JP6370852B2 - ジスルホニルアミド塩の顆粒または粉末 - Google Patents
ジスルホニルアミド塩の顆粒または粉末 Download PDFInfo
- Publication number
- JP6370852B2 JP6370852B2 JP2016183498A JP2016183498A JP6370852B2 JP 6370852 B2 JP6370852 B2 JP 6370852B2 JP 2016183498 A JP2016183498 A JP 2016183498A JP 2016183498 A JP2016183498 A JP 2016183498A JP 6370852 B2 JP6370852 B2 JP 6370852B2
- Authority
- JP
- Japan
- Prior art keywords
- mass
- granule
- parts
- solvent
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000008187 granular material Substances 0.000 title claims description 52
- 239000000843 powder Substances 0.000 title claims description 42
- 150000003839 salts Chemical class 0.000 title description 9
- 150000001875 compounds Chemical class 0.000 claims description 23
- 239000013557 residual solvent Substances 0.000 claims description 17
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 claims description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 60
- 238000000034 method Methods 0.000 description 27
- 239000002904 solvent Substances 0.000 description 26
- 239000000243 solution Substances 0.000 description 20
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 19
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 19
- MHEBVKPOSBNNAC-UHFFFAOYSA-N potassium;bis(fluorosulfonyl)azanide Chemical compound [K+].FS(=O)(=O)[N-]S(F)(=O)=O MHEBVKPOSBNNAC-UHFFFAOYSA-N 0.000 description 16
- -1 alkali metal salts Chemical class 0.000 description 15
- 238000002425 crystallisation Methods 0.000 description 14
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 11
- 230000008025 crystallization Effects 0.000 description 9
- 239000002608 ionic liquid Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000003792 electrolyte Substances 0.000 description 8
- 150000008282 halocarbons Chemical class 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000008151 electrolyte solution Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 3
- 229910003002 lithium salt Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000012452 mother liquor Substances 0.000 description 3
- PVMUVDSEICYOMA-UHFFFAOYSA-N n-chlorosulfonylsulfamoyl chloride Chemical compound ClS(=O)(=O)NS(Cl)(=O)=O PVMUVDSEICYOMA-UHFFFAOYSA-N 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 238000001291 vacuum drying Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000007561 laser diffraction method Methods 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 159000000002 lithium salts Chemical class 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- 235000003270 potassium fluoride Nutrition 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 1
- UJIGKESMIPTWJH-UHFFFAOYSA-N 1,3-dichloro-1,1,2,2,3-pentafluoropropane Chemical compound FC(Cl)C(F)(F)C(F)(F)Cl UJIGKESMIPTWJH-UHFFFAOYSA-N 0.000 description 1
- VAYTZRYEBVHVLE-UHFFFAOYSA-N 1,3-dioxol-2-one Chemical compound O=C1OC=CO1 VAYTZRYEBVHVLE-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 208000033962 Fontaine progeroid syndrome Diseases 0.000 description 1
- 229910015015 LiAsF 6 Inorganic materials 0.000 description 1
- 229910013063 LiBF 4 Inorganic materials 0.000 description 1
- 229910013684 LiClO 4 Inorganic materials 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- 229910012424 LiSO 3 Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical class C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical class C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- WRJWRGBVPUUDLA-UHFFFAOYSA-N chlorosulfonyl isocyanate Chemical compound ClS(=O)(=O)N=C=O WRJWRGBVPUUDLA-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000004503 fine granule Substances 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 150000004693 imidazolium salts Chemical class 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 229940006487 lithium cation Drugs 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical class FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000005009 perfluoropropyl group Chemical group FC(C(C(F)(F)F)(F)F)(F)* 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/086—Compounds containing nitrogen and non-metals and optionally metals containing one or more sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
- C01B21/093—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms containing also one or more sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/48—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0568—Liquid materials characterised by the solutes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0561—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
- H01M10/0563—Liquid materials, e.g. for Li-SOCl2 cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Secondary Cells (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本願は、2013年11月18日に日本に出願された特願2013−237991号に基づき優先権を主張し、その内容をここに援用する。
本発明の目的は、このような要求に応え得る、電解質などに好適なジスルホニルアミド塩の顆粒または粉末、およびその製造方法を提供することである。
〔1〕式〔I〕で表される化合物からなる、モード径が80μm以下である、顆粒または粉末。
〔2〕モード径が5μm以上80μm以下である〔1〕に記載の顆粒または粉末。
〔3〕式〔I〕で表される化合物からなる、メディアン径が45μm以下である、顆粒または粉末。
〔4〕メディアン径が5μm以上45μm以下である〔3〕に記載の顆粒または粉末。
〔5〕式〔I〕で表される化合物からなる、(モード径)/(メディアン径)の比が1.7以下である、顆粒または粉末。
〔6〕残留溶媒が1500ppm以下である〔1〕〜〔5〕のいずれかひとつに記載の顆粒または粉末。
〔7〕残留溶媒が800ppm以下である〔1〕〜〔5〕のいずれかひとつに記載の顆粒または粉末。
〔8〕R1およびR2がフッ素原子である〔1〕〜〔7〕のいずれかひとつに記載の顆粒または粉末。
〔9〕前記〔1〕〜〔8〕のいずれかひとつに記載の顆粒または粉末を溶解してなる電解液。
〔10〕式〔I〕で表される化合物を含むエステル系溶媒溶液を、ハロゲン化炭化水素系溶媒に添加することによる晶析工程を含む、〔1〕〜〔8〕のいずれかひとつに記載の顆粒または粉末の製造方法。
〔11〕前記のエステル系溶媒溶液は、式〔I〕で表される化合物の濃度が20質量%以上90質量%以下である、〔10〕に記載の顆粒または粉末の製造方法。
装置: 島津製作所社製 GCMS−QP2010 plus、GC−2010、パーキンエルマ社製 Turbo Matrix40
カラム: HP−5(長さ:30m、カラム内径:0.53mm、膜厚:0.25μm)(アジレント社製)
カラム温度条件: 50℃(0分保持)、5℃/分で100℃まで昇温(0分保持)
ヘッドスペース条件: バイアル温度70℃(20分保持)、ニードル温度100℃、トランスファライン温度150℃
キャリアガス: ヘリウム、80kPa
インターフェース温度: 230℃
イオン源: EI
イオン源温度: 200℃
測定モード: SIM(ターゲットイオンm/z72、確認イオンm/z71)
(ジ(クロロスルホニル)アミドの合成)
攪拌器、温度計および還流管を取り付けた反応容器に、クロロスルホン酸123.9質量部、およびクロロスルホニルイソシアネート98.1質量部を仕込んだ。この混合液を撹拌しながら、2.5時間かけて130℃まで昇温し、次いで130℃で9時間反応させた。その後、減圧蒸留を行って98.5℃〜101℃/4.2torrの留分を分取した。ジ(クロロスルホニル)アミドが無色透明な液状物として77.9質量部得られた。
(ジ(フルオロスルホニル)アミドアンモニウム塩の合成)
フッ素樹脂製反応容器に、合成例1で得られたジ(クロロスルホニル)アミド1.07質量部を仕込んだ。これにアセトニトリル7.9質量部およびフッ化アンモニウム0.89質量部を添加し、80〜84℃で4時間還流して反応させた。その後、室温に冷却し、不溶物を濾し取り、アセトニトリル7.9質量部で洗浄した。次いで、溶媒を減圧下で留去して、ジ(フルオロスルホニル)アミドアンモニウム塩0.95質量部を得た。
反応容器に、ジ(フルオロスルホニル)アミドアンモニウム塩33.4質量部、酢酸ブチル69.5質量部、および水酸化カリウム102.5質量部の20%水溶液を仕込み、100torrの減圧下、40℃で1時間撹拌した。反応液を25℃に冷却した。その後、分液し、水相を酢酸ブチル81.1質量部で2回抽出した。各抽出操作において得られた有機相を混ぜ合わせ、水4.6質量部で2回洗浄した。得られた有機相を減圧下で溶媒留去して39.1質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液91.2質量部を得た。収率は97%であった。
実施例1と同じ方法で38.0質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液71.7質量部を得た。
ジクロロメタン167.6質量部に、38.0質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液71.7質量部を19〜20℃で30分間かけて滴下した。1時間かけて10℃まで冷却した。その後、10℃で30分間撹拌した。得られたスラリー液を濾過し、ジクロロメタン50.3質量部で洗浄した。得られた固形物を、2torrの真空下、40℃で1時間乾燥させ、次いで0.5torrの真空下、60℃で2時間乾燥させて顆粒25.8質量部を得た。収率はジ(フルオロスルホニル)アミドカリウム塩仕込み量に対し98%であった。顆粒は、メディアン径が35.313μm、モード径が39.619μm、残留溶媒の量が640ppm(ジクロロメタン550ppm、酢酸ブチル90ppm)であった。
実施例1と同じ方法で36.5質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液73.2質量部を得た。
ジクロロメタン162.4質量部に、36.5質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液73.2質量部を24〜32℃で29分間かけて滴下した。2.1時間かけて12℃まで冷却した。得られたスラリー液を濾過し、ジクロロメタン48.8質量部で洗浄した。得られた固形物を8〜10torrの真空下、60℃で18.1時間乾燥させて顆粒25.3質量部を得た。収率はジ(フルオロスルホニル)アミドカリウム塩仕込み量に対し95%であった。顆粒は、メディアン径が39.658μm、モード径が39.619μm、残留溶媒の量が790ppm(ジクロロメタン430ppm、酢酸ブチル360ppm)であった。
実施例1と同じ方法で37.3質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液82.0質量部を得た。
ジクロロメタン188.1質量部に、37.3質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液82.0質量部を17〜19℃で30分間かけて滴下した。32分間かけて10℃まで冷却した。その後、5〜10℃で1.2時間撹拌した。得られたスラリー液を濾過し、ジクロロメタン56.1質量部で洗浄した。得られた固形物を11torrの真空下、60℃で18.1時間乾燥させて顆粒15.5質量部を得た。収率はジ(フルオロスルホニル)アミドカリウム塩仕込み量に対し98%であった。顆粒は、メディアン径が34.420μm、モード径が39.619μm、残留溶媒の量が1160ppm(ジクロロメタン800ppm、酢酸ブチル360ppm)であった。
実施例1と同じ方法で38.8質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液81.5質量部を得た。
38.8質量%のジ(フルオロスルホニル)アミドカリウム塩/酢酸ブチル溶液81.5質量部に、ジクロロメタン194.2質量部を4〜5℃で39分間かけて滴下した。滴下終了後、4〜5℃で1.4時間撹拌した。得られたスラリー液を濾過し、ジクロロメタン57.9質量部で洗浄した。得られた固形物を5torrの真空下、60℃で12.3時間乾燥させ、4torrの真空下、60℃で20.5時間乾燥させ、次いで、6torrの真空下、60℃で18.9時間乾燥させて顆粒30.9質量部を得た。収率はジ(フルオロスルホニル)イミドカリウム塩仕込み量に対し98%であった。顆粒は、メディアン径が51.796μm、モード径が91.146μm、残留溶媒の量が5100ppm(ジクロロメタン2300ppm、酢酸ブチル2800ppm)であった。メディアン径が45μmよりも大きく、モード径が80μmよりも大きく、且つモード径/メディアン径の比が1.7よりも大きい顆粒は長時間の乾燥を行っても残留溶媒の量が減らなかった。
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018130826A JP6910324B2 (ja) | 2013-11-18 | 2018-07-10 | ジスルホニルアミド塩の顆粒または粉末 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013237991 | 2013-11-18 | ||
JP2013237991 | 2013-11-18 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015547730A Division JP6034981B2 (ja) | 2013-11-18 | 2014-10-31 | ジスルホニルアミド塩の顆粒または粉末、およびその製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018130826A Division JP6910324B2 (ja) | 2013-11-18 | 2018-07-10 | ジスルホニルアミド塩の顆粒または粉末 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017052689A JP2017052689A (ja) | 2017-03-16 |
JP6370852B2 true JP6370852B2 (ja) | 2018-08-08 |
Family
ID=53057289
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015547730A Active JP6034981B2 (ja) | 2013-11-18 | 2014-10-31 | ジスルホニルアミド塩の顆粒または粉末、およびその製造方法 |
JP2016183498A Active JP6370852B2 (ja) | 2013-11-18 | 2016-09-20 | ジスルホニルアミド塩の顆粒または粉末 |
JP2018130826A Active JP6910324B2 (ja) | 2013-11-18 | 2018-07-10 | ジスルホニルアミド塩の顆粒または粉末 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015547730A Active JP6034981B2 (ja) | 2013-11-18 | 2014-10-31 | ジスルホニルアミド塩の顆粒または粉末、およびその製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018130826A Active JP6910324B2 (ja) | 2013-11-18 | 2018-07-10 | ジスルホニルアミド塩の顆粒または粉末 |
Country Status (10)
Country | Link |
---|---|
US (1) | US10214419B2 (ja) |
EP (1) | EP3045426B2 (ja) |
JP (3) | JP6034981B2 (ja) |
KR (2) | KR101830016B1 (ja) |
CN (1) | CN105658572B (ja) |
CA (1) | CA2924432C (ja) |
ES (1) | ES2707742T5 (ja) |
SG (1) | SG11201601554SA (ja) |
TW (1) | TWI555724B (ja) |
WO (1) | WO2015072353A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6709686B2 (ja) * | 2016-06-02 | 2020-06-17 | 株式会社日本触媒 | ビス(フルオロスルホニル)イミドアルカリ金属塩の製造方法 |
JP6792394B2 (ja) * | 2016-09-27 | 2020-11-25 | 株式会社日本触媒 | ビス(フルオロスルホニル)イミドのアルカリ金属塩と有機溶媒とを含む電解液材料の製造方法 |
WO2018147195A1 (ja) * | 2017-02-08 | 2018-08-16 | 森田化学工業株式会社 | ビス(フルオロスルホニル)イミド金属塩ならびに該金属塩の製造方法 |
US20190157721A1 (en) * | 2017-02-14 | 2019-05-23 | Arkema France | Lithium bis(fluorosulfonyl)imide Salt and Uses Thereof |
JP6375463B1 (ja) * | 2018-02-28 | 2018-08-15 | 日本曹達株式会社 | ビス(フルオロスルホニル)アミドアルカリ金属塩粉末の製造方法 |
CN112978690B (zh) * | 2019-12-18 | 2022-12-09 | 浙江蓝天环保高科技股份有限公司 | 一种粉末态双氟磺酰亚胺锂的除水筛分方法 |
CN113851713B (zh) * | 2021-09-17 | 2022-05-17 | 珠海市赛纬电子材料股份有限公司 | 电解液添加剂和含有该添加剂的电解液及锂离子电池 |
WO2023089084A1 (en) | 2021-11-19 | 2023-05-25 | Rhodia Operations | Dry dispersion of ammonium bis(fluorosulfonyl)imide (nh4fsi) salt with an at least bimodal particle size distribution |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3527070A1 (de) | 1985-07-29 | 1987-01-29 | Hoechst Ag | Verfahren zur herstellung von 6-methyl-3,4-dihydro-1,2,3-oxathiazin-4-on-2,2-dioxid |
CA2163336C (fr) | 1994-03-21 | 2006-05-09 | Christophe Michot | Materiau a conduction ionique presentant de bonnes proprietes anti-corrosion |
US5874616A (en) | 1995-03-06 | 1999-02-23 | Minnesota Mining And Manufacturing Company | Preparation of bis (fluoroalkylenesulfonyl) imides and (fluoroalkysulfony) (fluorosulfonyl) imides |
EP0971854B1 (fr) | 1998-02-03 | 2006-11-29 | Acep Inc. | Nouveaux materiaux utiles en tant que solutes electrolytiques |
JP2004269491A (ja) * | 2003-02-21 | 2004-09-30 | Kanto Denka Kogyo Co Ltd | パーフルオロアルキルイミド化合物の製造方法 |
JP4705476B2 (ja) * | 2006-01-10 | 2011-06-22 | 第一工業製薬株式会社 | フッ素化合物の製造方法 |
WO2009025246A1 (ja) | 2007-08-17 | 2009-02-26 | Asahi Glass Company, Limited | 精製された含フッ素ビススルホニルイミドのアンモニウム塩の製造方法 |
CN102786451A (zh) | 2008-11-28 | 2012-11-21 | 华中科技大学 | 双(氟磺酰)亚胺和(全氟烷基磺酰基氟磺酰基)亚胺碱金属盐的制备方法 |
BR112012007289A2 (pt) | 2009-09-30 | 2016-04-19 | Adeka Corp | composição de resina de poléster, fibra de poliéster, artigo moldado de resina de poliéster e processo para a produção do agente de nucleação para resina de poliéster |
JP5563282B2 (ja) | 2009-12-04 | 2014-07-30 | 株式会社Adeka | ポリエステル樹脂用結晶核剤の製造方法 |
EP2578533B1 (en) | 2010-05-28 | 2019-02-06 | Nippon Shokubai Co., Ltd. | Alkali metal salt of fluorosulfonyl imide, and production method therefor |
SG192258A1 (en) * | 2011-02-10 | 2013-09-30 | Nippon Soda Co | Process for production of fluorosulfonylimide ammonium salt |
CA2826375C (en) | 2011-03-03 | 2016-02-16 | Nippon Soda Co., Ltd. | Process for producing fluorine-containing sulfonylimide salt |
EP2660196B1 (en) | 2011-03-03 | 2017-05-03 | Nippon Soda Co., Ltd. | Manufacturing method for fluorosulfonylimide ammonium salt |
JP5726707B2 (ja) * | 2011-10-14 | 2015-06-03 | エレクセル株式会社 | リチウム二次電池 |
JP5899789B2 (ja) | 2011-10-18 | 2016-04-06 | 住友電気工業株式会社 | イミド塩の製造方法 |
JP5928149B2 (ja) * | 2012-05-18 | 2016-06-01 | セントラル硝子株式会社 | イミド酸化合物の製造方法 |
EP2920147B1 (en) * | 2012-11-16 | 2019-02-13 | Trinapco, Inc | Synthesis of tetrabutylammonium bis(fluorosulfonyl)imide and related salts |
JP6147523B2 (ja) * | 2013-02-25 | 2017-06-14 | 株式会社日本触媒 | フルオロスルホニルイミド塩の製造方法 |
US9950929B2 (en) | 2013-03-18 | 2018-04-24 | Nippon Soda Co., Ltd. | Method for producing disulfonylamine alkali metal salt |
JP6139944B2 (ja) * | 2013-04-01 | 2017-05-31 | 株式会社日本触媒 | フルオロスルホニルイミドのアルカリ金属塩の製造方法 |
WO2018147195A1 (ja) | 2017-02-08 | 2018-08-16 | 森田化学工業株式会社 | ビス(フルオロスルホニル)イミド金属塩ならびに該金属塩の製造方法 |
-
2014
- 2014-10-31 JP JP2015547730A patent/JP6034981B2/ja active Active
- 2014-10-31 CA CA2924432A patent/CA2924432C/en active Active
- 2014-10-31 WO PCT/JP2014/079054 patent/WO2015072353A1/ja active Application Filing
- 2014-10-31 CN CN201480056583.8A patent/CN105658572B/zh active Active
- 2014-10-31 EP EP14861940.6A patent/EP3045426B2/en active Active
- 2014-10-31 US US15/035,011 patent/US10214419B2/en active Active
- 2014-10-31 KR KR1020167009816A patent/KR101830016B1/ko active IP Right Grant
- 2014-10-31 ES ES14861940T patent/ES2707742T5/es active Active
- 2014-10-31 KR KR1020187003206A patent/KR101880416B1/ko active IP Right Grant
- 2014-10-31 SG SG11201601554SA patent/SG11201601554SA/en unknown
- 2014-11-04 TW TW103138126A patent/TWI555724B/zh active
-
2016
- 2016-09-20 JP JP2016183498A patent/JP6370852B2/ja active Active
-
2018
- 2018-07-10 JP JP2018130826A patent/JP6910324B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
EP3045426A1 (en) | 2016-07-20 |
CN105658572A (zh) | 2016-06-08 |
EP3045426B2 (en) | 2021-11-10 |
CA2924432A1 (en) | 2015-05-21 |
KR20160055899A (ko) | 2016-05-18 |
JP2017052689A (ja) | 2017-03-16 |
TWI555724B (zh) | 2016-11-01 |
KR101880416B1 (ko) | 2018-07-19 |
CN105658572B (zh) | 2017-09-19 |
WO2015072353A1 (ja) | 2015-05-21 |
JP6910324B2 (ja) | 2021-07-28 |
CA2924432C (en) | 2018-07-10 |
US20160289074A1 (en) | 2016-10-06 |
TW201527268A (zh) | 2015-07-16 |
ES2707742T5 (es) | 2022-04-04 |
SG11201601554SA (en) | 2016-04-28 |
JP2018188359A (ja) | 2018-11-29 |
EP3045426B1 (en) | 2018-11-14 |
JP6034981B2 (ja) | 2016-11-30 |
EP3045426A4 (en) | 2017-06-21 |
KR20180015295A (ko) | 2018-02-12 |
KR101830016B1 (ko) | 2018-02-19 |
ES2707742T3 (es) | 2019-04-04 |
US10214419B2 (en) | 2019-02-26 |
JPWO2015072353A1 (ja) | 2017-03-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6370852B2 (ja) | ジスルホニルアミド塩の顆粒または粉末 | |
JP5074636B2 (ja) | フルオロスルホニルイミドのアルカリ金属塩およびその製造方法 | |
EP2660196B1 (en) | Manufacturing method for fluorosulfonylimide ammonium salt | |
EP2505551B2 (en) | Fluorosulfonyl imide salt and method for producing fluorosulfonyl imide salt | |
JP6139944B2 (ja) | フルオロスルホニルイミドのアルカリ金属塩の製造方法 | |
JP6663986B2 (ja) | ビス(フルオロスルホニル)イミドアルカリ金属塩の製造方法 | |
JP2018035054A (ja) | ビス(フルオロスルホニル)イミドアルカリ金属塩の製造方法ならびにビス(フルオロスルホニル)イミドアルカリ金属塩組成物 | |
JP5447866B2 (ja) | 結晶質で完全に溶解するリチウムビス(オキサラト)ホウ酸塩(LiBOB) | |
WO2016093025A1 (ja) | ジフルオロリン酸リチウム粉体の製造方法およびジフルオロリン酸リチウム | |
CN105175452B (zh) | 一种磷腈氟烷基磺酰亚胺碱金属盐的制备方法 | |
JP2010189372A (ja) | フルオロスルホニルイミド類およびその製造方法 | |
TWI513653B (zh) | Method for producing difluorophosphate | |
KR20190001092A (ko) | 매우 간단하고 효율적인 리튬 비스(플루오로술포닐)이미드의 새로운 제조방법 | |
JP5891598B2 (ja) | フルオロスルホン酸リチウムの製造方法、およびフルオロスルホン酸リチウム | |
CN111138464A (zh) | 一种二草酸硼酸锂的制备方法 | |
JP2017210392A (ja) | 電解液材料の製造方法 | |
JP2017218328A (ja) | ビス(フルオロスルホニル)イミドアルカリ金属塩の製造方法 | |
KR20210077773A (ko) | 리튬 이온 및 리튬 금속 배터리 내의 애노드에 대해 안정한 유기 용매를 사용하여 리튬 비스(플루오로설포닐)이미드 (LiFSI)로부터 반응성 용매를 제거하는 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160920 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170705 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170718 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170912 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171222 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180216 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180417 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180612 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180711 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6370852 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |