JP5849955B2 - Mobile device, exposure apparatus, exposure method, flat panel display manufacturing method, and device manufacturing method - Google Patents

Description

  The present invention relates to a moving body device, an exposure apparatus, an exposure method, a flat panel display manufacturing method, and a device manufacturing method, and in particular, a moving body device including a moving body that is movable in at least one axial direction within a predetermined plane, An exposure apparatus including a moving body apparatus, an exposure method for forming a predetermined pattern on an object held by the moving body of the moving body apparatus, a manufacturing method of a flat panel display using the exposure apparatus, and a device using the exposure apparatus It relates to a manufacturing method.

  Conventionally, in a lithography process for manufacturing an electronic device (microdevice) such as a liquid crystal display element, a semiconductor element (such as an integrated circuit), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or a wafer (hereinafter referred to as “mask”). Step-and-scan exposure in which the pattern formed on the mask is transferred onto the substrate using an energy beam while the substrate is collectively moved along a predetermined scanning direction (scanning direction). Equipment (so-called scanning stepper (also called scanner)) is used

  This type of exposure apparatus includes a mask stage that holds a mask and a substrate holding member on which a substrate that is an exposure target is placed.

  The mask stage is driven with a predetermined stroke in the scanning direction by, for example, a plurality of linear motors, and is appropriately finely driven in the scanning direction and a cross-scanning direction perpendicular thereto. The mover of each of these linear motors is provided on the mask stage. Here, since the mask stage is increased in size with the recent increase in size of the mask and its weight is very heavy, a very large thrust is required to drive the mask stage. Therefore, conventionally, a linear motor that generates a large thrust commensurate with this has been used (see, for example, Patent Document 1 and Patent Document 2).

  Further, for example, in the exposure apparatus disclosed in Patent Document 1, the substrate holding member is mounted on an XY biaxial stage apparatus, and the XY biaxial stage apparatus performs a long stroke in a scanning direction and a cross scanning direction orthogonal thereto. Be guided. Further, the substrate holding member is appropriately driven in a direction of 6 degrees of freedom by a plurality of linear motors (voice coil motors) provided with a mover on the substrate holding member and a stator on the XY two-axis stage device. Here, since the substrate holding member is increased in size with the recent increase in size of the substrate and its weight is very heavy, a linear motor that generates a large thrust is used to drive the substrate holding member. It was.

  However, in general, linear motors (stator and mover) that generate a large thrust are large and heavy, and this contributes to a decrease in the motion performance and position controllability of the mask stage and the XY two-axis stage device. It was. Therefore, it has been desired to develop a technique for driving the mask stage and the substrate stage using a small and lightweight linear motor with small generated thrust.

US Patent Application Publication No. 2010/0018950 US Patent Application Publication No. 2008/0030702

According to a first aspect of the present invention, there is provided a moving body device that moves a first moving body and a second moving body that can move relative to each other in a first direction by a first drive system , the first moving body. And a support device that supports the first moving body, and the first moving body and the second moving body that are moving in the first direction. relative movable range, and a limiting device for switchably limit between the first range and the first range smaller than the first range with respect to the first direction, wherein the limiting device, the supporting device On the other hand, a mobile device is provided that is disposed on one side with respect to the first direction and restricts the movable range on the one side and the other side with respect to the first direction .

According to a second aspect of the present invention, there is provided an exposure apparatus for exposing an object with an energy beam , the movable body apparatus of the present invention in which the object is held by the first movable body, and an energy beam applied to the object. exposure apparatus irradiating the and a pattern generator for generating a pattern on the object is provided.

According to a third aspect of the present invention, the method comprising: exposing the object using the exposure equipment of the present invention, the exposed device manufacturing method comprising, and developing the object it is provided. In this case, the manufacturing method of a flat panel display is provided by using the board | substrate used for manufacture of a flat panel display as an object.

According to a fourth aspect of the present invention, there is provided an exposure method for forming a predetermined pattern on an object using an energy beam, the first driving system the first movable body relatively movable and the second moving body to each other A support device arranged to be movable relative to the first moving body and the second moving body by holding the object on the first moving body of the moving body device moved in the first direction by using a method comprising supporting said first moving member, and the supporting device with the other hand the restriction device disposed on a side with respect to said first direction to, the first movable body in the moving to the first direction the relative movable range of the one side and the other side of the second movable body, to switchably limit between the first range and the first range smaller than the first range with respect to the first direction When, by moving the second moving body and the first moving body It and the exposure method comprising a method comprising forming an image of the pattern on the object held in the first moving body is provided.

According to a fifth aspect of the present invention, the method comprising: exposing the object by the exposure method of the present invention, the exposed device manufacturing method comprising, and developing the object it is provided.

It is a figure which shows schematically the structure of the liquid-crystal exposure apparatus which concerns on 1st Embodiment. It is sectional drawing of the substrate stage apparatus which the liquid-crystal exposure apparatus of FIG. 1 has. It is the sectional view on the AA line of FIG. It is a top view of the mask stage apparatus which the liquid-crystal exposure apparatus of FIG. 1 has. It is the BB sectional view taken on the line of FIG. FIG. 6A is a diagram for explaining the relationship between the thrust of the voice coil motor and the force acting on the fine movement stage in the first embodiment, and FIG. 6B is a voice coil motor in the comparative example. It is a figure for demonstrating the relationship between this thrust and the force which acts on a fine movement stage. It is a top view of the mask stage apparatus which concerns on 2nd Embodiment. It is a top view of the mask stage apparatus which concerns on 3rd Embodiment. It is sectional drawing of the mask stage apparatus which concerns on 4th Embodiment. It is sectional drawing of the substrate stage apparatus which concerns on 5th Embodiment. It is the side view which looked at the substrate stage device concerning a 5th embodiment from the + X direction. It is the side view which looked at the substrate stage apparatus concerning a 6th embodiment from the + X direction. It is sectional drawing of the substrate stage apparatus which concerns on 7th Embodiment. It is the side view which looked at the substrate stage apparatus concerning a 7th embodiment from + X direction. It is sectional drawing of the substrate stage apparatus which concerns on 8th Embodiment. It is sectional drawing of the substrate stage apparatus which concerns on 9th Embodiment. It is a top view of the mask stage apparatus which the liquid-crystal exposure apparatus which concerns on 10th Embodiment has. 18A is a side view of the mask stage apparatus of FIG. 17 viewed from the −X side, and FIG. 18B is a cross-sectional view taken along the line CC of FIG. It is a figure which shows the sub stage which the mask stage apparatus of FIG. 17 has. 20A is a plan view of the flexure apparatus included in the mask stage apparatus of FIG. 17, and FIG. 20B is a side view of the flexure apparatus of FIG. 20A. 21A to 21C are views (No. 1 to No. 3) for explaining the operation of the mask stage apparatus of FIG. 22A is a plan view of a flexure device according to a modification, and FIG. 22B is a cross-sectional view taken along the line DD in FIG. 22A. It is XZ sectional drawing of the substrate stage apparatus which the liquid crystal exposure apparatus which concerns on 11th Embodiment has. It is the side view which looked at the substrate stage apparatus of FIG. 23 from the + X side. FIG. 25A is an XZ cross-sectional view of the X switching device when accelerating / decelerating the fine movement stage, and FIG. 25B is a cross-sectional view taken along the line EE of FIG. FIG. 26A is an XZ cross-sectional view of the X switching device when the fine movement stage is moved at a constant speed, and FIG. 26B is a cross-sectional view taken along the line FF of FIG. 27A and 27B are plan views schematically showing the substrate stage apparatus of FIG. 28A and 28B are plan views schematically showing a substrate stage device according to a modification of the eleventh embodiment.

<< First Embodiment >>
The first embodiment will be described below with reference to FIGS. 1 to 6B.

  FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan projection exposure that uses a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used for a display panel of a liquid crystal display device as an exposure object. A device, a so-called scanner.

  The liquid crystal exposure apparatus 10 includes an illumination system IOP, a mask stage apparatus MST including a mask stage 20 that holds a mask M, a projection optical system PL, a body 30 on which the mask stage apparatus MST and the projection optical system PL are mounted, and a substrate P. A substrate stage apparatus PST to be held and a control system thereof are provided. In the following, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure will be referred to as the X-axis direction, and the directions orthogonal to this in the horizontal plane will be the Y-axis direction, X-axis The direction orthogonal to the Z-axis direction will be described, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis will be described as the θx, θy, and θz directions, respectively.

  The illumination system IOP is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331 or US Pat. No. 6,552,775. That is, the illumination system IOP has a plurality of, for example, five illumination systems that illuminate each of a plurality of, for example, five illumination regions arranged in a staggered pattern on the mask M. Each illumination system has a light source (for example, not shown) , A mercury lamp) is irradiated onto the mask M as exposure illumination light (illumination light) IL through a reflection mirror, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, etc. (not shown). As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used. Further, the wavelength of the illumination light IL can be appropriately switched by a wavelength selection filter, for example, according to the required resolution.

  The mask stage apparatus MST includes a pair of mask stage guides 35 fixed to the upper surface of a lens barrel base plate 33 that is a part of a body 30 described later, and an air bearing 27 (see FIGS. 4 and 4) on the pair of mask stage guides 35. 5), the mask stage 20 is mounted in a non-contact state (floating state). The mask stage 20 supports a mask M on which a circuit pattern or the like is formed on its pattern surface (the lower surface in FIG. 1). The mask stage 20 is driven with a predetermined long stroke in the X-axis direction (scanning direction) on the pair of mask stage guides 35 by a mask stage drive system 70 (see FIGS. 4 and 5) included in the mask stage apparatus MST. At the same time, they are slightly driven in the Y-axis direction and the θz direction as appropriate. In the mask stage apparatus MST, the mask stage 20 is appropriately moved with a short stroke also in the Y-axis direction. The configuration of the mask stage apparatus MST will be described in detail later.

  The projection optical system PL is supported by a lens barrel surface plate 33 which is a part of the body 30 below the mask stage 20 in FIG. As the projection optical system PL, one having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 5,729,331 or US Pat. No. 6,552,775 can be used. The projection optical system PL includes a plurality of, for example, five projection optical systems (multi-lens projection optical systems) in which the projection areas of the pattern image of the mask M are arranged in a staggered manner corresponding to the plurality of illumination areas described above, It functions in the same way as a projection optical system having a single rectangular image field whose longitudinal direction is the Y-axis direction. In the present embodiment, each of the plurality of projection optical systems includes, for example, a two-stage in-mirror lens optical system including two prisms, optical element groups (lens groups), and two reflecting mirrors arranged along the optical axis. For example, a bilateral telecentric enlargement system that forms an erect image is used.

  For this reason, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system IOP, the illumination light IL that has passed through the mask M causes the circuit of the mask M in the illumination area to pass through the projection optical system PL. Irradiation region of illumination light IL conjugate to an illumination region on a substrate P on which a resist (sensitive agent) is coated, on which a projection image (partial upright image) of a pattern is arranged on the image plane side of projection optical system PL It is formed in (exposure area). Then, the mask M is moved in the scanning direction (X-axis) with respect to the illumination area (illumination light IL) by synchronous driving of the mask stage 20 and the substrate stage device PST (more precisely, fine movement stage 50 described later) holding the substrate P. And moving the substrate P relative to the exposure area (illumination light IL) in the scanning direction (X-axis direction), thereby scanning exposure of one shot area (partition area) on the substrate P. And the pattern of the mask M is transferred to the shot area. That is, in the liquid crystal exposure apparatus 10, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the sensitive layer (resist layer) on the substrate P is exposed on the substrate P by the illumination light IL. That pattern is formed.

  The body 30 includes a substrate stage frame 31, a pair of side columns 32, and a lens barrel surface plate 33. The substrate stage pedestal 31 is made of a member extending in the Y-axis direction, and is provided with, for example, two in the X-axis direction at a predetermined interval (in FIG. Hidden behind) The two substrate stage stands 31 are supported from below by vibration-proof devices 34 installed on the floor 130 at both ends in the Y-axis direction, and are vibrationally separated from the floor 130. The pair of side columns 32 is made of a member extending in the X-axis direction, and is fixed in a state of being spanned on the + Y side ends and the −Y side ends of the two substrate stage stands 31. . The lens barrel surface plate 33 is formed of a flat plate-like member, and is supported horizontally (parallel to the XY plane) by a pair of side columns 32 that support both ends in the Y-axis direction from below. Thereby, the body 30 and the projection optical system PL supported by the body 30 are vibrationally separated from the floor 130.

  The substrate stage device PST is mounted on the surface plate 12, the pair of base frames 14, the X coarse movement stage 23X supported by the pair of base frames 14 from below, the X coarse movement stage 23X and the so-called gantry together with the X coarse movement stage 23X. Weight coarse stage 23Y, fine movement stage 50 arranged on the + Z side (upper side) of Y coarse movement stage 23Y, and weight cancellation for supporting fine movement stage 50 from below on surface plate 12 The apparatus 40 is provided.

  The surface plate 12 is made of a rectangular plate-like member (for example, viewed from the + Z side) formed of a stone material, and its upper surface is finished with a very high flatness. The surface plate 12 is mounted on the two substrate stage platforms 31 (see FIG. 2).

  Each of the pair of base frames 14 is disposed on one side and the other side of the surface plate 12 in the Y-axis direction. As shown in FIG. 2, each of the pair of base frames 14 includes a main body portion 14a made of a plate-like member parallel to the XZ plane extending in the X-axis direction, and a plurality (for example, 3) of supporting the main body portion 14a from below. ) And is installed on the floor 130 via a plurality of adjuster devices 14c in a non-contact state (a state straddling the substrate stage mount 31). As shown in FIG. 3, three X linear guide members 16 extending in parallel with the X-axis direction are fixed to both side surfaces and the upper end surface of the main body portion 14a. A pair of magnet units 15a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction are fixed above the X linear guide members 16 on both side surfaces of each main body portion 14a. In FIG. 3, the weight cancellation device 40 and the like are omitted from the viewpoint of avoiding complications in the drawing.

  Returning to FIG. 1, the X coarse movement stage 23 </ b> X has a rectangular frame-shaped member in plan view with the Y-axis direction as the longitudinal direction, that is, a rectangular opening 23 </ b> Xa (see FIG. 2) formed at the center of the plate-like member. It consists of members. As shown in FIGS. 1 and 3, a pair of X carriages 21 are fixed to both ends of the lower surface of the X coarse movement stage 23 </ b> X in the Y-axis direction so as to correspond to the pair of base frames 14. Each X carriage 21 is composed of a member having an inverted U-shaped YZ cross section, and as shown in FIG. 3, a main body portion 14a is inserted between a pair of opposed surfaces. A plurality of X sliders 19 that are slidably engaged with the X linear guide member 16 are fixed to the pair of opposing surfaces and the ceiling surface of each X carriage 21. A coil unit 15b including a plurality of coils is fixed to a pair of opposed surfaces of each X carriage 21 so as to face each of the pair of magnet units 15a. The pair of magnet units 15a and the coil unit 15b opposed thereto constitute an X linear motor 15 of an electromagnetic force (Lorentz force) driving system for driving the X coarse movement stage 23X in the X-axis direction (see FIG. 3). ). The position (X position) in the X-axis direction of the X coarse movement stage 23X includes an X linear scale 13a fixed to the main body 14a and an X encoder head (detector) 13b fixed to the X carriage 21, respectively. Based on the X position information measured by the linear encoder system 13 (or an interferometer system not shown), it is controlled by a main controller (not shown) via a pair of X linear motors 15 on the + Y side and the −Y side. . Further, as shown in FIG. 2, a pair of Y linear guide members 28 extending in the Y-axis direction are fixed to the upper surfaces of the −X side and + X side portions of the X coarse movement stage 23X. A magnet unit 60a including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction between the pair of Y linear guide members 28 on the upper surfaces of the −X side and + X side portions of the X coarse movement stage 23X. It is fixed.

  The Y coarse movement stage 23Y is made of a plate-like member having a rectangular shape in plan view whose length in the X-axis direction is slightly longer than the length in the Y-axis direction, and an opening 23Ya is formed in the center thereof. A plurality of Y sliders 29 slidably engaged with each of the two pairs (four) of Y linear guide members 28 fixed to the upper surface of the X coarse movement stage 23X are provided on the lower surface of the Y coarse movement stage 23Y. (For example, four for each Y linear guide member 28) are fixed (see FIG. 3), and the Y coarse movement stage 23Y is movable with a predetermined stroke in the Y-axis direction with respect to the X coarse movement stage 23X. It has become. On the other hand, the Y coarse movement stage 23Y is restricted in relative movement in the X-axis direction with respect to the X coarse movement stage 23X because the Y linear guide member 28 and the Y slider 29 are engaged. It moves in the X-axis direction integrally with the coarse movement stage 23X. Further, as shown in FIG. 2, each of the pair of coil units 60 b including the coils is disposed on the lower surfaces of the −X side and + X side ends of the Y coarse movement stage 23 </ b> Y. The magnet units 60a are fixed to face each other. The coil unit 60b facing each magnet unit 60a constitutes a Y linear motor 60 of an electromagnetic force (Lorentz force) drive system for driving the Y coarse movement stage 23Y in the Y axis direction on the X coarse movement stage 23X. (See FIG. 2). The position (Y position) of the Y coarse movement stage 23Y in the Y-axis direction is based on Y position information measured by a measurement system (including a Y linear encoder system (or interferometer system)) (not shown). Control is performed by a control device via a pair of Y linear motors 60 on the + X side and the −X side.

  As shown in FIG. 1, the fine movement stage 50 includes a stage main body 51 made of a rectangular parallelepiped member having a substantially square shape in plan view, a leveling device 52 provided below the stage main body 51, and the stage main body 51. A substrate holder 53 is fixed to the upper surface. The substrate holder 53 has, for example, a vacuum suction device (or electrostatic suction device) (not shown), and holds the substrate P on the upper surface thereof. A Y movable mirror (bar mirror) 22Y having a reflecting surface orthogonal to the Y axis is fixed to the side surface on the + Y side of the stage body 51 via a mirror base 24Y. As shown in FIG. 2, an X movable mirror (bar mirror) 22X having a reflecting surface orthogonal to the X axis is fixed to the side surface on the + X side of the stage main body 51 via a mirror base 24X. The position information of the stage main body 51 in the XY plane is, for example, about 0.5 to 1 nm by a laser interferometer system that irradiates each of the Y moving mirror 22Y and the X moving mirror 22X with a length measurement beam and receives the reflected light. Is always detected with a resolution of. The laser interferometer system includes a Y interferometer 39 (see FIG. 1) and an X interferometer (not shown) corresponding to the Y moving mirror 22Y and the X moving mirror 22X, respectively. Each of the Y interferometer 39 and the X interferometer separates light from a light source (not shown) into two light beams by a light separation element (for example, a beam splitter), and one of the light beams corresponds to a movable mirror (Y The movable mirror 22Y or the X movable mirror 22X) is irradiated, and the other light beam is irradiated as a reference beam to a fixed mirror (not shown) attached to the projection optical system PL (or a member that can be regarded as integral with the projection optical system PL). Based on the photoelectric conversion signal of the interference light, the reflected light from the movable mirror and the reference mirror of the length measuring light and the reference light are combined again on the same axis and interfered with each other, and the interference light is received by the light receiving element. Then, the position of the reflecting surface of the movable mirror with respect to the position of the reflecting surface of the fixed mirror in the measurement direction (that is, the displacement amount (movement amount) of the stage main body 51) is obtained.

  As shown in FIG. 2, fine movement stage 50 (stage body 51) includes a Z stator (for example, a coil unit) 36 a fixed to Y coarse movement stage 23 </ b> Y via support member 55, and stage body 51. A plurality of electromagnetic force (Lorentz force) drive type Z voice coil motors 18z each including a Z mover (for example, a magnet unit) 36b fixed to each other via a support member 56, Z is moved on the Y coarse movement stage 23Y. It is driven with a small stroke in the axial direction. One Z voice coil motor 18z is provided at each of three locations that are not on the same straight line, such as locations corresponding to the four corners of the Y coarse movement stage 23Y (in FIG. 2, one Z voice coil motor 18z). Only a representative example), and by generating different driving forces for each of the plurality of Z voice coil motors 18z, the stage body 51 is slightly driven in the tilt direction (for example, θx direction, θy direction, etc.) with respect to the XY plane. it can. Further, a Z stopper device (not shown) is provided between the Y coarse movement stage 23Y and the fine movement stage 50 to mechanically limit the relative movable range of the fine movement stage 50 with respect to the Y coarse movement stage 23Y in the Z-axis direction. It has been. The stage main body 51 is driven with a small stroke in the X-axis direction and the Y-axis direction on the Y coarse movement stage 23Y by an X driving device 70X and a Y driving device 70Y (see FIG. 3), which will be described later. In FIG. 1, illustration of the plurality of Z voice coil motors 18z is omitted.

  As shown in FIG. 1, the weight canceling device 40 is composed of a single columnar member extending in the Z-axis direction (also referred to as a core column), and the central portion of the stage main body 51 is moved downward via the leveling device 52. I support from. As shown in FIG. 2, the weight cancellation device 40 is inserted into the opening 23Xa of the X coarse movement stage 23X and the opening 23Ya of the Y coarse movement stage 23Y.

  The weight cancellation device 40 includes a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 has a base 41a made of a plate-like member parallel to the XY plane, and a peripheral wall portion 41b made of a cylindrical member extending in the Z-axis direction fixed to the upper surface of the base 41a. The housing 41 is provided with a predetermined clearance (gap, It is supported in a non-contact (floating) state via a gap) (in FIG. 2, one of the three base pads 44 is not shown). The air spring 42 is accommodated in the housing 41 and installed on the base 41a. The Z slider 43 is formed of a cylindrical member extending in the Z-axis direction, is placed on the air spring 42, and the outer peripheral surface thereof is a bearing surface of a plurality of air bearings 45 attached to the inner wall surface of the peripheral wall portion 41b. Opposing via a predetermined clearance (gap, gap). As the air spring 42 expands and contracts, the Z slider 43 is guided linearly in the Z-axis direction by a plurality of air bearings 45 in a non-contact state. A plurality of thrust-type air bearings 43a (hereinafter referred to as sealing pads 43a; not shown in FIG. 1) are attached to the upper surface of the Z slider 43, and are added from the bearing surfaces of the plurality of sealing pads 43a. The leveling device 52 is supported in a non-contact manner from below by the static pressure of the pressurized gas. Therefore, the fine movement stage 50 and the weight cancellation device 40 are vibrationally separated in the X-axis and Y-axis directions. The weight canceling device 40 transmits the upward force (+ Z direction) generated by the air spring 42 to the support object, specifically, the fine movement stage 50 (and the substrate P) via the Z slider 43. By canceling the weight (downward force (−Z direction) due to gravitational acceleration), the load on the plurality of Z voice coil motors 18z is reduced.

  A plurality of (for example, four) Z sensors (for example, a laser displacement meter, a laser interferometer, etc.) 47 are fixed to the lower surface of the stage body 51. The four Z sensors 47 are arranged in the Z-axis direction of the fine movement stage 50 via targets 49 attached to the tips of a plurality of (for example, four) arm members 48 fixed in a cantilevered manner to the outer wall surface of the peripheral wall portion 41b. In addition, position information regarding the tilt direction (for example, the θx direction, the θy direction, etc.) with respect to the XY plane is measured. Further, a recess 51 a is formed on the lower surface of the stage main body 51 to accommodate a part of a lever 113 described later. The positional relationship between the Z sensor 47 and the target 49 may be reversed.

  The leveling device 52 is a hemispherical spherical air that is attached to the lower surface of the stage body 51 and is inserted into a recess formed on the upper surface of the base member 52a. It includes a bearing 54, and functions as a spherical bearing device that supports fine movement stage 50 so that it can swing (tilt) with respect to the XY plane with its center of gravity position G1 (hereinafter also referred to as center of gravity G1) as the rotation center. As the configuration of the leveling device 52, for example, a pseudo spherical bearing structure using a polygonal member and a plurality of thrust type air bearings such as a leveling device disclosed in US 2010/0018950 is disclosed. It can also be adopted.

  Further, the peripheral wall portion 41b of the weight canceling device 40 is constituted by a plurality of connecting devices 46 (also referred to as flexure devices) including a leaf spring (or a thin steel plate having no spring property) and a sliding device such as a ball joint. The Y coarse movement stage 23Y is mechanically connected. The weight canceling device 40 is pulled by the Y coarse movement stage 23Y via at least one of the plurality of coupling devices 46, thereby moving in the X axis direction and / or the Y axis direction integrally with the Y coarse movement stage 23Y. To do. Further, the positions (Z positions) of the plurality of coupling devices 46 in the Z-axis direction substantially coincide with the Z position of the center of gravity G2 of the weight cancellation device 40. For this reason, the weight canceling device 40 is moved in parallel with the XY plane on the surface plate 12 by being pulled by the Y coarse movement stage 23Y. At this time, the moment in the θx or θy direction is applied to the weight canceling device 40. Does not work. Therefore, the weight canceling device 40 moves on the surface plate 12 in parallel (without tilting) to the XY plane. On the other hand, since the leveling device 52 is separated (mounted in a substantially friction-free state) with respect to the direction parallel to the XY plane with respect to the weight cancellation device 40 by the plurality of sealing pads 43a, 40 can move along the XY plane. Specific configurations of the weight canceling device 40, the leveling device 52, the connecting device 46, and the like are disclosed in, for example, US Patent Application Publication No. 2010/0018950.

  By the way, in the liquid crystal exposure apparatus 10 of the present embodiment, one pattern (a part of the pattern) is formed on the substrate P by synthesizing a plurality of projection images formed on the substrate P through the plurality of enlarged projection optical systems. Therefore, the illumination system IOP is simultaneously illuminated on the pattern surface of the mask M at a plurality of locations separated by a predetermined interval in the Y-axis direction. That is, on the mask M, a plurality of illumination areas spaced apart at a predetermined interval in the Y-axis direction are formed. A plurality of strip-shaped (strip-shaped) regions extending in the scanning direction (X-axis direction) are provided on the pattern surface of the mask M at predetermined intervals in the Y-axis direction. The intervals in the Y-axis direction are set so that the plurality of band-like areas are illuminated every other illumination system IOP. In these plural strip-shaped regions, a part of a mask pattern for forming a specific pattern (hereinafter referred to as pattern A) on the substrate P, and another pattern different from the pattern A (hereinafter referred to as “pattern A”). A part of the mask pattern for forming (pattern B) on the substrate is alternately formed in the Y-axis direction (each mask pattern is not shown).

  For this reason, in the liquid crystal exposure apparatus 10, the mask M is positioned with respect to the Y-axis direction so that a plurality of strip-like regions having a part of the mask pattern for forming the pattern A on the substrate P are illuminated by the illumination system IOP. By performing scanning exposure in this state, the pattern A can be formed on the substrate P, and a strip-like region having a part of the mask pattern for forming the pattern B on the substrate P is illuminated on the illumination system IOP. As described above, the pattern B can be formed on the substrate P by performing scanning exposure with the mask M positioned in the Y-axis direction.

  In the mask stage apparatus MST according to the present embodiment, the mask stage 20 holding the mask M is also short in the Y axis direction (cross scan direction) in order to enable the positioning of the mask M in the Y axis direction. It can be moved with a stroke. Here, the configuration of the mask stage apparatus MST will be described with reference to FIGS.

  As described above, the mask stage apparatus MST has a pair of mask stage guides 35, a mask stage 20, a mask stage drive system 70, and the like. In FIG. 4, the illumination system IOP, the projection optical system PL, the body 30, the substrate stage apparatus PST, and the like are not shown. In FIG. 5, the illumination system IOP, the substrate stage apparatus PST, and the like are omitted. Yes.

  As shown in FIGS. 4 and 5, the pair of mask stage guides 35 are arranged (fixed) on the lens barrel base plate 33 at a predetermined interval in the Y-axis direction and extend in the X-axis direction. The dimension in the longitudinal direction (X-axis direction) of each of the pair of mask stage guides 35 is set to be somewhat longer than the moving stroke during the scanning operation of the mask M. Each of the pair of mask stage guides 35 is made of, for example, a stone, and the upper surface thereof is finished with extremely high flatness.

  As shown in FIG. 4, the mask stage 20 is made of a frame-like member having a rectangular shape in plan view, the length in the Y-axis direction being somewhat longer than the length in the X-axis direction. For example, air bearings 27 are attached to the lower surface of the mask stage 20 near, for example, four corners via balls (or hinges) 62 (see FIG. 5, in FIG. 5, the −X side air bearing 27 is the + X side). Is hidden behind the air bearing 27). The lower surface (bearing surface) of each air bearing 27 faces the upper surface of the mask stage guide 35 via a minute clearance (gap, gap). For example, each of the four air bearings 27 is levitated and supported on the pair of mask stage guides 35 by the static pressure of pressurized gas ejected from the bearing surfaces toward the upper surface of the mask stage guide 35 facing the mask stage 20 (non-lifting). Contact support).

  As shown in FIG. 4, a rectangular opening 20 a in which the mask M is accommodated is formed in the center portion of the mask stage 20. A holding member 64 including a plurality of (for example, five) suction pads for vacuum-sucking and holding the end portion of the mask M on each of the inner wall surfaces on the −X side and the + X side of the opening 20 a of the mask stage 20 holds the fixing member 66. Is attached through.

  A pair of X moving mirrors 68X each having a reflecting surface orthogonal to the X axis are fixed to the end surface on the −X side of the mask stage 20 so as to be separated from each other in the Y axis direction. A Y movable mirror 68Y composed of a bar mirror having a reflecting surface extending in the X-axis direction and orthogonal to the Y-axis is fixed to the lower surface of the unit. Position information in the XY plane (including rotation information in the θz direction) of the mask stage 20 is provided corresponding to each of the pair of X movable mirrors 68X, and the length measurement beam is applied to the reflecting surface of the corresponding X movable mirror 68X. A pair of X laser interferometers 72X that respectively irradiate and receive the reflected light are provided corresponding to the Y moving mirror 68Y, and the reflecting light of the Y moving mirror 68Y is irradiated with a length measuring beam, and the reflected light is irradiated. It is measured by a pair of Y laser interferometers 72Y that receive light. As shown in FIG. 5, the pair of Y laser interferometers 72 </ b> Y are fixed to the upper surface of the end portion on the −Y side of the lens barrel base plate 33 so as to be separated in the X-axis direction (in FIG. 5, −X The Y laser interferometer 72Y on the side is hidden behind the + X side Y laser interferometer 72Y), and the X laser interferometer 72X is not shown in the figure, but the -X of the lens barrel base plate 33 is omitted. It is fixed to the upper surface of the end portion on the side while being separated in the Y-axis direction.

  A concave portion 20b that opens to the + Z side and the + Y side is formed at the center in the X-axis direction of the end portion on the + Y side of the mask stage 20. A concave portion 20c that opens to the + Z side and the −Y side is formed at the center in the X-axis direction of the −Y side end of the mask stage 20. The X positions of the recesses 20b and 20c substantially coincide with the X position of the center of gravity G of the mask stage 20. The X positions of the recesses 20b and 20c may not coincide with the X position of the center of gravity G (may be on the −X side or the + X side of the center of gravity G).

  The mask stage drive system 70 includes a pair of (+ Y side and −Y side) XY stage devices 76a and 76b that are spaced apart in the Y-axis direction so as to sandwich the mask stage 20 in plan view, and an XY on the + Y side. It has a + Y side driving device 78a mounted on the stage device 76a and a -Y side driving device 78b mounted on the -Y side XY stage device 76b.

  As shown in FIG. 5, the XY stage device 76 a on the + Y side is supported from below by a support base 74 a installed on the + Y side of the body 30, and the XY stage device 76 b on the −Y side is It is supported from below by a support base 74b installed on the -Y side. Each of the support bases 74a and 74b is installed on the floor 130 (see FIG. 1) so that the upper surface thereof is parallel to the XY plane. A pair of X beams 61 respectively constituting a part of the XY stage devices 76a and 76b are fixed to the upper surfaces of the support bases 74a and 74b. Each X beam 61 is composed of a plate-like member parallel to the XY plane extending in the X-axis direction, and its longitudinal dimension is set to be approximately the same as the longitudinal dimension of the mask stage guide 35. A plurality of, for example, a pair (two) of X linear guide members 77 extending in the X axis direction are fixed to the upper surface of each X beam 61 so as to be spaced apart from each other in the Y axis direction. A magnet unit 82 including a plurality of magnets arranged at predetermined intervals in the X-axis direction is fixed.

  The XY stage device 76a on the + Y side includes an X stage 83Xa composed of a flat plate member disposed horizontally (parallel to the XY plane) and a Y stage 83Ya composed of a flat plate member mounted on the X stage 83Xa.

  The X stage 83Xa is supported by a pair of X linear guide members 77 so as to be slidable in the X-axis direction via a plurality of X sliders 79 fixed to the lower surface thereof. For example, two X sliders 79 are provided for each X linear guide member 77 although it is hidden behind the paper surface in FIG. A coil unit 86 including a coil is fixed to the lower surface of the X stage 83Xa so as to face the magnet unit 82. The magnet unit 82 and the coil unit 86 constitute an X linear motor 87a of an electromagnetic force (Lorentz force) drive system that drives the X stage 83Xa with a predetermined long stroke in the X axis direction with respect to the X beam 61 on the support frame 74a. To do. That is, the X stage 83Xa is linearly driven along the pair of X linear guide members 77 (in the X axis direction) by the X linear motor 87a. The position of the X stage 83Xa is controlled by a main controller (not shown) based on the output of a measurement system (not shown) (for example, a linear encoder system (or interferometer system)).

  As shown in FIG. 4, the X stage 83Xa has a pair of stoppers 97 each including a shock absorber installed in the vicinity of the −X side and + X side ends of the X beam 61 (support frame 74a). The range of movement in the direction is mechanically limited. Specifically, the movement range of the X stage 83Xa is set within a range in which none of the plurality of air bearings 27 attached to the mask stage 20 is disengaged from above the mask stage guide 35. Further, on the upper surface of the X stage 83Xa, a plurality of (for example, two) Y linear guide members 84 extending in the Y axis direction and spaced apart in the X axis direction, and a plurality of magnets arranged at predetermined intervals in the Y axis direction A magnet unit (not shown) including is fixed.

  As shown in FIG. 5, the Y stage 83 </ b> Ya is supported by two Y linear guide members 84 through a plurality of Y sliders 129 fixed to the lower surface thereof so as to be slidable in the Y axis direction. For example, two Y sliders 129 are provided for one Y linear guide member 84. The Z position on the upper surface of the Y stage 83Ya is set higher than the Z position on the upper surface of the mask stage guide 35 on the + Y side. A coil unit (not shown) including a coil is fixed to the lower surface of the Y stage 83Ya so as to face a magnet unit (not shown) fixed to the upper surface of the X stage 83Xa. The magnet unit and coil unit (both not shown) constitute a Y linear motor of an electromagnetic force (Lorentz force) driving system that drives the Y stage 83Ya with a predetermined short stroke in the Y axis direction with respect to the X stage 83Xa. In other words, the Y stage 83Ya is linearly driven along the two Y linear guide members 84 (in the Y-axis direction) by the Y linear motor. The position of the Y stage 83Ya is controlled by a main controller (not shown) based on the output of a measurement system (not shown) (for example, a linear encoder system (or interferometer system)).

  The XY stage device 76b on the -Y side includes an X stage 83Xb made of a flat plate member arranged in parallel to the XY plane, and a Y stage 83Yb mounted on the X stage 83Xb. The X stage 83Xb has the same configuration as the X linear motor 87a that drives the X stage 83Xa (including the coil unit 86 and the magnet unit 82), is driven in the X-axis direction, and is the same as the X stage 83Xa In addition, the linear guide device includes the X linear guide member 77 and the X slider 79, and is linearly guided in the X-axis direction. The Z position on the lower surface of the X stage 83Xb is set higher than the Z position on the upper surface of the Y laser interferometer 72Y. The Y stage 83Yb has a base member 88 that is inclined so that the upper surface of the Y stage 83Y is lower than the −Y side, and a support member that is fixed along the upper surface (inclined surface) of the base member 88. 89. The base member 88 is driven in the Y-axis direction with respect to the X stage 83Xb by a Y linear motor having the same configuration as that of the Y linear motor that drives the Y stage 83Ya, and the Y linear guide member 84 is the same as the Y stage 83Ya. A plurality of linear guide devices each including a Y slider 129 are guided linearly in the Y-axis direction.

  As shown in FIGS. 4 and 5, the + Y side drive device 78 a includes a voice coil motor 71, a lever 73, and the like. As shown in FIG. 4, the voice coil motor 71 is disposed in the vicinity of the + Y side end of the Y stage 83Ya. As shown in FIG. 5, the voice coil motor 71 is provided corresponding to a stator 69 (for example, a coil unit) fixed to the upper surface of the Y stage 83 </ b> Ya via a support member 72, and the stator 69. Mover 75 (for example, a magnet unit). The mover 75 includes a yoke 75a made of a magnetic body having a substantially U-shaped YZ cross section, and a plurality of permanent magnets 75b fixed to each of a pair of opposed surfaces of the yoke 75a. The stator 69 includes a plurality of coils (not shown) and a housing member 69a having a substantially Y-shaped YZ section for housing the plurality of coils. The accommodating member 69a has a part of the plurality of coils accommodated between the pair of opposed surfaces of the yoke 75a and a permanent magnet 75b fixed to each of the pair of opposed surfaces in the Y-axis and Z-axis directions. It is inserted through a clearance (gap, gap). With the above configuration, when a current is supplied to a plurality of coils of the stator 69, a current flows in the stator 69 across the Z-axis magnetic field generated in the mover 75 in the Y-axis direction. An electromagnetic force (Lorentz force) in the X-axis direction acts between the child 69 and the mover 75. Therefore, hereinafter, the voice coil motor 71 is also referred to as an X voice coil motor 71. Note that the current supply to the plurality of coils of the stator 69 is controlled by the main controller.

  The lever 73 is composed of an elongated member arranged in parallel to the XY plane, and the yoke 75a of the mover 75 is fixed to one end portion in the longitudinal direction, and the other end portion in the longitudinal direction, together with an air bearing 80 described later, It is inserted into a recess 20 b formed in the mask stage 20. Further, the lever 73 is rotatably supported at its middle portion in the longitudinal direction by a shaft member 90 that is fixed to the Y stage 83Ya and extends in the Z-axis direction. More specifically, a through hole 73a (see FIG. 4) penetrating in the Z-axis direction is formed in the intermediate portion of the lever 73, and the shaft member 90 is inserted into the through hole 73a. The shaft member 90 is fixed via a fixing member 91 on the upper surface of the Y stage 83Ya and on the + Y side of the recess 20b formed in the mask stage 20. The Z position of the lever 73 is set so as to include the Z position of the center of gravity G of the mask stage 20. In FIG. 4, the lever 73 is located at a reference position (neutral position in the θz direction) whose longitudinal direction is parallel to the Y axis. In addition, as a member which comprises the lever 73, a lightweight and highly rigid thing with a high vibration damping property is preferable.

  The air bearing 80 swings in the θz and θy directions via the ball 99 (or hinge), respectively, on the −X end surface and the + X end surface of the end portion (the other end portion in the longitudinal direction) of the lever 73 on the −Y side. Each one is attached as possible. The bearing surface of the −X side air bearing 80 faces the −X side, and the bearing surface of the + X side air bearing 80 faces the + X side. On the other hand, the inner wall surface on the −X side of the recess 20b of the mask stage 20 is parallel to the YZ plane facing the bearing surface of the air bearing 80 on the −X side via a predetermined (small) clearance (gap, gap). An opposing member 81 having an opposing surface is fixed. Similarly, on the inner wall surface on the + X side of the recess 20b of the mask stage 20, a facing surface parallel to the YZ plane that faces the bearing surface of the air bearing 80 on the + X side via a predetermined (small) clearance (gap, gap). An opposing member 81 having a fixed shape is fixed. The air bearing 80 is connected to a gas supply device (for example, a compressor) (not shown), and a pressurized gas is ejected from the bearing surface to the opposing surface of the opposing member 81, and the opposing member is generated by the static pressure of the pressurized gas. The above-mentioned predetermined clearance (gap, gap) is formed between The bearing rigidity and load capacity of the air bearing 80 are appropriate so that at least the air bearing 80 does not contact the opposing member 81 and the mask stage 20 can be positioned at high speed when the mask stage 20 is accelerated. It is preferable to set a large size. In order to obtain the appropriate bearing rigidity and load capacity, the predetermined clearance (gap, gap) is appropriately adjusted according to the bearing area of the air bearing 80, for example. Further, as shown in FIG. 5, the Z position of each of the air bearing 80 and the facing member 81 substantially coincides with the Z position of the center of gravity G of the mask stage 20.

  Here, as described above, the air bearing 80 and the facing member 81 are opposed to each other in the X-axis direction because they face each other in the X-axis direction through the predetermined clearance (gap, gap). The directions other than this direction (Y-axis, Z-axis, θx, θy, θz directions) are not restricted to each other. Therefore, the air bearing 80 and the facing member 81 (mask stage 20) are allowed to move relative to the latter direction (Y-axis, Z-axis, θx, θy, and θz directions), and the Y stage 83Ya The generated vibration in the latter direction is hardly transmitted to the mask stage 20 via the + Y side drive device 78a. On the other hand, vibration in the former direction (X-axis direction) is suppressed from being transmitted to the mask stage 20 by controlling the X voice coil motor 71.

  In the driving device 78a on the + Y side, when a current is supplied to the plurality of coils of the stator 69 of the X voice coil motor 71, the electromagnetic mutual between the mover 75 (magnet unit) and the stator 69 (coil unit) is achieved. Due to the action, an electromagnetic force (Lorentz force) directed to one side in the X-axis direction (for example, + X direction) acts on the stator 69 (coil unit), and as a reaction, the lever 73 to which the mover 75 (magnet unit) is fixed A force on the other side in the X-axis direction (for example, in the −X direction) acts on the end portion on the + Y side. As a result, a moment is generated in the lever 73 in one direction around the axis of the shaft member 90 (the θz direction) (for example, in the direction of arrow L in FIG. 4), and one of the levers 73 provided on the −Y side end (for example, The + X side) air bearing 80 presses the opposing member 81 facing the air bearing 80 in a non-contact manner in the + X direction, and an X-axis direction force (driving force) acts on the + Y side end of the mask stage 20. To do. At this time, since the air bearing 80 can swing in the θz direction with respect to the −Y side end of the lever 73 as described above, the lever 73 swings around the axis of the shaft member 90 (θz direction). However, the bearing surface and the facing surface of the facing member 81 facing the bearing surface are kept parallel to each other through the predetermined clearance (gap, gap).

  Here, the axis of the shaft member 90 (the fulcrum of the force transmitted to the mask stage 20 by the + Y side drive device 78a) and the + Y side end of the lever 73 (the + Y side drive device 78a are transmitted to the mask stage 20). The distance between the axis of the shaft member 90 and the -Y end of the lever 73 (the point of action of the force transmitted to the mask stage 20 by the + Y drive device 78a), That is, the lever ratio is set to 4: 1, for example. Therefore, the electromagnetic force generated by the X voice coil motor 71 is amplified about four times by the lever principle and transmitted to the + Y side end of the mask stage 20. The lever ratio is not limited to 4: 1, but may be changed as appropriate according to the thrust of the X voice coil motor 71 (electromagnetic force generated in the X voice coil motor 71). Specifically, the lever ratio is preferably increased as the thrust of the X voice coil motor 71 is smaller.

  Further, as shown in FIG. 5, a movable element 92 composed of a pair of flat plate members spaced in the Z-axis direction parallel to the XY plane is fixed to the inner wall surface on the −Y side of the recess 20 b of the mask stage 20. Yes. A magnet unit (not shown) including a plurality of magnets is fixed to each of the pair of opposing surfaces of the mover 92. On the other hand, a stator 93 composed of a coil unit including a plurality of coils is fixed to the −Y end surface of the lever 73 in a state of being inserted between magnet units fixed to a pair of opposing surfaces of the mover 92. ing. With the above configuration, when current is supplied to a plurality of coils of the stator 93, current flows in the stator 93 across the magnetic field in the Z-axis direction generated in the mover 92 in the X-axis direction. An electromagnetic force (Lorentz force) in the Y-axis direction is generated by electromagnetic interaction between the child 93 and the mover 92. That is, the mover 92 and the stator 93 are of an electromagnetic force (Lorentz force) driving system that slightly drives the mask stage 20 in the Y-axis direction with respect to the Y stage 83Ya via the lever 73, the shaft member 90, and the fixing member 91. A Y voice coil motor 96a is configured. The X position of the Y voice coil motor 96a substantially matches the X position of the center of gravity G of the mask stage 20, and the electromagnetic force generated in the Y voice coil motor 96a is transmitted to the center of gravity G of the mask stage 20. .

  Further, relative positional information (distance) between the mask stage 20 and the Y stage 83Ya in the X-axis and Y-axis directions is fixed to the Y stage 83Ya via a fixing member 91 as shown in FIG. A gap sensor 94a including a gap sensor and a Y gap sensor is measured via an X target 95Xa and a Y target 95Ya fixed to the + Y end face of the mask stage 20.

  As can be seen from FIG. 4, the drive unit 78b on the -Y side is substantially symmetrical with the drive unit 78a on the + Y side with respect to a plane parallel to the XZ plane including the center of gravity G of the mask stage 20 (the mounting structure is And the end of the mask stage 20 on the −Y side is driven in the X-axis direction. Here, as described above, the X stage 83Xb is disposed at a position higher than the Y laser interferometer 72Y, and the installation height of the drive unit 78b on the -Y side is higher than that on the drive unit 78a on the + Y side. Therefore, the lever 73 of the drive unit 78b on the -Y side cannot be inserted into the recess 20c of the mask stage 20 at the + Y side end in the horizontal state. Therefore, as can be seen from FIG. 5, the drive unit 78b on the -Y side has a Y stage in a state where the lever 73, the voice coil motor 71, etc. are inclined such that the + Y side is lower than the -Y side. 83Yb. As can be seen from FIGS. 4 and 5, the −Y side drive device 78b does not have a Y voice coil motor corresponding to the Y voice coil motor 96a of the + Y side drive device 78a. The components of the −Y side drive device 78b are assigned the same reference numerals as the corresponding components of the + Y side drive device 78a. The relative positional information (distance) between the mask stage 20 and the Y stage 83Yb in the X-axis and Y-axis directions is fixed to the Y stage 83Yb via a fixing member 91 as shown in FIG. Measurement is performed by the gap sensor 94b including the gap sensor and the Y gap sensor via the X target 95Xb and the Y target 95Yb fixed to the −Y end face of the mask stage 20.

  As described above, the X voice coil motors 71 of the + Y side and −Y side driving devices 78a and 78b are driven synchronously, so that the + Y side and −Y side ends of the mask stage 20 are respectively in the X-axis direction. The same magnitude of force acting on one side (for example, -X direction) acts, and the mask stage 20 is on one side in the X-axis direction (for example, -X direction) with respect to the Y stages 83Ya and 83Yb on the + Y side and -Y side. Relative movement (minor movement). That is, for example, the mask stage 20 corresponds to the reaction force (corresponding to the thrust of the voice coil motor 71 of the present embodiment) transmitted from the water to two all (corresponding to the lever 73 of the present embodiment) in a rowing boat. ) Is driven in the X-axis direction so that the boat moves. Further, when the X stages 83Xa and 83Xb are synchronously driven with a long stroke in the X-axis direction, the −Y side end of the lever 73 of the + Y side drive device 78a and the lever 73 of the −Y side drive device 78b. The + Y side end of each is driven in the X-axis direction in synchronization with the X stages 83Xa and 83Xb, so that the mask stage 20 moves with the X stages 83Xa and 83Xb in a long stroke in the X-axis direction. Further, when the Y stages 83Ya and 83Yb are synchronously driven with a short stroke in the Y-axis direction, the Y voice coil motor 96a of the + Y side driving device 78a is driven in synchronization with the Y stages 83Ya and 83Yb. The mask stage 20 moves with the Y stages 83Ya and 83Yb in a short stroke in the Y-axis direction.

  Further, as shown in FIG. 4, on the Y stage 83Ya, the + Y side end of the lever 73 of the + Y side drive device 78a (hereinafter referred to as the + Y side lever 73) located at the reference position. Each of the pair of X stoppers 11 is mounted in the vicinity of the −X side and the vicinity of the + X side. Each X stopper 11 includes a shock absorber 11a, a coil spring 11b attached to the shock absorber 11a, and a pad 11c attached to the tip of a rod of the shock absorber 11a. Each X stopper 11 has a shock absorber 11a through the support member 42 and the upper surface of the Y stage 83Ya so that the pad 11c faces the + Y side end of the lever 73 and the expansion / contraction direction of the coil spring 11b is the X-axis direction. It is fixed to. In the state where the lever 73 is at the reference position, a uniform clearance (gap, gap) is formed between each of the −X side and + X side pads 11 c and the + Y side end of the lever 73. Similarly, on the Y stage 83Yb, on the −X side of the −Y side end of the lever 73 of the −Y side drive device 78b (hereinafter referred to as the −Y side lever 73) located at the reference position. X stoppers 11 are also provided in the vicinity and in the vicinity of the + X side.

  Each lever 73 swings a predetermined amount from the reference position (neutral position in the θz direction) to one direction in the θz direction (arrow L direction in FIG. 4) and the other direction from the reference position in the θz direction (FIG. 4). Can be swung without interfering with any of the X stoppers 11 within a predetermined swing range between the position swung by a predetermined amount in the direction of arrow R). For example, during the exposure operation, the + Y side and −Y side lever 73 is driven in the θz direction within the swing range by synchronously driving the + Y side and −Y side X voice coil motors 71. Swing is performed in one direction (for example, the direction of arrow L in FIG. 4), and the other is swung in the other direction of the θz direction (for example, in the direction of arrow R in FIG. 4) within the swinging range. Slightly moves to one side (−X direction or + X direction) in the X axis direction with respect to the Y stages 83Ya and 83Yb within the movement range (within the effective stroke) in the X axis direction corresponding to the swing range. Further, the + Y side and −Y side levers 73 are different from each other in the swing range by at least one of the magnitude and direction of the thrust of each of the + Y side and −Y side X voice coil motors 71 being different from each other. And the mask stage 20 slightly moves (rotates) in the θz direction.

  Here, the main controller (not shown) cannot control the driving devices 78a and 78b due to, for example, an interferometer signal error when the mask stage 20 is moved to one side in the X-axis direction (for example, -X direction). When troubles such as the above occur, the power supply to the X linear motors 87a and 87b is stopped or the brake is operated to stop each of the X stages 83Xa and 83Xb (the X stages 83Xa and 83Xb are the final ones). In actuality, it collides with a stopper 97 provided on the X beam 61 and stops. At this time, the mask stage 20 moves to one side (for example, −X direction) in the X-axis direction with respect to the Y stages 83Ya and 83Yb beyond the effective stroke (range) due to its inertia. As a result, the + Y side lever 73 swings in one direction of the θz direction (for example, the arrow R direction in FIG. 4) beyond the swing range, and comes into contact with the pad 11c of the X stopper 11 on the + Y side and the + X side. The −Y side lever 73 swings in the θz direction (for example, the arrow L direction in FIG. 4) beyond the swing range, and contacts the pad 11c of the X stopper 11 on the −Y side and the + X side. The + Y side and −Y side levers 73 further swing in the same direction against the damping force of the shock absorber 11a and the elastic force of the coil spring 11b while abutting the pad 11c, and the coil spring 11b is contracted. When it reaches the limit, its oscillation is mechanically limited. A stopper member (not shown) may be provided, and the stopper member and the lever 73 may be brought into contact with each other to mechanically limit (stop) the swing of the lever 73. Thereby, the mask stage 20 is stopped. As described above, the X stopper 11 mechanically restricts the swing of the lever 73 in the θz direction, so that the + Y side and −Y side ends of the mask stage 20 in the X axis direction with respect to the Y stages 83Ya and 83Yb. Relative movement is mechanically limited.

  As described above, the two X stoppers 11 provided on the Y stage 83Ya, the lever 73 of the drive unit 78a on the + Y side, the air bearing 80, and the like are arranged on the X axis with respect to the Y stage 83Ya at the + Y side end of the mask stage 20. An X stopper device 98a for limiting the range of relative movement in the direction is configured. Further, the two X stoppers 11 provided on the Y stage 83Yb, the lever 73 of the drive unit 78b on the -Y side, the air bearing 80, and the like are in the X-axis direction with respect to the Y stage 83Yb at the end on the -Y side of the mask stage 20 The X stopper device 98b is configured to limit the range of relative movement. That is, the movement range of the mask stage 20 in the X-axis direction with respect to the Y stages 83Ya and 83Yb is mechanically limited (set) by the X stopper devices 98a and 98b. As described above, the driving device 78a and the X stopper device 98a share some constituent members, and the driving device 78b and the X stopper device 98b share some constituent members. .

  The Y stage 83Ya is provided with a plurality of Y stoppers (not shown) that limit the range of relative movement of the mask stage 20 relative to the Y stage 83Ya in the Y-axis direction. The Y stage 83Yb includes the mask stage 20 A plurality of Y stoppers (not shown) are provided to limit the range of relative movement in the Y axis direction with respect to the Y stage 83Yb.

  Next, the X driving device 70X and the Y driving device 70Y included in the substrate stage device PST will be described in detail. As shown in FIG. 2, the X drive device 70X is provided on the −X side of the weight cancellation device 40 on the upper surface of the Y coarse movement stage 23Y. The X driving device 70X includes a voice coil motor 110, a lever 113, and the like. In FIG. 1, the X driving device 70X and the Y driving device 70Y are not shown.

  As shown in FIG. 3, the voice coil motor 110 is disposed in the vicinity of the upper surface of the Y coarse movement stage 23 </ b> Y and directly below the recess 51 a formed on the lower surface of the stage main body 51. The voice coil motor 110 includes a stator 111 (for example, a coil unit) fixed to the upper surface of the Y coarse movement stage 23Y via a support member 114, and a mover 112 (for example, a magnet) provided corresponding to the stator 111. Unit). As shown in FIG. 3, the mover 112 includes a yoke 115 made of a magnetic body having a substantially inverted U-shaped YZ cross section, and a plurality of permanent magnets 116 fixed to a pair of opposing surfaces of the yoke 115. . The stator 111 includes a plurality of coils (not shown) arranged so that a current flows at least in the Z-axis direction, and a housing member 117 having a substantially Y-shaped YZ section for housing the plurality of coils. A part of the housing member 117 that houses the plurality of coils is predetermined between the pair of facing surfaces of the yoke 115 and the permanent magnet 116 fixed to each of the pair of facing surfaces in the Y-axis direction and the Z-axis direction. It is arranged through the clearance (gap, gap). With the above configuration, when current is supplied to a plurality of coils of the stator 111, current flows in the stator 111 across the magnetic field in the Y-axis direction generated in the mover 112 in the Z-axis direction. An electromagnetic force (Lorentz force) in the X-axis direction acts between the stator 111 and the mover 112. Therefore, hereinafter, the voice coil motor 110 is also referred to as an X voice coil motor 110. The current supply to the plurality of coils of the stator 111 is controlled by the main controller.

  As shown in FIG. 2, the lever 113 is formed of an elongated member, and one end in the longitudinal direction thereof is fixed to the upper surface of the yoke 115 (see FIG. 3) of the mover 112, and the other end in the longitudinal direction is described later. Together with the air bearing 118 and the like, it is inserted into a recess 51a formed on the lower surface of the stage main body 51. The lever 113 is supported at its longitudinal intermediate portion on the Y coarse movement stage 23Y so as to be rotatable around an axis extending in the Y-axis direction. More specifically, a through hole 113a penetrating in the Y axis direction is formed in the intermediate portion of the lever 113, and a shaft member 119 having the Y axis direction as the axial direction is inserted into the through hole 113a so as to be integrated. It is fixed. As shown in FIG. 3, the shaft member 119 has a pair of both ends standing on the upper surface of the Y coarse movement stage 23Y so as to sandwich a plane including the center of gravity G1 of the fine movement stage 50 and parallel to the XZ plane. It is rotatably supported by a pair of bearing members 120 fixed to each of the wall portions 85c and 85d (on the + Y side and the −Y side). The position of the lever 113 in the Y-axis direction with respect to the shaft member 119 is set so that the Y position thereof matches the Y position of the gravity center G1 of the fine movement stage 50. FIG. 2 shows a state in which the lever 113 is positioned at a reference position (neutral position with respect to the θy direction) whose longitudinal direction is in the Z-axis direction. The pair of wall portions 85c and 85d is a support frame having a rectangular frame shape in plan view together with the pair of (−X side and + X side) wall portions 85a and 85b (see FIG. 2) connecting the pair of wall portions 85c and 85d. 85 is configured. In addition, as a member which comprises the lever 113, a lightweight and highly rigid thing is preferable.

  As shown in FIG. 2, air bearings 118 are respectively provided in the θy and θz directions via the balls 121 (or hinges) on the −X end surface and the + X end surface of the upper end portion (the other end portion in the longitudinal direction) of the lever 113. Each one is attached so as to be able to swing. The bearing surfaces of the −X side and + X side air bearings 118 face the −X side and the + X side, respectively. On the other hand, on the inner wall surface on the −X side of the recess 51a of the stage body 51, a predetermined (fine) clearance (gap, gap) is provided on the bearing surface (the surface on the −X side) of the air bearing 118 on the −X side. An opposing member 122 having an opposing surface parallel to the opposing YZ plane is fixed. Similarly, the inner wall surface on the + X side of the recess 51a of the stage main body 51 is opposed to the bearing surface (+ X side surface) of the + X side air bearing 118 via a predetermined (small) clearance (gap, gap). A facing member 122 having a facing surface parallel to the plane is fixed. The air bearing 118 is connected to a gas supply device (for example, a compressor) (not shown), and a pressurized gas is ejected from the bearing surface to the opposing surface of the opposing member 122, and the opposing member is generated by the static pressure of the pressurized gas. The predetermined clearance (gap, gap) is formed between the first and second parts. The bearing rigidity and load capacity of the air bearing 118 are appropriate so that at least the air bearing 118 does not come into contact with the opposing member 122 and the positioning control of the fine movement stage 50 can be performed at high speed when the fine movement stage 50 is accelerated. It is preferable to set a large size. In order to obtain the appropriate bearing rigidity and load capacity, the predetermined clearance (gap, gap) is appropriately adjusted. Further, the Z positions of the air bearing 118 and the facing member 122 are set so as to include the Z position of the center of gravity G1 of the fine movement stage 50.

  Here, as described above, the air bearing 118 and the facing member 122 are opposed to each other in the X-axis direction because they face each other in the X-axis direction through the predetermined clearance (gap, gap). The directions other than this direction (Y-axis, Z-axis, and θx, θy, and θz directions) are not constrained to each other. Therefore, the air bearing 118 and the opposing member 122 (stage body 51) are allowed to move relative to the latter direction (Y-axis, Z-axis, θx, θy, and θz directions), and the Y coarse movement stage. The vibration in the latter direction is hardly transmitted from 23Y to fine movement stage 50. In addition, regarding the θz direction, the air bearing 118 is not necessarily configured to be swingable by a minute angle.

  In the X drive device 70 </ b> X configured as described above, when current is supplied to a plurality of coils of the stator 111 of the X voice coil motor 110, electromagnetic waves in the X axis direction are interposed between the mover 112 and the stator 111. A force (Lorentz force) is generated, and a force in the X-axis direction (for example, −X direction) acts on the lower end portion (one longitudinal end portion) of the lever 113 fixed to the mover 112. As a result, a moment in one direction (for example, the direction of arrow Q in FIG. 2) around the axis of the shaft member 119 is generated in the lever 113, and the + X side air bearing 118 provided at the upper end of the lever 113 The + X side facing member 122 is pressed in the + X direction in a non-contact manner, and a force (driving force) in the + X direction acts on the center of gravity G1 of the fine movement stage 50. At this time, since the air bearing 118 can swing in the θy direction with respect to the upper end portion of the lever 113 as described above, the lever 113 moves around the axis of the shaft member 119 as the fine movement stage 50 moves in the X-axis direction. Even if it rotates in the (θy direction), the bearing surface and the facing surface of the facing member 122 are kept parallel to each other through the predetermined clearance (gap, gap).

  Here, the axis of the shaft member 119 (the fulcrum of the force transmitted to the fine movement stage 50 by the X driving device 70X) and the lower end of the lever 113 (the force point of the force transmitted to the fine movement stage 50 by the X driving device 70X). The ratio between the distance and the distance between the axis of the shaft member 119 and the upper end of the lever 113 (the point of action of the force transmitted to the fine movement stage 50 by the X driving device 70X), that is, the lever ratio is, for example, about 4: 1. The electromagnetic force generated and generated in the X voice coil motor 110 is amplified about four times by the lever principle and transmitted to the center of gravity G1 of the fine movement stage 50. The lever ratio is not limited to 4: 1 and may be changed as appropriate according to the driving force of the X voice coil motor 110. Specifically, the lever ratio is preferably increased as the electromagnetic force generated in the X voice coil motor 110 is smaller.

  Further, as shown in FIG. 2, a pair of X stoppers 123X are provided on the Y coarse movement stage 23Y near the −X side and the + X side of the lower end portion of the lever 113 at the reference position. ing. Each X stopper 123X includes a shock absorber 123a, a coil spring 123b attached to the shock absorber 123a, and a pad 123c attached to the tip of the rod of the shock absorber 123a. Each of the pair of shock absorbers 123a included in the pair of X stoppers 123X is extended and contracted in each of the −X side and + X side walls 85a and 85b of the support frame 85 installed on the upper surface of the Y coarse movement stage 23Y. Is fixed in the X-axis direction. Each shock absorber 123a has a pad 123c attached to the tip thereof facing the lower end of the lever 113. In the state where the lever 113 shown in FIG. 2 is in the reference position, a uniform clearance (gap, gap) is formed between each of the −X side and + X side pads 123c and the lower end of the lever 113.

  That is, the lever 113 swings (rotates) a predetermined amount from the reference position (neutral position in the θy direction) in one direction (arrow Q direction in FIG. 2) in the θy direction, and other positions in the θy direction from the reference position. It can be swung without interfering with the X stopper 123X within a predetermined swing range between a position (swinged) by a predetermined amount in the direction (arrow R direction in FIG. 2). For example, during the exposure operation, the lever 113 is appropriately driven within this swing range by the X voice coil motor 110, and accordingly, the fine movement stage 50 moves in the X-axis direction corresponding to this swing range. Slightly moves within the moving range (within the effective stroke).

  Here, when the fine movement stage 50 moves in the X-axis direction (for example, + X direction) beyond the effective stroke (range) due to trouble such as inability to control, the lever 113 exceeds the swing range in the θy direction ( For example, it swings in the direction of arrow Q in FIG. 2 and comes into contact with the pad 123c of the X stopper 123X on the -X side. The lever 113 further swings in the same direction against the damping force of the shock absorber 123a and the elastic force of the coil spring 123b while abutting the pad 123c. Limited mechanically. A stopper member (not shown) may be provided, and the stopper member and the lever 113 may be brought into contact with each other to mechanically limit (stop) the swing of the lever 113. Thereby, fine movement stage 50 is stopped. As described above, the swing of the lever 113 in the θy direction is mechanically limited by the pair of X stoppers 123X, so that the relative movement in the X-axis direction of the fine movement stage 50 with respect to the Y coarse movement stage 23Y is mechanically performed. Limited. Note that the range in which the lever 113 can swing in the θy direction, that is, the range in which the fine movement stage 50 moves in the X-axis direction with respect to the Y coarse movement stage 23Y interferes (contacts) with the stator 36a and the mover 36b of the Z voice coil motor 18z. ) The range is not set.

  As described above, the X stopper 123X, the lever 113, the air bearing 118, and the like constitute the X stopper device 90X that limits the range of relative movement of the fine movement stage 50 with respect to the Y coarse movement stage 23Y in the X axis direction. That is, the X driving device 70X and the X stopper device 90X share some constituent members.

  As shown in FIG. 3, the Y driving device 70Y has a configuration in which the X driving device 70X is rotated by 90 ° around an axis including the center of gravity G1 of the fine movement stage 50 and extending in the Z-axis direction. To do. In addition, the same code | symbol as each structural member of the corresponding X drive device 70X is attached | subjected to each structural member of Y drive device 70Y. A concave portion 51b is formed on the lower surface of the −Y side portion of the stage body 51, and the upper end portion of the lever 113 of the Y driving device 70Y, the air bearing 118, the facing member 122, and the like are arranged in the concave portion 51b. Yes.

  Further, in the vicinity of the lever 113 of the Y drive device 70Y, there is provided a Y stopper 123Y that has substantially the same configuration and function as the X stopper 123X and limits the swing range of the lever 113. The Y stopper 123Y, the lever 113, the air bearing 118, and the like constitute a Y stopper device 90Y that restricts the range of relative movement of the fine movement stage 50 with respect to the Y coarse movement stage 23Y in the Y-axis direction. That is, the Y driving device 70Y and the Y stopper device 90Y share some constituent members. Note that the range in which the lever 113 can swing in the θx direction, that is, the range in which the fine movement stage 50 moves in the Y-axis direction with respect to the Y coarse movement stage 23Y interferes (contacts) with the stator 36a and the mover 36b of the Z voice coil motor 18z. ) The range is not set. Hereinafter, the voice coil motor 110 of the Y drive device 70Y is also referred to as a Y voice coil motor 110.

  Next, referring to FIGS. 6A and 6B, in order to drive fine movement stage 50 (not shown in FIGS. 6A and 6B) to Y coarse movement stage 23Y. The magnitude of the required voice coil motor (not shown in FIG. 6B) will be described in comparison with a comparative example. In the comparative example shown in FIG. 6 (B), the members corresponding to the members of the present embodiment shown in FIG. 6 (A) are indicated by adding H to the reference numerals of the members of the present embodiment. In the comparative example, the fine movement stage is driven directly (without a lever) with respect to the Y coarse movement stage 23YH by the voice coil motor. In FIG. 6A and FIG. 6B, individual members are schematically shown as compared to other drawings.

In the following description, in FIG. 6A, the reaction force received by the Y coarse movement stage 23Y of this embodiment from the fine movement stage is F (necessary for driving the fine movement stage to the Y coarse movement stage 23YH in the comparative example). This is also the thrust of the voice coil motor), the thrust of the Y voice coil motor 110 of this embodiment and the reaction force acting on the Y coarse movement stage 23Y are f, and the Y linear motor 60 of this embodiment uses the Y coarse movement stage 23Y. The thrust required for driving is P ₁ , the moment due to the reaction force F and the reaction force f acting on the Y coarse movement stage 23Y of this embodiment is M ₁ , and the thrust f of the Y voice coil motor 110 of this embodiment is the distance between the action point and the fulcrum a, the distance between the power point and the fulcrum of the thrust f of Y voice coil motors 110 of this embodiment b _{1 (>} a), Y coarse movement stage in the present embodiment 23Y The distance between the power point and the fulcrum of the resultant force F + f the reaction force F and Y thrust f of the voice coil motor 110 received from the fine movement stage 50 (Y coarse movement stage 23Y drive position) and b _2. Although not shown, in the comparative example, the support frame 85H fixed to the upper surface of the Y coarse movement stage 23YH has a voice coil motor stator for driving the fine movement stage (not shown) in the Y-axis direction. Fixed. In FIG. 6B, the thrust required for the Y linear motor of the comparative example to drive the Y coarse movement stage 23YH is P ₀ , and the moment due to the reaction force F acting on the Y coarse movement stage 23YH of the comparative example is obtained. M ₀ , the distance between the force point of the reaction force F from the fine movement stage acting on the Y coarse movement stage 23YH of the comparative example and the action point (drive position of the Y coarse movement stage 23YH) is L.

  As can be seen from FIG. 6A, the balance of the moments of force acting on the lever 113 is expressed by the following equation (1).

F × a = f × b ₁ (1)
Therefore, the following equation (3) is established from the following equation (2) derived from the above equation (1) and the relationship of a <b ₁ .

f = F × a / b ₁ (2)
f <F (3)

  As can be seen from FIG. 6B, if the inertial mass of the Y coarse movement stage 23YH and the frictional resistance from the Y linear guide member 28H acting on the Y coarse movement stage 23YH are ignored, the Y coarse movement stage 23YH acts. The balance of forces in the X-axis direction is expressed by the following formula (4).

P ₀ = F (4)
As can be seen from FIG. 6A, the balance of the forces acting on the Y coarse movement stage 23Y is expressed by the following equation (5).

P ₁ = (F + f) −f = F (5)
And the relationship of the following formula | equation (6) is formed from said Formula (4) and (5).

P ₀ = P ₁ (6)
That is, the thrust required for the Y linear motor to drive the Y coarse movement stage is the same in this embodiment and the comparative example. In addition, the relationship of the following formula | equation (7) is formed from said Formula (3) and (5).

f <P ₁ (7)

Here, if, when _{b 1} ≒ _{b 2} ≒ _b, and a + b ≒ L, as can be seen from FIG. 6 (B), the moment acting on the Y coarse movement stage 23YH by the reaction force F from the fine movement stage, the following It is represented by Formula (8).

M ₀ = F × L (8)

  As can be seen from FIG. 6A, the moment acting on the Y coarse movement stage 23Y by the resultant force F + f of the reaction force F from the fine movement stage and the thrust f of the voice coil motor 110 acting on the shaft member 119 is Based on the above formula (2), it is represented by the following formula (9).

M ₁ = (F + f) × b = {F + (F × a / b)} × b = F × (a + b) = F × L (9)

  From the above formulas (8) and (9), the following formula (10) is established.

M ₀ = M ₁ (10)
Thus, it can be seen that the moment acting on the Y coarse movement stage 23Y by the resultant force F + f in the present embodiment and the moment acting on the Y coarse movement stage 23Y by the reaction force F in the comparative example are substantially equal.

  As described above, in the comparative example, the voice coil motor that drives the fine movement stage requires a large thrust comparable to the Y linear motor that drives the Y coarse movement stage 23YH (see (4)). On the other hand, in the present embodiment, the thrust of the voice coil motor 110 is not increased with respect to the comparative example without increasing the moment acting on the Y coarse movement stage 23Y (see (10)). It can be made smaller than the thrust of the driven Y linear motor (see (6))) (see (7))). The Y voice coil motor 110 has been described above, but this description also applies to the X voice coil motor 110 and the X voice coil motor 71 included in each of the pair of drive devices 78a and 78b of the mask stage drive system 70 described above. To do.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, under the management of a main controller (not shown), a mask loader (not shown) loads the mask M onto the mask stage 20 and does not. The substrate P is loaded onto the fine movement stage 50 (substrate holder 53) by the illustrated substrate loader. Thereafter, the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its detailed description is omitted.

  When the mask M is moved in the X-axis direction during the exposure operation or the mask exchange operation, the main controller drives the X stages 83Xa and 83Xb synchronously to have a predetermined length in the X-axis direction (scan direction). Drive with stroke. At this time, the Y stages 83Ya and 83Yb supported by the X stages 83Xa and 83Xb also move together with the X stages 83Xa and 83Xb. The main controller drives the mask stage 20 in the X-axis direction in synchronization with the X stages 83Xa and 83Xb via the driving devices 78a and 78b. As a result, the X stages 83Xa and 83Xb and the mask stage 20 integrally move with a long stroke in the X-axis direction. Further, when the mask stage 20 is moved in the X-axis direction with a long stroke, the main control device appropriately rotates the mask stage 20 in the θz direction by the thrust difference between the driving devices 78a and 78b and uses the Y voice coil motor 96a. Then, the mask stage 20 is slightly driven in the Y-axis direction as appropriate. When the mask stage 20 moves beyond the movement range in the X-axis direction with respect to the Y stages 83Ya and 83Yb due to troubles such as inability to control, the relative movement of the mask stage 20 with respect to the Y stages 83Ya and 83Yb as described above. Is limited by the X stopper devices 98a and 98b.

  As described above, in the liquid crystal exposure apparatus 10 according to the present embodiment, for example, when a pattern to be formed on the substrate P is selected, the mask stage 20 is driven with a predetermined short stroke in the Y-axis direction. At this time, the main controller drives the Y stages 83Ya and 83Yb on the X stages 83Xa and 83Xb in the Y-axis direction (cross-scan direction) with a predetermined short stroke, and moves the mask stage 20 to the Y voice coil motor 96a. Is driven in the Y-axis direction in synchronization with the Y stage 83Ya.

  In addition, the main controller controls the X coarse movement stage 23X at a constant speed in the X-axis direction (scan direction) by the pair of X linear motors 15 during normal operations such as the exposure operation, the alignment operation, and the substrate exchange operation. The fine movement stage 50 is driven in the X-axis direction in synchronization with the X coarse movement stage 23X by the X driving device 70X. At this time, the Y coarse movement stage 23Y supported by the X coarse movement stage 23X, the weight cancellation device 40 mechanically restrained in the X-axis direction by the Y coarse movement stage 23Y, and the like also move together with the X coarse movement stage 23X. Further, the main control device appropriately drives the Y coarse movement stage 23Y on the X coarse movement stage 23X in the Y-axis direction (step direction / cross scan direction), and the Y drive device 70Y moves the fine movement stage 50 to the Y coarse movement stage. Drives in the Y-axis direction in synchronization with 23Y. At this time, a weight cancellation device or the like mechanically restrained in the Y-axis direction by the Y coarse movement stage 23Y also moves together with the Y coarse movement stage 23Y. Further, the main control device appropriately controls the X driving device 70X and the Y driving device 70Y and appropriately drives the plurality of Z voice coil motors 18z, thereby moving the fine movement stage 50 on the Y coarse movement stage 23Y on the X axis. , Y-axis, Z-axis, and XY plane tilt direction (for example, θx, θy direction, etc.) fine drive (more specifically, based on the interferometer signal of the laser interferometer system, X coarse movement stage 23X, and Y coarse The deviation from the movement of the moving stage 23Y is slightly driven). When the fine movement stage 50 moves beyond the movement range in the X-axis and Y-axis directions with respect to the Y coarse movement stage 23Y due to trouble such as inability to control, as described above, the swing of the lever 113 causes the X stopper 123X to swing. The Y stopper 123Y restricts the movement of the fine movement stage 50 by the X stopper device 90X and the Y stopper device 90Y.

  As described above, according to the mask stage apparatus MST according to the first embodiment, the electromagnetic force generated by the voice coil motor 71 provided in each of the Y stages 83Ya and 83Yb is used as a lever using the lever 73. It can be amplified and transmitted to the mask stage 20 according to the principle. Thereby, for example, compared with a configuration in which the mask stage 20 is directly driven by a voice coil motor (a configuration in which a mover is provided in the mask stage 20), a small, lightweight and inexpensive voice coil motor with a small generated thrust is used. Thrust necessary for driving the mask stage 20 can be obtained. Therefore, according to the present embodiment, the mask stage can be significantly reduced in weight as compared with the configuration in which the mask stage 20 is directly driven by the voice coil motor as described above, and its motion performance and position controllability are greatly improved. In addition, the cost increase can be suppressed.

  Further, when the mask stage 20 is driven by the voice coil motor 71 via the lever 73 to the XY stage devices 76a and 76b as in the present embodiment, the mask stage 20 is not driven by the X voice coil motor via the lever 73, for example. (Directly) when driving with respect to the XY stage devices 76a and 76b, the reaction force acting on the XY stage devices 76a and 76b from the mask stage 20, that is, necessary for driving the XY stage device in the X-axis direction. The thrust is almost the same. That is, in the former case (this embodiment), the thrust of the voice coil motor 71 can be reduced while the thrust for driving the XY stage devices 76a and 76b in the X-axis direction is substantially the same as in the latter case. .

  In this embodiment, since the voice coil motor 71 can be arranged at a position away from the mask stage 20, for example, a stator fixed to the mask stage 20 and a movable fixed to the Y stage 83Ya (or 83Yb). Compared to a configuration in which the mask stage 20 is directly driven by a voice coil motor including a child, the mask stage 20 and its peripheral members (for example, a fixed member 66, a holding member 64, an X moving mirror 68X, a Y moving mirror 68Y). , The X targets 95Xa and 95Xb, the Y targets 95Ya and 95Yb, the movable element 92, the air bearing 27, and the like) are hardly transmitted to the mask stage 20 and the peripheral members.

  Further, the ratio of the movement amount of the end of the lever 73 on the mask stage 20 side to the end of the X voice coil motor 71 when the lever 73 swings is, for example, 1: 4 depending on the lever ratio. Therefore, the strokes of the shock absorber 11a and the coil spring 11b that are in contact with the end of the lever 73 on the voice coil motor 71 side as compared with the amount of movement of the mask stage 20 that moves with the end of the lever 73 on the mask stage 20 side. Can be lengthened. As a result, the lever 73 (mask stage 20) swings (moves) in a state where its swing speed (moving speed) is sufficiently reduced (when large kinetic energy is efficiently converted into thermal energy). Is mechanically limited. On the other hand, for example, when the movement of the mask stage 20 is restricted directly (without a lever) by the stopper, the amount of elastic deformation of the stopper is set to an amount corresponding to the slight movement amount of the mask stage 20. For this reason, the movement of the mask stage 20 is mechanically limited in a state where the movement speed is not sufficiently reduced by the stopper. That is, according to the present embodiment, for example, the impact when the movement of the mask stage 20 is mechanically restricted can be sufficiently mitigated, compared to the case where the movement of the mask stage 20 is directly restricted by the stopper. It is possible to prevent damage including deformation of the mask stage 20, damage including displacement of the peripheral member, displacement, and the like.

  In addition, since the X stopper devices 98a and 98b uniformly press the + Y side and −Y side end centers (the + Y side and −Y sides of the center of gravity G of the mask stage 20) of the mask stage 20, For example, even if a stopper is not disposed on the movement path of the mask stage 20 such as on a straight line passing through the center of gravity G of the mask stage 20 and parallel to the X axis, the mask stage 20 does not generate a moment in the θz direction. Can be stopped. Therefore, the degree of freedom in designing the liquid crystal exposure apparatus 10 can be improved.

  Further, according to the present embodiment, the distance between the end of the lever 73 moving with the mask stage 20 on the mask stage 20 side and the swing fulcrum (the axis of the shaft member 90) of the lever 73, and the lever that contacts the X stopper 11 The ratio (lever ratio) of the distance between the end of the voice coil motor 71 on the side of 73 and the swing fulcrum of the lever 73 is, for example, 1: 4, so that the mask stage 20 is directly moved by the stopper, for example. The load on the stopper can be reduced as compared with the case where the limit is limited.

  Further, according to the present embodiment, the distance by which the mask stage 20 moves in accordance with the movement of the mover 75 is shorter than the distance by which the mover 75 of the X voice coil motor 71 moves due to the lever ratio of the lever 73. For example, as compared with a configuration in which a mover is provided on the mask stage 20, the position control accuracy of the mover can be easily increased, and as a result, the position control accuracy of the mask stage 20 can be easily increased.

  The stator 69 and the mover 75 of the pair of X voice coil motors 71 are both provided on the Y stages 83Ya and 83Yb. The mover 75 moves relative to the stator 69 only in the X-axis direction. Clearances (gap and gap) in the Y-axis and Z-axis directions of the film hardly change. Accordingly, the clearances (gap and gap) in both the Y-axis and Z-axis directions can be set small in advance, whereby the thrust of the X voice coil motor 71 can be improved.

  Further, the X voice coil motor 71 is set to generate a smaller thrust as compared with the case where the mask stage 20 is directly driven by the voice coil motor, for example, so that the mask stage 20 is frequently accelerated and decelerated. Even if thrust continues to be generated, the possibility that the stator 69 (coil unit) will overheat is low.

  Further, according to the substrate stage apparatus PST according to the present embodiment, the electromagnetic force generated in the voice coil motor 110 provided in the Y coarse movement stage 23Y is amplified by the lever principle using the lever 113 to finely adjust the fine movement stage 50. Can be communicated to. Accordingly, in the present embodiment, for example, a configuration in which fine movement stage 50 is directly driven by a voice coil motor (a Y coarse movement stage is provided with a stator, and a movable element corresponding to the stator is provided on the fine movement stage. Compared with the configuration, it is possible to obtain a thrust necessary for driving the fine movement stage 50 by using a small and lightweight voice coil motor with a small generated thrust. Therefore, according to this embodiment, compared with the case where the fine movement stage 50 is directly driven by the voice coil motor, the fine movement stage 50 can be significantly reduced in weight, and its motion performance and position controllability can be significantly improved. Cost increase can be suppressed.

  In addition, according to the present embodiment, the X voice coil motor 110 and the Y voice coil motor 110 which are heat generation sources are configured to drive the fine movement stage 50 via the lever 113, so that these voice coil motors are moved from the fine movement stage 50. The fine movement stage 50 can be arranged at a distant position (near the upper surface of the Y coarse movement stage 23Y). For example, the fine movement stage 50 is fine movement compared to a configuration in which the fine movement stage 50 is directly driven by a voice coil motor arranged close to the fine movement stage 50. It is difficult for heat to be transmitted to the stage 50, and members constituting the fine movement stage 50 and its peripheral members (the stage main body 51, the substrate holder 53, the mirror bases 24X, 24Y, the X movable mirror 22X, the Y movable mirror 22Y, etc.) undergo thermal deformation and the like. Occurrence is suppressed.

  Further, the ratio of the movement amount of the upper end portion and the lower end portion of the lever 113 when the lever 113 swings is, for example, about 1: 4 by the lever ratio. Compared with the movement amount of 50, the extension strokes of the shock absorber 123a and the coil spring 123b that extend and contract in contact with the lower end of the lever 113 can be lengthened. Thus, the swing (movement) of the lever 113 (fine movement stage 50) is mechanically limited in a state where the swing speed (movement speed) is sufficiently reduced. On the other hand, for example, when the movement of the fine movement stage 50 is restricted directly (without a lever) by the stopper, the elastic deformation amount of the stopper is a length corresponding to the slight movement amount of the fine movement stage 50. It is necessary to. For this reason, the movement of the fine movement stage 50 is mechanically restricted in a state where the movement speed is not sufficiently reduced. As described above, according to the present embodiment, for example, compared with the case where the movement of the fine movement stage 50 is directly restricted by the stopper, the impact when the movement of the fine movement stage 50 is mechanically restricted is sufficiently reduced. Can do.

  Further, the ratio between the distance between the upper end of the lever 113 that moves together with the fine movement stage 50 and the swing fulcrum of the lever 113 and the distance between the lower end of the lever 113 that contacts the stopper and the swing fulcrum of the lever 113 is, for example, Since it is about 1: 4, for example, the load applied to the stopper can be reduced as compared with the case where the movement of the fine movement stage 50 is directly restricted by the stopper.

  Further, since the distance by which the fine movement stage 50 moves in accordance with the movement of the movable element 112 is shorter than the distance by which the movable element 112 moves, the accuracy of the position control of the fine movement stage 50 can be increased due to the lever ratio of the lever 113. .

  Further, the stator 111 and the mover 112 of the voice coil motor 110 move relatively only in the X-axis direction (or Y-axis direction), and the clearance in the Y-axis direction (or X-axis direction) and Z-axis direction of both of them. Since (gap, gap) hardly changes, the clearance (gap, gap) in both the Y-axis direction (or X-axis direction) and the Z-axis direction can be set small in advance, whereby the voice coil motor 110 The thrust can be improved.

  Since the generated thrust of the voice coil motor 110 is set to be smaller than that when the fine movement stage 50 is directly driven, for example, even if the fine movement stage 50 is frequently accelerated and decelerated, the voice coil motor 110 continues to generate thrust. The coil of the stator 111 is less likely to overheat.

  Furthermore, since the liquid crystal exposure apparatus 10 according to the present embodiment can accurately drive the mask stage 20 that holds the mask M and the fine movement stage 50 that holds the substrate P as described above, the mask M It is possible to accurately transfer the pattern formed on the plurality of shot areas on the substrate P.

  Next, another embodiment will be described. In the following second to fourth embodiments, only the configuration of the mask stage apparatus in the liquid crystal exposure apparatus is different from that of the first embodiment. Therefore, only the mask stage apparatus will be described, and the first embodiment will be described. Members having the same configuration and function as the members described in 1 are assigned the same reference numerals, and descriptions thereof are omitted.

<< Second Embodiment >>
FIG. 7 shows a plan view of a mask stage apparatus MST2 according to the second embodiment. As can be seen by comparing FIG. 7 with FIG. 4, the mask stage apparatus MST2 is different from the mask stage apparatus MST in that a mask stage drive system 170 is provided instead of the mask stage drive system 70.

  The mask stage driving system 170 includes a plurality of (for example, a pair of) voice coil motors 101a and 101b that directly drive the mask stage 20 to the Y stages 83Ya and 83Yb, respectively, and driving on the −Y side. Although the driving device 178b is provided in place of the device 78b, it is different from the mask stage driving system 70 described above, but the configuration of other parts is the same as that of the mask stage driving system 70.

  A plurality (for example, a pair) of X voice coil motors 101a drives the + Y side end of the mask stage 20 in the X-axis direction with respect to the Y stage 83Ya. 20 is driven in the X-axis direction with respect to the Y stage 83Yb.

  The pair of X voice coil motors 101a is disposed on the + Y side of the mask stage 20 and sandwiches the lever 73 in the X axis direction. The Z position of each of the pair of (−X side and + X side) X voice coil motors 101 a includes the Z position of the center of gravity G of the mask stage 20. The X voice coil motor 101a has the same configuration (including its mounting structure) as the X voice coil motor 71 except for the difference in arrangement, and includes a stator 105 (for example, a coil unit) and the stator 105. And a mover 107 (for example, a magnet unit) provided correspondingly. The stator 105 and the corresponding movable element 107 are arranged via a predetermined clearance (gap, gap) in the Y-axis and Z-axis directions. The stator 105 is fixed to the upper surface of the Y stage 83Ya via a support member 109. The mover 107 is fixed to the + Y end surface of the mask stage 20. Each of the pair of X voice coil motors 101a is synchronously controlled by a main controller (not shown). Hereinafter, the pair of X voice coil motors 101a is appropriately referred to as a + Y side voice coil motor pair 102a.

  Also, one of the pair of X voice coil motors 101b is configured symmetrically with the X voice coil motor 101a on the -X side (including its mounting structure) with respect to a plane parallel to the XZ plane including the center of gravity G of the mask stage 20. The other of the pair of X voice coil motors 101b is symmetrical to the + X side X voice coil motor 101a with respect to a plane that includes the center of gravity G of the mask stage 20 and is parallel to the XZ plane (the mounting structure thereof) Including). Each of the pair of X voice coil motors 101b is synchronously controlled by a main controller (not shown). Hereinafter, the pair of X voice coil motors 101b will be collectively referred to as a -Y side voice coil motor pair 102b as appropriate.

  In the second embodiment, the main control device can drive the mask stage 20 in a straight line in the X-axis direction by synchronously driving the + Y side and -Y side voice coil motor pairs 102a and 102b. Further, the mask stage 20 can be driven in the θz direction by making at least one of the magnitude and direction of the thrusts of the + Y side and −Y side voice coil motor pairs 102a and 102b different from each other.

  The −Y side driving device 178b includes a Y voice coil motor 96b having a configuration substantially similar to that of the Y voice coil motor 96a of the + Y side driving device 78a in addition to the components of the driving device 78b described above. The Y voice coil motor 96b has a configuration symmetrical to the Y voice coil motor 96a of the drive unit 78a on the + Y side with respect to a plane parallel to the XZ plane including the center of gravity G of the mask stage 20. Therefore, the mask stage 20 can be slightly driven in the Y-axis direction with respect to the Y stages 83Ya and 83Yb by synchronously controlling the Y voice coil motors 96a and 96b of the + Y side and −Y side drive devices 78a and 178b.

  Further, in the present embodiment, with the installation of the + Y side and −Y side voice coil motor pairs 102a and 102b, the gap sensors 94a and 94b, the X targets 95Xa, 95Xb, and the Y target 95Ya with respect to the first embodiment. , 95Yb has been changed. Specifically, the gap sensor 94a is fixed to the + X end surface of the Y stage 83Ya, and the gap sensor 94b is fixed to the + X end surface of the Y stage 83Yb. The X target 95Xa and the Y target 95Ya are fixed to the mask stage 20 via a common bracket 103 so as to face one and the other of the gap sensor 94a, respectively. Similarly, the X target 95Xb and the Y target 95Yb are fixed to the mask stage 20 via the common bracket 103 so as to face one and the other of the gap sensor 94b, respectively.

  In the second embodiment, the main controller, for example, when replacing the mask M, the driving device 78a when the mask stage 20 that does not require positioning accuracy but requires a large thrust (including when decelerating) is required. The mask stage 20 is driven in the X-axis direction with respect to the Y stages 83Ya and 83Yb using 178b (a braking force is applied during deceleration). The main controller uses the X voice coil motors 101a and 101b when positioning accuracy is required but large thrust is not required, such as when the mask stage 20 is moved at a constant speed during the exposure operation. 20 is driven in the X-axis direction with respect to the Y stages 83Ya and 83Yb.

  Hereinafter, an example in which the mask stage 20 is driven in the X-axis direction with respect to the Y stages 83Ya and 83Yb will be described. First, the mask stage 20 that is in a stopped state with respect to the Y stages 83Ya and 83Yb is driven in synchronism with a pair of X voice coil motors 71 provided in the drive devices 78a and 178b, respectively, so that the X-axis with respect to the Y stages 83Ya and 83Yb. Gives a stationary holding force in the direction. When the mask stage 20 overcomes its inertial force (by the above-mentioned stationary holding force) and accelerates in the same manner as the Y stages 83Ya and 83Yb to reach a predetermined target speed, the driving devices 78a and 178b are respectively provided. The power supply to the pair of X voice coil motors 71 is stopped (or the control force is weakened), and the power supply to the pair of X voice coil motors 101a and the pair of X voice coil motors 101b is made (Note that May be powered from the beginning). Thereby, the drive source of the mask stage 20 is switched from the drive devices 78a and 178b to each pair of X voice coil motors 101a and 101b (+ Y side and −Y side voice coil motor pairs 102a and 102b). Based on the measurement result of the laser interferometer, the pair of X voice coil motors 101a and 101b performs precise positioning control by slight acceleration / deceleration on the Y stage 83Ya and 83Yb, and is driven at a constant speed at the target speed.

  According to the second embodiment, when the mask stage 20 is driven in the X-axis direction with respect to the Y stages 83Ya and 83Yb, the driving devices 78a and 178b are used only when the mask stage 20 is accelerated. 178b does not require positioning accuracy for the pair of X voice coil motors 71 provided in each. Therefore, the cost of the X voice coil motor 71 can be reduced as compared with the first embodiment.

  Further, since the pair of voice coil motors 101a and 101b (+ Y side and −Y side voice coil motor pairs 102a and 102b) is used only when the mask stage 20 moves at a constant speed, the first embodiment is used. In comparison, the positioning accuracy of the mask stage 20 can be improved while suppressing an increase in cost.

  Further, according to the second embodiment, compared to the first embodiment, the Y voice coil motor 96b is also provided in the −Y side drive device 178b in addition to the + Y side drive device 78a. The mask stage 20 can be stably driven in the Y-axis direction with respect to the Y stages 83Ya and 83Yb.

<< Third Embodiment >>
FIG. 8 shows a plan view of a mask stage apparatus MST3 according to the third embodiment. As can be seen by comparing FIG. 8 and FIG. 7, the mask stage apparatus MST3 is different from the mask stage apparatus MST2 in that a mask stage drive system 270 is provided instead of the mask stage drive system 170.

  The mask stage drive system 270 is different from the mask stage drive system 170 in that instead of the + Y side and −Y side drive devices 78a and 178b, + Y side and −Y side drive devices 278a and 278b are provided. However, the configuration of other parts is the same as that of the mask stage drive system 170.

  In the + Y side and −Y side drive devices 278 a and 278 b provided in the mask stage drive system 270, a pair of contact members 201 instead of the pair of air bearings 80 are opposed to the opposing members 281, respectively. It is attached as follows.

  More specifically, each of the pair of abutting members 201 is made of, for example, a hemispherical member, and protrudes toward the opposing member 281 side at the end of the lever 73 on the mask stage 20 side (its top portion is It is fixed so as to face the opposing member 281 side. As the facing member 281 of the third embodiment, a highly rigid material that is harder and more resistant to impact than the facing member 81 of the first and second embodiments is preferable. In a state where the lever 73 shown in FIG. 8 is located at the reference position (neutral position in the θz direction), a uniform clearance is provided between the tops of the pair of contact members 201 and the opposing member 281 facing the pair of contact members 201. (Gap, gap) is formed. This clearance (gap, gap) is, for example, less than ¼ of the clearance (gap, gap) between the end of the lever 73 located at the reference position on the X voice coil motor 71 side and the pad 11c of the X stopper 11 (for example, 1 mm to 5 mm). Accordingly, until the lever 73 located at the reference position swings in one direction of the θz direction and the contact member 201 contacts the opposing member 281 and further swings a predetermined amount in the same direction, the lever 73 is X There is no interference with the stopper 11. The material of the contact member 201 may be a hard material such as steel or ceramics, or may be a soft material such as elastomer.

  In addition, the gap sensor 202 is fixed to a position in the vicinity of one contact member 201 in each of the + Y side and −Y side levers 73 so as to face the facing member 281. And a gap (interval) between the opposite member 281 and the opposite member 281 can be constantly monitored. The main control device controls the X voice coil motor 71 based on the output of the gap sensor 202 and appropriately adjusts the gap between the abutting member 201 and the opposing member 281 opposed thereto.

  For example, when accelerating the mask stage 20 in the X-axis direction (for example, -X direction), the main control device moves the pair of XY stage devices 76a and 76b in the X-axis direction (via the pair of linear motors 87a and 87b). For example, the + Y-side end of the + Y-side lever 73 and the −Y-side end of the −Y-side lever 73 that are positioned at the reference position are accelerated to the −Y-side end of the pair of X voice coil motors 71. For example, they are driven synchronously in the + X direction via each. As a result, the + Y side lever 73 swings in one direction around the axis of the shaft member 90 (in the direction of arrow R in FIG. 8), and the −Y side lever 73 moves in the other direction around the axis of the shaft member 90 (see FIG. 8). The −X side contact member 201 fixed to the + Y side and −Y side levers 73 contacts the −X side facing member 281 opposite to this (point L). Contact. The + Y side and −Y side levers 73 amplify the driving force of the X voice coil motor 71 based on the lever principle with the shaft member 90 as a fulcrum, respectively, and the −X side contact member 201 and the same. The mask stage 20 is pressed in the −X direction via the opposing member 281 that contacts the surface. In this way, a force is applied to the mask stage 20 so as to accelerate together with the Y stages 83Ya and 83Yb (overcoming the inertial force so as not to be left behind by the Y stages 83Ya and 83Yb). When the mask stage 20 reaches a predetermined target speed, the main control device controls the X voice coil motor 71 to separate the contact member 201 from the facing member 281 and each pair of X voice coil motors 101a. , 101b are driven synchronously. Thereby, the transmission of force from the driving devices 278a and 278b to the mask stage 20 is released, and the mask stage 20 is driven at a constant speed relative to the body 30 by each pair of X voice coil motors 101a and 101b. In this case, the control of the X voice coil motor 71 includes, for example, reducing the power supplied to the X voice coil motor 71, stopping the power supply to the X voice coil motor 71, and controlling the X voice coil motor 71. For example, driving in the reverse direction. The case where the end of each lever 73 on the X voice coil motor 71 side is driven in the + X direction when the mask stage 20 is accelerated in the −X direction has been described above. However, the mask stage 20 is accelerated in the + X direction. The same applies to the case where the end of each lever 73 on the X voice coil motor 71 side is driven in the -X direction.

  According to the third embodiment, as described above, when the mask stage 20 is accelerated, the lever 73 is swung and the contact member 201 is brought into contact with the opposing member 281 to press the mask stage 20. , The rigidity at the time of pressing can be increased. Therefore, the mask stage 20 can be accelerated with high response.

  Further, when the mask stage 20 is accelerated to a predetermined target speed and then driven at a constant speed, the contact member 201 is separated from the facing member 81, and therefore vibrations generated in the Y stages 83Ya and 83Yb are generated. It is prevented from being transmitted to.

<< Fourth Embodiment >>
FIG. 9 shows a cross-sectional view of a mask stage apparatus MST4 according to the fourth embodiment. The mask stage apparatus MST4 is different from the mask stage apparatus MST2 according to the second embodiment described above in that a mask stage drive system 370 is provided instead of the mask stage drive system 170.

  The mask stage drive system 170 included in the mask stage apparatus MST2 is supported from below by the pair of support bases 74a and 74b, whereas the mask stage drive system 370 included in the mask stage apparatus MST4 is suspended from above by the support frame 300. Supported in a lowered state.

  The support frame 300 is installed between a pair of wall portions 300a and 300b extending in the X-axis direction, which is erected on the floor 130 so as to sandwich the body 30 in the Y-axis direction, and between the pair of wall portions 300a and 300b. The erection part 300c is included. The erection part 300c is located above the illumination system IOP (not shown in FIG. 9, refer to FIG. 1).

  A pair of bases 303 extending in the X-axis direction are fixed to the lower surface of the erection part 300c at predetermined intervals in the Y-axis direction. The + Y side base 303 of the pair of bases 303 has an XY stage 376a having substantially the same configuration as that of the + Y side XY stage device 76a (see FIG. 5) of the first embodiment turned upside down. Supported from above. More specifically, in the XY stage 376a, the X stage 383Xa is supported on the + Y side base 303 through the X linear guide member 77 so as to be slidable in the X axis direction, and the Y stage 383Ya is supported by the X stage 383Xa. The Y linear guide member 84 is supported from above so as to be slidable in the Y-axis direction. The X stage 383Xa is driven in the X-axis direction with respect to the base 303 by an X linear motor 387 having a configuration in which an X linear motor 87a (see FIG. 5) is turned upside down, and the Y stage 383Ya is driven by a Y linear motor (not shown). It is driven in the Y-axis direction with respect to the X stage 383Xa.

  On the Y stage 383 Ya, the + Y side drive device 78 a (see FIG. 5) of the first embodiment is applied in one direction around the axis parallel to the X axis passing through the center of the ball 99 (arrow Q ′ in FIG. 5). The driving device 378a on the + Y side having a configuration rotated 90 degrees in the direction) is supported in a suspended state. Specifically, on the lower surface of the Y stage 383 Ya, the stator 69 of the X voice coil motor 71 of the driving device 378 a on the + Y side is placed in the movable element 75 fixed to the upper end portion (one longitudinal end portion) of the lever 73. In the inserted state, it is fixed via a support member 72. Further, a support member 315 made of a flat plate member parallel to the XZ plane is fixed to a position on the + Y side of the support member 72 on the lower surface of the Y stage 383Ya, and a fixing member is fixed to the −Y end surface of the support member 315. A shaft member 390 is fixed via 91 with the Y-axis direction as the axial direction. The shaft member 390 is inserted into a through hole 73a (see FIG. 4) formed in the middle portion of the lever 73 in the longitudinal direction. The lower end (the other end in the longitudinal direction) of the lever 73 is accommodated in a recess 20 b formed in the mask stage 20, and an air bearing 80 is attached to the lower end via a ball 99. Further, the stator 93 of the Y voice coil motor 96 a is fixed to the −Y end surface of the lower end portion of the lever 73 in a state of being inserted into the movable element 92 fixed to the mask stage 20.

  In addition, a pair of stators 105 that are spaced apart in the X-axis direction are inserted into a pair of movers 107 that are spaced apart and fixed to the + Y end surface of the mask stage 20 in the X-axis direction on the lower surface of the support member 315. (In FIG. 9, the −X side stator 105 is hidden behind the + X side stator 105, and the −X side mover 107 is the + X side mover 107. Against the back of the page). Each of the pair of X voice coil motors 301a including the stator 105 and the movable element 107 is the center of each of the pair of X voice coil motors 101a (see FIG. 7) of the second embodiment. And rotated 90 ° in one direction around an axis parallel to the X axis.

  The -Y side base 303 of the pair of bases 303 includes a -Y side XY stage 376b, a -Y side drive device 378b, a pair of X voice coil motors 301b, and a -Y side Y voice coil motor 96b. The Y stage 376a on the + Y side, the drive unit 378a on the + Y side, the pair of X voice coil motors 301a, and the Y voice coil motor 96a on the + Y side are symmetrical with respect to a plane parallel to the XZ plane including the center of gravity G of the mask stage 20. Is arranged.

  The operation of the mask stage drive system 370 of the fourth embodiment is almost the same as the operation of the mask stage drive system 170 of the second embodiment.

  According to the fourth embodiment, since the mask stage drive system 370 is suspended from above the body 30, a space for installing the mask stage drive system is required on the + Y side and the -Y side of the body 30. There is no need (to ensure a space for installing the pair of walls 300a and 300b of the support frame 300). Therefore, it is particularly effective when the space on the + Y side and −Y side of the body 30 is limited (narrow) due to the configuration of the liquid crystal exposure apparatus.

  Next, still another embodiment will be described. A liquid crystal exposure apparatus according to each of the fifth and subsequent embodiments described below forms an erect image as, for example, a double telecentric equal magnification system as each of the plurality of projection optical systems constituting the projection optical system PL. Things are used. Accordingly, as the mask stage apparatus corresponding to this, the mask stage 20 having a configuration that can only move minutely in the cross scan direction can be used, or the mask stage apparatus MST similar to the first embodiment described above. Can also be used. In the following fifth to ninth embodiments, the configuration of the substrate stage apparatus in the liquid crystal exposure apparatus is different from that of the first embodiment. Therefore, only the substrate stage apparatus will be described, and the first embodiment will be described. Members having the same configurations and functions as those of the members described are given the same reference numerals, and descriptions thereof are omitted.

<< Fifth Embodiment >>
FIG. 10 shows a cross-sectional view of the substrate stage apparatus PST2 according to the fifth embodiment, and FIG. 11 shows a side view of the substrate stage apparatus PST2 viewed from the −X direction. The substrate stage device PST2 includes a plurality of, for example, a pair of voice coil motors 124 and 128 that directly drive the fine movement stage 50 with respect to the Y coarse movement stage 23Y, in addition to the same components as the substrate stage device PST described above. In addition. In FIG. 10, the illustration of the sealing pad 43a of the weight cancellation device 40 is omitted (the same applies to the following sixth to ninth embodiments).

  The X voice coil motor 124 has the same configuration as the X voice coil motor 110 described above except that the arrangement is different, and is provided corresponding to the stator 125 (for example, a coil unit) and the stator 125. Mover 126 (for example, a magnet unit). The stator 125 and the corresponding mover 126 are arranged in the Y-axis and Z-axis directions via a predetermined clearance (gap, gap). The pair of X voice coil motors 124 are arranged at symmetrical positions with respect to a plane parallel to the XZ plane including the center of gravity G1 of the fine movement stage 50 (in FIG. 10, the X voice coil motor 124 on the + Y side is on the −Y side). The X voice coil motor 124 is disposed on the front side of the paper surface). The Z position of each of the pair of X voice coil motors 124 substantially coincides with the Z position of the center of gravity G1 of fine movement stage 50. Therefore, the fine movement stage 50 can be linearly driven in the X-axis direction by making the driving force generated by each of the pair of X voice coil motors 124 the same. Further, the fine movement stage 50 can be driven in the θz direction by making the driving forces generated by the pair of X voice coil motors 124 different from each other. The X voice coil motor 124 is controlled by a main controller (not shown).

  The stator 125 is attached to the upper end of the −X side wall 85a of the support frame 85 via the support member 106 (the wall 85a has a longer dimension in the X-axis direction than the first embodiment. Have been). The mover 126 is attached to a bracket 127 fixed to the −X end surface of the stage main body 51. The configuration of the pair of Y voice coil motors 128 is a configuration in which the pair of X voice coil motors 124 is rotated by 90 ° around an axis passing through the center of gravity of fine movement stage 50 and parallel to the Z axis (see FIG. 11). The description is omitted. In FIG. 11, the + X side Y voice coil motor 128 is hidden behind the −X side Y voice coil motor 128.

  In the fifth embodiment, the main controller drives the fine movement stage 50 in the X-axis direction and the Y-axis direction using the X drive device 70X and the Y drive device 70Y, respectively, when accelerating the fine movement stage 50 that requires a large thrust. To do. Further, the main controller uses the pair of X voice coil motors 124 and the pair of Y voice coil motors 128 to move the fine movement stage 50 in the X-axis direction and the Y-axis direction when the fine movement stage 50 that does not require a large thrust is moving at a constant speed. To drive.

  Hereinafter, a case where fine movement stage 50 is driven in the X-axis direction with respect to Y coarse movement stage 23Y will be described as an example. First, the fine movement stage 50 in a stopped state with respect to the Y coarse movement stage 23Y is accelerated in the X-axis direction with respect to the Y coarse movement stage 23Y by the X driving device 70X. When the relative speed of fine movement stage 50 with respect to Y coarse movement stage 23Y reaches a predetermined target speed, current supply to X voice coil motor 110 is stopped and current supply to a pair of X voice coil motors 124 is stopped. Made. As a result, the driving source of the fine movement stage 50 is switched from the X driving device 70X to the pair of X voice coil motors 124, and the fine movement stage 50 is equal to the Y coarse movement stage 23Y by the pair of X voice coil motors 124 at the target speed. Driven at high speed. Note that, after the switching, the power supply of the X voice coil motor 110 does not necessarily stop (may be in a state where a weak force is generated). The same applies when the fine movement stage 50 is driven in the Y-axis direction with respect to the Y coarse movement stage 23Y.

  According to the fifth embodiment, since the X driving device 70X and the Y driving device 70Y are used only when the fine movement stage 50 is accelerated, a pair of voice coil motors provided in each of the X driving device 70X and the Y driving device 70Y. 110 does not require positioning accuracy. Therefore, the cost of the voice coil motor 110 can be reduced as compared with the first embodiment.

  In addition, since the voice coil motors 124 and 128 are used only during the constant speed movement of the fine movement stage 50, although the positioning accuracy is required for the voice coil motors 124 and 128, the generated thrust is not required much (the fine movement stage 50 Just keep the speed constant). Therefore, as the voice coil motors 124 and 128 for directly driving the fine movement stage 50, those having a small generated thrust, a small size and a light weight and high positioning accuracy are used, so that the fine movement stage 50 can be compared with the first embodiment. Positioning accuracy can be improved.

  In addition, since the pair of voice coil motors that directly drive the fine movement stage 50 are arranged at positions sandwiching the center of gravity G1 of the fine movement stage 50 in a side view, the fine movement stage 50 is driven in a straight line in the horizontal direction or in the θz direction. Can be rotated.

  When the fine movement stage 50 is accelerated, the pair of X voice coil motors 124 may be used together with the X drive device 70X, and the pair of Y voice coil motors 128 may be used together with the Y drive device 70Y. In this case, even if the bearing rigidity of the air bearing 80 is low, the fine movement stage 50 can be accelerated with high response.

<< Sixth Embodiment >>
FIG. 12 shows a side view of the substrate stage apparatus PST3 according to the sixth embodiment viewed from the −X direction. As is apparent from comparison between FIG. 12 and FIG. 11, in the substrate stage apparatus PST3, instead of the Z voice coil motor 18z, the fine movement stage 50 is driven in the Z-axis direction with respect to the Y coarse movement stage 23Y. The driving device 70Z is different from the substrate stage device PST2 in that a driving device 70Z is provided.

  The Z driving device 70Z has a configuration substantially similar to the configuration in which the X driving device 70X or the Y driving device 70Y is rotated by 90 ° around an axis parallel to the horizontal plane. That is, the voice coil motor 110 (hereinafter referred to as the Z voice coil motor 110) of the Z drive device 70Z is disposed such that the thrust generation direction (electromagnetic force generation direction) is the Z-axis direction. Also, one Z driving device 70Z is disposed at each of three locations that are not on the same straight line, such as locations corresponding to the four corners of the stage body 51 (in FIG. 12, one Z driving device is provided). Only 70Z is representatively shown). Therefore, the fine movement stage 50 can be linearly driven in the Z-axis direction with respect to the Y coarse movement stage 23Y by synchronously controlling the plurality of Z drive devices 70Z. Further, by making the driving force (specifically, the thrust generated by the Z voice coil motor 110) generated by each of the plurality of Z driving devices 70Z different from each other, the fine movement stage 50 is moved relative to the Y coarse movement stage 23Y with respect to the XY plane. It can be driven in the tilt direction (for example, the θx direction and the θy direction).

  In the Z drive device 70 </ b> Z, the air bearing 380 is attached only to the upper end of the other end portion in the longitudinal direction of the lever 73. The air bearing 380 is disposed such that its bearing surface faces the base 303 fixed to the lower surface of the stage main body 51 via a predetermined clearance (gap, gap). The stator 111 of the Z voice coil motor 110 is supported via a bracket 305 on a support member 301 that extends in the Z-axis direction and is fixed to the upper surface of the Y coarse movement stage 23Y. The reference position of the lever 113 of the Z drive device 70Z (the neutral position around the axis extending parallel to the horizontal plane) is set to a position where the longitudinal direction of the lever 113 is parallel to the XY plane.

  According to the sixth embodiment, when the fine movement stage 50, which is a heavy object, is driven in the Z-axis direction, a plurality of Z driving devices 70Z are used. The fine movement stage 50 can be moved up and down with high response by using a small, small and light-weight one.

  In the sixth embodiment, the fine movement stage 50 is moved up and down by a plurality of Z drive devices 70Z. However, it is not always necessary to do so. For example, when the fine movement stage 50 is raised, the Z drive device 70Z is used. When the fine movement stage 50 is lowered, its own weight may be used.

  Further, when the weight cancellation device 40 cannot completely cancel the weight of the fine movement stage 50, or when the rotation center of the fine movement stage 50 in the tilt direction with respect to the horizontal plane and the center of gravity G1 of the fine movement stage 50 do not coincide with each other. Since the fine movement stage 50 is inclined, it is necessary to apply a large thrust in the Z-axis direction to the fine movement stage 50. By using the Z driving device 70Z, the Z voice coil as in the first and fifth embodiments is used. Compared with the case where the fine movement stage 50 is directly driven by the motor 18z, the thrust of the Z voice coil motor 110 is amplified and transmitted to the fine movement stage 50, so the load on the Z voice coil motor 110 is reduced. In FIG. 12, only the air bearing 380 with the bearing surface facing the + Z side (upward) is attached to the lever 113. However, the present invention is not limited thereto, and the air bearing has the bearing surface facing the −Z side (downward). (Not shown) may be attached below the air bearing 380 (ie, a pair of air bearings on the lever 113). In this case, a U-shaped member into which the pair of air bearings are inserted between a pair of opposed surfaces may be attached to the lower surface of fine movement stage 50. Thus, the fine movement stage 50 can be driven in the ± Z directions by one Z driving device 70Z.

<< Seventh Embodiment >>
FIG. 13 shows a cross-sectional view of the substrate stage apparatus PST4 according to the seventh embodiment, and FIG. 14 shows a side view of the substrate stage apparatus PST4 viewed from the −X direction. The substrate stage device PST4 is provided with an X drive device 470X (see FIG. 13) and a Y drive device 470Y (see FIG. 14) in place of the X drive devices 70X and 70Y described above. This is different from the substrate stage apparatus PST2 according to the embodiment.

  In the X drive device 470X according to the seventh embodiment, as shown in FIG. It is provided so as to face each other.

  Each of the pair of contact members 401 is made of, for example, a hemispherical member, and is fixed to the upper end portion of the lever 113 so as to protrude toward the opposing member 133 (the top portion thereof faces the opposing member 133). Has been. As the opposing member 133 of the present embodiment, a highly rigid member that is harder and more resistant to impact than the opposing member 122 of the first, fifth, and sixth embodiments is preferable. In a state where the lever 113 shown in FIG. 13 is at the reference position, a uniform distance of, for example, about 1 mm to 5 mm is provided between the top of each of the pair of contact members 401 and the facing surface of the facing member 133 facing the pair. Clearance (gap, gap) is formed. The material of the contact member 401 may be a hard material such as steel or ceramics or a soft material such as an elastomer.

  As shown in FIG. 14, the Y drive device 470Y has a configuration in which the X drive device 470X is rotated by 90 ° around an axis that passes through the center of gravity G1 of the fine movement stage 50 and extends in the Z-axis direction. Since the same operation and effect are exhibited, the description thereof is omitted.

  As shown in FIG. 13, the gap sensor 402X is fixed to the upper end portion of the lever 113 of the X driving device 470X so as to face the opposite member 131 on the −X side. The gap (interval) with the opposing member 133 facing this can be constantly monitored. Similarly, as shown in FIG. 14, the gap sensor 402Y is fixed to the upper end portion of the lever 113 of the Y driving device 470Y so as to face the opposing member 133 on the −Y side. The main controller controls the X voice coil motor 110 (see FIG. 13) based on the output of the gap sensor 402X, and controls the Y voice coil motor 110 (see FIG. 14) based on the output of the gap sensor 402Y. The gap between the contact member 401 and the opposing member 133 facing the contact member 401 is appropriately adjusted.

  For example, when accelerating the fine movement stage 50 in the X-axis direction (for example, + X direction), the main control unit integrally connects the X coarse movement stage 23X and the Y coarse movement stage 23Y via the pair of X linear motors 15. While accelerating in the X-axis direction (for example, + X direction), the lower end portion of the lever 113 positioned at the reference position is driven in the X-axis direction (for example, -X direction) via the X voice coil motor 110. As a result, the lever 113 swings in one direction around the axis of the shaft member 119 (in the direction of the arrow Q), and the + X side contact member 401 contacts (point contact) with the + X side facing member 133. The lever 113 moves the stage main body 51 in the + X direction via the contact member 401 and the opposing member 133 in a state where the driving force of the X voice coil motor 110 is amplified based on the principle of the lever with the axis of the shaft member 119 as a fulcrum. Press on. Thereby, fine movement stage 50 is accelerated in the + X direction. When the fine movement stage 50 reaches a predetermined target speed, the main controller controls the X voice coil motor 110 to separate the contact member 401 from the opposing member 133 and to move the pair of X voice coil motors 124. Drive synchronously. Thereby, the transmission of force from the X driving device 470X to the fine movement stage 50 is released, and the fine movement stage 50 is driven at a constant speed by the pair of X voice coil motors 124. In this case, the control of the X voice coil motor 110 includes, for example, reducing the power supplied to the X voice coil motor 110, stopping the power supply to the X voice coil motor 110, and controlling the X voice coil motor 110. For example, driving in the reverse direction. The same applies to the case where the lower end portion of the lever 113 is driven in the + X direction by the X voice coil motor 110.

  According to the seventh embodiment, as described above, when the fine movement stage 50 is accelerated, the lever 113 is rotated, the contact member 401 is brought into contact with the opposing member 133, and the fine movement stage 50 is pressed. Therefore, the rigidity at the time of the press can be improved. Therefore, the fine movement stage 50 can be accelerated with high response.

  Further, when the fine movement stage 50 is accelerated to a predetermined target speed and then driven at a constant speed, the contact member 401 is separated from the facing member 133, so that the vibration of the Y coarse movement stage 23 </ b> Y is transmitted to the fine movement stage 50. Can be prevented.

<< Eighth Embodiment >>
FIG. 15 shows a cross-sectional view of a substrate stage apparatus PST5 according to the eighth embodiment. The substrate stage device PST5 is provided with an X drive device 570X having a different configuration from that of the X drive device 70X and the Y drive device 70Y and a Y drive device (not shown) having the same configuration as these.

  In the eighth embodiment, as shown in FIG. 15, the X driving device 570X, the support frame 85, and the like are installed on the upper surface of the + X side portion of the Y coarse movement stage 23Y. Further, the recess 51 a is not formed in the stage main body 51, and the lever 113 of the X driving device 570 X is disposed so that the upper end portion is located on the + X side of the stage main body 51. The upper end portion of the lever 113 and the + X end surface of the stage main body 51 are connected by a rope 500. The rope 500 is stretched between the lever 113 and the stage main body 51 in a state where the lever 113 is positioned at the reference position. The rope 500 is preferably a high-strength wire such as a stranded wire rope or a rope made by Kevlar (registered trademark of DuPont). Further, the stator 125 of each of the pair of X voice coil motors 124 is fixed to the upper surface of the Y coarse movement stage 23Y via the support base 550 and the support member 106. In FIG. 15, illustration of the X stopper 11 and the like is omitted.

  In the eighth embodiment, for example, when the fine voice stage 50 is accelerated in the + X direction, if the lower end portion of the lever 113 is driven in the −X direction by the X voice coil motor 110, the upper end portion of the lever 113 is moved in the + X direction. The fine movement stage 50 is driven in the + X direction by the tension of the rope 500. When the speed of fine movement stage 50 reaches a predetermined target speed, driving of lever 113 by X voice coil motor 110 is stopped and fine movement stage 50 is driven at a constant speed in the + X direction by X voice coil motor 124. The At this time, the rope 500 is loosened and the reaction force from the lever 113 when the drive of the lever 113 is stopped is not transmitted to the stage body 51.

  According to the eighth embodiment, the X driving device 570X is configured to drive the fine movement stage 50 by the tension of the rope 500 by swinging the lever 113 by the X voice coil motor 110. The force acting on the lever 113 is transmitted to the fine movement stage 50 while the force is acting on the lever 113 while the force acting on the lever 113 is not transmitted to the fine movement stage 50 when the rope 500 is loose. Accordingly, when the swing of the lever 113 is stopped while the fine movement stage 50 is driven by the X drive device 570X, the rope 500 is loosened, and therefore, it is possible to prevent the reaction force from the lever 113 from being transmitted to the fine movement stage 50. . Thereby, the drive source of fine movement stage 50 can be smoothly switched from X drive device 570X to X voice coil motor 124.

  The X driving device 570X configured to pull (drive) the fine movement stage 50 in the + X direction has been described above. However, the substrate stage device PST5 has the same configuration as the X driving device 570X, and the fine movement stage 50 is moved in the −X direction. And an X drive device (not shown) configured to pull the fine movement stage 50 in the + Y direction and the −Y direction, respectively, and a Y drive device (not shown) configured to pull the fine movement stage 50 in the + Y direction and the −Y direction. , And can be driven in the -Y direction.

<< Ninth embodiment >>
FIG. 16 shows a cross-sectional view of a substrate stage apparatus PST6 according to the ninth embodiment. In the ninth embodiment, the lever 113 provided in each of the X driving device 670X (see FIG. 16) and the Y driving device (not shown) of the substrate stage device PST6 and the fine movement stage 50 are connected by the eighth method. This is different from the embodiment.

  In the substrate stage apparatus PST6, as shown in FIG. 16, the support frame 85 is installed directly below the recess 51c formed on the lower surface of the stage main body 51. The upper end portion of the lever 113 of the X driving device 670X is inserted into the concave portion 51c, and the −X end and the + X end of the upper end portion are the inner wall surface on the −X side of the concave portion 51c of the stage body 51 and + X, respectively. For example, a rope 600 is connected to the inner wall surface on the side. The −X side and + X side ropes 600 are bent by a predetermined amount (the same amount) in a state where the lever 113 is positioned at the reference position shown in FIG. 16. Therefore, the lever 113 is not restrained by the stage main body 51 when positioned near the reference position.

  In the ninth embodiment, for example, when the lever 113 at the reference position is swung in the direction of the arrow Q in FIG. 16 by the X voice coil motor 110 when the fine movement stage 50 is accelerated in the + X direction, for example, the rope on the + X side 600 further bends, and the rope 600 on the −X side is stretched, and the tension of the rope 600 moves the fine movement stage 50 in the + X direction. When the speed of fine movement stage 50 reaches a predetermined target speed, X voice coil motor 110 is stopped and fine movement stage 50 is driven at a constant speed in the + X direction by a pair of X voice coil motors 124. At this time, the -X side rope 600 is loosened, and the reaction force from the lever 113 when the swing of the lever 113 is restricted is prevented from being transmitted to the fine movement stage 50. The same applies when the lever 113 at the reference position is swung in the direction of the arrow R in FIG. 16, for example, when the fine movement stage 50 is accelerated in the −X direction.

  According to the ninth embodiment, since the lever 113 is not restrained by the fine movement stage 50 when positioned near the reference position, the fine movement stage 50 is positioned near the neutral position with respect to the Y coarse movement stage 23Y. 50 can be moved slightly in any direction without resistance, and the vibration generated in the Y coarse movement stage 23 </ b> Y is prevented from being transmitted to the fine movement stage 50 via the lever 113.

  Note that the Y drive device (not shown) of the ninth embodiment has a configuration in which the X drive device 670X is rotated around an axis passing through the center of gravity G1 of the fine movement stage 50 and parallel to the Z axis. Since the same operation and effect as 670X are produced, the description thereof is omitted.

<< Tenth Embodiment >>
Next, a tenth embodiment will be described. In this embodiment, since only the configuration of the mask stage apparatus in the liquid crystal exposure apparatus is different from that in the first embodiment, the mask stage apparatus will be described, and the same configuration as the members described in the first embodiment and The members having a function are denoted by the same reference numerals and description thereof is omitted.

  As shown in FIG. 17, the mask stage apparatus MST5 according to the tenth embodiment includes a pair of mask stage guides 35 and an air bearing 27 (see FIGS. 17 and 18A) on the pair of mask stage guides 35. And the mask stage drive system 770 for driving the mask stage 20 and a control system thereof.

  In mask stage apparatus MST5, each pair of X laser interferometers 72X and Y that measure positional information (including rotation information in the θz direction) of the pair of mask stage guide 35, mask stage 20, and mask stage 20 in the XY plane. The laser interferometer system including the laser interferometer 72Y is configured in the same manner as the mask stage apparatus MST according to the first embodiment described above. Therefore, the mask stage drive system 770 will be described below.

  As shown in FIG. 17, the mask stage drive system 770 includes a pair of substage devices 160, a pair of X voice coil motors 101a and 101b, a single Y voice coil motor 96a, and a pair of substage devices 160. A plurality of (for example, four) flexure apparatuses 150 that connect each of the pair of X stages (X tables) 83Xa and 83Xb and the mask stage 20 are included.

  The pair of sub-stage devices 160 is on the floor 130 (see FIG. 1), with one being on the + Y side of the body 30 (see FIG. 1) and the other on the −Y side of the body 30, respectively. is set up. Note that the support frame 74a of the + Y side substage apparatus 160 is lower than the support frame 74b of the -Y side substage apparatus 160 (see FIG. 18A), and the + Y side substage apparatus 160 will be described later. Except for having a stator 93 constituting the Y voice coil motor 96a (see FIG. 18B), the pair of substage devices 160 have the same functions, and therefore include the components and are the same for convenience. A description will be given with reference numerals.

  The pair of substage apparatuses 160 includes the X beam 61 and the X stages 83Xa and 83Xb described above. As shown in FIG. 18A, the X beam 61 is mounted on support frames 74a and 74b installed on the floor 130 (not shown in FIG. 18A, see FIG. 1). A magnet unit 82 including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction is fixed to the center of the upper surface of the X beam 61. Further, an X linear guide member 77 extending in the X-axis direction is fixed to the upper surface of the X beam 61 on each of the + Y side and the −Y side of the magnet unit 82.

  A coil unit 86 that is opposed to the magnet unit 82 via a predetermined clearance (gap, gap) is fixed at the center of the lower surface of each of the X stages 83Xa and 83Xb. The coil unit 86, together with the magnet unit 82, constitutes X linear motors 87a and 87b for driving the X stages 83Xa and 83Xb with a predetermined stroke in the X-axis direction. As the X linear motors 87a and 87b, since the distance between the coil unit 86 (mover) and the magnet unit 82 (stator) does not change, for example, a linear motor including a coil with a core is used. Each of the X stages 83Xa and 83Xb includes rolling elements (for example, a plurality of balls or rollers) on the lower surface thereof, and a plurality of (for example, one X slider 79) that slidably engages the X linear guide member 77. 2) per X linear guide member 77). The positional information regarding the X-axis direction of the X stages 83Xa and 83Xb is, for example, an encoder system (not shown) including an X linear scale attached to the X beam 61 and a detector (head) attached to each of the X stages 83Xa and 83Xb. Is required.

  As shown in FIG. 18B, one of the pair of X voice coil motors 101 a and 101 b is arranged on the + Y side of the mask stage 20, and the other is arranged on the −Y side of the mask stage 20. The −Y side X voice coil motor 101b includes a mover 107 fixed to the central portion in the X-axis direction near the −Y side end of the upper surface of the mask stage 20 via a bracket 59, and a −Y side X voice coil motor 101b. And a stator 105 fixed via a support member 109 to the + Y side end of the stage 83Xb. The X voice coil motor 101a on the + Y side includes a mover 107 fixed via a bracket 59 to a central portion in the X axis direction near the + Y side end of the lower surface of the mask stage 20, and a + Y side X stage 83Xa. And an X stator 105 fixed to the end portion on the -Y side via a support member 109. The Y voice coil motor 96a is fixed to the movable element 92 fixed to the central portion in the X-axis direction on the side surface on the + Y side of the mask stage 20, and to the upper surface of the X stage 83Xa on the + Y side via a support member 109a. And a child 93.

  The two movers 107 and the mover 92 are each made of a member having a U-shaped UZ cross section, and a magnet unit (not shown) including a permanent magnet is attached to a pair of opposing surfaces thereof. Each of the two X stators 105 and Y stators 93 has a coil unit (not shown), and the coil unit corresponds to a pair of opposing surfaces of the movable element 107 and the movable element 92 (a magnet unit). Between the two) via a predetermined clearance (gap, gap). The X voice coil motors 101a and 101b can slightly drive the mask stage 20 with respect to the X stages 83Xa and 83Xb by electromagnetic force (Lorentz force) with respect to the X stages 83Xa and 83Xb by electromagnetic interaction between the magnet unit and the coil unit. Here, the two X voice coil motors 101 a and 101 b are arranged at positions that are point-symmetric with respect to the gravity center position CG of the mask stage 20. Accordingly, when a thrust is applied to the mask stage 20 using the two X voice coil motors 101a and 101b, it is possible to suppress the moment in the θy direction (pitching moment) from acting on the mask stage 20.

  Further, in the mask stage apparatus MST5, by making the thrusts of the two X voice coil motors 101a and 101b different, the mask stage 20 is parallel to the Z axis passing through the center of gravity position CG with respect to the pair of X stages 83Xa and 83Xb. It can be slightly driven around the axis (θz direction) (see FIG. 17). The Y voice coil motor 96a can slightly drive the mask stage 20 with respect to the X stage 83Xa in the Y-axis direction by electromagnetic force (Lorentz force) by electromagnetic interaction between the magnet unit and the coil unit.

  Returning to FIG. 17, for example, four flexure apparatuses 150 are provided respectively on the + X side and the −X side of the + Y side X stage 83Xa, and on the + X side and the −X side of the −Y side X stage 83Xb. It has been. For example, since the configuration of each of the four flexure apparatuses 150 is substantially the same, one of them will be described below. In FIG. 17, for example, four flexure apparatuses 150 are shown in a simplified manner.

  As shown in FIGS. 20A and 20B, the flexure device 150 is a pair of brackets 155 and a pair of brackets 155 that are rotatably supported in the θz direction via shaft members 152, respectively. And a rope 154 having one end connected to one of the pair of rotating members 153 and the other end connected to the other of the pair of rotating members 153. Each of the pair of brackets 155 is made of a member having a U-shaped XZ cross section, one is fixed to the mask stage 20 via the bracket 173, and the other is fixed to the X stage 83Xb via the bracket 171 (see FIG. 19). ). As long as the rope 154 has flexibility (or flexibility) and has high longitudinal rigidity (elongation rigidity), the rope 154 may be made of, for example, a metal (one obtained by twisting a plurality of steel wires) or a synthetic resin. . In FIG. 19 (and FIGS. 21A to 21C described later), illustration of the X beam 61 (see FIG. 17) of the substage device 160 is omitted to avoid complication of the drawing.

  Here, as shown in FIG. 19, when the X voice coil motor 101b is in a neutral state (the movable element 107 is movable with respect to the stator 105 by the same stroke in the + X direction and the −X direction, respectively). The lengths of the ropes 154 are set so that the ropes 154 of the + X side flexure device 150 and the −X side flexure device 150 of the X stage 83Xb (or 83Xa) are bent. Therefore, in the neutral state, the mask stage 20 is not restrained by the X stage 83Xb (or 83Xa) and is slightly smaller than the X stage 83Xb (or 83Xa) in three degrees of freedom (X-axis, Y-axis, and θz directions). Relative movement is possible with a stroke (actually, relative movement is possible in a total of six degrees of freedom including the Z-axis, θx, and θy directions).

  Further, the two flexure devices 150 on the + Y side and the two flexure devices 150 on the −Y side are point-symmetric with respect to the center of gravity position CG of the mask stage 20, similarly to the two X voice coil motors 101 a and 101 b. (See FIG. 18B).

  The relative position information of the mask stage 20 with respect to the X stage 83Xb (or 83Xa) is attached to the mask stage 20 via the bracket 173 by the gap sensor 172 fixed to the X stage 83Xb (or 83Xa) via the bracket 171. It is determined via the target 174. As shown in FIG. 17, for example, four gap sensors 172 are provided corresponding to the four flexure devices 150. Note that the positional relationship between the gap sensor 172 and the target 174 may be reversed.

  In the liquid crystal exposure apparatus according to the tenth embodiment, the configuration of each part other than the mask stage apparatus is the same as that of the liquid crystal exposure apparatus 10 according to the first embodiment described above.

  In the liquid crystal exposure apparatus according to the tenth embodiment configured as described above, the mask is controlled under the control of the main controller (not shown) or by the main controller, as in the first embodiment. After carrying in (loading) the mask M to the stage 20 and carrying out preparatory work such as loading (loading) the substrate P onto the fine movement stage 50 and alignment measurement, exposure operation of the step-and-scan method is performed. Is done.

  Hereinafter, the operation of the mask stage apparatus MST5 during the step-and-scan exposure operation will be described. During the step-and-scan exposure operation, the mask stage 20 positioned on one end side of the stroke end is accelerated in the X-axis direction from the stop state, and then is driven at a predetermined constant speed. Is decelerated (accelerated in the minus direction with respect to the traveling direction) in accordance with the completion of the stroke, and stopped at the other end side of the stroke end. Hereinafter, as an example, the operation when the mask stage 20 moves in the + X direction will be described with reference to FIGS. 21 (A) to 21 (C). The following operation of the mask stage apparatus MST5 is performed under the control of a main controller (not shown). Further, when driving the mask stage 20, the pair of X stages 83Xa and 83Xb (see FIG. 17) are driven synchronously, so in FIGS. 21A to 21C, the X stage on the −Y side. Only 83Xb is shown, and the + Y side X stage 83Xa is not shown.

  When accelerating the stopped mask stage 20 in the + X direction, the main controller first turns each of the pair of X linear motors 87a and 87b (see FIG. 18A) as shown in FIG. The pair of X stages 83Xa and 83Xb (in FIG. 21A, the + Y side X stage 83Xa is not shown) is driven (accelerated) in the X-axis direction. At this time, the power supply to the coil units of the X movers 107 of the pair of X voice coil motors 101a and 101b is stopped, and the mask stage 20 is in a state where the position in the XY plane is not restrained.

  Therefore, when the X stages 83Xa and 83Xb are accelerated in the + X direction, the ropes 154 included in the flexure devices 150 on the −X side of the X stages 83Xa and 83Xb (opposite to the traveling direction of the X stages 83Xa and 83Xb), respectively. Tension acts on. When the rope 154 is not bent (strained), the rigidity of the rope 154 causes the mask stage 20 to be pulled by the X stages 83Xa and 83Xb, so that the X stage 83Xa and 83Xb and the mask stage 20 are It is accelerated in the + X direction as a unit. At this time, the ropes 154 of the + X side flexure devices 150 of the X stages 83Xa and 83Xb are bent more than the neutral position shown in FIG. Further, as described above, the two + Y side flexure apparatuses 150 and the two −Y side flexure apparatuses 150 are arranged at positions that are point-symmetric with respect to the center of gravity position CG (see FIG. 17) of the mask stage 20. Therefore, when the mask stage 20 is pulled through the rope 154, the moment in the θy direction (pitching direction) acts on the mask stage 20 is suppressed. Further, the main control device appropriately controls the relative position in the X-axis direction with respect to the mask stage 20 of each of the pair of X stages 83Xa and 83Xb based on the outputs of the plurality of gap sensors 172. Suppresses the application of moment in the direction (yawing direction).

  Thereafter, when it is measured based on the outputs of the pair of X laser interferometers 72X (see FIG. 17) that the mask stage 20 (mask M (see FIG. 17)) has reached a predetermined constant velocity, the main controller Controls the position of the X stages 83Xa and 83Xb so that the mask stage 20 is positioned at the neutral position shown in FIG. 21B based on the outputs of the plurality of gap sensors 172, and the mask stage 20 is set at the neutral position. In the state where X is positioned, power is supplied to the coil units of the stators 105 of the X voice coil motors 101a and 101b so that the relative speed between the X stages 83Xa and 83Xb and the mask stage 20 becomes zero. The mask stage 20 is electromagnetically induced using the X voice coil motors 101a and 101b. As a result, the pair of X stages 83Xa and 83Xb (see FIG. 17) and the mask stage 20 integrally move at a predetermined constant speed in the + X direction.

  Here, when the mask stage 20 moves in the + X direction at a predetermined constant speed, the rope 154 of the flexure device 150 on the + X side and the −X side of each of the X stages 83Xa and 83Xb is bent (relaxed). Become. Therefore, in the mask stage apparatus MST5, based on the result of the alignment measurement, the mask stage 20 is slightly driven in the θz direction using the pair of X voice coil motors 101a and 101b (see FIG. 18B), and The mask stage 20 can be slightly driven in the Y-axis direction using a Y voice coil motor 96a (not shown in FIG. 21B, see FIG. 18B). Thereby, a highly accurate exposure operation is possible.

  In mask stage apparatus MST5, after the exposure operation for one shot area is completed, mask stage 20 is decelerated in preparation for the exposure operation for the next shot area to be exposed. When the mask stage 20 is decelerated, the main controller is an X voice coil motor 101a. The power supply to the coil units of the respective stators 105 and 105 is stopped, and the X stages 83Xa and 83Xb are decelerated using a pair of X linear motors 87a and 87b. As a result, as shown in FIG. 21C, the mask stage 20 that is levitated and supported by a pair of mask stage guides 35 (not shown in FIG. 21C, see FIG. 17) is moved to the X stages 83Xa and 83Xb. On the other hand, it moves in the + X direction by inertia. When the mask stage 20 moves in the + X direction with respect to the X stages 83Xa and 83Xb, a tension acts on the rope 154 included in the + X side flexure device 150 of each of the X stages 83Xa and 83Xb. When the rope 154 is no longer bent, the braking force acts on the mask stage 20 due to the rigidity of the rope 154. Accordingly, the X stages 83Xa and 83Xb and the mask stage 20 are integrally decelerated (accelerated in the −X direction).

  As described above, according to the mask stage apparatus MST5 according to the tenth embodiment, the X stage 83Xa, 83Xb is pulled through the flexure apparatus 150 to accelerate the mask stage 20, and the X stage 83Xa, 83Xb. However, the mask stage 20 is decelerated by applying a braking force via the flexure device 150. Here, as a method of accelerating the mask stage 20 in a stopped state or a method of decelerating the mask stage 20 moving at a constant speed, a method using the X voice coil motors 101a and 101b can be considered. In this case, the mask stage 20 can be arbitrarily driven (accelerated or decelerated) without the flexure device 150, but a large thrust must be applied to the mask stage 20, and a large voice coil motor is used. (Or increase the number of voice coil motors). On the other hand, in this embodiment, since the mask stage 20 is driven, a large thrust is not required for the X voice coil motors 101a and 101b (the mask stage 20 can be guided at a constant speed and moved at a constant speed). A thrust that can be driven minutely in the θz direction is sufficient). Thereby, a small (light) thing can be used as X voice coil motor 101a, 101b (mover 107 and stator 105). Thereby, the motion performance and position controllability of the mask stage 20 can be improved, and the cost can be reduced.

  In addition, since small X voice coil motors 101a and 101b with small generated thrust can be used, the amount of heat generated from a coil unit (not shown) of the stator 105 is small, and thrust is used to drive the mask stage 20. Even if it continues to occur, the temperature rise around the mask stage 20 can be suppressed.

  Further, since the flexure apparatus 150 mechanically connects the X stages 83Xa and 83Xb and the mask stage 20 in advance, for example, the X stage 83Xa and 83Xb and the mask stage 20 are mechanically switched between connected and disconnected states. Compared with the case where an actuator (for example, a clamp device) is provided, the configuration is simple (no drive source is required), and the switching operation between the connected and non-connected states is not required. it can. In addition, it is conceivable that the X stage 83Xa, 83Xb and the mask stage 20 are not in contact with each other, and the mask stage 20 is pressed against the X stage 83Xa, 83Xb. There is a need. On the other hand, in the present embodiment, since the X stages 83Xa and 83Xb and the mask stage 20 are connected in advance, impact, dust generation, and the like during acceleration / deceleration are suppressed.

  Further, when the mask stage 20 moves at a constant speed, the rope 154 of each flexure device 150 is in a bent state (see FIG. 21B), and therefore, between the X stages 83Xa and 83Xb and the mask stage 20. Transmission of vibration at is suppressed.

  The configuration of the mask stage apparatus MST5 is not limited to that described in the tenth embodiment, and can be changed as appropriate. For example, instead of the flexure device 150 including the rope 154 (see FIGS. 20A and 20B), a thin steel plate 194 as shown in FIGS. 22A and 22B described below. A flexure device 190 including the above may be used. The flexure device 190 includes a pair of brackets 191, a pair of rotating members 193 that are rotatably supported in the θz direction via shaft members 192, respectively, and one end of the pair of brackets 191, as in the above embodiment. A steel plate 194 connected to the member 193 via the mounting plate 195 and having the other end connected to the other rotating member 193 via the mounting plate 195 is included. The rotating member 193, the mounting plate 195, the mounting plate 195, and the steel plate 194 are fixed to each other through a plurality of rivets 196, respectively. Since the function and operation of the flexure device 190 are the same as those in the above embodiment, the description thereof is omitted.

  In addition, the rope 154 in the flexure device 150 (or the steel plate 194 in the flexure device 190) is a bracket 171 using a smooth joint device such as a ball joint or a hinge device, as long as both ends of the rope 154 can rotate in the θz direction. And between the brackets 173. In the tenth embodiment (or a modification thereof), the mask stage 20 and the X stages 83Xa and 83Xb are connected by one flexure device 150 (or the flexure device 190) on the + X side and the −X side, respectively. Although connected, a plurality of flexure devices 150 (or flexure devices 190) may be used.

  The X voice coil motors 101a and 101b and the Y voice coil motor 96a are moving magnet types, but are not limited to this, and may be a moving coil type. However, since it is not necessary to connect a power supply cable to the mask stage 20 and the coil as a heat source can be moved away from the mask stage 20, it is possible to suppress vibration transmission, reduce weight, improve exposure accuracy, and the like. It is preferable to use a moving magnet type voice coil motor.

Further, for example, when the mask stage 20 is finely driven in the X-axis direction with high precision, for example, during an alignment operation, the mask stage is used by using the pair of X stages 83Xa and 83Xb even when the mask stage 20 is accelerated. The mask stage 20 may be driven with respect to the pair of X stages 83Xa and 83Xb using the two X voice coil motors 101a and 101b without towing the X stage. Further, when the positioning accuracy of the mask M is not required, the mask stage 20 is moved by the X stages 83Xa and 83Xb via the flexure device 150 (or the flexure device 190) even when the mask stage 20 is moved at a constant speed. It may be towed (the guidance by the X voice coil motors 101a and 101b may not be performed).
<< Eleventh Embodiment >>
Next, an eleventh embodiment will be described with reference to FIGS. The eleventh embodiment differs from the first embodiment only in the configuration of the substrate stage apparatus in the liquid crystal exposure apparatus, so the substrate stage apparatus will be described and the same members as those described in the first embodiment. The members having the structure and function are denoted by the same reference numerals, and the description thereof is omitted.

  The substrate stage device PST7 included in the liquid crystal exposure apparatus according to the eleventh embodiment is a fine movement stage XY drive system, X instead of the X drive device 70X, the Y drive device 70Y, the X stopper device 90X, and the Y stopper device 90Y. Although the switching device 1070X and the Y switching device 1070Y are different from the above-described substrate stage device PST, the configuration of the other parts is the same. Hereinafter, the difference will be mainly described.

  As shown in FIG. 27A, the fine movement stage XY drive system includes a plurality of fine movement stages 50 for slightly driving the Y coarse movement stage 23Y in the three-degree-of-freedom direction (X, Y, θz directions). Voice coil motors (X voice coil motor 18x and Y voice coil motor 18y). 27A and 27B, the substrate holder 53, the X moving mirror 22X, the Y moving mirror 22Y, the X coarse movement stage 23X, and the like are omitted from the viewpoint of avoiding the complication of the drawings.

  For example, two X voice coil motors 18x are provided on the + X side of the stage body 51 at predetermined intervals in the Y-axis direction. The two X voice coil motors 18x are arranged symmetrically with respect to a plane parallel to the XZ plane passing through the gravity center position G1 of the fine movement stage 50. The Z positions of the two X voice coil motors 18x substantially coincide with the Z position of the center of gravity position G1 of the fine movement stage 50, as shown in FIG. Therefore, when the two X voice coil motors 18x slightly drive the fine movement stage 50, the moment in the pitching direction (θy direction) is suppressed as in the case where the thrust acts on the gravity center position G1 of the fine movement stage 50. Hereinafter, driving the fine movement stage 50 in the same manner as applying a thrust to the gravity center position G1 will be referred to as gravity drive. Furthermore, the two X voice coil motors 18x can slightly drive the fine movement stage 50 in the direction around the axis parallel to the Z axis passing through the center of gravity position G1 (θz direction) by making the thrusts different. Returning to FIG. 27A, for example, two Y voice coil motors 18y are provided at predetermined intervals in the X-axis direction. For example, the two Y voice coil motors 18y have a configuration in which the two X voice coil motors 18x are rotated by 90 ° around an axis parallel to the Z axis passing through the gravity center position G1 of the fine movement stage 50. Therefore, detailed description is omitted. From the viewpoint of avoiding the complication of the drawings, the X voice coil motor 18x and the Y voice coil motor 18y are not shown in FIG. 23, and the Y voice coil motor 18y is not shown in FIG.

  As shown in FIG. 24, the X voice coil motor 18x is attached to the front end (+ Z side end) of the columnar support member 114 fixed to the upper surface of the Y coarse movement stage 23Y via a fixing member 37. And a movable element 126 attached to the side surface of the stage main body 51 via a support member 188. The mover 126 is formed of a member having a U-shaped YZ cross section, and has a magnet unit including a permanent magnet on a pair of opposed surfaces thereof. The stator 125 has a coil unit including a coil inserted between a pair of opposed surfaces of the mover 126 (between a pair of magnet units). Between the stator 125 and the mover 126, a predetermined drive in the Y-axis and Z-axis directions (fine movement stage 50 is slightly driven in the Y-axis direction, the θz direction, the Z-axis direction, the θx direction, or the θy direction. Clearances (clearances, gaps) that do not contact each other are formed. Note that the X voice coil motor 18x and the Y voice coil motor 18y have different directions of the stator and the mover in FIG. 27A and FIG. 27B, respectively, in order to facilitate understanding. Although shown, it may be arranged in an orientation as shown in FIGS. 27 (A) and 27 (B).

  The X switching device 1070X is arranged on the + X side of the stage main body 51 as shown in FIG. As shown in FIG. 25A (corresponding to an enlarged view of FIG. 23) and FIG. 25B, the X switching device 1070X includes a spheroid 273 having an elliptical contour (outer shape) shape, an XY plane. A plate-like member 283 parallel to each other.

  As shown in FIG. 23, the spheroid 273 is accommodated in a rectangular parallelepiped casing 181 fixed to the + X side end face of the stage main body 51 via a bracket 282. As illustrated in FIG. 24, the housing 181 is disposed between the pair of fixing members 37. As can be seen from FIGS. 25A and 25B, the housing 181 has openings formed on the −Z side surface (bottom surface), the + Y side surface, and the −Y side surface (side surface). ing.

  A through hole 273a penetrating in the Z-axis direction is formed at the center of the spheroid 273, and the shaft member 277 has an axis parallel to the Z axis and the spheroid 273 is formed in the through hole 273a. It is inserted through the center of The spheroid 273 is fixed to the shaft member 277, and both rotate integrally. The Y position of the axis of the shaft member 277 substantially coincides with the Y position of the gravity center position G1 of the fine movement stage 50 (see FIG. 24). Note that the spheroid 273 and the shaft member 277 may be formed as a single component.

  The shaft member 277 has a + Z side and −Z side portions (portions protruding from the through-hole 273a) of the spheroid 273 in a θz direction (for example, ball bearings) fixed by a bearing 279 (for example, a ball bearing). It is supported rotatably around the Z axis). Further, the −Z side portion of the shaft member 277 protrudes downward from the −Z side opening of the housing 181 and is fixed to the lower surface of the housing 181 via a spacer 298, for example, including a motor. Connected to device 299. The shaft member 277 and the spheroid 273 are driven in the θz direction by the driving device 299.

  As shown in FIG. 24, the plate member 283 is installed between the pair of fixing members 37. As shown in FIG. 25B, the plate-like member 283 has its Y-axis direction intermediate portion inserted into the housing 181, and its + Y side and −Y side ends are outside the housing 181. Sticks out. Each of the + Y side and −Y side ends of the plate-like member 283 is fixed via a plurality of bolts 289 to a flange portion 37 a protruding from the facing surface of each of the pair of fixing members 37.

  In addition, an opening 283a having a rectangular shape in plan view with the Y-axis direction as the longitudinal direction is formed in the center of the plate-like member 283. The dimension of the opening 283a in the X-axis direction is set to be slightly longer than the dimension of the spheroid 273 in the major axis direction. As shown in FIGS. 25B and 26B, the spheroid 273 is inserted into the opening 283a in the housing 181, and the outer peripheral surface thereof is the opening of the plate-like member 283. It faces the inner wall surface that divides the portion 283a. The Z position of the plate member 283 and the Z position of the spheroid 273 substantially coincide with the Z position of the center of gravity position G1 of the fine movement stage 50 (see FIG. 24).

  In the state shown in FIG. 25B, the axis of the shaft member 277 is located substantially at the center of the opening 283a. The major axis of the spheroid 273 is parallel to the X axis, and the clearance (gap, gap) in the X axis direction between the spheroid 273 and the plate-like member 283 is minimum (for example, 1 mm or less). Yes. As a result, the relative movement distance in the X-axis direction between the Y coarse movement stage 23Y and the fine movement stage 50 (see FIGS. 23 and 24, respectively) is limited to, for example, ± 1 mm or less. On the other hand, in the state shown in FIG. 26B, the shaft member 277 has its axis positioned substantially at the center of the opening 283a, but the major axis of the spheroid 273 is parallel to the Y axis. The clearance (gap, gap) in the X-axis direction between the spheroid 273 and the plate-like member 283 is the maximum (for example, 3 mm or more). Thus, with respect to the X-axis direction, the relative movement distance in the X-axis direction between the Y coarse movement stage 23Y and the fine movement stage 50 (see FIGS. 23 and 24, respectively) is, for example, ± 3 mm or more (3 mm in the + and − directions, respectively). Above) is allowed. Hereinafter, the θz position of the spheroid 273 in which the long axis shown in FIGS. 25 (A) and 25 (B) is parallel to the X axis is referred to as a limit position, and FIGS. 26 (A) and 26 (B). The θz position of the spheroid 273 in which the long axis shown in () is parallel to the Y axis is referred to as an allowable position. The Y switching device 1070Y has a configuration in which the X switching device 1070X is rotated by 90 ° around an axis parallel to the Z axis passing through the center of gravity position G1 of the fine movement stage 50 (for example, FIG. 27A and FIG. B)), and the description thereof is omitted.

  In the substrate stage apparatus PST7, for example, in the X switching apparatus 1070X, the Y coarse movement stage 23Y is in the X-axis direction in a state where the spheroid 273 is positioned at the restriction position (see FIGS. 25A and 25B). When moving in the (+ X direction or −X direction), as shown in FIG. 27A, the inner wall surface of the opening 283a of the plate-like member 283 and the outer peripheral surface of the spheroid 273 come into contact (line). Fine movement stage 50 moves in the X-axis direction integrally with Y coarse movement stage 23Y (see FIG. 23, respectively).

  The components other than the substrate stage apparatus PST7 are the same as the exposure apparatus according to the first embodiment described above except that a unity magnification system is used as the projection optical system and the mask stage 20 can only be finely moved in the cross scan direction. It is constituted similarly.

  In the liquid crystal exposure apparatus according to the eleventh embodiment configured as described above, as in the first embodiment, the mask is controlled under the control of the main controller (not shown) or by the main controller. After carrying in (loading) the mask M to the stage 20 and carrying out preparatory work such as loading (loading) the substrate P onto the fine movement stage 50 and alignment measurement, exposure operation of the step-and-scan method is performed. Is done.

  During the exposure operation, the alignment operation, or the substrate exchange operation, the main controller uses the pair of X linear motors 15 (see FIG. 24) to move the X coarse movement stage 23X in the X-axis direction (+ X direction) that is the scanning direction. Or in the -X direction). As a result, the Y coarse movement stage 23Y, the weight cancellation device 40, and the like also move in the X-axis direction together with the X coarse movement stage 23X.

  Here, the main controller drives (accelerates) the X coarse movement stage 23X in order to move the fine movement stage 50 at a predetermined constant speed, for example, from a state where the fine movement stage 50 (ie, the substrate P) is stopped. At this time, the spheroid 273 of the X switching device 1070X is positioned at the limit position shown in FIGS. 25 (A) and 25 (B). When the X coarse movement stage 23X (see FIG. 23, FIG. 24, etc.) is accelerated in a state where the spheroid 273 is located at the limit position, the spheroid 273 is plate-shaped as shown in FIG. By being pressed by the member 283, the fine movement stage 50 is accelerated in the X-axis direction integrally with the Y coarse movement stage 23Y. At this time, the spheroid (not shown) of the Y switching device 1070Y is positioned at an allowable position where relative movement of the fine movement stage 50 with respect to the Y coarse movement stage 23Y in the Y-axis direction is allowed.

  The main controller controls the two X voice coil motors 18x immediately before the fine movement stage 50 reaches a predetermined target speed so that the fine movement stage 50 moves in the same direction at the same speed as the Y coarse movement stage 23Y. Next, a thrust is applied to fine movement stage 50. Further, the main control device controls the driving device 299 (see FIG. 25A) of the X switching device 1070X almost simultaneously with the thrust generation of the two X voice coil motors 18x, and rotates the spheroid 273 by 90 °. Then, it is positioned at the permissible position shown in FIGS. 26 (A) and 26 (B). In this state, as shown in FIG. 27B, the spheroids 273 of the X switching device 1070X and the Y switching device 1070Y are at the permissible positions (see FIGS. 26A and 26B). Therefore, the main control unit moves the fine movement stage 50 guided at a constant speed in the X-axis direction by the Y coarse movement stage 23Y using the pair of X voice coil motors 18x to the pair of Y voice coil motors 18y. And can be driven slightly in the Y-axis direction and / or θz direction as appropriate (a pair of X voice coil motors 18x may be used for position control in the θz direction).

  Further, when the main control device decelerates the fine movement stage 50 that moves at the constant speed, the spheroid 273 of the X switching device 1070X is again moved to the restriction position (see FIGS. 25A and 25B). The power supply to the pair of X voice coil motors 18x is stopped (or the pair of X voice coil motors 18x are operated in the deceleration direction without stopping the power supply). When the X coarse movement stage 23X (see FIG. 23, FIG. 24, etc.) is decelerated in this state, the fine movement stage 50 is mounted on the weight canceling device 40 in a state substantially free of friction in the direction parallel to the XY plane. For this reason, it moves in the X-axis direction with respect to the X coarse movement stage 23X due to inertia, and the spheroid 273 and the plate-like member 283 come into contact with each other. As a result, a braking force acts on the fine movement stage 50.

  Further, when accelerating or decelerating fine movement stage 50 in the Y-axis direction, the main controller limits the relative movement of fine movement stage 50 with respect to Y coarse movement stage 23Y in the Y-axis direction using Y switching device 1070Y. In this state, fine movement stage 50 is driven using Y coarse movement stage 23Y (by a Y linear motor). When the fine movement stage 50 is moved at a constant speed in the Y-axis direction, the spheroid 273 of the Y switching device 1070Y is positioned at an allowable position, and the fine movement stage 50 is moved to the rough Y position using the pair of Y voice coil motors 18y. Electromagnetically guided so as to move integrally with the moving stage 23Y.

  According to the substrate stage apparatus PST7 of the eleventh embodiment described above, in the state where the fine movement stage 50 is substantially restrained by the Y coarse movement stage 23Y using the X switching apparatus 1070X or the Y switching apparatus 1070Y, The fine movement stage 50 is accelerated or decelerated using the coarse movement stage (X linear motor 15) or the Y coarse movement stage 23Y (Y linear motor 60). Here, in order to accelerate the fine movement stage 50 stopped using the X voice coil motor 18x or the Y voice coil motor 18y, or to decelerate the fine movement stage 50 that is moving at a constant speed, the fine movement stage 50 is large. Thrust must be applied and it is necessary to use a large voice coil motor (or increase the number of voice coil motors). On the other hand, in this embodiment, a large thrust is not required for the plurality of voice coil motors for driving the fine movement stage 50 (thus enough to be able to guide the fine movement stage 50 at a constant speed). As a result, a small (light) voice coil motor can be used, or the number of voice coil motors can be reduced, and the motion performance and position controllability of the fine movement stage 50 can be improved, and the cost can be reduced. Can be achieved.

  In addition, since a small voice coil motor with a small generated thrust can be used (or the number of voice coil motors can be reduced), the amount of heat generated from a coil unit (not shown) included in the stator 74 is small, and it is supposed to be a fine movement stage. Even if thrust is continuously generated to drive 50 slightly, the temperature rise of fine movement stage 50 and its peripheral members can be suppressed.

  Further, since the spheroid 273 moves from the allowable position to the limit position by its rotation, the relative position (relative distance) between the fine movement stage 50 and the Y coarse movement stage 23Y hardly changes during the operation, and therefore, a plurality of It is possible to prevent the mover and the stator of the voice coil motor (in particular, the voice coil motor in the direction orthogonal to the driving direction and the Z voice coil motor 18z) from coming into contact with each other. Further, even when the spheroid 273 moves from the restriction position to the allowable position, the relative position (relative distance) between the fine movement stage 50 and the Y coarse movement stage 23Y hardly changes, and the fine movement stage 50 using the voice coil motor immediately. High-precision control can be performed.

  Further, the X switching device 1070X and the Y switching device 1070Y are a state in which the spheroid 273 is positioned at the restriction position (see FIG. 25B), the contact portion between the spheroid 273 and the plate member 283, and the shaft. The axes of the members 277 are positioned on the same axis in the direction of the pressing force (or braking force) (or the X-axis direction in FIG. 25B) with respect to the fine movement stage 50 (see FIG. 27A). Is expensive. Therefore, the thrust and braking force from the Y coarse movement stage 23Y can be reliably transmitted to the fine movement stage 50.

  Furthermore, since the spheroid 273 can be quickly moved between the allowable position and the limit position simply by rotating, for example, 90 °, the position control of the fine movement stage 50 can be performed with good responsiveness. The permissible position may be a position where the gap between the spheroid 273 and the opening 283a can be secured by a predetermined amount or more, and is therefore limited to a position where the spheroid 273 is rotated 90 ° with respect to the limit position. Instead, it may be a position rotated by less than 90 °, such as 45 °. Further, in the X switching device 1070X and the Y switching device 1070Y, since the spheroid 273 and the inner wall surface of the opening 283a of the plate-like member 283 are in line contact, a large thrust can be transmitted without loss.

  The configuration of the substrate stage apparatus PST7 is not limited to that described in the eleventh embodiment, and can be changed as appropriate. For example, in the substrate stage apparatus PST7a shown in FIGS. 28A and 28B, a pair of X gap sensors 290x are attached to each of the pair of support members 114, and one Y gap sensor 290y is on the −X side. The support member 114 is attached. The fine movement stage 50 is attached with a pair of X targets 292x and one Y target 292y corresponding to the pair of X gap sensors 290x and one Y gap sensor 290y. In the substrate stage apparatus PST7a, the three-degree-of-freedom direction (X axis, Y axis, θz direction) between the fine movement stage 50 and the Y coarse movement stage 23Y via the pair of X gap sensors 290x and one Y gap sensor 290y. The relative position information on is constantly measured. As the X gap sensor 290x and the Y gap sensor 290y, for example, eddy current sensors (or laser displacement meters) are used, respectively. In the substrate stage device PST7a, the main control device (not shown) restricts or restricts the relative movement between the fine movement stage 50 and the Y coarse movement stage 23Y using the X switching device 1070X or the Y switching device 1070Y. When canceling, fine movement stage 50 and / or coarse Y movement is performed using the measurement values of the plurality of gap sensors so that the distance between the center of rotation of spheroid 273 and the center of opening 283a is a predetermined distance. By controlling the position of the stage 23Y, an impact at the time of contact between the spheroid 273 and the plate member 283 is suppressed. Thereby, the operation of the substrate stage device PST7a is stabilized, and dust generation due to contact wear is also suppressed.

  In the eleventh embodiment, the voice coil motor is operated immediately before the acceleration of the fine movement stage 50 and immediately before the deceleration starts. However, the fine movement stage 50 is driven by driving the voice coil motor when the fine movement stage 50 is accelerated and decelerated. You may control the attitude. Thereby, for example, when the fine movement stage 50 is driven simultaneously in the X-axis and Y-axis directions, the fine movement stage 50 rotates in the θz direction when the position of the spheroid 273 is shifted from the center line of the fine movement stage 50. Can be suppressed.

  Further, one X switching device 1070X is provided on the axis parallel to the X axis passing through the gravity center position G1 of the fine movement stage 50. However, the present invention is not limited to this, and a plurality of X switching devices 1070X may be provided. In this case, it is preferable to arrange the fine movement stage 50 so that the center of gravity can be driven. Specifically, the fine movement stage 50 is preferably provided symmetrically on the + Y side and the −Y side across the axis parallel to the X axis. Similarly, a plurality of Y switching devices 1070Y may be provided. Alternatively, a plurality of X switching devices 1070X and Y switching devices 1070Y may be provided, some of which may be used for accelerating fine movement stage 50, and another portion may be used for decelerating fine movement stage 50. Further, although the spheroid 273 is provided on the fine movement stage 50 and the plate-like member 283 is provided on the Y coarse movement stage 23Y, the arrangement may be reversed.

  The spheroid 273 of each of the X switching device 1070X and the Y switching device 1070Y moves between the allowable position and the limit position by rotating around the Z axis. For example, around the axis parallel to the horizontal plane (X switching The rotation ellipsoid 273 of the device 1070X may be rotated about the Y axis, and the rotation ellipsoid 273 of the Y switching device 1070Y may be rotated about the X axis. Further, in the X switching device 1070X and the Y switching device 1070Y, the distance between the fine movement stage 50 and the Y coarse movement stage 23Y in the X axis direction and the Y axis direction (relative movable distance) is adjusted by the spheroid 273. However, the distance between the fine movement stage 50 and the Y coarse movement stage 23Y may be adjusted using a member that can slide in the X-axis direction or the Y-axis direction. Further, although the spheroid 273 is inserted into the opening 283a of the plate-like member 283, two members may be arranged so as to sandwich the spheroid 273 instead of the plate-like member 283. In this case, the distance from the spheroid 273 (the distance between the fine movement stage 50 and the Y coarse movement stage 23Y) can be easily adjusted.

  Further, each of the X switching device 1070X and the Y switching device 1070Y is provided with a vacuum suction port, and particles (wear powder) generated by frictional contact at the time of contact between the plate-like member 283 and the spheroid 273 are sucked to the outside. You may make it discharge | emit.

  In addition, when the positioning accuracy of the substrate is not required (the minute drive by the voice coil motor is not necessary), the spheroid 273 is always set to the limit position even when the fine movement stage 50 is moved at a constant speed. It may be located.

  The configuration of the liquid crystal exposure apparatus according to each of the first to eleventh embodiments is an example, and the present invention is not limited to this. For example, in each of the first to fourth embodiments, a voice coil motor is used as an actuator for swinging the lever 73. However, if the actuator can drive one end of the lever 73 in a uniaxial direction, for example, An air cylinder, a feed screw mechanism, a rack and pinion mechanism, or the like may be used.

  In each of the first to fourth embodiments, a linear motor that linearly moves the mover relative to the stator is employed as the voice coil motor 71. However, the present invention is not limited to this, and for example, the mover A rotary motor that rotates the mover relative to the stator along a locus that is substantially the same as the rotation locus of one end of the lever 73 that is fixed to the lever 73 may be employed.

  In the first to fourth embodiments, the configurations of the + Y side and −Y side drive devices are substantially the same, but may be different configurations.

  The inclination angle of the lever 73 with respect to the XY plane is not limited to those shown in the first to fourth embodiments, and can be changed as appropriate.

  In each of the first to fourth embodiments, the fulcrum, force point, and action point of the lever 73 are arranged on the same straight line, but other arrangements may be used.

  In each of the first, second, and fourth embodiments, the lever 73 is provided with the air bearing 80 and the mask stage 20 is provided with the opposing member. Instead, the mask stage 20 has the air bearing 80. And a counter member may be provided on the lever 73. In this case, the opposing member is preferably provided on the lever 73 so as to be swingable.

  In the second to fourth embodiments, only the driving device is used when accelerating the mask stage 20 in the X-axis direction. However, an X voice coil motor that directly drives the mask stage 20 in conjunction with the driving device is used. It may be used. In this case, even if the bearing stiffness of the air bearing 80 is low, the mask stage 20 can be accelerated with high response.

  In the third embodiment, the configuration in which the contact member 201 and the facing member 281 are brought into point contact is adopted. However, the present invention is not limited thereto, and the contact surface of the contact member with the facing member 281 is flat, for example. The contact member and the opposing member 281 may be brought into surface contact or line contact with each other by using a surface or a cylindrical surface. Thereby, the rigidity when the contact member presses the opposing member 281 can be increased.

  In the third embodiment, the contact member 201 is fixed to the lever 73 and the facing member 281 is fixed to the mask stage 20. Instead, for example, the contact member is fixed to the mask stage 20. The opposing member may be fixed to the lever 73.

  In each of the first to fourth embodiments, the XY stage devices 76a and 76b are respectively arranged on the + Y side and the −Y side of the mask stage 20, and the XY stage devices 76a and 76b are respectively connected to the X voice coil motor 71, For example, when the mask M does not need to be moved with a short stroke in the Y-axis direction, the member having the X voice coil motor 71 and the lever 73 is long only in the X-axis direction. You may mount on the X stage apparatus which can move with a stroke.

  The number and arrangement of the X voice coil motors and Y voice coil motors that directly drive the mask stage 20 in the second to fourth embodiments are not limited to those shown in these embodiments, and can be changed as appropriate. .

  In the mask stage drive system 370 of the fourth embodiment, the layout of the mask stage drive system 170 of the second embodiment is changed to a suspension type. The layout of the mask stage drive system of each of the third embodiments may be changed to a hanging type.

  In each of the first to fourth embodiments, the mask stage 20 is pressed by the lever 73. Instead, for example, the mask stage 20 and the lever 73 are made of a thin plate made of, for example, a rope or a spring stiffness. The mask stage 20 may be pulled by the lever 73 by connecting through a member having extremely low rigidity other than the pulling direction, such as a thin plate having both ends attached to the thin plate. Thereby, reaction force from the lever 73 when the swing of the lever 73 is stopped is prevented from acting on the mask stage 20. In this case, when the lever 73 is positioned near the reference position, if the tension is not applied to the member connecting the mask stage 20 and the lever 73 as much as possible, the lever 73 is positioned near the reference position. In addition, it is possible to prevent vibration from being transmitted from the lever 73 to the mask stage 20 and to prevent the slight movement of the mask stage 20 in all directions.

  Further, in each of the first to fourth embodiments, an X coarse movement stage (for example, an X stage 83Xa, which is movable on the fixed frame (for example, the support frame 74a, 74b) with a long stroke in the X-axis direction). 83Xb) is mounted, and the Y coarse movement stage (for example, Y stages 83Ya and 83Yb) that can move in the Y-axis direction with a short stroke is mounted on the X stage. On the gantry, an X coarse movement stage that can move in the X axis direction with a long stroke is mounted on a Y coarse movement stage that can move in the Y axis direction with a short stroke, and a voice coil motor and lever are mounted on the X coarse movement stage. A driving device including the above may be arranged.

  In each of the first, second, and fourth embodiments, the first permanent magnet is replaced with the air bearing 80, the second permanent magnet is replaced with the facing member 81, and the magnetic poles of the portions facing each other are the same. (For example, the N pole and the N pole, or the S pole and the S pole face each other). In this case, a repulsive force (repulsive force) is generated between the first and second permanent magnets, and the first and second permanent magnets do not mechanically contact each other even when the lever 73 is swung. The mask stage 20 can be pressed by the lever 73 as in the first, second, and fourth embodiments. Moreover, piping for supplying pressurized gas to the air bearing, a device for generating pressurized gas, and the like are not required, and the configuration of the device is simplified.

  Further, for example, in each of the first, fifth to ninth embodiments, one X driving device and one Y driving device are provided so as to transmit the driving force to the gravity center G1 of the fine movement stage 50, respectively. However, instead of this, for example, a plurality of X driving devices and Y driving devices may be provided separately in the Y axis direction and the X axis direction, respectively. In this case, in order to make the fine movement stage 50 rotatable in the θz direction, at least one X driving device is arranged on each of one side and the other side including the center of gravity G1 of the fine movement stage 50 and sandwiching the XZ plane. Is preferred. Further, in order to make fine movement stage 50 rotatable in the θz direction, a plurality of Y driving devices may be arranged at least one on each of one side and the other side including the center of gravity G1 of fine movement stage 50 and sandwiching the YZ plane. preferable.

  In the X driving device and the Y driving device of the first, fifth to ninth embodiments, the lever 113 is swingable about an axis parallel to the XY plane. The lever 113 may be swingable about an axis that intersects the XY plane.

  In each of the first, fifth to ninth embodiments, a linear motor that linearly moves the mover relative to the stator is employed as the voice coil motor 110. However, the present invention is not limited to this. You may employ | adopt the rotary motor which rotates a needle | mover with respect to a stator with the locus | trajectory substantially the same as the rotation locus | trajectory of the one end part of the lever 113 fixed to the child.

  In the first, fifth to ninth embodiments, the fulcrum, force point, and action point of the lever 113 are arranged on the same straight line, but other arrangements may be used.

  In each of the first, fifth to ninth embodiments, the voice coil motor is used as the actuator that swings the lever 113. However, if the actuator can drive one end of the lever 113 in a uniaxial direction, for example, an air A cylinder, a feed screw mechanism, a rack and pinion mechanism, or the like may be used.

  In each of the first, fifth, and sixth embodiments, the lever 113 is provided with the air bearing 118 and the stage main body 51 is provided with the counter member 122. Instead, the stage main body 51 is provided with the air bearing. 118 may be provided, and the opposing member 122 may be provided on the lever 113. However, in this case, the facing member 122 needs to be provided on the lever 113 so as to be swingable.

  In each of the first, fifth, and sixth embodiments, the first permanent magnet is replaced with the air bearing 118 (or 380), the second permanent magnet is replaced with the facing member 122, and the portions facing each other. The magnetic poles may be arranged so as to be the same (for example, the N pole and the N pole, or the S pole and the S pole face each other). In this case, a repulsive force (repulsive force) is generated between the first and second permanent magnets, and the first and second permanent magnets do not come into mechanical contact with each other even when the lever 113 is swung. The stage main body 51 can be pressed by the lever 113 as in the first, fifth and sixth embodiments. Moreover, piping for supplying pressurized gas to the air bearing, a device for generating pressurized gas, and the like are not required, and the configuration of the device is simplified.

  In the said 7th Embodiment, although the structure which makes the contact member 401 and the opposing member 133 point-contact is employ | adopted, not only this but the contact surface with the opposing member 133 in a contact member is flat, for example The contact member and the opposing member 133 may be brought into surface contact or line contact with each other by using a surface or a cylindrical surface. Thereby, the rigidity of the contact part of a contact member and the opposing member 133 can be improved.

  In the seventh embodiment, the contact member 401 is fixed to the lever 113 and the facing member 133 is fixed to the stage main body 51. Instead, for example, the contact member is fixed to the stage main body 51. The opposing member may be fixed to the lever 113.

  In each of the eighth and ninth embodiments, the fine movement stage 50 and the lever 113 are connected via a rope, but instead of the rope, a thin plate made of spring-rigid, and a joint is attached to both ends of the thin plate. The lever 113 and the fine movement stage 50 may be connected via a member having extremely low rigidity other than the direction in which the object is pulled.

  In each of the first, fifth to ninth embodiments, the fine movement stage 50 that holds the substrate P that is the object to be exposed is driven using the X driving device 70X including the lever 113 or the Y driving device 70Y. However, the present invention is not limited to this. For example, in order to drive the mask stage 20 holding the mask M with a long stroke in the scanning direction, the same configuration as the X driving device 70X of the first, fifth to ninth embodiments. The X drive device may be used. In each of the first to fourth embodiments, a mask stage apparatus that uses a unity magnification system as a projection optical system as in the fifth embodiment, and the mask stage can only move minutely in the cross-scan direction. May be used.

  In each of the fifth to eleventh embodiments, when an enlargement system is used as the projection optical system, a mask having two mask patterns as disclosed in, for example, International Publication No. 2009/090928 is used as a mask stage apparatus. A mask that can be moved with a predetermined stroke in the cross scan direction (Y-axis direction in the above embodiment) and selectively switches the pattern formed on the substrate P in accordance with the position of the mask M in the cross scan direction. A stage device may be used. The mask stage apparatus according to the first, second, third, fourth, and tenth embodiments and the fifth, sixth, seventh, eighth, ninth, and eleventh embodiments. You may combine arbitrarily with a substrate stage apparatus. Further, the mask stage apparatus according to the first, second, third, fourth and tenth embodiments and the conventional substrate stage apparatus, for example, the substrate disclosed in US Patent Application Publication No. 2010/0018950. A stage apparatus may be combined, or the substrate stage apparatus according to each of the fifth, sixth, seventh, eighth, ninth and eleventh embodiments may be combined with, for example, US Patent Application Publication No. 2010/0018950. It may be combined with the mask stage apparatus disclosed in the above.

The illumination light used in the exposure apparatus is ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). May be. As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  In each of the above embodiments and the modifications thereof, the case where the projection optical system PL is a multi-lens projection optical system including a plurality of optical systems has been described. However, the number of projection optical systems is not limited thereto. One or more is sufficient. The projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror. Further, the case where the projection magnification of the projection optical system uses an enlargement system or an equal magnification system has been described, but the present invention is not limited to this, and the projection optical system of the liquid crystal exposure apparatus of each of the above embodiments is an enlargement system, an equal magnification system. And a reduction system may be used. Further, the mask is not limited to the light transmission type mask, and may be a light reflection type mask, for example. Further, in place of these masks, for example, as disclosed in US Pat. No. 6,778,257, a transmission pattern, a reflection pattern, or a light emission pattern is formed based on electronic data of a pattern to be exposed. An electronic mask (variable shaping mask) to be formed, for example, a variable shaping mask using a DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (also called a spatial light modulator) may be used.

  In each of the above-described embodiments and modifications thereof, the description has been given of the case where the exposure apparatus is a projection exposure apparatus that performs scanning exposure with a step-and-scan operation of the plate. The above-described embodiments can also be applied to proximity type exposure apparatuses that do not use. Further, the substrate stage apparatus according to each of the above embodiments can be applied to a step-and-repeat type exposure apparatus (so-called stepper) or a step-and-stitch type exposure apparatus. In addition, the mobile device may be a device other than the exposure device, for example, an element manufacturing device provided with an ink jet type functional liquid application device, a substrate inspection device used for substrate inspection, or the like.

  As an exposure apparatus, an exposure apparatus that exposes a substrate having a size (including at least one of an outer diameter, a diagonal line, and one side) of 500 mm or more, for example, a large substrate for a flat panel display (FPD) such as a liquid crystal display element. It is particularly effective to apply to this.

  Further, the use of the exposure apparatus is not limited to an exposure apparatus for liquid crystal that transfers a liquid crystal display element pattern onto a square glass plate. For example, an exposure apparatus for manufacturing a semiconductor, a thin film magnetic head, a micromachine, a DNA chip, etc. The present invention can also be widely applied to an exposure apparatus for manufacturing. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The embodiments described above can also be applied to an exposure apparatus that transfers a circuit pattern. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Moreover, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member).

  In addition, the moving body device that moves an object along a predetermined two-dimensional plane is not limited to an exposure apparatus, and for example, an object inspection apparatus used for inspection of an object (for example, a glass substrate, a wafer, etc.) You may use for the object treatment apparatus which processes. Further, when the movable body apparatus is applied to an exposure apparatus, it may be applied to any of a mask stage apparatus that holds a mask (or reticle) and a substrate stage apparatus that holds an object to be exposed (for example, a glass substrate, a wafer, etc.). good.

  It should be noted that the disclosure of all international publications, US patent application publication specifications and US patent specifications relating to the exposure apparatus and the like cited in the above description are incorporated herein by reference.

<Device manufacturing method>
Next, a micro device manufacturing method using the liquid crystal exposure apparatus according to each of the above embodiments in a lithography process will be described. In the liquid crystal exposure apparatus according to each of the above embodiments, a liquid crystal display element as a micro device can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate).
<Pattern formation process>
First, a so-called photolithography process is performed in which a pattern image is formed on a photosensitive substrate (such as a glass substrate coated with a resist) using the liquid crystal exposure apparatus according to each of the above embodiments. By this photolithography process, a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to various processes such as a developing process, an etching process, and a resist stripping process, whereby a predetermined pattern is formed on the substrate.
<Color filter formation process>
Next, a set of three dots corresponding to R (Red), G (Green), and B (Blue) is arranged in a matrix, or a set of three stripe filters of R, G, and B A color filter arranged in a plurality of horizontal scanning line directions is formed.
<Cell assembly process>
Next, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern forming step, the color filter obtained in the color filter forming step, and the like. For example, liquid crystal is injected between a substrate having a predetermined pattern obtained in the pattern formation step and a color filter obtained in the color filter formation step to manufacture a liquid crystal panel (liquid crystal cell).
<Module assembly process>
Thereafter, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete the liquid crystal display element.

  In this case, since the plate is exposed with high throughput and high accuracy using the liquid crystal exposure apparatus according to each of the embodiments in the pattern forming step, as a result, the productivity of the liquid crystal display element can be improved. .

Claims (24)

A moving body device that moves a first moving body and a second moving body that can move relative to each other in a first direction by a first drive system ,
A support device arranged to be relatively movable with respect to the first moving body and the second moving body, and supporting the first moving body ;
Between the relative moving ranges, the terms first direction the first range first range smaller than the second range of the first moving body and the second moving body in the moving to the first direction A restriction device for restricting the switchable ,
The limiting device is a mobile device that is arranged on one side with respect to the support device with respect to the first direction and limits the movable range on the one side and the other side with respect to the first direction . The restriction device includes a first member that is provided on the first moving body so as to be relatively movable with respect to the second moving body, and a first member that faces one side of the first member with respect to the first direction. The mobile device according to claim 1, further comprising: a second member having a facing portion and a second facing portion facing the other side. The mobile device according to claim 2, wherein the restriction device includes a rotation mechanism that rotates the first member around a rotation axis located between the first facing portion and the second facing portion. Before Machinery guinea is movable body apparatus according to claim 3 which is an axis parallel to the vertical direction. Wherein the first member is movable body apparatus according to any one of claims 2-4 in which the distance from the rotation axis have different side portions to each other. The mobile device according to claim 5 , wherein the first member has an elliptical cross section orthogonal to the rotation axis. The restriction device, the mobile device according to any one of claims 1 to 6 are arranged at the same height as the height of the center of gravity position of the first movable body. The restriction device according to any one of 請 Motomeko 1-6 which is placed in parallel with the axis in the first direction passing through at least one of the center of gravity of said first moving body and the second movable body Mobile device. The restriction device any one of claims 1 to 8 wherein the or first during acceleration of the first moving body and the second movable body by the drive system for setting the movable range during deceleration in the second range The mobile device according to item. The restriction device in any one of claims 1 to 9 for setting the movable range constant velocity during movement of said first moving body and the second movable body by the first drive system to said first range The mobile device described. The first drive system includes a stator provided on the second moving body and a mover provided on the first moving body in a state where the movable range is set to the first range. 1 by providing a thrust to the second mobile body by using an electromagnetic actuator, the mobile device according to any one of claims 1 to 10 for moving the first movable body together with the second movable body. The first drive system is in a state in which the movable range is limited to the first range, the dynamic drive with respect to the first moving body and the second movable body with said and said stator armature The mobile device according to claim 11 . A measuring device for measuring an interval between the first and second moving bodies;
The restriction device switches the movable range from the first range to the second range after an interval between the first and second moving bodies is adjusted based on a measurement result of the measurement device . 13. The mobile device according to any one of 12 above. An exposure apparatus that exposes an object with an energy beam,
The moving body device according to any one of claims 1 to 13 , wherein the object is held by the first moving body ;
An exposure apparatus and a pattern generator for generating a pattern on the object by irradiating an energy beam on the object. The exposure apparatus according to claim 14 , wherein the object is a substrate having a size of 500 mm or more. The exposure apparatus according to claim 14 , wherein the object is a substrate used for manufacturing a flat panel display. Exposing the substrate using an exposure apparatus according to claim 16 ;
Method of manufacturing a flat panel display including and developing the exposed the substrate. Exposing the object using the exposure apparatus according to any one of claims 14 to 16 ,
Device manufacturing method comprising developing the exposed the object, the. An exposure method for forming a predetermined pattern on an object using an energy beam,
Holding the object on the first moving body of the moving body device that moves the first moving body and the second moving body that are movable relative to each other in the first direction by a first drive system ;
Supporting the first moving body using a support device arranged to be relatively movable with respect to the first moving body and the second moving body;
To the one side and the other side of the first moving body and the second moving body that are moving in the first direction by using a limiting device that is arranged on one side with respect to the first direction with respect to the support device . and that the relative movement range, to switchably limit between the first range and the first range smaller than the first range with respect to the first direction,
And moving the second moving body and the first moving body,
The exposure method comprising a method comprising forming an image of the pattern on the object held in the first moving body. In the limiting, the first member provided on the first moving body is divided into a first facing portion facing one side of the first member and a second facing portion facing the other side in the first direction. The exposure method according to claim 19, wherein the exposure is performed relative to the second member. In the limiting , the first member is rotated around a rotation axis by using a driving system included in the limiting device , and the movable range is switched between the first range and the second range. 21. The exposure method according to 20 . The exposure method according to any one of claims 19 to 21 , wherein the movable range is set to the second range when the second moving body is accelerated or decelerated. The exposure method according to any one of claims 19 to 22 , wherein the movable range is set to the first range when the second moving body is moved at a constant speed. Exposing the object by the exposure method according to any one of claims 19 to 23 ;
Device manufacturing method comprising developing the exposed the object, the.

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