JP6034343B2 - 重複露光を運用した多重露光画像ミキシングの検査方法 - Google Patents
重複露光を運用した多重露光画像ミキシングの検査方法 Download PDFInfo
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- JP6034343B2 JP6034343B2 JP2014171633A JP2014171633A JP6034343B2 JP 6034343 B2 JP6034343 B2 JP 6034343B2 JP 2014171633 A JP2014171633 A JP 2014171633A JP 2014171633 A JP2014171633 A JP 2014171633A JP 6034343 B2 JP6034343 B2 JP 6034343B2
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- 238000007689 inspection Methods 0.000 title claims description 69
- 238000000034 method Methods 0.000 title claims description 26
- 230000007547 defect Effects 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000003973 paint Substances 0.000 claims description 12
- 238000004458 analytical method Methods 0.000 claims description 8
- 238000012360 testing method Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 description 13
- 238000005286 illumination Methods 0.000 description 10
- 230000001678 irradiating effect Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000005284 excitation Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 238000002073 fluorescence micrograph Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
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- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
第1コンフィグレーション下の異なる波長帯及び照射角度のうちのいずれかを有する複数の光源装置の総露光時間を構成する露光時間値を各々設するステップS100と、
重複露光を行って順次それら光源装置を対応する露光時間値をオンにした後でオフにし、それら光源装置が被検査回路基板を順次照射すると共に画像取込装置がそれら露光時間値内の異なる波長帯及び照射角度のうちのいずれかの光でミキシングする検査画像を生成するステップS200と、
分析検査に供するため該検査画像を出力するステップS300と、を含む。
110 被検査回路基板
210 第1コンフィグレーションの光源装置
220 その他のコンフィグレーションの光源装置
310 画像取込装置
330 演算用PC
S100〜S300 ステップ
Claims (6)
- 第1コンフィグレーション下の異なる波長帯、及び、照射角度のうちのいずれかを有する複数の光源装置の総露光時間を構成する露光時間値を各々設定するステップS100と、
重複露光を行って順次前記光源装置を対応する露光時間値をオンにした後でオフにし、前記光源装置が被検査回路基板を順次照射すると共に画像取込装置が前記露光時間値内の異なる波長帯、及び、照射角度のうちのいずれかの光でミキシングする検査画像を生成するステップS200と、
複数のコンフィグレーション下で、それぞれ、前記光源装置の前記露光時間値を設定し、また前記ステップS200を繰り返すことによって、複数の検査画像を生成した後、
分析検査に供するため、生成した前記複数の検査画像を結合して、1枚の検査画像として出力するステップS300と、
を含む重複露光を運用した多重露光画像ミキシングの検査方法。
- 前記第1コンフィグレーションの前記光源装置は、可視光波帯発光装置と不可視光波帯発光装置とを含むことを特徴とする請求項1に記載の検査方法。
- 前記被検査回路基板上の金属線が断線しているかどうかの判断において、前記第1コンフィグレーションの前記光源装置は、可視光波帯発光装置、及び、紫外線波帯発光装置で、前記可視光波帯発光装置の露光時間値の前記総露光時間に占める割合が前記紫外線波帯発光装置の露光時間値の前記総露光時間に占める割合より小さいことを特徴とする請求項1に記載の検査方法。
- 前記可視光波帯発光装置の露光時間値の前記総露光時間に占める割合が30%で、前記紫外線波帯発光装置の露光時間値の前記総露光時間に占める割合が70%となることを特徴とする請求項3に記載の検査方法。
- 前記被検査回路基板上の金属線が突出しているかどうかの判断において、前記第1コンフィグレーションの前記光源装置は、可視光波帯発光装置、及び、紫外線波帯発光装置で、前記可視光波帯発光装置の露光時間値の前記総露光時間に占める割合が前記紫外線波帯発光装置の露光時間値の前記総露光時間に占める割合に等しいことを特徴とする請求項1に記載の検査方法。
- 前記被検査回路基板上の緑色ペンキ表面に欠陥があるかどうかの判断において、前記第1コンフィグレーションの前記光源装置は、側面光発光装置、及び、正面光発光装置で、該側面光発光装置の露光時間値の前記総露光時間に占める割合が前記正面光発光装置の露光時間値の前記総露光時間に占める割合に等しいことを特徴とする請求項1に記載の検査方法。
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TW103125041A TWI495867B (zh) | 2014-07-22 | 2014-07-22 | Application of repeated exposure to multiple exposure image blending detection method |
TW103125041 | 2014-07-22 |
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Cited By (2)
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CN110146519A (zh) * | 2018-02-12 | 2019-08-20 | 志圣工业股份有限公司 | 电路板检测方法及电路板曝光方法 |
CN110702031A (zh) * | 2019-11-19 | 2020-01-17 | 四川长虹电器股份有限公司 | 适用于深色表面的三维扫描装置及扫描方法 |
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Cited By (2)
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CN110146519A (zh) * | 2018-02-12 | 2019-08-20 | 志圣工业股份有限公司 | 电路板检测方法及电路板曝光方法 |
CN110702031A (zh) * | 2019-11-19 | 2020-01-17 | 四川长虹电器股份有限公司 | 适用于深色表面的三维扫描装置及扫描方法 |
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KR101679314B1 (ko) | 2016-11-24 |
KR20160011556A (ko) | 2016-02-01 |
TWI495867B (zh) | 2015-08-11 |
CN105277574A (zh) | 2016-01-27 |
JP2016024185A (ja) | 2016-02-08 |
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