[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP6094050B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

Info

Publication number
JP6094050B2
JP6094050B2 JP2012089043A JP2012089043A JP6094050B2 JP 6094050 B2 JP6094050 B2 JP 6094050B2 JP 2012089043 A JP2012089043 A JP 2012089043A JP 2012089043 A JP2012089043 A JP 2012089043A JP 6094050 B2 JP6094050 B2 JP 6094050B2
Authority
JP
Japan
Prior art keywords
group
parts
copolymer
resin composition
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012089043A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012230365A (ja
Inventor
貴清 寺川
貴清 寺川
泰行 桐生
泰行 桐生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2012089043A priority Critical patent/JP6094050B2/ja
Publication of JP2012230365A publication Critical patent/JP2012230365A/ja
Application granted granted Critical
Publication of JP6094050B2 publication Critical patent/JP6094050B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/24Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2012089043A 2011-04-15 2012-04-10 着色感光性樹脂組成物 Active JP6094050B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012089043A JP6094050B2 (ja) 2011-04-15 2012-04-10 着色感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011090788 2011-04-15
JP2011090788 2011-04-15
JP2012089043A JP6094050B2 (ja) 2011-04-15 2012-04-10 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2012230365A JP2012230365A (ja) 2012-11-22
JP6094050B2 true JP6094050B2 (ja) 2017-03-15

Family

ID=46992142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012089043A Active JP6094050B2 (ja) 2011-04-15 2012-04-10 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP6094050B2 (zh)
KR (1) KR101946643B1 (zh)
CN (2) CN102736416A (zh)
TW (1) TWI575312B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102914943B (zh) * 2011-08-04 2018-01-12 住友化学株式会社 着色固化性树脂组合物
JP2013036006A (ja) * 2011-08-11 2013-02-21 Sumitomo Chemical Co Ltd 化合物
WO2013089197A1 (ja) * 2011-12-14 2013-06-20 日本化薬株式会社 キサンテン化合物
JP2013205834A (ja) * 2012-03-29 2013-10-07 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに画像表示装置
KR20150103210A (ko) * 2013-02-13 2015-09-09 후지필름 가부시키가이샤 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법, 경화막, 액정 표시 장치 및 유기 el 표시 장치
JP2018009043A (ja) * 2014-11-14 2018-01-18 昭和電工株式会社 樹脂組成物、その製造方法、カラーフィルター及び画像表示素子
JP6566901B2 (ja) * 2015-03-30 2019-08-28 住友化学株式会社 着色硬化性樹脂組成物
TWI696889B (zh) * 2015-06-30 2020-06-21 南韓商東友精細化工有限公司 著色固化性樹脂組合物、濾色器和液晶顯示裝置
TWI721087B (zh) * 2016-01-27 2021-03-11 日商住友化學股份有限公司 著色硬化性樹脂組成物、彩色濾光片及含有該濾光片之顯示裝置
US10101655B2 (en) 2016-02-26 2018-10-16 Samsung Sdi Co., Ltd. Compound, polymer, photosensitive resin composition, and color filter
JP6971055B2 (ja) * 2016-07-20 2021-11-24 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 青色硬化性樹脂組成物、カラーフィルタ、及び表示装置
KR102025478B1 (ko) * 2017-11-28 2019-09-25 주식회사 엘지화학 착색제 조성물 제조방법, 이를 이용하여 제조된 착색제 조성물, 착색제 분산액, 감광성 수지 조성물, 컬러필터 및 액정 표시 장치
KR102355812B1 (ko) * 2017-12-05 2022-01-26 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
CN114556213A (zh) * 2019-12-02 2022-05-27 株式会社Lg化学 着色剂组合物、光敏树脂组合物、光致抗蚀剂、滤色器和液晶显示装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3841497B2 (ja) * 1996-05-17 2006-11-01 凸版印刷株式会社 感光性着色組成物
JP2002062651A (ja) * 2000-08-18 2002-02-28 Mitsubishi Chemicals Corp 光重合性組成物及びそれを用いたカラーフィルタ
JP2002072475A (ja) * 2000-08-28 2002-03-12 Mitsubishi Chemicals Corp 光重合性組成物及びそれを用いたカラーフィルター
US7371783B2 (en) * 2001-09-25 2008-05-13 Nippon Shokubai Co., Ltd. Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
JP4645346B2 (ja) * 2005-07-29 2011-03-09 住友化学株式会社 感光性樹脂組成物
JP4788485B2 (ja) * 2006-06-13 2011-10-05 住友化学株式会社 着色感光性樹脂組成物
JP2008009121A (ja) * 2006-06-29 2008-01-17 Sumitomo Chemical Co Ltd ポジ型着色感放射線性樹脂組成物
JP2008242311A (ja) * 2007-03-28 2008-10-09 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
JP5481844B2 (ja) * 2007-12-14 2014-04-23 住友化学株式会社 着色感光性樹脂組成物
JP2009175451A (ja) * 2008-01-24 2009-08-06 Sumitomo Chemical Co Ltd 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
TWI455984B (zh) * 2008-05-30 2014-10-11 Sumitomo Chemical Co 著色硬化性組成物
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
CN101625525B (zh) * 2008-07-11 2013-06-12 住友化学株式会社 感光性树脂组合物
TWI501027B (zh) * 2008-11-18 2015-09-21 Sumitomo Chemical Co Photosensitive resin composition and display device
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
TW201036941A (en) * 2009-03-30 2010-10-16 Sumitomo Chemical Co Method for producing sulfonamide compound
JP2011022237A (ja) * 2009-07-14 2011-02-03 Toppan Printing Co Ltd 青色感光性着色組成物及びそれを用いたカラーフィルタ並びにカラー表示装置
JP5957905B2 (ja) * 2011-02-25 2016-07-27 Jsr株式会社 画素パターンの形成方法、カラーフィルタ、表示素子及び着色感放射線性組成物

Also Published As

Publication number Publication date
KR101946643B1 (ko) 2019-02-11
CN102736416A (zh) 2012-10-17
KR20120117658A (ko) 2012-10-24
JP2012230365A (ja) 2012-11-22
TWI575312B (zh) 2017-03-21
CN108845481A (zh) 2018-11-20
TW201303491A (zh) 2013-01-16

Similar Documents

Publication Publication Date Title
JP6094050B2 (ja) 着色感光性樹脂組成物
JP6713517B2 (ja) 赤色着色硬化性樹脂組成物
JP6028326B2 (ja) 着色硬化性樹脂組成物
JP6098113B2 (ja) 着色感光性樹脂組成物
JP6078970B2 (ja) 着色感光性樹脂組成物
JP5919830B2 (ja) 着色感光性樹脂組成物
JP2012181505A (ja) 着色感光性樹脂組成物
JP2013242554A (ja) 着色感光性樹脂組成物
JP2013104002A (ja) 着色硬化性樹脂組成物
JP6019596B2 (ja) 着色感光性樹脂組成物
JP6019597B2 (ja) 着色感光性樹脂組成物
JP5978670B2 (ja) 着色硬化性樹脂組成物
JP6091831B2 (ja) 着色感光性樹脂組成物
JP5825961B2 (ja) 着色感光性組成物
JP2013011867A (ja) 着色感光性樹脂組成物
JP5962388B2 (ja) 着色硬化性樹脂組成物
JP2018035345A (ja) 着色硬化性樹脂組成物
JP6051689B2 (ja) 着色感光性樹脂組成物
JP6115005B2 (ja) 着色感光性樹脂組成物
JP6238516B2 (ja) 着色硬化性樹脂組成物
JP5978583B2 (ja) 着色感光性樹脂組成物
JP6047885B2 (ja) 着色感光性樹脂組成物
KR102116142B1 (ko) 착색 감광성 수지 조성물
JP6414826B2 (ja) 着色感光性樹脂組成物
JP2018180081A (ja) 着色硬化性樹脂組成物、カラーフィルタ及び表示装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150305

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20151210

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151222

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20160218

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160316

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20160316

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160621

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20160818

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161006

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170117

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170130

R151 Written notification of patent or utility model registration

Ref document number: 6094050

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350