JP6643823B2 - 化粧シートおよび化粧シートの製造方法 - Google Patents
化粧シートおよび化粧シートの製造方法 Download PDFInfo
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- JP6643823B2 JP6643823B2 JP2015136847A JP2015136847A JP6643823B2 JP 6643823 B2 JP6643823 B2 JP 6643823B2 JP 2015136847 A JP2015136847 A JP 2015136847A JP 2015136847 A JP2015136847 A JP 2015136847A JP 6643823 B2 JP6643823 B2 JP 6643823B2
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- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
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- 150000002632 lipids Chemical class 0.000 description 1
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- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
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- 239000000395 magnesium oxide Substances 0.000 description 1
- VIALJPAGUCTUBQ-UHFFFAOYSA-L magnesium;12-hydroxyoctadecanoate Chemical compound [Mg+2].CCCCCCC(O)CCCCCCCCCCC([O-])=O.CCCCCCC(O)CCCCCCCCCCC([O-])=O VIALJPAGUCTUBQ-UHFFFAOYSA-L 0.000 description 1
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- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
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- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- FEUQNCSVHBHROZ-UHFFFAOYSA-N ricinoleic acid Natural products CCCCCCC(O[Si](C)(C)C)CC=CCCCCCCCC(=O)OC FEUQNCSVHBHROZ-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
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- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- NRHMKIHPTBHXPF-TUJRSCDTSA-M sodium cholate Chemical compound [Na+].C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC([O-])=O)C)[C@@]2(C)[C@@H](O)C1 NRHMKIHPTBHXPF-TUJRSCDTSA-M 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
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- 229940083466 soybean lecithin Drugs 0.000 description 1
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- 150000003408 sphingolipids Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- VQOXUMQBYILCKR-UHFFFAOYSA-N tridecaene Natural products CCCCCCCCCCCC=C VQOXUMQBYILCKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- DCXXMTOCNZCJGO-UHFFFAOYSA-N tristearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC DCXXMTOCNZCJGO-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- QYSXJUFSXHHAJI-YRZJJWOYSA-N vitamin D3 Chemical compound C1(/[C@@H]2CC[C@@H]([C@]2(CCC1)C)[C@H](C)CCCC(C)C)=C\C=C1\C[C@@H](O)CCC1=C QYSXJUFSXHHAJI-YRZJJWOYSA-N 0.000 description 1
- 235000005282 vitamin D3 Nutrition 0.000 description 1
- 239000011647 vitamin D3 Substances 0.000 description 1
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- 239000003021 water soluble solvent Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Landscapes
- Laminated Bodies (AREA)
Description
実施例1においては、分散剤として12−ヒドロキシステアリン酸マグネシウムを用いた分散剤内包ベシクル、無機フィラーとして平均粒子径2.0μmの炭酸カルシウムを高密度ポリエチレンと同重量で配合した樹脂組成物に対して、2軸延伸加工を施した厚さ100μmの原反層2を具備する化粧シート1とした。
実施例2においては、MFR(メルトフローレート)が0.8g/10min(190℃)の高密度ポリエチレン(ハイゼックス5305E;プライムポリマー社製)50重量%に対して、分散剤として12−ヒドロキシステアリン酸マグネシウムを用いた分散剤内包ベシクル、無機フィラーとして平均粒子径2.0μmの炭酸カルシウム50重量%を配合した樹脂組成物に対して、2軸延伸加工を施した厚さ200μmの原反層2を具備する化粧シート1とした。その他の構成については、実施例1と同様である。
比較例1においては、MFR(メルトフローレート)が0.8g/10min(190℃)の高密度ポリエチレン(ハイゼックス5305E;プライムポリマー社製)50重量%に対して、分散剤として12−ヒドロキシステアリン酸マグネシウムを用いた分散剤リポソーム、無機フィラーとして平均粒子径2.0μmの炭酸カルシウム50重量%を配合した樹脂組成物に対して、2軸延伸加工を施さない厚さ100μmの原反層2を具備する化粧シート1とした。その他の構成については、実施例1と同様である。
比較例2においては、MFR(メルトフローレート)が0.8g/10min(190℃)の高密度ポリエチレン(ハイゼックス5305E;プライムポリマー社製)50重量%に対して、分散剤を添加せず、無機フィラーとして平均粒子径2.0μmの炭酸カルシウム50重量%を配合した樹脂組成物に対して、2軸延伸加工を施さない厚さ100μmの原反層2を具備する化粧シート1とした。その他の構成については、実施例1と同様である。
<引張試験>
つかみ具距離:90mm
引張速度:50mm/min
<デュポン衝撃試験>
500gおよび1000gの錘を50cmの高さから自由落下させて、その際の落下点の亀裂・割れの有無による点衝撃強度を判定する。
<キャスター試験>
各化粧シート1を基材Bとしての中質繊維板(MDF)の表面にそれぞれ貼り付け、鉄車輪25kgを用いて、化粧シート1の上から10cmの距離を1000往復させ、その際に基材BとしてのMDFに対して凹みが認められたか否かを判定する。
<Vカット曲げ加工適性試験>
温度条件:常温(25℃)
曲げ角度:90度
<表1の記号の説明>
(デュポン衝撃試験)
○:亀裂・割れなどの損傷が生じなかった
×:顕著な亀裂・割れが生じた
(キャスター試験)
○:MDFに凹みは認められなかった
×:MDFに顕著な凹みが認められた
(Vカット曲げ加工適正試験)
○:白化・亀裂などが認められなかった
×:化粧シートとして容認できない白化・亀裂が認められた
2 原反層
3 絵柄模様層
4 透明樹脂層
4a エンボス模様
5 トップコート層
6 プライマー層
7 接着層
8 隠蔽層
B 基材
Claims (5)
- 複数の樹脂層からなり、
前記樹脂層のうちの1層が、ポリオレフィン系樹脂を主成分として無機フィラーが50〜70重量%の割合で添加された樹脂組成物から構成され1軸延伸加工または2軸延伸加工が施された厚さ100〜300μmの原反層
とされた化粧シートであって、
前記原反層は、前記樹脂組成物に、さらに超臨界逆相蒸発法によってベシクルに分散剤を内包させた分散剤内包ベシクルを添加して形成したことを特徴とする化粧シート。 - 前記樹脂組成物には、顔料が添加されていることを特徴とする請求項1に記載の化粧シート。
- 前記ポリオレフィン系樹脂が、ポリエチレンもしくはポリプロピレンであることを特徴とする請求項1または請求項2に記載の化粧シート。
- 前記無機フィラーが、炭酸カルシウムであることを特徴とする請求項1乃至請求項3のいずれか1項に記載の化粧シート。
- 複数の樹脂層からなる化粧シートの製造方法であって、
前記樹脂層のうちの1層を、主成分とするポリオレフィン系樹脂に50〜70重量%の割合で無機フィラーを添加するとともに超臨界逆相蒸発法によってベシクルに分散剤を内包させた分散剤内包ベシクルを添加して形成した樹脂組成物に対して、1軸延伸加工または2軸延伸加工を施した厚さ100〜300μmの原反層として形成することを特徴とする化粧シートの製造方法。
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