JP5992515B2 - Manufacturing method of roll with pattern - Google Patents

Description

The present invention relates to a method for producing a patterned roll which has been subjected to patterning by DLC (diamond-like carbon).

  There is a roll for gravure printing as a roll with a pattern. In gravure printing, for a gravure printing roll (gravure cylinder), a micro concave portion (gravure cell) corresponding to the plate making information is formed to produce a plate surface, and the gravure cell is filled with ink and transferred to a printing material. is there. In a general gravure plate-making roll, a copper plating layer (plate material) for forming a plate surface is provided on the surface of a plate base material such as aluminum or iron, and a number of minute concave portions are formed on the copper plating layer according to plate making information by etching. (Gravure cell) is formed, and then a hard chromium layer is formed by chromium plating for increasing the printing durability of the gravure plate making roll to form a surface-enhanced coating layer, and plate making (plate surface production) is completed. The applicant of the present application has proposed, for example, a gravure printing roll described in Patent Document 1.

  Moreover, there exists an embossing roll for shaping | molding as a roll with a pattern. Embossing thermoplastic film to produce electronic parts such as prism sheet, lenticular sheet, Fresnel sheet, anti-reflection film used for LCD backlights and rear projection screens, and embossing metal plate For example, it is possible to improve the design and to provide an anti-slip function. The applicant of the present application has proposed an embossing roll described in Patent Document 2, for example.

  Moreover, there exists a roll for continuous plating as a roll with a pattern. The roll for continuous plating is used for a continuous plating apparatus. For example, a continuous plating is performed by continuously winding a strip-shaped workpiece such as a steel sheet wound around a reel through a plating bath. is there. As an example of the roll for continuous plating, there exist rolls, such as a sink roll disclosed by patent document 3 or patent document 4, for example.

  When manufacturing a roll with a pattern as described above, if a photosensitive material is applied to a substrate and exposed, developed, burned, and etched, there is a problem that over etching called so-called side etching occurs. As the patterning becomes finer, the problem of side etching becomes more obvious.

International Publication No. 2008/120789 JP 2009-72828 A JP 2006-283044 A JP 2001-89836 A JP 2009-093170 A

The present invention has been made in view of the problems of the prior art described above, to eliminate the side etching problem, and an object thereof is to provide a method of manufacturing a patterned roll having excellent chemical resistance, releasability .

To solve the above problems, with the pattern roll, a photosensitive material is applied to the surface of the substrate, to form a resist pattern caused to exposure and development, first DLC coating film on the surface of the substrate and the resist pattern The first DLC coating film formed on the resist pattern is peeled off together with the resist pattern to form a DLC pattern on the surface of the substrate, and the second DLC coating is formed on the surface of the substrate and the DLC pattern. It is characterized by forming a covering film.

  Thus, since the first DLC coating film formed on the resist pattern is peeled off together with the resist pattern, there is an advantage that the problem of side etching is solved. That is, in the present invention, since a technique called so-called lift-off is used instead of etching, the conventional side etching problem does not occur.

  Moreover, since the 2nd DLC coating film is formed in the surface of the said base material and a DLC pattern, there exists an advantage that it is excellent in chemical-resistance and also excellent in mold release property.

  The substrate to which the photosensitive material is applied is preferably made of at least one material selected from the group consisting of Ni, stainless steel, Ti, Cu, and Al.

  It is preferable that the base material includes a cushion layer made of rubber or a resin having cushioning properties. As the cushion layer, a synthetic rubber such as silicone rubber, or a synthetic resin having elasticity such as polyurethane or polystyrene can be used. The thickness of the cushion layer is not particularly limited as long as it is a thickness capable of imparting cushioning properties, that is, elasticity. For example, a thickness of about 1 mm to 10 cm is sufficient, and a thickness of 1 cm to 5 cm is sufficient. Is preferable. As an example of a gravure plate provided with a cushion layer made of rubber or a resin having cushioning properties, there is, for example, Patent Document 5.

  You may comprise so that the base material with which the said photosensitive material is apply | coated may consist of the material which has cushioning properties which consist of rubber | gum or resin which has cushioning properties. More specifically, a synthetic rubber such as silicon rubber, or an elastic synthetic resin such as polyurethane or polystyrene can be used as the base material.

  As the photosensitive material, either a positive photosensitive composition or a negative photosensitive composition is applicable, but a negative photosensitive composition is preferable.

  The first DLC coating film and the second DLC coating film preferably have a thickness of 0.1 μm to several tens of μm. More specifically, 0.1 μm to 20 μm is preferable, and 0.1 μm to 5 μm is more preferable.

  It is preferable that the roll with a pattern is a roll for gravure printing. This is because there is no problem of side etching, so that the concentration range can be expanded as compared with the conventional case.

This product is printed by the gravure roll.

  The patterned roll is preferably an embossing roll for molding.

This product is characterized by being molded by the molding embossing roll.

  It is preferable that the roll with a pattern is a roll for continuous plating.

This product is characterized by being plated by the roll for continuous plating.

  The method for producing a patterned roll of the present invention includes a step of preparing a substrate, a step of applying a photosensitive material to the surface of the substrate, exposing and developing the resist pattern, and forming the resist pattern. Forming a first DLC coating film on the surface of the substrate, peeling the first DLC coating film formed on the resist pattern together with the resist pattern, and forming a DLC pattern on the surface of the substrate, Forming a second DLC coating film on the surface of the substrate and the DLC pattern.

  The substrate to which the photosensitive material is applied is preferably made of at least one material selected from the group consisting of Ni, stainless steel, Ti, Cu, and Al.

  It is preferable that the base material includes a cushion layer made of the above-described rubber or a resin having cushioning properties.

  The base material to which the photosensitive material is applied may be made of a cushioning material made of rubber or a cushioning resin.

  As the photosensitive material, either a positive photosensitive composition or a negative photosensitive composition is applicable, but a negative photosensitive composition is preferable.

  The first DLC coating film and the second DLC coating film preferably have a thickness of 0.1 μm to several tens of μm.

ADVANTAGE OF THE INVENTION According to this invention, it has the remarkable effect that the problem of a side etching can be eliminated and the manufacturing method of the roll with a pattern excellent in chemical resistance and mold release property can be provided.

It is explanatory drawing which shows typically an example of the roll with a pattern manufactured by this invention method , (a) is principal part sectional drawing of the state which apply | coated the photosensitive material to the surface of the base material, (b) is exposure and image development FIG. 4C is a cross-sectional view of a main part in a state in which a resist pattern is formed, FIG. 5C is a cross-sectional view of the main part in a state in which a first DLC coating film is formed on the surface of the substrate and the resist pattern, and FIG. FIG. 4E is a cross-sectional view of a main part showing a state in which the first DLC coating film formed in FIG. 1 is peeled off together with the resist pattern, and FIG. FIG. It is a flowchart which shows the process order of the manufacturing method of the roll with a pattern shown in FIG. It is an enlarged photograph of the surface of the roll with a pattern concerning Example 1. FIG.

  Embodiments of the present invention will be described below, but these embodiments are exemplarily shown, and it goes without saying that various modifications can be made without departing from the technical idea of the present invention.

  In FIG. 1, the code | symbol 10 shows a roll with a pattern. The code | symbol 12 shows a base material and what consists of at least 1 type of material chosen from the group which consists of Ni, stainless steel, Ti, Cu, and Al can be used. Moreover, you may make it provide the cushion layer which consists of resin which has rubber | gum or cushioning properties. Furthermore, it can also comprise so that a base material may consist of the material which has cushioning properties which consist of rubber | gum or resin which has cushioning properties. The cushion layer is made of rubber or a resin having a cushioning property, and a sheet-like material having a uniform thickness of about 1 mm to 10 cm, preferably 1 cm to 5 cm and having high surface smoothness, does not open a gap at the seam. The substrate 12 is firmly bonded to the substrate 12, and then precision cylindrical grinding and mirror polishing are performed.

  First, the photosensitive material 14 is applied to the surface of the substrate 12 (step 100 in FIG. 1A and FIG. 2). The resist pattern 16 is formed by exposure and development (step 102 in FIG. 1B and FIG. 2). The photosensitive composition used as the photosensitive material can be either a negative type or a positive type, but it is preferable to use a negative photosensitive composition.

  Next, a first DLC coating film 18 is formed on the surface of the substrate 12 and the resist pattern 16 (step 104 in FIG. 1C and FIG. 2). The first DLC coating film may be formed by a CVD (Chemical Vapor Deposition) method or a sputtering method.

  Next, the first DLC coating film formed on the resist pattern is peeled off together with the resist pattern to form the DLC pattern 20 on the surface of the base material (step 106 in FIGS. 1D and 2).

  Next, a second DLC coating film 24 is formed on the surface of the substrate 12 and the DLC pattern 20 (step 108 in FIGS. 1E and 2). The second DLC coating film 24 may be formed by a CVD (Chemical Vapor Deposition) method or a sputtering method.

  The present invention will be described more specifically with reference to the following examples. However, it is needless to say that these examples are shown by way of illustration and should not be construed in a limited manner.

Example 1
A plate base material (aluminum hollow roll) having a circumference of 600 mm and a surface length of 1100 mm is prepared, and a copper plating layer and a nickel plating layer described below using a boomerang line (a fully automatic laser gravure plate making apparatus manufactured by Sink Laboratory Co., Ltd.) To the formation of. First, a plate base material (aluminum hollow roll) was mounted on a copper plating tank, and the hollow roll was completely immersed in a plating solution to form a copper plating layer of 80 μm at 20 A / dm ² and 6.0 V. The plating surface was free of bumps and pits, and a uniform copper plating layer was obtained. The surface of the copper plating layer was polished using a 4-head type polishing machine (Sink Laboratory Co., Ltd. polishing machine) to make the surface of the copper plating layer a uniform polishing surface. Next, it was mounted in a nickel plating tank and immersed in a plating solution to form a 3 μm nickel plating layer at ^{2 A} / dm ² and 7.0 V. The plating surface was free of bumps and pits, and a uniform nickel plating layer was obtained. Using the formed nickel plating layer as a base material, a photosensitive film (thermal resist: TSER-NS (manufactured by Sink Laboratories)) was applied to the surface (fountain coater) and dried. The film thickness of the obtained photosensitive film was 7 μm as measured by a film thickness meter (F20 manufactured by FILLMETRICS, sold by Matsushita Techno Trading). The image was then developed with laser exposure. In the laser exposure, a laser stream FX was used and a predetermined pattern exposure was performed under an exposure condition of 300 mJ / cm ² . The development was performed at 24 ° C. for 90 seconds at a developer dilution ratio (stock solution 1: water 7) using a TLD developer (Sink Laboratory Co., Ltd. developer) to form a predetermined resist pattern.

  A first DLC coating film was formed on the surface of the nickel plating layer and the resist pattern by a CVD method. An intermediate layer having a film thickness of 0.1 μm was formed in an argon / hydrogen gas atmosphere, hexamethyldisiloxane as a source gas, a film formation temperature of 80 to 120 ° C., and a film formation time of 60 minutes. Next, a first DLC coating film having a film thickness of 5 μm was formed on the source gas using toluene, a film formation temperature of 80 to 120 ° C., and a film formation time of 180 minutes.

  Next, the hollow roll was sonicated in an aqueous sodium hydroxide solution for 30 minutes. And the 1st DLC coating film formed on this resist pattern was peeled with this resist pattern, and the DLC pattern was formed in the surface of a base material.

  Further, a second DLC coating film was formed on the surface of the nickel plating layer and the DLC pattern by a CVD method. An intermediate layer having a film thickness of 0.1 μm was formed in an argon / hydrogen gas atmosphere, hexamethyldisiloxane as a source gas, a film formation temperature of 80 to 120 ° C., and a film formation time of 60 minutes. Next, a second DLC coating film having a thickness of 5 μm was formed on the source gas with toluene, a film formation temperature of 80 to 120 ° C., and a film formation time of 180 minutes. In this way, a roll for gravure printing was obtained.

  When the surface of this gravure printing roll was observed with an optical microscope, a high-definition gravure plate shown in FIG. 3 was observed. In FIG. 3, the line width of the DLC pattern 20 on which the second DLC coating film 24 is formed is 10 μm, and the gravure cell 22 has a side of 145 μm. The depth of the gravure cell 22 was 5.1 μm.

(Example 2)
An embossing roll for molding was obtained in the same manner as in Example 1 except that the patterning shape was changed. When the obtained embossing roll for molding was observed with an optical microscope, a high-definition DLC pattern was observed. The line width of the DLC pattern 20 on which the second DLC coating film 24 was formed was 30 μm.

(Example 3)
A roll for continuous plating was obtained in the same manner as in Example 1 except that the patterning shape was changed. When the obtained roll for continuous plating was observed with an electron microscope, a high-definition DLC pattern was observed. The line width of the DLC pattern 20 on which the second DLC coating film 24 was formed was 8 μm.

Example 4
A gravure printing roll was obtained in the same manner as in Example 1 except that the base material on the surface on which the resist pattern was formed was stainless steel. When the obtained gravure printing roll was observed with an electron microscope, a high-definition DLC pattern on which the second DLC coating film was formed was observed.

(Example 5)
A gravure printing roll was obtained in the same manner as in Example 1 except that the substrate on the surface of resist pattern formation was titanium. When the obtained gravure printing roll was observed with an electron microscope, a high-definition DLC pattern on which the second DLC coating film was formed was observed.

  A patterned roll was produced in the same manner as in Examples 1 to 3 except that a roll in which a nickel sleeve having a thickness of 0.4 mm was fitted on silicon rubber was used as the base material. When the obtained roll with a pattern was observed with the electron microscope, the high-definition DLC pattern in which the 2nd DLC coating film was formed was observed.

  A patterned roll was produced in the same manner as in Example 1 except that a roll using silicon rubber was used as the substrate. When the obtained roll with a pattern was observed with the electron microscope, the high-definition DLC pattern in which the 2nd DLC coating film was formed was observed.

  10: roll with pattern, 12: substrate, 14: photosensitive material, 16: resist pattern, 18: first DLC coating film, 20: DLC pattern, 22: gravure cell, 24: second DLC coating film.

Claims (6)

  A step of preparing a substrate, a step of applying a photosensitive material on the surface of the substrate, exposing and developing to form a resist pattern, and forming a first DLC coating film on the surfaces of the substrate and the resist pattern A step of peeling the first DLC coating film formed on the resist pattern together with the resist pattern to form a DLC pattern on the surface of the substrate, and a second on the surfaces of the substrate and the DLC pattern. And a step of forming a DLC coating film. The substrate on which the photosensitive material is applied is, Ni, stainless steel, Ti, Cu, method for producing a patterned roll according to claim 1, characterized in that it consists of at least one material selected from the group consisting of Al . The said base material is provided with the cushion layer which consists of resin which has rubber | gum or cushioning properties, The manufacturing method of the roll with a pattern of Claim 1 or 2 characterized by the above-mentioned. The substrate on which the photosensitive material is applied is, rubber or the production method of the patterned roll according to claim 1, characterized in that it consists of a material having a cushioning made of a resin having cushioning property. The method for producing a patterned roll according to any one of claims 1 to 4 , wherein the photosensitive material is a negative photosensitive composition. The thickness of the first DLC coating film and the second DLC coating film, according to claim 1 to 5, the production method of the patterned roll of any one of claims, characterized in that the 0.1Myuemu～20myuemu.