JP6495816B2 - エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法 - Google Patents
エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法 Download PDFInfo
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- JP6495816B2 JP6495816B2 JP2015503319A JP2015503319A JP6495816B2 JP 6495816 B2 JP6495816 B2 JP 6495816B2 JP 2015503319 A JP2015503319 A JP 2015503319A JP 2015503319 A JP2015503319 A JP 2015503319A JP 6495816 B2 JP6495816 B2 JP 6495816B2
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- 238000012682 free radical photopolymerization Methods 0.000 description 1
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- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
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- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
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- 230000000977 initiatory effect Effects 0.000 description 1
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- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 230000001617 migratory effect Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002848 norbornenes Chemical class 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
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- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
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- 150000004053 quinones Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 239000006254 rheological additive Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- GHAKYKGFKFZYSJ-UHFFFAOYSA-N sulfonylmethanone Chemical class O=C=S(=O)=O GHAKYKGFKFZYSJ-UHFFFAOYSA-N 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
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- 238000012719 thermal polymerization Methods 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
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- 230000000007 visual effect Effects 0.000 description 1
- QYSXJUFSXHHAJI-YRZJJWOYSA-N vitamin D3 Chemical compound C1(/[C@@H]2CC[C@@H]([C@]2(CCC1)C)[C@H](C)CCCC(C)C)=C\C=C1\C[C@@H](O)CCC1=C QYSXJUFSXHHAJI-YRZJJWOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Description
エラストマーバインダー:60〜95部
粒子状物質:5〜40部
第2のバインダー:0〜40部
染料:0〜5部
モノマー(任意選択):0〜20部
光開始剤(任意選択):0〜10部
約65%のVector 4111A、15%のPolyoil、15.75%のHMDA、2%の光開始剤、および2.25%の従来の添加剤(すなわち、酸化防止剤、熱防止剤(thermal inhibitor)、着色染料、およびUV吸収染料)の光重合性混合物を混合した。混合物を押出成形し、カレンダー加工して、5ミル(0.013cm)の支持体および5ミル(0.013cm)ケイ素被覆PETカバーシートである2つのポリエチレンテレフタレート(PET)フィルムの間に光重合性層を有する光重合性要素を形成した。これらの予備的感光性要素は、後述のようにさらに使用するために保管した。
D(s)=ベタの濃度、またはD−Max、
D(b)=フィルムベースの濃度
比較例2の別の実験において、エラストマー組成物の層中に含まれる粒子状物質が平均粒度が11μであり屈折率が1.52であるSpheriglass A5000であったことを除けば、実施例1〜5および比較例1に記載の手順と同じ手順で印刷プレートを作製した。前述と同じプレスおよび同じ設定を使用したが、別の機会に印刷した場合、以下の結果が得られた。
なお、本発明は、特許請求の範囲を含め、以下の発明を包含する。
1.印刷版原版であって:
a)化学線に対して感受性である光重合性組成物の層であって、前記組成物がバインダー、モノマー、および光開始剤を含む層と;
b)前記化学線に対して感受性である、または感受性となるエラストマー組成物の層であって、少なくともエラストマーバインダー、および粒子状物質を含み、前記エラストマー組成物がある屈折率を有し;
前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され、前記粒子状物質が、平均直径1〜10ミクロンを有し、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する層と;
c)前記光重合性層a)とは反対側の前記エラストマー層b)の上に存在する、隣接する、または上方に配置され、in−situマスクを形成可能な化学線不透明層と、
を含む、印刷版原版。
2.前記粒子の99.7%が1〜10ミクロンの範囲内となる粒度分布を前記粒子状物質が有する、1に記載の印刷版原版。
3.前記粒子状物質の2%未満が10ミクロンを超える粒度を有する、1に記載の印刷版原版。
4.前記粒子状物質の0.5%未満が10ミクロンを超える粒度を有する、1に記載の印刷版原版。
5.前記粒子状物質の平均直径が2〜9ミクロンである、1に記載の印刷版原版。
6.前記粒子状物質の平均直径が5〜8ミクロンである、1に記載の印刷版原版。
7.前記粒子状物質がポリアミドである、1に記載の印刷版原版。
8.前記粒子状物質がポリメチルメタクリレートである、1に記載の印刷版原版。
9.前記粒子状物質が長石である、1に記載の印刷版原版。
10.前記粒子状物質が霞石閃長岩である、1に記載の印刷版原版。
11.前記ガラス粒子状物質がソーダ石灰ガラスである、1に記載の印刷版原版。
12.前記粒子状物質が霞石閃長岩である、1に記載の印刷版原版。
13.前記粒子状物質が前記エラストマー組成物の5〜40重量%である、1に記載の印刷版原版。
14.前記粒子状物質が前記エラストマー組成物の15〜35重量%であり、前記エラストマーバインダーが前記エラストマー組成物の85〜65重量%である、1に記載の印刷版原版。
15.前記エラストマーバインダーが、エラストマーブロックと非エラストマーブロックとを含む熱可塑性ブロックコポリマーから選択される、1に記載の印刷版原版。
16.前記エラストマー組成物が1.52〜1.54の屈折率を有し、前記粒子状物質が1.48〜1.58の屈折率を有する、1に記載の印刷版原版。
17.前記エラストマー組成物中の前記バインダーが、前記光重合性組成物中の前記バインダーと同じ場合も異なる場合もある、1に記載の印刷版原版。
18.前記エラストマー層が1〜10ミルの厚さを有する、1に記載の印刷版原版。
19.凸版印刷版の製造方法であって:
I)印刷版原版であって:
a)化学線に対して感受性である光重合性組成物の層であって、前記組成物がバインダー、モノマー、および光開始剤を含む層と;
b)前記化学線に対して感受性である、または感受性となるエラストマー組成物の層であって、少なくともエラストマーバインダー、および粒子状物質を含み、前記エラストマー組成物がある屈折率を有し;前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され、前記粒子状物質が、平均直径1〜10ミクロンを有し、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する層と;
c)前記光重合性層a)とは反対側の前記エラストマー層b)の上に存在する、隣接する、または上方に配置され、in−situマスクを形成可能な化学線不透明層と、
を含む、印刷版原版を提供するステップと、
II)前記化学線不透明層をレーザー放射線に像様露光することによってin−situマスクを形成するステップと;
III)前記in−situマスクを介して、ステップII)の前記原版を化学線に全面露光して、前記光重合性層および前記エラストマー層の中に重合部分および未重合部分を形成するステップと;
IV)III)の前記原版を処理することで未重合部分を除去して、印刷に好適なレリーフ表面を形成するステップと、を含む方法。
20.前記処理ステップIV)が、
IV1)溶剤溶液、水溶液、半水性溶液、および水からなる群から選択される少なくとも1種類のウォッシュアウト溶液を用いて処理するステップ;または
IV2)前記未重合部分を溶融、流動、または軟化させるのに十分な温度まで要素を加熱して、前記未重合部分を除去するステップ、
から選択される、19に記載の方法。
21.前記in−situマスクを介した前記原版の化学線への前記全面露光が、大気酸素の存在下で行われる、19に記載の方法。
22.前記in−situマスクを介した前記原版の化学線への前記全面露光が、不活性ガスを含み酸素濃度が190,000〜100ppmである環境中で行われる、19に記載の方法。
23.19に記載の方法により製造された凸版印刷版。
24.印刷プレート原版の形成方法であって:
A)化学線不透明材料の層を一時的なカバーシートの上に塗布することと;エラストマー組成物の層を前記化学線不透明層の上または隣接して塗布することとを含み、前記エラストマー組成物が、化学線に対して感受性である、または感受性となり、少なくともエラストマーバインダーおよび粒子状物質を含む、多層カバー要素を形成するステップと;
B)化学線に対して感受性であり、バインダー、モノマー、および光開始剤を含む光重合性組成物の層を、前記エラストマー層が前記光重合性層に接触するように、支持体と前記多層カバー要素との間に形成するステップとを含み;
前記エラストマー組成物がある屈折率を有し、前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され;
前記粒子状物質が、平均直径1〜10ミクロンを有し、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する、方法。
25.凸版印刷版の製造方法であって:
I)印刷版原版であって、
a)化学線に対して感受性である光重合性組成物の層であって、前記組成物がバインダー、モノマー、および光開始剤を含む層と;
b)前記化学線に対して感受性である、または感受性となるエラストマー組成物の層であって、少なくともエラストマーバインダー、および粒子状物質を含み、前記エラストマー組成物がある屈折率を有し;前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され、前記粒子状物質が、平均直径1〜10ミクロンを有し、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する層と;
c)前記光重合性層a)とは反対側の前記エラストマー層b)の上に存在する、隣接する、または上方に配置され、in−situマスクを形成可能な化学線不透明層と、
を含む、印刷版原版の前記化学線不透明層をレーザー放射線に像様露光することによってin−situマスクを形成するステップと:
II)前記in−situマスクを介して、ステップI)の前記原版に化学線を全面露光することによって、前記光重合性層および前記エラストマー層の中に重合部分および未重合部分を形成するステップと;
III)II)の前記原版を処理することで未重合部分を除去して、印刷に好適なレリーフ表面を形成するステップと、を含む方法。
Claims (4)
- 印刷版原版であって:
a)化学線に対して感受性である光重合性組成物の層であって、前記組成物がバインダー、モノマー、および光開始剤を含む層と;
b)エラストマー組成物の層であって、少なくともエラストマーバインダー、および粒子状物質を含み、前記エラストマー組成物が、ある屈折率を有し且つ前記化学線に対して感受性であり;前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され、前記粒子状物質が、平均直径1〜10ミクロンを有し、且つ、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する層と;
c)前記光重合性組成物の層a)とは反対側の前記エラストマー組成物の層b)の上に存在する、隣接する、または上方に配置される、in−situマスクを形成可能な化学線不透明層と、
を含む、印刷版原版。 - 凸版印刷版の製造方法であって:
I)印刷版原版であって:
a)化学線に対して感受性である光重合性組成物の層であって、前記組成物がバインダー、モノマー、および光開始剤を含む層と;
b)エラストマー組成物の層であって、少なくともエラストマーバインダー、および粒子状物質を含み、前記エラストマー組成物が、ある屈折率を有し且つ前記化学線に対して感受性であり;前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され、前記粒子状物質が、平均直径1〜10ミクロンを有し、且つ、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する層と;
c)前記光重合性組成物の層a)とは反対側の前記エラストマー組成物の層b)の上に存在する、隣接する、または上方に配置される、in−situマスクを形成可能な化学線不透明層と、
を含む、印刷版原版を提供するステップと、
II)前記化学線不透明層をレーザー放射線に像様露光することによってin−situマスクを形成するステップと;
III)前記in−situマスクを介して、ステップII)の前記原版を化学線に全面露光して、前記光重合性組成物の層および前記エラストマー組成物の層の中に重合部分および未重合部分を形成するステップと;
IV)III)の前記原版を処理することで未重合部分を除去して、印刷に好適なレリーフ表面を形成するステップと、を含む方法。 - 印刷版原版の形成方法であって:
A)化学線不透明材料の層を一時的なカバーシートの上に塗布することと;エラストマー組成物の層を、前記化学線不透明層の上に塗布する、または、前記化学線不透明層に隣接して塗布することとを含み、前記エラストマー組成物が、化学線に対して感受性である、少なくともエラストマーバインダーおよび粒子状物質を含む、多層カバー要素を形成するステップと;
B)化学線に対して感受性であり、バインダー、モノマー、および光開始剤を含む光重合性組成物の層を、前記エラストマー組成物の層が前記光重合性組成物の層に接触するように、支持体と前記多層カバー要素との間に形成するステップとを含み;
前記エラストマー組成物がある屈折率を有し、前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され;
前記粒子状物質が、平均直径1〜10ミクロンを有し、且つ、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する、方法。 - 凸版印刷版の製造方法であって:
I)印刷版原版であって、
a)化学線に対して感受性である光重合性組成物の層であって、前記組成物がバインダー、モノマー、および光開始剤を含む層と;
b)エラストマー組成物の層であって、少なくともエラストマーバインダー、および粒子状物質を含み、前記エラストマー組成物が、ある屈折率を有し且つ前記化学線に対して感受性であり;前記粒子状物質が、ポリアミド、ポリメチルメタクリレート、長石、霞石閃長岩、またはガラスの粒子から選択され、前記粒子状物質が、平均直径1〜10ミクロンを有し、且つ、前記エラストマー組成物の前記屈折率の±0.04である屈折率を有する層と;
c)前記光重合性組成物の層a)とは反対側の前記エラストマー組成物の層b)の上に存在する、隣接する、または上方に配置される、in−situマスクを形成可能な化学線不透明層と、
を含む、印刷版原版の前記化学線不透明層をレーザー放射線に像様露光することによってin−situマスクを形成するステップと:
II)前記in−situマスクを介して、ステップI)の前記原版に化学線を全面露光することによって、前記光重合性組成物の層および前記エラストマー組成物の層の中に重合部分および未重合部分を形成するステップと;
III)II)の前記原版を処理することで未重合部分を除去して、印刷に好適なレリーフ表面を形成するステップと、を含む方法。
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PCT/US2013/031860 WO2013148299A2 (en) | 2012-03-27 | 2013-03-15 | Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
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US20130255513A1 (en) | 2013-10-03 |
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