JP5895838B2 - 分離膜エレメントおよび複合半透膜の製造方法 - Google Patents
分離膜エレメントおよび複合半透膜の製造方法 Download PDFInfo
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- JP5895838B2 JP5895838B2 JP2012507742A JP2012507742A JP5895838B2 JP 5895838 B2 JP5895838 B2 JP 5895838B2 JP 2012507742 A JP2012507742 A JP 2012507742A JP 2012507742 A JP2012507742 A JP 2012507742A JP 5895838 B2 JP5895838 B2 JP 5895838B2
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- functional layer
- reagent
- separation functional
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- polyamide separation
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- 238000000926 separation method Methods 0.000 title claims description 199
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- 239000003153 chemical reaction reagent Substances 0.000 claims description 91
- 239000004952 Polyamide Substances 0.000 claims description 86
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- 239000000243 solution Substances 0.000 claims description 38
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- 125000000524 functional group Chemical group 0.000 claims description 23
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- 125000003277 amino group Chemical group 0.000 claims description 15
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- 238000000034 method Methods 0.000 description 33
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- 229920002492 poly(sulfone) Polymers 0.000 description 6
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 5
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- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 3
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- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
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- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical compound C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
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- RXCMFQDTWCCLBL-UHFFFAOYSA-N 4-amino-3-hydroxynaphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(N)=C(O)C=C(S(O)(=O)=O)C2=C1 RXCMFQDTWCCLBL-UHFFFAOYSA-N 0.000 description 2
- HBZVNWNSRNTWPS-UHFFFAOYSA-N 6-amino-4-hydroxynaphthalene-2-sulfonic acid Chemical compound C1=C(S(O)(=O)=O)C=C(O)C2=CC(N)=CC=C21 HBZVNWNSRNTWPS-UHFFFAOYSA-N 0.000 description 2
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 238000012695 Interfacial polymerization Methods 0.000 description 2
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- 239000003963 antioxidant agent Substances 0.000 description 2
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- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- 238000011084 recovery Methods 0.000 description 2
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- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
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- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- KLYWOECPXNAJPC-UHFFFAOYSA-N naphthalen-1-amine;naphthalen-2-amine Chemical compound C1=CC=CC2=CC(N)=CC=C21.C1=CC=C2C(N)=CC=CC2=C1 KLYWOECPXNAJPC-UHFFFAOYSA-N 0.000 description 1
- WUQGUKHJXFDUQF-UHFFFAOYSA-N naphthalene-1,2-dicarbonyl chloride Chemical compound C1=CC=CC2=C(C(Cl)=O)C(C(=O)Cl)=CC=C21 WUQGUKHJXFDUQF-UHFFFAOYSA-N 0.000 description 1
- 230000008764 nerve damage Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000003204 osmotic effect Effects 0.000 description 1
- LSHSZIMRIAJWRM-UHFFFAOYSA-N oxolane-2,3-dicarbonyl chloride Chemical compound ClC(=O)C1CCOC1C(Cl)=O LSHSZIMRIAJWRM-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000004986 phenylenediamines Chemical group 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- BCIIMDOZSUCSEN-UHFFFAOYSA-N piperidin-4-amine Chemical compound NC1CCNCC1 BCIIMDOZSUCSEN-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 125000004585 polycyclic heterocycle group Chemical group 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- OUYCCCASQSFEME-UHFFFAOYSA-N tyrosine Natural products OC(=O)C(N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0002—Organic membrane manufacture
- B01D67/0006—Organic membrane manufacture by chemical reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
- B01D67/00931—Chemical modification by introduction of specific groups after membrane formation, e.g. by grafting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/106—Membranes in the pores of a support, e.g. polymerized in the pores or voids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/107—Organic support material
- B01D69/1071—Woven, non-woven or net mesh
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1213—Laminated layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1216—Three or more layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/10—Specific pressure applied
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/40—Details relating to membrane preparation in-situ membrane formation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/50—Control of the membrane preparation process
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/108—Boron compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/08—Seawater, e.g. for desalination
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Description
(1) 基材と多孔性支持層とからなる微多孔性支持体上にポリアミド分離機能層を有する複合半透膜を備えた分離膜エレメントであって、該ポリアミド分離機能層の黄色度が10以上40以下であり、該基材からの溶出物濃度が1.0×10−3重量%以下である分離膜エレメント。
(2) 前記ポリアミド分離機能層において、多孔性支持層側の面および該多孔性支持層とは反対側の面それぞれの官能基比率を(アゾ基のモル当量+フェノール性水酸基のモル当量+アミノ基のモル当量)/(アミド基のモル当量)と表したとき、(多孔性支持層とは反対側の面の官能基比率)/(多孔質支持層側の面の官能基比率)が1.1以上である、前記(1)記載の分離膜エレメント。
(3) 前記基材がポリエステルの長繊維不織布である、前記(1)または(2)記載の分離膜エレメント。
(4) 基材と多孔性支持層とからなる微多孔性支持体上で、多官能アミン水溶液と多官能酸ハロゲン化物含有溶液とを接触させて第一級アミノ基を有するポリアミド分離機能層を形成した後に、該ポリアミド分離機能層に、前記第一級アミノ基と反応してジアゾニウム塩またはその誘導体を生成する試薬(A)および前記ジアゾニウム塩またはその誘導体と反応する試薬(B)を接触させ、複合半透膜を製造する方法であって、前記試薬(A)を0.2MPa以上の圧力でポリアミド分離機能層表面に接触させ、かつ、前記試薬(B)の濃度と前記試薬(B)と前記ポリアミド分離機能層との接触時間の積(ppm・min)を200,000ppm・min以下とすることを特徴とする複合半透膜の製造方法。
(5) 基材と多孔性支持層とからなる微多孔性支持体上で、多官能アミン水溶液と多官能酸ハロゲン化物含有溶液とを接触させて第一級アミノ基を有するポリアミド分離機能層を形成した後に、該ポリアミド分離機能層上で、第一級アミノ基を有する試薬(C)と該第一級アミノ基と反応してジアゾニウム塩またはその誘導体を生成する試薬(D)とを接触させて複合半透膜を製造する方法であって、前記試薬(D)を0.2MPa以上の圧力でポリアミド分離機能層表面に接触させ、かつ、前記試薬(C)の濃度と前記試薬(C)が前記ポリアミド分離機能層へ接触する時間との積(ppm・min)を200,000ppm・min以下とすることを特徴とする複合半透膜の製造方法。
溶出物の抽出は、エタノール中に基材を8時間浸漬させることによって行う。エタノール中に基材を8時間浸漬させることによって、溶出物がほぼエタノールに抽出されると考えられる。
分離膜エレメントを解体し、複合半透膜を取り出す。複合半透膜の液滴を除き、複合半透膜を10×10cm切り出して、基材を剥離した。これを、エタノール50gに8時間浸漬し、エタノールに抽出された成分をあらかじめ検量線を得た紫外可視分光光度計(島津製作所製 UV−2450)で測定し、基材からの溶出物重量を算出した。次いで、エタノール中から、基材を取り出し、60℃で4時間加熱して乾燥させ、デシケータ内で室温まで冷却させた後、重量測定を行い、次の式から、基材からの溶出物濃度を求めた。
(黄色度)
分離膜エレメントを解体し、複合半透膜を取り出す。複合半透膜を室温で8時間乾燥したのち、ポリアミド分離機能層表面にセロハンテープ(ニチバン株式会社製 CT405AP−18)を貼り付け、セロハンテープをゆっくり剥離し、ポリアミド分離機能層をセロハンテープに付着させた。剥したセロハンテープをガラス板上に固定し、スガ試験器株式会社製SMカラーコンピュータSM−7により測定し、ポリアミド分離機能層の黄色度を算出した。
上記のように乾燥させた複合半透膜から基材を剥離・除去し、分離機能層・多孔性支持層をシリコンウェハ上に、分離機能層または多孔性支持層を表面にして固定し、ジクロロメタンにより多孔性支持層を溶解・除去し、それぞれ複合半透膜表面に相当する面(多孔性支持層とは反対側の面)および多孔性支持層側の面のサンプルとした。それらサンプルについてXPS測定し、(アゾ基のモル当量+フェノール性水酸基のモル当量+アミノ基のモル当量)、(アミド基のモル当量)を求め、以下の式で表される官能基比率、そしてそれら官能基比率の比を求めた。
官能基比率=(アゾ基のモル当量+フェノール性水酸基のモル当量+アミノ基のモル当量)/(アミド基のモル当量)
官能基比率比=(多孔性支持層とは反対側の面の官能基比率)/(多孔質支持層側の面の官能基比率)
装置:ESCALAB220iXL(英国 VG Scientific社製)
励起X線:アルミニウム K α 1、2線(1486.6eV)
X線出力:10kV 20mV
光電子脱出角度:90°
(エレメントの各種特性)
分離膜エレメントを圧力容器に入れ、ホウ素を5ppm含む3.5重量%食塩水を用い、温度25℃、pH6.5、操作圧力5.5MPaで3時間運転(回収率8%)した。その時の透過水、供給水の水質とともに膜透過水量を測定することにより、以下の特性を求めた。
TDS除去率(%)=100×{1−(透過水中のTDS濃度/供給水中のTDS濃度)}
(造水量)
供給水(海水)の膜透過水量を、膜エレメントあたり、1日あたりの透水量(立方メートル)を造水量(m3/日)として表した。
供給水と透過水中のホウ素濃度をICP発光分析装置(日立製作所製 P−4010)で分析し、次の式から求めた。
ホウ素除去率(%)=100×{1−(透過水中のホウ素濃度/供給水中のホウ素濃度)}。
短繊維ポリエステル抄紙不織布(通気度1cc/cm2/sec)上にポリスルホンの15.7重量%DMF溶液を200μmの厚みで室温(25℃)でキャストし、ただちに純水中に浸漬して5分間放置することによって微多孔性支持体(厚さ210〜215μm)のロールを作製した。得られた微多孔性支持体に、mPDAの4.0重量%水溶液を塗布し、エアーノズルから窒素を吹き付け支持膜表面から余分な水溶液を取り除いた後、トリメシン酸クロリド0.165重量%を含むn−デカン溶液を表面が完全に濡れるように塗布した。次に、膜から余分な溶液をエアーブローで除去し、90℃の熱水で2分間洗浄して、微多孔性支持体上に分離機能層を有する複合半透膜のロールを得た。
参考例1で得られた分離膜エレメントを圧力容器に入れ、該エレメントに、工程(a)としてmPDA500ppmの水溶液を通液し、60分間静置した後、30℃の純水でフラッシングした。次に工程(b)、硫酸によりpH3に調整した250ppmの亜硝酸ナトリウム水溶液を、室温(30℃)、1.0MPaの加圧下で30分間通液処理した後、純水でフラッシングした。その後0.1重量%の亜硫酸ナトリウム水溶液を通液し、10分間静置した。
工程(a)、工程(b)、およびそれら工程の順序を表1に記載した条件に変更した以外は実施例1と同様にして処理して、評価した。結果を表2に示す。
基材として長繊維ポリエステル不織布を用いた以外は、参考例1と同様にして、分離膜エレメントを作製した。
参考例2で得られた分離膜エレメントを用い、工程(a)、工程(b)、およびそれら工程の順序を表2に記載した条件に変更した以外は実施例1と同様にして処理して、評価した。結果を表2に示す。
次亜塩素酸ナトリウム(塩素20ppm)と臭化ナトリウム10ppmの溶液(pH6)を調整した。参考例1で得られた分離膜エレメントを圧力容器に入れ、該エレメントに、調整した溶液を室温(30℃)、1.5MPaの加圧下で30分間通液処理した後、純水でフラッシングした。結果を表2に示す。
Claims (4)
- 基材と多孔性支持層とからなる微多孔性支持体上にポリアミド分離機能層を有する複合半透膜を備えた分離膜エレメントであって、
前記ポリアミド分離機能層に、芳香族アミン誘導体がアゾ基を介して共有結合しているか、アゾ基を有する芳香族アミン誘導体が吸着されており、
該ポリアミド分離機能層の黄色度が10以上40以下であり、
該基材からの溶出物濃度が1.0×10−3重量%以下であり、
前記ポリアミド分離機能層において、該微多孔性支持層側の面および該多孔性支持層とは反対側の面それぞれの官能基比率を(アゾ基のモル当量+フェノール性水酸基のモル当量+アミノ基のモル当量)/(アミド基のモル当量)と表したとき、(多孔性支持層とは反対側の面の官能基比率)/(多孔質支持層側の面の官能基比率)が1.1以上である、
る分離膜エレメント。 - 前記基材がポリエステルの長繊維不織布である、請求項1記載の分離膜エレメント。
- 基材と多孔性支持層とからなる微多孔性支持体上で、多官能アミン水溶液と多官能酸ハロゲン化物含有溶液とを接触させて第一級アミノ基を有するポリアミド分離機能層を形成した後に、該ポリアミド分離機能層に、前記第一級アミノ基と反応してジアゾニウム塩またはその誘導体を生成する試薬(A)および前記ジアゾニウム塩またはその誘導体と反応する試薬(B)を接触させ、複合半透膜を製造する方法であって、
前記試薬(B)は芳香族アミン誘導体であって、
前記試薬(A)を0.2MPa以上の圧力でポリアミド分離機能層表面に接触させ、かつ、前記試薬(B)の濃度と前記試薬(B)と前記ポリアミド分離機能層との接触時間の積(ppm・min)を200,000ppm・min以下とすることを特徴とする複合半透膜の製造方法。 - 基材と多孔性支持層とからなる微多孔性支持体上で、多官能アミン水溶液と多官能酸ハロゲン化物含有溶液とを接触させて第一級アミノ基を有するポリアミド分離機能層を形成した後に、該ポリアミド分離機能層上で、第一級アミノ基を有する試薬(C)と該第一級アミノ基と反応してジアゾニウム塩またはその誘導体を生成する試薬(D)とを接触させて複合半透膜を製造する方法であって、
前記試薬(C)は芳香族アミン誘導体であって、
前記試薬(D)を0.2MPa以上の圧力でポリアミド分離機能層表面に接触させ、かつ、前記試薬(C)の濃度と前記試薬(C)が前記ポリアミド分離機能層へ接触する時間との積(ppm・min)を200,000ppm・min以下とすることを特徴とする複合半透膜の製造方法。
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