JPH0628305B2 - Master slice LSI - Google Patents
Master slice LSIInfo
- Publication number
- JPH0628305B2 JPH0628305B2 JP61112018A JP11201886A JPH0628305B2 JP H0628305 B2 JPH0628305 B2 JP H0628305B2 JP 61112018 A JP61112018 A JP 61112018A JP 11201886 A JP11201886 A JP 11201886A JP H0628305 B2 JPH0628305 B2 JP H0628305B2
- Authority
- JP
- Japan
- Prior art keywords
- basic cell
- master slice
- area
- wiring
- basic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/118—Masterslice integrated circuits
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] この発明は、マスタスライスLSIに関し、特に、メモ
リセルなどの論理セルを高密度に搭載することが可能な
マスタスライスLSIに関する。The present invention relates to a master slice LSI, and more particularly to a master slice LSI capable of mounting logic cells such as memory cells at a high density.
[従来の技術] 従来のマスタスライスLSI、特にチップの全面にわた
って能動素子からなる基本セルを敷き詰めたいわゆる敷
き詰め方式のマスタスライスLSIにおいては、任意の
基本セル領域が、メモリセルなどの論理セル間の配線領
域として用いられていた。このような敷き詰め方式のマ
スタスライスLSIは、たとえばHideki Fuk
uda et al.による1982 Symposi
um on VLSI Technology Dig
est of Technical Papersの
p.16〜17の“A CMOS Pair−Tran
sistor Array Masterslice”
において開示されている。[Prior Art] In a conventional master slice LSI, in particular, a so-called spread type master slice LSI in which basic cells made of active elements are spread over the entire surface of a chip, an arbitrary basic cell area is formed between logic cells such as memory cells. It was used as a wiring area. Such a spread-type master slice LSI is, for example, a Hideki Fuk.
uda et al. By 1982 Symposi
um on VLSI Technology Dig
est of Technical Papers p. 16-17 "A CMOS Pair-Tran
Sister Array Masterslice ”
Are disclosed in.
第2図は、このような従来の敷き詰め方式のマスタスラ
イスLSIの一例の内部領域を示す配線図である。FIG. 2 is a wiring diagram showing an internal area of an example of such a conventional master slice LSI of the spreading method.
まず、第2図に示した従来の敷き詰め方式のマスタスラ
イスLSIの構成について説明する。第2図において、
半導体チップ1の全面にわたって、バイポーラトランジ
スタおよび抵抗、またはMOSトランジスタからなる多
数の基本セル2が複数の列をなすように配置されてお
り、これらの複数の列のうち隣接する各列間には、所定
の間隔の間隙3が形成されている。さらに、これらの列
のうちの任意の列においては、その列内の数の基本セル
がたとえばメモリセルなどの種々の論理セル4を構成し
ている。これらの論理セル4の相互間の接続は、論理セ
ル4の形成されていない基本セル領域において多数の縦
方向Al1層配線5および横方向Al2層配線6よって
多数のスルーホール7を介して行なわれる。First, the configuration of the conventional spread master slice LSI shown in FIG. 2 will be described. In FIG.
A large number of basic cells 2 composed of bipolar transistors and resistors or MOS transistors are arranged in a plurality of columns over the entire surface of the semiconductor chip 1, and between adjacent columns of these plurality of columns, A gap 3 having a predetermined interval is formed. Furthermore, in any of these columns, the number of basic cells in that column constitutes various logic cells 4, such as memory cells. These logic cells 4 are connected to each other through a large number of through holes 7 by a large number of vertical Al1 layer wirings 5 and horizontal direction Al2 layer wirings 6 in a basic cell region where the logic cells 4 are not formed. .
次に、第2図に示した従来の敷き詰め方式のマスタスラ
イスLS1の作用について説明する。第2図に示したマ
スタスライスLS1においては、製造時に所定の規則に
従って、基本セル領域中の所定の基本セル列の所定の位
置にメモリセルなどの論理セル4を形成し、他の基本セ
ル領域を論理セル間の配線領域とし使用しれいる。した
がって、第2図の上部の領域に示すように、配線領域と
して使用する基本セル列の数を最適化するようにレイア
ウトを考慮することにより、基本セル領域内に、論理セ
ルとしても配線領域としても使用されない無駄な身使用
領域を生じることがなく、所望の高集積度のマスタスラ
イスLSIを得ることができた。Next, the operation of the conventional master slice LS1 shown in FIG. 2 will be described. In the master slice LS1 shown in FIG. 2, a logic cell 4 such as a memory cell is formed at a predetermined position of a predetermined basic cell row in the basic cell area according to a predetermined rule at the time of manufacturing, and another basic cell area is formed. May be used as a wiring area between logic cells. Therefore, as shown in the upper area of FIG. 2, by considering the layout so as to optimize the number of basic cell columns used as the wiring area, it is possible to use both the logic cells and the wiring areas in the basic cell area. It was possible to obtain a desired highly integrated master slice LSI without generating a wasteful personal use area that is not used.
[発明が解決しようとする問題点] 従来の敷き詰め方式のマスタスライスLSIは、以上の
ように構成されていたので、第2図の下部の領域に示す
ように、たとえばメモリセルなどのように配線領域が極
端に少なくて済むような論理セルを基本セル列中に形成
した場合にも、第2図中のAで示すように、少なくとも
1列の基本セル領域全体を配線領域として用いなければ
ならず、1つの基本セル列内の配線本数よりも実際に必
要な配線本数が極端に少なくなり、基本セル領域内に大
きな末使用領域が生じ、マスタスライスLSIの高集積
化を妨げるという問題点があった。[Problems to be Solved by the Invention] Since the conventional master-slice LSI of the spreading method is configured as described above, as shown in the lower region of FIG. 2, wiring such as a memory cell is performed. Even when a logic cell that requires an extremely small area is formed in the basic cell row, at least one entire basic cell area must be used as the wiring area, as indicated by A in FIG. However, the number of wires actually required is extremely smaller than the number of wires in one basic cell column, and a large unused area is generated in the basic cell area, which hinders high integration of the master slice LSI. there were.
この発明は、上述のような問題点を解消するためになさ
れたもので、未使用配線領域を生じることなく集積度の
向上を実現したマスタスライスLSIを提供することを
目的とする。The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a master slice LSI which realizes an improvement in the degree of integration without generating an unused wiring area.
[問題点を解決するための手段] この発明に係るマスタスライスLSIは、複数の基本セ
ルが列をなして形成された複数の基本セル領域を有し、
これらの基本セル領域の列のうち隣接する各列間には所
定の間隔の間隙が形成され、複数の基本セル領域内の任
意の基本セルによって、相互間に比較的多い配線本数を
要する複数の第1の種類の論理セルが構成され、複数の
基本セル領域内の他の任意の基本セルによって、相互間
に比較的少ない配線本数を要する複数の第2の種類の論
理セルが構成され、複数の第1の種類の論理セルを接続
するための配線領域は、複数の基本セル領域内の第1お
よび第2の種類の論理セルが形成されていない領域に形
成され、複数の第2の種類の論理セルを接続するための
配線領域は、半導体チップ上の複数の基本セル領域の隣
接する各々の間の予め定められた間隔の領域に形成され
るように構成したものである。[Means for Solving Problems] A master slice LSI according to the present invention has a plurality of basic cell regions in which a plurality of basic cells are formed in a row,
A gap having a predetermined interval is formed between adjacent columns of the columns of these basic cell regions, and a plurality of basic cells in a plurality of basic cell regions require a relatively large number of wirings between them. A first type logic cell is formed, and other arbitrary basic cells in a plurality of basic cell regions form a plurality of second type logic cells that require a relatively small number of wiring lines between them, Wiring regions for connecting the first type logic cells are formed in regions in which the first and second type logic cells are not formed in the plurality of basic cell regions, and the plurality of second type The wiring region for connecting the logic cells is configured to be formed in a region of a predetermined interval between adjacent ones of the plurality of basic cell regions on the semiconductor chip.
[作用] この発明におけるマスタスライスLSIは、配線領域が
極端に少なくて済むような論理セルを配置する部分で
は、基本セル領域の各列間の領域を配線領域とし使用
し、基本セル領域を配線領域としては使用しないで、か
かる部分においては、すべての基本セルを論理セルとし
て使用することが可能であるとともに論理セル間の配線
も従来通り可能である。[Operation] In the master slice LSI according to the present invention, the area between the columns of the basic cell area is used as the wiring area in the portion where the logic cells are arranged so that the wiring area is extremely small, and the basic cell area is wired. In this portion, all the basic cells can be used as logic cells without being used as regions, and wiring between logic cells can be performed as usual.
[発明の実施例] 第1図は、この発明の一実施例である敷き詰め方式マス
タスライスLSIの一実施例の内部領域を示す配線図で
ある。第1図に示したマスタスライスLSIは、以下の
点を除いて第2図に示した従来のマスタスライスLSI
と同じである。すなわち、第1図に示した実施例におい
ては、第1図中の下半分の領域に示すように、配線領域
が極端に少なくて済むような論理セル周辺では、基本セ
ル領域の各列の間の間隙の領域に複数の固定配線領域B
が設けられており、第2図に示すような配線領域として
専用される基本セル領域Aは存在しない。[Embodiment of the Invention] FIG. 1 is a wiring diagram showing an internal area of an embodiment of a spread master slice LSI which is an embodiment of the present invention. The master slice LSI shown in FIG. 1 is a conventional master slice LSI shown in FIG. 2 except for the following points.
Is the same as. That is, in the embodiment shown in FIG. 1, as shown in the lower half area in FIG. 1, between the columns of the basic cell area in the periphery of the logic cell where the wiring area is extremely small. A plurality of fixed wiring areas B in the gap area
Is provided, and there is no basic cell area A dedicated as a wiring area as shown in FIG.
したがって、第1図の上半分の領域では、配線領域とし
て使用する基本セル列の数を最適化するようにレイアウ
トを考慮することにより、すべての基本セル領域を論理
セルとしてまたは配線領域として無駄なく使用すること
ができるとともに、主に配線領域の少ないメモリセル等
の論理セルが形成された第1図の下半分の領域では、基
本セル領域を用いることなく論理セル(メモリセル)間
の配線が可能である。Therefore, in the upper half area of FIG. 1, by considering the layout so as to optimize the number of basic cell columns used as wiring areas, all the basic cell areas can be used as logic cells or wiring areas without waste. In the lower half area of FIG. 1 in which logic cells such as memory cells which are usable and mainly have a small wiring area are formed, the wiring between the logic cells (memory cells) can be performed without using the basic cell area. It is possible.
[発明の効果] 以上のように、この発明によれば、半導体チップ上の基
本セル領域の各列間の領域を論理セル間の配線のための
固定配線領域として使用するように構成したので、配線
領域の極端に小さい論理セルが設けられた領域において
も、基本セル領域を配線領域として使用する必要がな
く、したがって基本セル領域内に大きな未使用領域が生
じることがなく、半導体チップサイズの縮小化およびマ
スタスライスLSIの高集積化を実現することができ、
ひいてはLSIの低価格化をもたらすことができる。As described above, according to the present invention, the region between the columns of the basic cell region on the semiconductor chip is used as a fixed wiring region for wiring between logic cells. Even in the area where the logic cell of the wiring area is extremely small, it is not necessary to use the basic cell area as the wiring area, so that a large unused area does not occur in the basic cell area, and the semiconductor chip size is reduced. And high integration of the master slice LSI can be realized,
As a result, the cost of the LSI can be reduced.
第1図は、この発明の一実施例であるマスタスライスL
SIの内部領域を示す配線図である。 第2図は、従来のマスタスライスLSIの内部領域を示
す配線図である。 図において、1は半導体チップ、2は基本セル、3は基
本セル領域間の間隙、4は論理セル、5は縦方向Al1
層配線、6は横方向Al2層配線、7はスルーホールを
示す。FIG. 1 shows a master slice L which is an embodiment of the present invention.
It is a wiring diagram which shows the internal region of SI. FIG. 2 is a wiring diagram showing an internal area of a conventional master slice LSI. In the figure, 1 is a semiconductor chip, 2 is a basic cell, 3 is a gap between basic cell regions, 4 is a logic cell, 5 is a vertical direction Al1.
Layer wiring, 6 is a lateral Al2 layer wiring, and 7 is a through hole.
Claims (4)
本セル領域が予め定める間隔を隔てて半導体チップ上に
複数形成されたマスタスライスLSIにおいて、 前記複数の基本セル領域内の任意の基本セルによって、
相互間に比較的多い配線本数を要する複数の第1の種類
の論理セルが構成され、 前記複数の基本セル領域内の他の任意の基本セルによっ
て、相互間に比較的少ない配線本数を要する複数の第2
の種類の論理セルが構成され、 前記複数の第1の種類の論理セルを接続するための配線
領域は、前記複数の基本セル領域内の前記第1および第
2の種類の論理セルが形成されていない領域に形成さ
れ、 前記複数の第2の種類の論理セルを接続するための配線
領域は、前記半導体チップ上の前記複数の基本セル領域
の隣接する各々の間の前記予め定める間隔の領域に形成
されることを特徴とする、マスタスライスLSI。1. A master slice LSI having a plurality of basic cell regions formed in a row of a plurality of basic cells on a semiconductor chip at predetermined intervals, wherein By the basic cell,
A plurality of first-type logic cells that require a relatively large number of wirings between each other are configured, and a plurality of other basic cells in the plurality of basic cell regions that require a relatively small number of wirings between each other. Second
Different types of logic cells are formed, and the wiring regions for connecting the plurality of first type logic cells are formed with the first and second type logic cells in the plurality of basic cell regions. And a wiring region for connecting the plurality of second-type logic cells to each other, the wiring region being formed at a predetermined interval between adjacent ones of the plurality of basic cell regions on the semiconductor chip. A master slice LSI, which is formed into a.
および抵抗によって構成される、特許請求の範囲第1項
記載のマスタスライスLSI。2. The master slice LSI according to claim 1, wherein the basic cell includes a bipolar transistor and a resistor.
って構成される、特許請求の範囲第1項記載のマスタス
ライスLSI。3. The master slice LSI according to claim 1, wherein the basic cell is composed of a MOS transistor.
ある、特許請求の範囲第1項ないし第3項のいずれかに
記載のマスタスライスLSI。4. The master slice LSI according to claim 1, wherein the second type logic cell is a memory cell.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61112018A JPH0628305B2 (en) | 1986-05-14 | 1986-05-14 | Master slice LSI |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61112018A JPH0628305B2 (en) | 1986-05-14 | 1986-05-14 | Master slice LSI |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62266850A JPS62266850A (en) | 1987-11-19 |
JPH0628305B2 true JPH0628305B2 (en) | 1994-04-13 |
Family
ID=14575918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61112018A Expired - Lifetime JPH0628305B2 (en) | 1986-05-14 | 1986-05-14 | Master slice LSI |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0628305B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0254576A (en) * | 1988-08-18 | 1990-02-23 | Mitsubishi Electric Corp | Gate array |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5553440A (en) * | 1978-10-16 | 1980-04-18 | Mitsubishi Electric Corp | Large-scale integrated circuit |
-
1986
- 1986-05-14 JP JP61112018A patent/JPH0628305B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62266850A (en) | 1987-11-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3179800B2 (en) | Semiconductor integrated circuit device | |
JPH0763074B2 (en) | Method for arranging logic cells in semiconductor logic integrated circuit | |
US4910574A (en) | Porous circuit macro for semiconductor integrated circuits | |
JP2005093575A (en) | Semiconductor integrated circuit device and wiring layout method | |
JPS61292341A (en) | Semiconductor integrated circuit | |
EP0021661B1 (en) | Semiconductor master-slice device | |
JPH0628305B2 (en) | Master slice LSI | |
JPH079941B2 (en) | Method of designing integrated circuit device | |
JPH0758301A (en) | Semiconductor integrated circuit device | |
JP3289999B2 (en) | Semiconductor integrated circuit | |
JPH06140607A (en) | Semiconductor integrated circuit | |
JPH0630376B2 (en) | Method for manufacturing semiconductor device | |
JPS61225845A (en) | Semiconductor device | |
JP3353397B2 (en) | Semiconductor integrated circuit | |
JP2505039B2 (en) | Wiring method for wiring that passes over functional blocks | |
JP2656263B2 (en) | Semiconductor integrated circuit device | |
JPH0296371A (en) | Semiconductor device | |
EP0288688A2 (en) | Porous circuit macro for semiconductor integrated circuits | |
JP2652948B2 (en) | Semiconductor integrated circuit | |
JPH0334570A (en) | Master slice system integrated circuit device | |
JPH0691224B2 (en) | Master slice type semiconductor integrated circuit device | |
JP2702155B2 (en) | Semiconductor integrated circuit | |
JPH01152642A (en) | Semiconductor integrated circuit | |
JP2569477B2 (en) | Gate array | |
JPS61141152A (en) | Master slice type integrated circuit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |