example, a nonionic organic fluorine compound as a water repellent agent is used.
The chemical liquids in the chemical liquid tanks 24 to 29 are fed from the circulation path 12 to the processing tank 11 by the chemical liquid pumps 34 to 39, respectively. A mixer is appropriately arranged in the circulation passage 12 so that when the chemical liquid in each of the chemical liquid tanks is supplied to the treatment tank 11 through the circulation passage 12, the respective chemical liquids are sequentially and uniformly mixed in the circulation passage 12. For example, the chemical solution fed by the chemical solution pumps 34 and 35 is mixed with the processing solution in the circulation path 12 by the mixer 44. The chemical liquids sent by the chemical liquid pumps 36 to 39 are respectively mixed in the mixer.
At 45 to 48, they are mixed with the processing liquid in the circulation path 12, respectively.
The chemical liquid pumps 34 to 39 are controlled by the arithmetic controller 70, respectively.
循環路12には,該処理液中の水酸化ナトリウム濃度を連
続的に検出する濃度検出器60のほか,該処理液中の過酸
化水素の濃度を連続的に検出するための酸化還元電位測
定器61が配設され,該酸化還元電位測定器61の検出結果
は演算制御器70′に入力される。また演算制御器70′に
は,処理液中の水酸化ナトリウムの濃度を設定するため
の濃度設定器71aのほか,処理液中の過酸化水素の濃度
を設定するための濃度設定器71bも接続されている。さ
らに,演算制御器70′には,2つの薬液比率設定器72a
および72bが接続されている。The circulation path 12 has a concentration detector 60 for continuously detecting the concentration of sodium hydroxide in the treatment liquid, and a redox potential measurement for continuously detecting the concentration of hydrogen peroxide in the treatment liquid. A device 61 is provided, and the detection result of the redox potential measuring device 61 is input to the arithmetic controller 70 '. In addition to the concentration setter 71a for setting the concentration of sodium hydroxide in the treatment liquid, the arithmetic controller 70 'is also connected to the concentration setter 71b for setting the concentration of hydrogen peroxide in the treatment liquid. Has been done. Further, the arithmetic controller 70 'includes two chemical liquid ratio setting devices 72a.
And 72b are connected.
本実施例では,水酸化ナトリウムに対して助剤Fとケイ
酸ナトリウムの組成比率がそれぞれ設定され,また過酸
化水素に対して各助剤EおよびGの組成比率が設定され
る。例えば,水酸化ナトリウムが5に対して,助剤Fが
10,ケイ酸ナトリウムが10の割合となるように薬液比率
設定器72aにて設定され,また過酸化水素が20に対し,
助剤Eが10,助剤Gが10の割合となるように薬液設定器
72bにて設定される。In this embodiment, the composition ratio of the auxiliary agent F and sodium silicate is set for sodium hydroxide, and the composition ratio of the auxiliary agents E and G is set for hydrogen peroxide. For example, sodium hydroxide is 5 and auxiliary agent F is
10, the ratio of sodium silicate is set to 10 by the chemical liquid ratio setting device 72a, and hydrogen peroxide is 20:
Auxiliary agent E is 10 and auxiliary agent G is 10
It is set at 72b.
演算制御器70′は,濃度設定器71aにて設定された水酸
化ナトリウム濃度と,濃度検出器60にて検出される処理
液中の水酸化ナトリウム濃度とを比較し,検出濃度の設
定濃度に対する偏差を演算する。そしてその偏差を解消
するために必要な水酸化ナトリウム量を演算し,その塩
山量が供給量となるように薬液ポンプ37を連続的に制御
する。さらに,演算制御器70′は,演算された水酸化ナ
トリウム供給量に基づき,薬液比率設定器72aにて設定
された組成比率に対応させてケイ酸ナトリウムおよび助
剤Eの供給量を演算し,その演算量が供給量となるよう
に各薬液ポンプ38および39を連続的に制御する。The arithmetic and control unit 70 'compares the sodium hydroxide concentration set by the concentration setting unit 71a with the sodium hydroxide concentration in the treatment liquid detected by the concentration detector 60, and compares the detected concentration with the set concentration. Calculate the deviation. Then, the amount of sodium hydroxide required to eliminate the deviation is calculated, and the chemical liquid pump 37 is continuously controlled so that the salt mountain amount becomes the supply amount. Further, the arithmetic controller 70 'calculates the supply amount of sodium silicate and the auxiliary agent E in accordance with the composition ratio set by the chemical liquid ratio setting device 72a based on the calculated sodium hydroxide supply amount, The chemical liquid pumps 38 and 39 are continuously controlled so that the calculated amount becomes the supply amount.
一方,演算制御器70′は,酸化還元電位測定器61にて測
定される処理液中の酸化還元電位から過酸化水素の濃度
を検出し,濃度設定器71bにて設定される濃度と比較
し,検出濃度の設定濃度に対する偏差を演算する。そし
て,演算制御器70′は,その偏差を解消するために必要
な過酸化水素量を演算し,その演算量が供給量となるよ
うに薬液ポンプ34を連続的に制御する。さらに,演算制
御器70′は,演算された過酸化水素供給量に基づき,薬
液比率設定器72bにて設定された組成比率に対応させて
助剤EおよびGの供給量を演算し,その各演算量がそれ
ぞれの供給量となるように薬液ポンプ35および36を連続
的に制御する。On the other hand, the arithmetic controller 70 'detects the concentration of hydrogen peroxide from the redox potential in the treatment liquid measured by the redox potential measuring device 61 and compares it with the concentration set by the concentration setting device 71b. , Calculate the deviation of the detected concentration from the set concentration. Then, the arithmetic controller 70 'calculates the amount of hydrogen peroxide necessary to eliminate the deviation, and continuously controls the chemical liquid pump 34 so that the calculated amount becomes the supply amount. Further, the arithmetic controller 70 'calculates the supply amounts of the auxiliaries E and G in correspondence with the composition ratio set by the chemical liquid ratio setting device 72b based on the calculated hydrogen peroxide supply amount, and each of them is calculated. The chemical liquid pumps 35 and 36 are continuously controlled so that the calculated amounts become the respective supplied amounts.
本発明の薬液処理装置に用いられる薬液は,プラスチッ
クフィルム,繊維糸,布帛等の仕上加工に用いられる薬
剤であり,例えば繊維布帛では糊抜処理に用いられる糊
抜剤;精錬漂白に用いられる水酸化ナトリウム,各種漂
白剤,浸透剤;あるいは仕上工程で用いられる防しわ加
工剤;触媒;柔軟剤;帯電防止剤等である。このような
薬液は,原液であっても,適当に希釈された溶液であっ
てもよい。The chemical solution used in the chemical solution treating apparatus of the present invention is a chemical agent used for finishing plastic film, fiber yarn, cloth, etc. For example, in the case of fiber cloth, a desizing agent used for desizing treatment; Sodium, various bleaching agents, penetrating agents; or anti-wrinkling agents used in finishing processes; catalysts; softening agents; antistatic agents and the like. Such a drug solution may be a stock solution or an appropriately diluted solution.
処理液中の薬液濃度の検出器としては,酸化還元電位,
電離度測定等のように,薬液濃度を電気的に検出し得る
ものが用いられる。濃度を検出し得る薬液としては,硫
酸,塩酸,水酸化ナトリウム,炭酸ソーダのように電離
度を検出し得る酸性またはアルカリ性物質;塩化カリウ
ム等の電解質;あるいは過酸化水素等のように酸化還元
電位を検出し得る酸化剤や還元剤が好適である。浸透剤
のように,濃度を直接電気的に検出できない非イオン性
物質等の濃度の検出には,濃度検出用のトレーサー物質
が用いられる。該トレーサー物質の使用量は,検出すべ
き薬液の濃度を検定し得るように,その薬液とは一定の
比率で使用される。As the detector of the chemical concentration in the treatment liquid, the redox potential,
The one that can electrically detect the concentration of the chemical solution, such as the ionization degree measurement, is used. The chemical solution that can detect the concentration includes acidic or alkaline substances such as sulfuric acid, hydrochloric acid, sodium hydroxide, and sodium carbonate that can detect the degree of ionization; electrolytes such as potassium chloride; or redox potentials such as hydrogen peroxide. Oxidizing agents and reducing agents capable of detecting the are suitable. A tracer substance for concentration detection is used to detect the concentration of nonionic substances such as penetrants whose concentration cannot be directly detected electrically. The amount of the tracer substance used is used in a certain ratio with the drug solution so that the concentration of the drug solution to be detected can be assayed.
(発明の効果) 本発明の薬液処理装置は,このように、被処理物を連続
的に薬液処理している間に,処理液の濃度を連続的に制
御し得る。また処理液調整のための予備タンクを必要と
しない。処理槽内における被処理物の薬液処理条件が変
更されても処理液を所定の濃度に速やかにかつ安定的に
調整し得る。各薬液タンクと処理槽とは循環路を介して
連結され,各薬液タンクからの薬液は,該循環路内の処
理液と一旦混合された後処理槽内に投入されるため,相
溶性の優れない薬液が含まれていても安定的に濃度調整
ができる。各薬液は処理液と十分に混合されるため,被
処理物を連続的に均一に処理し得る。それゆえ,得られ
た薬液処理物には品質に変動がない。(Effects of the Invention) As described above, the chemical treatment apparatus of the present invention can continuously control the concentration of the treatment liquid while continuously treating the object to be treated with the chemical. Moreover, a spare tank for adjusting the processing liquid is not required. Even if the chemical treatment conditions of the object to be treated in the treatment tank are changed, the treatment liquid can be quickly and stably adjusted to a predetermined concentration. Each chemical solution tank and processing tank are connected via a circulation path, and the chemical solution from each chemical solution tank is mixed with the processing solution in the circulation path once and then introduced into the post-treatment tank, so that the compatibility is excellent. Concentration can be adjusted stably even if there is no chemical solution. Since each chemical solution is sufficiently mixed with the processing solution, the object to be processed can be continuously and uniformly processed. Therefore, there is no change in the quality of the obtained chemical liquid processed product.
第1図は,本発明の薬液処理装置の模式図,第2図は,
本発明の他の実施例における薬液処理装置の模式図であ
る。 11……処理槽,12……循環路,21〜29……薬液タンク,
31〜39……薬液ポンプ,41,42,44〜47……ミキサー,
60……濃度検出器,61……酸化還元電位測定器,70,7
0′……演算制御器,71,71a,71b……濃度設定器,7
2,72a,72b……薬液比率設定器。FIG. 1 is a schematic diagram of the chemical liquid processing apparatus of the present invention, and FIG. 2 is
It is a schematic diagram of the chemical | medical solution processing apparatus in the other Example of this invention. 11 …… Treatment tank, 12 …… Circulating path, 21-29 …… Chemical solution tank,
31-39 …… Chemical solution pump, 41, 42, 44-47 …… Mixer,
60 …… Concentration detector, 61 …… Redox potential measuring instrument, 70, 7
0 '... Arithmetic controller, 71, 71a, 71b ... Concentration setter, 7
2, 72a, 72b ... Chemical liquid ratio setting device.
Claims (3)
槽内に,被処理物を連続的に浸漬させて薬液処理する装
置において, 各薬液を循環路を介して該処理槽に供給する薬液供給ポ
ンプと, 処理液中の所定の薬液の濃度検出器と, その薬液の処理液中の濃度を設定する濃度設定器と, 処理液中の各薬液の組成比率を設定する薬液比率設定器
と, 前記濃度検出器による薬液濃度と前記濃度設定器による
設定濃度との偏差を解消するために必要なその薬液の供
給量を演算すると共に,該供給量に基づき,前記薬液比
率設定器の設定組成比率に対応させて他の薬液の供給量
を演算し,前記各薬液供給ポンプをその演算供給量とな
るように制御する演算制御器と, を具備する薬液処理装置。1. A device for treating chemicals by continuously immersing an object to be treated in a treatment tank containing a treatment liquid containing a plurality of chemicals, wherein each chemical is supplied to the treatment tank through a circulation path. Chemical supply pump, concentration detector for a prescribed chemical in the treatment liquid, concentration setter for setting the concentration of the chemical in the treatment liquid, and chemical ratio setter for setting the composition ratio of each chemical in the treatment liquid And calculating the supply amount of the chemical liquid necessary to eliminate the deviation between the concentration of the chemical liquid by the concentration detector and the concentration set by the concentration setting device, and based on the supply amount, setting of the chemical liquid ratio setting device. A chemical liquid treatment apparatus comprising: a calculation controller that calculates the supply amount of another chemical liquid corresponding to the composition ratio and controls each of the chemical liquid supply pumps to reach the calculated supply amount.
た濃度検定用のトレーサー物質にて該薬液の濃度を検出
し得る特許請求の範囲第1項に記載の薬液処理装置。2. The chemical liquid treatment apparatus according to claim 1, wherein the concentration detector can detect the concentration of the chemical liquid with a tracer substance for concentration test mixed in a predetermined chemical liquid.
液との混合のためのミキサーが配設されている特許請求
の範囲第1項に記載の薬液処理装置。3. The chemical liquid treatment apparatus according to claim 1, wherein a mixer for mixing the treatment liquid and the chemical liquid in the circulation passage is provided in the circulation passage.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61057654A JPH0641664B2 (en) | 1986-03-14 | 1986-03-14 | Chemical processing equipment |
KR1019870001933A KR940007702B1 (en) | 1986-03-14 | 1987-03-04 | Chemical liquid treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61057654A JPH0641664B2 (en) | 1986-03-14 | 1986-03-14 | Chemical processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62215066A JPS62215066A (en) | 1987-09-21 |
JPH0641664B2 true JPH0641664B2 (en) | 1994-06-01 |
Family
ID=13061890
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61057654A Expired - Lifetime JPH0641664B2 (en) | 1986-03-14 | 1986-03-14 | Chemical processing equipment |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH0641664B2 (en) |
KR (1) | KR940007702B1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01183570A (en) * | 1988-01-19 | 1989-07-21 | Sando Iron Works Co Ltd | Apparatus for continuous liquid treatment of fabric |
NL9001133A (en) * | 1990-05-14 | 1991-12-02 | Brugman Machinefabriek Bv | METHOD FOR DETERMINING AND CONTROLLING THE HYDROXYLES HYDROGEN PEROXIDE CENTER IN BLEACH BATHS AND DEVICE FOR TREATING TEXTILE PATHS. |
JP4456308B2 (en) | 2001-12-05 | 2010-04-28 | 富士通マイクロエレクトロニクス株式会社 | Chemical supply device |
JP5198187B2 (en) * | 2007-09-26 | 2013-05-15 | 東京エレクトロン株式会社 | Liquid processing apparatus and processing liquid supply method |
JP2010242258A (en) * | 2009-04-07 | 2010-10-28 | Seiren Co Ltd | Method and device for padding treatment of fibrous materials |
JP5707446B2 (en) * | 2013-06-06 | 2015-04-30 | 株式会社日阪製作所 | Liquid flow dyeing equipment |
CN113136666A (en) * | 2021-04-30 | 2021-07-20 | 广东溢达纺织有限公司 | Cloth finishing method |
-
1986
- 1986-03-14 JP JP61057654A patent/JPH0641664B2/en not_active Expired - Lifetime
-
1987
- 1987-03-04 KR KR1019870001933A patent/KR940007702B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR940007702B1 (en) | 1994-08-24 |
JPS62215066A (en) | 1987-09-21 |
KR870008611A (en) | 1987-10-19 |
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