JP5617645B2 - ORGANIC ELECTROLUMINESCENT ELEMENT MATERIAL, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY DEVICE AND LIGHTING DEVICE USING THE SAME - Google Patents
ORGANIC ELECTROLUMINESCENT ELEMENT MATERIAL, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY DEVICE AND LIGHTING DEVICE USING THE SAME Download PDFInfo
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- JP5617645B2 JP5617645B2 JP2011003768A JP2011003768A JP5617645B2 JP 5617645 B2 JP5617645 B2 JP 5617645B2 JP 2011003768 A JP2011003768 A JP 2011003768A JP 2011003768 A JP2011003768 A JP 2011003768A JP 5617645 B2 JP5617645 B2 JP 5617645B2
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
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Description
本発明は、新規な有機エレクトロルミネッセンス素子用材料、及びこれを用いた有機エレクトロルミネッセンス素子、表示素子、照明装置に関するものである。 The present invention relates to a novel organic electroluminescent element material, and an organic electroluminescent element, a display element, and a lighting device using the same.
従来、発光型の電子ディスプレイデバイスとしてエレクトロルミネッセンスディスプレイ(以下、ELDと言う)がある。ELDとして、無機エレクトロルミネッセンス素子や有機エレクトロルミネッセンス素子(以下、有機ELとも言う)が挙げられる。無機エレクトロルミネッセンス素子は平面型光源として使用されてきたが、発光素子を駆動させるためには高電圧が必要である。有機エレクトロルミネッセンス素子においては発光する化合物を含有する発光層、さらに必要に応じて複数の有機化合物層を陰極と陽極で挟んだ構成を有し、発光層に電子および正孔を注入して、再結合させることにより励起子(エキシトン)を生成させ、この励起子が失活する際の光の放出(蛍光・リン光)を利用して発光する素子であり、数V〜数十V程度の低電圧で発光が可能であり、更に自己発光型であるために視野角に富み、視認性が高く、薄膜型の完全固体素子であるために省スペース、携帯性の観点からも注目されている。 Conventionally, there is an electroluminescence display (hereinafter referred to as ELD) as a light-emitting electronic display device. As ELD, an inorganic electroluminescence element and an organic electroluminescence element (hereinafter, also referred to as organic EL) can be given. Inorganic electroluminescent elements have been used as planar light sources, but a high voltage is required to drive the light emitting elements. An organic electroluminescence device has a light-emitting layer containing a compound that emits light, and a structure in which a plurality of organic compound layers are sandwiched between a cathode and an anode as necessary. It is an element that emits light by utilizing the emission of light (fluorescence / phosphorescence) when excitons (excitons) are generated by bonding, and the excitons are deactivated. Since it is capable of emitting light by voltage, and is self-luminous, it has a wide viewing angle, high visibility, and since it is a thin-film complete solid-state device, it has attracted attention from the viewpoint of space saving and portability.
しかしながら、今後の実用化に向けた有機エレクトロルミネッセンス素子においては、更に効率が高く、長寿命に発光する有機エレクトロルミネッセンス素子の開発が望まれている。 However, in the organic electroluminescence device for practical use in the future, development of an organic electroluminescence device that emits light with higher efficiency and longer life is desired.
また、有機エレクトロルミネッセンス素子の発光材料に蛍光材料だけでなくリン光材料の利用が可能なことが明らかとなり鋭意研究開発が行われている。一重項励起子と三重項励起子の生成比は1:3であるが、蛍光材料の場合、励起一重項のみを利用できるのに対し、リン光材料の場合には励起一重項に加えて励起三重項も利用できるため、内部量子効率の上限を100%とすることができる。このため、蛍光材料に比較してリン光材料を利用した場合、原理的に発光効率が4倍となり、冷陰極管とほぼ同等の性能が得られる可能性があることから照明用途としても注目されている。 In addition, it has become clear that not only fluorescent materials but also phosphorescent materials can be used as light-emitting materials for organic electroluminescence elements, and research and development has been conducted earnestly. The generation ratio of singlet excitons and triplet excitons is 1: 3. In the case of fluorescent materials, only excited singlets can be used, whereas in the case of phosphorescent materials, excitation is performed in addition to excited singlets. Since triplet can also be used, the upper limit of internal quantum efficiency can be made 100%. For this reason, when a phosphorescent material is used compared to a fluorescent material, the luminous efficiency is four times in principle, and there is a possibility of obtaining almost the same performance as a cold cathode tube. ing.
一方、有機エレクトロルミネッセンス素子の寿命を改善する手段の一つとして、含有される化合物の構造に着目した研究が進められてきた結果、実用に耐えうる可能性のある材料が幾つか見出されている。 On the other hand, as a means of improving the lifetime of organic electroluminescence devices, research focused on the structure of the compound contained has resulted in the discovery of some materials that could withstand practical use. Yes.
環状構造を有する有機エレクトロルミネッセンス素子用材料については、(チア)カリックスアレーン類のようにアリーレン基とヘテロ原子あるいはアリーレン基とアルキレン基による環状構造を有する材料(例えば、特許文献1、2参照。)、直接アリーレン基を結合した環状化合物材料(例えば、特許文献3参照。)や環状シロキサン構造(例えば特許文献4参照。)が既に開示されている。 Regarding materials for organic electroluminescence devices having a cyclic structure, materials having a cyclic structure with an arylene group and a heteroatom or an arylene group and an alkylene group, such as (thia) calixarenes (see, for example, Patent Documents 1 and 2). In addition, a cyclic compound material having an arylene group directly bonded thereto (for example, see Patent Document 3) and a cyclic siloxane structure (for example, see Patent Document 4) have already been disclosed.
しかしながら、これらの環状化合物は、鎖状化合物に比較して素子の安定性に優れるものの、素子として利用した場合には他の材料との相性に課題があり、またリン光波長が長く、青色リン光発光ドーパントを用いた場合に、効率が実用上、不十分であることが明らかとなった。 However, these cyclic compounds are superior in stability of the device as compared with chain compounds, but have problems in compatibility with other materials when used as devices, have a long phosphorescence wavelength, and are blue phosphorescent. When using a light-emitting dopant, it became clear that the efficiency was insufficient practically.
本発明の目的は、高効率、長寿命で、ダークスポットの少ない有機エレクトロルミネッセンス素子、およびこれを用いた表示装置、照明装置を提供することである。 An object of the present invention is to provide an organic electroluminescence element with high efficiency, long life and few dark spots, and a display device and an illumination device using the organic electroluminescence element.
本発明の上記目的は、以下の構成1〜6により達成することができる。
具体的に本発明によれば、構成1において、一般式(1)中、XはSiR 1 R 2 、PR 3 、P(=Y)R 4 、O、S、SO 2 、NR 5 、CR 6 R 7 またはC(=O)を表し、少なくとも1つのXがSiR 1 R 2 、PR 3 またはP(=Y)R 4 を表す有機エレクトロルミネッセンス素子用材料が提供される。
The above object of the present invention can be achieved by the following configurations 1 to 6 .
Specifically, according to the present invention, in the constitution 1, in the general formula (1), X is SiR 1 R 2 , PR 3 , P (= Y) R 4 , O, S, SO 2 , NR 5 , CR 6. There is provided a material for an organic electroluminescence device which represents R 7 or C (═O), and at least one X represents SiR 1 R 2 , PR 3 or P (= Y) R 4 .
1.下記一般式(1)で表されることを特徴とする有機エレクトロルミネッセンス素子用材料。 1. An organic electroluminescent element material represented by the following general formula (1).
〔式中、ArとXは互いに結合して8員環以上の環状化合物を形成し、mおよびnは1以上の整数を表し、m個のArは同一でも異なっていてもよく、n個のmおよびXは同一でも異なっていても良い。Arは芳香族炭化水素環または芳香族複素環を表す。総てのmが1の場合、少なくとも1つのXはSiR1R2、PR3またはP(=Y)R4を表し、mが2以上の場合、XはSiR1R2、PR3、P(=Y)R4、O、S、SO2、NR5、CR6R7またはC(=O)を表す。Yは酸素、硫黄またはセレンを表し、R1からR7はそれぞれ置換基を表す。〕
2.前記一般式(1)において、XはSiR1R2、PR3またはP(=Y)R4のいずれかであることを特徴とする前記1に記載の有機エレクトロルミネッセンス素子用材料。
[In the formula, Ar and X are bonded to each other to form an 8-membered or higher cyclic compound, m and n represent an integer of 1 or more, m Ar may be the same or different, and n m and X may be the same or different. Ar represents an aromatic hydrocarbon ring or an aromatic heterocyclic ring. When all m are 1, at least one X represents SiR 1 R 2 , PR 3 or P (= Y) R 4, and when m is 2 or more, X is SiR 1 R 2 , PR 3 , P (= Y) represents R 4 , O, S, SO 2 , NR 5 , CR 6 R 7 or C (═O). Y represents oxygen, sulfur or selenium, and R 1 to R 7 each represents a substituent. ]
2. 2. The organic electroluminescent element material according to 1 above, wherein in the general formula (1), X is any one of SiR 1 R 2 , PR 3 or P (= Y) R 4 .
3.前記1または2に記載の有機エレクトロルミネッセンス素子用材料を含有することを特徴とする有機エレクトロルミネッセンス素子。 3. 3. An organic electroluminescence device comprising the material for an organic electroluminescence device according to 1 or 2 above.
4.前記1または2に記載の有機エレクトロルミネッセンス素子用材料を含有する層が湿式法(ウェットプロセス)により形成されたことを特徴とする有機エレクトロルミネッセンス素子。 4). 3. An organic electroluminescence device, wherein the layer containing the material for an organic electroluminescence device according to the above 1 or 2 is formed by a wet method (wet process).
5.前記3または4に記載の有機エレクトロルミネッセンス素子を備えたことを特徴とする表示装置。 5. 5. A display device comprising the organic electroluminescence element as described in 3 or 4 above.
6.前記3または4に記載の有機エレクトロルミネッセンス素子を備えたことを特徴とする照明装置。 6). 5. An illuminating device comprising the organic electroluminescence element as described in 3 or 4 above.
本発明により、高効率、長寿命で、ダークスポットの少ない有機エレクトロルミネッセンス素子、およびこれを用いた表示装置、照明装置を提供することができた。 According to the present invention, it was possible to provide an organic electroluminescence element with high efficiency, long life, and few dark spots, and a display device and an illumination device using the same.
本発明者らは上記課題に鑑み、鋭意検討を行う中で大環状化合物に着目し、その課題を克服することで本発明を達成するに至った。 In view of the above problems, the present inventors have focused on macrocyclic compounds during intensive studies, and have achieved the present invention by overcoming these problems.
即ち、大環状化合物の環状構造の一部にXで表される基を導入した、前記一般式(1)で表される化合物とすることで、素子の安定性を向上させると共に、併用した他の有機エレクトロルミネッセンス素子用材料との相性が良く、安定した有機エレクトロルミネッセンス素子を提供できることを見出した。また、青色発光リン光ドーパントを用いた場合にも良好な素子性能を示す有機エレクトロルミネッセンス素子を提供できること、さらには塗布製膜可能な材料を提供できることを見出した。 That is, by using the compound represented by the general formula (1) in which a group represented by X is introduced into a part of the ring structure of the macrocyclic compound, the stability of the device is improved and the combination is used together. The present inventors have found that a stable organic electroluminescence device can be provided that has good compatibility with the organic electroluminescence device material. In addition, it has been found that an organic electroluminescence device exhibiting good device performance can be provided even when a blue light emitting phosphorescent dopant is used, and further, a material capable of being coated and formed can be provided.
これらの要因としては、環状化合物の一部にXで表される基を導入した、前記一般式(1)で表される構造にすることで、環全体あるいは環を構成するAr同士の平面性とねじれを適切な程度に調整できたため他材料との相性が良く、膜質が向上したためと予想している。また更にはXで表される基を導入することでリン光発光波長の長波化を抑制することが可能になったためと考えている。このような要因により、本発明の有機エレクトロルミネッセンス素子用材料を用いて有機エレクトロルミネッセンス素子の有機層を形成した場合、他の材料との相性が良く、化合物だけではなく素子としての安定性に優れること、さらに青色リン光発光ドーパントに対しても高効率な発光が可能になったものと推測している。 As these factors, by making the structure represented by the general formula (1) in which a group represented by X is introduced into a part of the cyclic compound, the entire ring or the planarity of Ars constituting the ring The torsion can be adjusted to an appropriate level, so the compatibility with other materials is good and the film quality is expected to improve. Furthermore, it is considered that the introduction of a group represented by X has made it possible to suppress the phosphorescence emission wavelength from becoming longer. Due to these factors, when the organic electroluminescent element organic layer is formed using the organic electroluminescent element material of the present invention, the compatibility with other materials is good, and the stability as an element as well as a compound is excellent. In addition, it is presumed that high-efficiency light emission is possible even for blue phosphorescent dopants.
本発明の有機エレクトロルミネッセンス素子用材料は、前記一般式(1)で表される事を特徴とする。 The material for an organic electroluminescence element of the present invention is represented by the general formula (1).
前記一般式(1)において、Arはそれぞれ同一、あるいは異なっていてもよい芳香族炭化水素環(芳香族炭素環基、アリール基等ともいい、例えば、フェニル基、p−クロロフェニル基、メシチル基、トリル基、キシリル基、ナフチル基、アントリル基、アズレニル基、アセナフテニル基、フルオレニル基、フェナントリル基、インデニル基、ピレニル基、ビフェニリル基等)、芳香族複素環基(例えば、ピリジル基、ピリミジル基、フリル基、ピロリル基、イミダゾリル基、ベンゾイミダゾリル基、ピラゾリル基、ピラジニル基、トリアゾリル基(例えば、1,2,4−トリアゾール−1−イル基、1,2,3−トリアゾール−1−イル基等))、オキサゾリル基、ベンゾオキサゾリル基、チアゾリル基、イソオキサゾリル基、イソチアゾリル基、フラザニル基、チエニル基、キノリル基、ベンゾフリル基、ジベンゾフリル基、ベンゾチエニル基、ジベンゾチエニル基、インドリル基、カルバゾリル基、カルボリニル基、ジアザカルボリル基(前記、カルボリニル基のカルボリン環構成する炭素原子の一つが窒素原子で置き換わったもの)、キノキサリニル基、トリアジニル基、キナゾリニル基、フタラジニル基等)であり、より好ましい芳香族炭化水素環として、フェニル基、ナフチル基、フルオレニル基、フェナントリル基、ビフェニリル基、フルオレノニル基が挙げられ、同様により好ましい芳香族複素環基として、ピリジル基、ピリミジル基、イミダゾリル基、ベンゾイミダゾリル基、ピラゾリル基、チエニル基、キノリル基、インドリル基、ジベンゾフリル基、カルバゾリル基、カルボリニル基、ジアザカルボリニル基が挙げられ、更に好ましくはフェニル基、ナフチル基、ビフェニル基、フルオレニル基、ピリジル基、チエニル基、ジベンゾフリル基、カルバゾリル基、カルボリニル基、ジアザカルバゾリル基が挙げられる。これらArは任意の位置で他のArあるいはXと結合し、連結位置は同一でも異なっていてもよい。Arは更に置換基を有していても良く、このような置換基として、アルキル基、シクロアルキル基、アルキニル基、芳香族炭化水素環基、芳香族複素環基、複素環基(例えば、ピロリジル基、イミダゾリジル基、モルホリニル基、オキサゾリジル基等)、アルコキシ基、シクロアルコキシ基、アリールオキシ基、アルキルチオ基、シクロアルキルチオ基、アリールチオ基、アルコキシカルボニル基、アリールオキシカルボニル基、スルファモイル基、アシル基、アシルオキシ基、アミド基、カルバモイル基、ウレイド基、スルフィニル基、アルキルスルホニル基、アリールスルホニル基、ヘテロアリールスルホニル基、アミノ基、ハロゲン原子、フッ化炭化水素基、シアノ基、ニトロ基、ヒドロキシ基、メルカプト基、シリル基、ホスホノ基等が挙げられ、好ましい例として、アルキル基、芳香族炭化水素環基、芳香族複素環基、アミノ基、シリル基、ホスホノ基が挙げられ、これら置換基は同一であっても、異なっていても良く、上記の置換基によって更に置換および結合して環を形成しても良い。なお、カルバゾリル基およびその誘導体は炭素−炭素結合、あるいは窒素−炭素結合で結合することが可能であるが、炭素−炭素結合で結合した置換基であることがより好ましい。 In the general formula (1), Ar may be the same or different aromatic hydrocarbon rings (also referred to as aromatic carbocyclic groups, aryl groups, etc., for example, a phenyl group, a p-chlorophenyl group, a mesityl group, Tolyl group, xylyl group, naphthyl group, anthryl group, azulenyl group, acenaphthenyl group, fluorenyl group, phenanthryl group, indenyl group, pyrenyl group, biphenylyl group, etc.), aromatic heterocyclic group (for example, pyridyl group, pyrimidyl group, furyl) Group, pyrrolyl group, imidazolyl group, benzimidazolyl group, pyrazolyl group, pyrazinyl group, triazolyl group (for example, 1,2,4-triazol-1-yl group, 1,2,3-triazol-1-yl group, etc.)) , Oxazolyl group, benzoxazolyl group, thiazolyl group, isoxazolyl group, isothia Ryl group, furazanyl group, thienyl group, quinolyl group, benzofuryl group, dibenzofuryl group, benzothienyl group, dibenzothienyl group, indolyl group, carbazolyl group, carbolinyl group, diazacarbolyl group (the carbon atom constituting the carboline ring of the carbolinyl group) One of which is replaced by a nitrogen atom), a quinoxalinyl group, a triazinyl group, a quinazolinyl group, a phthalazinyl group, and the like, and more preferable aromatic hydrocarbon rings include a phenyl group, a naphthyl group, a fluorenyl group, a phenanthryl group, and a biphenylyl group. Similarly, more preferred aromatic heterocyclic groups include pyridyl group, pyrimidyl group, imidazolyl group, benzoimidazolyl group, pyrazolyl group, thienyl group, quinolyl group, indolyl group, dibenzofuryl group, A zolyl group, a carbolinyl group, and a diazacarbolinyl group, and more preferably a phenyl group, a naphthyl group, a biphenyl group, a fluorenyl group, a pyridyl group, a thienyl group, a dibenzofuryl group, a carbazolyl group, a carbolinyl group, a diazacarba A zolyl group may be mentioned. These Ar bonds to other Ar or X at an arbitrary position, and the connecting positions may be the same or different. Ar may further have a substituent. Examples of such a substituent include an alkyl group, a cycloalkyl group, an alkynyl group, an aromatic hydrocarbon ring group, an aromatic heterocyclic group, a heterocyclic group (for example, pyrrolidyl Group, imidazolidyl group, morpholinyl group, oxazolidyl group, etc.), alkoxy group, cycloalkoxy group, aryloxy group, alkylthio group, cycloalkylthio group, arylthio group, alkoxycarbonyl group, aryloxycarbonyl group, sulfamoyl group, acyl group, acyloxy Group, amide group, carbamoyl group, ureido group, sulfinyl group, alkylsulfonyl group, arylsulfonyl group, heteroarylsulfonyl group, amino group, halogen atom, fluorinated hydrocarbon group, cyano group, nitro group, hydroxy group, mercapto group , Silyl group, phosphono group Preferred examples include alkyl groups, aromatic hydrocarbon ring groups, aromatic heterocyclic groups, amino groups, silyl groups, and phosphono groups, and these substituents may be the same or different. It is also possible to form a ring by further substituting and bonding with the above substituents. The carbazolyl group and derivatives thereof can be bonded by a carbon-carbon bond or a nitrogen-carbon bond, but more preferably a substituent bonded by a carbon-carbon bond.
mは1以上、20以下の整数を表し、好ましくは2以上、15以下の整数であり、m個のArは互いに同一であっても、異なっていても良い。 m represents an integer of 1 or more and 20 or less, preferably an integer of 2 or more and 15 or less, and m Ar may be the same or different from each other.
XはSiR1R2、PR3、P(=Y)R4、O、S、NR5またはCR6R7を表し、総てのmが1である場合、少なくとも1つのXはSiR1R2、PR3、P(=Y)R4であって、Xとして好ましくはSiR1R2、PR3、P(=Y)R4またはNR5であり、より好ましくはSiR1R2、PR3またはP(=Y)R4であり、さらに好ましくはSiR1R2またはP(=Y)R4である。Yは酸素、硫黄またはセレンを表し、好ましくは酸素、硫黄であって、より好ましくは硫黄である。 X represents SiR 1 R 2 , PR 3 , P (= Y) R 4 , O, S, NR 5 or CR 6 R 7, and when all m are 1, at least one X is SiR 1 R 2 , PR 3 , P (= Y) R 4 , wherein X is preferably SiR 1 R 2 , PR 3 , P (= Y) R 4 or NR 5 , more preferably SiR 1 R 2 , PR 3 or P (= Y) R 4 , more preferably SiR 1 R 2 or P (= Y) R 4 . Y represents oxygen, sulfur or selenium, preferably oxygen or sulfur, more preferably sulfur.
R1からR7はそれぞれ置換基を表し、置換基としては上述の置換基が挙げられ、好ましくは芳香族炭化水素環基、芳香族複素環基であって、より好ましくはジベンゾフリル基、カルバゾリル基、カルボリニル基、ジアザカルバゾリル基、アミノ基であって、これらは更に置換基を有していても良い。 R 1 to R 7 each represents a substituent, and examples of the substituent include the above-mentioned substituents, preferably an aromatic hydrocarbon ring group and an aromatic heterocyclic group, more preferably a dibenzofuryl group and a carbazolyl group. A group, a carbolinyl group, a diazacarbazolyl group, and an amino group, which may further have a substituent.
nは1以上、20以下の整数を表し、n個のmおよびXは同一でも異なっていてもよい。また、mとnの和は2以上、40以下であることが好ましく、より好ましくは2以上、20以下であって、さらに好ましくは3以上10以下であって、更には4から8のいずれかの整数であることがより好ましい。mとnの大小関係については、特に限定されないが、mとnの差は5より小さい整数であることがより好ましい。 n represents an integer of 1 or more and 20 or less, and n m and X may be the same or different. The sum of m and n is preferably 2 or more and 40 or less, more preferably 2 or more and 20 or less, still more preferably 3 or more and 10 or less, and any one of 4 to 8 It is more preferable that it is an integer. The magnitude relationship between m and n is not particularly limited, but the difference between m and n is more preferably an integer smaller than 5.
この時、形成される環のサイズについては8員環以上であれば、特に限定されないが、8員環以上、100員環以下であることが好ましく、より好ましくは10員環以上、50員環以下であって、更に好ましくは10員環以上、30員環以下である。 At this time, the size of the ring formed is not particularly limited as long as it is an 8-membered ring or more, but it is preferably an 8-membered ring or more and a 100-membered ring or less, more preferably a 10-membered ring or more and a 50-membered ring. It is below, More preferably, they are 10-membered ring or more and 30-membered ring or less.
以下、本発明に係る化合物を挙げるが、これらに限定されるものではない。なお、本発明に係る化合物はMacromolecules、10413−10420頁(2005年)、Chemistry−A European Journal,1136−1150頁(1997年)、J.Chem.Soc.,Chem.Commun.,336−339頁(1990年)、特開2009−260286公報等の合成法を参考に合成することができる。 Hereinafter, although the compound concerning this invention is mentioned, it is not limited to these. The compounds according to the present invention are described in Macromolecules, pages 10413-10420 (2005), Chemistry-A European Journal, pages 1361-1150 (1997), J. Am. Chem. Soc. , Chem. Commun. , 336-339 (1990), Japanese Patent Application Laid-Open No. 2009-260286, and the like.
以下に本発明の化合物の合成例を示す。 Synthesis examples of the compounds of the present invention are shown below.
《本発明の化合物(19)の合成》 << Synthesis of Compound (19) of the Present Invention >>
<中間体(C)の合成>
別途合成した中間体(A)、5.0gと中間体(B)、2.6gをフラスコに入れ、THF(テトラヒドロフラン)、200mlおよびEtOH、20mlを加え、30分間窒素バブリングした。この溶液に炭酸カリウム、3.0gと触媒としてテトラキストリフェニルホスフィンパラジウム、0.3gを加え、窒素気流下、12時間加熱還流した。放冷後、水、100mlを加え有機層を抽出し、水洗、硫酸ナトリウムで乾燥、濃縮した後、カラムクロマトグラフィーによって、中間体(C)、3.0gを得た(収率60%)。
<Synthesis of Intermediate (C)>
Separately synthesized intermediate (A), 5.0 g and intermediate (B), 2.6 g were placed in a flask, THF (tetrahydrofuran), 200 ml and EtOH, 20 ml were added, and nitrogen was bubbled for 30 minutes. To this solution, 3.0 g of potassium carbonate and 0.3 g of tetrakistriphenylphosphine palladium as a catalyst were added and heated under reflux for 12 hours under a nitrogen stream. After allowing to cool, 100 ml of water was added, the organic layer was extracted, washed with water, dried over sodium sulfate, concentrated, and then subjected to column chromatography to obtain 3.0 g of intermediate (C) (yield 60%).
<中間体(E)の合成>
中間体(C)、3.0gと中間体(D)、3.6gとDMAc(ジメチルアセトアミド)30mlをフラスコに入れ15分間窒素バブリングした。この溶液に炭酸カリウム、2.1gと触媒として銅、0.8gを加え、窒素気流下、150℃で8時間反応させた。反応終了後、水、200mlおよび酢酸エチル、200mlを加え、有機層を抽出、水洗し、硫酸ナトリウムで乾燥、濃縮した後、カラムクロマトグラフィーによって中間体(E)、1.9gを得た(収率39%)。
<Synthesis of Intermediate (E)>
Intermediate (C), 3.0 g, intermediate (D), 3.6 g, and DMAc (dimethylacetamide) 30 ml were placed in a flask and bubbled with nitrogen for 15 minutes. To this solution, 2.1 g of potassium carbonate and 0.8 g of copper as a catalyst were added and reacted at 150 ° C. for 8 hours under a nitrogen stream. After completion of the reaction, water, 200 ml and ethyl acetate, 200 ml were added, the organic layer was extracted, washed with water, dried over sodium sulfate and concentrated, and then 1.9 g of intermediate (E) was obtained by column chromatography (yield). (Rate 39%).
<本発明の化合物(19)の合成>
中間体(E)、1.9gをフラスコに入れ、窒素気流下、脱水THF、100mlを加え溶解させた。窒素気流下、この溶液をドライアイス/アセトン浴にて冷却し、−70℃以下を保ちながらn−BuLi(1.65M)、3mlおよびTHF、10mlの混合溶液を滴下した。そのまま低温で30分間撹拌した後、ジクロロフェニルホスフィン、0.4gとTHF、10mlを滴下した。この溶液を室温に戻し、3時間加熱還流させた。反応終了後、有機層を水、50mlにて2度水洗し、続けて過酸化水素水(30〜35.5%)を2倍に希釈した溶液を100ml加え、2時間室温にて撹拌した。有機層を中性まで水洗した後、硫酸ナトリウムで乾燥、分取GPCで精製して本発明の化合物(19)、0.4gを得た(収率22%)。
<Synthesis of Compound (19) of the Present Invention>
Intermediate (E) (1.9 g) was placed in a flask, and dehydrated THF (100 ml) was added and dissolved under a nitrogen stream. Under a nitrogen stream, this solution was cooled in a dry ice / acetone bath, and a mixed solution of n-BuLi (1.65 M), 3 ml and THF, 10 ml was added dropwise while maintaining at −70 ° C. or lower. After stirring at low temperature for 30 minutes, dichlorophenylphosphine, 0.4 g and THF, 10 ml were added dropwise. The solution was returned to room temperature and heated to reflux for 3 hours. After completion of the reaction, the organic layer was washed twice with 50 ml of water, 100 ml of a solution obtained by diluting hydrogen peroxide solution (30 to 35.5%) twice was added, and stirred at room temperature for 2 hours. The organic layer was washed with water until neutral, dried over sodium sulfate, and purified by preparative GPC to obtain 0.4 g of the compound (19) of the present invention (yield 22%).
《本発明の化合物(21)および(32)の合成》 << Synthesis of Compounds (21) and (32) of the Present Invention >>
<中間体(C′)の合成>
窒素気流下、フラスコ内に別途合成した中間体(A′)、10.0gとTHF(テトラヒドロフラン)、200mlを加え、ドライアイス/アセトン浴にて冷却した。−70℃以下まで冷却後、n−BuLi(1.65M)、15.8mlを滴下し、続けてジクロロジフェニルシラン(B′)、3.2gをTHF、15mlと共に滴下した。滴下終了後、3時間かけて徐々に温度を室温に戻した後、水、50mlを加え、分液、水洗、硫酸ナトリウムで乾燥後、濃縮し、クロマトグラフィーによって精製し、中間体(C′)、7.4gを得た(収率72%)。
<Synthesis of Intermediate (C ')>
Under a nitrogen stream, intermediate (A ') 10.0 g and THF (tetrahydrofuran) separately synthesized in the flask were added and cooled in a dry ice / acetone bath. After cooling to −70 ° C. or lower, 15.8 ml of n-BuLi (1.65 M) was added dropwise, followed by dropwise addition of 3.2 g of dichlorodiphenylsilane (B ′) together with 15 ml of THF. After completion of the dropwise addition, the temperature was gradually returned to room temperature over 3 hours, water and 50 ml were added, liquid separation, washing with water, drying over sodium sulfate, concentration, purification by chromatography, intermediate (C ′) 7.4 g were obtained (72% yield).
<中間体(E′)の合成>
中間体(C′)、6.5g、中間体(D)、3.7gとDMSO(ジメチルスルホキシド)50mlをフラスコに入れ15分間窒素バブリングした。この溶液に炭酸カリウム、4.9gと[1,1′−ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)ジクロリドジクロロメタン付加物、0.9gを加え、120℃で8時間反応させた。放冷後、撹拌しながら水、500mlを徐々に加え、析出した固体をろ取、トルエンで再結晶を行い中間体(E′)、5.1gを得た(収率65%)。
<Synthesis of Intermediate (E ')>
Intermediate (C ′), 6.5 g, intermediate (D), 3.7 g and DMSO (dimethyl sulfoxide) 50 ml were placed in a flask and bubbled with nitrogen for 15 minutes. To this solution, 4.9 g of potassium carbonate and 0.9 g of [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride dichloromethane adduct were added and reacted at 120 ° C. for 8 hours. After allowing to cool, 500 ml of water was gradually added with stirring, and the precipitated solid was collected by filtration and recrystallized from toluene to obtain 5.1 g of intermediate (E ′) (yield 65%).
<中間体(F′)の合成>
中間体(F′)、5.0gをDMF(ジメチルホルムアミド)、50mlに溶解し、氷浴で冷却しながら臭素、0.6mlを加えた。さらにこの溶液を室温で4時間撹拌した後、水、500mlを加え、トルエンで抽出した。有機層をチオ硫酸ナトリウム水溶液で洗浄し、さらに水洗、硫酸マグネシウムで乾燥後、濃縮したところ、固体が析出したのでこれをろ取し、さらにトルエン/THFで再結晶して中間体(F′)、4.7gを得た(収率82%)。
<Synthesis of Intermediate (F ')>
Intermediate (F ′) (5.0 g) was dissolved in DMF (dimethylformamide) (50 ml), and bromine (0.6 ml) was added while cooling in an ice bath. The solution was further stirred at room temperature for 4 hours, 500 ml of water was added, and the mixture was extracted with toluene. The organic layer was washed with an aqueous sodium thiosulfate solution, further washed with water, dried over magnesium sulfate, and concentrated. As a result, a solid was precipitated, which was collected by filtration and further recrystallized from toluene / THF to give an intermediate (F ′). 4.7 g was obtained (82% yield).
<本発明の化合物(32)の合成>
窒素気流下、中間体(F′)、4.5g、THF、450mlをフラスコに入れ、ドライアイス/アセトン浴にて冷却し、−70℃以下を保ちながらn−BuLi(1.65M)、4.7mlを滴下した。そのまま低温で30分間撹拌した後、ジクロロフェニルホスフィン(G′)、0.7gとTHF、50mlを滴下した。この溶液を徐々に室温に戻した後、8時間加熱還流させた。反応終了後、有機層を水で2度水洗した後、有機層中の不溶解物をろ別した。この溶液をさらに水洗、硫酸マグネシウムで脱水、分取GPCで精製して本発明の化合物(32)、0.38gを得た(収率9%)。
<Synthesis of Compound (32) of the Present Invention>
Under a nitrogen stream, intermediate (F ′), 4.5 g, THF, 450 ml were placed in a flask, cooled in a dry ice / acetone bath, and maintained at −70 ° C. or lower while maintaining n-BuLi (1.65 M), 4 7 ml was added dropwise. After stirring at low temperature for 30 minutes, dichlorophenylphosphine (G ′), 0.7 g and THF, 50 ml were added dropwise. The solution was gradually returned to room temperature and then heated to reflux for 8 hours. After completion of the reaction, the organic layer was washed twice with water, and then the insoluble matter in the organic layer was filtered off. This solution was further washed with water, dehydrated with magnesium sulfate, and purified by preparative GPC to obtain 0.38 g of the compound (32) of the present invention (yield 9%).
<本発明の化合物(21)の合成>
本発明の化合物(32)、0.35gをEtOH、100mlに溶解し、過酸化水素水(30〜35.5%)を3倍に希釈した溶液を50ml加え、2時間撹拌した。反応終了後、水酸化ナトリウム水溶液で中和し、溶液を減圧濃縮した。濃縮した反応溶液にTHF、50mlを加え、水洗した後、硫酸マグネシウムで乾燥、分取GPCで精製して本発明の化合物(21)、0.27gを得た(収率76%)。
<Synthesis of Compound (21) of the Present Invention>
50 ml of a solution obtained by dissolving 0.35 g of the compound (32) of the present invention in 100 ml of EtOH and diluting a hydrogen peroxide solution (30 to 35.5%) three times was added and stirred for 2 hours. After completion of the reaction, the solution was neutralized with an aqueous sodium hydroxide solution, and the solution was concentrated under reduced pressure. To the concentrated reaction solution, 50 ml of THF was added, washed with water, dried over magnesium sulfate, and purified by preparative GPC to obtain 0.27 g of the compound (21) of the present invention (yield 76%).
《本発明の化合物(25)の合成》 << Synthesis of Compound (25) of the Present Invention >>
<中間体(C″)の合成>
窒素気流下、フラスコ内に2,2′−ジブロモビフェニル(A″)、12.0gと脱水Et2O(ジエチルエーテル)、200mlを加え、ドライアイス/アセトン浴で−70℃以下に冷却した。この溶液にテトラクロロシラン(B″)、26.0gをEt2O、150mlの混合溶液を滴下した。そのまま−70℃以下を保ちながら6時間撹拌し、室温に戻した。析出した固体をろ別し、ろ液を減圧濃縮し、中間体(C″)、5.0gを得た(収率52%)。
<Synthesis of Intermediate (C ")>
Under a nitrogen stream, 2,2′-dibromobiphenyl (A ″), 12.0 g and dehydrated Et 2 O (diethyl ether), 200 ml were added to the flask, and the solution was cooled to −70 ° C. or lower in a dry ice / acetone bath. Then, a mixed solution of tetrachlorosilane (B ″), 26.0 g, Et 2 O and 150 ml was dropped. The mixture was stirred for 6 hours while maintaining at -70 ° C or lower, and returned to room temperature. The precipitated solid was filtered off, and the filtrate was concentrated under reduced pressure to obtain 5.0 g of intermediate (C ″) (yield 52%).
<中間体(E″)の合成>
窒素気流下、1,4−ジブロモベンゼン(D″)、4.7gとTHF、50mlを加え、ドライアイス/アセトン浴にて冷却した。−70℃以下を保ちながら、n−BuLi(1.65M)、12.6mlを加え、低温で1時間撹拌後、この溶液に中間体(C″)、2.5gとTHF、50mlの混合溶液を徐々に加えた。滴下終了後、さらに2時間、低温で撹拌した後、昇温し、−10℃で水、100mlを加えた。反応液を分液、水洗、硫酸ナトリウムで脱水後、カラムクロマトグラフィーによって精製し、中間体(E″)、2.1gを得た(収率43%)。
<Synthesis of Intermediate (E ")>
Under a nitrogen stream, 1,4-dibromobenzene (D ″), 4.7 g and THF, 50 ml were added and cooled in a dry ice / acetone bath. N-BuLi (1.65 M) was maintained at −70 ° C. or lower. 12.6 ml), and after stirring at low temperature for 1 hour, a mixed solution of Intermediate (C ″), 2.5 g and THF, 50 ml was gradually added to this solution. After completion of the dropwise addition, the mixture was further stirred for 2 hours at a low temperature, and then the temperature was raised. Water and 100 ml were added at -10 ° C. The reaction mixture was separated, washed with water, dehydrated with sodium sulfate, and purified by column chromatography to obtain 2.1 g of intermediate (E ″) (43% yield).
<本発明の化合物(25)の合成>
窒素気流下、中間体(E″)、2.0gとTHF、200mlを入れ、ドライアイス/アセトン浴にて冷却した。−70℃以下を保ちながらn−BuLi(1.65M)、5.2mlおよびTHF、10mlの混合溶液を滴下し、そのまま低温で30分間撹拌した後、中間体(C″)、1.1gとTHF、30mlを滴下した。さらに低温で1時間撹拌した後、この溶液を室温に戻し、4時間加熱還流させた。反応終了後、水を加え、分液、水洗し、硫酸ナトリウムで乾燥後、分取GPCで精製して本発明の化合物(25)、0.3gを得た(収率14%)。
<Synthesis of Compound (25) of the Present Invention>
Under a nitrogen stream, intermediate (E ″), 2.0 g and THF, 200 ml were added and cooled in a dry ice / acetone bath. N-BuLi (1.65 M), 5.2 ml while maintaining at −70 ° C. or lower. Then, a mixed solution of 10 ml of THF and 10 ml of THF was dropped, and the mixture was stirred as it was at low temperature for 30 minutes, and then 1.1 g of intermediate (C ″) and THF, 30 ml were dropped. After further stirring at low temperature for 1 hour, the solution was returned to room temperature and heated to reflux for 4 hours. After completion of the reaction, water was added, followed by liquid separation, washing with water, drying over sodium sulfate, and purification by preparative GPC to obtain 0.3 g of the compound (25) of the present invention (yield 14%).
尚、後述する本発明の有機EL素子の作製に際しては、更に昇華精製を2回行った試料を用いた。 In the preparation of the organic EL device of the present invention, which will be described later, a sample that was further subjected to sublimation purification twice was used.
本発明に係る化合物は、有機エレクトロルミネッセンス素子中のいずれの有機層に含まれていても良いが、好ましくはホスト化合物、正孔輸送材料、電子輸送材料として用いられることが好ましく、さらに好ましくはホスト材料、正孔輸送材料として用いられることである。またこの時、各有機層は、本発明に係る化合物単独で構成されていても良いし、他の材料と混合して用いられていても良い。 The compound according to the present invention may be contained in any organic layer in the organic electroluminescence device, but is preferably used as a host compound, a hole transport material, or an electron transport material, more preferably a host. It is used as a material and a hole transport material. At this time, each organic layer may be composed of the compound according to the present invention alone, or may be used by mixing with other materials.
≪有機EL素子の構成層≫
本発明の有機EL素子の構成層について説明する。本発明において、有機EL素子の層構成の好ましい具体的を以下に示すが、本発明はこれらに限定されない。
(i)陽極/発光層/電子輸送層/陰極
(ii)陽極/正孔輸送層/発光層/電子輸送層/陰極
(iii)陽極/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極
(iv)陽極/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極バッファー層/陰極
(v)陽極/陽極バッファー層/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極バッファー層/陰極
本発明の有機EL素子においては、青色発光層の発光極大波長は430〜480nmにあるものが好ましく、緑色発光層は発光極大波長が510〜550nm、赤色発光層は発光極大波長が600〜640nmの範囲にある単色発光層であることが好ましく、これらを用いた表示素子であることが好ましい。またこれらの少なくとも3層の発光層を積層して白色発光層としたものであっても良い。さらに発光層間には非発光性の中間層を有していても良い。本発明の有機EL素子としては白色発光層であることが好ましく、これらを用いた照明装置であることが好ましい。
≪Component layer of organic EL element≫
The constituent layers of the organic EL element of the present invention will be described. In the present invention, preferred specific examples of the layer structure of the organic EL element are shown below, but the present invention is not limited thereto.
(I) Anode / light emitting layer / electron transport layer / cathode (ii) Anode / hole transport layer / light emitting layer / electron transport layer / cathode (iii) Anode / hole transport layer / light emitting layer / hole blocking layer / electron Transport layer / cathode (iv) anode / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer / cathode (v) anode / anode buffer layer / hole transport layer / light emitting layer / hole Blocking layer / electron transport layer / cathode buffer layer / cathode In the organic EL device of the present invention, the blue light emitting layer preferably has a light emission maximum wavelength of 430 to 480 nm, and the green light emitting layer has a light emission maximum wavelength of 510 to 550 nm, The red light emitting layer is preferably a monochromatic light emitting layer having a light emission maximum wavelength in the range of 600 to 640 nm, and is preferably a display element using these. Alternatively, a white light emitting layer may be formed by laminating at least three light emitting layers. Further, a non-light emitting intermediate layer may be provided between the light emitting layers. The organic EL element of the present invention is preferably a white light emitting layer, and is preferably a lighting device using these.
本発明の有機EL素子を構成する各層について説明する。 Each layer which comprises the organic EL element of this invention is demonstrated.
≪発光層≫
本発明に係る発光層は、電極または電子輸送層、正孔輸送層から注入されてくる電子および正孔が再結合して発光する層であり、発光する部分は発光層の層内であっても発光層と隣接層との界面であっても良い。
≪Luminescent layer≫
The light emitting layer according to the present invention is a layer that emits light by recombination of electrons and holes injected from the electrode, the electron transport layer, or the hole transport layer, and the light emitting portion is in the layer of the light emitting layer. May also be the interface between the light emitting layer and the adjacent layer.
発光層の膜厚の総和に特に制限はないが、膜の均質性や発光時に不必要な高電圧を印加するのを防止し、かつ駆動電流に対する発光色の安定性向上の観点から、2nm〜5μmの範囲に調整することが好ましく、更に好ましくは2〜200nmの範囲に調整され、特に好ましくは10〜40nmの範囲である。 There is no particular limitation on the total thickness of the light emitting layer, but from the viewpoint of preventing the application of unnecessary high voltage during film homogeneity and light emission, and improving the stability of the light emission color with respect to the drive current It is preferable to adjust to the range of 5 micrometers, More preferably, it adjusts to the range of 2-200 nm, Especially preferably, it is the range of 10-40 nm.
本発明の有機EL素子の発光層には、発光ドーパント(リン光ドーパント(リン光発光性ドーパント基ともいう)や蛍光ドーパント等)化合物と、ホスト化合物を含有する。 The light emitting layer of the organic EL device of the present invention contains a light emitting dopant (phosphorescent dopant (also referred to as phosphorescent dopant group) or fluorescent dopant) compound and a host compound.
(発光性ドーパント化合物)
発光性ドーパント化合物について説明する。
(Luminescent dopant compound)
The luminescent dopant compound will be described.
発光性ドーパント化合物としては、蛍光ドーパント化合物、リン光ドーパント化合物を用いる事ができる。 As the luminescent dopant compound, a fluorescent dopant compound or a phosphorescent dopant compound can be used.
(リン光ドーパント化合物)
本発明に係るリン光ドーパント化合物について説明する。
(Phosphorescent dopant compound)
The phosphorescent dopant compound according to the present invention will be described.
本発明に係るリン光ドーパント化合物は、励起三重項からの発光が観測される化合物であり、具体的には室温(25℃)にてリン光発光する化合物であり、リン光量子収率が25℃において0.01以上の化合物であると定義されるが、好ましいリン光量子収率は0.1以上である。 The phosphorescent dopant compound according to the present invention is a compound in which light emission from an excited triplet is observed, specifically, a compound that emits phosphorescence at room temperature (25 ° C.), and a phosphorescence quantum yield of 25 ° C. The phosphorescence quantum yield is preferably 0.1 or more.
上記、リン光量子収率は、第4版実験化学講座7の分光IIの398頁(1992年版、丸善)に記載の方法により測定できる。溶液中でのリン光量子収率は種々の溶媒を用いて測定できるが、本発明に係るリン光ドーパント化合物は任意の溶媒のいずれかにおいれ上記リン光収率0.01以上が達成されれば良い。 The phosphorescence quantum yield can be measured by the method described in Spectra II, page 398 (1992 version, Maruzen) of Experimental Chemistry Course 4 of the 4th edition. Although the phosphorescence quantum yield in a solution can be measured using various solvents, the phosphorescence dopant compound according to the present invention can be measured in any solvent if the phosphorescence yield of 0.01 or more is achieved. good.
リン光ドーパント化合物の発光原理としては2種挙げられ、一つはキャリアが輸送されるホスト化合物上でのキャリアの再結合が起こって、発光性ホスト化合物の励起状態が生成し、このエネルギーをリン光ドーパントに移動させることでリン光ドーパントからの発光を得る、というエネルギー移動型。もう一つはリン光ドーパント化合物自身がキャリアトラップとなり、リン光ドーパント上でキャリアの再結合が生じ、リン光ドーパント化合物からの発光が得られるというキャリアトラップ型であるが、いずれの場合においても、リン光ドーパント化合物の励起状態のエネルギーは、ホスト化合物の励起状態のエネルギーよりも低いことが良好な発光を得るための条件である。 There are two types of emission principles of the phosphorescent dopant compound. One is the recombination of carriers on the host compound to which carriers are transported, and the excited state of the luminescent host compound is generated. Energy transfer type that obtains light emission from phosphorescent dopant by moving to optical dopant. The other is a carrier trap type in which the phosphorescent dopant compound itself becomes a carrier trap, carrier recombination occurs on the phosphorescent dopant, and light emission from the phosphorescent dopant compound is obtained. It is a condition for obtaining good light emission that the excited state energy of the phosphorescent dopant compound is lower than the excited state energy of the host compound.
以下にリン光ドーパントとして用いられる公知の化合物の具体例を示すが、本発明はこれらに限定されない。また、これらの化合物は、例えば、Inorg.Chem.40巻、1704〜1711頁に記載の方法などにより合成できる。 Although the specific example of the well-known compound used as a phosphorescence dopant below is shown, this invention is not limited to these. These compounds are described in, for example, Inorg. Chem. 40, pages 1704 to 1711, and the like.
以下に発光ドーパントの例を挙げるがこれらに限定されない。 Although the example of a light emission dopant is given to the following, it is not limited to these.
(蛍光ドーパント化合物)
蛍光ドーパント化合物としては、クマリン系色素、ピラン系色素、シアニン系色素、クロコニウム系色素、スクアリリウム系色素、オキソベンゾアントラセン系色素、フルオレッセイン系色素、ローダミン系色素、ピリリウム系色素、ペリレン系色素、スチルベン系色素、ポリチオフェン系色素または希土類錯体系蛍光体等が挙げられる。
(Fluorescent dopant compound)
As fluorescent dopant compounds, coumarin dyes, pyran dyes, cyanine dyes, croconium dyes, squarylium dyes, oxobenzoanthracene dyes, fluorescein dyes, rhodamine dyes, pyrylium dyes, perylene dyes, Examples include stilbene dyes, polythiophene dyes, and rare earth complex phosphors.
(発光ホスト化合物(発光ホスト等ともいう))
本発明の有機EL素子の発光層や発光ユニットに使用される発光ホスト化合物としては、発光層に含有される化合物のうち、その層中での質量比が20%以上であり、かつ室温(25℃)においてリン光量子収率が0.1未満の化合物と定義され、好ましくはリン光量子収率が0.01未満である。また、発光層に含有される化合物のうち、層中での質量比が20%以上であることが好ましい。
(Luminescent host compound (also referred to as luminescent host))
As the light-emitting host compound used in the light-emitting layer and the light-emitting unit of the organic EL device of the present invention, among the compounds contained in the light-emitting layer, the mass ratio in the layer is 20% or more and room temperature (25 ° C) is defined as a compound having a phosphorescence quantum yield of less than 0.1, preferably a phosphorescence quantum yield of less than 0.01. Moreover, it is preferable that the mass ratio in a layer is 20% or more among the compounds contained in a light emitting layer.
ホスト化合物としては、公知のホスト化合物を単独で使用しても良く、また複数種併用して用いても良い。ホスト化合物を複数種用いることで、キャリアの移動を調整することが可能であり、有機EL素子の性能をさらに高効率化することができる。また、前記リン光ドーパントとして用いられる公知の化合物を複数種用いることで、異なる発光を混合することが可能となり、これにより任意の発光色を得ることができる。 As the host compound, known host compounds may be used alone or in combination of two or more. By using a plurality of types of host compounds, it is possible to adjust the movement of carriers, and the performance of the organic EL element can be further increased. Moreover, it becomes possible to mix different light emission by using multiple types of well-known compounds used as the said phosphorescence dopant, and, thereby, arbitrary luminescent colors can be obtained.
また、本発明に用いられる発光ホストとしては、低分子化合物でも、繰り返し単位を有する高分子化合物でも良く、ビニル基やエポキシ基のような重合性基を有する低分子化合物(蒸着重合性発光ホスト)でも良く、このような化合物を1種または複数種用いても良い。 The light emitting host used in the present invention may be a low molecular compound or a high molecular compound having a repeating unit, and a low molecular compound having a polymerizable group such as a vinyl group or an epoxy group (evaporation polymerizable light emitting host). Alternatively, one or a plurality of such compounds may be used.
公知の発光ホスト化合物として、代表的にはカルバゾール誘導体、トリアリールアミン誘導体、芳香族誘導体、含窒素複素環化合物、チオフェン誘導体、フラン誘導体、オリゴアリーレン化合物等の基本骨格を有するもの、またはカルボリン誘導体やジアザカルバゾール誘導体等が挙げられる。 Known light-emitting host compounds typically include those having a basic skeleton such as carbazole derivatives, triarylamine derivatives, aromatic derivatives, nitrogen-containing heterocyclic compounds, thiophene derivatives, furan derivatives, oligoarylene compounds, carboline derivatives, And diazacarbazole derivatives.
併用しても良い、公知のホスト化合物としては、正孔輸送能、電子輸送能を有しつつ、発光の長波長化を防ぎ、高Tg(ガラス転移温度)である化合物が好ましい。 A known host compound that may be used in combination is preferably a compound that has a hole transporting ability and an electron transporting ability, prevents a long wavelength of light emission, and has a high Tg (glass transition temperature).
公知のホスト化合物の具体例としては、以下の文献に記載されている化合物等が挙げられるがこれらに限定されるものではない。 Specific examples of known host compounds include, but are not limited to, compounds described in the following documents.
特開2001−257076号公報、同2002−308855号公報、同2001−313179号公報、同2002−319491号公報、同2001−357977号公報、同2002−334786号公報、同2002−8860号公報、同2002−334787号公報、同2002−15871号公報、同2002−334788号公報、同2002−43056号公報、同2002−334789号公報、同2002−75645号公報、同2002−338579号公報、同2002−105445号公報、同2002−343568号公報、同2002−141173号公報、同2002−352957号公報、同2002−203683号公報、同2002−363227号公報、同2002−231453号公報、同2003−3165号公報、同2002−234888号公報、同2003−27048号公報、同2002−255934号公報、同2002−260861号公報、同2002−280183号公報、同2002−299060号公報、同2002−302516号公報、同2002−305083号公報、同2002−305084号公報、同2002−308837号公報等。 JP-A-2001-257076, 2002-308855, 2001-313179, 2002-319491, 2001-357777, 2002-334786, 2002-8860, 2002-334787, 2002-15871, 2002-334788, 2002-43056, 2002-334789, 2002-75645, 2002-338579, 2002-105445 gazette, 2002-343568 gazette, 2002-141173 gazette, 2002-352957 gazette, 2002-203683 gazette, 2002-363227 gazette, 2002-231453 gazette, No. 003-3165, No. 2002-234888, No. 2003-27048, No. 2002-255934, No. 2002-286061, No. 2002-280183, No. 2002-299060, No. 2002. -302516, 2002-305083, 2002-305084, 2002-308837, and the like.
次に本発明の有機EL素子の構成層として用いられる、注入層、阻止層、輸送層等について説明する。 Next, an injection layer, a blocking layer, a transport layer, and the like used as a constituent layer of the organic EL element of the present invention will be described.
≪注入層:電子注入層、正孔輸送層≫
注入層は必要に応じて設け、電子注入層と正孔注入層があり、上記の如く陽極と発光層、または正孔輸送層、および陰極と発光層、または電子輸送層との間に存在させても良い。
≪Injection layer: electron injection layer, hole transport layer≫
The injection layer is provided as necessary, and has an electron injection layer and a hole injection layer, and is present between the anode and the light emitting layer or the hole transport layer and between the cathode and the light emitting layer or the electron transport layer as described above. May be.
注入層とは駆動電圧低下や発光輝度向上のために電極と有機層間に設けられる層のことで「有機EL素子とその工業化最前線(1998年11月30日、エヌ・ティー・エス社発行)」の第2編第2章「電極材料」(123〜166頁)に詳細に記載されており、正孔注入層(陽極バッファー層)電子注入層(陰極バッファー層)とがある。 An injection layer is a layer provided between an electrode and an organic layer in order to lower drive voltage and improve light emission luminance. “Organic EL element and its industrialization front line (November 30, 1998, issued by NTT) 2 of Chapter 2 “Electrode Materials” (pages 123 to 166) in detail, and includes a hole injection layer (anode buffer layer) and an electron injection layer (cathode buffer layer).
陽極バッファー層(正孔注入層)は、特開平9−45579号公報、同9−260062号公報、同8−288069号公報等にもその詳細が記載されており、具体例として銅フタロシアニンに代表されるフタロシアニンバッファー層、酸化バナジウムに代表される酸化物バッファー層、アモルファスカーボンバッファー層、ポリアニリン(エメラルディン)やポリチオフェン等の導電性高分子を用いた高分子バッファー層などが挙げられる。 The details of the anode buffer layer (hole injection layer) are described in JP-A-9-45579, JP-A-9-260062, JP-A-8-288069, and the like, and representative examples thereof include copper phthalocyanine. Phthalocyanine buffer layers, oxide buffer layers typified by vanadium oxide, amorphous carbon buffer layers, polymer buffer layers using conductive polymers such as polyaniline (emeraldine) and polythiophene, and the like.
陰極バッファー層(電子注入層は)は、特開平6−325871号公報、同9−17574号公報、同10−74586号公報等にもその詳細が記載されており、具体的にはストロンチウムやアルミニウム等に代表される金属バッファー層、フッ化リチウムに代表されるアルカリ金属化合物バッファー層、フッ化マグネシウムに代表されるアルカリ土類金属化合物バッファー層、酸化アルミニウムに代表される酸化物バッファー層等が挙げられる。 Details of the cathode buffer layer (electron injection layer) are described in JP-A-6-325871, JP-A-9-17574, JP-A-10-74586, and the like. Specifically, strontium or aluminum Metal buffer layer represented by lithium fluoride, alkali metal compound buffer layer represented by lithium fluoride, alkaline earth metal compound buffer layer represented by magnesium fluoride, oxide buffer layer represented by aluminum oxide, etc. It is done.
上記バッファー層(注入層)は、ごく薄い膜であることが好ましく、素材にもよるがその膜厚は0.1nm〜5μmの範囲が好ましい。 The buffer layer (injection layer) is preferably a very thin film, and the film thickness is preferably in the range of 0.1 nm to 5 μm although it depends on the material.
≪阻止層:正孔阻止層、電子阻止層≫
阻止層は上記の如く、有機化合物薄膜の基本構成層の他に必要に応じて設けられるものである。例えば、特開平11−204158号公報、同11−204359号公報、および「有機EL素子とその工業化最前線(1998年11月30日、エヌ・ティー・エス社発行)」の237頁等に記載されており正孔阻止層(ホールブロック層)がある。
≪Blocking layer: hole blocking layer, electron blocking layer≫
As described above, the blocking layer is provided as necessary in addition to the basic constituent layer of the organic compound thin film. For example, described in JP-A Nos. 11-204158 and 11-204359, and “Organic EL devices and the forefront of industrialization (November 30, 1998, issued by NTS Corporation)” on page 237, etc. There is a hole blocking layer (hole blocking layer).
正孔阻止層とは広い意味では電子輸送層の機能を有し、電子を輸送する機能を有しつつ、正孔を輸送する能力が著しく小さい正孔阻止材料からなり、電子を輸送しつつ正孔輸送を阻止することで、電子と正孔の再結合確率を向上させることができる。また後述する電子輸送層の構成を必要に応じて、本発明に係る正孔阻止層として用いる事ができる。 The hole blocking layer has a function of an electron transport layer in a broad sense, and is made of a hole blocking material having a function of transporting electrons and having a remarkably small ability to transport holes. By blocking hole transport, the recombination probability of electrons and holes can be improved. Moreover, the structure of the electron carrying layer mentioned later can be used as a hole-blocking layer concerning this invention as needed.
本発明の有機EL素子の正孔阻止層は、発光層に隣接して設けられていることが好ましい。 The hole blocking layer of the organic EL device of the present invention is preferably provided adjacent to the light emitting layer.
正孔阻止層には、前述のホスト化合物として挙げたカルバゾール誘導体、またカルボリン誘導体やジアザカルバゾール誘導体等を含有することが好ましい。 The hole blocking layer preferably contains the carbazole derivative, carboline derivative, diazacarbazole derivative, or the like mentioned as the host compound.
また、発光色の異なる複数の発光層を有する場合、その発光極大波長が最も短波な発光層が、全発光層中、最も陽極に近いことが好ましい。このような場合、該最短波発光層と該発光層の次に陽極に近い発光層との間に正孔阻止層を追加して設ける事が好ましい。さらに、該位置に設けられる正孔阻止層の化合物の50%質量%以上が、前記最短波発光層のホスト化合物のイオン化ポテンシャルに対し、0.3eV以上大きいことが好ましい。 Moreover, when it has several light emitting layers from which luminescent color differs, it is preferable that the light emitting layer with the shortest light emission maximum wavelength is the closest to an anode among all the light emitting layers. In such a case, it is preferable to additionally provide a hole blocking layer between the shortest wave light emitting layer and the light emitting layer next to the anode next to the light emitting layer. Further, it is preferable that 50% by mass or more of the compound of the hole blocking layer provided at the position is 0.3 eV or more larger than the ionization potential of the host compound of the shortest wave emitting layer.
イオン化ポテンシャルは化合物のHOMO(最高被占分子軌道)レベルにある電子を真空準位に放出するために必要なエネルギーと定義され、例えば、下記に示すような方法により求めることができる。 The ionization potential is defined as the energy required to emit electrons at the HOMO (highest occupied molecular orbital) level of the compound to the vacuum level, and can be obtained by, for example, the following method.
(1)米国Gaussian社製の分子軌道計算用ソフトウェアであるGaussian98(Gaussian98、Revision A.11.4,M.J.Frisch,et al,Gaussian,Inc.,Pittsburgh PA,2002.)を用い、キーワードとしてB3LYP/6−31G*を用いて構造最適化を行うことにより算出した値(eV単位換算値)の小数点第2位を四捨五入した値としてイオン化ポテンシャルを求めることができる。この計算値が有効な背景には、この手法で求めた計算値と実験値の相関が高いためである。 (1) Using Gaussian 98 (Gaussian 98, Revision A.11.4, MJ Frisch, et al, Gaussian, Inc., Pittsburgh PA, 2002.), a molecular orbital calculation software manufactured by Gaussian, USA The ionization potential can be obtained as a value obtained by rounding off the second decimal place of the value (eV unit converted value) calculated by performing structural optimization using B3LYP / 6-31G *. This calculation value is effective because the correlation between the calculation value obtained by this method and the experimental value is high.
(2)光電子分光法で直接測定する方法により求めることもできる。きる。例えば、理研計器製の低エネルギー電子分光装置「Model AC−1」を用いて、あるいは紫外光電子分光として知られている方法を好適に用いることができる。 (2) It can also be determined by a method of direct measurement by photoelectron spectroscopy. Yes. For example, a method known as ultraviolet photoelectron spectroscopy can be suitably used using a low energy electron spectrometer “Model AC-1” manufactured by Riken Keiki.
一方、電子阻止層とは広い意味では正孔輸送層の機能を有し、正孔を輸送する機能を有しつつ電子を輸送する能力が著しく小さい材料からなり、正孔を輸送しつつ電子輸送を阻止することで電子と正孔の再結合確率を向上させることができる。また、後述する正孔輸送層の構成を必要に応じて電子阻止層として用いる事ができる。 On the other hand, the electron blocking layer has a function of a hole transport layer in a broad sense, and is made of a material having a function of transporting holes and a very small ability to transport electrons, and transporting electrons while transporting holes. The probability of recombination of electrons and holes can be improved by blocking. Moreover, the structure of the positive hole transport layer mentioned later can be used as an electron blocking layer as needed.
本発明に係る正孔阻止層、電子阻止層の膜厚として、好ましくは3〜100nmであり、さらに好ましくは5〜30nmである。 The film thickness of the hole blocking layer and the electron blocking layer according to the present invention is preferably 3 to 100 nm, and more preferably 5 to 30 nm.
≪正孔輸送層≫
正孔輸送層とは正孔を輸送する機能を有する正孔輸送材料からなり、広い意味で正孔注入層、電子阻止層も正孔輸送層に含まれるとみなすことができる。正孔輸送層は単層または複数層設けることができる。
≪Hole transport layer≫
The hole transport layer is made of a hole transport material having a function of transporting holes. In a broad sense, the hole transport layer and the electron blocking layer can be regarded as being included in the hole transport layer. The hole transport layer can be provided as a single layer or a plurality of layers.
正孔輸送材料としては、正孔の注入または輸送、電子の障壁性のいずれかを有するものであり、有機物、無機物のいずれであっても良い。例えば、トリアゾール誘導体、オキサジアゾール誘導体、イミダゾール誘導体、ポリアリールアルカン誘導体、ピラゾリン誘導体およびピラゾロン誘導体、フェニレンジアミン誘導体、アリールアミン誘導体、アミノ置換カルコン誘導体、オキサゾール誘導体、スチリルアントラセン誘導体、フルオレノン誘導体、ヒドラゾン誘導体、スチルベン誘導体、シラザン誘導体、アニリン系共重合体や導電性高分子(ポリマーやオリゴマー)、特にチオフェンオリゴマー等が挙げられる。 The hole transport material has any of hole injection or transport and electron barrier properties, and may be either organic or inorganic. For example, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, Examples thereof include stilbene derivatives, silazane derivatives, aniline copolymers and conductive polymers (polymers and oligomers), particularly thiophene oligomers.
正孔輸送材料としては上記のものを使用することができるが、ポルフィリン化合物、芳香族第3級アミン化合物およびスチリルアミン化合物、特に芳香族第3級アミン化合物を用いることが好ましい。また、本発明の有機EL素子用材料も同様に好ましく用いることができる。 The above-mentioned materials can be used as the hole transport material, but it is preferable to use a porphyrin compound, an aromatic tertiary amine compound and a styrylamine compound, particularly an aromatic tertiary amine compound. In addition, the organic EL device material of the present invention can be preferably used in the same manner.
芳香族第3級アミン化合物及びスチリルアミン化合物の代表例としては、N,N′−ジフェニル−N,N′−ビス(3−メチルフェニル)−〔1,1′−ビフェニル〕−4,4′−ジアミン(TPD)、4,4′−ビス〔N−(1−ナフチル)−N−フェニルアミノ〕ビフェニル(α−NPD)、4,4′,4″−トリス〔N−(3−メチルフェニル)−N−フェニルアミノ〕トリフェニルアミン(MTDATA)等が挙げられる。 Representative examples of aromatic tertiary amine compounds and styrylamine compounds include N, N'-diphenyl-N, N'-bis (3-methylphenyl)-[1,1'-biphenyl] -4,4 '. -Diamine (TPD), 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (α-NPD), 4,4 ', 4 "-tris [N- (3-methylphenyl) ) -N-phenylamino] triphenylamine (MTDATA).
さらにこれらの材料を高分子鎖に導入、または高分子の主鎖とした高分子材料を用いることもできる。またp型−Si、p型−SiC等の無機化合物も正孔輸送材料として使用することができる。また、特開平11−251067号公報、J.Huang et al.著文献(Applied Physics Letters 80(2002),p.139)に記載されているような、p型正孔輸送材料を用いることもできる。 Furthermore, a polymer material in which these materials are introduced into a polymer chain or a polymer main chain can also be used. Inorganic compounds such as p-type-Si and p-type-SiC can also be used as the hole transport material. JP-A-11-251067, J. Org. Huang et al. A p-type hole transport material as described in a book (Applied Physics Letters 80 (2002), p. 139) can also be used.
正孔輸送層は上記のような正孔輸送材料を、例えば、真空蒸着法、スピンコート法、キャスト法、インクジェット法を含む印刷法、LB法などの公知の方法によって薄膜化することにより形成することができる。正孔輸送層の膜厚について特に制限はないが、通常は5nm〜5μm、好ましくは5〜200nmである。また、正孔輸送材料は複数種の材料からなる一層構造であっても良い。 The hole transport layer is formed by thinning the hole transport material as described above by, for example, a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method. be able to. Although there is no restriction | limiting in particular about the film thickness of a positive hole transport layer, Usually, 5 nm-5 micrometers, Preferably it is 5-200 nm. Further, the hole transport material may have a single layer structure composed of a plurality of types of materials.
また、不純物をドープしたp性の高い正孔輸送層を用いることもできる。 Alternatively, a hole transport layer having a high p property doped with impurities can be used.
≪電子輸送層≫
電子輸送層とは電子を輸送する機能を有する材料からなり、広い意味で電子注入層、正孔阻止層も電子輸送層に含まれる。電子輸送層は単層または複数層設けることができる。
≪Electron transport layer≫
The electron transport layer is made of a material having a function of transporting electrons, and in a broad sense, an electron injection layer and a hole blocking layer are also included in the electron transport layer. The electron transport layer can be provided as a single layer or a plurality of layers.
発光層に対して陰極側に隣接する電子輸送層に用いられる電子輸送材料(正孔阻止材料を兼ねる)としては、陰極より注入された電子を発光層に伝達する機能を有していればよく、その材料としては従来公知の化合物の中から任意のものを選択して用いることができ、例えば、ニトロ置換フルオレン誘導体、ジフェニルキノン誘導体、チオピランジオキシド誘導体、カルボジイミド、フレオレニリデンメタン誘導体、アントラキノジメタン及びアントロン誘導体、オキサジアゾール誘導体等が挙げられる。更に上記オキサジアゾール誘導体において、オキサジアゾール環の酸素原子を硫黄原子に置換したチアジアゾール誘導体、電子吸引基として知られているキノキサリン環を有するキノキサリン誘導体も、電子輸送材料として用いることができる。更にこれらの材料を高分子鎖に導入した、またはこれらの材料を高分子の主鎖とした高分子材料を用いることもできる。 An electron transport material (also serving as a hole blocking material) used for the electron transport layer adjacent to the cathode side with respect to the light emitting layer may have a function of transmitting electrons injected from the cathode to the light emitting layer. As the material, any one of conventionally known compounds can be selected and used. For example, nitro-substituted fluorene derivatives, diphenylquinone derivatives, thiopyran dioxide derivatives, carbodiimides, fluorenylidenemethane derivatives, anthra Examples include quinodimethane and anthrone derivatives, oxadiazole derivatives, and the like. Furthermore, in the above oxadiazole derivative, a thiadiazole derivative in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, and a quinoxaline derivative having a quinoxaline ring known as an electron withdrawing group can also be used as an electron transport material. Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used.
また、8−キノリノール誘導体の金属錯体、例えば、トリス(8−キノリノール)アルミニウム(Alq)、トリス(5,7−ジクロロ−8−キノリノール)アルミニウム、トリス(5,7−ジブロモ−8−キノリノール)アルミニウム、トリス(2−メチル−8−キノリノール)アルミニウム、トリス(5−メチル−8−キノリノール)アルミニウム、ビス(8−キノリノール)亜鉛(Znq)等、及びこれらの金属錯体の中心金属がIn、Mg、Cu、Ca、Sn、GaまたはPbに置き替わった金属錯体も、電子輸送材料として用いることができる。その他、フタロシアニン系材料やその誘導体も電子輸送材料として好ましく用いることができる。また、発光層の材料として例示したジスチリルピラジン誘導体も、電子輸送材料として用いることができるし、正孔注入層、正孔輸送層と同様にn型−Si、n型−SiC等の無機半導体も電子輸送材料として用いることができる。 In addition, metal complexes of 8-quinolinol derivatives such as tris (8-quinolinol) aluminum (Alq), tris (5,7-dichloro-8-quinolinol) aluminum, tris (5,7-dibromo-8-quinolinol) aluminum Tris (2-methyl-8-quinolinol) aluminum, tris (5-methyl-8-quinolinol) aluminum, bis (8-quinolinol) zinc (Znq), and the like, and the central metals of these metal complexes are In, Mg, Metal complexes replaced with Cu, Ca, Sn, Ga or Pb can also be used as the electron transport material. In addition, phthalocyanine materials and derivatives thereof can also be preferably used as the electron transport material. In addition, the distyrylpyrazine derivative exemplified as the material of the light emitting layer can also be used as an electron transport material, and an inorganic semiconductor such as n-type-Si, n-type-SiC, etc. as in the case of the hole injection layer and the hole transport layer. Can also be used as an electron transporting material.
電子輸送層は上記電子輸送材料を、例えば、真空蒸着法、スピンコート法、キャスト法、インクジェット法を含む印刷法、LB法等の公知の方法により、薄膜化することにより形成することができる。電子輸送層の膜厚については特に制限はないが、通常は5nm〜5μm程度、好ましくは5〜200nmである。電子輸送層は上記材料の1種または2種以上からなる一層構造であってもよい。また、不純物をドープしたn性の高い電子輸送層を用いることもできる。 The electron transport layer can be formed by thinning the electron transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method. Although there is no restriction | limiting in particular about the film thickness of an electron carrying layer, Usually, 5 nm-about 5 micrometers, Preferably it is 5-200 nm. The electron transport layer may have a single layer structure composed of one or more of the above materials. Further, an electron transport layer having a high n property doped with impurities can also be used.
《陽極》
有機EL素子における陽極としては、仕事関数の大きい(4eV以上)金属、合金、電気伝導性化合物及びこれらの混合物を電極物質とするものが好ましく用いられる。このような電極物質の具体例としては、Au等の金属、CuI、インジウムチンオキシド(ITO)、SnO2、ZnO等の導電性透明材料が挙げられる。また、IDIXO(In2O3−ZnO)等非晶質で透明導電膜を作製可能な材料を用いてもよい。
"anode"
As the anode in the organic EL element, an electrode material made of a metal, an alloy, an electrically conductive compound, or a mixture thereof having a high work function (4 eV or more) is preferably used. Specific examples of such electrode materials include metals such as Au, and conductive transparent materials such as CuI, indium tin oxide (ITO), SnO 2 , and ZnO. Alternatively, an amorphous material such as IDIXO (In 2 O 3 —ZnO) capable of forming a transparent conductive film may be used.
陽極はこれらの電極物質を蒸着やスパッタリング等の方法により薄膜を形成させ、フォトリソグラフィー法やマスクを介してパターンを形成してもよい。あるいは、有機導電性化合物のように塗布可能な物質を用いる場合には、印刷方式、コーティング方式等湿式成膜法を用いることもできる。この陽極より発光を取り出す場合には、透過率を10%より大きくすることが望ましく、また陽極としてのシート抵抗は数百Ω/□以下が好ましい。更に膜厚は材料にもよるが、通常は10〜1000nmの範囲であり、好ましくは10〜200nmの範囲で選ばれる。 For the anode, a thin film may be formed by vapor deposition or sputtering of these electrode materials, and a pattern may be formed through a photolithography method or a mask. Or when using the substance which can be apply | coated like an organic electroconductivity compound, wet film-forming methods, such as a printing system and a coating system, can also be used. When light emission is extracted from the anode, it is desirable that the transmittance be greater than 10%, and the sheet resistance as the anode is preferably several hundred Ω / □ or less. Further, although the film thickness depends on the material, it is usually in the range of 10 to 1000 nm, preferably in the range of 10 to 200 nm.
《陰極》
一方、陰極としては仕事関数の小さい(4eV以下)金属(電子注入性金属と称する)、合金、電気伝導性化合物及びこれらの混合物を電極物質とするものが用いられる。このような電極物質の具体例としては、ナトリウム、ナトリウム−カリウム合金、マグネシウム、リチウム、マグネシウム/銅混合物、マグネシウム/銀混合物、マグネシウム/アルミニウム混合物、マグネシウム/インジウム混合物、アルミニウム/酸化アルミニウム(Al2O3)混合物、インジウム、リチウム/アルミニウム混合物、希土類金属等が挙げられる。これらの中で、電子注入性及び酸化等に対する耐久性の点から、電子注入性金属とこれより仕事関数の値が大きく安定な金属である第二金属との混合物、例えば、マグネシウム/銀混合物、マグネシウム/アルミニウム混合物、マグネシウム/インジウム混合物、アルミニウム/酸化アルミニウム(Al2O3)混合物、リチウム/アルミニウム混合物、アルミニウム等が好適である。
"cathode"
On the other hand, as the cathode, a material having a low work function (4 eV or less) metal (referred to as an electron injecting metal), an alloy, an electrically conductive compound, and a mixture thereof as an electrode material is used. Specific examples of such electrode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al 2 O 3 ) Mixtures, indium, lithium / aluminum mixtures, rare earth metals and the like. Among these, from the point of durability against electron injection and oxidation, etc., a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function than this, for example, a magnesium / silver mixture, Magnesium / aluminum mixtures, magnesium / indium mixtures, aluminum / aluminum oxide (Al 2 O 3 ) mixtures, lithium / aluminum mixtures, aluminum and the like are preferred.
陰極はこれらの電極物質を蒸着やスパッタリング等の方法により薄膜を形成させることにより、作製することができる。また、陰極としてのシート抵抗は数百Ω/□以下が好ましく、膜厚は通常10nm〜5μm、好ましくは50〜200nmの範囲で選ばれる。なお、発光した光を透過させるため、有機EL素子の陽極または陰極のいずれか一方が透明または半透明であれば発光輝度が向上し好都合である。 The cathode can be produced by forming a thin film of these electrode materials by a method such as vapor deposition or sputtering. The sheet resistance as the cathode is preferably several hundred Ω / □ or less, and the film thickness is usually selected in the range of 10 nm to 5 μm, preferably 50 to 200 nm. In order to transmit the emitted light, if either one of the anode or the cathode of the organic EL element is transparent or translucent, the light emission luminance is improved, which is convenient.
また、陰極に上記金属を1〜20nmの膜厚で作製した後に、陽極の説明で挙げた導電性透明材料をその上に作製することで、透明または半透明の陰極を作製することができ、これを応用することで陽極と陰極の両方が透過性を有する素子を作製することができる。 Moreover, after producing the said metal with a film thickness of 1-20 nm on a cathode, a transparent or semi-transparent cathode can be produced by producing the electroconductive transparent material quoted by description of the anode on it, By applying this, an element in which both the anode and the cathode are transmissive can be manufactured.
《支持基板》
本発明の有機EL素子に用いることのできる支持基板(以下、基体、基板、基材、支持体等ともいう)としては、ガラス、プラスチック等の種類には特に限定はなく、また透明であっても不透明であってもよい。支持基板側から光を取り出す場合には、支持基板は透明であることが好ましい。好ましく用いられる透明な支持基板としては、ガラス、石英、透明樹脂フィルムを挙げることができる。特に好ましい支持基板は、有機EL素子にフレキシブル性を与えることが可能な樹脂フィルムである。
《Support substrate》
The support substrate (hereinafter also referred to as a substrate, substrate, substrate, support, etc.) that can be used in the organic EL device of the present invention is not particularly limited in the type of glass, plastic, etc., and is transparent. May be opaque. When extracting light from the support substrate side, the support substrate is preferably transparent. Examples of the transparent support substrate preferably used include glass, quartz, and a transparent resin film. A particularly preferable support substrate is a resin film capable of giving flexibility to the organic EL element.
樹脂フィルムとしては、例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)等のポリエステル、ポリエチレン、ポリプロピレン、セルロースエステル類(セルロースアセテートプロピオネート(CAP)、セルロースアセテートフタレート(TAC)、セルロースナイトレート等)またはそれらの誘導体、ポリ塩化ビニリデン、ポリエチレンビニルアルコール、シンジオタクティックポリスチレン、ポリカーボネート、ノルボルネン樹脂、ポリメチルペンテン、ポリエーテルケトン、ポリイミド、ポリエーテルスルホン(PES)、ポリフェニレンスルフィド、ポリスルホン類、ポリエーテルイミド、ポリエーテルケトンイミド、ポリアミド、フッ素樹脂、ナイロン、ポリメチルメタクリレート、アクリルあるいはポリアリレート類、アートン(JSR製)あるいはアペル(三井化学製)といったシクロオレフィン系樹脂等を挙げられる。 Examples of the resin film include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellulose esters (cellulose acetate propionate (CAP), cellulose acetate phthalate (TAC), and cellulose nitrate. Etc.) or derivatives thereof, polyvinylidene chloride, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide, polyethersulfone (PES), polyphenylene sulfide, polysulfones, polyether Imide, polyether ketone imide, polyamide, fluororesin, nylon, polymethyl methacrylate, acrylic Alternatively polyarylates, and cycloolefin resins such as ARTON (manufactured by JSR) or APEL (manufactured by Mitsui Chemicals).
樹脂フィルムの表面には、無機物、有機物の被膜またはその両者のハイブリッド被膜が形成されていてもよく、JIS K 7129−1992に準拠した方法で測定された、水蒸気透過度(25±0.5℃、相対湿度(90±2)%RH)が0.01g/(m2・24h)以下のバリア性フィルムであることが好ましく、更には、JIS K 7126−1987に準拠した方法で測定された酸素透過度が10−3cm3/(m2・24h・atm)以下、水蒸気透過度が10−3g/(m2・24h)以下の高バリア性フィルムであることが好ましく、さらには水蒸気透過度が10−5g/(m2・24h)以下であることがより好ましい。 On the surface of the resin film, an inorganic film, an organic film, or a hybrid film of both may be formed. Water vapor permeability (25 ± 0.5 ° C.) measured by a method according to JIS K 7129-1992. , Relative humidity (90 ± 2)% RH) is preferably 0.01 g / (m 2 · 24 h) or less, and further, oxygen measured by a method according to JIS K 7126-1987. Preferably, the film is a high barrier film having a permeability of 10 −3 cm 3 / (m 2 · 24 h · atm) or less and a water vapor permeability of 10 −3 g / (m 2 · 24 h) or less, and moreover, a water vapor transmission rate. The degree is more preferably 10 −5 g / (m 2 · 24 h) or less.
バリア膜を形成する材料としては、水分や酸素等、素子の劣化をもたらすものの浸入を抑制する機能を有する材料であればよく、例えば、酸化珪素、二酸化珪素、窒化珪素等を好適に用いることができる。更に該膜の脆弱性を改良するために、これら無機層と有機材料からなる層の積層構造を持たせることがより好ましい。無機層と有機層の積層順については特に制限はないが、両者を交互に複数回積層させることが好ましい。 As a material for forming the barrier film, any material may be used as long as it has a function of suppressing intrusion of moisture or oxygen that causes deterioration of the element. For example, silicon oxide, silicon dioxide, silicon nitride, or the like is preferably used. it can. Further, in order to improve the brittleness of the film, it is more preferable to have a laminated structure of these inorganic layers and organic material layers. Although there is no restriction | limiting in particular about the lamination | stacking order of an inorganic layer and an organic layer, It is preferable to laminate | stack both alternately several times.
バリア膜の形成方法については特に限定はなく、例えば、真空蒸着法、スパッタリング法、反応性スパッタリング法、分子線エピタキシー法、クラスタ−イオンビーム法、イオンプレーティング法、プラズマ重合法、大気圧プラズマ重合法、プラズマCVD法、レーザーCVD法、熱CVD法、コーティング法等を用いることができ、大気圧プラズマ重合法によるものが特に好ましい。 The method for forming the barrier film is not particularly limited. For example, the vacuum deposition method, sputtering method, reactive sputtering method, molecular beam epitaxy method, cluster ion beam method, ion plating method, plasma polymerization method, atmospheric pressure plasma weight A combination method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used, and an atmospheric pressure plasma polymerization method is particularly preferable.
不透明な支持基板としては、例えば、アルミ、ステンレス等の金属板、フィルムや不透明樹脂基板、セラミック製の基板等が挙げられる。 Examples of the opaque support substrate include metal plates such as aluminum and stainless steel, films, opaque resin substrates, and ceramic substrates.
本発明の有機EL素子の発光の室温における外部取り出し量子効率は、1%以上であることが好ましく、より好ましくは5%以上である。ここに、外部取り出し量子効率(%)=有機EL素子外部に発光した光子数/有機EL素子に流した電子数×100である。 The external extraction quantum efficiency at room temperature of light emission of the organic EL device of the present invention is preferably 1% or more, more preferably 5% or more. Here, the external extraction quantum efficiency (%) = the number of photons emitted to the outside of the organic EL element / the number of electrons sent to the organic EL element × 100.
また、カラーフィルター等の色相改良フィルター等を併用しても、有機EL素子からの発光色を蛍光体で多色へ変換する色変換フィルターを併用してもよい。色変換フィルターを用いる場合においては、有機EL素子の発光のλmaxは480nm以下が好ましい。 In addition, a hue improvement filter such as a color filter may be used in combination, or a color conversion filter that converts the emission color from the organic EL element into multiple colors with a phosphor may be used in combination. In the case of using a color conversion filter, the λmax of light emission of the organic EL element is preferably 480 nm or less.
《封止》
本発明に用いられる封止手段としては、例えば、封止部材と電極、支持基板とを接着剤で接着する方法を挙げることができる。
<Sealing>
As a sealing means used for this invention, the method of adhere | attaching a sealing member, an electrode, and a support substrate with an adhesive agent can be mentioned, for example.
封止部材としては、有機EL素子の表示領域を覆うように配置されておればよく、凹板状でも平板状でもよい。また、透明性、電気絶縁性は特に問わない。 As a sealing member, it should just be arrange | positioned so that the display area | region of an organic EL element may be covered, and concave plate shape or flat plate shape may be sufficient. Further, transparency and electrical insulation are not particularly limited.
具体的には、ガラス板、ポリマー板・フィルム、金属板・フィルム等が挙げられる。ポリマー板としては、ポリカーボネート、アクリル、ポリエチレンテレフタレート、ポリエーテルサルファイド、ポリスルホン等を挙げることができる。金属板としては、ステンレス、鉄、銅、アルミニウム、マグネシウム、ニッケル、亜鉛、クロム、チタン、モリブテン、シリコン、ゲルマニウム及びタンタルからなる群から選ばれる一種以上の金属または合金からなるものが挙げられる。 Specific examples include a glass plate, a polymer plate / film, and a metal plate / film. Examples of the polymer plate include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone. Examples of the metal plate include those made of one or more metals or alloys selected from the group consisting of stainless steel, iron, copper, aluminum, magnesium, nickel, zinc, chromium, titanium, molybdenum, silicon, germanium, and tantalum.
本発明においては、素子を薄膜化できるということからポリマーフィルム、金属フィルムを好ましく使用することができる。更には、ポリマーフィルムは、JIS K 7126−1987に準拠した方法で測定された酸素透過度が1×10−3cm3/(m2・24h・atm)以下、JIS K 7129−1992に準拠した方法で測定された水気透過度(25±0.5℃、相対湿度(90±2)%RH)が1×10−3g/(m2・24h)以下のものであることが好ましい。 In the present invention, a polymer film and a metal film can be preferably used because the element can be thinned. Further, the polymer film has an oxygen permeability measured by a method according to JIS K 7126-1987 of 1 × 10 −3 cm 3 / (m 2 · 24 h · atm) or less, and conforms to JIS K 7129-1992. The water permeability (25 ± 0.5 ° C., relative humidity (90 ± 2)% RH) measured by the method is preferably 1 × 10 −3 g / (m 2 · 24 h) or less.
接着剤として具体的には、アクリル酸系オリゴマー、メタクリル酸系オリゴマーの反応性ビニル基を有する光硬化及び熱硬化型接着剤、2−シアノアクリル酸エステル等の湿気硬化型等の接着剤を挙げることができる。また、エポキシ系等の熱及び化学硬化型(二液混合)を挙げることができる。また、ホットメルト型のポリアミド、ポリエステル、ポリオレフィンを挙げることができる。また、カチオン硬化タイプの紫外線硬化型エポキシ樹脂接着剤を挙げることができる。 Specific examples of the adhesive include photocuring and thermosetting adhesives having reactive vinyl groups such as acrylic acid oligomers and methacrylic acid oligomers, and moisture curing adhesives such as 2-cyanoacrylates. be able to. Moreover, heat | fever and chemical curing types (two-component mixing), such as an epoxy type, can be mentioned. Moreover, hot-melt type polyamide, polyester, and polyolefin can be mentioned. Moreover, a cationic curing type ultraviolet curing epoxy resin adhesive can be mentioned.
なお、熱硬化型接着剤を用いる場合、有機EL素子が熱処理により劣化する場合があるので、室温から80℃までに接着硬化できるものが好ましい。また、前記接着剤中に乾燥剤を分散させておいてもよい。封止部分への接着剤の塗布は市販のディスペンサーを使ってもよいし、スクリーン印刷のように印刷してもよい。 In addition, when using a thermosetting adhesive, since an organic EL element may deteriorate with heat processing, what can be adhesively cured from room temperature to 80 degreeC is preferable. A desiccant may be dispersed in the adhesive. Application | coating of the adhesive agent to a sealing part may use commercially available dispenser, and may print like screen printing.
また、有機層を挟み支持基板と対向する側の電極の外側に該電極と有機層を被覆し、支持基板と接する形で無機物、有機物の層を形成し封止膜とすることも好適にできる。この場合、該膜を形成する材料としては、水分や酸素等素子の劣化をもたらすものの浸入を抑制する機能を有する材料であればよく、例えば、酸化珪素、二酸化珪素、窒化珪素等を用いることができる。更に該膜の脆弱性を改良するために、これら無機層と有機材料からなる層の積層構造を持たせることが好ましい。これらの膜の形成方法については、特に限定はなく、例えば真空蒸着法、スパッタリング法、反応性スパッタリング法、分子線エピタキシー法、クラスタ−イオンビーム法、イオンプレーティング法、プラズマ重合法、大気圧プラズマ重合法、プラズマCVD法、レーザーCVD法、熱CVD法、コーティング法等を用いることができる。 In addition, it is also preferable that the electrode and the organic layer are coated on the outside of the electrode facing the support substrate with the organic layer interposed therebetween, and an inorganic or organic layer is formed in contact with the support substrate to form a sealing film. . In this case, the material for forming the film may be any material that has a function of suppressing intrusion of elements that cause deterioration of elements such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like may be used. it can. Further, in order to improve the brittleness of the film, it is preferable to have a laminated structure of these inorganic layers and layers made of organic materials. The method for forming these films is not particularly limited. For example, vacuum deposition, sputtering, reactive sputtering, molecular beam epitaxy, cluster-ion beam method, ion plating method, plasma polymerization method, atmospheric pressure plasma A polymerization method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used.
封止部材と有機EL素子の表示領域との間隙には、気相及び液相では、窒素、アルゴン等の不活性気体やフッ化炭化水素、シリコンオイルのような不活性液体を注入することが好ましい。また真空とすることも可能である。また、内部に吸湿性化合物を封入することもできる。 In the gap between the sealing member and the display area of the organic EL element, an inert gas such as nitrogen or argon, or an inert liquid such as fluorinated hydrocarbon or silicon oil can be injected in the gas phase and liquid phase. preferable. A vacuum is also possible. Moreover, a hygroscopic compound can also be enclosed inside.
吸湿性化合物としては、例えば、金属酸化物(例えば、酸化ナトリウム、酸化カリウム、酸化バリウム、酸化マグネシウム、酸化アルミニウム等)、硫酸塩(例えば、硫酸ナトリウム、硫酸カルシウム、硫酸マグネシウム等)、金属ハロゲン化物、過塩素酸類等が挙げられ、無水塩が好適に用いられる。 Examples of the hygroscopic compound include metal oxides (for example, sodium oxide, potassium oxide, barium oxide, magnesium oxide, aluminum oxide, etc.), sulfates (for example, sodium sulfate, calcium sulfate, magnesium sulfate, etc.), metal halides. Perchloric acids and the like, and anhydrous salts are preferably used.
《保護膜、保護板》
有機層を挟み支持基板と対向する側の前記封止膜、あるいは前記封止用フィルムの外側に、素子の機械的強度を高めるために保護膜、あるいは保護板を設けてもよい。特に封止が前記封止膜により行われている場合には、保護膜、保護板を設けることが好ましい。これに使用することができる材料としては、前記封止に用いたのと同様なガラス板、ポリマー板・フィルム、金属板・フィルム等を用いることができるが、軽量、且つ薄膜化ということからポリマーフィルムを用いることが好ましい。
《Protective film, protective plate》
In order to increase the mechanical strength of the element, a protective film or a protective plate may be provided on the outer side of the sealing film on the side facing the support substrate with the organic layer interposed therebetween or on the sealing film. In particular, when sealing is performed by the sealing film, it is preferable to provide a protective film and a protective plate. As a material that can be used for this, the same glass plate, polymer plate / film, metal plate / film, etc. used for the sealing can be used. It is preferable to use a film.
《光取り出し》
有機EL素子は空気よりも屈折率の高い(屈折率が1.7〜2.1程度)層の内部で発光し、発光層で発生した光のうち15%から20%程度の光しか取り出せないことが一般的に言われている。これは、臨界角以上の角度θで界面(透明基板と空気との界面)に入射する光は、全反射を起こし素子外部に取り出すことができないことや、透明電極ないし発光層と透明基板との間で光が全反射を起こし、光が透明電極ないし発光層を導波し、結果として光が素子側面方向に逃げるためである。
《Light extraction》
The organic EL element emits light inside a layer having a refractive index higher than that of air (refractive index is about 1.7 to 2.1) and can extract only about 15% to 20% of the light generated in the light emitting layer. It is generally said. This is because light incident on the interface (interface between the transparent substrate and air) at an angle θ greater than the critical angle causes total reflection and cannot be taken out of the device, or between the transparent electrode or light emitting layer and the transparent substrate. This is because the light is totally reflected between the light and the light is guided through the transparent electrode or the light emitting layer, and as a result, the light escapes in the direction of the element side surface.
この光の取り出しの効率を向上させる手法としては、例えば、透明基板表面に凹凸を形成し、透明基板と空気界面での全反射を防ぐ方法(米国特許第4,774,435号明細書)、基板に集光性を持たせることにより効率を向上させる方法(特開昭63−314795号公報)、素子の側面等に反射面を形成する方法(特開平1−220394号公報)、基板と発光体の間に中間の屈折率を持つ平坦層を導入し、反射防止膜を形成する方法(特開昭62−172691号公報)、基板と発光体の間に基板よりも低屈折率を持つ平坦層を導入する方法(特開2001−202827号公報)、基板、透明電極層や発光層のいずれかの層間(含む、基板と外界間)に回折格子を形成する方法(特開平11−283751号公報)等がある。 As a method for improving the light extraction efficiency, for example, a method of forming irregularities on the surface of the transparent substrate to prevent total reflection at the interface between the transparent substrate and the air (US Pat. No. 4,774,435), A method of improving efficiency by providing a light collecting property to a substrate (Japanese Patent Laid-Open No. 63-314795), a method of forming a reflective surface on a side surface of an element (Japanese Patent Laid-Open No. 1-220394), and light emission from a substrate A method of forming an antireflection film by introducing a flat layer having an intermediate refractive index between the bodies (Japanese Patent Laid-Open No. 62-172691), a flat having a lower refractive index between the substrate and the light emitter than the substrate A method of introducing a layer (Japanese Patent Laid-Open No. 2001-202827), a method of forming a diffraction grating between any one of a substrate, a transparent electrode layer and a light emitting layer (including between the substrate and the outside) (Japanese Patent Laid-Open No. 11-283951) Gazette).
本発明においては、これらの方法を本発明の有機EL素子と組み合わせて用いることができるが、基板と発光体の間に基板よりも低屈折率を持つ平坦層を導入する方法、あるいは基板、透明電極層や発光層のいずれかの層間(含む、基板と外界間)に回折格子を形成する方法を好適に用いることができる。本発明はこれらの手段を組み合わせることにより、更に高輝度あるいは耐久性に優れた素子を得ることができる。 In the present invention, these methods can be used in combination with the organic EL device of the present invention. However, a method of introducing a flat layer having a lower refractive index than the substrate between the substrate and the light emitter, or a substrate, transparent A method of forming a diffraction grating between any layers of the electrode layer and the light emitting layer (including between the substrate and the outside) can be suitably used. In the present invention, by combining these means, it is possible to obtain an element having higher luminance or durability.
透明電極と透明基板の間に低屈折率の媒質を光の波長よりも長い厚みで形成すると、透明電極から出てきた光は、媒質の屈折率が低いほど外部への取り出し効率が高くなる。 When a medium having a low refractive index is formed between the transparent electrode and the transparent substrate with a thickness longer than the wavelength of light, the light extracted from the transparent electrode has a higher extraction efficiency to the outside as the refractive index of the medium is lower.
低屈折率層としては、例えば、エアロゲル、多孔質シリカ、フッ化マグネシウム、フッ素系ポリマー等が挙げられる。透明基板の屈折率は一般に1.5〜1.7程度であるので、低屈折率層は屈折率がおよそ1.5以下であることが好ましい。また、更に1.35以下であることが好ましい。 Examples of the low refractive index layer include aerogel, porous silica, magnesium fluoride, and a fluorine-based polymer. Since the refractive index of the transparent substrate is generally about 1.5 to 1.7, the low refractive index layer preferably has a refractive index of about 1.5 or less. Further, it is preferably 1.35 or less.
また、低屈折率媒質の厚みは媒質中の波長の2倍以上となるのが望ましい。これは低屈折率媒質の厚みが、光の波長程度になってエバネッセントで染み出した電磁波が基板内に入り込む膜厚になると、低屈折率層の効果が薄れるからである。 The thickness of the low refractive index medium is preferably at least twice the wavelength in the medium. This is because the effect of the low refractive index layer is diminished when the thickness of the low refractive index medium is about the wavelength of light and the electromagnetic wave that has exuded by evanescent enters the substrate.
全反射を起こす界面もしくはいずれかの媒質中に回折格子を導入する方法は、光取り出し効率の向上効果が高いという特徴がある。この方法は回折格子が1次の回折や2次の回折といった、所謂ブラッグ回折により、光の向きを屈折とは異なる特定の向きに変えることができる性質を利用して、発光層から発生した光のうち層間での全反射等により外に出ることができない光を、いずれかの層間もしくは、媒質中(透明基板内や透明電極内)に回折格子を導入することで光を回折させ、光を外に取り出そうとするものである。 The method of introducing a diffraction grating into an interface or any medium that causes total reflection is characterized by a high effect of improving light extraction efficiency. This method uses the property that the diffraction grating can change the direction of light to a specific direction different from refraction by so-called Bragg diffraction, such as first-order diffraction or second-order diffraction, and light generated from the light-emitting layer. The light that cannot go out due to total reflection between layers, etc. is diffracted by introducing a diffraction grating in any layer or medium (in the transparent substrate or transparent electrode). It is intended to be taken out.
導入する回折格子は、二次元的な周期屈折率を持っていることが望ましい。これは発光層で発光する光はあらゆる方向にランダムに発生するので、ある方向にのみ周期的な屈折率分布を持っている一般的な1次元回折格子では、特定の方向に進む光しか回折されず、光の取り出し効率がさほど上がらない。しかしながら、屈折率分布を二次元的な分布にすることにより、あらゆる方向に進む光が回折され、光の取り出し効率が上がる。 The introduced diffraction grating desirably has a two-dimensional periodic refractive index. This is because light emitted from the light-emitting layer is randomly generated in all directions, so in a general one-dimensional diffraction grating having a periodic refractive index distribution only in a certain direction, only light traveling in a specific direction is diffracted. Therefore, the light extraction efficiency does not increase so much. However, by making the refractive index distribution a two-dimensional distribution, light traveling in all directions is diffracted, and light extraction efficiency is increased.
回折格子を導入する位置としては前述の通り、いずれかの層間もしくは媒質中(透明基板内や透明電極内)でもよいが、光が発生する場所である有機発光層の近傍が望ましい。このとき、回折格子の周期は媒質中の光の波長の約1/2〜3倍程度が好ましい。 As described above, the position where the diffraction grating is introduced may be in any of the layers or in the medium (in the transparent substrate or in the transparent electrode), but is preferably in the vicinity of the organic light emitting layer where light is generated. At this time, the period of the diffraction grating is preferably about 1/2 to 3 times the wavelength of light in the medium.
回折格子の配列は正方形のラチス状、三角形のラチス状、ハニカムラチス状等、2次元的に配列が繰り返されることが好ましい。 The arrangement of the diffraction grating is preferably two-dimensionally repeated, such as a square lattice, a triangular lattice, or a honeycomb lattice.
《集光シート》
本発明の有機EL素子は基板の光取り出し側に、例えば、マイクロレンズアレイ状の構造を設けるように加工したり、あるいは所謂集光シートと組み合わせたりすることにより、特定方向、例えば、素子発光面に対し正面方向に集光することにより、特定方向上の輝度を高めることができる。
<Condenser sheet>
The organic EL device of the present invention can be processed to provide, for example, a microlens array-like structure on the light extraction side of the substrate, or combined with a so-called condensing sheet, for example, in a specific direction, for example, the device light emitting surface. On the other hand, the brightness | luminance in a specific direction can be raised by condensing in a front direction.
マイクロレンズアレイの例としては、基板の光取り出し側に一辺が30μmでその頂角が90度となるような四角錐を2次元に配列する。一辺は10μm〜100μmが好ましい。これより小さくなると回折の効果が発生して色付く、大きすぎると厚みが厚くなり好ましくない。 As an example of the microlens array, quadrangular pyramids having a side of 30 μm and an apex angle of 90 degrees are two-dimensionally arranged on the light extraction side of the substrate. One side is preferably 10 μm to 100 μm. If it becomes smaller than this, the effect of diffraction will generate | occur | produce and color, and if too large, thickness will become thick and is not preferable.
集光シートとしては、例えば、液晶表示装置のLEDバックライトで実用化されているものを用いることが可能である。このようなシートとして、例えば、住友スリーエム社製輝度上昇フィルム(BEF)等を用いることができる。プリズムシートの形状としては、例えば、基材に頂角90度、ピッチ50μmの△状のストライプが形成されたものであってもよいし、頂角が丸みを帯びた形状、ピッチをランダムに変化させた形状、その他の形状であってもよい。 As the condensing sheet, for example, a sheet that is put into practical use in an LED backlight of a liquid crystal display device can be used. As such a sheet, for example, a brightness enhancement film (BEF) manufactured by Sumitomo 3M Limited can be used. As the shape of the prism sheet, for example, the base material may be formed by forming a △ -shaped stripe having a vertex angle of 90 degrees and a pitch of 50 μm, or the vertex angle is rounded and the pitch is changed randomly. Other shapes may be used.
また、発光素子からの光放射角を制御するために、光拡散板・フィルムを集光シートと併用してもよい。例えば、(株)きもと製拡散フィルム(ライトアップ)等を用いることができる。 Moreover, in order to control the light emission angle from a light emitting element, you may use together a light diffusing plate and a film with a condensing sheet. For example, a diffusion film (light-up) manufactured by Kimoto Co., Ltd. can be used.
《有機EL素子の作製方法》
本発明の有機EL素子の作製方法の一例として、陽極/正孔注入層/正孔輸送層/発光層/電子輸送層/電子注入層/陰極からなる有機EL素子の作製法を説明する。
<< Method for producing organic EL element >>
As an example of the method for producing the organic EL device of the present invention, a method for producing an organic EL device comprising an anode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode will be described.
まず適当な基体上に所望の電極物質、例えば、陽極用物質からなる薄膜を1μm以下、好ましくは10〜200nmの膜厚になるように、蒸着やスパッタリング等の方法により形成させ陽極を作製する。 First, a desired electrode material, for example, a thin film made of an anode material is formed on a suitable substrate by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably 10 to 200 nm, thereby producing an anode.
次に、この上に有機EL素子材料である正孔注入層、正孔輸送層、発光層、電子輸送層、電子注入層、正孔阻止層の有機化合物薄膜を形成させる。 Next, an organic compound thin film of a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, and a hole blocking layer, which are organic EL element materials, is formed thereon.
これら各層の形成方法としては、前記の如く蒸着法、ウェットプロセス(スピンコート法、キャスト法、インクジェット法、印刷法)等があるが、均質な膜が得られやすく、且つピンホールが生成しにくい等の点から、本発明においてはウェットプロセスが好ましく、中でもスピンコート法、インクジェット法、印刷法等の塗布法による成膜が好ましい。 As a method for forming each of these layers, there are a vapor deposition method, a wet process (spin coating method, casting method, ink jet method, printing method) and the like as described above. In view of the above, in the present invention, a wet process is preferable, and film formation by a coating method such as a spin coating method, an ink jet method, or a printing method is particularly preferable.
本発明の有機EL素子材料を溶解または分散する液媒体としては、例えば、メチルエチルケトン、シクロヘキサノン等のケトン類、酢酸エチル等の脂肪酸エステル類、ジクロロベンゼン等のハロゲン化炭化水素類、トルエン、キシレン、メシチレン、シクロヘキシルベンゼン等の芳香族炭化水素類、シクロヘキサン、デカリン、ドデカン等の脂肪族炭化水素類、DMF、DMSO等の有機溶媒を用いることができる。また、分散方法としては、超音波、高剪断力分散やメディア分散等の分散方法により分散することができる。 Examples of the liquid medium for dissolving or dispersing the organic EL device material of the present invention include ketones such as methyl ethyl ketone and cyclohexanone, fatty acid esters such as ethyl acetate, halogenated hydrocarbons such as dichlorobenzene, toluene, xylene, and mesitylene. Aromatic hydrocarbons such as cyclohexylbenzene, aliphatic hydrocarbons such as cyclohexane, decalin, and dodecane, and organic solvents such as DMF and DMSO can be used. Moreover, as a dispersion method, it can disperse | distribute by dispersion methods, such as an ultrasonic wave, high shear force dispersion | distribution, and media dispersion | distribution.
これらの層を形成後、その上に陰極用物質からなる薄膜を1μm以下、好ましくは50〜200nmの範囲の膜厚になるように、例えば、蒸着やスパッタリング等の方法により形成させ、陰極を設けることにより所望の有機EL素子が得られる。 After these layers are formed, a thin film made of a cathode material is formed thereon by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably 50 to 200 nm, and a cathode is provided. Thus, a desired organic EL element can be obtained.
また、作製順序を逆にして、陰極、電子注入層、電子輸送層、発光層、正孔輸送層、正孔注入層、陽極の順に作製することも可能である。このようにして得られた多色の表示装置に、直流電圧を印加する場合には陽極を+、陰極を−の極性として電圧2〜40V程度を印加すると発光が観測できる。また、交流電圧を印加してもよい。なお、印加する交流の波形は任意でよい。 In addition, it is also possible to reverse the production order and produce the cathode, the electron injection layer, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode in this order. When a DC voltage is applied to the multicolor display device thus obtained, light emission can be observed by applying a voltage of about 2 to 40 V with the positive polarity of the anode and the negative polarity of the cathode. An alternating voltage may be applied. The alternating current waveform to be applied may be arbitrary.
《用途》
本発明の有機EL素子は、表示デバイス、ディスプレイ、各種発光光源として用いることができる。発光光源として、例えば、照明装置(家庭用照明、車内照明)、時計や液晶用バックライト、看板広告、信号機、光記憶媒体の光源、電子写真複写機の光源、光通信処理機の光源、光センサーの光源等が挙げられるがこれに限定するものではないが、特に液晶表示装置のバックライト、照明用光源としての用途に有効に用いることができる。
<Application>
The organic EL element of the present invention can be used as a display device, a display, and various light emission sources. For example, lighting devices (home lighting, interior lighting), clock and liquid crystal backlights, billboard advertisements, traffic lights, light sources of optical storage media, light sources of electrophotographic copying machines, light sources of optical communication processors, light Although the light source of a sensor etc. are mentioned, It is not limited to this, Especially, it can use effectively for the use as a backlight of a liquid crystal display device, and a light source for illumination.
本発明の有機EL素子においては、必要に応じ成膜時にメタルマスクやインクジェットプリンティング法等でパターニングを施してもよい。パターニングする場合は、電極のみをパターニングしてもよいし、電極と発光層をパターニングしてもよいし、素子全層をパターニングしてもよく、素子の作製においては、従来公知の方法を用いることができる。 In the organic EL element of the present invention, patterning may be performed by a metal mask, an ink jet printing method, or the like as needed during film formation. In the case of patterning, only the electrode may be patterned, the electrode and the light emitting layer may be patterned, or the entire layer of the element may be patterned. In the fabrication of the element, a conventionally known method is used. Can do.
本発明の有機EL素子や本発明に係る化合物の発光する色は、「新編色彩科学ハンドブック」(日本色彩学会編、東京大学出版会、1985)の108頁の図4.16において、分光放射輝度計CS−1000(コニカミノルタセンシング社製)で測定した結果をCIE色度座標に当てはめたときの色で決定される。
The light emission color of the organic EL device of the present invention and the compound according to the present invention is shown in FIG. 4.16 on
また、本発明の有機EL素子が白色素子の場合には、白色とは、2度視野角正面輝度を上記方法により測定した際に、1000cd/m2でのCIE1931表色系における色度がX=0.33±0.07、Y=0.33±0.1の領域内にあることを言う。 Further, when the organic EL element of the present invention is a white element, white means that the chromaticity in the CIE 1931 color system at 1000 cd / m 2 is X when the 2 ° viewing angle front luminance is measured by the above method. = 0.33 ± 0.07 and Y = 0.33 ± 0.1.
以下、本発明の有機EL素子を有する表示装置の一例を図面に基づいて説明する。 Hereinafter, an example of a display device having the organic EL element of the present invention will be described with reference to the drawings.
図1は有機EL素子から構成される表示装置の一例を示した模式図である。有機EL素子の発光により画像情報の表示を行う、例えば、携帯電話等のディスプレイの模式図である。 FIG. 1 is a schematic view showing an example of a display device composed of organic EL elements. It is a schematic diagram of a display such as a mobile phone that displays image information by light emission of an organic EL element.
ディスプレイ1は複数の画素を有する表示部A、画像情報に基づいて表示部Aの画像走査を行う制御部B等からなる。 The display 1 includes a display unit A having a plurality of pixels, a control unit B that performs image scanning of the display unit A based on image information, and the like.
制御部Bは表示部Aと電気的に接続され、複数の画素それぞれに外部からの画像情報に基づいて走査信号と画像データ信号を送り、走査信号により走査線毎の画素が画像データ信号に応じて順次発光して画像走査を行って画像情報を表示部Aに表示する。 The control unit B is electrically connected to the display unit A, and sends a scanning signal and an image data signal to each of a plurality of pixels based on image information from the outside. The image information is sequentially emitted to scan the image and display the image information on the display unit A.
図2は表示部Aの模式図である。 FIG. 2 is a schematic diagram of the display unit A.
表示部Aは基板上に、複数の走査線5及びデータ線6を含む配線部と複数の画素3等とを有する。表示部Aの主要な部材の説明を以下に行う。
The display unit A includes a wiring unit including a plurality of
図においては、画素3の発光した光が白矢印方向(下方向)へ取り出される場合を示している。 In the figure, the light emitted from the pixel 3 is extracted in the direction of the white arrow (downward).
配線部の走査線5及び複数のデータ線6はそれぞれ導電材料からなり、走査線5とデータ線6は格子状に直交して、直交する位置で画素3に接続している(詳細は図示していない)。
The
画素3は走査線5から走査信号が印加されると、データ線6から画像データ信号を受け取り、受け取った画像データに応じて発光する。
When a scanning signal is applied from the
発光の色が赤領域の画素、緑領域の画素、青領域の画素を適宜同一基板上に並置することによって、フルカラー表示が可能となる。 Full-color display is possible by appropriately arranging pixels in the red region, the green region, and the blue region on the same substrate.
図3は照明装置の概略図を示し、有機EL素子101はガラスカバー102で覆われている(なお、ガラスカバーでの封止作業は、有機EL素子101を大気に接触させることなく窒素雰囲気下のグローブボックス(純度99.999%以上の高純度窒素ガスの雰囲気下)で行った)。図4は照明装置の断面図を示し、図4において、各々陰極105、有機EL層106、透明電極付きガラス基板107を示す。なお、ガラスカバー102内には窒素ガス108が充填され、捕水剤109が設けられている。
FIG. 3 is a schematic diagram of the lighting device, and the
以下、実施例により本発明を説明するが、本発明はこれらに限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these.
なお、実施例において「%」の表示を用いるが、特に断りが無い限り「質量%」を表す。また、実施例において用いられる標準的な化合物と比較化合物を下記に示す。 In addition, although the display of "%" is used in an Example, unless otherwise indicated, "mass%" is represented. In addition, standard compounds and comparative compounds used in Examples are shown below.
実施例1
《有機EL素子の作製》
〔有機EL素子1−1の作製〕
100mm×100mm×1.1mmのガラス基板上にITO(インジウムチンオキサイド)を厚さ200nmで製膜した基板を用い、ITO膜を50mm×50mmの発光面積が得られるようパターニングして陽極電極(ITO透明電極)を作成し、イソプロピルアルコールで超音波洗浄し、窒素ガスで乾燥、さらにUVオゾン洗浄を行い、透明支持基板を作製した。
Example 1
<< Production of organic EL element >>
[Production of Organic EL Element 1-1]
Using a substrate in which ITO (indium tin oxide) is formed to a thickness of 200 nm on a glass substrate of 100 mm × 100 mm × 1.1 mm, the ITO film is patterned to obtain a light emitting area of 50 mm × 50 mm, and an anode electrode (ITO) A transparent electrode) was prepared, ultrasonically cleaned with isopropyl alcohol, dried with nitrogen gas, and further subjected to UV ozone cleaning to prepare a transparent support substrate.
この透明支持基板を市販の真空蒸着装置に入れ、4×10−4Pa以下まで減圧した後、正孔注入層としてCuPc(銅フタロシアニン)を蒸着し、20nmの正孔注入層を設けた。 This transparent support substrate was put into a commercially available vacuum deposition apparatus, and after reducing the pressure to 4 × 10 −4 Pa or less, CuPc (copper phthalocyanine) was deposited as a hole injection layer to provide a 20 nm hole injection layer.
さらに続けてHT−1を20nm蒸着し正孔輸送層とし、その上にホスト材料として化合物(15)とドーパント材料としてD−36をドーパント濃度が6%となるようにした発光層を30nm蒸着した。更にET−1を30nm蒸着して電子輸送層とし、引き続きフッ化リチウムを0.5nm蒸着し電子注入層を形成し、アルミニウム120nmを蒸着して陰極を製膜し、有機EL素子1−1とした。作製後の各素子は、非発光面をガラスケースで覆い、周縁部をエポキシ系接着剤で封止し、評価を実施した。 The HT-1 and 20nm deposited a hole transport layer continues further, a light emitting layer of D-36 was as dopant concentration of 6% and to reduction compound host material thereon and (15) as a dopant material 30 nm was deposited. Further, 30 nm of ET-1 is evaporated to form an electron transport layer, 0.5 nm of lithium fluoride is subsequently evaporated to form an electron injection layer, 120 nm of aluminum is evaporated to form a cathode, and the organic EL device 1-1 is formed. did. Each element after fabrication was evaluated by covering the non-light emitting surface with a glass case and sealing the peripheral edge with an epoxy adhesive.
≪有機EL素子1−2〜1−15の作製≫
有機EL素子1−1の作製において、表1に記載の様に電子輸送材料、ホスト材料および正孔輸送材料をそれぞれ変更した以外は同様にして、有機EL素子1−2〜1−15を作製した。
<< Production of Organic EL Elements 1-2 to 1-15 >>
In the production of the organic EL element 1-1, the organic EL elements 1-2 to 1-15 were produced in the same manner except that the electron transport material, the host material, and the hole transport material were changed as shown in Table 1. did.
≪有機EL素子1−1〜1−15の評価≫
下記の方法によって有機EL素子1−1〜1−15の効率および安定性を評価した。結果を合わせて表1に示す。
<< Evaluation of Organic EL Elements 1-1 to 1-15 >>
The efficiency and stability of the organic EL elements 1-1 to 1-15 were evaluated by the following methods. The results are shown in Table 1.
(効率)
作製した有機EL素子1−1〜1−15について、2.5mA/cm2の定電流を印加した際の外部取出し量子効率を測定した。なお、測定には分光放射輝度計CS−1000(コニカミノルタセンシング社製)を用いた。表1の効率の値は、有機EL素子1−1〜1−6に対しては有機EL素子1−1の測定値を100とし、有機EL素子1−7〜1−11に対しては有機EL素子1−7の測定値を100とし、有機EL素子1−12〜1−15に対しては有機EL素子1−12の測定値を100とした場合の相対値で表した。
(efficiency)
About the produced organic EL elements 1-1 to 1-15, the external extraction quantum efficiency when a constant current of 2.5 mA / cm 2 was applied was measured. For the measurement, a spectral radiance meter CS-1000 (manufactured by Konica Minolta Sensing) was used. The values of efficiency in Table 1 are 100 for the organic EL elements 1-1 to 1-6, and 100 for the organic EL elements 1-7 to 1-11. The measured value of the EL element 1-7 was set to 100, and relative to the organic EL elements 1-12 to 1-15, the measured value of the organic EL element 1-12 was set to 100.
(安定性)
作製した有機EL素子1−1〜1−15について、初期輝度1000cd/m2を与える電流で定電流駆動し、初期輝度の1/2(500cd/m2)になる時間を測定し、これを安定性の尺度とした。なお、効率の評価と同様に安定性の値は、有機EL素子1−1〜1−6に対しては有機EL素子1−1の測定値を100とし、有機EL素子1−7〜1−11に対しては有機EL素子1−7の測定値を100とし、有機EL素子1−12〜1−15に対しては有機EL素子1−12の測定値を100とした場合の相対値で表した。初期輝度が1000cd/m2に至らなかった素子については×印で示した。
(Stability)
About the produced organic EL elements 1-1 to 1-15, a constant current drive is performed with a current that gives an initial luminance of 1000 cd / m 2 , and a time that is ½ (500 cd / m 2 ) of the initial luminance is measured. A measure of stability. Similar to the evaluation of efficiency, the stability value is 100 for the organic EL elements 1-1 to 1-6, and the measured value of the organic EL element 1-1 is 100. 11 is a relative value when the measured value of the organic EL element 1-7 is 100, and the measured value of the organic EL element 1-12 is 100 for the organic EL elements 1-12 to 1-15. expressed. An element whose initial luminance did not reach 1000 cd / m 2 is indicated by a cross.
(ダークスポット)
安定性評価後の有機EL素子1−1〜1−15について、ダークスポットの有無を目視にて確認し、下記の評価基準に従って評価を行った。実用上、◎〜○であることが好ましい。なお、安定性評価で×印であったものについては、評価していない。
(Dark spot)
About the organic EL element 1-1 to 1-15 after stability evaluation, the presence or absence of a dark spot was confirmed visually, and evaluation was performed according to the following evaluation criteria. Practically, it is preferable that it is (double-circle)-(circle). In addition, what was x mark by stability evaluation is not evaluated.
◎:ダークスポットが確認されない
○:ダークスポットが1〜5個確認される
△:ダークスポットが6個以上確認されるが発光面積は素子の半分以上
×:大きくダークスポットが広がり、素子の半分以上が非発光
◎: No dark spot is confirmed. ○: 1 to 5 dark spots are confirmed. △: 6 or more dark spots are confirmed, but the emission area is more than half of the device. Is non-luminous
以上より、本発明の有機EL素子用材料を用いることで効率と安定性に優れ、ダークスポットの少ない有機EL素子を提供できることが明らかとなった。 From the above, it has been clarified that by using the organic EL element material of the present invention, an organic EL element having excellent efficiency and stability and having few dark spots can be provided.
実施例2
≪白色発光素子および白色照明装置の作製−1≫
陽極として20mm×20mmにパターニング済みのITO付きガラス基板上に、上記実施例1と同様にして正孔注入/輸送層としてHT−1を25nmの厚さで製膜し、さらに化合物(24)とD−34とD−39をそれぞれ蒸着速度が100:0.5:8となるように調節し、膜厚40nmの発光層を設けた。次に正孔阻止層としてBAlqを10nm製膜し、続いてAlq3を40nm製膜し電子輸送層を設けた。引き続き電子注入層としてフッ化リチウムを0.5nmの厚さに形成した後、陰極としてアルミニウム150nmを製膜し、非発光面をガラスケースで覆い、エポキシ系接着剤で封止した。
Example 2
<< Production of White Light Emitting Element and White Lighting Device-1 >>
On the glass substrate with ITO patterned to 20 mm × 20 mm as the anode, HT-1 as a hole injecting / transporting layer was formed to a thickness of 25 nm in the same manner as in Example 1, and the compound (24) and D-34 and D-39 were adjusted such that the deposition rate was 100: 0.5: 8, and a light-emitting layer having a thickness of 40 nm was provided. Next, 10 nm of BAlq was formed as a hole blocking layer, and then 40 nm of Alq 3 was formed to provide an electron transport layer. Subsequently, lithium fluoride was formed to a thickness of 0.5 nm as an electron injection layer, and then 150 nm of aluminum was formed as a cathode. The non-light emitting surface was covered with a glass case and sealed with an epoxy adhesive.
この素子を用いて図3、図4に示す平面ランプを作製した。この平面ランプに通電したところ、ほぼ白色の光が得られ、照明装置として使用できることが分かった。 The flat lamp shown in FIGS. 3 and 4 was produced using this element. When this flat lamp was energized, it was found that almost white light was obtained and it could be used as a lighting device.
実施例3
≪白色発光素子および白色照明装置の作製−2≫
上記白色発光素子および白色照明装置の作製−1と同じ基板上にポリ(3,4−エチレンジオキシチオフェン)−ポリスチレンスルホネート(PEDOT/PSS、Bayer製、Baytron P Al 4083)を純水で70%に希釈した溶液を3000rpm、30秒スピンコートした後、乾燥し、膜厚30nmの正孔輸送層を設けた。
Example 3
<< Production of White Light Emitting Element and White Lighting Device-2 >>
Poly (3,4-ethylenedioxythiophene) -polystyrene sulfonate (PEDOT / PSS, manufactured by Bayer, Baytron P Al 4083) is 70% pure water on the same substrate as that for preparation of the white light emitting element and the white lighting device. The solution diluted in (1) was spin-coated at 3000 rpm for 30 seconds and then dried to provide a hole transport layer having a thickness of 30 nm.
さらにこの正孔輸送層付き基板を窒素雰囲気下に移し、化合物13(120mg)、D−34(3.5mg)、D−7(3.0mg)をトルエン8mlに溶解した溶液を1000rpm、30秒スピンコートした後、100℃で真空減圧乾燥して発光層とした。続いて、この基板を真空蒸着装置に移し、真空度4.0×10−4Paで電子輸送層としてAlq3を40nmの厚さで製膜し、引き続き電子注入層としてフッ化リチウムを0.5nmの厚さに形成した後、陰極としてアルミニウム150nmを製膜し、非発光面をガラスケースで覆い、エポキシ系接着剤で封止した。この素子に通電したところ、ほぼ白色の光が得られ、照明装置として使用できることがわかった。 Furthermore, this board | substrate with a positive hole transport layer was moved under nitrogen atmosphere, and the solution which melt | dissolved the compound 13 (120 mg), D-34 (3.5 mg), and D-7 (3.0 mg) in 8 ml of toluene was 1000 rpm and 30 seconds. After spin coating, it was dried under vacuum at 100 ° C. to obtain a light emitting layer. Subsequently, this substrate was transferred to a vacuum deposition apparatus, and Alq 3 was formed to a thickness of 40 nm as an electron transport layer at a degree of vacuum of 4.0 × 10 −4 Pa, and subsequently, lithium fluoride was set to a thickness of 0.04 as an electron injection layer. After forming to a thickness of 5 nm, aluminum 150 nm was formed as a cathode, the non-light emitting surface was covered with a glass case, and sealed with an epoxy adhesive. When this element was energized, it was found that substantially white light was obtained and it could be used as a lighting device.
≪比較の発光素子の作製≫
白色発光素子および白色照明装置の作製−2において化合物13を比較の化合物1(120mg)、比較の化合物2(120mg)、比較の化合物3(120mg)にそれぞれ変更した以外は同様にして白色発光素子の作製を行った。しかしながら比較の化合物1を用いた場合には、トルエンへの溶解性が不十分で製膜できなかった。また、比較の化合物2および3を用いた場合、製膜はできたものの100℃真空減圧乾燥時、膜に割れが生じたため、これ以降の操作は実施できなかった。このため、比較の化合物2および3については乾燥条件を23℃真空減圧に変更して発光層としたが、素子化後、通電しても発光は確認できなかった。
<Production of comparative light-emitting element>
White Light Emitting Element In the same manner as in Preparation of White Light Emitting Element and White Lighting Device-2, except that Compound 13 was changed to Comparative Compound 1 (120 mg), Comparative Compound 2 (120 mg), and Comparative Compound 3 (120 mg), respectively. Was made. However, when Comparative Compound 1 was used, the film could not be formed due to insufficient solubility in toluene. Further, when Comparative Compounds 2 and 3 were used, although the film was formed, the film was cracked during drying at 100 ° C. under vacuum under reduced pressure, and therefore the subsequent operations could not be performed. For this reason, with regard to the comparative compounds 2 and 3, the drying condition was changed to 23 ° C. under reduced pressure to obtain a light emitting layer.
1 ディスプレイ
3 画素
5 走査線
6 データ線
A 表示部
B 制御部
101 有機EL素子
102 ガラスカバー
105 陰極
106 有機EL層
107 透明電極付きガラス基板
108 窒素ガス
109 捕水剤
DESCRIPTION OF SYMBOLS 1 Display 3
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