JP5829034B2 - Photocurable thermosetting composition for inkjet and printed wiring board using the same - Google Patents
Photocurable thermosetting composition for inkjet and printed wiring board using the same Download PDFInfo
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- JP5829034B2 JP5829034B2 JP2011078844A JP2011078844A JP5829034B2 JP 5829034 B2 JP5829034 B2 JP 5829034B2 JP 2011078844 A JP2011078844 A JP 2011078844A JP 2011078844 A JP2011078844 A JP 2011078844A JP 5829034 B2 JP5829034 B2 JP 5829034B2
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- JP
- Japan
- Prior art keywords
- viscosity
- mpa
- thermosetting composition
- inkjet
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920001187 thermosetting polymer Polymers 0.000 title claims description 36
- 239000000203 mixture Substances 0.000 title claims description 34
- 239000000178 monomer Substances 0.000 claims description 29
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 15
- 239000003054 catalyst Substances 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 9
- 239000003999 initiator Substances 0.000 claims description 8
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 6
- NCAVPEPBIJTYSO-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate;2-(oxiran-2-ylmethoxymethyl)oxirane Chemical compound C1OC1COCC1CO1.OCCCCOC(=O)C=C NCAVPEPBIJTYSO-UHFFFAOYSA-N 0.000 claims description 4
- 238000013035 low temperature curing Methods 0.000 claims 1
- -1 methacryloyl group Chemical group 0.000 description 25
- 238000000034 method Methods 0.000 description 22
- 239000000126 substance Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 8
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 239000003505 polymerization initiator Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
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- 238000009413 insulation Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
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- 150000003839 salts Chemical class 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
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- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
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- 229910000679 solder Inorganic materials 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
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- 239000012965 benzophenone Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical class O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
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- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Ink Jet (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
Description
本発明は、樹脂絶縁層の形成に用いる光硬化性熱硬化性組成物であって、インクジェットプリンターを用いて、プリント配線板用の基板上に直接パターンを描画するのに適している光硬化性熱硬化性組成物及びこれを用いて形成された樹脂絶縁層を有するプリント配線板に関する。 The present invention is a photocurable thermosetting composition used for forming a resin insulating layer, and is suitable for drawing a pattern directly on a substrate for a printed wiring board using an ink jet printer. The present invention relates to a thermosetting composition and a printed wiring board having a resin insulating layer formed using the same.
インクジェットプリンターを用いたプリント配線板の製造方法としては、例えば、プラスチック基板上の金属箔にインクジェットプリンターを用いてエッチングレジストを形成し、エッチング処理を行なう導体回路の形成方法が存在する(特開昭56−66089号、特開昭56−157089号、特開昭58−50794号、特開平6−237063号参照)。この方法は、CADデータに従い、金属箔にパターンを直接描画するので、フォトマスクが必須となる感光性樹脂を使用した写真現像法によるパターニングや、レジストインキをスクリーン印刷法によりパターニングする場合に比較して、プリント配線板の製造工程にかかる手間や時間が大幅に短縮できると同時に、現像液、レジストインキ、洗浄溶剤等の消耗品も削減できるという利点を有する。 As a method for producing a printed wiring board using an ink jet printer, for example, there is a method for forming a conductive circuit in which an etching resist is formed on a metal foil on a plastic substrate using an ink jet printer and an etching process is performed (Japanese Patent Laid-Open No. Sho). 56-66089, JP 56-157089, JP 58-50794, JP 6-237063). This method draws the pattern directly on the metal foil according to the CAD data. Compared to patterning by photo development using a photosensitive resin that requires a photomask and patterning resist ink by screen printing. Thus, the labor and time required for the production process of the printed wiring board can be greatly reduced, and at the same time, consumables such as developer, resist ink, and cleaning solvent can be reduced.
また、プリント配線板に形成された導体回路を保護するソルダーレジストといった樹脂絶縁層についても、インクジェットプリンターを用いた形成方法は既に提案されている(特開平7−263845号、特開平9−18115号参照)。その形成方法は、上述したエッチングレジストを形成する方法と同様である。このインクジェット方法を用いた場合にも、写真現像法やスクリーン印刷法に比較して工程数、時間、消耗品を削減することができる。また更には、インクジェットプリンターのインクタンクを、例えばエッチングレジスト用インキ、ソルダーレジストインキ、マーキングインキ及びそれらの硬化剤のそれぞれに分けてインクジェットプリンターに備えることにより、一台のインクジェットプリンターで複数の工程を行うことができる方式も提案されている(特開平8−236902号参照)。 Also, a resin insulating layer such as a solder resist for protecting a conductor circuit formed on a printed wiring board has already been proposed using an ink jet printer (Japanese Patent Laid-Open Nos. 7-263845 and 9-18115). reference). The formation method is the same as the method for forming the etching resist described above. Even when this ink jet method is used, the number of steps, time, and consumables can be reduced as compared with the photographic development method and the screen printing method. Furthermore, the ink tank of the ink jet printer is divided into, for example, an etching resist ink, a solder resist ink, a marking ink, and a curing agent thereof, and the ink jet printer is provided with the ink jet printer, so that a plurality of steps can be performed with one ink jet printer. A method that can be performed has also been proposed (see JP-A-8-236902).
しかし、インクジェットプリンターに用いるインクは、塗布時の粘度が約20mPa・s以下であることが必要となる。一方、スクリーン印刷に使用されるインクの粘度は20,000mPa・s前後であり、両者の粘度には大きな差異がある。従って、スクリーン印刷用のレジストインキを大量の希釈剤で希釈した場合であっても、インクジェットプリンターに使用できる粘度にまでこれを低下させることは難しい。また、たとえ20mPa・sまで上記レジストインキの粘度を低下させることができたとしても、ソルダーレジストのような樹脂絶縁層に要求される耐熱性、耐薬品性等の物性は大きく低下してしまう。更に、上記レジストインキを揮発性の溶剤で希釈した場合には不揮発分が非常に少なくなるため、これを基板に塗布する際の所定の膜厚の確保が難しくなる。そのため、プリント配線板の樹脂絶縁層の形成方法としては、前記インクジェット方式はアイデアの域を出ておらず、インクジェットプリンターで使用できる、実用的な樹脂絶縁層形成用のレジストインキ等の樹脂組成物は存在しなかった。 However, the ink used for the ink jet printer needs to have a viscosity of about 20 mPa · s or less when applied. On the other hand, the viscosity of the ink used for screen printing is around 20,000 mPa · s, and there is a large difference in the viscosity between the two. Therefore, even when the resist ink for screen printing is diluted with a large amount of diluent, it is difficult to reduce it to a viscosity that can be used for an ink jet printer. Even if the viscosity of the resist ink can be reduced to 20 mPa · s, physical properties such as heat resistance and chemical resistance required for a resin insulating layer such as a solder resist are greatly reduced. Furthermore, when the resist ink is diluted with a volatile solvent, the non-volatile content becomes very small, and it becomes difficult to secure a predetermined film thickness when the resist ink is applied to the substrate. Therefore, as a method for forming a resin insulation layer of a printed wiring board, the ink jet method is not out of the idea, and can be used in an ink jet printer, and a resin composition such as a resist ink for forming a practical resin insulation layer. Did not exist.
本発明は、上述した従来技術の問題を解消するためになされたものであり、その主たる目的は、樹脂絶縁層の形成に用いる光硬化性熱硬化性組成物であって、インクジェットプリンターを用いて、プリント配線板用の基板上に直接パターンを描画することができる光硬化性熱硬化性組成物を提供することにある。 The present invention has been made in order to solve the above-described problems of the prior art, and its main purpose is a photocurable thermosetting composition used for forming a resin insulating layer, using an inkjet printer. An object of the present invention is to provide a photocurable thermosetting composition capable of directly drawing a pattern on a substrate for a printed wiring board.
更に本発明の他の目的は、上記光硬化性熱硬化性組成物を用いてインクジェットプリンターによりプリント配線板用の基板上に直接パターンを描画し、これを硬化させてなる樹脂絶縁層を有するプリント配線板を提供することにある。 Still another object of the present invention is to provide a print having a resin insulating layer obtained by directly drawing a pattern on a substrate for a printed wiring board by an ink jet printer using the photocurable thermosetting composition and curing the pattern. It is to provide a wiring board.
本発明が解決しようとする課題は、インクジェットプリンターに使用できる粘度であって、樹脂絶縁層に要求される耐熱性、耐薬品性等に優れており、また密着性もよく、更にプリント配線板を製造するときの加熱温度である170℃以下、望ましくは150℃以下の低温で熱硬化させることができる光硬化性熱硬化性組成物を提供することにある。 The problem to be solved by the present invention is a viscosity that can be used in an ink jet printer, which is excellent in heat resistance and chemical resistance required for a resin insulating layer, has good adhesion, and further has a printed wiring board. An object of the present invention is to provide a photocurable thermosetting composition that can be thermally cured at a low temperature of 170 ° C. or lower, preferably 150 ° C. or lower, which is a heating temperature during production.
前記目的を達成するために、本発明は以下のような特徴を有する。
即ち、本発明の特徴の一つは、分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーと、3官能以上のアクリレートモノマーと、熱硬化触媒と、光重合開始剤を含むことを特徴とするインクジェット用光硬化性熱硬化性組成物である。
In order to achieve the above object, the present invention has the following features.
That is, one of the features of the present invention is that a monomer having a (meth) acryloyl group and a glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less, a trifunctional or higher acrylate monomer, and a thermosetting catalyst And a photopolymerization initiator. A photocurable thermosetting composition for inkjet.
また本発明の他の特徴は、前記分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーがグリシジルメタクリレート又は4−ヒドロキシブチルアクリレートグリシジルエーテルであることを特徴とするインクジェット用光硬化性熱硬化性組成物である。 Another feature of the present invention is that the monomer having a (meth) acryloyl group and a glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less is glycidyl methacrylate or 4-hydroxybutyl acrylate glycidyl ether. Is a photocurable thermosetting composition for inkjet.
更に本発明の他の特徴は、上記インクジェット用光硬化性熱硬化性組成物において、前記分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーを100質量部としたとき、前記3官能以上のアクリレートモノマーを15〜400質量部、好ましくは20〜300質量部、前記熱硬化触媒を0.1〜5質量部、好ましくは0.5〜4質量部含有することである。 Still another feature of the present invention is that in the above-described photocurable thermosetting composition for inkjet, a monomer having a (meth) acryloyl group and a glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less. When it is 100 parts by mass, the trifunctional or higher functional acrylate monomer is 15 to 400 parts by mass, preferably 20 to 300 parts by mass, and the thermosetting catalyst is 0.1 to 5 parts by mass, preferably 0.5 to 4 parts by mass. It is to contain part.
ここで本明細書において、粘度とはJIS K2283に従って測定した粘度を指す。また、上記インクジェット用光硬化性熱硬化性組成物の粘度は常温(25℃)で150mPa・s以下である。上述のように、インクジェットプリンターに使用するインクの粘度は塗布時の温度において約20mPa・s以下であることが必要である。しかし、常温で150mPa・s以下の粘度であれば、塗布前、若しくは塗布時の加温によって上記条件を充足することができる。 Here, in this specification, a viscosity refers to the viscosity measured according to JIS K2283. Moreover, the viscosity of the said photocurable thermosetting composition for inkjets is 150 mPa * s or less at normal temperature (25 degreeC). As described above, the viscosity of the ink used in the ink jet printer needs to be about 20 mPa · s or less at the temperature at the time of application. However, if the viscosity is 150 mPa · s or less at room temperature, the above conditions can be satisfied by heating before coating or by heating during coating.
更に、本発明の他の特徴は、上記インクジェット用光硬化性熱硬化性組成物を用いてインクジェットプリンターにより基板上にパターンを描画し、これを硬化させてなる樹脂絶縁層を有することを特徴とするプリント配線板である。 Furthermore, another feature of the present invention is that it has a resin insulating layer obtained by drawing a pattern on a substrate by an ink jet printer using the photocurable thermosetting composition for ink jet and curing the pattern. Printed wiring board.
本発明のインクジェット用光硬化性熱硬化性組成物は、分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーと、3官能以上のアクリレートモノマーとを配合することにより、これを硬化させてなる樹脂絶縁層の耐熱性、耐薬品性、及び密着性を向上させることができる。特に、従来のインクジェット用樹脂組成物では、粘度の高い感光性モノマー(若しくは感光性熱硬化性モノマー)を使用しており、当該組成物を上記所定の粘度(20mPa・s)に低下させるために、粘度の低い単官能の感光性モノマーを配合するのが一般的であった。一方、本発明では、感光性熱硬化性モノマーとして粘度の低い、分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーを使用することにより、耐熱性、耐薬品性、及び密着性に優れる、粘度の高い3官能以上のアクリレートモノマーの配合が可能となった。 The photocurable thermosetting composition for inkjet according to the present invention comprises a monomer having a (meth) acryloyl group and a glycidyl group in the molecule and a viscosity at 25 ° C. of 10 mPa · s or less, a trifunctional or higher acrylate monomer, By blending, it is possible to improve the heat resistance, chemical resistance, and adhesion of the resin insulation layer obtained by curing this. In particular, in a conventional inkjet resin composition, a photosensitive monomer having a high viscosity (or a photosensitive thermosetting monomer) is used, and the composition is reduced to the predetermined viscosity (20 mPa · s). In general, a monofunctional photosensitive monomer having a low viscosity is blended. On the other hand, in the present invention, by using a monomer having a low viscosity as a photosensitive thermosetting monomer and having a (meth) acryloyl group and a glycidyl group in the molecule and a viscosity at 25 ° C. of 10 mPa · s or less, It is possible to blend a tri- or higher functional acrylate monomer with excellent viscosity, chemical resistance and adhesion.
また、本発明のインクジェット用光硬化性熱硬化性組成物は、熱硬化触媒を配合することにより、プリント配線板を製造するときの加熱温度である170℃以下、望ましくは150℃以下で硬化させることができる。これにより、プリント配線板の特性に影響を与えることなく、樹脂絶縁層を形成することができる。 In addition, the photocurable thermosetting composition for inkjet according to the present invention is cured at 170 ° C. or lower, preferably 150 ° C. or lower, which is a heating temperature when manufacturing a printed wiring board, by blending a thermosetting catalyst. be able to. Thereby, the resin insulating layer can be formed without affecting the characteristics of the printed wiring board.
以下、本発明の一実施形態を詳述する。尚、本発明が当該実施形態に限定されないことはもとよりである。 Hereinafter, an embodiment of the present invention will be described in detail. Of course, the present invention is not limited to this embodiment.
上述のとおり、本発明のインクジェット用光硬化性熱硬化性組成物は、インクジェットプリンターを用いて所定のパターンをプリント配線板用の基板上に直接描画することができ、またこれに活性エネルギー線を照射することによって一次硬化させ、その後更に加熱硬化することにより、耐熱性、耐薬品性、密着性等に優れる樹脂絶縁層を形成することができる。また、上記組成物は熱硬化触媒を含有していることにより、上記加熱硬化においてプリント配線板を製造するときの加熱温度の低温でも十分に硬化させることが可能となる。この場合、活性エネルギー線の照射条件は、100mJ/cm2以上、好ましくは300mJ/cm2〜2000mJ/cm2とすることが望ましい。また、加熱硬化の条件は、140〜170℃で20分以上、好ましくは150〜170℃で20〜60分とすることが望ましい。 As described above, the photocurable thermosetting composition for inkjet according to the present invention can directly draw a predetermined pattern on a substrate for a printed wiring board using an inkjet printer, and an active energy ray can be drawn on the pattern. A resin insulating layer having excellent heat resistance, chemical resistance, adhesion, and the like can be formed by first curing by irradiation and then further heat curing. Moreover, since the said composition contains the thermosetting catalyst, it becomes possible to fully harden | cure even at the low temperature of the heating temperature when manufacturing a printed wiring board in the said heat curing. In this case, irradiation conditions of the active energy ray, 100 mJ / cm 2 or more, preferably it is desirable to 300mJ / cm 2 ~2000mJ / cm 2 . Further, the heat curing conditions are 140 to 170 ° C. for 20 minutes or longer, preferably 150 to 170 ° C. for 20 to 60 minutes.
上記活性エネルギー線の照射は、インクジェットプリンターによるパターンの描画後に行なう方法と、当該パターン描画と平行して行なう方法とがあるが、時間や工程の短縮等から、後者の方法が好ましい。上記活性エネルギー線の照射をパターン描画と平行して行なう方法としては、例えばパターン描画時に基板の側部や底部等から活性エネルギー線を照射する方法等がある。活性エネルギー線の照射光源としては、低圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノンランプ、メタルハライドランプ等を利用することができる。その他、電子線、α線、β線、γ線、X線、中性子線等も利用できる。 The irradiation of the active energy ray includes a method performed after drawing a pattern by an ink jet printer and a method performed in parallel with the pattern drawing. The latter method is preferable from the viewpoint of shortening time and processes. As a method of performing the irradiation of the active energy rays in parallel with the pattern drawing, for example, there is a method of irradiating the active energy rays from the side portion or the bottom portion of the substrate at the time of pattern drawing. As the irradiation source of the active energy ray, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, a metal halide lamp, or the like can be used. In addition, electron beams, α rays, β rays, γ rays, X rays, neutron rays and the like can be used.
以下、本発明のインクジェット用光硬化性熱硬化性組成物について説明する。 Hereinafter, the photocurable thermosetting composition for inkjet according to the present invention will be described.
上記分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーとしては、例えばグリシジルメタクリレート、4−ヒドロキシブチルアクリレートグリシジルエーテル等が挙げられ、市販品としては日油製ブレンマーG、共栄社化学製ライトエステルG等がある。尚、本明細書において、(メタ)アクリロイル基はアクリロイル基及びメタアクリロイル基を総称する用語であり、他の類似の表現についても同様とする。 Examples of the monomer having a (meth) acryloyl group and a glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less include glycidyl methacrylate and 4-hydroxybutyl acrylate glycidyl ether. There are NOF Blemmer G and Kyoeisha Chemical Light Ester G. In the present specification, the (meth) acryloyl group is a generic term for an acryloyl group and a methacryloyl group, and the same applies to other similar expressions.
上記3官能以上のアクリレートモノマーとしては、トリエチレングリコールジアクリレート、テトラエチレングリコールジアクリレート等のポリエチレングリコールジアクリレート、ペンタエリスリトールトリアクリレート、トリメチロールプロパントリアクリレート、トリメチロールメタントリアクリレート、エチレンオキシド変性トリメチロールプロパントリアクリレート、プロピレンオキシド変性トリメチロールプロパントリアクリレート、エピクロルヒドリン変性トリメチロールプロパントリアクリレート、ペンタエリスリトールテトラアクリレート、ペンタエリスリトールテトラメタクリレート、テトラメチロールメタンテトラアクリレート、エチレンオキシド変性リン酸トリアクリレート、エピクロルヒドリン変性グリセロールトリアクリレート、ジペンタエリスリトールヘキサアクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレート、あるいはこれらのシルセスキオキサン変性物等に代表される多官能アクリレート、あるいはこれらに対応するメタアクリレートモノマー、3官能メタクリレートエステル、ε−カプロラクトン変性トリス(アクロキシエチル)イソシアヌレート等が挙げられる。当該3官能以上のアクリレートモノマーの配合量は、分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーを100質量部としたとき、40〜400質量部、好ましくは50〜300質量部である。 Examples of the tri- or higher functional acrylate monomer include polyethylene glycol diacrylates such as triethylene glycol diacrylate and tetraethylene glycol diacrylate, pentaerythritol triacrylate, trimethylolpropane triacrylate, trimethylolmethane triacrylate, and ethylene oxide-modified trimethylolpropane. Triacrylate, propylene oxide modified trimethylolpropane triacrylate, epichlorohydrin modified trimethylolpropane triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, tetramethylolmethane tetraacrylate, ethylene oxide modified phosphate triacrylate, epichlorohydrin modified glycerol Polyfunctional acrylates typified by reacrylate, dipentaerythritol hexaacrylate, dipentaerythritol monohydroxypentaacrylate, or their modified silsesquioxanes, or the corresponding methacrylate monomers, trifunctional methacrylate esters, ε -Caprolactone-modified tris (acryloxyethyl) isocyanurate and the like. The blending amount of the tri- or higher functional acrylate monomer is 40 to 400 mass when the monomer having (meth) acryloyl group and glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less is 100 mass parts. Parts, preferably 50 to 300 parts by mass.
上記光重合開始剤としては、光ラジカル重合開始剤や光カチオン重合開始剤が挙げられる。 Examples of the photopolymerization initiator include a photoradical polymerization initiator and a photocationic polymerization initiator.
光ラジカル重合開始剤としては、光、レーザー、電子線等によりラジカルを発生し、ラジカル重合反応を開始する化合物であれば全て用いることができる。当該光ラジカル重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインとベンゾインアルキルエーテル類;アセトフェノン、2,2−ジメトキシ−2−フェニルアセトフェノン、2,2−ジエトキシ−2−フェニルアセトフェノン、1,1−ジクロロアセトフェノン等のアセトフェノン類;2−メチル−1−[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−ブタン−1−オン、N,N−ジメチルアミノアセトフェノン等のアミノアセトフェノン類;2−メチルアントラキノン、2−エチルアントラキノン、2−t−ブチルアントラキノン、1−クロロアントラキノン等のアントラキノン類;2,4−ジメチルチオキサントン、2,4−ジエチルチオキサントン、2−クロロチオキサントン、2,4−ジイソプロピルチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;2,4,5−トリアリールイミダゾール二量体;リボフラビンテトラブチレート;2−メルカプトベンゾイミダゾール、2−メルカプトベンゾオキサゾール、2−メルカプトベンゾチアゾール等のチオール化合物;2,4,6−トリス−s−トリアジン、2,2,2−トリブロモエタノール、トリブロモメチルフェニルスルホン等の有機ハロゲン化合物;ベンゾフェノン、4,4´−ビスジエチルアミノベンゾフェノン等のベンゾフェノン類又はキサントン類;2,4,6−トリメチルベンゾイルジフェニルホスフィンオキサイド等が挙げられる。 Any radical photopolymerization initiator can be used as long as it is a compound that generates radicals by light, laser, electron beam or the like and initiates radical polymerization reaction. Examples of the photo radical polymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2- Acetophenones such as diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino Aminoacetophenones such as -1- (4-morpholinophenyl) -butan-1-one, N, N-dimethylaminoacetophenone; 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1-chloro Anthraquinones such as anthraquinone; thioxanthones such as 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone and 2,4-diisopropylthioxanthone; ketals such as acetophenone dimethyl ketal and benzyldimethyl ketal; 4,5-triarylimidazole dimer; riboflavin tetrabutyrate; thiol compounds such as 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole; 2,4,6-tris-s-triazine, Organic halogen compounds such as 2,2,2-tribromoethanol and tribromomethylphenyl sulfone; benzophenones such as benzophenone, 4,4′-bisdiethylaminobenzophenone, or xanthone And 2,4,6-trimethylbenzoyldiphenylphosphine oxide and the like.
上記光ラジカル重合開始剤は、単独で又は複数種を混合して使用することができる。また更に、これらに加え、N,N−ジメチルアミノ安息香酸エチルエステル、N,N−ジメチルアミノ安息香酸イソアミルエステル、ペンチル−4−ジメチルアミノベンゾエート、トリエチルアミン、トリエタノールアミン等の三級アミン類等の光開始助剤を使用することができる。また、可視光領域に吸収のあるCGI−784等(BASFジャパン社製)のチタノセン化合物等も、光反応を促進するために光ラジカル重合開始剤に添加することもできる。尚、光ラジカル重合開始剤に添加する成分はこれらに限られるものではなく、紫外光もしくは可視光領域で光を吸収し、(メタ)アクリロイル基等の不飽和基をラジカル重合させるものであれば、光重合開始剤、光開始助剤に限らず、単独であるいは複数併用して使用できる。 The above radical photopolymerization initiators can be used alone or in combination of two or more. Furthermore, in addition to these, tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, triethanolamine, etc. Photoinitiator aids can be used. In addition, a titanocene compound such as CGI-784 having an absorption in the visible light region (manufactured by BASF Japan) or the like can also be added to the photoradical polymerization initiator in order to accelerate the photoreaction. The components added to the radical photopolymerization initiator are not limited to these, as long as they absorb light in the ultraviolet or visible light region and radically polymerize unsaturated groups such as (meth) acryloyl groups. These are not limited to photopolymerization initiators and photoinitiator aids, and can be used alone or in combination.
上記光カチオン重合開始剤としては、光、レーザー、電子線等によりカチオン重合反応を開始する化合物であれば用いることができる。光によりカチオン種を発生する光カチオン重合開始剤としては、例えばジアゾニウム塩、ヨードニウム塩、ブロモニウム塩、クロロニウム塩、スルホニウム塩、セレノニウム塩、ピリリウム塩、チアピリリウム塩、ピリジニウム塩等のオニウム塩;トリス(トリハロメチル)−s−トリアジン及びその誘導体等のハロゲン化化合物;スルホン酸の2−ニトロベンジルエステル;イミノスルホナート;1−オキソ−2−ジアゾナフトキノン−4−スルホナート誘導体;N−ヒドロキシイミド=スルホナート;トリ(メタンスルホニルオキシ)ベンゼン誘導体;ビススルホニルジアゾメタン類;スルホニルカルボニルアルカン類;スルホニルカルボニルジアゾメタン類;ジスルホン化合物等が挙げられる。市販されている光カチオン重合開始剤としては、サイラキュアUVI−6970、UVI−6974、UVI−6990、UVI−6950(以上、UCC社製の商品名)、イルガキュア261(BASFジャパン社製の商品名)、SP−150、SP−152、SP−170(以上、旭電化工業(株)製の商品名)、、DAICATII(ダイセル化学工業(株)製の商品名)、UVAC1591(ダイセル・サイテック(株)製の商品名)、CI−2734、CI−2855、CI−2823、CI−2758(以上、日本曹達(株)製の商品名)、PI−2074(ローヌプーラン(株)製の商品名)、FFC509(3M(株)製の商品名)、ロードシル フォトイニシエーター2074(ローディア(株)製の商品名)、BBI−102、BBI−101(ミドリ化学(株)製の商品名)、CD−1012(サートマー(株)製の商品名)等が挙げられる。 As the photocationic polymerization initiator, any compound that initiates a cationic polymerization reaction by light, laser, electron beam or the like can be used. Photocationic polymerization initiators that generate cationic species by light include, for example, diazonium salts, iodonium salts, bromonium salts, chloronium salts, sulfonium salts, selenonium salts, pyrium salts, thiapyrylium salts, pyridinium salts and other onium salts; tris (trihalo Halogenated compounds such as methyl) -s-triazine and derivatives thereof; 2-nitrobenzyl ester of sulfonic acid; iminosulfonate; 1-oxo-2-diazonaphthoquinone-4-sulfonate derivative; N-hydroxyimide = sulfonate; (Methanesulfonyloxy) benzene derivatives; bissulfonyldiazomethanes; sulfonylcarbonylalkanes; sulfonylcarbonyldiazomethanes; disulfone compounds and the like. Commercially available photocationic polymerization initiators include Cyracure UVI-6970, UVI-6974, UVI-6990, UVI-6950 (trade names manufactured by UCC) and Irgacure 261 (trade names manufactured by BASF Japan). , SP-150, SP-152, SP-170 (above, trade names manufactured by Asahi Denka Kogyo Co., Ltd.), DAICAT II (trade names manufactured by Daicel Chemical Industries, Ltd.), UVAC1591 (Daicel Cytec Co., Ltd.) Product name), CI-2734, CI-2855, CI-2823, CI-2758 (above, product name manufactured by Nippon Soda Co., Ltd.), PI-2074 (product name manufactured by Rhône-Poulein Co., Ltd.), FFC509 (trade name manufactured by 3M Co., Ltd.), Rhodesill Photoinitiator 2074 (trade name manufactured by Rhodia Co., Ltd.), BBI-1 02, BBI-101 (trade name manufactured by Midori Chemical Co., Ltd.), CD-1012 (trade name manufactured by Sartomer Co., Ltd.) and the like.
上記熱硬化触媒としては、イミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、4−フェニルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−(2−シアノエチル)−2−エチル−4−メチルイミダゾール等のイミダゾール誘導体;ジシアンジアミド、ベンジルジメチルアミン、4−(ジメチルアミノ)−N,N−ジメチルベンジルアミン、4−メトキシ−N,N−ジメチルベンジルアミン、4−メチル−N,N−ジメチルベンジルアミン等のアミン化合物、アジピン酸ジヒドラジド、セバシン酸ジヒドラジド等のヒドラジン化合物;トリフェニルホスフィン等のリン化合物等が挙げられる。市販されている熱硬化触媒としては、例えば四国化成工業社製の2MZ−A、2MZ−OK、2PHZ、2P4BHZ、2P4MHZ(いずれもイミダゾール系化合物の商品名)、サンアプロ社製のU−CAT3503N、U−CAT3502T(いずれもジメチルアミンのブロックイソシアネート化合物の商品名)、DBU、DBN、U−CATSA102、U−CAT5002(いずれも二環式アミジン化合物及びその塩)等が挙げられる。これらは単独で又は2種以上を混合して使用してもかまわない。当該熱硬化触媒の配合量は、分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマーを100質量部としたとき0.1〜5質量部、好ましくは0.5〜4質量部である。 Examples of the thermosetting catalyst include imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, 1-cyanoethyl-2-phenylimidazole, 1- ( Imidazole derivatives such as 2-cyanoethyl) -2-ethyl-4-methylimidazole; dicyandiamide, benzyldimethylamine, 4- (dimethylamino) -N, N-dimethylbenzylamine, 4-methoxy-N, N-dimethylbenzylamine Amine compounds such as 4-methyl-N, N-dimethylbenzylamine, hydrazine compounds such as adipic acid dihydrazide and sebacic acid dihydrazide; phosphorus compounds such as triphenylphosphine, and the like. Examples of commercially available thermosetting catalysts include 2MZ-A, 2MZ-OK, 2PHZ, 2P4BHZ, 2P4MHZ (both trade names of imidazole compounds) manufactured by Shikoku Kasei Kogyo Co., Ltd., U-CAT3503N manufactured by San Apro, U -CAT3502T (all are trade names of blocked isocyanate compounds of dimethylamine), DBU, DBN, U-CATSA102, U-CAT5002 (all are bicyclic amidine compounds and salts thereof), and the like. These may be used alone or in admixture of two or more. The blending amount of the thermosetting catalyst is 0.1 to 5 parts by mass when the monomer having a (meth) acryloyl group and a glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less is 100 parts by mass, Preferably it is 0.5-4 mass parts.
本発明のインクジェット用光硬化性熱硬化性組成物は、粘度の調整を目的として、希釈溶剤を添加することもできる。希釈溶剤としては、例えば、メチルエチルケトン、シクロヘキサノン等のケトン類;トルエン、キシレン、テトラメチルベンゼン等の芳香族炭化水素類;セロソルブ、メチルセロソルブ、ブチルセロソルブ、カルビトール、メチルカルビトール、ブチルカルビトール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、ジプロピレングリコールジエチルエーテル、トリエチレングリコールモノエチルエーテル等のグリコールエーテル類;酢酸エチル、酢酸ブチル、セロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート等の酢酸エステル類;エタノール、プロパノール、エチレングリコール、プロピレングリコール等のアルコール類;オクタン、デカン等の脂肪族炭化水素類;石油エーテル、石油ナフサ、水添石油ナフサ、ソルベントナフサ等の石油系溶剤類等が挙げられる。 The photocurable thermosetting composition for inkjet according to the present invention may contain a diluent solvent for the purpose of adjusting the viscosity. Examples of the diluting solvent include ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene; cellosolve, methyl cellosolve, butyl cellosolve, carbitol, methyl carbitol, butyl carbitol, propylene glycol Glycol ethers such as monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol diethyl ether, triethylene glycol monoethyl ether; ethyl acetate, butyl acetate, cellosolve acetate, butyl cellosolve acetate, carbitol acetate, butyl carbitol acetate, propylene glycol Acetic acid ester such as monomethyl ether acetate and dipropylene glycol monomethyl ether acetate Alcohols such as ethanol, propanol, ethylene glycol and propylene glycol; aliphatic hydrocarbons such as octane and decane; petroleum solvents such as petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha and solvent naphtha It is done.
更に本発明の光硬化性熱硬化性組成物は、必要に応じて、フタロシアニン・ブルー、フタロシアニン・グリーン、アイオジン・グリーン、ジスアゾイエロー、クリスタルバイオレット、カーボンブラック、ナフタレンブラック等の着色剤、ハイドロキノン、ハイドロキノンモノメチルエーテル、tert−ブチルカテコール、ピロガロール、フェノチアジン等の公知慣用の重合禁止剤、シリコーン系、フッ素系、高分子系等の消泡剤及び/又はレベリング剤、イミダゾール系、チアゾール系、トリアゾール系、シランカップリング剤等の密着性付与剤等の添加剤類を配合することができる。 Further, the photo-curable thermosetting composition of the present invention may be prepared by adding colorants such as phthalocyanine blue, phthalocyanine green, iodin green, disazo yellow, crystal violet, carbon black, naphthalene black, hydroquinone, hydroquinone as necessary. Known and commonly used polymerization inhibitors such as monomethyl ether, tert-butylcatechol, pyrogallol, phenothiazine, etc., antifoaming agents and / or leveling agents such as silicone, fluorine and polymer, imidazole, thiazole, triazole, silane Additives such as adhesion-imparting agents such as coupling agents can be blended.
以下、実施例を示して本発明について具体的に説明するが、本発明はこれらの実施例のみに限定されるものではない。尚、以下において特に断りのない限り、「部」は質量部を意味する。 EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, this invention is not limited only to these Examples. In the following, “part” means part by mass unless otherwise specified.
実施例1〜5及び比較例1〜6について、表1に示す割合で各成分を配合し、これをディゾルバーで攪拌し、更に1μmのディスクフィルターでろ過を行い、各組成物を得た。 About Examples 1-5 and Comparative Examples 1-6, each component was mix | blended in the ratio shown in Table 1, this was stirred with the dissolver, and also it filtered with a 1 micrometer disk filter, and obtained each composition.
<分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマー>
GMA:グリシジルメタクリレート(粘度2mPa・s(25℃))
4HBAGE:4−ヒドロキシブチルアクリレートグリシジルエーテル(粘度7mPa・s(25℃))
<「分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマー」以外のモノマー>
EA−1010N:ビスフェノールA型エポキシ樹脂の片方のエポキシ基にアクリル酸を付加させた化合物 新中村化学工業社製(粘度22,000mPa・s(25℃))
AGE:アリルグリシジルエーテル アリル基とグリシジル基を持つ(粘度1mPa・s(25℃))
4HBA:4−ヒドロキシブチルアクリレート(粘度10mPa・s(25℃))
DPGDA:ジプロピレングリコールジアクリレート(粘度12 mPa・s(25℃))
M−100:3,4−エポキシシクロヘキシルメチルメタクリレート メタクロイルと脂環式エポキシ基を持つ化合物 ダイセル化学工業製(粘度10mPa・s(25℃))
<3官能以上のアクリレートモノマー>
PETA:ペンタエリスリトールトリアクリレート
TMPTA:トリメチロールプロパントリアクリレート
SR9011:3官能メタクリレートエステル サートマー社製
M327:ε−カプロラクトン変性トリス(アクロキシエチル)イソシアヌレート(東亞合成社製)
<熱硬化触媒>
2E4MZ:2−エチル−4−メチルイミダゾール
<光重合開始剤>
IRG819:BASF社製 イルガキュア819
<Monomer having a (meth) acryloyl group and a glycidyl group in the molecule and a viscosity at 25 ° C. of 10 mPa · s or less>
GMA: Glycidyl methacrylate (viscosity 2 mPa · s (25 ° C.))
4HBAGE: 4-hydroxybutyl acrylate glycidyl ether (viscosity 7 mPa · s (25 ° C.))
<Monomers other than “monomer having a (meth) acryloyl group and a glycidyl group in the molecule and a viscosity at 25 ° C. of 10 mPa · s or less”>
EA-1010N: Compound in which acrylic acid is added to one epoxy group of bisphenol A type epoxy resin, manufactured by Shin-Nakamura Chemical Co., Ltd. (viscosity 22,000 mPa · s (25 ° C.))
AGE: Allyl glycidyl ether with allyl group and glycidyl group (viscosity 1 mPa · s (25 ° C))
4HBA: 4-hydroxybutyl acrylate (viscosity 10 mPa · s (25 ° C.))
DPGDA: Dipropylene glycol diacrylate (viscosity 12 mPa · s (25 ° C.))
M-100: 3,4-epoxycyclohexylmethyl methacrylate Compound having methacryloyl and alicyclic epoxy group, manufactured by Daicel Chemical Industries (viscosity: 10 mPa · s (25 ° C.))
<Trifunctional or higher acrylate monomer>
PETA: Pentaerythritol triacrylate TMPTA: Trimethylolpropane triacrylate SR9011: Trifunctional methacrylate ester M327: ε-caprolactone-modified tris (acryloxyethyl) isocyanurate (manufactured by Toagosei Co., Ltd.)
<Thermosetting catalyst>
2E4MZ: 2-ethyl-4-methylimidazole <photopolymerization initiator>
IRG819: Irgacure 819 manufactured by BASF
上記各組成物について以下に示す特性試験を行った。その結果を表2に示す。 The following characteristic tests were performed on each of the above compositions. The results are shown in Table 2.
<塗布性>
富士フィルム製インクジェットプリンターDimatix Materials Printer DMP−2831を用い、インクジェットプリント用紙(エプソン フォトマット紙 A4)に、上記各組成物で幅が100μmで一辺の長さが20mmのL型ラインを印刷した。当該L型ラインについて、ルーペで観察し、ラインの形状を以下のとおり評価した。
○:ラインにかすれやよれがなく正しく描画できている。
×:ラインが確認できない、又はラインにかすれやよれが発生している。
<Applicability>
An L-shaped line having a width of 100 μm and a side length of 20 mm was printed on an inkjet print paper (Epson Photomat Paper A4) using an Fujifilm inkjet printer, Dimatix Materials Printer DMP-2831. The L-shaped line was observed with a loupe, and the shape of the line was evaluated as follows.
○: The line is not blurred or twisted and drawn correctly.
X: The line cannot be confirmed, or the line is blurred or twisted.
<光硬化性>
富士フィルム製インクジェットプリンターDimatix Materials Printer DMP−2831を用い、プリント配線板用銅張積層板(FR−4 厚み1.6mm 大きさ150×95mm)に、上記各組成物で10×20mmの大きさの長方形のパターンを印刷した。その直後に、上記印刷済みの積層板に対して高圧水銀灯を用いて300mJ/cm2の積算光量でUV照射した。当該長方形パターンについて、UV照射後の硬化状態について以下のとおり評価した。
○:硬化しており、形状保持している。
×:硬化せず。
<Photocurability>
Using a Fujifilm inkjet printer Dimatix Materials Printer DMP-2831, a copper-clad laminate for printed wiring boards (FR-4 thickness 1.6 mm, size 150 × 95 mm) with the above composition having a size of 10 × 20 mm. A rectangular pattern was printed. Immediately thereafter, the printed laminate was irradiated with UV at an integrated light amount of 300 mJ / cm 2 using a high-pressure mercury lamp. About the said rectangular pattern, it evaluated as follows about the hardening state after UV irradiation.
○: Cured and shape retained.
X: Not cured.
<密着性>
富士フィルム製インクジェットプリンターDimatix Materials Printer DMP−2831を用い、プリント配線板用銅張積層板(FR−4 厚み1.6mm 大きさ150×95mm)に、上記各組成物で10×20mmの大きさの長方形のパターンを膜厚が15μmになるように印刷した。その直後に上記印刷済みの積層板に対して、高圧水銀灯を用いて300mJ/cm2の積算光量でUV照射した。次いで、当該UV照射済の積層板を熱風循環式乾燥炉にて150℃30分加熱し、上記パターンを熱硬化させて各試験片を得た。当該各試験片の長方形パターンにカッターナイフで縦横に1本ずつ切り込みをいれ、これについてセロハンテープでピーリングを行い、そのはがれについて以下のとおり評価を行った。
○:ほとんどはがれが見られない。
×:セローテプ(登録商標)に大きく転写するはがれがある。
<Adhesion>
Using a Fujifilm inkjet printer Dimatix Materials Printer DMP-2831, a copper-clad laminate for printed wiring boards (FR-4 thickness 1.6 mm, size 150 × 95 mm) with the above composition having a size of 10 × 20 mm. A rectangular pattern was printed so that the film thickness was 15 μm. Immediately thereafter, the printed laminate was irradiated with UV light at a cumulative light quantity of 300 mJ / cm 2 using a high-pressure mercury lamp. Then, the UV-irradiated laminate was heated at 150 ° C. for 30 minutes in a hot air circulation drying furnace, and the pattern was thermally cured to obtain each test piece. The rectangular pattern of each test piece was cut one by one vertically and horizontally with a cutter knife, peeled with cellophane tape, and the peeling was evaluated as follows.
○: Mostly no peeling is observed.
X: There is peeling that is largely transferred to Serotep (registered trademark).
<耐薬品性>
上記各組成物について、上記密着性試験に記載した方法と同様の方法で各試験片を作製した。当該各試験片について、プロピレングリコールモノメチルエーテルアセテートに室温で30分浸漬させ、これを取り出した後に乾燥させた。乾燥後の各試験片について、塗膜の状態を目視にて以下のとおり評価した。
○:塗膜の状態に変化なし
×:塗膜に浮き、はがれがある
<Chemical resistance>
About each said composition, each test piece was produced by the method similar to the method described in the said adhesive test. Each test piece was immersed in propylene glycol monomethyl ether acetate for 30 minutes at room temperature, taken out, and then dried. About each test piece after drying, the state of the coating film was visually evaluated as follows.
○: No change in the state of the coating film ×: Floating on the coating film, peeling
<耐熱性>
上記各組成物について、上記密着性試験に記載した方法と同様の方法で各試験片を作製した。当該各試験片について、ロジン系フラックスを塗布して、260℃のはんだ槽に10秒間浸漬し、これを取り出して自然冷却した。この試験を3回繰返した後、各試験片の塗膜の状態を目視にて以下のとおり評価した。
○:塗膜の状態に変化なし
×:塗膜に浮き、はがれがある
<Heat resistance>
About each said composition, each test piece was produced by the method similar to the method described in the said adhesive test. About each said test piece, the rosin system flux was apply | coated, and it was immersed in the soldering bath of 260 degreeC for 10 second, this was taken out and naturally cooled. After repeating this test three times, the state of the coating film of each test piece was visually evaluated as follows.
○: No change in the state of the coating film ×: Floating on the coating film, peeling
<絶縁性>
上記実施例1〜5の組成物について、銅張り積層板の代わりにIPC B−25テストパターンのクシ型電極Bクーポンを用い、また膜厚を40μmにしたこと以外は密着性試験に記載の方法と同様の方法で各試験片を作製した。この試験片に、DC500Vのバイアスを印加し、絶縁抵抗値を測定した。値が100GΩ以上であれば○、100GΩ未満であれば×とした。
<Insulation>
About the composition of the said Examples 1-5, the method as described in an adhesive test except having used the comb-type electrode B coupon of the IPC B-25 test pattern instead of the copper clad laminated board, and having made film thickness into 40 micrometers. Each test piece was prepared in the same manner as described above. A DC 500 V bias was applied to the test piece, and the insulation resistance value was measured. When the value was 100 GΩ or more, it was rated as “◯”, and when it was less than 100 GΩ, it was marked as “X”.
Claims (4)
3官能以上のアクリレートモノマーと、
熱硬化触媒と、
光重合開始剤を含み、
前記熱硬化触媒の配合量が分子内に(メタ)アクリロイル基とグリシジル基を有し25℃での粘度が10mPa・s以下のモノマー100質量部に対して0.1〜5質量部であることを特徴とする、150℃以下の低温硬化用のインクジェット用光硬化性熱硬化性組成物。 A monomer having a (meth) acryloyl group and a glycidyl group in the molecule and having a viscosity at 25 ° C. of 10 mPa · s or less,
Trifunctional or higher acrylate monomers;
A thermosetting catalyst;
Including a photopolymerization initiator,
The blending amount of the thermosetting catalyst is 0.1 to 5 parts by mass with respect to 100 parts by mass of the monomer having a (meth) acryloyl group and a glycidyl group in the molecule and a viscosity at 25 ° C. of 10 mPa · s or less. A photocurable thermosetting composition for inkjets for low-temperature curing at 150 ° C. or lower.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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JP2011078844A JP5829034B2 (en) | 2011-03-31 | 2011-03-31 | Photocurable thermosetting composition for inkjet and printed wiring board using the same |
KR1020137022869A KR101523160B1 (en) | 2011-03-31 | 2012-03-28 | Photocurable/thermosetting inkjet composition, and printed wiring board using same |
PCT/JP2012/002142 WO2012132423A1 (en) | 2011-03-31 | 2012-03-28 | Photocurable/thermosetting inkjet composition, and printed wiring board using same |
CN201280011155.4A CN103403106B (en) | 2011-03-31 | 2012-03-28 | Photocurable/thermosetting inkjet composition, and printed wiring board using same |
TW101111067A TWI509033B (en) | 2011-03-31 | 2012-03-29 | A photohardenable thermosetting composition for inkjet and a printed circuit board using the same |
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JP2011078844A JP5829034B2 (en) | 2011-03-31 | 2011-03-31 | Photocurable thermosetting composition for inkjet and printed wiring board using the same |
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JP5758472B2 (en) * | 2013-11-05 | 2015-08-05 | 太陽インキ製造株式会社 | Curable composition for printed wiring board, cured coating film using the same, and printed wiring board |
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