JP5283838B2 - 熱剥離性粘着シート及び被着体回収方法 - Google Patents
熱剥離性粘着シート及び被着体回収方法 Download PDFInfo
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- JP5283838B2 JP5283838B2 JP2006299738A JP2006299738A JP5283838B2 JP 5283838 B2 JP5283838 B2 JP 5283838B2 JP 2006299738 A JP2006299738 A JP 2006299738A JP 2006299738 A JP2006299738 A JP 2006299738A JP 5283838 B2 JP5283838 B2 JP 5283838B2
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- heat
- sensitive adhesive
- peelable pressure
- adhesive layer
- peelable
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Classifications
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08K9/10—Encapsulated ingredients
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- C—CHEMISTRY; METALLURGY
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/50—Additional features of adhesives in the form of films or foils characterized by process specific features
- C09J2301/502—Additional features of adhesives in the form of films or foils characterized by process specific features process for debonding adherents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68331—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding of passive members, e.g. die mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/14—Layer or component removable to expose adhesive
- Y10T428/149—Sectional layer removable
- Y10T428/1495—Adhesive is on removable layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
- Y10T428/24372—Particulate matter
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
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- Chemical & Material Sciences (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Dicing (AREA)
Description
C≦(A+B)≦60μm (1)
0.25C≦B≦0.8C (2)
厚さ25μmのポリイミドフィルム基材(商品名「カプトンH100」、デュポンケミカル製、Tg300℃以上)上に、アクリルポリマーA[2−エチルヘキシルアクリレート/エチルアクリレート/2−ヒドロキシエチルアクリレート(重量比:50/50/4)共重合体]100重量部、イソシアネート系架橋剤[商品名「コロネートL」、日本ポリウレタン(株)製]3重量部を含むトルエン溶液を、塗布、乾燥して、厚さ25μmの中間層を形成した。
別途、シリコーン離型処理されたポリエステルフィルム上に、前記アクリルポリマーA100重量部、熱膨張性微小球A[商品名「マツモトマイクロスフェアF−301D」、松本油脂製薬(株)製;膨張開始温度90℃、メディアン径11.5μm、最大粒径42μm]40重量部、イソシアネート系架橋剤[商品名「コロネートL」、日本ポリウレタン(株)製]4重量部、可塑剤[商品名「モノサイザーW−700」、大日本インキ(株)製]10重量部を含むトルエン溶液を塗布、乾燥して、セパレータ付き熱剥離性粘着層を作製し、これを前記中間層付き基材の中間層側に貼り合わせて、熱剥離性粘着シートAを得た。熱剥離性粘着層の厚さは30μmであり、粘着シートの総厚みは80μmである。
厚さ25μmのポリイミド基材の代わりに、厚さ38μmのポリエチレンテレフタレート基材(Tg68℃)を使用した以外は実施例1と同様の操作を行い、総厚み93μmの熱剥離性粘着シートBを得た。
厚さ38μmのポリエチレンテレフタレート基材上に、実施例1と同じアクリルポリマーA100重量部、実施例1と同じイソシアネート系架橋剤3重量部を含むトルエン溶液を、塗布、乾燥して、厚さ13μmの中間層を形成した。
別途、シリコーン離型処理されたポリエステルフィルム上に、前記アクリルポリマーA100重量部、実施例1と同じ熱膨張性微小球A30重量部、実施例1と同じイソシアネート系架橋剤3.5重量部、ロジンエステル系粘着付与剤4重量部を含むトルエン溶液を塗布、乾燥して、セパレータ付き熱剥離性粘着層を作製し、これを前記中間層付き基材の中間層側に貼り合わせて、熱剥離性粘着シートCを得た。熱剥離性粘着層の厚さは37μmであり、粘着シートの総厚みは88μmである。
厚さ38μmのポリエチレンテレフタレート基材上に、実施例1と同じアクリルポリマーA100重量部、実施例1と同じイソシアネート系架橋剤1重量部を含むトルエン溶液を、塗布、乾燥して、厚さ13μmの中間層を形成した。
別途、シリコーン離型処理されたポリエステルフィルム上に、前記アクリルポリマーA100重量部、実施例1と同じ熱膨張性微小球A30重量部、実施例1と同じイソシアネート系架橋剤2重量部、テルペンフェノール系粘着付与剤20重量部を含むトルエン溶液を塗布、乾燥して、セパレータ付き熱剥離性粘着層を作製し、これを前記中間層付き基材の中間層側に貼り合わせて、熱剥離性粘着シートDを得た。熱剥離性粘着層の厚さは37μmであり、粘着シートの総厚みは88μmである。
実施例及び比較例で得られた熱剥離性粘着シートの加熱前及び加熱後の粘着力、該粘着シートの加熱後の粘着層の表面粗さ(中心線平均粗さ及び最大高低差)、並びに加熱剥離性を以下の方法により測定、評価した。結果を表1に示す。
幅20mmの熱剥離性粘着シートの熱剥離性粘着層に、幅30mm、厚さ25μmのポリエチレンテレフタレートフィルムを貼り付け、そのポリエチレンテレフタレートフィルムを剥離角度180°、剥離速度300mm/minで剥離する際の荷重を測定した(加熱前の粘着力)。なお、ポリエチレンテレフタレートフィルムの貼付けは、2kgfゴムローラーを使用し、貼付け速度300mm/minで1往復させて行った。
また、粘着シートを100℃のホットプレート上で1分間加熱した後、上記と同様にして、加熱後の粘着力を測定した。
100℃のホットプレート上で1分間加熱処理した熱剥離性粘着シートの熱剥離性粘着層表面に、シリコーン樹脂(商品名「♯6810」、東レダウコーニング製)を滴下し、真空脱泡後、85℃の熱風乾燥機中で30分間プレキュアし、熱剥離性粘着シートを剥離した後に、シリコーン樹脂を150℃の熱風乾燥機中で30分間本キュアして、加熱処理後の熱剥離性粘着層表面のレプリカを得た。そのレプリカの表面粗さ(中心線平均粗さRa、最大高低差Rmax)を、表面粗さ測定器(商品名「P−11」、Tencor製)を使用して測定した。
熱剥離性粘着シートの熱剥離性粘着層表面に、1mm×1mm角、厚さ30μmのシリコンチップを貼り付け、同サイズのマイクロヒーター(温度180℃及び300℃)で、基材側から加熱して熱剥離性粘着層を発泡させ、吸着コレットでシリコンチップをピックアップし、ピックアップ成功率を求めた。
表1に示されるように、本発明に相当する実施例1及び2の熱剥離性粘着シートは良好な加熱剥離性を示すのに対し、熱剥離性粘着層の厚さBが、0.8×熱膨張性微小球の最大粒径Cより大きい比較例1及び2の熱剥離性粘着シートでは、ピックアップできないチップが多かった。また、基材としてポリイミドを使用した実施例1の熱剥離性粘着シートでは、300℃で加熱することができ、非常に高速でチップのピックアップを行うことができる。
2 中間層
3 熱剥離性粘着層
4 セパレータ
Claims (5)
- 基材の一方の面に厚さAの中間層と最大粒径Cの熱膨張性微小球を含有する厚さBの熱剥離性粘着層とがこの順で積層された熱剥離性粘着シートであって、Aが10〜25μm、Bが20〜35μmであり、C≦(A+B)≦60μmおよび0.25C≦B≦0.8Cの関係を満足し、且つ加熱処理後の熱剥離性粘着層の粘着力が0.1N/20mm未満であり、加熱処理後の熱剥離性粘着層表面の中心線平均粗さRaが4.5μm以下であり、加熱処理後の熱剥離性粘着層表面の最大高低差Rmaxが23μm以下であることを特徴とする厚さ40μm以下の半導体チップ仮固定用熱剥離性粘着シート。
- ガラス転移温度(Tg)が60℃以上且つ厚さが50μm以下である基材を使用した請求項1記載の厚さ40μm以下の半導体チップ仮固定用熱剥離性粘着シート。
- 所定形状に予め切断加工された基材、中間層及び熱剥離性粘着層とからなるシートが長尺のセパレータ上に、前記熱剥離性粘着層がセパレータ表面に接する状態で配列され、且つロール状に巻回されている請求項1又は2に記載の厚さ40μm以下の半導体チップ仮固定用熱剥離性粘着シート。
- 熱剥離性粘着層上に被着体が載置された請求項1〜3の何れか1項に記載の厚さ40μm以下の半導体チップ仮固定用熱剥離性粘着シートの基材側または被着体側から加熱を施して、熱剥離性粘着層中の熱膨張性微小球を膨張させた後、前記被着体を剥離回収することを特徴とする被着体回収方法。
- 被着体が半導体部品または電子部品である請求項4記載の被着体回収方法。
Priority Applications (7)
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JP2006299738A JP5283838B2 (ja) | 2006-11-04 | 2006-11-04 | 熱剥離性粘着シート及び被着体回収方法 |
KR1020097004888A KR101345484B1 (ko) | 2006-11-04 | 2007-10-18 | 열박리성 점착 시트 및 피착체 회수 방법 |
EP07830045A EP2078740A1 (en) | 2006-11-04 | 2007-10-18 | Heat-peelable pressure-sensitive adhesive sheet and method of recovering adherend |
PCT/JP2007/070311 WO2008053713A1 (fr) | 2006-11-04 | 2007-10-18 | Feuille adhésive sensible à la pression et pelable sous l'action de la chaleur, et procédé de récupération de la surface adhésive |
US12/311,974 US20100028588A1 (en) | 2006-11-04 | 2007-10-18 | Heat-peelable pressure-sensitive adhesive sheet and method of recovering adherend |
CN2007800382907A CN101522846B (zh) | 2006-11-04 | 2007-10-18 | 热剥离性粘合片及粘附体回收方法 |
TW096139919A TWI438257B (zh) | 2006-11-04 | 2007-10-24 | A heat-peelable adhesive sheet and a method of recovering the adhesive |
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JP2006299738A JP5283838B2 (ja) | 2006-11-04 | 2006-11-04 | 熱剥離性粘着シート及び被着体回収方法 |
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EP (1) | EP2078740A1 (ja) |
JP (1) | JP5283838B2 (ja) |
KR (1) | KR101345484B1 (ja) |
CN (1) | CN101522846B (ja) |
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WO (1) | WO2008053713A1 (ja) |
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JPS5124534A (en) | 1974-08-23 | 1976-02-27 | Seiko Instr & Electronics | Tokeiyogaisobuhinno hyomenshorihoho |
JPS5661468A (en) | 1979-10-23 | 1981-05-26 | Matsumoto Yushi Seiyaku Kk | Releasable adhesive |
JPS5661469A (en) | 1979-10-23 | 1981-05-26 | Matsumoto Yushi Seiyaku Kk | Hot-bonding adhesive |
JPS60252681A (ja) | 1984-05-30 | 1985-12-13 | F S K Kk | 熱剥離性粘着シ−ト |
US5491009A (en) * | 1990-08-03 | 1996-02-13 | W. R. Grace & Co.-Conn. | Amorphous nylon composition and films |
JP4540150B2 (ja) * | 1998-09-30 | 2010-09-08 | 日東電工株式会社 | 熱剥離型粘着シート |
US7214424B2 (en) * | 1999-03-01 | 2007-05-08 | Nitto Denko Corporation | Heat-peelable pressure-sensitive adhesive sheet |
JP3594853B2 (ja) * | 1999-11-08 | 2004-12-02 | 日東電工株式会社 | 加熱剥離型粘着シート |
US6406763B1 (en) * | 1999-12-23 | 2002-06-18 | Cryovac, Inc. | Post pasteurization multilayered film |
JP2001323228A (ja) * | 2000-05-15 | 2001-11-22 | Nitto Denko Corp | 加熱剥離型粘着シート |
JP4651805B2 (ja) | 2000-11-08 | 2011-03-16 | 日東電工株式会社 | 加熱剥離型粘着シート |
US20030180487A1 (en) * | 2002-03-25 | 2003-09-25 | Reighard Tricia Susan | Non-foil barrier laminates |
DE10227580A1 (de) * | 2002-06-20 | 2004-01-08 | Kuhne Anlagenbau Gmbh | Mehrschichtige flächen- oder schlauchförmige Nahrungsmittelhülle oder -folie |
DE10254172B4 (de) * | 2002-11-20 | 2005-07-21 | Kuhne Anlagenbau Gmbh | Mehrschichtige, flächen- oder schlauchförmige Nahrungsmittelhülle oder -folie |
JP4493273B2 (ja) * | 2003-01-29 | 2010-06-30 | 日東電工株式会社 | 両面粘着シートおよびタッチパネル付き表示装置 |
US20050037162A1 (en) * | 2003-08-11 | 2005-02-17 | Adams John Peter | Paperboard laminate for food packaging applications |
US20050058829A1 (en) * | 2003-09-16 | 2005-03-17 | Nitto Denko Corporation | Pressure-sensitive adhesive tape |
-
2006
- 2006-11-04 JP JP2006299738A patent/JP5283838B2/ja active Active
-
2007
- 2007-10-18 WO PCT/JP2007/070311 patent/WO2008053713A1/ja active Application Filing
- 2007-10-18 KR KR1020097004888A patent/KR101345484B1/ko active IP Right Grant
- 2007-10-18 EP EP07830045A patent/EP2078740A1/en not_active Withdrawn
- 2007-10-18 US US12/311,974 patent/US20100028588A1/en not_active Abandoned
- 2007-10-18 CN CN2007800382907A patent/CN101522846B/zh active Active
- 2007-10-24 TW TW096139919A patent/TWI438257B/zh active
Also Published As
Publication number | Publication date |
---|---|
US20100028588A1 (en) | 2010-02-04 |
KR20090077037A (ko) | 2009-07-14 |
TW200840851A (en) | 2008-10-16 |
JP2008115273A (ja) | 2008-05-22 |
CN101522846A (zh) | 2009-09-02 |
CN101522846B (zh) | 2013-12-11 |
KR101345484B1 (ko) | 2013-12-27 |
EP2078740A1 (en) | 2009-07-15 |
WO2008053713A1 (fr) | 2008-05-08 |
TWI438257B (zh) | 2014-05-21 |
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