JP6086299B2 - Mobile device, exposure apparatus, flat panel display manufacturing method, and device manufacturing method - Google Patents

Description

  The present invention relates to a moving body apparatus, an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method, and more specifically, a moving body apparatus including a moving body that moves along a predetermined two-dimensional plane, and the moving body. The present invention relates to an exposure apparatus including an apparatus, a flat panel display manufacturing method using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

  Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a mask (photomask) or reticle (hereinafter collectively referred to as “mask”), a glass plate or A step-and-step of transferring a pattern formed on a mask onto a substrate using an energy beam while synchronously moving a wafer (hereinafter collectively referred to as a “substrate”) along a predetermined scanning direction (scanning direction). A scanning exposure apparatus (a so-called scanning stepper (also called a scanner)) or the like is used.

  As this type of exposure apparatus, in order to control the position of the substrate in the horizontal plane at high speed and with high precision, a so-called coarse / fine movement substrate stage apparatus in which a gantry type biaxial coarse movement stage and a fine movement stage are combined. (For example, see Patent Documents 1 and 2).

  Here, it has been desired to develop a substrate stage apparatus for an exposure apparatus that can position and control a substrate at a higher speed and with higher accuracy in order to improve throughput.

US Patent Application Publication No. 2010/0018950 JP 2011-249555 A

The present invention has been made under the above circumstances, to a first aspect, move possible to said first hand direction in the predetermined two-dimensional plane including the first and second directions orthogonal to each other a first moving member, said extending the second way direction, the second moving member pre SL moved possible to first hand direction, is supported on the second movable body, the first to the second moving member A third moving body capable of relative movement in two directions; a connecting portion that connects the first moving body and the second moving body; a drive system that drives the first moving body in the first direction; The third moving body is supported by the second moving body connected by the connecting portion with respect to the first moving body driven in the first direction. It is a moving body device that is pressed and driven in the first direction .

  According to a second aspect of the present invention, there is provided a moving body device according to the first aspect of the present invention in which a predetermined object is held by the third moving body, and a predetermined pattern using an energy beam on the object. An exposure apparatus comprising: a pattern forming apparatus for forming.

  According to a third aspect of the present invention, there is provided a flat panel display comprising: exposing the object using the exposure apparatus according to the second aspect of the present invention; and developing the exposed object. It is a manufacturing method.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: exposing the object using the exposure apparatus according to the second aspect of the present invention; and developing the exposed object. is there.

It is a figure which shows schematically the structure of the liquid-crystal exposure apparatus which concerns on 1st Embodiment. It is a top view of the substrate stage apparatus which the liquid crystal exposure apparatus of FIG. 1 has. It is CC sectional view taken on the line of FIG. It is the A section enlarged view of FIG. It is a figure (side view) which shows operation | movement of a substrate stage apparatus. It is a figure (C-C arrow sectional drawing of FIG. 2) which shows operation | movement of a substrate stage apparatus. FIG. 7A and FIG. 7B are views showing modifications (No. 1 and No. 2) of the substrate stage apparatus of the first embodiment. It is a figure which shows the substrate stage apparatus which concerns on 2nd Embodiment. It is a top view of the substrate stage apparatus of FIG. It is a figure which shows the substrate stage apparatus which concerns on 3rd Embodiment. It is a figure which shows the substrate stage apparatus which concerns on 4th Embodiment. It is a top view of the substrate stage apparatus of FIG. It is the D section enlarged view of FIG. It is FF arrow sectional drawing of FIG. FIGS. 15A and 15B are views (a plan view and a side view) showing a substrate stage device according to the fifth embodiment. FIGS. 16A and 16B are views (No. 1 and No. 2) for explaining the operation of the switching device included in the substrate stage device according to the fifth embodiment. FIG. 17A and FIG. 17B are views (a plan view and a side view) showing a substrate stage device according to the sixth embodiment. 18A and 18B are views (a plan view and a side view) showing a modification of the substrate stage apparatus of the sixth embodiment. FIG. 19A and FIG. 19B are views (a plan view and a side view) showing a substrate stage device according to the seventh embodiment. FIGS. 20A and 20B are views (a plan view and a side view) showing a modified example (No. 1) of the substrate stage apparatus of the seventh embodiment. FIGS. 21A and 21B are views (a plan view and a side view) showing a modification (No. 2) of the substrate stage apparatus of the seventh embodiment.

<< First Embodiment >>
Hereinafter, a first embodiment will be described with reference to FIGS.

  FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object. A projection exposure apparatus, a so-called scanner.

  The liquid crystal exposure apparatus 10 has an illumination system 12, a mask stage apparatus 14 that holds a mask M on which a circuit pattern and the like are formed, a projection optical system 16, an apparatus main body 18, and a resist (surface facing the + Z side in FIG. 1). It has a substrate stage device 20 that holds a substrate P coated with (sensitive agent), a control system for these, and the like. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is defined as the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, the X-axis, and the Y-axis. In the following description, the orthogonal direction is the Z-axis direction, and the rotation directions around the X-axis, Y-axis, and Z-axis are the θx, θy, and θz directions, respectively. Further, description will be made assuming that the positions in the X-axis, Y-axis, and Z-axis directions are the X position, the Y position, and the Z position, respectively.

  The illumination system 12 is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331. The illumination system 12 irradiates light emitted from a light source (not shown) (for example, a mercury lamp) through exposure mirrors (not shown), dichroic mirrors, shutters, wavelength selection filters, various lenses, and the like. ) Irradiate the mask M as IL. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used.

  The mask stage device 14 holds the mask M by, for example, vacuum suction. The mask stage device 14 is driven with a predetermined long stroke in the scanning direction (X-axis direction) by a mask stage driving system (not shown) including, for example, a linear motor, and is appropriately finely driven in the Y-axis direction and the θz direction. The Position information of the mask stage device 14 in the XY plane is obtained by a mask interferometer system including a laser interferometer (not shown).

  The projection optical system 16 is disposed below the mask stage device 14. The projection optical system 16 is a so-called multi-lens projection optical system having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775, and is a double-sided telecentric equal magnification system. A plurality of projection optical systems for forming a vertical image are provided.

  In the liquid crystal exposure apparatus 10, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light that has passed through the mask M causes the mask M in the illumination area to pass through the projection optical system 16. A projection image (partial upright image) of the circuit pattern is formed in an irradiation region (exposure region) of illumination light conjugate to the illumination region on the substrate P. Then, the mask M moves relative to the illumination area (illumination light IL) in the scanning direction, and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction. Scanning exposure of one shot area is performed, and the pattern formed on the mask M is transferred to the shot area.

  The apparatus main body 18 supports the mask stage apparatus 14 and the projection optical system 16 and is installed on the floor 11 of the clean room via a plurality of vibration isolators 19. The apparatus main body 18 is configured similarly to the apparatus main body disclosed in, for example, US Patent Application Publication No. 2008/0030702, and includes an upper pedestal portion 18a, a pair of lower pedestal portions 18b, and a pair of middle pedestal portions 18c ( One of them is not shown in FIG. 1 (see FIG. 2).

  The substrate stage apparatus 20 includes a pair of X guides 22 (one is not shown in FIG. 1, see FIG. 2), a bridge stage 24, a follower base 26, a follower table 28, a fine stage 50, a drive system (X linear motor 23 (see FIG. 2). 1 (see FIG. 3), and a pair of X / Y axis 2 DOF (Degree Of Freedom) motors 36). The substrate stage apparatus 20 shown in FIG. 1 corresponds to a cross-sectional view taken along the line BB in FIG.

  As can be seen from FIGS. 1 and 2, each of the pair of X guides 22 is composed of a plate-like member parallel to the XZ plane extending in the X-axis direction, and the dimension in the longitudinal direction (X-axis direction) is that of the apparatus main body 18. It is about the same as the X-axis direction. Each of the pair of X guides 22 is fixed on the upper surface of the pair of undercarriage portions 18b. As shown in FIG. 3, the pair of X guides 22 are arranged in parallel to each other at predetermined intervals in the Y axis direction (slightly narrower than the Y axis direction dimension of the substrate P). The upper surface and both side surfaces of the X guide 22 are finished with very high flatness.

  The bridge stage 24 includes a Y beam guide 24a and a pair of X carriages 24b. The Y beam guide 24a is formed of a member having a rectangular XZ section extending in the Y-axis direction. As shown in FIG. 1, the Y beam guide 24a of the present embodiment is formed hollow and a plurality of ribs for stiffening are arranged inside. However, if a desired bending rigidity can be ensured. The shape is not limited to this. The upper surface of the Y beam guide 24a is finished with very high flatness.

  Returning to FIG. 3, one of the pair of X carriages 24b is the lower surface of the Y beam guide 24a and near the + Y side end, and the other is the lower surface of the Y beam guide 24a and near the other end of the −Y side. Respectively. The X carriage 24b is made of a member having an inverted U-shaped YZ section. One X guide 22 is provided between a pair of opposing surfaces of one (+ Y side) X carriage 24b, and the other X guide 22 is provided between a pair of opposing surfaces of the other (−Y side) X carriage 24b. Each is inserted through a predetermined clearance. An air bearing (not shown) is provided on the pair of facing surfaces of the X carriage 24b and the ceiling surface (facing surfaces facing the X guide 22). The bridge stage 24 can move with a predetermined long stroke in the X-axis direction along the pair of X guides 22 with substantially no frictional resistance by the action of the air bearings of the pair of X carriages 24b. ing.

  In the above description, each of the pair of X carriages 24b is formed in an inverted U shape in the YZ cross section, but is not limited to this as long as the Y beam guide 24a can be guided straight in the X axis direction. A flat plate-like member parallel to the XY plane having an air bearing (not shown) on the lower surface portion may be used like the X carriage 24c shown in FIG. In this case, relative movement in the Y-axis direction between the X carriage 24c and the X guide 22 on the lower surface of one (which may be the -Y side in FIG. 7A but may be the + Y side) X carriage 24c. It is preferable to arrange a plurality of pins 24d that limit the above.

  Returning to FIG. 1, the follower base 26 has a main body portion 26 a which is a plate-like portion parallel to the XY plane extending in the X-axis direction, the vicinity of both ends in the longitudinal direction of the main body portion 26 a, and the central portion in the longitudinal direction. And a plurality of legs 26b supported from below. The dimension in the longitudinal direction (X-axis direction) of the main body 26a is set to be twice or more the X-axis direction dimension of the substrate P. As shown in FIG. 3, the main body portion 26 a is disposed between the pair of X guides 22. The main body portion 26a is arranged such that the lower surface of the main body portion 26a and the upper surface of the lower base portion 18b are separated from each other, and the Z position of the upper surface of the main body portion 26a is closer to the -Z side than the Z position of the lower surface of the Y beam guide 24a. The Z position is set. As shown in FIG. 1, the leg portion 26 b is disposed so as to be separated from each of the pair of undercarriage portions 18 b. Thereby, the apparatus main body 18 and the follower base 26 are vibrationally separated. As shown in FIG. 2, a pair of X linear guides 21a is fixed to the upper surface of the main body portion 26a. In addition, an X stator 23a including a plurality of permanent magnets (not shown) arranged in the X-axis direction is fixed to the upper surface of the main body 26a and between the pair of X linear guides 21a. .

  Returning to FIG. 1, the follower table 28 is composed of a plate-like member parallel to the XZ plane extending in the X-axis direction, and the dimension in the longitudinal direction (X-axis direction) is set slightly shorter than the dimension in the X-axis direction of the substrate P. Has been. As shown in FIG. 3, the follower table 28 is disposed above the main body portion 26a of the follower base 26 (on the + Z side) and substantially parallel to the main body portion 26a. A plurality of X slide members 21b (for example, four (see FIG. 1) per X linear guide 21a) are fixed to the lower surface of the follower table 28. The X slide member 21b is formed in an inverted U shape in the YZ section, and has a rolling element (not shown) such as a ball. The X slide member 21b together with the corresponding X linear guide 21a constitutes a mechanical X linear guide device 21 as disclosed in, for example, US Pat. No. 6,761,482, and the follower table 28 includes By the action of the Y linear guide device 21, the linear guide is guided in the X-axis direction on the follower base 26.

  An X mover 23b is fixed to the lower surface of the follower table 28 so as to face the X stator 23a. The X mover 23b includes a coil unit (not shown). The direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown). The X mover 23b and the X stator 23a constitute an X linear motor 23 as disclosed in, for example, US Pat. No. 8,030,804. The follower table 28 is linearly driven in the X-axis direction on the follower base 26 by the X linear motor 23. The X position information of the follower table 28 is obtained by a linear encoder system (not shown). Here, as the X linear motor 23, not only the follower table 28 but also the bridge stage 24 and the fine stage 50 (Y carriage 30, substrate table 32, substrate holder 46, X bar mirror 48x (see FIG. 1), Y bar mirror 48y). (See FIG. 3)), which has a thrust capable of driving the inertial mass. In addition, since it is not necessary to control the X position of the follower table 28 with high accuracy, it is preferable to use a relatively inexpensive cored linear motor that generates a high thrust as the X linear motor 23. The X linear motor 23 may be a moving magnet type.

  A support base 38 that supports a stator 36a of an X / Y-axis 2DOF motor 36 to be described later is fixed on the upper surface of the follower table 28 and in the vicinity of both ends in the longitudinal direction. In the present embodiment, as shown in FIG. 3, the support base 38 is formed in an inverted trapezoidal shape when viewed from the front, but the X / Y-axis 2 DOF motor 36 is longer in the Y-axis direction than the follower table 28. The shape is not particularly limited as long as the stator 36a can be reliably supported. The follower table 28 may be divided into a portion where one support base 38 is fixed and a portion where the other support base 38 is fixed, and the X position may be controlled independently.

  The stator 36a is formed of a member having an U-shaped XZ section (see FIG. 4) extending in the Y-axis direction. In the present embodiment, the + X side stator 36a opens to the −X side, and the −X side stator 36a opens to the + X side. The dimension of the stator 36a in the longitudinal (Y-axis) direction is set to be substantially the same as that of the Y beam guide 24a of the bridge stage 24 described above (see FIGS. 2 and 3). A plurality of permanent magnets (not shown) arranged in the Y-axis direction are fixed to each of the pair of opposed surfaces of the stator 36a.

Returning to FIG. 1, the Y beam guide 24 a is formed by a plurality of flexure devices 40 in the vicinity of the height position of the gravity center position CG ₁ of the bridge stage 24 (Y beam guide 24 a and a pair of X carriages 24 b). 38 (that is, the follower table 28). In this embodiment, as shown in FIG. 2, the Y beam guide 24a has one and other support bases 38 (not shown in FIG. 2 because they are hidden behind the stator 36a in the drawing, see FIG. 1). Each is connected by a pair of flexure devices 40 spaced apart in the Y-axis direction, but the number of flexure devices 40 is not limited to this. Returning to FIG. 1, the flexure device 40 includes, for example, a thin strip-shaped steel plate arranged parallel to the XY plane, and a smoothing device (for example, a ball joint) provided at both ends of the steel plate, A steel plate is installed between the Y beam guide 24a and the support base 38 via a sliding device. As a result, when the follower table 28 moves in the X-axis direction, the Y beam guide 24 a moves in the X-axis direction integrally with the follower table 28 by being pulled by the support base 38 via the flexure device 40. At this time, since the Z position of the flexure device 40 substantially coincides with the Z position of the gravity center position CG ₁ , it is difficult for a moment in the θy direction to act on the bridge stage 24. Further, due to the action of the flexure device 40, forces (including moment and vibration) other than those in the X-axis direction are hardly transmitted between the follower table 28 and the bridge stage 24.

  The fine stage 50 includes a Y carriage 30 and a substrate table 32. The Y carriage 30 is formed of a rectangular parallelepiped member having a low height, and is disposed above the Y beam guide 24a described above. An air bearing 42 is fixed to the center of the lower surface of the Y carriage 30. The air bearing 42 ejects a pressurized gas (for example, air) onto the upper surface of the Y beam guide 24a, and causes the Y carriage 30 to float above the Y beam guide 24a with a slight clearance by the static pressure of the pressurized gas. That is, the Y carriage 30 is placed on the Y beam guide 24a in a state where the position in the XY plane is not restrained with respect to the Y beam guide 24a.

  The substrate table 32 is formed of a rectangular parallelepiped member that is longer in the X-axis and Y-axis directions than the Y carriage 30, and is placed on the Y carriage 30 via a plurality of Z driving devices 44 with a predetermined clearance. . In the present embodiment, for example, four Z driving devices 44 are provided, and the four Z driving devices 44 are arranged in the vicinity of the four corners on the upper surface of the Y carriage 30. The Z driving device 44 is schematically shown in each drawing, but is a cam device including a pair of wedge-shaped members arranged in a vertical direction, for example, and is fixed to the substrate table 32 (upper side). By moving the other (lower) wedge-shaped member with respect to the wedge-shaped member along the horizontal plane (in the + X direction or -X direction in FIG. 4), the substrate table 32 is moved in the Z-axis direction with a small stroke. To drive. In the present embodiment, for example, four Z driving devices are used so that the surface position (Z position) of the substrate P is obtained by a surface position measurement system (not shown) and the surface position is located within the focal depth of the projection optical system 16. 44, the substrate table 32 is appropriately driven with respect to the Y carriage 30 in the Z-axis, θx, and θy directions (hereinafter collectively referred to as the Z / tilt direction). In addition, if the Z drive device 44 is arrange | positioned in three places which are not on the same straight line, an arrangement position will not be specifically limited. Further, if the substrate table 32 can be slightly driven in the Z-axis direction, the type of the Z driving device 44 is not particularly limited, and for example, a linear motor, a piezoelectric element, or the like may be used. If it is not necessary to control the surface position of the substrate P, the plurality of Z driving devices 44 may be omitted and the substrate table 32 may be directly fixed on the Y carriage 30.

  A substrate holder 46 is fixed on the upper surface of the substrate table 32 (not shown in FIGS. 2 and 4). The substrate holder 46 is composed of a plate-like member formed with substantially the same dimensions as the substrate P (actually somewhat shorter). The substrate P is placed on the upper surface of the substrate holder 46, and is sucked and held on the substrate holder 46 by, for example, vacuum suction.

As shown in FIG. 2, a mover 36b of the X / Y-axis 2DOF motor 36 is fixed to each of the side surfaces of the Y carriage 30 on the + Y side and the −Y side corresponding to the pair of stators 36a described above. Yes. As shown in FIG. 4, the mover 36 b is formed in a T-shaped XZ cross section, and the tip is inserted between a pair of opposing surfaces of the corresponding stator 36 a via a predetermined clearance. The mover 36b includes a coil unit (not shown), and the direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown). Each Y position and Z position of the movable element 36b is in good agreement with each Y position and Z position of the center of gravity position CG ₂ fine stage 50.

The stator 36a and the mover 36b constitute a Lorentz force drive type X / Y-axis 2DOF motor 36 as disclosed in, for example, Japanese Patent Laid-Open No. 2000-078830. In the present embodiment, the X / Y-axis 2DOF motor 36 can drive the Y carriage 30 with a long stroke in the Y-axis direction and with a small stroke in the X-axis direction. In the substrate stage apparatus 20 of the present embodiment, the X / Y-axis 2 DOF motor 36 is disposed on each of the + X side and the −X side of the Y carriage 30, so that the Y carriage 30 is slightly driven in the θz direction. Be able to. The gap amount (gap amount) in the X-axis direction between the stator 36a and the mover 36b is monitored by a gap sensor (not shown), and is controlled so that the gap amount does not become a predetermined value or less. Z position of the stator 36a, and the movable element 36b is set to approximately the same as the Z position of the center of gravity position CG ₂ fine stage 50 is a driven object in X / Y-axis 2DOF motor 36, fine The pitching operation of the fine stage 50 when driving the stage 50 is suppressed.

  The position of the substrate P in the XY plane is controlled based on the output of the substrate interferometer system that determines the position information of the Y carriage 30 in the XY plane. The substrate interferometer system is an apparatus as shown in FIG. An X bar mirror 48x (not shown in FIG. 3, see FIG. 1) including a laser interferometer 49 fixed to the main body 18 and fixed to the Y carriage 30 via a mirror base 47, and a Y carriage using the Y bar mirror 48y. The position information in 30 XY planes is obtained. The laser interferometer 49 actually includes an X laser interferometer corresponding to the X bar mirror 48x and a Y laser interferometer corresponding to the Y bar mirror 48y. Further, the X laser interferometer (or Y laser interferometer) irradiates a corresponding bar mirror with a plurality of length measurement lights in a horizontal plane, and obtains θz position information of the Y carriage 30 (that is, the substrate P). Be able to.

  In addition, the substrate stage device 20 has a pair of roller devices 52 as shown in FIG. One roller device 52 is the side surface on the + X side of the Y carriage 30 and below the mover 36b, and the other roller device 52 is the −X side surface of the Y carriage 30 and below the mover 36b. It is fixed. As shown in FIG. 4, the roller device 52 includes a bracket 52a having a U-shaped XZ cross section fixed to the Y carriage 30, a shaft 52b parallel to the Z-axis constructed between a pair of opposing surfaces of the bracket 52a, and A roller 52c is rotatably supported on the shaft 52b. The outer peripheral surface of the roller 52c is separated from the side surface of the Y carriage 30 by an interval of several mm. The outer peripheral surface of the + X side roller 52c is disposed so as to contact the + X side support base 38 in a state where the Y carriage 30 is driven to the + X side stroke end using a pair of X / Y-axis 2DOF motors 36. (See FIG. 5). Further, the outer peripheral surface of the −X side roller 52c is disposed so as to contact the −X side support base 38 in a state where the Y carriage 30 is driven to the −X side stroke end. The contact operation between the roller 52c and the corresponding support base 38 is performed based on the output of the gap sensor (and / or a force sensor such as a load cell (not shown)).

In the above description, the roller device 52 is disposed below the movable element 36b. However, the present invention is not limited to this. For example, as shown in FIG. May be arranged outside the stator 36a (bypassing the stator 36a). In this case, it is possible to roughly match the Z position of the roller 52 and the center-of-gravity position CG ₂ fine stage 50. Accordingly, no moment in the θy direction acts on the fine stage 50. Since the Z positions of the roller device 52 and the stator 36a are substantially the same, it is preferable to attach a protective plate 53 to the stator 36a at a portion that contacts the roller 52c.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded onto the mask stage apparatus 14 by a mask loader (not shown) under the control of a main controller (not shown). The substrate P is loaded onto the substrate stage device 20 by a substrate loader (not shown). Thereafter, the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its detailed description is omitted.

  During the step-and-scan exposure operation, for example, as shown in FIG. 5, when moving the substrate P in the -X direction (acceleration, constant speed movement, and deceleration), the substrate stage apparatus 20 Then, the follower table 28 is driven in the −X direction by an X linear motor 23 (not shown in FIG. 5, see FIG. 3). At this time, electric power is not supplied to each of the pair of X / Y-axis 2 DOF motors 36, so that the + X side support base 38 contacts the roller 52 c (not shown in FIG. 5; see FIG. 4) of the roller device 52. Touch. The bridge stage 24 (Y beam guide 24a and a pair of X carriages 24b) is moved in the -X direction integrally with the follower table 28 by being pulled by the support base 38 on the -X side via the flexure device 40. To do. The Y carriage 30 is accelerated in the −X direction by a thrust applied from the follower table 28 via the support base 38 and the roller device 52.

  When the substrate P substantially reaches a desired speed (acceleration of the substrate P is almost finished), power is supplied to each of the pair of X / Y-axis 2 DOF motors 36, and a laser interferometer 49 (not shown in FIG. 5). The position control of the Y carriage 30 in the X-axis direction with respect to the follower table 28 is performed based on the output of the substrate interferometer system including FIG. At this time, the Y carriage 30 is slightly driven while the support base 38 and the roller device 52 are separated from each other. Although not shown, when the substrate P (Y carriage 30) moving in the −X direction is decelerated, the power supply to the pair of X / Y-axis 2 DOF motors 36 is stopped, whereby the Y carriage 30 is The Y beam guide 24 a is moved by inertia, and the −X side roller device 52 comes into contact with the −X side support base 38. Thereafter, the Y carriage 30 is integrally decelerated by decelerating the follower table 28. Since the operation when driving the substrate P in the + X direction is the reverse of the above case, the description thereof is omitted. Thus, the substrate stage apparatus 20 uses the follower table 28 without using the pair of X / Y-axis 2 DOF motors 36 at the time of acceleration / deceleration of the substrate P (Y carriage 30) that requires a large thrust. / The power consumption of the Y-axis 2DOF motor 36 can be suppressed.

  When the substrate P is moved in the Y-axis direction with a predetermined long stroke, as shown in FIG. 6, a pair of X / Y-axis 2 DOF motors 36 (one is not shown in FIG. 6, refer to FIG. 1). As a result, the Y carriage 30 is driven in the Y-axis direction on the Y beam guide 24a (bridge stage 24). When the movement operation of the substrate P shown in FIG. 6 in the Y-axis direction and the acceleration / deceleration operation of the substrate P shown in FIG. 5 in the X-axis direction are performed in parallel, the roller 52c (see FIG. 4) is rotated in accordance with the movement operation of the Y carriage 30 in the Y-axis direction, so that there is no resistance to movement of the carriage 30 in the Y-axis direction. Further, the minute driving of the substrate P in the θz direction is performed by setting the driving directions in the Y axis direction of the pair of X / Y axis 2 DOF motors 36 to be opposite to each other. If the follower table 28 can press the Y carriage 30 via the support base 38, for example, an air bearing whose bearing surface faces the support base 38 is attached to the side surface of the Y carriage 30 instead of the roller device 52. The Y carriage 30 may be pressed without contact. Further, instead of the roller device 52, a simple pressing pad may be attached to the support base 38 and the Y carriage 30 may be pressed in a contact state.

According to the substrate stage apparatus 20 according to the first embodiment described above, the fine stage 50 is configured using the X / Y axis 2 DOF motor 36 disposed at the same height as the gravity center position CG _{2 of} the fine stage 50. It is driven on the bridge stage 24 with a long stroke in the Y-axis direction and is slightly driven in the X-axis direction as appropriate. The bridge stage 24 in a non-contact support the fine stage 50 is driven in the X-axis direction by the follower table 28 connected at the same height as the position of the center of gravity CG _1. As a result, the fine stage 50 that holds the substrate P has a driving force acting on the height of the center of gravity both when moving in the X-axis direction and when moving in the Y-axis direction (hereinafter referred to as center-of-gravity driving). ). Accordingly, the fine stage 50 and the bridge stage 24 do not receive a moment around the axis orthogonal to the driving direction (pitching moment), so that the controllability is improved and the air bearing 42 or the X carriage 24b is not shown. The load does not act on each air bearing. Thereby, the acceleration / deceleration speed of the stage of the fine stage 50 can be increased, and the throughput is improved. Further, since the driving reaction force of the fine stage 50 driven in the X-axis and Y-axis directions is transmitted to the follower base 26 separated from the apparatus main body 18, there is no possibility of exciting the apparatus main body 18.

  Further, since the substrate stage device 20 does not have a mechanical device (for example, a Y linear guide device) that restrains the movement of the fine stage 50 in the X-axis direction, the cost of the device can be reduced. Even when the fine stage 50 is accelerated or decelerated at high speed in the X-axis direction, there is no risk of mechanical damage. Further, since the fine stage 50 is pressed against the follower table 28 via the roller device 52 when accelerating / decelerating the fine stage 50 in the X-axis direction, the X / Y-axis 2DOF motor 36 in the X-axis direction is also configured. The thrust can be reduced. Further, since the bridge stage 24 is pulled in the X-axis direction by the follower table 28, a driving device for driving the bridge stage 24 is not necessary. Further, since the X linear motor 23 that drives the follower table 28 does not directly drive the fine stage 50, the ripple is larger than that of the coreless motor, but an inexpensive cored linear motor can be employed.

  In the first embodiment, for example, when the X / Y-axis 2DOF motor 36 has a sufficiently large thrust in the X-axis direction, the X / Y-axis 2DOF motor 36 is used to move the fine stage 50 in the X-axis direction. Acceleration / deceleration may be performed. Alternatively, the bridge stage 24 and the follower table 28 may be separated, and the bridge stage 24 and the follower table 28 may be driven in the X-axis direction using independent drive devices. In this case, it is desirable that the driving device can drive the bridge stage 24 at the center of gravity. In addition, the X guide 22 and the X carriage 24b are arranged as a pair apart from each other in the Y-axis direction, but the present invention is not limited to this and may be three or more.

<< Second Embodiment >>
Next, a second embodiment will be described with reference to FIGS. The substrate stage apparatus 120 according to the second embodiment is different from the first embodiment in the configuration of a drive system for driving the substrate P in the Z / tilt direction. Hereinafter, only differences will be described, and elements having the same configuration and function as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and description thereof is omitted.

  In the first embodiment, the Y carriage 30 is directly placed on the Y beam guide 24a via the air bearing 42 as shown in FIG. The weight canceling device 70 is placed on the Y beam guide 24a, and the Y carriage 30 is supported by the weight canceling device 70 from below via a leveling device 72. In the substrate stage apparatus 120 of the second embodiment, the substrate holder 46 is directly fixed on the upper surface of the Y carriage 30, and the position of the substrate P placed on the substrate holder 46 in the Z / tilt direction. 8 is controlled by, for example, four Y / Z-axis 2DOF motors 34 as shown in FIG.

  Returning to FIG. 8, the weight cancellation device 70 has the same configuration and function as the weight cancellation device disclosed in, for example, US Patent Application Publication No. 2010/0018950. That is, the weight canceling device 70 has, for example, an air spring (not shown), and the weight of the system including the Y carriage 30, the substrate holder 46, and the like due to the upward force in the gravity direction (+ Z direction) generated by the air spring. This cancels the (downward (−Z direction) force due to weight acceleration), thereby reducing the load on the Y / Z-axis 2DOF motor 34 when position control of the substrate P in the Z / tilt direction is performed. The weight canceling device 70 has an air bearing (not shown) in the vicinity of the lower end, and floats on the Y beam guide 24a through a slight clearance by the action of the air bearing.

  The leveling device 72 is a spherical bearing device that includes a spherical body that is slidably fitted in a recess formed in the central portion of the lower surface of the Y carriage 30, and the Y carriage 30 can be tilted in a direction that includes the θx and θy directions. I support it. The weight cancellation device 70 moves in the X axis and / or Y axis direction integrally with the Y carriage 30 via the leveling device 72. If the Y carriage 30 can be supported in a tiltable manner, a pseudo spherical bearing device as disclosed in, for example, US Patent Application Publication No. 2010/0018950 may be used as the leveling device. .

  As shown in FIG. 9, the mover 36b is fixed to the side surface on the + X side of the Y carriage 30 as in the first embodiment. A mover 34 b is fixed to the + Y side and the −Y side of the mover 36 b on the side surface on the + X side of the Y carriage 30. The mover 34b is substantially the same in appearance as the mover 36b (the configuration and control of a coil unit (not shown) are different), and a predetermined clearance is provided between a pair of opposing surfaces of the stator 36a. Has been inserted (see FIG. 8). Similarly, a movable element 36b and a pair of movable elements 34b are fixed to the side surface of the Y carriage 30 on the −X side. The pair of X / Y-axis 2DOF motors 36 is constituted by the pair of stators 36a and the corresponding movers 36b, which is the same as in the first embodiment. In the second embodiment, for example, four Z / Y-axis 2 DOF motors 34 are configured in total by the pair of stators 36 a and the corresponding four movable elements 34 b, for example. The Z / Y-axis 2DOF motor 34 can drive the mover 34b with respect to the stator 36a with a long stroke in the Y-axis direction, and can slightly drive the mover 34b with respect to the stator 36a in the Z-axis direction. Yes. Like the Z / Y-axis 2DOF motor 34 of this embodiment, the mover 34b is driven with a long stroke (translation drive) along the direction in which the stator 36a extends (Y-axis direction in this embodiment), and the mover A 2DOF motor capable of applying a floating force (force in the Z-axis direction) to 36b is disclosed in, for example, US Patent Application Publication No. 2010/0167556.

  In the substrate stage apparatus 120, the Y carriage 30 is translationally driven in the Y axis direction with respect to the follower table 28 (in the θz direction) by the pair of X / Y axis 2 DOF motors 36 and the four Z / Y axis 2 DOF motors 34. The Y carriage 30 is slightly driven in the X-axis direction with respect to the follower table 28 by the pair of X / Y-axis 2 DOF motors 36, and further, for example, four Z / Y-axis 2 DOF motors 34. As a result, the Y carriage 30 is slightly driven in the Z / tilt direction with respect to the follower table 28. The position information of the Y carriage 30 (that is, the substrate P) in the Z / tilt direction is weight canceled by a plurality of Z sensors 74a (for example, laser displacement meters) attached to the lower surface of the Y carriage 30, as shown in FIG. It is obtained by using a target 74c fixed to the device 70 via an arm member 74b. The Z sensor 74a and the target 74c corresponding to the Z sensor 74a are arranged at least at three locations that are not on the same straight line. Note that the upper surface of the Y beam guide 24a may be used as the target for the Z sensor 74a. In the second embodiment, in addition to the same effects as those of the first embodiment, the Z / tilt direction control of the fine stage 50 is shared with the Z / tilt 2 DOF motor 36 using the stator 36a. Since it is performed by the Y-axis 2DOF motor 34, the efficiency is good.

  In the second embodiment, a motor (X / Y-axis 2 DOF motor 36) composed of a stator 36a and a mover 36b, and a motor (Z / Y) composed of a stator 36a and a mover 34b. The Y-axis 2DOF motor 34) can generate a thrust in the Y-axis direction. If either one can generate a thrust in the Y-axis direction, for example, the Y-axis 2DOF motor 34) includes a stator 36a and a mover 36b. The other motor may be an X linear motor, or the other motor constituted by, for example, the stator 36a and the mover 34b may be a Z linear motor.

<< Third Embodiment >>
Next, a third embodiment will be described with reference to FIG. The substrate stage apparatus 220 according to the third embodiment is for driving the Y carriage 30 in the Y-axis and / or X-axis direction as compared with the substrate stage apparatus 20 (see FIG. 1) of the first embodiment. The configuration of the pair of X / Y-axis 2 DOF motors 35 is different. Hereinafter, only differences will be described, and elements having the same configuration and function as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and description thereof is omitted.

Each of the pair of X / Y axis 2 DOF motors 35 includes a stator 35a and a mover 35b. The X / Y-axis 2DOF motor 35 is configured such that the Y / Z-axis 2DOF motor 34 (see FIGS. 8 and 9) in the second embodiment is rotated by 90 ° around the Y-axis. That is, the stator 35a is formed in an XZ cross-section U shape, and is fixed to the support base 38 in an open state on the + Z side. The mover 35b is attached to the upper surface of the Y carriage 30 via the attachment plate 35c. The X / Y-axis 2DOF motor 35 can slightly drive the mover 35b in the X-axis direction between a pair of opposing surfaces of the stator 35a. Thereby, in the substrate stage apparatus 220, the Y carriage 30 is slightly driven in the X-axis direction with respect to the follower table 28. The point that the Y carriage 30 is driven in the Z / tilt direction by a plurality of Z driving devices 44 is the same as in the first embodiment. In the substrate stage device 220 of the third embodiment, it is possible to match the Z position of the roller 52 in the Z position of the center of gravity position CG ₂ fine stage 50. Hereinafter, in the present specification, as in the third embodiment, the arrangement of the 2DOF motor (or linear motor) in which the stator opens on the + Z side is referred to as “vertical arrangement”, and the arrangement of the first embodiment is described. As described above, the arrangement of the 2DOF motor (or linear motor) in which the stator opens to the + X (or −X) side will be referred to as “lateral arrangement”.

<< Fourth Embodiment >>
Next, a fourth embodiment will be described with reference to FIGS. The substrate stage device 320 according to the fourth embodiment is different in the driving method of the Y carriage 30 from the first to third embodiments. Hereinafter, only differences will be described, and elements having the same configurations and functions as those of the first to third embodiments will be denoted by the same reference numerals as those of the first to third embodiments, and description thereof will be omitted. Note that the substrate stage apparatus 320 shown in FIG. 11 corresponds to the cross-sectional view taken along the line EE of FIG.

  In the first embodiment (see FIG. 1), the Y carriage 30 is driven in a two-degree-of-freedom direction by a pair of X / Y-axis 2DOF motors 36, whereas in the fourth embodiment, the Y carriage 12, 30 is driven with a long stroke in the Y-axis direction by a pair of Y linear motors 37 and is slightly driven in the X-axis direction by a plurality of X voice coil motors 76.

  In the substrate stage device 320, as can be seen from FIG. 11 and FIG. 12, a base plate 25 made of a plate-like member parallel to the XY plane is fixed on the pair of pedestals 18b, and a pair of base plates 25 is placed on the base plate 25. X guide 22 is fixed. As in the first embodiment, the pair of X guides 22 may be directly fixed on the pair of undercarriage portions 18b (the base plate 25 may not be provided). A bridge stage 24 is mounted on the pair of X guides 22. In the fourth embodiment, as shown in FIG. 12, the Y beam guide 24a of the bridge stage 24 is formed somewhat wider than the first embodiment (see FIG. 2). For convenience, the same reference numerals are used for explanation. Further, in the bridge stage 24 according to the fourth embodiment, the Y beam guide 24a is placed on the pair of X guides 22 via a plurality of air bearings 24c, similarly to the modification shown in FIG. While floating, the relative movement in the Y-axis direction with respect to the X guide 22 is restricted by the plurality of pins 24d (the shape of the air bearing 24c and the pin 24d is different from that in FIG. 7A, but is functionally the same). For convenience, the same reference numerals are used). Note that the Y beam guide 24a may be mounted on the pair of X guides 22 via the X carriage 24b (see FIG. 3) made of a member having an inverted U-shaped YZ section, as in the first embodiment. good.

  On the Y beam guide 24a, as in the first embodiment, the Y carriage 30 is non-passed through an air bearing 42 (for convenience, the same reference numerals as those in the first embodiment are given). It is placed in contact. In the fourth embodiment, for example, four air bearings 42 are arranged in the vicinity of the four corners of the Y carriage 30, but the air bearings are arranged at the center of the lower surface of the Y carriage 30 as in the first embodiment. One 42 may be attached. The point that the substrate table 32 is arranged on the Y carriage 30 via the plurality of Z driving devices 44 and the point that the substrate holder 46 that holds the substrate P on the substrate table 32 is fixed are described above. Since it is substantially the same as the first embodiment, the description thereof is omitted. Since the configuration of the follower base 26 and the follower table 28 driven on the follower base 26 in the X-axis direction by the X linear motor 23 is substantially the same as that of the first embodiment, description thereof will be omitted.

  A stator 35a is fixed to the + X side and the −X side of the follower table 28 in the vicinity of the end portions via a support base 38. As shown in FIG. 14, the support base 38 in the fourth embodiment is formed in a rectangular shape when viewed from the front. The same reference numerals as those in the first embodiment are given. Moreover, it may be formed in a reverse trapezoidal shape as in the first embodiment. The Y beam guide 24a is connected to the support base 38 via a plurality of flexure devices 40, and is pulled by the follower table 28 via the flexure device 40, as in the first embodiment.

  Next, referring to FIG. 12, a pair of Y linear motors 37 for driving the Y carriage 30 with a predetermined long stroke in the Y-axis direction, for example, four X voice coils for slightly driving the Y carriage 30 in the X-axis direction The configuration of, for example, four Y linear motors 39 for driving the motor 76 and the stator 76a (see FIG. 13) of each of the four X voice coil motors 76 in the Y-axis direction with a predetermined long stroke will be described. .

  Each of the pair of Y linear motors 37 includes a stator 37a and a mover 37b. Similarly to the third embodiment, the stator 37a is formed in a U-shaped XZ section, and is fixed to the support base 38 in an open state (vertical arrangement) on the + Z side. A plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction are fixed to each of the pair of opposed surfaces of the stator 37a. A mover 37b is inserted between a pair of opposing surfaces of the stator 37a. As shown in FIG. 13, the upper end of the support base 38 has a guide plate parallel to the YZ plane extending in the Y-axis direction along the surface facing the Y carriage 30 on the outer surface of the stator 37 a. 57a is fixed, and a pair of Y linear guides 58a is fixed to the guide plate 57a at a predetermined interval in the Z-axis direction. The mover 37b is fixed to the lower surface in the vicinity of the other end (see FIG. 12) of the mounting plate 54, one end of which is fixed to the upper surface of the Y carriage 30 via the spacer 54a (in FIG. 13, the surface of the mover 39b). Hidden behind) The mover 37b has a coil unit (not shown), and the direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown).

  Returning to FIG. 12, for example, each of the four Y linear motors 39 includes a stator 37a (shared with the Y linear motor 37) and a mover 39b. The mover 39b is disposed on the + Y side and the −Y side of the mover 37b via a predetermined clearance with respect to the mover 37b, and is inserted between a pair of opposing surfaces of the stator 37a. (In FIG. 13, one mover 39b is hidden behind the other mover 39b in the drawing). The mover 39b has a coil unit (not shown), and the direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown).

  As shown in FIG. 13, the mover 39 b is attached to a substage 56 formed in an inverted L-shaped XZ cross section. In the substage 56, a first surface portion that is a portion parallel to the YZ plane is disposed to face the guide plate 57a, and a second surface portion that is a portion parallel to the XY plane is disposed above the stator 37a. . The second surface portion is disposed at substantially the same Z position as the mounting plate 54, and a pair of movers 39b are fixed to the lower surface of the second surface portion (see FIG. 12). In the present embodiment, one substage 56 is driven by, for example, two Y linear motors 39, but the present invention is not limited to this. For example, the number of Y linear motors 39 may be one or three or more. Further, a notch for inserting the attachment plate 54 through a predetermined clearance is formed at the center of the second surface portion (see FIG. 12). On the first surface portion of the substage 56, together with the Y linear guide 58a, for example, a Y slide member constituting a mechanical Y linear guide device 58 as disclosed in US Pat. No. 6,761,482 is disclosed. A plurality of 58b (for example, three for one Y linear guide 58a) are fixed. The substage 56 is linearly driven in the Y-axis direction by the pair of Y linear motors 39 in synchronization with the Y carriage 30 (attachment plate 54). The sub-stage 56 moves in the X-axis direction integrally with the support base 38 (that is, the follower table 28) to which the corresponding guide plate 57 is fixed.

  The X voice coil motor 76 includes a stator 76a and a mover 76b. The stator 76a is fixed on a mounting plate 57b that is fixed in the vicinity of the lower end of the substage 56 and is parallel to the XY plane. The stator 76a is integrated with the substage 56 (that is, integrated with the Y carriage 30). Move in the direction with a predetermined long stroke. The stator 76a is formed in a YZ cross-section U shape, and a plurality of permanent magnets are fixed to each of the pair of opposed surfaces. The mover 76b is fixed to the side surface of the Y carriage 30 via a mounting plate 57c. The mover 76b has a coil unit (not shown), and the coil unit is inserted between a pair of opposing surfaces of the stator 76a. The direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown).

  Returning to FIG. 12, in the substrate stage device 320, when the Y carriage 30 is driven (accelerated and decelerated) in the X-axis direction, the follower table 28 is driven in the X-axis direction by the X linear motor 23 (see FIG. 14). In response to this, the stator 76a of the X voice coil motor 76 moves in the X-axis direction. The thrust generated between the stator 76a and the mover 76b of the X voice coil motor 76 is controlled so that the Y carriage 30 moves in the X-axis direction integrally with the follower table 28. Accordingly, the follower table 28 and the Y carriage 30 can be moved integrally in the X-axis direction with little relative movement in the X-axis direction. Further, when the Y carriage 30 moves at a constant speed in the X-axis direction, the X position and the θz position of the Y carriage 30 are appropriately accurately controlled by the four X voice coil motors 76, for example.

<< Fifth Embodiment >>
Next, a fifth embodiment will be described with reference to FIGS. 15 (A) to 16 (B). A substrate stage apparatus 420 according to the fifth embodiment is different from the substrate stage apparatus 320 (see FIG. 11) of the fourth embodiment in that it includes a switching device 80. Hereinafter, only differences will be described, and elements having the same configuration and function as those of the fourth embodiment are denoted by the same reference numerals as those of the fourth embodiment, and description thereof is omitted.

  As shown in FIG. 16A, the switching device 80 is attached to the frame member 84 fixed to the side surface on the −Y side of the Y carriage 30 and the central portion of the attachment plate 57b via the rotation drive device 86. And a spheroid 82 formed. The frame-shaped member 84 is formed of a plate-shaped member having a rectangular shape in plan view, and an opening 84a having a rectangular shape in plan view penetrating in the Z-axis direction is formed at the center. The spheroid 82 is formed of a plate-like member having an XY cross-sectional ellipse and is inserted into the opening 84a. Of the inner wall surface that defines the opening 84a, the distance between the pair of opposed surfaces that are separated in the X-axis direction is set to be approximately the same as (or somewhat longer than) the dimension in the major axis direction of the spheroid 82, and the Y-axis The distance between the pair of facing surfaces that are separated in the direction is set to be longer than the major axis dimension of the spheroid 82.

  In the switching device 80, as shown in FIG. 16B, when the major axis direction of the spheroid 82 is parallel to the X axis, the outer peripheral surface of the spheroid 82 and the opening 84a are defined. The inner wall surface abuts (or approaches through a small gap), and the X of the Y carriage 30 and the substage 56 (not shown except for the mounting plate 57b in FIG. 16B, see FIG. 15B). Relative movement along the axial direction is limited. On the other hand, as shown in FIG. 16A, when the major axis direction of the spheroid 82 is parallel to the Y axis, the inner surface defining the outer peripheral surface of the spheroid 82 and the opening 84a is defined. The wall surface is separated at a predetermined interval (for example, 10 mm or less), and relative movement along the X-axis direction between the Y carriage 30 and the substage 56 is allowed.

  Returning to FIG. 15A, in the substrate stage device 420, the switching device 80 is set in the state shown in FIG. 16B, and the follower table 28 (not shown in FIG. 15A, see FIG. 15B). When driven in the X-axis direction, the follower table 28 and the Y carriage 30 move integrally in the X-axis direction. Thus, the Y carriage 30 can be accelerated and decelerated in the X-axis direction without using a plurality of X voice coil motors 76, which is efficient. On the other hand, when it is necessary to control the X position of the Y carriage 30 with high accuracy, the switching device 80 is set to the state shown in FIG. 16A and the follower table 28 is used by using a plurality of X voice coil motors 76. The position control of the Y carriage 30 with respect to the X-axis direction may be performed.

  In the substrate stage device 420, since the X voice coil motor 76 is not used for acceleration / deceleration of the Y carriage 30, the thrust of the X voice coil motor 76 may be smaller than that in the fourth embodiment. Therefore, the X voice coil motor 76 is not provided on the + X side of the Y carriage 30, and the stator 37 a fixed to the support base 38 and the rectangular parallelepiped fixing member 59 on the side of the Y carriage 30 on the + X side. Only one Y linear motor 37 constituted by the movable element 37b fixed via the Y is disposed. Although the Y linear motor 37 on the + X side of the Y carriage 30 is a horizontal type, it is functionally the same and is therefore given the same reference numeral as in the fourth embodiment. Note that the + X side Y linear motor 37 may be placed vertically in the same manner as the −X side Y linear motor 37.

<< Sixth Embodiment >>
Next, a sixth embodiment will be described with reference to FIGS. 17 (A) and 17 (B). The substrate stage apparatus 520 according to the sixth embodiment is functionally the same as the sub-stage 56 (see the sub-stage 56 of the fifth embodiment (see FIG. 15A)), and therefore has the same reference numerals as the fifth embodiment. Is attached to the support base 38. Hereinafter, only differences will be described, and elements having the same configuration and function as those of the fifth embodiment will be denoted by the same reference numerals as those of the fifth embodiment, and description thereof will be omitted.

  As can be seen from FIGS. 17A and 17B, the sub-stage 56 of the sixth embodiment includes a pair of first portions formed in a plate shape parallel to the YZ plane, and the pair of first stages. An XZ cross-section L-shaped member including a second portion formed in a plate shape parallel to the XY plane and spanned between the portions. The first portion is guided straight in the Y-axis direction by the Y linear guide device 58. Further, the rotation drive device 86 of the switching device 80, the stator 76a of the X voice coil motor 76, and the like are fixed to the second portion. A pair of movable elements 39b is fixed to the substage 56, and a movable element 37b is inserted between the pair of movable elements 39b with a predetermined clearance from the substage 56. Each of the Y linear motor 37 and the Y linear motor 39 is a horizontal type, and thus the height dimension of the Y linear motor 37 and the Y linear motor 39 can be reduced. Further, the guide plate 57a (see FIG. 15B) as in the fifth embodiment is not necessary. In addition, maintainability such as replacement of the stator 37a is improved.

  Note that, as in the modification shown in FIGS. 18A and 18B, in the substrate stage device 520 (the same reference numerals as in FIGS. 17A and 17B are used for convenience), the Y carriage 30 is used. May be driven in the Y-axis direction by a pair of Y linear motors 37 disposed on the −X side and a single Y linear motor 37 disposed on the + X side. The Y mover 37 b of each of the pair of Y linear motors 37 on the −X side is fixed to the Y carriage 30 via the attachment plate 54. Further, only one Y linear motor 39 for driving the substage 56 in the Y-axis direction is provided, and a mover 39 b of the one Y linear motor 39 is fixed to the substage 56.

<< Seventh Embodiment >>
Next, a seventh embodiment will be described with reference to FIGS. 19 (A) and 19 (B). The substrate stage apparatus 620 according to the seventh embodiment is different from the sixth embodiment in that it does not have a pair of X voice coil motors 76 (see FIG. 17A). Hereinafter, only differences will be described, and elements having the same configuration and function as those of the sixth embodiment will be denoted by the same reference numerals as those of the sixth embodiment, and description thereof will be omitted.

  In the substrate stage device 620, the stator 90a is fixed on the support base 38 on the -X side. A mover 90 b is fixed to the Y carriage 30 via a mounting plate 54. The stator 90a and the mover 90b constitute a horizontal type X / Y2DOF motor 90. Similarly to the sixth embodiment, the substage 56 is guided in a straight line in the Y-axis direction along the support base 38 via the Y linear guide device 58. A pair of movers 92 b is fixed to the substage 56. One mover 92b is disposed on the + Y side of the mover 90b, and the other mover 92b is disposed on the −Y side of the mover 90b via a predetermined clearance. The stator 90a and the pair of movable elements 92b constitute a pair of laterally placed type Y linear motors 92. In the substrate stage device 620, the Y carriage 30 has a predetermined long stroke in the Y-axis direction by the X / Y2DOF motor 90 with the Y carriage 30 arranged on the −X side and one Y linear motor 37 arranged on the + X side. And is slightly driven by the X / Y2DOF motor 90 in the X-axis direction. When the Y carriage 30 is accelerated or decelerated, the relative movement of the Y carriage 30 and the follower table 28 (see FIG. 19B) is restricted by the switching device 80. The spheroid 82 (see FIG. 19A) and the rotation drive device 86 (see FIG. 19B) of the switching device 80 are integrally formed with the Y carriage 30 by a pair of Y linear motors 92 in the Y-axis direction. It is driven with a predetermined long stroke.

  Note that, as in the first modification shown in FIGS. 20A and 20B, in the substrate stage device 620 (the same reference numerals as in FIGS. 19A and 19B are used for convenience) The Y carriage 30 may be driven in the Y-axis direction by a pair of X / Y2DOF motors 90 disposed on the −X side and one Y linear motor 37 disposed on the + X side. The Y mover 90 b of each of the pair of X / Y2DOF motors 90 on the −X side is fixed to the Y carriage 30 via a fixing member 59. The substage 56 is disposed between the pair of fixing members 59. The substage 56 includes a spheroid 82 (see FIG. 20A) of the switching device 80 and a rotation driving device 86 (see FIG. B) is attached. A movable element 92b is fixed to the substage 56, and is driven by a Y linear motor 92 with a predetermined long stroke in the Y-axis direction.

  Further, as in the second modification shown in FIGS. 21A and 21B, the substrate stage apparatus 620 (for convenience, the same reference numerals as those in FIGS. 19A and 19B) are used. A pair of clamping devices 94 may be further provided. One clamping device 94 is disposed on the + Y side of the switching device 80, and the other clamping device 94 is disposed on the −Y side of the switching device 80. The clamp device 94 includes an air cylinder 94 a fixed on the substage 56. A ball 94b is fixed to the rod tip of the air cylinder 94a. A pivot 94d is fixed to the mounting plate 54 via a mounting plate 94c above the air cylinder 94a. The pivot 94d has a recess defined by a tapered surface. In the clamping device 94, the movement of the device along the XY plane between the substage 56 and the Y carriage 30 is restricted by inserting the ball 94b into the recess. Since the substrate stage device 620 is not guided by a mechanical guide device, the position in the horizontal plane tends to become unstable in a state where position control is not performed (at the time of initialization or the like). By using the clamp device 94, the Y carriage 30 can be restrained in the XY plane.

  Note that the configurations of the first to seventh embodiments described above (including modifications thereof, the same applies hereinafter) can be changed as appropriate. For example, in the first to seventh embodiments, the X / Y-axis 2DOF motor 36, the Y / Z-axis 2DOF motor 34, the X / Y-axis 2DOF motor 35, the Y linear motor 37, the Y linear motor 39, and the X voice coil The motor 76, the X / Y2DOF motor 90, and the Y linear motor 92 are moving coil types, but are not limited thereto, and may be moving magnet types. In the 2DOF motor or linear motor of the first to seventh embodiments, the number of movers sharing one stator (that is, the number of 2DOF motors or linear motor sharing one stator). Is not particularly limited as long as the object to be driven can be driven at a desired speed or accuracy, and may be more or less than the case exemplified in the above embodiments.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  Although the case where the projection optical system 16 is a multi-lens projection optical system including a plurality of optical systems has been described, the number of projection optical systems is not limited to this, and one or more projection optical systems may be used. The projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror. Further, the projection optical system 16 may be an enlargement system or a reduction system.

  Further, the use of the exposure apparatus is not limited to the exposure apparatus for liquid crystal that transfers the liquid crystal display element pattern onto the square glass plate. For example, the exposure apparatus for manufacturing an organic EL (Electro-Luminescence) panel, the semiconductor manufacture The present invention can also be widely applied to an exposure apparatus for manufacturing an exposure apparatus, a thin film magnetic head, a micromachine, a DNA chip, and the like. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern.

  The object to be exposed is not limited to a glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Moreover, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member). The exposure apparatus of the present embodiment is particularly effective when a substrate having a side length or diagonal length of 500 mm or more is an exposure target.

  For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) A lithography step for transferring a mask (reticle) pattern to a glass substrate by the exposure apparatus and the exposure method of each embodiment described above, a development step for developing the exposed glass substrate, and a portion where the resist remains. It is manufactured through an etching step for removing the exposed member of the portion by etching, a resist removing step for removing a resist that has become unnecessary after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .

  As described above, the moving body device of the present invention is suitable for moving the moving body along a predetermined two-dimensional plane. The exposure apparatus of the present invention is suitable for forming a predetermined pattern on an object held by a moving body apparatus. Moreover, the manufacturing method of the flat panel display of this invention is suitable for production of a flat panel display. The device manufacturing method of the present invention is suitable for the production of micro devices.

  DESCRIPTION OF SYMBOLS 10 ... Liquid crystal exposure apparatus, 20 ... Substrate stage apparatus, 22 ... X guide, 24 ... Bridge stage, 28 ... Follower table, 30 ... Y carriage, 36 ... X / Y axis 2 DOF motor, 38 ... Support stand, 40 ... Flexure apparatus 52 ... Roller device, P ... Substrate.

Claims (18)

A first movable body capable of moving to the first way direction in the predetermined two-dimensional plane including the first and second directions orthogonal to each other,
Extending in the second way direction, a front Symbol to first hand direction move possible second movable body,
A third moving body supported by the second moving body and capable of relative movement in the second direction with respect to the second moving body;
A connecting portion for connecting the first moving body and the second moving body;
A drive system for driving the first moving body in the first direction,
The third moving body is pressed by the first moving body while being supported by the second moving body connected by the connecting portion with respect to the first moving body driven in the first direction. A mobile device that drives in the first direction . The third moving body has a pressing portion pressed against the first moving body,
The first moving body presses the pressing portion provided on the third moving body in a direction opposite to the traveling direction of the first moving body with respect to the first direction, and the third moving body The mobile device according to claim 1, wherein the mobile device is driven in the first direction. The drive system includes a first actuator provided on the first moving body and the third moving body, and the third moving body that is pressed by the first moving body and moved in the first direction is The moving body device according to claim 1, wherein the first actuator is driven relative to the first moving body in the second direction. 4. The mobile device according to claim 2 , wherein the drive system applies thrust in the first and second directions to a center-of-gravity height position of the third mobile body. The drive system includes a second actuator provided on the first moving body and the third moving body, and the third moving body supported by the second moving body is moved with respect to the first moving body. 5. The mobile device according to claim 2, wherein two mobile bodies are relatively driven in the first direction by the second actuator. The mobile device according to claim 5 , wherein the first and second actuators are electromagnetic motors including a stator provided on the first mobile body and a mover provided on the third mobile body. Said first and second actuator is a common actuator, the common one of said stator, driving one of the movable element which is common to the first and second actuator toward the first and second sides The mobile device according to claim 5 , further comprising a two-degree-of-freedom electromagnetic motor. Said first and second actuators, seen contains two degrees of freedom electromagnetic motor for driving dynamic another of said movable element in said stator, said two degrees of freedom electromagnetic motor, the third moving body, the first mobile The mobile body device according to claim 7 , wherein the mobile body device is driven in a direction intersecting the second direction and the two-dimensional plane with respect to a body. The third moving body, the moving body apparatus according to any one of claims 1 to 8 which is a non-contact supported on said second moving member. The connection unit may connect the second moving body and the first movable body in the height of the center of gravity position of the second movable body,
Said first thrust that will be applied from the moving body to the second movable body, movable body apparatus according to any one of claims 1 to 9 which acts on the center of gravity height position of the second movable body. The connection portion is movable body apparatus according to any one of claims 1 to 10 rigidity other direction is lower than the first way the stiffness of the direction. The drive system, when the first moving body is accelerated and decelerated along the first direction, along the first sides towards the said third moving member by the first actuator which drives the first movable body the movable body apparatus according to prior SL any one of claims 1 to 11 for acceleration or deceleration along the first sides toward the third moving body by the action of thrust was. Limiting device said first and second moving body to limit relative movement along the first way direction between the first moving member and the third moving body when it is accelerated and decelerated along the direction of the first way The mobile device according to any one of claims 1 to 11 , further comprising: The moving body device according to any one of claims 1 to 13 , wherein a predetermined object is held by the third moving body,
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern on the object using an energy beam. The exposure apparatus according to claim 14 , wherein the object is a substrate used for a flat panel display. The exposure apparatus according to claim 15 , wherein the substrate has a length of at least one side or a diagonal length of 500 mm or more. And exposing the object using the exposure apparatus according to claim 1 5 or 16,
Developing the exposed object. A method of manufacturing a flat panel display. Exposing the object using the exposure apparatus according to any one of claims 14 to 16 ,
Developing the exposed object.

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