JP5942563B2 - Method for producing polymer, method for producing resist composition, and method for producing substrate on which pattern is formed - Google Patents

Description

  The present invention relates to a method for producing a polymer, a method for producing a resist composition using a polymer obtained by the production method, and a method for producing a substrate on which a pattern is formed using the resist composition.

In recent years, a resist pattern formed in a manufacturing process of a semiconductor element, a liquid crystal element, or the like has been rapidly miniaturized due to advances in semiconductor lithography technology. As a technique for miniaturization, there is a reduction in wavelength of irradiation light. Specifically, the irradiation light has become shorter in wavelength from ultraviolet rays typified by conventional g-line (wavelength: 438 nm) and i-line (wavelength: 365 nm) to a shorter wavelength DUV (Deep Ultra Violet). .
Recently, KrF excimer laser (wavelength: 248 nm) lithography technology has been introduced, and ArF excimer laser (wavelength: 193 nm) lithography technology and EUV (wavelength: 13.5 nm) lithography technology for further shortening the wavelength have been studied. . Furthermore, these immersion lithography techniques are also being studied. Also, as a different type of lithography technology, electron beam lithography technology has been energetically studied.

A “chemically amplified resist composition” containing a photoacid generator has been proposed as a highly sensitive resist composition used for forming a resist pattern using the irradiation light or electron beam of the short wavelength. Improvement and development of the amplified resist composition are underway.
For example, as a chemically amplified resist polymer used in ArF excimer laser lithography, an acrylic polymer that is transparent with respect to light having a wavelength of 193 nm has attracted attention. As the acrylic polymer, for example, a polymer of (meth) acrylic acid ester having an adamantane skeleton in an ester portion and (meth) acrylic acid ester having a lactone skeleton in an ester portion has been proposed (Patent Document 1). etc).

With the miniaturization of resist patterns, demands for quality of polymers for semiconductor lithography have become stricter. For example, variations between production lots of polymers for semiconductor lithography may cause minute defects during development, which may cause defects in device design.
Patent Document 2 listed below describes a method of synthesizing a resin having an acid-dissociable group using a living radical polymerization initiator as a method for reducing fluctuations in molecular weight distribution due to lot differences.

In Patent Document 3 below, in order to reduce the fluctuation range of the polymerization temperature (reaction temperature) in the drop polymerization, when the photoresist resin is produced on a scale of 10 kg or more per batch, the polymerization solvent in the polymerization vessel is previously stored. Is set to 1 to 5 ° C. higher than the polymerization temperature, and when the dropping of the monomer and the polymerization initiator is started, the temperature of the polymerization vessel is lowered to the predetermined polymerization temperature as the liquid temperature decreases. A method of gradually lowering is described.
Patent Document 4 listed below describes a method in which the temperature of the heating medium supplied to the outer can of the polymerization tank is set to the polymerization temperature + 10 ° C. or less in order to prevent the formation of microgel in the drop polymerization.

JP 10-319595 A JP 2009-175746 A JP 2006-176573 A JP 2008-163319 A

However, in recent years, the demand for reducing the lot-to-lot variation of resist polymers has become increasingly severe, and conventional methods are not necessarily sufficient.
The present invention has been made in view of the above circumstances, and a method for producing a polymer capable of further reducing variation between polymer lots, a method for producing a resist composition using the production method, and the resist composition An object of the present invention is to provide a method for manufacturing a substrate on which a pattern is formed, using the method for manufacturing an object.

The method for producing a polymer of the present invention comprises a polymerization step in which a monomer is polymerized in a reaction solution containing a polymerization solvent, a monomer and a polymerization initiator in a reaction vessel, and a reaction termination in which the polymerization reaction is stopped. A monomer supply step of supplying a monomer continuously or dropwise into the reaction vessel within a polymerization reaction period from the start of the polymerization reaction to the start of a stop operation. And the temperature of the reaction solution during the monomer supply period from the start to the end of the monomer supply step is within the range of the average temperature of the reaction solution during the monomer supply period ± 1.0 ° C. The total mass of monomers supplied into the reactor is less than 30% by mass with respect to the mass of the reaction liquid at the end of the polymerization reaction period, and the monomer supply period Is not less than 80% and not more than 90% of the polymerization reaction period The

It is preferable that at least a portion of the inner surface of the reaction vessel that comes into contact with the reaction solution is made of stainless steel.
The present invention provides a resist composition comprising a step of producing a resist polymer by the production method of the present invention, and a step of mixing the obtained resist polymer and a compound that generates an acid upon irradiation with actinic rays or radiation. A manufacturing method is provided.
The present invention includes a step of producing a resist composition by the production method of the present invention, a step of coating the obtained resist composition on a work surface of a substrate to form a resist film, and the resist film There are provided a method for producing a substrate having a pattern, the method comprising: exposing the exposed resist film and developing the exposed resist film using a developer.

According to the present invention, a polymer having a small lot-to-lot variation can be obtained.
A resist composition using a polymer obtained by the method for producing a polymer of the present invention is excellent in stability of performance because the lot-to-lot variation of the polymer is small.
According to the substrate manufacturing method of the present invention, a highly accurate fine pattern can be stably formed.

In the present specification, “(meth) acrylic acid” means acrylic acid or methacrylic acid, and “(meth) acryloyloxy” means acryloyloxy or methacryloyloxy.
<Polymer>
The polymer in the present invention is not particularly limited, but is preferably a polymer for semiconductor lithography in which lot-to-lot variation is likely to be a problem. Further, among the polymers for semiconductor lithography, it is particularly preferable to be a resist polymer that has a strict demand for reduction in lot-to-lot variation.
The polymer for semiconductor lithography preferably has a structural unit (a) having a polar group, and the resist polymer has a structural unit (b) having an acid leaving group in addition to the structural unit (a). It is preferable to have.
The weight average molecular weight of the polymer for semiconductor lithography is not particularly limited, but generally 1,000 to 100,000 is preferable, and 3,000 to 50,000 is more preferable.

[Structural unit (a)]
The polymer in the present invention preferably has a structural unit (a) having a polar group.
The “polar group” is a group having a polar functional group or a polar atomic group. Specific examples include a hydroxy group, a cyano group, an alkoxy group, a carboxy group, an amino group, a carbonyl group, and a fluorine atom. A group containing a sulfur atom, a group containing a lactone skeleton, a group containing an acetal structure, a group containing an ether bond, and the like.
Among these, the resist polymer used in the resist composition in the pattern forming method of exposing with light having a wavelength of 250 nm or less preferably has a structural unit having a lactone skeleton as the structural unit having a polar group. It is preferable to have a structural unit having a hydrophilic group described later.

(Constitutional unit / monomer having a lactone skeleton)
Examples of the lactone skeleton include a lactone skeleton having about 4 to 20 members. The lactone skeleton may be a monocycle having only a lactone ring, or an aliphatic or aromatic carbon ring or a heterocyclic ring may be condensed with the lactone ring.
In the case where the polymer contains a structural unit having a lactone skeleton, the content thereof is preferably 20 mol% or more, more preferably 25 mol% or more of all structural units (100 mol%) from the viewpoint of adhesion to a substrate or the like. Is more preferable. Moreover, from the point of a sensitivity and resolution, 60 mol% or less is preferable, 55 mol% or less is more preferable, and 50 mol% or less is more preferable.

  As a monomer having a lactone skeleton, a (meth) acrylic acid ester having a substituted or unsubstituted δ-valerolactone ring, a substituted or unsubstituted γ-butyrolactone ring is used because of its excellent adhesion to a substrate or the like. Preferably, at least one selected from the group consisting of monomers having it is preferred, and monomers having an unsubstituted γ-butyrolactone ring are particularly preferred.

Specific examples of the monomer having a lactone skeleton include β- (meth) acryloyloxy-β-methyl-δ-valerolactone, 4,4-dimethyl-2-methylene-γ-butyrolactone, β- (meth) acryloyl. Oxy-γ-butyrolactone, β- (meth) acryloyloxy-β-methyl-γ-butyrolactone, α- (meth) acryloyloxy-γ-butyrolactone, 2- (1- (meth) acryloyloxy) ethyl-4-butanolide , (Meth) acrylic acid pantoyl lactone, 5- (meth) acryloyloxy-2,6-norbornanecarbolactone, 8-methacryloxy-4-oxatricyclo [5.2.1.0 ^2,6 ] decane-3 - one, 9-methacryloxy-4-oxatricyclo [5.2.1.0 ^{2, 6]} cited decan-3-one and the like . Examples of the monomer having a similar structure include methacryloyloxysuccinic anhydride.
Monomers having a lactone skeleton may be used alone or in combination of two or more.

(Structural unit / monomer having a hydrophilic group)
The “hydrophilic group” in the present specification is at least one of —C (CF ₃ ) ₂ —OH, hydroxy group, cyano group, methoxy group, carboxy group, and amino group.
Among these, it is preferable that the resist polymer used for the resist composition in the pattern forming method in which exposure is performed with light having a wavelength of 250 nm or less has a hydroxy group or a cyano group as a hydrophilic group.
The content of the structural unit having a hydrophilic group in the polymer is preferably from 5 to 30 mol%, more preferably from 10 to 25 mol%, of the total structural units (100 mol%) from the viewpoint of the resist pattern rectangularity. .

  Examples of the monomer having a hydrophilic group include a (meth) acrylic acid ester having a terminal hydroxy group; a derivative having a substituent such as an alkyl group, a hydroxy group, or a carboxy group on the hydrophilic group of the monomer; Monomers having a cyclic hydrocarbon group (for example, cyclohexyl (meth) acrylate, 1-isobornyl (meth) acrylate, adamantyl (meth) acrylate, tricyclodecanyl (meth) acrylate, (meth) acrylic acid) Dicyclopentyl, 2-methyl-2-adamantyl (meth) acrylate, 2-ethyl-2-adamantyl (meth) acrylate, etc.) having a hydrophilic group such as a hydroxy group or a carboxy group as a substituent; Can be mentioned.

Specific examples of the monomer having a hydrophilic group include (meth) acrylic acid, 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2-hydroxy- (meth) acrylate. -Propyl, 4-hydroxybutyl (meth) acrylate, 3-hydroxyadamantyl (meth) acrylate, 2- or 3-cyano-5-norbornyl (meth) acrylate, 2-cyanomethyl-2-adamantyl (meth) acrylate, etc. Is mentioned. From the viewpoint of adhesiveness to a substrate or the like, 3-hydroxyadamantyl (meth) acrylate, 2- or 3-cyano-5-norbornyl (meth) acrylate, 2-cyanomethyl-2-adamantyl (meth) acrylate, and the like are preferable.
The monomer which has a hydrophilic group may be used individually by 1 type, and may be used in combination of 2 or more type.

[Structural unit (b)]
The polymer in the present invention preferably has a structural unit (b) having an acid-eliminable group in addition to the above-mentioned structural unit (a) having a polar group when used for resist applications. Accordingly, it may have a known structural unit.
The “acid leaving group” is a group having a bond that is cleaved by an acid, and a part or all of the acid leaving group is removed from the main chain of the polymer by cleavage of the bond.
In the resist composition, a polymer having a structural unit having an acid-eliminable group reacts with an acid component to become soluble in an alkaline solution, and has an effect of enabling formation of a resist pattern.
The proportion of the structural unit having an acid leaving group is preferably 20 mol% or more, more preferably 25 mol% or more, of all the structural units (100 mol%) constituting the polymer from the viewpoint of sensitivity and resolution. . Moreover, 60 mol% or less is preferable from the point of the adhesiveness to a board | substrate etc., 55 mol% or less is more preferable, and 50 mol% or less is further more preferable.

The monomer having an acid leaving group may be a compound having an acid leaving group and a polymerizable multiple bond, and known ones can be used. The polymerizable multiple bond is a multiple bond that is cleaved during the polymerization reaction to form a copolymer chain, and an ethylenic double bond is preferable.
Specific examples of the monomer having an acid leaving group include (meth) acrylic acid esters having an alicyclic hydrocarbon group having 6 to 20 carbon atoms and having an acid leaving group. It is done. The alicyclic hydrocarbon group may be directly bonded to an oxygen atom constituting an ester bond of (meth) acrylic acid ester, or may be bonded via a linking group such as an alkylene group.
The (meth) acrylic acid ester has an alicyclic hydrocarbon group having 6 to 20 carbon atoms, and a tertiary carbon atom at the bonding site with the oxygen atom constituting the ester bond of the (meth) acrylic acid ester. A (meth) acrylic acid ester having an alicyclic hydrocarbon group or an alicyclic hydrocarbon group having 6 to 20 carbon atoms and a -COOR group (R may have a substituent) on the alicyclic hydrocarbon group. (Represents a tertiary hydrocarbon group, a tetrahydrofuranyl group, a tetrahydropyranyl group, or an oxepanyl group.) (Meth) acrylic acid ester bonded directly or through a linking group.

In particular, in the case of producing a resist polymer used in a resist composition applied to a pattern forming method that is exposed to light having a wavelength of 250 nm or less, as a preferred example of a monomer having an acid leaving group, for example, 2-methyl-2-adamantyl (meth) acrylate, 2-ethyl-2-adamantyl (meth) acrylate, 1- (1′-adamantyl) -1-methylethyl (meth) acrylate, 1-methylcyclohexyl (meth) Examples include acrylate, 1-ethylcyclohexyl (meth) acrylate, 1-methylcyclopentyl (meth) acrylate, 1-ethylcyclopentyl (meth) acrylate, isopropyl adamantyl (meth) acrylate, 1-ethylcyclooctyl (meth) acrylate, and the like.
As the monomer having an acid leaving group, one type may be used alone, or two or more types may be used in combination.

<Method for producing polymer>
The method for producing a polymer of the present invention comprises a polymerization step in which a polymerization solvent, a monomer and a polymerization initiator are supplied into a reaction vessel and the monomer is polymerized in a liquid (reaction solution) in the reaction vessel. And a reaction stopping step for stopping the polymerization reaction.
In the present invention, the period from the start of the polymerization reaction to the start of the operation for stopping the polymerization reaction (stopping operation) is referred to as the polymerization reaction period.
The polymerization step in the present invention is a solution polymerization method in which a monomer is radically polymerized using a polymerization initiator in the presence of a polymerization solvent.

Examples of the polymerization solvent include the following.
Ethers: chain ether (diethyl ether, propylene glycol monomethyl ether (hereinafter referred to as “PGME”), etc.), cyclic ether (tetrahydrofuran (hereinafter referred to as “THF”), 1,4-dioxane, etc. )etc.
Esters: methyl acetate, ethyl acetate, butyl acetate, ethyl lactate, butyl lactate, propylene glycol monomethyl ether acetate (hereinafter referred to as “PGMEA”), γ-butyrolactone, and the like.
Ketones: acetone, methyl ethyl ketone (hereinafter referred to as “MEK”), methyl isobutyl ketone (hereinafter referred to as “MIBK”), and the like.
Amides: N, N-dimethylacetamide, N, N-dimethylformamide and the like.
Sulfoxides: dimethyl sulfoxide and the like.
Aromatic hydrocarbons: benzene, toluene, xylene and the like.
Aliphatic hydrocarbon: hexane and the like.
Alicyclic hydrocarbons: cyclohexane and the like.
A polymerization solvent may be used individually by 1 type, and may use 2 or more types together.

  As the polymerization initiator, those that generate radicals efficiently by heat are preferable. Examples of the polymerization initiator include azo compounds (2,2′-azobisisobutyronitrile, dimethyl-2,2′-azobisisobutyrate, 2,2′-azobis [2- (2-imidazoline). -2-yl) propane], etc.), organic peroxides (2,5-dimethyl-2,5-bis (tert-butylperoxy) hexane, di (4-tert-butylcyclohexyl) peroxydicarbonate, etc. Etc.).

In the present invention, the total mass of the monomers supplied into the reactor is less than 30% by mass with respect to the mass of the reaction liquid in the reaction vessel at the end of the polymerization reaction period. Specifically, of all the raw materials (including at least the polymerization solvent, the monomer, and the polymerization initiator) supplied to the reaction vessel, the polymerization solvent is adjusted so that the total amount of monomers is less than 30% by mass. Set usage.
When the ratio of the total amount of monomers supplied to the reaction liquid with respect to the reaction liquid at the end of the polymerization reaction period is less than 30% by mass, Variation in molecular weight between lots can be effectively reduced. In order to further reduce the variation in molecular weight between the lots, the total proportion of the monomers is preferably 25% by mass or less, and more preferably 24.5% by mass or less. The lower limit of the total ratio of the monomers is not particularly limited, but is preferably 5% by mass or more and more preferably 10% by mass or more from the viewpoint of production efficiency.
Further, during the polymerization reaction period, it is preferable that the total mass of the monomers supplied to the reactor so far is less than 30% by mass with respect to the mass of the reaction liquid in the reaction vessel.

In the polymerization step, it is preferable to supply at least a part of the polymerization solvent and / or a part of the monomer in advance into the reaction vessel before the start of the polymerization reaction.
It is preferable that a part of the polymerization solvent is supplied into the reaction vessel before the start of the polymerization reaction, and the rest is supplied into the reaction vessel after the start of the polymerization reaction.
Before starting the polymerization reaction, a part of all monomers used for the polymerization reaction may be supplied into the reaction vessel, and the remainder may be supplied into the reaction vessel after the start of the polymerization reaction. All monomers may be fed into the reaction vessel.

When the polymerization solvent is supplied in advance into the reaction vessel, it is preferable to heat the polymerization solvent to a preset polymerization temperature before the start of the polymerization reaction. If a monomer and a polymerization initiator are supplied here, a polymerization reaction will start. In this case, the time when both the monomer and the polymerization initiator are supplied into the reaction vessel is the start time of the polymerization reaction period.
When the polymerization solvent and the monomer are supplied into the reaction vessel in advance, it is preferable to heat the liquid in the reaction vessel to a preset polymerization temperature. When a polymerization initiator is supplied here, a polymerization reaction starts. In this case, the time when the polymerization initiator is supplied into the reaction vessel is the start time of the polymerization reaction period.
The method of supplying the polymerization initiator into the reaction vessel may be a method of supplying continuously or a method of supplying by dropping. The method of supplying by dropping is more preferable in that the variation in average molecular weight, molecular weight distribution, and the like due to differences in production lots can be easily reduced.

  The polymerization reaction period is from the start of the polymerization reaction (from the time when the polymerization initiator is supplied) to the time when the polymerization reaction is stopped. The operation for stopping the polymerization reaction means an operation for stopping the radical polymerization reaction or causing a decrease in the growth reaction rate. An operation for supplying the inhibitor into the reaction vessel can be mentioned.

The present invention has a monomer supply step of supplying the monomer continuously or dropwise into the reaction vessel within the polymerization reaction period. In the monomer supply step, the polymerization reaction is performed while supplying the monomer into the reaction vessel in the presence of the polymerization solvent and the polymerization initiator. The drop polymerization method in which the monomer is dropped into the reaction vessel by dropping is more preferable in that the dispersion of the average molecular weight, the molecular weight distribution, etc. due to the difference in the production lot is easily reduced.
In the dropping polymerization method, the monomer may be dropped only with the monomer or may be dropped as a monomer solution in which the monomer is dissolved in the polymerization solvent.
When supplying the polymerization initiator by dropping, it may be directly dissolved in the monomer and dropped, or it may be dropped in the monomer solution, or only dissolved in the polymerization solvent and dropped. Good.
After the monomer and the polymerization initiator are mixed in the same storage tank, they may be dropped into the reaction vessel; they may be dropped from the independent storage tank into the reaction vessel; respectively, from the independent storage tank to the reaction vessel. They may be mixed immediately before feeding and dropped into the reaction vessel.
One of the monomer and the polymerization initiator may be dropped first, and then the other may be dropped with a delay, or both may be dropped at the same timing.
The dropping speed may be constant until the dropping is completed, or may be changed in multiple stages according to the consumption speed of the monomer or the polymerization initiator.
The dripping may be performed continuously or intermittently.

The start time of the monomer supply step is the time when the monomer is first supplied into the reaction vessel after the start time of the polymerization reaction period. The end point of the monomer supply step is the time point when all the monomers used for the polymerization reaction have been supplied into the reaction vessel.
The polymerization reaction may be stopped immediately after supplying all the monomers in the reaction vessel, but after supplying all the monomers in the reaction vessel, the reaction solution in the reaction vessel is set in advance by polymerization. It is preferable to carry out an aging step in which the polymerization reaction proceeds while maintaining the temperature.
In the present invention, the monomer supply period is 70% or more of the polymerization reaction period. By supplying the monomer over 70% or more of the polymerization reaction period, the lot-to-lot variation in the molecular weight of the resulting polymer can be effectively suppressed. The monomer supply period is more preferably 75% or more, and more preferably 80% or more of the polymerization reaction period, in that molecular weight variation among the lots is more easily suppressed. The ratio of the monomer supply period to the polymerization reaction period may be 100%, but is preferably 95% or less, more preferably 90% or less in that the monomer reaction rate increases and good productivity is easily obtained. preferable.
If the polymerization reaction period is too short, the polymerization reaction becomes insufficient, and a large amount of unreacted monomer remains. If the polymerization reaction period is too long, the production efficiency deteriorates. Therefore, the polymerization reaction period can be set in consideration of these points. The polymerization reaction period is preferably 3 to 15 hours, and more preferably 4 to 12 hours, although it depends on the composition and production amount of the polymer produced by the polymerization reaction.

The polymerization temperature set in advance in the polymerization reaction is determined according to the decomposition temperature of the polymerization initiator. The polymerization temperature in the case of using a radical polymerization initiator is generally in the range of 50 to 150 ° C.
In the present invention, the reaction is carried out so that the temperature of the reaction liquid in the reaction vessel during the monomer supply period is maintained within the range of the average temperature of the reaction liquid ± 1.5 ° C. during the monomer supply period. Reduce liquid temperature fluctuations. By setting the temperature fluctuation of the reaction solution within the above range, it is possible to effectively suppress the lot-to-lot variation in the molecular weight of the obtained polymer. The average temperature of the reaction solution is preferably maintained within a range of ± 1.2 ° C., and the average temperature of the reaction solution is preferably maintained within a range of ± 1.0 ° C.
The average temperature of the reaction liquid during the monomer supply period does not necessarily coincide with a preset polymerization temperature, but is preferably close to the polymerization temperature. Specifically, the average temperature is preferably within the range of the polymerization temperature ± 1.2 ° C.

The temperature of the reaction solution is measured and acquired at the start of the monomer supply period and thereafter every time a predetermined interval time elapses. Then, every 4 minutes from the start of the monomer supply period, an average value of the temperature data of the reaction liquid obtained during the 4 minutes is obtained, and the average value is a representative value for evaluating temperature fluctuations. And The interval time for acquiring (measuring) the temperature data of the reaction solution is within 1 minute, and preferably 15 seconds to 1 minute.
For example, when the interval time is 1 minute, the temperature of the reaction solution is measured every minute from the start of the reaction, and 4 points of temperature data of 1 minute, 2 minutes, 3 minutes, and 4 minutes after the start of the reaction are measured. The average value is set as the representative value x1 for 4 minutes. Further, the average value of the temperature data at 4 points after 5 minutes, 6 minutes, 7 minutes, and 8 minutes is set as the representative value x2 for the 4 minutes. Thereafter, the representative values x3, x4,... Are similarly obtained until the end of the monomer supply period, and the average value of all the representative values x1, x2, x3, x4,. Let X be. If all the representative values x1, x2,... Are within a range from a temperature 1.5 ° C. lower than the average temperature X to a temperature 1.5 ° C. higher than the average temperature X, The temperature of the reaction liquid during the body supply period is within the range of the average temperature of the reaction liquid ± 1.5 ° C. during the monomer supply period ”.

  For example, when the interval time for acquiring temperature data is 30 seconds, the temperature of the reaction solution is measured every 30 seconds from the start of the reaction, and 0.5 minutes, 1 minute, 1.5 minutes, 2 minutes from the start of the reaction. The average value of the temperature data of 8 points after minutes, 2.5 minutes, 3 minutes, 3.5 minutes, and 4 minutes is taken as the representative value x1 for the 4 minutes. In addition, the average value of the temperature data of 8 points after 4.5 minutes, 5.5 minutes, 5.5 minutes, 6 minutes, 6.5 minutes, 7 minutes, 7.5 minutes, and 8 minutes is the representative for the 4 minutes. Value x2. Thereafter, the representative values x3, x4,... Are similarly obtained until the end of the monomer supply period, and the average value of all the representative values x1, x2, x3, x4,. Let X be.

  In the present invention, it is preferable to improve the uniformity of the polymerization reaction by stirring the reaction solution in the reaction vessel during the polymerization reaction step. Moreover, it is preferable to use a pressure-resistant metal reaction vessel in that the pressure in the reaction vessel can be controlled and the reaction temperature can be easily controlled with excellent thermal conductivity. As the metal, stainless steel (hereinafter also referred to as SUS) is preferable because it has high corrosion resistance and can easily reduce the mixing of metal impurities into the polymer. Of the inner surface of the reaction vessel, at least the portion with which the reaction solution comes into contact is preferably made of stainless steel.

In a preferred embodiment of the polymerization step, a polymerization solvent is supplied to the reaction vessel in advance, and the polymerization solvent is heated to a preset polymerization temperature, and the temperature and the temperature are controlled so that the polymerization temperature is maintained. / Or a method of dropping a dropping solution composed of a mixture of a polymerization initiator and a polymerization solvent, supplying a monomer and a polymerization initiator, and after completing the supply of all the monomers, performing an aging step, The polymerization reaction is stopped.
In this embodiment, the total amount of polymerization solvent used is 25% by mass or less of the total amount of monomers out of all raw materials (total of polymerization solvent, monomer, and polymerization initiator) supplied to the reaction vessel. Preferably it sets so that it may become 5-25 mass%. It is preferable to supply a part of the total amount of the polymerization solvent to the reaction vessel in advance and use the rest for the dropping solution. 15-50 mass% is preferable and, as for the density | concentration of the monomer in a dripping solution, 25-40 mass% is more preferable.

In another preferred embodiment of the polymerization step, a part of the monomer and the polymerization solvent are supplied to the reaction vessel in advance, and this is heated to a preset polymerization temperature, and the temperature is maintained so that the polymerization temperature is maintained. In a controlled manner, a dropping solution consisting of a monomer and / or a mixture of a polymerization initiator and a polymerization solvent is added dropwise to supply the remainder of the monomer and the polymerization initiator, and supply all the monomers. After finishing, an aging step is performed, and then the polymerization reaction is stopped.
In this embodiment, the total amount of polymerization solvent used is less than 30% by mass of the total amount of monomers out of all raw materials (total of polymerization solvent, monomer and polymerization initiator) supplied to the reaction vessel. Preferably it sets so that it may become 5-25 mass%. It is preferable to supply a part of the total amount of the polymerization solvent to the reaction vessel in advance and use the rest for the dropping solution. 0-30 mass% is preferable and, as for the density | concentration of the monomer in the liquid (mixture of a polymerization solvent and a monomer) in the reaction container immediately before a polymerization initiator is dripped, 3-20 mass% is more preferable. 15-50 mass% is preferable and, as for the density | concentration of the monomer in a dripping solution, 25-40 mass% is more preferable.

  The polymer solution obtained by stopping the polymerization reaction in the reaction stopping step is purified as necessary. For example, after diluting to an appropriate solution viscosity with a diluting solvent such as 1,4-dioxane, acetone, THF, MEK, MIBK, γ-butyrolactone, PGMEA, PGME, ethyl lactate, methanol, ethanol, isopropyl alcohol, water, hexane In a poor solvent such as heptane, diisopropyl ether, or a mixed solvent thereof, the polymer is precipitated. This process is called a reprecipitation process, and is very effective for removing unreacted monomers, polymerization initiators and the like remaining in the polymer solution. If the unreacted monomer remains as it is, the sensitivity decreases when used as a resist composition, so it is preferable to remove it as much as possible. The monomer content as an impurity in the polymer is more preferably 2.0% by mass or less, further preferably 1.0% by mass or less, particularly preferably 0.29% by mass or less, and 0.25% by mass or less. Most preferred.

As the poor solvent, any solvent may be used as long as the polymer to be produced is not dissolved, and any known solvent can be used, but unreacted monomers, polymerization initiators and the like used in the polymer for semiconductor lithography can be used. In view of efficient removal, methanol, isopropyl alcohol, diisopropyl ether, heptane, water, or a mixed solvent thereof is preferable.
Since the amount of the poor solvent used can further reduce the remaining unreacted monomer, it can be used in the same mass or more as the polymer solution, preferably 3 times or more, more preferably 4 times or more, and further more preferably 5 times or more. Preferably, 6 times or more is particularly preferable.

Thereafter, the precipitate is filtered off to obtain a wet powder.
Further, after the wet powder is dispersed again in a poor solvent to obtain a polymer dispersion, an operation of filtering the polymer can be repeated. This step is called a restructuring step and is very effective for further reducing unreacted monomers, polymerization initiators and the like remaining in the polymer wet powder.
It is preferable to purify the polymer only by the reprecipitation step without performing the restructuring step in that the polymer can be obtained while maintaining high productivity.

The obtained wet powder can be sufficiently dried to obtain a dry powder polymer.
In addition, after filtering off, it may be used as a lithographic composition by dissolving it in a suitable solvent without drying and using it as a lithographic composition. Also good. At that time, additives such as a storage stabilizer may be appropriately added.
Further, after drying, it may be dissolved in a suitable solvent and further concentrated to remove the low boiling point compound, and then used as a composition for lithography. At that time, additives such as a storage stabilizer may be appropriately added.

<Method for producing resist composition>
The method for producing a resist composition of the present invention comprises producing a resist polymer by the production method of the present invention, and the resulting resist polymer and a compound that generates an acid upon irradiation with actinic rays or radiation (hereinafter referred to as “ A method for producing a resist composition comprising a step of mixing a photoacid generator ”. Preferably, the polymer and the photoacid generator are dissolved in a resist solvent to produce a resist composition.
When the resist polymer is produced, as the monomer, the monomer that leads the structural unit (a) described above (monomer having a polar group) and the monomer that leads the structural unit (b) described above ( It is preferable to use a monomer having an acid leaving group. The obtained resist composition includes a resist polymer obtained by the production method of the present invention, and a compound that generates an acid upon irradiation with actinic rays or radiation. Is a chemically amplified resist composition.

[Resist solvent]
Examples of the resist solvent include the same solvents as the polymerization solvent.
[Compound that generates acid upon irradiation with actinic ray or radiation (photoacid generator)]
As the photoacid generator, known photoacid generators for the chemically amplified resist composition can be appropriately selected and used. A photo-acid generator may be used individually by 1 type, and may use 2 or more types together.
Examples of the photoacid generator include onium salt compounds, sulfonimide compounds, sulfone compounds, sulfonic acid ester compounds, quinone diazide compounds, diazomethane compounds, and the like.
0.1-20 mass parts is preferable with respect to 100 mass parts of polymers, and, as for content of the photo-acid generator in a resist composition, 0.5-10 mass parts is more preferable.

[Nitrogen-containing compounds]
The chemically amplified resist composition may contain a nitrogen-containing compound. By including the nitrogen-containing compound, the resist pattern shape, the stability over time, and the like are further improved. That is, the cross-sectional shape of the resist pattern becomes closer to a rectangle, and the resist film is irradiated with light, then baked (PEB), and then left for several hours before the next development process. Although it is a line, the occurrence of the deterioration of the cross-sectional shape of the resist pattern is further suppressed when left as such (timed).

The nitrogen-containing compound is preferably an amine, more preferably a secondary lower aliphatic amine or a tertiary lower aliphatic amine.
As for the quantity of a nitrogen-containing compound, 0.01-2 mass parts is preferable with respect to 100 mass parts of polymers.

[Organic carboxylic acid, phosphorus oxo acid or derivative thereof]
The chemically amplified resist composition may contain an organic carboxylic acid, an oxo acid of phosphorus, or a derivative thereof (hereinafter collectively referred to as an acid compound). By including an acid compound, it is possible to suppress deterioration in sensitivity due to the blending of the nitrogen-containing compound, and further improve the resist pattern shape, stability with time of leaving, and the like.

Examples of the organic carboxylic acid include malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid.
Examples of phosphorus oxo acids or derivatives thereof include phosphoric acid or derivatives thereof, phosphonic acid or derivatives thereof, phosphinic acid or derivatives thereof, and the like.
The amount of the acid compound is preferably 0.01 to 5 parts by mass with respect to 100 parts by mass of the polymer.

[Additive]
The resist composition may contain various additives such as a surfactant, other quenchers, sensitizers, antihalation agents, storage stabilizers, and antifoaming agents as necessary. Any additive can be used as long as it is known in the art. Further, the amount of these additives is not particularly limited, and may be determined as appropriate.

<Manufacturing method of substrate on which fine pattern is formed>
The method for producing a substrate on which a fine pattern is formed according to the present invention comprises a step of producing a resist composition by the production method of the present invention, and applying the obtained resist composition onto a work surface of the substrate to form a resist. A step of forming a film, a step of exposing the resist film, and a step of developing the exposed resist film using a developer.
Hereinafter, an example of the manufacturing method of the substrate will be described.

  First, a resist composition is applied by spin coating or the like to the surface (processed surface) of a substrate to be processed such as a silicon wafer on which a desired fine pattern is to be formed. And the resist film is formed on a board | substrate by drying the to-be-processed board | substrate with which this resist composition was apply | coated by baking process (prebaking) etc.

Next, the resist film is irradiated with light having a wavelength of 250 nm or less through a photomask to form a latent image (exposure). As irradiation light, a KrF excimer laser, an ArF excimer laser, an F ₂ excimer laser, and an EUV excimer laser are preferable, and an ArF excimer laser is particularly preferable. Moreover, you may irradiate an electron beam.
In addition, immersion in which light is irradiated with a high refractive index liquid such as pure water, perfluoro-2-butyltetrahydrofuran, or perfluorotrialkylamine interposed between the resist film and the final lens of the exposure apparatus. Exposure may be performed.

After the exposure, heat treatment is appropriately performed (post-exposure baking, PEB), an alkali developer is brought into contact with the resist film, and the exposed portion is dissolved in the developer and removed (development). A well-known thing can be used as an alkali developing solution.
After development, the substrate is appropriately rinsed with pure water or the like. In this way, a resist pattern is formed on the substrate to be processed.

The substrate on which the resist pattern is formed is appropriately heat-treated (post-baked) to strengthen the resist and selectively etch the portion without the resist.
After the etching, the resist is removed with a release agent to obtain a substrate on which a pattern is formed.

According to the production method of the present invention, the temperature of the reaction solution during the monomer supply period is maintained within the range of the average temperature ± 1.5 ° C. of the reaction solution during the monomer supply period, and the polymerization reaction The total mass of the monomers supplied into the reactor is 25% by mass or less with respect to the mass of the reaction liquid at the end of the period, and the monomer supply period is 70% or more of the polymerization reaction period. As a result, a polymer can be obtained in which the variation in molecular weight between lots is suppressed to a small level at a high level that has not existed before.
In particular, by reducing the total mass of the monomers supplied to the reaction liquid to the reaction liquid at the end of the polymerization reaction in the above range, the amount of heat generated by the polymerization reaction per unit volume of the reaction liquid in the reaction vessel can be reduced. It is sufficiently reduced.
In addition, the amount of heat generated by the polymerization reaction per unit time is sufficiently reduced by supplying the monomer over 70% of the polymerization reaction period.
In this way, it is difficult to control the temperature of the reaction liquid in the reaction vessel to hardly fluctuate in the polymerization process by simultaneously reducing the heat generation amount per unit volume and the heat generation amount per unit time due to the polymerization reaction. As a result, it is considered that the temperature uniformity of the reaction solution during the polymerization reaction can be improved and the variation in molecular weight between lots can be extremely reduced.

The resist composition obtained by the present invention is excellent in stability of resist performance such as sensitivity and development contrast since the molecular weight variation of the polymer for semiconductor lithography contained in the resist composition is small.
Therefore, according to the manufacturing method of the board | substrate of this invention, a highly accurate fine resist pattern can be formed stably by using the resist composition concerning this invention. In addition, it is also suitable for pattern formation by photolithography using exposure light having a wavelength of 250 nm or less or lithography using electron beam lithography, for example, ArF excimer laser (193 nm), which requires use of a highly sensitive resist composition. be able to.

Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited thereto.
In each example, “part” means “part by mass” unless otherwise specified. The measuring method and the evaluation method used the following methods.

<Measurement of weight average molecular weight>
The weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn) of the polymer were determined in terms of polystyrene by gel permeation chromatography under the following conditions (GPC conditions).
[GPC conditions]
Equipment: Tosoh Corporation, Tosoh High Speed GPC Equipment HLC-8220GPC (trade name),
Separation column: manufactured by Showa Denko, Shodex GPC K-805L (trade name) connected in series,
Measurement temperature: 40 ° C.
Eluent: Tetrahydrofuran (THF)
Sample: A solution in which about 20 mg of a polymer is dissolved in 5 mL of THF and filtered through a 0.5 μm membrane filter.
Flow rate: 1 mL / min,
Injection volume: 0.1 mL,
Detector: differential refractometer.

Calibration curve I: About 20 mg of standard polystyrene was dissolved in 5 mL of THF, and the solution was filtered through a 0.5 μm membrane filter and injected into a separation column under the above conditions, and the relationship between elution time and molecular weight was determined. As the standard polystyrene, the following standard polystyrene manufactured by Tosoh Corporation (both trade names) were used.
F-80 (Mw = 706,000),
F-20 (Mw = 190,000),
F-4 (Mw = 37,900),
F-1 (Mw = 10,200),
A-2500 (Mw = 2,630),
A-500 (mixture of Mw = 682, 578, 474, 370, 260).

<Sensitivity and development contrast measurement>
The resist composition was spin-coated on a 6-inch silicon wafer and prebaked (PAB) at 120 ° C. for 60 seconds on a hot plate to form a thin film having a thickness of 300 nm. Using an ArF excimer laser exposure apparatus (VUVES-4500, manufactured by RISOTEC Japan), 18 shots of 10 mm × 10 mm ² were exposed while changing the exposure amount. Next, after post-baking (PEB) at 110 ° C. for 60 seconds, using a resist development analyzer (RDA-800 manufactured by RISOTEC Japan), development is performed with an aqueous 2.38 mass% tetramethylammonium hydroxide solution at 23 ° C. for 65 seconds. The change with time of the resist film thickness during development at each exposure amount was measured.

[analysis]
A curve plotting the logarithm of the exposure amount (mJ / cm ² ) and the residual film thickness ratio (hereinafter referred to as the residual film ratio) (%) when developed for 60 seconds with respect to the initial film thickness, based on the obtained data (Hereinafter, exposure amount-residual film rate curve) was prepared, and Eth sensitivity (required exposure amount for setting the residual film rate to 0%, which represents sensitivity) was determined as follows.
Eth sensitivity: exposure amount (mJ / cm ² ) at which the exposure amount-residual film rate curve intersects with a residual film rate of 0%

<Temperature of reaction liquid during monomer supply period>
The temperature of the reaction solution is measured every 30 seconds from the start of the reaction, and 0.5 minutes, 1 minute, 1.5 minutes, 2 minutes, 2.5 minutes, 3 minutes, 3.5 minutes, and 4 minutes from the start of the reaction. The average value of the temperature data of the subsequent 8 points is taken as the representative value x1 for 4 minutes. In addition, the average value of the temperature data of 8 points after 4.5 minutes, 5.5 minutes, 5.5 minutes, 6 minutes, 6.5 minutes, 7 minutes, 7.5 minutes, and 8 minutes is the representative for the 4 minutes. Value x2. Thereafter, the representative values x3, x4,... Are similarly obtained until the end of the monomer supply period, and the average value of all the representative values x1, x2, x3, x4,. Let X be. Among the absolute values of the differences between the average temperature X and the representative values x1, x2, x3, x4..., The largest value is shown in the table as the fluctuation width (unit: ° C.) of the reaction solution temperature.

<Lot difference in weight average molecular weight>
In each example, the polymer was synthesized five times under the same conditions, and the weight average molecular weight of each polymer obtained was measured. The standard deviation of the number of measurements 5 was determined and used as the difference between the lots in the weight average molecular weight. The smaller the difference between lots, the better the reproducibility of the polymerization reaction, and the smaller the lot-to-lot variation in the weight average molecular weight.

[Example 1]
Example 1 is a reference example.
258.9 g of ethyl lactate was added as a polymerization solvent to a 1 L SUS flask equipped with a nitrogen inlet, a stirrer, a condenser, one dropping funnel, and a thermometer. After reducing the pressure in the flask to 18 kPa (final pressure reduction degree), nitrogen gas was supplied to increase the pressure to 101 kPa (gas purge step). That is, an operation of supplying an inert gas after depressurizing the inside of the reaction vessel (hereinafter referred to as a purge operation after depressurization) was performed twice. The polymerization pressure is normal pressure (101 kPa).
Next, the flask was placed in a hot water bath while keeping the inside of the flask in a nitrogen atmosphere, the temperature of the hot water bath was raised to 81 ° C. while stirring the flask, and the internal temperature of the flask was set to 80 ° C.
Subsequently, while obtaining (checking) the temperature of the solution (reaction solution) in the flask every 30 seconds, the following mixture 1 (monomer solution) was placed in the flask at a constant rate over 5 hours from the dropping funnel. It was dripped in. Further, the temperature of the hot water bath was kept at 81 ° C. while being heated with a heater.
The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 1.0 ° C. That is, the temperature of the reaction solution was always controlled within 80.0 ± 1.0 ° C. The fluctuation range of the reaction solution temperature is shown in Table 1 (hereinafter the same).
After completion of the dropping, the reaction solution was kept at a temperature of 80 ° C. for 2 hours (aging process). Then, cooling of the reaction liquid which is reaction stop operation was started, the reaction liquid was cooled to 25 degreeC, the polymerization reaction was stopped, and the polymer solution was obtained. The total of the dropping time and the aging time is the polymerization reaction period, and the dropping time is the monomer supply period. From these values, the ratio of the monomer supply period during the polymerization reaction period was determined. The results are shown in Table 1 (hereinafter the same).
The mass of the reaction liquid at the end of the polymerization reaction period is the sum of the mass of the liquid (polymerization solvent in this example) previously charged in the reaction vessel and the mass of the monomer, polymerization initiator, and polymerization solvent supplied dropwise. The ratio of the total amount of monomers supplied to the mass of the reaction solution was calculated. The results are shown in Table 1 (hereinafter the same).

(Mixture 1)
81.60 g of a monomer of the following formula (m1),
94.08 g of a monomer of the following formula (m2),
56.64 g of a monomer of the following formula (m3),
431.5 g of ethyl lactate,
6.624 g of dimethyl-2,2′-azobisisobutyrate (Wako Pure Chemical Industries, V601 (trade name)).
The composition (mol%) of the monomer in the mixture 1 is shown in Table 1.

  The obtained polymer solution was added dropwise to a 7.0 times amount of a mixed solvent of methanol and water (methanol / water = 80/20 volume ratio) while stirring to precipitate a white precipitate (polymer P1). Obtained. The precipitate was filtered off to obtain a polymer wet powder. The polymer powder was dried at 40 ° C. under reduced pressure for about 40 hours. The weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn) of the obtained polymer P1 (referred to as Production 1-1) are shown in Table 1 (hereinafter the same).

  100 parts of the polymer P1, 2 parts of triphenylsulfonium triflate as a photoacid generator, and PGMEA as a solvent are mixed so that the polymer concentration becomes 12.5% by mass to obtain a uniform solution. And filtered through a membrane filter having a pore size of 0.1 μm to obtain a resist composition. The sensitivity (Eth) of the obtained resist composition was evaluated. The results are shown in Table 1 (hereinafter the same).

Production of polymer P1 was further performed 4 times (production 1-2 to 1-5) under the same conditions. The weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn) of the polymer obtained each time were measured. The standard deviation of the polymerization average molecular weight of production 1-2 to 1-5 was determined, and the difference between lots in the weight average molecular weight (Mw) was determined. The results are shown in Table 1 (hereinafter the same).
A resist composition was prepared under the same conditions using the polymers obtained each time, and the sensitivity (Eth) was evaluated. The results are shown in Table 1 (hereinafter the same).

[Comparative Example 2]
A polymer was produced and evaluated in the same manner as in Example 1 except that the conditions were changed as shown in Table 1. The results are shown in Table 1.
The differences from the first embodiment are as follows. That is, the mixture 1 was dropped into the flask at a constant rate over 4 hours. At this time, the average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation range (maximum value) of the reaction liquid temperature was 1.3 ° C. That is, the temperature of the reaction solution was always controlled within 80.0 ± 1.3 ° C. After completion of dropping, the reaction solution was kept at a temperature of 80 ° C. for 3 hours.

[Comparative Example 3]
A polymer was produced and evaluated in the same manner as in Example 1 except that the conditions were changed as shown in Table 1. The results are shown in Table 1.
The differences from the first embodiment are as follows. That is, the amount of the polymerization solvent (ethyl lactate) supplied in advance to the same SUS flask as in Example 1 was changed to 233.7 g. The monomer solution to be dropped was changed to the following mixture 3. The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 1.3 ° C. That is, the temperature of the reaction solution was always controlled within 80.0 ± 1.3 ° C.

(Mixture 3)
102.00 g of the monomer of the formula (m1),
117.60 g of the monomer of the formula (m2),
70.80 g of the monomer of the formula (m3),
435.6 g of ethyl lactate,
Dimethyl-2,2'-azobisisobutyrate (Wako Pure Chemical Industries, V601 (trade name)) 8.280 g.

[Example 4]
In this example, the monomer and the polymerization solvent were supplied into the reaction vessel before the start of the polymerization reaction.
The following mixture 4-1 was placed in a 1 L SUS flask equipped with a nitrogen inlet, a stirrer, a condenser, two dropping funnels, and a thermometer. After reducing the pressure in the flask to 18 kPa (final pressure reduction degree), nitrogen gas was supplied to increase the pressure to 101 kPa (gas purge step). That is, an operation of supplying an inert gas after depressurizing the inside of the reaction vessel (hereinafter referred to as a purge operation after depressurization) was performed twice. The polymerization pressure is normal pressure (101 kPa).
Next, the flask was placed in a hot water bath while keeping the inside of the flask in a nitrogen atmosphere, the temperature of the hot water bath was raised to 81 ° C. while stirring the flask, and the internal temperature of the flask was set to 80 ° C.
Subsequently, while obtaining the solution temperature in the flask every 30 seconds, the following mixture 4-2 was added from the dropping funnel over 6 hours, and the following mixture 4-3 was transferred from the other dropping funnel over 20 minutes at a constant rate. Was dropped into the flask. The mixture 4-2 and the mixture 4-3 started dropping at the same time, and the dropping of the mixture 4-2 was completed 5 hours and 40 minutes after the dropping of the mixture 4-3 was completed.
The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 0.7 ° C. That is, the temperature of the reaction solution was always controlled within 80.0 ± 0.7 ° C.
After completion of the dropwise addition of the mixture 4-2, the mixture was kept at a temperature of 80 ° C. for 1 hour (aging process). Then, cooling of the reaction liquid which is reaction stop operation was started, the reaction liquid was cooled to 25 degreeC, the polymerization reaction was stopped, and the polymer solution was obtained.
The obtained polymer solution was produced and evaluated in the same manner as in Example 1.

(Mixture 4-1)
6.53 g of the monomer of the formula (m1),
11.76 g of the monomer of the formula (m2),
4.84 g of the monomer of the formula (m3),
170.4 g of ethyl lactate,
PGMEA 139.4g.

(Mixture 4-2)
73.44 g of the monomer of the formula (m1),
84.67 g of the monomer of the formula (m2),
50.98 g of the monomer of the formula (m3),
232.4 g of ethyl lactate,
PGMEA 199.7g,
4.633 g of dimethyl-2,2′-azobisisobutyrate (manufactured by Wako Pure Chemical Industries, Ltd., V601 (trade name)).
The composition (mol%) of the monomer in the mixture 4-2 is shown in Table 1.

(Mixture 4-3)
11.7 g of ethyl lactate,
1.158 g of dimethyl-2,2′-azobisisobutyrate (Wako Pure Chemical Industries, V601 (trade name)).

[Comparative Example 5]
A polymer was produced and evaluated in the same manner as in Example 1 except that the fluctuation range of the reaction solution temperature was larger than that in Example 1. The results are shown in Table 2.
The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 1.7 ° C.

[Comparative Example 6]
A polymer was produced and evaluated in the same manner as in Comparative Example 2 except that the fluctuation range of the reaction solution temperature was larger than that in Comparative Example 2. The results are shown in Table 2.
The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 1.8 ° C.

[Comparative Example 7]
A polymer was produced and evaluated in the same manner as in Comparative Example 3 except that the fluctuation range of the reaction solution temperature was larger than that in Comparative Example 3. The results are shown in Table 2.
The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 1.9 ° C.

[Comparative Example 8]
In Comparative Example 7, the monomer supply period was changed to 4 hours, and the aging time was changed to 3 hours. Others were produced and evaluated in the same manner as in Comparative Example 7. The results are shown in Table 2.
That is, the mixture 3 was dropped into the flask at a constant rate over 4 hours. At this time, the average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 2.1 ° C. After completion of dropping, the reaction solution was kept at a temperature of 80 ° C. for 3 hours (aging step).

[Comparative Example 9]
A polymer was produced and evaluated in the same manner as in Comparative Example 8 except that the reaction vessel was changed from a SUS reaction vessel to a glass reaction vessel. The results are shown in Table 2.
The average temperature of the reaction liquid during dropping (during the monomer supply period) was 80.0 ° C., and the fluctuation width (maximum value) of the reaction liquid temperature was 2.4 ° C.

  From the results of Tables 1 and 2, the temperature of the reaction liquid during the monomer supply period is maintained within the range of the average temperature of the reaction liquid during the monomer supply period ± 1.5 ° C., and the polymerization reaction The total mass of the monomers supplied into the reactor is less than 30% by mass with respect to the mass of the reaction liquid at the end of the period, and the monomer supply period is 70% or more of the polymerization reaction period. In Examples 1 and 4, a polymer having a very small difference in weight average molecular weight between lots was obtained. In Examples 1 and 4, the sensitivity of the resist composition prepared using the obtained polymer was further improved, and the variation in sensitivity among lots was further reduced.

Claims (4)

In the reaction vessel, a polymerization step of polymerizing the monomer in a reaction solution containing a polymerization solvent, a monomer and a polymerization initiator, and a reaction stopping step of stopping the polymerization reaction,
In the polymerization reaction period from the start of the polymerization reaction to the start of the stop operation, a monomer supply step of supplying the monomer continuously or dropwise into the reaction vessel,
The temperature of the reaction liquid during the monomer supply period from the start to the end of the monomer supply process is maintained within the range of the average temperature of the reaction liquid during the monomer supply period ± 1.0 ° C. And
The total mass of the monomers supplied into the reactor is less than 30% by mass with respect to the mass of the reaction solution at the end of the polymerization reaction period, and the monomer supply period is the polymerization reaction. A method for producing a polymer , wherein the period is 80% or more and 90% or less .   The method for producing a polymer according to claim 1, wherein at least a portion of the inner surface of the reaction vessel that comes into contact with the reaction solution is made of stainless steel. A step of producing a resist polymer by the production method according to claim 1 or 2,
The manufacturing method of the resist composition which has the process of mixing the obtained polymer for resists, and the compound which generate | occur | produces an acid by irradiation of actinic light or a radiation. A step of producing a resist composition by the production method according to claim 3;
Applying the obtained resist composition onto a work surface of a substrate to form a resist film;
A method for producing a substrate on which a pattern is formed, comprising a step of exposing the resist film and a step of developing the exposed resist film using a developer.