JP6949679B2 - Processing equipment, inspection equipment and processing method - Google Patents

Description

The present invention relates to a processing device that executes a calculation process for calculating the Q value of a measurement target, an inspection method for inspecting the measurement target based on the Q value, and a processing method for executing the calculation process for calculating the Q value of the measurement target. It is a thing.

As a processing device of this type, an impedance measuring device disclosed by the applicant in Patent Document 1 below is known. This impedance measuring device includes a controller, a first measuring means, and a second measuring means, and is configured to be able to calculate the Q value of the inductor element and determine the quality of the inductor element based on the Q value. In this case, the first measuring means measures the DC resistance value Rdc4 of the inductor element by a four-terminal measuring method using a DC signal. The second measuring means measures the DC resistance value Rdc2 of the inductor element by a two-terminal measuring method using a DC signal, and also measures the effective resistance value Rs and the inductance value of the inductor element by a two-terminal measuring method using a high-frequency signal. Measure L. Further, the controller controls the first measuring means and the second measuring means, and determines the quality of the inductor element based on the Q value calculated using each measured value Rdc4, Rdc2, Rs, L. In this impedance measuring device, in order to reduce the influence of the contact resistance value Rc of the measuring probe when the second measuring means performs the measurement by the two-terminal measuring method, the difference value between Rdc2 and Rdc4 is set as the contact resistance value Rc ( Rc = Rdc2-Rdc4), the effective resistance value Rs is corrected by the contact resistance value Rc, and the Q value is calculated using the correction value Rs'(Rs' = Rs-Rc).

Japanese Unexamined Patent Publication No. 2015-125135 (Page 5-8, Fig. 1-2)

However, the above impedance measuring device has the following problems to be improved. Specifically, in the above impedance measuring device, the second measuring means executes the measurement of the DC resistance value Rdc2 only once before or after the measurement of the effective resistance value Rs, and the DC resistance value is measured. The effective resistance value Rs is corrected by the contact resistance value Rc obtained from Rdc2. In this case, when the contact resistance value Rc at the measurement time of the DC resistance value Rdc2 and the contact resistance value Rc at the measurement time of the effective resistance value Rs are different, that is, when the contact resistance value Rc changes between the two measurement times. The effective resistance value Rs is corrected with a contact resistance value Rc different from the actual contact resistance value Rc, and at this time, it becomes difficult to accurately calculate the Q value. In particular, when the contact resistance value Rc at the measurement time of the effective resistance value Rs is smaller than the contact resistance value Rc at the measurement time of the DC resistance value Rdc2, the correction is made more than the actual effective resistance value Rs not including the contact resistance value Rc. As a result, the value Rs'(effective resistance value Rs after correction) becomes smaller and the Q value (ωL / Rs') becomes larger than the actual value, and as a result, when inspecting the inductor element based on the Q value, it is actually May determine a defective inductor element with a small Q value as a good product.

The present invention has been made in view of the problem to be improved, and is a processing device, an inspection device, and a processing method capable of calculating a Q value capable of improving the inspection accuracy in the quality inspection of the measurement target using the Q value. The main purpose is to provide.

In order to achieve the above object, the processing apparatus according to claim 1 includes a first measuring unit that executes a first measurement process in which the DC resistance value of the measurement target is set as the first DC resistance value and is measured by the 4-terminal method, and the measurement target. The second measurement process of measuring the DC resistance value of the above as the second DC resistance value by the two-terminal method, and the second measurement process of measuring the AC resistance value and the inductance value of the measurement target by the two-terminal method, respectively. A process including a measuring unit and a processing unit capable of performing a process of calculating the Q value of the measurement target based on the first DC resistance value, the second DC resistance value, the AC resistance value, and the inductance value. In the device, the second measurement unit executes the second measurement process a plurality of times, and the processing unit identifies the change state of each of the second DC resistance values measured by each of the second measurement processes. At the same time, the correction resistance obtained by executing the correction processing for correcting the AC resistance value using the difference value between the third DC resistance value and the first DC resistance value defined based on the second DC resistance value. The first process of calculating the Q value using the value, the second process of calculating the Q value using the AC resistance value, and notifying that the Q value is not calculated without calculating the Q value. Any one of the third processes is executed according to the change state.

Further, the processing apparatus according to claim 2 is the processing apparatus according to claim 1, wherein the processing unit is the difference between the maximum value and the minimum value of each of the second DC resistance values as the changed state. When the fluctuation range is equal to or less than the preset first threshold value, the first process is executed by defining the third DC resistance value based on each of the second DC resistance values, and the first process is executed. The second process is executed when the fluctuation range is larger than the threshold value.

Further, the processing apparatus according to claim 3 is the processing apparatus according to claim 1, wherein the processing unit is the difference between the maximum value and the minimum value of each of the second DC resistance values as the changed state. When the fluctuation range is equal to or less than the preset first threshold value, the first process is executed by defining the third DC resistance value based on each of the second DC resistance values, and the first process is executed. The third process is executed when the fluctuation range is larger than the threshold value.

Further, the processing apparatus according to claim 4 is the processing apparatus according to any one of claims 1 to 3, wherein the processing unit defines the minimum value of each of the second DC resistance values as the third DC resistance value. do.

Further, the processing apparatus according to claim 5 is the processing apparatus according to claim 1, wherein the processing unit is a part of each of the second DC resistance values as the changed state and is adjacent to each other in time. The second DC resistance value measured after the second state in which the second fluctuation width, which is the difference between the maximum value and the minimum value of the second DC resistance value, is equal to or less than the preset second threshold value. When the first process is executed by defining the third DC resistance value based on the above, and the second state is not reached by the end of the plurality of second measurement processes by the second measurement unit. The second process is executed.

Further, the processing apparatus according to claim 6 is the processing apparatus according to claim 1, wherein the processing unit is a part of each of the second DC resistance values as the changed state and is adjacent to each other in time. The second DC resistance value measured after the second state in which the second fluctuation width, which is the difference between the maximum value and the minimum value of the second DC resistance value, is equal to or less than the preset second threshold value. When the first process is executed by defining the third DC resistance value based on the above, and the second state is not reached by the end of the plurality of second measurement processes by the second measurement unit. The third process is executed.

Further, the processing apparatus according to claim 7 is the processing apparatus according to claim 5 or 6, wherein the processing unit sets the minimum value of the second DC resistance value measured after the second state is reached. It is defined as the third DC resistance value.

The processing apparatus according to claim 8 is the processing apparatus according to any one of claims 1 to 7, wherein the processing unit has a coefficient of 0 or more and 1 or less predetermined for the difference value in the correction processing. The value obtained by multiplying by is subtracted from the AC resistance value to correct the AC resistance value.

Further, the processing apparatus according to claim 9 is the processing apparatus according to any one of claims 1 to 8, wherein the processing unit performs the first processing when the difference value is larger than a preset set value. Is executed, and when the difference value is equal to or less than the set value, either the second process or the third process is executed.

The inspection device according to claim 10 includes the processing device according to any one of claims 1 to 9, and an inspection unit that inspects the quality of the measurement target based on the Q value calculated by the processing device. Equipped with.

The processing method according to claim 11 is a first measurement process in which the DC resistance value of the measurement target is set as the first DC resistance value by the 4-terminal method, and the DC resistance value of the measurement target is set as the second DC resistance value. The second measurement process for measuring by the terminal method and the third measurement process for measuring the AC resistance value and the inductance value of the measurement target by the two-terminal method are executed, and the first DC resistance value and the second DC resistance value are executed. , A processing method for executing a process of calculating the Q value of the measurement target based on the AC resistance value and the inductance value, the second measurement process is executed a plurality of times, and the measurement is performed by each of the second measurement processes. The change state of each of the second DC resistance values is specified, and the AC resistance is used by using the difference value between the third DC resistance value and the first DC resistance value defined based on the second DC resistance value. The first process of calculating the Q value using the corrected resistance value obtained by executing the correction process of correcting the value, the second process of calculating the Q value using the AC resistance value, and the Q value. One of the third processes for notifying that the Q value is not calculated without calculating is executed according to the change state.

In the processing apparatus according to claim 1, the inspection apparatus according to claim 10, and the processing method according to claim 11, the change state of each second DC resistance value measured by a plurality of second measurement processes is specified. The first process of calculating the Q value using the corrected resistance value corrected for the AC resistance value, the second process of calculating the Q value using the AC resistance value, and the fact that the Q value is not calculated without calculating the Q value. Any one of the third processes for notifying the above is executed according to the change state of each second DC resistance value. In this case, when the contact state of the measurement probe with respect to the measurement target is poor and the contact resistance value changes with the passage of time, the contact resistance value included in the second DC resistance value is included in the AC resistance value. When it is larger than the resistance value, the corrected resistance value corrected by using the second DC resistance value may be smaller than the actual AC resistance value of the measurement target, and it is calculated using this corrected resistance value. As a result of the calculated value of the Q value being larger than the actual Q value of the measurement target, there is a possibility that a defective measurement target having a small Q value is erroneously determined as a non-defective product. On the other hand, in this processing device, inspection device and processing method, the first processing, the second processing and the third processing are used properly according to the change state of each second DC resistance value, so that the corrected correction resistance value is the measurement target. By executing the first process of calculating the Q value using the corrected resistance value only when it is unlikely that the value will be smaller than the actual AC resistance value of, the calculated Q value will be the actual Q value of the measurement target. In fact, it is possible to prevent a situation in which a defective measurement target having a small Q value is erroneously determined as a non-defective product. Therefore, according to this processing device, inspection device, and processing method, it is possible to calculate a Q value that can sufficiently improve the inspection accuracy in the quality inspection of the measurement target using the Q value.

Further, in the processing apparatus according to claim 2 and the inspection apparatus according to claim 10, the first processing is executed when the first fluctuation width of each second DC resistance value is equal to or less than the first threshold value, and the first fluctuation width is executed. Is greater than the first threshold value, the second process is executed. Therefore, according to this processing device, inspection device, and processing method, the first fluctuation range of the second DC resistance value is equal to or less than the first threshold value, and the change in contact resistance value with time is small. Since the first process is executed only when the resistance value is unlikely to be smaller than the actual AC resistance value of the measurement target, the calculated Q value calculated using the corrected resistance value is the actual measurement target. It becomes a value larger than the Q value of, and it is possible to more reliably prevent a situation in which a defective measurement target having a small Q value is erroneously determined as a non-defective product.

Further, in the processing apparatus according to claim 3 and the inspection apparatus according to claim 10, the first processing is executed when the first fluctuation width of each second DC resistance value is equal to or less than the first threshold value, and the first fluctuation width is executed. Is greater than the first threshold value, the third process is executed. Therefore, according to this processing device, inspection device, and processing method, the first fluctuation range of the second DC resistance value is equal to or less than the first threshold value, and the change in contact resistance value with time is small. Since the first process is executed only when the resistance value is unlikely to be smaller than the actual AC resistance value of the measurement target, the calculated Q value calculated using the corrected resistance value is the actual measurement target. It becomes a value larger than the Q value of, and it is possible to more reliably prevent a situation in which a defective measurement target having a small Q value is erroneously determined as a non-defective product. Further, according to the processing device, the inspection device, and the processing method, when the first fluctuation range is larger than the first threshold value, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the measurement target are executed. Since the third process is executed without any need, it is unnecessary that a Q value larger than the actual Q value of the measurement target is calculated, or a defective measurement target having a small Q value is erroneously judged as a good product. It is possible to prevent wasting time for processing and shorten the processing time accordingly.

Further, according to the processing apparatus according to claim 4 and the inspection apparatus according to claim 10, the first processing is executed by using the minimum value of each second DC resistance value as the third DC resistance value. 3 It is possible to more reliably prevent the corrected resistance value corrected by using the DC resistance value from becoming smaller than the actual AC resistance value to be measured.

Further, in the processing apparatus according to claim 5 and the inspection apparatus according to claim 10, the second fluctuation range, which is the difference between the maximum value and the minimum value of the plurality of second DC resistance values that are adjacent to each other in time, is the second. The first process is executed using the second DC resistance value measured after the time when the value becomes 2 threshold values or less, and the second process is executed when the second fluctuation width does not become the second threshold value or less. Therefore, according to this processing device, inspection device, and processing method, the correction process is performed using the second DC resistance value measured after the contact state between the measurement target and the measurement probe is stable in a good state. In order to execute, the calculated value of the Q value calculated using the correction resistance value becomes a value larger than the actual Q value of the measurement target, and the defective measurement target with a small Q value is actually erroneously judged as a good product. Can be prevented more reliably.

Further, in the processing apparatus according to claim 6 and the inspection apparatus according to claim 10, the second fluctuation range, which is the difference between the maximum value and the minimum value of the plurality of second DC resistance values that are adjacent to each other in time, is the second. The first process is executed using the second DC resistance value measured after the time when the value becomes 2 threshold values or less, and the third process is executed when the second fluctuation width does not become the second threshold value or less. Therefore, according to this processing device, inspection device, and processing method, the correction process is performed using the second DC resistance value measured after the contact state between the measurement target and the measurement probe is stable in a good state. In order to execute, the calculated value of the Q value calculated using the correction resistance value becomes a value larger than the actual Q value of the measurement target, and the defective measurement target with a small Q value is actually erroneously judged as a good product. Can be prevented more reliably. Further, according to this processing device, inspection device, and processing method, when the second fluctuation width does not fall below the second threshold value, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the measurement target are performed. Since the third process is executed without being executed, a Q value larger than the actual Q value of the measurement target is calculated, or a defective measurement target having a small Q value is erroneously determined as a good product. It is possible to prevent wasting time for unnecessary processing and shorten the processing time accordingly.

Further, according to the processing apparatus according to claim 7 and the inspection apparatus according to claim 10, the minimum value of the second DC resistance value measured after the time when the second fluctuation width becomes equal to or less than the second threshold value is the second. 3 By executing the first process using the DC resistance value, it is more reliable to prevent the corrected resistance value corrected using the third DC resistance value from becoming smaller than the actual AC resistance value to be measured. can do.

Further, in the processing apparatus according to claim 8 and the inspection apparatus according to claim 10, in the correction processing, the value obtained by multiplying the difference value by a coefficient of 0 or more and 1 or less is subtracted from the AC resistance value to obtain the AC resistance value. to correct. In this case, the corrected resistance value corrected by the value obtained by multiplying the coefficient does not become smaller than the corrected resistance value corrected by the difference value. Therefore, according to this processing device, inspection device, and processing method, it is possible to surely prevent the corrected resistance value from becoming smaller than the actual AC resistance value of the measurement target, and as a result, the calculated value of the Q value. Can be more reliably prevented from becoming a value larger than the actual Q value.

Further, in the processing apparatus according to claim 9 and the inspection apparatus according to claim 10, the first process is executed when the difference value is larger than the preset set value, and when the difference value is equal to or less than the set value, the first process is executed. Either the 2nd process or the 3rd process is executed. Therefore, according to this processing device, inspection device, and processing method, for example, by setting the upper limit value of the contact resistance value that normally occurs when a probe for measurement in a good state is used as a set value, a difference value is obtained. Is larger than the set value and the correction process is executed only when there is a high need to correct the AC resistance value, and when the difference value is less than or equal to the set value and the need to correct the AC resistance value is low, the correction process is not executed. , Or the calculation of the Q value itself can be prevented. Therefore, according to this processing device, inspection device, and processing method, a Q value larger than the actual Q value is calculated by executing a correction process that is less necessary, and a defective measurement target having a small Q value is actually a good product. It is possible to surely prevent the situation where it is erroneously determined.

It is a block diagram which shows the structure of inspection apparatus 1. It is explanatory drawing explaining the 1st measurement process. It is explanatory drawing explaining the 2nd measurement process and the 3rd measurement process. It is a flowchart of inspection process 50. It is a flowchart of the calculation process 70. It is a flowchart of inspection process 50A. It is a flowchart of the calculation process 70A. It is a flowchart of inspection process 50B. It is a flowchart of calculation process 70B. It is a flowchart of inspection process 50C. It is a flowchart of the calculation process 70C.

Hereinafter, embodiments of a processing apparatus, an inspection apparatus, and a processing method will be described with reference to the accompanying drawings.

First, the configuration of the inspection device 1 shown in FIG. 1 will be described. The inspection device 1 is an example of an inspection device, and is configured to be able to calculate the Q value of the inductor element 100 as an example of the measurement target and to inspect the quality of the inductor element 100 based on the calculated Q value Qc. ing. Specifically, as shown in the figure, the inspection device 1 includes a first measurement unit 11, a second measurement unit 12, an operation unit 13, a storage unit 14, a display unit 15, a transport mechanism 16, and a processing unit 17. It is composed of. In this case, the processing device is configured by a portion of the inspection device 1 excluding the inspection function described later.

The first measuring unit 11 includes a moving mechanism (not shown) for moving the probes 31a to 31d, a current output unit 11a, and a voltage detecting unit 11b (see FIG. 2), and is an inductor under the control of the processing unit 17. The first measurement process of measuring the DC resistance value Rd1 (corresponding to the first DC resistance value) of the element 100 by the four-terminal method is executed. Specifically, in the first measurement process, as shown in the figure, the moving mechanism of the first measurement unit 11 brings the probes 31a and 31c into contact with the terminals 101a of the inductor element 100 conveyed to the measurement position P1. The probes 31b and 31d are brought into contact with the terminal 101b of the inductor element 100, the current output unit 11a outputs a direct current and supplies it to the inductor element 100 via the probes 31a and 31b, and the voltage detection unit 11b is the terminal 101a. , The voltage value between 101b is detected via the probes 31c and 31d. Further, the first measuring unit 11 measures the DC resistance value Rd1 based on the detected voltage value and the current value of the supplied DC current.

The second measuring unit 12 includes a moving mechanism (not shown) for moving the probes 32a and 32b, a current output unit 12a and a voltage detecting unit 12b (see FIG. 3), and is an inductor under the control of the processing unit 17. The second measurement process for measuring the DC resistance value Rd2 (corresponding to the second DC resistance value) of the element 100 by the two-terminal method, and the AC resistance value Ra (effective resistance value) and the inductance value L of the inductor element 100 are 2 respectively. The third measurement process of measuring by the terminal method is executed. Specifically, in the second measurement process, the moving mechanism of the second measurement unit 12 connects the probes 32a and 32b to the terminals 101a and 101b of the inductor element 100 conveyed to the measurement position P2, respectively, as shown in the figure. Upon contact, the current output unit 12a outputs a direct current and supplies it to the inductor element 100 via the probes 32a and 32b, and the voltage detection unit 11b transfers the voltage value between the terminals 101a and 101b via the probes 32a and 32b. To detect. Further, the second measuring unit 12 measures the DC resistance value Rd2 based on the detected voltage value and the current value of the supplied DC current.

Further, in the third measurement process, the moving mechanism of the second measurement unit 12 maintains a state in which the probes 32a and 32b are in contact with the terminals 101a and 101b of the inductor element 100, respectively (see FIG. 3), and the current output unit 12a Outputs an AC current and supplies it to the inductor element 100 via the probes 32a and 32b, and the voltage detection unit 12b detects the AC voltage value between the terminals 101a and 101b via the probes 32a and 32b. Further, the second measuring unit 12 sets the AC resistance value based on the AC voltage value (effective voltage value), the AC current value of the supplied AC current (effective current value), and the phase difference between the AC voltage and the AC current. Ra and the inductance value L are measured.

The operation unit 13 is configured to include various buttons and keys, and outputs an operation signal when these are operated.

The storage unit 14 stores the DC resistance value Rd1 measured by the first measuring unit 11, and also stores the DC resistance value Rd2, the AC resistance value Ra, and the inductance value L measured by the second measuring unit 12. Further, the storage unit 14 stores the calculated Q value Qc of the Q value calculated in the inspection process 50, which will be described later, which is executed by the processing unit 17. Further, the storage unit 14 stores the threshold value Rt1 (corresponding to the first threshold value) used in the inspection process 50, the reference value Qr of the Q value, and the set value Rr and the coefficient Kc used in the calculation process 70 executed in the inspection process 50. Remember.

The display unit 15 displays the calculated Q value Qc calculated in the inspection process 50 executed by the processing unit 17 and the inspection result of the quality of the inductor element 100 inspected in the inspection process 50 under the control of the processing unit 17. indicate.

The transport mechanism 16 is a supply position where the inductor element 100 is supplied by a supply device (not shown) under the control of the processing unit 17, and a measurement position P1 where the first measurement process is executed by the first measurement unit 11 (see FIG. 2). , The measurement position P2 (see FIG. 3) where the second measurement process and the third measurement process are executed by the second measurement unit 12, and the inductor element 100 for which each measurement process and inspection have been completed are carried out by an carry-out device (not shown). The inductor element 100 is conveyed to the carry-out position.

The processing unit 17 controls each component constituting the inspection device 1 according to an operation signal output from the operation unit 13. Further, the processing unit 17 executes the calculation process 70 shown in FIG. 5 to calculate the Q value of the inductor element 100 based on the DC resistance values Rd1 and Rd2, the AC resistance value Ra, and the inductance value L. Further, the processing unit 17 functions as an inspection unit, executes the inspection process 50 shown in FIG. 4, and has an inspection function of inspecting the quality of the inductor element 100 based on the calculated Q value Qc.

Next, refer to the drawings for a processing method for calculating the Q value of the inductor element 100 as a measurement target using the inspection device 1 and an inspection method for inspecting the quality of the inductor element 100 based on the calculated value Qc of the Q value. I will explain.

First, the operation unit 13 is operated to instruct the start of the inspection. At this time, the operation unit 13 outputs an operation signal, and the processing unit 17 executes the inspection process 50 shown in FIG. 4 according to the operation signal. In this inspection process 50, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 supplied to the supply position by the supply device (not shown) to the measurement position P1 shown in FIG. 2 (step 51).

Next, the processing unit 17 controls the first measurement unit 11 to execute the first measurement process (step 52). In this first measurement process, the first measurement unit 11 operates a movement mechanism (not shown) to move the probes 31a to 31d, and as shown in FIG. 2, the terminal of the inductor element 100 conveyed to the measurement position P1. The probes 31a and 31c are brought into contact with 101a, and the probes 31b and 31d are brought into contact with the terminal 101b of the inductor element 100.

Subsequently, the current output unit 11a of the first measurement unit 11 outputs a direct current and supplies it to the inductor element 100 via the probes 31a and 31b. Next, the voltage detection unit 11b of the first measurement unit 11 detects the voltage value between the terminals 101a and 101b via the probes 31c and 31d. Subsequently, the first measuring unit 11 measures the DC resistance value Rd1 of the inductor element 100 based on the detected voltage value and the current value of the supplied DC current. Next, the processing unit 17 stores the measured DC resistance value Rd1 in the storage unit 14.

In this case, in the resistance measurement by the four-terminal method using the four probes 31a to 31d as described above, the influence of the contact resistance generated at the contact portion between the probes 31a to 31d and the terminals 101a and 101b can be sufficiently suppressed. It is possible to measure the DC resistance value Rd1 in which the contact resistance value (hereinafter, also referred to as “contact resistance value Rc”) is not included (or is almost not included).

Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P1 to the measurement position P2 shown in FIG. 3 (step 53).

Next, the processing unit 17 controls the second measurement unit 12 to execute the second measurement process a plurality of times (for example, 10 times) at predetermined time intervals (step 54). In this second measurement process, the second measurement unit 12 operates a movement mechanism (not shown) to move the probes 32a and 32b, and as shown in FIG. 3, the terminal of the inductor element 100 conveyed to the measurement position P2. The probes 32a and 32b are brought into contact with the 101a and 101b, respectively.

Subsequently, the current output unit 12a of the second measurement unit 12 outputs a direct current and supplies it to the inductor element 100 via the probes 32a and 32b. Next, the voltage detection unit 12b of the current output unit 12a detects the voltage value between the terminals 101a and 101b via the probes 32a and 32b. Subsequently, the second measuring unit 12 measures the DC resistance value Rd2 of the inductor element 100 based on the detected voltage value and the current value of the supplied DC current. Further, the processing unit 17 stores the measured DC resistance value Rd2 in the storage unit 14.

In this case, as described above, in the resistance measurement by the two-terminal method using the two probes 32a and 32b, the influence of the contact resistance generated at the contact portion between the probes 32a and 32b and the terminals 101a and 101b cannot be suppressed, so that direct current is used. The resistance value Rd2 includes a contact resistance value Rc.

Next, the processing unit 17 controls the second measurement unit 12 to execute the third measurement process (step 55). In this third measurement process, as shown in FIG. 3, the second measurement unit 12 causes the current output unit 12a to make an alternating current in a state where the probes 32a and 32b are in contact with the terminals 101a and 101b of the inductor element 100, respectively. Is output and supplied to the inductor element 100 via the probes 32a and 32b. Subsequently, the voltage detection unit 12b detects the AC voltage value between the terminals 101a and 101b via the probes 32a and 32b. Next, the second measuring unit 12 determines the inductor element 100 based on the AC voltage value (effective voltage value), the AC current value of the supplied AC current (effective current value), and the phase difference between the AC voltage and the AC current. The AC resistance value Ra and the inductance value L are measured. Subsequently, the processing unit 17 stores the measured AC resistance value Ra and the inductance value L in the storage unit 14.

Next, the processing unit 17 executes the calculation process 70 (step 56). In this calculation process 70, as shown in FIG. 5, the processing unit 17 reads out the DC resistance value Rd2 stored in the storage unit 14, and the fluctuation width Rw1 of each DC resistance value Rd2 (corresponding to the first fluctuation width). ), Specifically, the difference value between the maximum value and the minimum value of each DC resistance value Rd2 is specified (step 71).

Subsequently, the processing unit 17 reads the threshold value Rt1 stored in the storage unit 14 and determines whether or not the fluctuation width Rw1 is equal to or less than the threshold value Rt1 (step 72). In this case, the maximum value and the minimum value of each DC resistance value Rd2 measured by executing the second measurement process a sufficient number of times in a state where the probes 32a and 32b are surely in contact with the terminals 101a and 101b of the good inductor element 100. The difference value from the value (the fluctuation range of each DC resistance value Rd2) is preset as the threshold value Rt1.

When the processing unit 17 determines in step 72 that the fluctuation width Rw1 is equal to or less than the threshold value Rt1 (corresponding to the first state), the processing unit 17 determines that the minimum value (third DC) of each DC resistance value Rd2 read in step 71 is described above. Corresponding to the resistance value, hereinafter also referred to as “DC resistance value Rd2s”) is specified (step 73).

Next, the processing unit 17 reads out the DC resistance value Rd1 stored in the storage unit 14 and calculates the difference value Rm (Rd2s-Rd1) between the DC resistance value Rd2s and the DC resistance value Rd1 (step 74). In this case, as described above, since the DC resistance value Rd2s includes the contact resistance value Rc and the DC resistance value Rd1 does not include the contact resistance value Rc, the difference value Rm corresponds to the contact resistance value Rc. do.

Subsequently, the processing unit 17 reads the set value Rr stored in the storage unit 14 and determines whether or not the difference value Rm is larger than the set value Rr (step 75). In this case, the upper limit of the contact resistance value Rc that normally occurs when the probes 32a and 32b in a good state in which the tip portion is not worn or oxidized is used is preset as the set value Rr.

When the processing unit 17 determines in step 75 that the difference value Rm is larger than the set value Rr, the processing unit 17 reads out the coefficient Kc stored in the storage unit 14 and multiplies the difference value Rm by the coefficient Kc to obtain the correction value Rm. '(Rm × Kc) is calculated (step 76). In this case, the coefficient Kc is arbitrarily defined in the range of 0 or more and 1 or less. By defining the coefficient Kc to 1 (that is, letting the correction value Rm'be the difference value Rm), the AC resistance value Ra described later can be corrected by using the difference value Rm as it is, and the coefficient Kc can be set. By defining it as 0 (that is, setting the correction value Rm'to 0), it is possible not to correct the AC resistance value Ra.

Next, the processing unit 17 reads the AC resistance value Ra stored in the storage unit 14 and executes a correction process of subtracting the correction value Rm'from the AC resistance value Ra to calculate the corrected correction resistance value Ra'. (Step 77). In this case, since the correction value Rm'is a value obtained by multiplying the difference value Rm corresponding to the contact resistance value Rc by the coefficient Kc as described above, the correction value Rm'is subtracted from the AC resistance value Ra. The resistance value corresponding to the contact resistance value Rc or the resistance value smaller than the contact resistance value Rc can be excluded from the AC resistance value Ra.

Subsequently, the processing unit 17 executes the first process of calculating the Q value of the inductor element 100 using the correction resistance value Ra'(step 78). In this case, if the calculated value of the Q value is Qc, the angular frequency of the alternating current in the third measurement process is ω, and the inductance value of the inductor element 100 is L, then Qc = ωL / Ra'.

Here, for example, when the contact state of the probes 32a and 32b with respect to the terminals 101a and 101b of the inductor element 100 is poor (unstable) and the contact resistance value Rc changes with the passage of time, the AC resistance value Ra is measured. Since the time (the time when the third measurement process is executed) and the time when the DC resistance value Rd2 is measured (the time when the second measurement process is executed) are different, the contact resistance value Rc and the AC resistance included in the DC resistance value Rd2 are different. The contact resistance value Rc included in the value Ra will be different. In this case, the AC resistance value Ra is set as the correction value Rm'based on the difference value Rm between the DC resistance value Rd2 including the contact resistance value Rc larger than the contact resistance value Rc included in the AC resistance value Ra and the DC resistance value Rd1. When corrected, the corrected resistance value Ra'after correction by executing the correction process may be smaller than the actual AC resistance value Ra of the inductor element 100 that does not include the contact resistance value Rc, and such correction The calculated Q value Qc of the Q value calculated using the resistance value Ra'is larger than the actual Q value of the inductor element 100. Therefore, in the configuration and method using the DC resistance value Rd2 measured by executing the second measurement process only once, the contact resistance value Rc included in the DC resistance value Rd2 is included in the AC resistance value Ra. When it is larger than Rc, the calculated value Qc of the Q value becomes a value larger than the actual Q value of the inductor element 100, and there is a possibility that the defective inductor element 100 having a small Q value is erroneously determined as a good product.

On the other hand, in this inspection device 1, as described above, when the fluctuation range Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1 and the temporal change of the contact resistance value Rc is small, that is, by executing the correction process. The correction process is executed when the correction resistance value Ra'is unlikely to be smaller than the actual AC resistance value Ra of the inductor element 100. Therefore, in this inspection device 1, the calculated value Qc of the Q value calculated by using the correction resistance value Ra'is larger than the actual Q value of the inductor element 100, and the defective inductor whose Q value is actually small. It is possible to reliably prevent a situation in which the element 100 is erroneously determined as a non-defective product.

On the other hand, when the processing unit 17 determines in step 72 that the fluctuation width Rw1 is larger than the threshold value Rt1, the inductor element uses the AC resistance value Ra before the correction processing without executing steps 73 to 77. The second process of calculating the Q value of 100 is executed (step 78). That is, in this inspection device 1, the fluctuation width Rw1 is larger than the threshold Rt1 corresponding to the fluctuation width of each DC resistance value Rd2 in a state where the probes 32a and 32b are surely in contact with the terminals 101a and 101b of the good inductor element 100. Is large, and when there is a possibility that the correction resistance value Ra'will become smaller than the actual AC resistance value Ra by executing the correction processing, the inductor element 100 uses the AC resistance value Ra without executing the correction processing. The configuration and method for calculating the Q value of the above are adopted.

Further, when the processing unit 17 determines in step 75 described above that the difference value Rm is equal to or less than the set value Rr, the inductor uses the AC resistance value Ra before the correction processing without executing steps 76 and 77. The second process of calculating the Q value of the element 100 is executed (step 78). That is, in this inspection device 1, the fluctuation range Rw1 of each DC resistance value Rd2 is equal to or less than the threshold value Rt1, and the difference value is larger than the set value Rr which is the contact resistance value Rc when the probes 32a and 32b in good condition are used. The correction process is executed only when Rm is larger and it is highly necessary to correct the AC resistance value Ra, and even if the fluctuation width Rw1 is equal to or less than the threshold Rt1, the difference value Rm is equal to or less than the set value Rr and the AC resistance value Ra is calculated. A configuration and method in which the correction process is not executed when the need for correction is low is adopted.

Next, the processing unit 17 stores the calculated Q value Qc in the storage unit 14, displays it on the display unit 15, ends the calculation process 70, and then performs step 57 of the inspection process 50 shown in FIG. Run. In this step 57, the processing unit 17 reads out the calculated value Qc and the reference value Qr stored in the storage unit 14, and compares the calculated value Qc with the reference value Qr. In this case, the processing unit 17 determines that the inductor element 100 is a non-defective product when the calculated value Qc is equal to or greater than the reference value Qr, and determines that the inductor element 100 is a defective product when the calculated value Qc is less than the reference value Qr. Next, the processing unit 17 causes the display unit 15 to display the inspection result (determination result).

Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 58), and ends the inspection process 50.

Next, a configuration and a method in which the processing unit 17 executes the inspection process 50A and the calculation process 70A shown in FIGS. 6 and 7, respectively, instead of the inspection process 50 and the calculation process 70 described above will be described. In the inspection process 50A and the calculation process 70A, duplicate description will be omitted for the steps of performing the same processing as the steps of the inspection process 50 and the calculation process 70.

In the inspection process 50A, after executing the same steps 51A to 54A (see FIG. 6) as in steps 51 to 54 in the inspection process 50, each DC resistance is the same as in step 71 of the calculation process 70 described above. The fluctuation width Rw1 of the value Rd2 is specified (step 55A), and then it is determined whether or not the fluctuation width Rw1 is equal to or less than the threshold value Rt1 in the same manner as in step 72 of the calculation process 70 (step 56A).

When the processing unit 17 determines in step 56A that the fluctuation width Rw1 is equal to or less than the threshold value Rt1, the processing unit 17 controls the second measurement unit 12 in the same manner as in step 55 of the inspection process 50 to execute the third measurement process ( Step 57A), and subsequently, the calculation process 70A shown in FIG. 7 is executed (step 58A). In the calculation process 70A, the processing unit 17 reads out the DC resistance value Rd2 stored in the storage unit 14, and then, as in step 73 of the calculation process 70, the minimum value of each DC resistance value Rd2 (third DC resistance). (Corresponding to the value) is specified (step 71A). Subsequently, steps 72A to 76A similar to steps 74 to 78 of the calculation process 70 are executed to calculate the Q value (execution of the first process).

Next, the processing unit 17 stores the calculated Q value Qc in the storage unit 14, displays it on the display unit 15, ends the calculation process 70A, and then performs step 59A of the inspection process 50A shown in FIG. Run. In this step 59A, the processing unit 17 compares the calculated value Qc with the reference value Qr and executes a process of determining the quality of the inductor element 100 in the same manner as in step 57 of the inspection process 50 described above, and executes an inspection result (determination result). ) Is displayed on the display unit 15. Next, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 60A), and ends the inspection process 50A.

On the other hand, when the processing unit 17 determines in step 56A described above that the fluctuation width Rw1 is larger than the threshold value Rt1, the processing unit 17 does not execute steps 57A to 59A, that is, the third measurement process (step 57A) and the calculation process 70A. The display unit 15 displays (notifies) that the Q value is not calculated and that the pass / fail determination process of the inductor element 100 is not executed without executing the pass / fail determination process (step 59A) of the inductor element 100. 3 Process is executed (step 61A). Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 60A), and ends the inspection process 50A.

In the configuration and method for executing the inspection process 50A, when the fluctuation range Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1 and the temporal change of the contact resistance value Rc is small, that is, the correction resistance value Ra'is executed. Is unlikely to be smaller than the actual AC resistance value Ra of the inductor element 100, the correction process is executed. Therefore, also in this configuration and method, the calculated Q value Qc of the Q value calculated using the correction resistance value Ra'is larger than the actual Q value of the inductor element 100, as in the configuration and method of executing the inspection process 50. It is possible to reliably prevent a situation in which a defective inductor element 100 having a large value and a small Q value is actually erroneously determined to be a good product.

Further, in the configuration and method for executing the inspection process 50A, when the fluctuation width Rw1 is larger than the threshold value Rt1, the third measurement process (step 57A), the calculation process 70A, and the pass / fail determination process of the inductor element 100 (step 59A) are performed. Notify that fact without executing it. Therefore, time for unnecessary processing such that a calculated value Qc larger than the actual Q value of the inductor element 100 is calculated, or a defective inductor element 100 having a small Q value is actually erroneously determined as a non-defective product. Waste is prevented, and the processing time can be shortened accordingly.

Next, a configuration and a method in which the processing unit 17 executes the inspection process 50B and the calculation process 70B shown in FIGS. 8 and 9, respectively, instead of the inspection process 50 and the calculation process 70 described above will be described. In the inspection process 50B and the calculation process 70B, duplicate description will be omitted for the steps of performing the same processing as the steps of the inspection process 50 and the calculation process 70.

In the inspection process 50B, the processing unit 17 executes the calculation process 70B shown in FIG. 9 after executing steps 51B to 55B (see FIG. 8) similar to steps 51 to 55 in the inspection process 50 (step 56B). .. In this calculation process 70B, as shown in the figure, the processing unit 17 reads out each DC resistance value Rd2 stored in the storage unit 14, and the fluctuation width Rw2 of each DC resistance value Rd2 (to the second fluctuation width). (Equivalent) is identified (step 71B). In this case, as an example, the processing unit 17 is the difference between the maximum value and the minimum value of a plurality of (for example, two) DC resistance values Rd2 that are a part of each DC resistance value Rd2 and are adjacent to each other in time. Is executed by changing the combination of the two DC resistance values Rd2.

Next, the processing unit 17 reads the threshold value Rt2 (corresponding to the second threshold value) from the storage unit 14 and determines whether or not the fluctuation range Rw2 equal to or less than the threshold value Rt2 exists (step 72B). In this case, as an example, the DC resistance value Rd2 measured first when the DC resistance value Rd2 is measured at a constant cycle immediately after the probes 32a and 32b are surely brought into contact with the terminals 101a and 101b of the good inductor element 100. A value of 20% of the difference between the DC resistance value Rd2 and the DC resistance value Rd2 measured next is set as the threshold value Rt2. That is, when the terminals 101a and 101b and the probes 32a and 32b are surely in contact with each other and the state stabilizes with the passage of time (the supply state of the direct current supplied to the inductor element 100 via the probes 32a and 32b is changed. The upper limit of the fluctuation range Rw2 in (when stable) is set as the threshold value Rt2.

When the processing unit 17 determines in step 72B that a fluctuation width Rw2 of the threshold value Rt2 or less exists (corresponds to the second state), the DC resistance measured after the fluctuation width Rw2 becomes the threshold value Rt2 or less. The minimum value of the value Rd2 (corresponding to the third DC resistance value) is specified (step 73B). Subsequently, the processing unit 17 executes steps 74B to 78B (see FIG. 9) similar to steps 74 to 78 of the calculation process 70 to calculate the Q value (execution of the first process).

Next, the processing unit 17 stores the calculated Q value Qc in the storage unit 14, displays it on the display unit 15, ends the calculation process 70B, and then performs step 57B of the inspection process 50B shown in FIG. Run. In this step 57B, the processing unit 17 compares the calculated value Qc with the reference value Qr and executes a process of determining the quality of the inductor element 100 in the same manner as in step 57 of the inspection process 50 described above, and executes an inspection result (determination result). ) Is displayed on the display unit 15. Next, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 58B), and ends the inspection process 50B.

On the other hand, when the processing unit 17 determines in step 72B of the above calculation process 70B that the fluctuation width Rw2 equal to or less than the threshold value Rt2 does not exist, the AC resistance value Ra before the correction process is not executed without executing steps 73B to 77B. The second process of calculating the Q value of the inductor element 100 is executed using the above (step 78B). Subsequently, the processing unit 17 stores the calculated Q value Qc in the storage unit 14 and displays it on the display unit 15 to end the calculation process 70B. Similarly, steps 57B and 58B of the inspection process 50B shown in FIG. 8 are executed to end the inspection process 50B.

In the configuration and method for executing the inspection process 50B, after the fluctuation width Rw2 of the DC resistance value Rd2 becomes equal to or less than the threshold value Rt2, that is, the contact state between the terminals 101a and 101b and the probes 32a and 32b is stable. The correction process is executed using the DC resistance value Rd2 measured after that time. Therefore, also in this configuration and method, the calculated Q value Qc of the Q value calculated using the correction resistance value Ra'is the actual Q value of the inductor element 100, as in the configuration and method of executing the inspection processes 50 and 50A. It is possible to reliably prevent a situation in which a defective inductor element 100 having a larger Q value and a smaller Q value is erroneously determined to be a non-defective product.

Further, in the configuration and method of executing the inspection process 50B, when the fluctuation width Rw2 equal to or less than the threshold value Rt2 does not exist, the second process of calculating the Q value of the inductor element 100 using the AC resistance value Ra before the correction process is executed. do. Therefore, in this configuration and method, when the contact state between the terminals 101a and 101b and the probes 32a and 32b is unstable, the Q value of the inductor element 100 is used by using the AC resistance value Ra without executing the correction process. The calculated value Qc of the Q value calculated using the correction resistance value Ra'is larger than the actual Q value of the inductor element 100, and the defective inductor element 100 having a small Q value is actually a good product. It is possible to more reliably prevent a situation in which a misjudgment is made.

Next, a configuration and a method in which the processing unit 17 executes the inspection process 50C and the calculation process 70C shown in FIGS. 10 and 11, respectively, instead of the inspection process 50 and the calculation process 70 described above will be described. In the inspection process 50C and the calculation process 70C, duplicate description will be omitted for the steps of performing the same processing as the steps of the inspection process 50 and the calculation process 70.

In the inspection process 50C, the processing unit 17 executes the same steps 51C to 54C (see FIG. 10) as in steps 51 to 54 in the inspection process 50, and then, in the same manner as in step 71B of the calculation process 70B described above, each DC resistance. The fluctuation width Rw1 of the value Rd2 is specified (step 55C), and then it is determined whether or not the fluctuation width Rw2 of the threshold value Rt2 or less exists in the same manner as in step 72B of the calculation process 70B (step 56C).

When the processing unit 17 determines in step 56C that a fluctuation width Rw2 equal to or less than the threshold value Rt2 exists, the processing unit 17 controls the second measurement unit 12 in the same manner as in step 55 of the inspection process 50 to execute the third measurement process ( Step 57C), then the calculation process 70C shown in FIG. 11 is executed (step 58C). In this calculation process 70C, the processing unit 17 reads out the DC resistance value Rd2 stored in the storage unit 14, and subsequently, after the time when the fluctuation width Rw2 becomes equal to or less than the threshold value Rt2 in the same manner as in step 73B of the calculation process 70B. The minimum value (corresponding to the third DC resistance value) of the DC resistance value Rd2 measured in 1) is specified (step 71C). Next, steps 72C to 76C similar to steps 74 to 78 of the calculation process 70 are executed to calculate the Q value (execution of the first process).

Subsequently, the processing unit 17 stores the calculated Q value Qc in the storage unit 14 and displays it on the display unit 15 to end the calculation process 70C. Similarly, steps 59C and 60C of the inspection process 50C shown in FIG. 10 are executed, and the inspection process 50C is completed.

On the other hand, when the processing unit 17 determines in step 56C described above that the fluctuation width Rw2 equal to or less than the threshold value Rt2 does not exist, the processing unit 17 does not execute steps 57C to 59C, that is, the third measurement process (step 57C), the calculation process. The display unit 15 displays (notifies) that the Q value is not calculated and that the pass / fail determination process of the inductor element 100 is not executed without executing the pass / fail determination process (step 59C) of the 70C and the inductor element 100. The third process is executed (step 61C). Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 60C) in the same manner as in step 58 of the inspection process 50, and ends the inspection process 50C. ..

In the configuration and method for executing the inspection process 50C, after the fluctuation width Rw2 of the DC resistance value Rd2 becomes equal to or less than the threshold value Rt2, that is, the contact state between the terminals 101a and 101b and the probes 32a and 32b is stable. The correction process is executed using the DC resistance value Rd2 measured after that time. Therefore, also in this configuration and method, the calculated value Qc of the Q value calculated using the correction resistance value Ra'is the actual value Qc of the inductor element 100, as in the configuration and method of executing the inspection processes 50, 50A, 50B. It is possible to reliably prevent a situation in which a defective inductor element 100, which has a value larger than the Q value and actually has a small Q value, is erroneously determined as a non-defective product.

Further, in the configuration and method for executing the inspection process 50C, when the fluctuation width Rw2 equal to or less than the threshold value Rt2 does not exist, the third measurement process (step 57C), the calculation process 70C, and the pass / fail determination process of the inductor element 100 (step 59C). In order to notify the fact without executing, a calculated value Qc larger than the actual Q value of the inductor element 100 may be calculated, or a defective inductor element 100 having a small Q value may be erroneously determined as a non-defective product. It is possible to prevent wasting time for unnecessary processing such as the above, and to shorten the processing time accordingly.

As described above, in this processing device, the inspection device 1, and the processing method, the change state of each DC resistance value Rd2 measured by the second measurement processing a plurality of times is specified, and the corrected resistance value Ra corrected for the AC resistance value Ra. The first process of calculating the Q value using', the second process of calculating the Q value using the AC resistance value Ra, and the third process of notifying that the Q value is not calculated without calculating the Q value. Any one of them is executed according to the change state of each DC resistance value Rd2. In this case, when the contact state of the probes 32a and 32b with respect to the terminals 101a and 101b of the inductor element 100 is poor and the contact resistance value Rc changes with the passage of time, the contact resistance value Rc included in the DC resistance value Rd2 becomes. When it is larger than the contact resistance value Rc included in the AC resistance value Ra, the corrected resistance value Ra'corrected by using the DC resistance value Rd2 becomes a value smaller than the actual AC resistance value Ra of the inductor element 100. As a result of the calculated value Qc of the Q value calculated using this correction resistance value Ra'being larger than the actual Q value of the inductor element 100, the defective inductor element 100 having a small Q value is actually used. There is a risk of erroneous judgment as a non-defective product. On the other hand, in this processing device, the inspection device 1, and the processing method, since the first processing, the second processing, and the third processing are used properly according to the change state of each DC resistance value Rd2, the corrected correction resistance value Ra'is set. The calculated value Qc calculated by executing the first process of calculating the Q value using the correction resistance value Ra'only when it is unlikely that the value will be smaller than the actual AC resistance value Ra of the inductor element 100 The value is larger than the actual Q value of the inductor element 100, and it is possible to reliably prevent a situation in which a defective inductor element 100, which actually has a small Q value, is erroneously determined as a good product. Therefore, according to the processing device, the inspection device 1, and the processing method, it is possible to calculate the Q value that can sufficiently improve the inspection accuracy in the quality inspection of the inductor element 100 using the Q value.

Further, in this processing device, the inspection device 1, and the processing method, the first processing is executed when the fluctuation width Rw1 of each DC resistance value Rd2 is equal to or less than the threshold value Rt1, and the second processing is executed when the fluctuation width Rw1 is larger than the threshold value Rt1. Execute the process. Therefore, according to this processing device, the inspection device 1, and the processing method, the fluctuation range Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1, and the temporal change of the contact resistance value Rc is small, so that the correction resistance value is corrected by executing the correction processing. Since the first process is executed only when Ra'is unlikely to be smaller than the actual AC resistance value Ra of the inductor element 100, the calculated value Qc of the Q value calculated using the correction resistance value Ra' Is a value larger than the actual Q value of the inductor element 100, and it is possible to more reliably prevent a situation in which a defective inductor element 100 having a small Q value is actually determined to be a good product.

Further, in this processing device, the inspection device 1, and the processing method, the first processing is executed when the fluctuation width Rw1 of each DC resistance value Rd2 is equal to or less than the threshold value Rt1, and the third processing is executed when the fluctuation width Rw1 is larger than the threshold value Rt1. Execute the process. Therefore, according to this processing device, the inspection device 1, and the processing method, the fluctuation range Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1, and the temporal change of the contact resistance value Rc is small, so that the correction resistance value is corrected by executing the correction processing. Since the first process is executed only when Ra'is unlikely to be smaller than the actual AC resistance value Ra of the inductor element 100, the calculated value Qc of the Q value calculated using the correction resistance value Ra' Is a value larger than the actual Q value of the inductor element 100, and it is possible to more reliably prevent a situation in which a defective inductor element 100 having a small Q value is actually determined to be a good product. Further, according to the processing device, the inspection device 1, and the processing method, when the fluctuation width Rw1 is larger than the threshold value Rt1, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the inductor element 100 are executed. Since the third process is executed without any problem, a calculated value Qc larger than the actual Q value of the inductor element 100 is calculated, or a defective inductor element 100 having a small Q value is erroneously determined as a non-defective product. It is possible to prevent wasting time for unnecessary processing and shorten the processing time accordingly.

Further, according to the processing device, the inspection device 1, and the processing method, the corrected resistance value Ra corrected by using the third DC resistance value by executing the first processing using the minimum value of each DC resistance value Rd2. It is possible to more reliably prevent that'is smaller than the actual AC resistance value Ra of the inductor element 100.

Further, in this processing device, the inspection device 1, and the processing method, after the fluctuation width Rw2, which is the difference between the maximum value and the minimum value of the plurality of DC resistance values Rd2 adjacent to each other in time, becomes the threshold value Rt2 or less. The first process is executed using the measured DC resistance value Rd2, and the second process is executed when the fluctuation width Rw2 does not become equal to or less than the threshold value Rt2. Therefore, according to this processing device, the inspection device 1, and the processing method, the DC resistance value Rd2 measured after the contact state between the terminals 101a and 101b of the inductor element 100 and the probes 32a and 32b is stable in a good state. Since the correction process is executed using the above, the calculated value Qc of the Q value calculated using the correction resistance value Ra'is larger than the actual Q value of the inductor element 100, and the Q value is actually small. It is possible to more reliably prevent the situation where the inductor element 100 is erroneously determined as a non-defective product.

Further, in this processing device, the inspection device 1, and the processing method, after the fluctuation width Rw2, which is the difference between the maximum value and the minimum value of the plurality of DC resistance values Rd2 adjacent to each other in time, becomes the threshold value Rt2 or less. The first process is executed using the measured DC resistance value Rd2, and the third process is executed when the fluctuation width Rw2 does not become equal to or less than the threshold value Rt2. Therefore, according to this processing device, the inspection device 1, and the processing method, the DC resistance value Rd2 measured after the contact state between the terminals 101a and 101b of the inductor element 100 and the probes 32a and 32b is stable in a good state. Since the correction process is executed using the above, the calculated value Qc of the Q value calculated using the correction resistance value Ra'is larger than the actual Q value of the inductor element 100, and the Q value is actually small. It is possible to more reliably prevent the situation where the inductor element 100 is erroneously determined as a non-defective product. Further, according to the processing device, the inspection device 1, and the processing method, when the fluctuation width Rw2 does not become equal to or less than the threshold value Rt2, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the inductor element 100 are performed. Since the third process is executed without being executed, a calculated value Qc larger than the actual Q value of the inductor element 100 may be calculated, or a defective inductor element 100 having a small Q value may be erroneously determined as a good product. It is possible to prevent wasting time for unnecessary processing such as the above, and to shorten the processing time accordingly.

Further, according to the processing device, the inspection device 1, and the processing method, the first processing is executed by using the minimum value of the DC resistance value Rd2 measured after the fluctuation width Rw2 becomes the threshold value Rt2 or less. It is possible to more reliably prevent the corrected resistance value Ra'corrected by using the third DC resistance value from becoming smaller than the actual AC resistance value Ra of the inductor element 100.

Further, in this processing device, the inspection device 1, and the processing method, in the correction processing, the correction value Rm'obtained by multiplying the difference value Rm by a coefficient Kc of 0 or more and 1 or less is subtracted from the AC resistance value Ra to obtain the AC resistance value Ra. To correct. In this case, the correction resistance value Ra'corrected by the correction value Rm'is not smaller than the correction resistance value Ra'corrected by the difference value Rm. Therefore, according to the processing device, the inspection device 1, and the processing method, it is possible to surely prevent the correction resistance value Ra'being smaller than the actual AC resistance value Ra of the inductor element 100. It is possible to more reliably prevent a situation in which the calculated value Qc of the Q value becomes a value larger than the actual Q value.

Further, in this processing device, the inspection device 1, and the processing method, the first process is executed when the difference value Rm is larger than the preset set value Rr, and the second process is executed when the difference value Rm is equal to or less than the set value Rr. (Or, as will be described later, the third process is executed instead of the second process. That is, either the second process or the third process is executed). Therefore, according to the processing device, the inspection device 1, and the processing method, for example, by setting the upper limit value of the contact resistance value Rc that normally occurs when the probes 32a and 32b in good condition are used as the set value Rr. , It is necessary to execute the correction process only when the difference value Rm is larger than the set value Rr and it is highly necessary to correct the AC resistance value Ra, and to correct the AC resistance value Ra when the difference value Rm is equal to or less than the set value Rr. When is low, it is possible not to execute the correction process or to calculate the Q value itself. Therefore, according to this processing device, the inspection device 1, and the processing method, a calculated value Qc larger than the actual Q value is calculated by executing the correction processing that is less necessary, and the defective inductor element having a small Q value is actually calculated. It is possible to reliably prevent a situation in which 100 is erroneously determined as a non-defective product.

The processing device, the inspection device 1, and the processing method are not limited to the above configurations and methods. For example, the example in which the minimum value of the target DC resistance value Rd2 is used as the third DC resistance value has been described above, but it is also possible to adopt a configuration and method in which the average value of the target DC resistance value Rd2 is used as the third DC resistance value. can.

Further, although the example in which the difference between the maximum value and the minimum value of the two DC resistance values Rd2 adjacent to each other in time is set to the fluctuation width Rw2 is described above, the three or more DC resistance values Rd2 adjacent to each other in time It is also possible to adopt a configuration and method in which the difference between the maximum value and the minimum value is the fluctuation range Rw2.

Further, the example described above in which the first process is executed when the difference value Rm is larger than the set value Rr and the second process is executed when the difference value Rm is equal to or less than the set value Rr has been described above, but the difference value Rm is the set value. It is also possible to adopt a configuration and method in which the third process is executed instead of the second process when the value is Rr or less.

Further, in the calculation process 70, the correction value Rm'is calculated by multiplying the difference value Rm by the coefficient Kc, and the AC resistance value Ra is corrected by the correction value Rm'. It is also possible to adopt a configuration and a method of correcting the AC resistance value Ra by using the difference value Rm as it is.

Further, in the calculation processes 70 to 70C, the configuration and method of determining whether or not the difference value Rm is larger than the set value Rr and executing the correction process only when the difference value Rm is larger than the set value Rr are described above. However, it is also possible to adopt a configuration and method in which the correction process is always executed without performing the determination process.

Further, although the example applied to the inspection device 1 provided with the conveying mechanism 16 and automatically conveying the inductor element 100 has been described above, the inspection device for inspecting the inductor element 100 manually conveyed without the conveying mechanism 16 It can also be applied. Further, an example in which the first measuring unit 11 and the second measuring unit 12 are provided with a moving mechanism and the probes 31a to 31d and the probes 32a and 32b are brought into contact with the terminals 101a and 101b of the inductor element 100 by the moving mechanism has been described above. It is also possible to adopt a configuration and method in which the probes 31a to 31d and the probes 32a and 32b are manually brought into contact with the terminals 101a and 101b.

Further, although the example applied to the inspection device 1 that inspects the inductor element 100 based on the Q value has been described above, it can also be applied to a processing device that does not have an inspection function (has only a function of calculating the Q value). can.

Further, the measurement target is not limited to the above-mentioned inductor element 100, and various electronic components that use the Q value for the quality inspection can be the measurement target.

1 Inspection device 11 1st measurement unit 12 2nd measurement unit 17 Processing unit 100 Inductor element Kc coefficient L Inductance value Qc Calculated value Ra AC resistance value Ra'Correction resistance value Rd1 DC resistance value Rd2 DC resistance value Rd2s DC resistance value Rm Difference Value Rr Set value Rt1 Threshold Rt2 Threshold Rw1 Fluctuation width Rw2 Fluctuation width

Claims (11)

The first measuring unit that executes the first measurement process that measures the DC resistance value of the measurement target as the first DC resistance value by the 4-terminal method, and the DC resistance value of the measurement target as the second DC resistance value by the 2-terminal method. The second measurement unit that executes the second measurement process to be measured and the third measurement process to measure the AC resistance value and the inductance value of the measurement target by the two-terminal method, the first DC resistance value, and the second DC A processing device including a processing unit capable of executing a process of calculating the Q value of the measurement target based on the resistance value, the AC resistance value, and the inductance value.
The second measurement unit executes the second measurement process a plurality of times.
The processing unit identifies the change state of each of the second DC resistance values measured by each of the second measurement processes, and also defines the third DC resistance value and the first DC resistance value defined based on the second DC resistance value. The first process of calculating the Q value using the corrected resistance value obtained by executing the correction process of correcting the AC resistance value using the difference value from the DC resistance value, and the Q using the AC resistance value. A processing device that executes any one of a second process of calculating a value and a third process of notifying that the Q value is not calculated without calculating the Q value according to the change state. The processing unit is in the first state where the first fluctuation width, which is the difference between the maximum value and the minimum value of each of the second DC resistance values as the change state, is equal to or less than a preset first threshold value. Claim 1 that defines the third DC resistance value based on each second DC resistance value, executes the first process, and executes the second process when the first fluctuation range is larger than the threshold value. The processing device described. The processing unit is in the first state where the first fluctuation width, which is the difference between the maximum value and the minimum value of each of the second DC resistance values as the change state, is equal to or less than a preset first threshold value. Claim 1 that defines the third DC resistance value based on each second DC resistance value, executes the first process, and executes the third process when the first fluctuation range is larger than the threshold value. The processing device described. The processing apparatus according to any one of claims 1 to 3, wherein the processing unit defines the minimum value of each of the second DC resistance values as the third DC resistance value. The processing unit is a part of each of the second DC resistance values as the changed state, and is a second variation which is a difference between the maximum value and the minimum value of a plurality of second DC resistance values adjacent to each other in time. The first process is executed by defining the third DC resistance value based on the second DC resistance value measured after the second state in which the width is equal to or less than the preset second threshold value. The processing apparatus according to claim 1, wherein the second processing is executed when the second state is not reached by the end of the plurality of second measurement processes by the second measuring unit. The processing unit is a part of each of the second DC resistance values as the changed state, and is a second variation which is a difference between the maximum value and the minimum value of a plurality of second DC resistance values adjacent to each other in time. The first process is executed by defining the third DC resistance value based on the second DC resistance value measured after the second state in which the width is equal to or less than the preset second threshold value. The processing apparatus according to claim 1, wherein the third processing is executed when the second state is not reached by the end of the plurality of second measurement processes by the second measuring unit. The processing apparatus according to claim 5 or 6, wherein the processing unit defines the minimum value of the second DC resistance value measured after the second state is reached as the third DC resistance value. The processing unit corrects the AC resistance value by subtracting a value obtained by multiplying the difference value by a predetermined coefficient of 0 or more and 1 or less from the AC resistance value in the correction processing. The processing apparatus according to any one of. The processing unit executes the first process when the difference value is larger than a preset set value, and when the difference value is equal to or less than the set value, either the second process or the third process. The processing apparatus according to any one of claims 1 to 8, wherein one is executed. An inspection device including the processing device according to any one of claims 1 to 9 and an inspection unit that inspects the quality of the measurement target based on the Q value calculated by the processing device. The first measurement process of measuring the DC resistance value of the measurement target as the first DC resistance value by the 4-terminal method, the second measurement process of measuring the DC resistance value of the measurement target as the second DC resistance value by the 2-terminal method, and A third measurement process is executed in which the AC resistance value and the inductance value of the measurement target are measured by the two-terminal method, respectively, and based on the first DC resistance value, the second DC resistance value, the AC resistance value, and the inductance value. This is a processing method for executing the process of calculating the Q value of the measurement target.
The second measurement process is executed a plurality of times,
The change state of each of the second DC resistance values measured by each of the second measurement processes is specified, and the third DC resistance value and the first DC resistance value defined based on the second DC resistance value are The first process of calculating the Q value using the corrected resistance value obtained by executing the correction process of correcting the AC resistance value using the difference value, and the calculation of the Q value using the AC resistance value. A processing method in which any one of two processes and a third process for notifying that the Q value is not calculated without calculating the Q value is executed according to the change state.

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