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JPH0541452A - Standard cell system integrated circuit - Google Patents

Standard cell system integrated circuit

Info

Publication number
JPH0541452A
JPH0541452A JP3000787A JP78791A JPH0541452A JP H0541452 A JPH0541452 A JP H0541452A JP 3000787 A JP3000787 A JP 3000787A JP 78791 A JP78791 A JP 78791A JP H0541452 A JPH0541452 A JP H0541452A
Authority
JP
Japan
Prior art keywords
potential
cell
cells
standard cell
power source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3000787A
Other languages
Japanese (ja)
Inventor
Takashi Uno
敬史 鵜野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3000787A priority Critical patent/JPH0541452A/en
Publication of JPH0541452A publication Critical patent/JPH0541452A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To reduce the width of a circuit and enhance its degree of integration by laying out and interconnecting automatically standard cell groups designed to share a diffusion layer of the same potential with adjacent cells. CONSTITUTION:A cell basic frame 1 is positioned on the outside of diffusion layers 2a and 2b. However, in the case where cell connection frames 1b, 1c and 1d are on the inner side than the cell basic frame 1 and adjacent cells are located in the same connection frame (e.g. 1b), they are laid out so that they may be connected with each other. The connection frames include three types of potentials, say, a power source potential and a grounding potential 1b, a power source potential and a power source potential 1c and a ground potential and a grounding potential 1d. They are registered in one library together with input/output information. As for a sharing method for the connection frames, it is selected that the cells be arrayed so that their horizontal direction may be minimized. This construction makes it possible to reduce the cells by about 20%.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は自動配置・配線を行なう
標準セル方式集積回路に関し、特に隣接標準セル相互間
の接続方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a standard cell type integrated circuit for automatic placement and wiring, and more particularly to a method for connecting adjacent standard cells.

【0002】[0002]

【従来の技術】従来技術による自動配置・配線を行なう
標準セル方式集積回路の実例として、2層アルミのCM
OS回路について、図4を参照して説明する。
2. Description of the Related Art As an example of a standard cell type integrated circuit for automatic placement and wiring according to the prior art, a two-layer aluminum CM
The OS circuit will be described with reference to FIG.

【0003】セルの基本枠1内に第1アルミ配線による
電源線4aおよび接地線4bが配置される。セルへの入
力は配線チャネル9内の第1アルミ4からポリシリコン
配線3を介してポリシリコンゲート電極3aに接続され
る。出力は拡散層用コンタクト2cから第1アルミ4を
介して第2アルミ5へ接続するするように設計される2.
5 層配線用のセルである。セル内の拡散層2a,2bは
隣接する外のセルの拡散層2a,2bとショートしない
よう、セル枠1の内側に形成されている。セル同志はセ
ル枠1の縦の辺を接するように配置される。
A power line 4a and a ground line 4b made of a first aluminum wiring are arranged in a basic frame 1 of the cell. The input to the cell is connected to the polysilicon gate electrode 3a from the first aluminum 4 in the wiring channel 9 through the polysilicon wiring 3. The output is designed to connect from the diffusion layer contact 2c to the second aluminum 5 through the first aluminum 4.
This is a 5-layer wiring cell. The diffusion layers 2a and 2b in the cell are formed inside the cell frame 1 so as not to short-circuit with the diffusion layers 2a and 2b of the adjacent outer cells. The cells are arranged so that the vertical sides of the cell frame 1 are in contact with each other.

【0004】図4はインバータを2段および2入力のN
ORとNANDとをそれぞれ1つずつ横に並べた回路を
簡略化して、部分的に記号化して表現したものである。
FIG. 4 shows an inverter having two stages and two inputs of N.
A circuit in which one OR and one NAND are arranged side by side is simplified and partially symbolized.

【0005】[0005]

【発明が解決しようとする課題】従来技術による標準セ
ルでは、拡散層をセルの内側に形成しているため、電源
あるいは接地電位などの同一電位の拡散層同志を共有す
ることができない。
In the standard cell according to the prior art, since the diffusion layer is formed inside the cell, the diffusion layers having the same potential such as the power supply or the ground potential cannot be shared with each other.

【0006】そのため横方向の寸法が大きくなる欠点が
あった。
Therefore, there is a drawback that the lateral dimension becomes large.

【0007】[0007]

【課題を解決するための手段】本発明の自動配置・配線
による標準セル方式半導体集積回路は、同一電位の拡散
層領域を隣接するセル同志で共有できるようにセルが構
成されているとともに、共有可能とするためのセル情報
が入出力端子情報と合せてセルライブラリに登録されて
いるものである。
In the standard cell type semiconductor integrated circuit with automatic placement / wiring of the present invention, cells are configured so that adjacent diffusion cells can share a diffusion layer region of the same potential, and The cell information for enabling is registered in the cell library together with the input / output terminal information.

【0008】[0008]

【実施例】本発明の第1の実施例について、図面を参照
して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to the drawings.

【0009】図1に標準セルの構成を示す。図1(a)
はインバータ、図1(b)は2入力NOR、図1(c)
は2入力NANDを示す。セルの基本枠1は従来技術に
おける図4と同様に拡散層2a,2bの外側にある。し
かしセルの接続用の枠1b,1c,1dをセルの基本枠
1より内側にして、隣接セル同志が同じ接続用の枠(例
えば1bと1b)をもっている場合は、それらを接する
ように配置させる。接続用の枠としては、電源電位と接
地電位1b、電源電位と電源電位1c、接地電位と接地
電位1dの3種類があり、1つのライブラリに入出力端
子情報と合せて登録する。
FIG. 1 shows the structure of a standard cell. Figure 1 (a)
Is an inverter, FIG. 1 (b) is a 2-input NOR, FIG. 1 (c)
Indicates a 2-input NAND. The basic frame 1 of the cell is outside the diffusion layers 2a and 2b, as in FIG. 4 in the prior art. However, if the cell connection frames 1b, 1c, and 1d are inside the cell basic frame 1, and adjacent cells have the same connection frame (for example, 1b and 1b), they are arranged so as to be in contact with each other. . There are three types of frames for connection: power supply potential and ground potential 1b, power supply potential and power supply potential 1c, and ground potential and ground potential 1d, which are registered together with input / output terminal information in one library.

【0010】図1(d)に従来技術の図4と同一のイン
バータ2段と2入力のNORとNANDを各1段ずつ接
続した回路を示す。図1(d)では2入力NANDをさ
らに1段追加した回路になっている。
FIG. 1 (d) shows a circuit in which two stages of the same inverter as in FIG. 4 of the prior art and two inputs of NOR and NAND are connected one stage each. In FIG. 1 (d), the circuit has an additional two-input NAND.

【0011】ここで図2を用いて図1を補足説明する。
図2(a)、図2(b)、図2(c)、図2(d)の4
つのセルを順に縦続接続する場合、図2(a)と図2
(b)とは共通の接続枠1bをもっているので、図2
(a)のセルを裏返して配置したものを図2(e)に示
す。各セルに英大文字のFを記して表裏を示した。図2
(b)と図2(c)とは共通の接続枠1cをもっている
ので、そのまま接続できる。図2(c)と図2(d)と
は共に接続枠1dをもっているが、図2(c)の配置は
既に決まっており、図2(d)と接続枠1dを共有する
ことはできない。
Here, FIG. 1 will be supplementarily described with reference to FIG.
2 of FIG. 2A, FIG. 2B, FIG. 2C, and FIG.
When two cells are connected in series in series, they are shown in FIG.
Since it has a common connection frame 1b with (b), FIG.
FIG. 2 (e) shows the cell of (a) arranged upside down. The upper and lower sides are shown by writing an uppercase F in each cell. Figure 2
Since (b) and FIG. 2 (c) have a common connection frame 1c, they can be connected as they are. Both FIG. 2C and FIG. 2D have the connection frame 1d, but the arrangement of FIG. 2C has already been decided, and the connection frame 1d cannot be shared with FIG. 2D.

【0012】もし図2(b)と図2(c)とが接続枠1
dを共有しなければ、図2(f)に示すように図2
(c)を裏返して図2(c)と図2(d)とが接続枠1
dを共有することができる。
2 (b) and 2 (c) show the connection frame 1
If d is not shared, as shown in FIG.
2C is turned over and FIG. 2C and FIG.
d can be shared.

【0013】接続枠の共有方法は複数個あり、セルを並
べて横方向が最小になる組み合わせを選択することがで
きる。実際は接続枠が共有できるように順次セルを配置
しても横方向の寸法に大差はない。本実施例では図1
(d)の幅10に示すように、従来技術の図4の幅10
に比べて約20%面積を縮小することができた。
There are a plurality of methods for sharing the connection frame, and it is possible to arrange the cells and select the combination that minimizes the horizontal direction. Actually, even if cells are sequentially arranged so that the connection frame can be shared, there is no great difference in the horizontal dimension. In this embodiment, FIG.
As shown in the width 10 of (d), the width 10 of the prior art FIG.
It was possible to reduce the area by about 20% as compared with.

【0014】つぎに本発明の第2の実施例について、図
3を参照して説明する。
Next, a second embodiment of the present invention will be described with reference to FIG.

【0015】図3(a)のインバータ2つを並列接続
し、同一電位の拡散層領域を共有することにより出力部
の拡散容量を削減して高性能化を実現した回路を図3
(b)に示す。本実施例においても、電源・接地電位に
ついて共通接続枠の組み合わせを変更しても同等の効果
を得ることができる。
FIG. 3 shows a circuit in which two inverters shown in FIG. 3A are connected in parallel and the diffusion layer region of the same potential is shared to reduce the diffusion capacitance of the output section to realize high performance.
It shows in (b). Also in this embodiment, the same effect can be obtained by changing the combination of the common connection frames for the power supply / ground potential.

【0016】[0016]

【発明の効果】同一電位の拡散層領域を隣接するセル同
志で共有するように設計された標準セル群を、拡散層を
共有するように自動配置・配線する。
EFFECTS OF THE INVENTION A standard cell group designed to share a diffusion layer region of the same potential between adjacent cells is automatically arranged and wired so as to share the diffusion layer.

【0017】その結果従来技術による図4の幅10に比
べて本発明による図1(d)の幅10に示すように、約
20%の集積度の向上が可能になった。
As a result, as compared with the width 10 of the prior art shown in FIG. 4, as shown by the width 10 of FIG. 1 (d) according to the present invention, the degree of integration can be improved by about 20%.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例を示す平面模式図であ
る。
FIG. 1 is a schematic plan view showing a first embodiment of the present invention.

【図2】図1のセルの配置・向きを説明する平面略図で
ある。
FIG. 2 is a schematic plan view illustrating the arrangement and orientation of the cells of FIG.

【図3】本発明の第2の実施例を示す平面模式図であ
る。
FIG. 3 is a schematic plan view showing a second embodiment of the present invention.

【図4】従来技術による標準セルおよびその配置・配線
を示す平面模式図である。
FIG. 4 is a schematic plan view showing a standard cell and its layout and wiring according to a conventional technique.

【符号の説明】[Explanation of symbols]

1 セルの基本枠 1a,1b,1c,1d 接続用枠 2a N+ 型拡散層 2b P+ 型拡散層 2c 拡散層用コンタクト 3 ポリシリコン配線 3a ポリシリコンゲート電極 4 第1アルミ 4a 電源用第1アルミ 4b 接地用第1アルミ 5 第2アルミ 6 拡散層用コンタクト 7 ポリシリコン・第1アルミ間コンタクト 8 第1アルミ・第2アルミ間コンタクト 9 配線チャネル 10 幅1 Cell Basic Frame 1a, 1b, 1c, 1d Connection Frame 2a N + Type Diffusion Layer 2b P + Type Diffusion Layer 2c Diffusion Layer Contact 3 Polysilicon Wiring 3a Polysilicon Gate Electrode 4 First Aluminum 4a Power Supply First Aluminum 4b Grounding first aluminum 5 Second aluminum 6 Diffusion layer contact 7 Polysilicon-first aluminum contact 8 First aluminum-second aluminum contact 9 Wiring channel 10 Width

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 標準セル方式を用いた半導体集積回路に
ついて、隣接するセル同志で同一電位の拡散層領域を共
有できるように設計された標準セル群を自動配置・配線
することを特徴とする標準セル方式集積回路。
1. A semiconductor integrated circuit using a standard cell method, characterized in that a standard cell group designed so that adjacent cells can share a diffusion layer region of the same potential is automatically arranged and wired. Cellular integrated circuit.
JP3000787A 1991-01-09 1991-01-09 Standard cell system integrated circuit Pending JPH0541452A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3000787A JPH0541452A (en) 1991-01-09 1991-01-09 Standard cell system integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3000787A JPH0541452A (en) 1991-01-09 1991-01-09 Standard cell system integrated circuit

Publications (1)

Publication Number Publication Date
JPH0541452A true JPH0541452A (en) 1993-02-19

Family

ID=11483410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3000787A Pending JPH0541452A (en) 1991-01-09 1991-01-09 Standard cell system integrated circuit

Country Status (1)

Country Link
JP (1) JPH0541452A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06326247A (en) * 1993-05-14 1994-11-25 Rohm Co Ltd Layout pattern generating method
JP2007115747A (en) * 2005-10-18 2007-05-10 Elpida Memory Inc Method and device for designing semiconductor integrated circuit
JP2008118004A (en) * 2006-11-07 2008-05-22 Nec Electronics Corp Semiconductor integrated circuit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06326247A (en) * 1993-05-14 1994-11-25 Rohm Co Ltd Layout pattern generating method
JP2007115747A (en) * 2005-10-18 2007-05-10 Elpida Memory Inc Method and device for designing semiconductor integrated circuit
JP2008118004A (en) * 2006-11-07 2008-05-22 Nec Electronics Corp Semiconductor integrated circuit

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Effective date: 19991005