JP5965687B2 - パワー半導体モジュール - Google Patents
パワー半導体モジュール Download PDFInfo
- Publication number
- JP5965687B2 JP5965687B2 JP2012066501A JP2012066501A JP5965687B2 JP 5965687 B2 JP5965687 B2 JP 5965687B2 JP 2012066501 A JP2012066501 A JP 2012066501A JP 2012066501 A JP2012066501 A JP 2012066501A JP 5965687 B2 JP5965687 B2 JP 5965687B2
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- JP
- Japan
- Prior art keywords
- power semiconductor
- lead
- semiconductor module
- insulating substrate
- metal foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 title claims description 143
- 229910052751 metal Inorganic materials 0.000 claims description 100
- 239000002184 metal Substances 0.000 claims description 100
- 239000000758 substrate Substances 0.000 claims description 64
- 229910000679 solder Inorganic materials 0.000 claims description 51
- 239000011888 foil Substances 0.000 claims description 34
- 230000017525 heat dissipation Effects 0.000 claims description 18
- 239000012530 fluid Substances 0.000 claims description 14
- 238000005304 joining Methods 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 description 49
- 239000010949 copper Substances 0.000 description 23
- 229910052802 copper Inorganic materials 0.000 description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 20
- 229910052782 aluminium Inorganic materials 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 15
- 239000000463 material Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000002826 coolant Substances 0.000 description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 229910052750 molybdenum Inorganic materials 0.000 description 5
- 239000011733 molybdenum Substances 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005219 brazing Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000962 AlSiC Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- Engineering & Computer Science (AREA)
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Description
2 第1のはんだ
3 絶縁基板
4〜6 配線パターン
7 金属箔
8 第2のはんだ
9 放熱ベース板
10 アルミワイヤ
11 ケース
12 封止材
13 第3のはんだ
14 熱拡散金属板
15 リード
Claims (13)
- 両側に金属箔を固着させた絶縁基板の一方の金属箔に半導体チップの一方の電極を接合し、前記絶縁基板上の他方の金属箔を放熱ベースに接合したパワー半導体モジュールにおいて、
前記半導体チップの他方の電極に金属板を接合し、前記金属板に導電リードの一端を接合し、前記導電リードの他端を絶縁基板上の金属箔に接合し、前記導電リードの前記金属板との接合部および前記導電リードの前記絶縁基板上の金属箔との接合部を他の部分よりも薄くした
ことを特徴とするパワー半導体モジュール。 - 請求項1記載のパワー半導体モジュールにおいて、
前記金属板と前記導電リードとの接合、並びに前記絶縁基板上の前記金属箔と前記導電リードとの接合が、超音波接合により行われる
ことを特徴とするパワー半導体モジュール。 - 請求項1記載のパワー半導体モジュールにおいて、
前記金属板と前記導電リードとの接合、並びに前記絶縁基板上の前記金属箔と前記導電リードとの接合が、はんだ接合により行われる
ことを特徴とするパワー半導体モジュール。 - 両側に金属箔を固着させた絶縁基板の一方の金属箔に半導体チップの一方の電極を接合し、前記絶縁基板上の他方の金属箔を放熱ベースに接合したパワー半導体モジュールにおいて、
前記半導体チップの他方の電極に金属板と導電リードが一体化したリード付金属板を接合し、前記リード付金属板の他端を絶縁基板上の金属箔に接合し、前記リード付金属板と前記絶縁基板上の金属箔との接合部を前記リード付金属板の他の部分よりも薄くした
ことを特徴とするパワー半導体モジュール。 - 請求項4記載のパワー半導体モジュールにおいて、
前記リード付金属板は、前記半導体チップの前記他方の電極とはんだ接合され、前記絶縁基板上の前記金属箔と超音波接合される
ことを特徴とするパワー半導体モジュール。 - 請求項4記載のパワー半導体モジュールにおいて、
前記リード付金属板は、前記半導体チップの前記他方の電極および前記絶縁基板上の前記金属箔と、それぞれはんだ接合される
ことを特徴とするパワー半導体モジュール。 - 両側に金属箔を固着させた絶縁基板の一方の金属箔に半導体チップの一方の電極を接合し、前記絶縁基板上の他方の金属箔を放熱ベースに接合したパワー半導体モジュールにおいて、
前記半導体チップの他方の電極に導電リードの一端を接合し、前記導電リードの他端を絶縁基板上の金属箔に接合し、前記導電リードの前記半導体チップとの接合部および前記導電リードの絶縁基板上の金属箔との接合部を他の部分よりも薄くした
ことを特徴とするパワー半導体モジュール。 - 請求項7記載のパワー半導体モジュールにおいて、
前記半導体チップの前記他方の電極に前記導電リードの前記一端が超音波接合され、前記導電リードの前記他端が前記絶縁基板上の前記金属箔に超音波接合される
ことを特徴とするパワー半導体モジュール。 - 請求項7記載のパワー半導体モジュールにおいて、
前記半導体チップの前記他方の電極に前記導電リードの前記一端がはんだ接合され、前記導電リードの前記他端が前記絶縁基板上の前記金属箔にはんだ接合される
ことを特徴とするパワー半導体モジュール。 - 請求項1乃至3記載のパワー半導体モジュールにおいて、
前記導電リードの中央部分の他よりも厚い部分の内部に中空部を設け、前記中空部に作動流体を封入してヒートパイプを構成した
ことを特徴とするパワー半導体モジュール。 - 請求項4乃至6記載のパワー半導体モジュールにおいて、
前記リード付金属板の内部に中空部を設け、前記中空部に作動流体を封入してヒートパイプを構成した
ことを特徴とするパワー半導体モジュール。 - 請求項6記載のパワー半導体モジュールにおいて、
前記リード付金属板の金属板部分、リードの中央部分および基板との取付部分に跨ってリード付金属板の内部に中空部を設け、前記中空部に作動流体を封入してヒートパイプを構成した
ことを特徴とするパワー半導体モジュール。 - 請求項7乃至9記載のパワー半導体モジュールにおいて、
前記導体リードの中央部分の他よりも厚い部分の内部に中空部を設け、前記中空部に作動流体を封入してヒートパイプを構成した
ことを特徴とするパワー半導体モジュール。
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