JP5161789B2 - Solder flux creeping-up composition, electronic member for solder coated with the composition, method for soldering the member, and electrical product - Google Patents
Solder flux creeping-up composition, electronic member for solder coated with the composition, method for soldering the member, and electrical product Download PDFInfo
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- JP5161789B2 JP5161789B2 JP2008544088A JP2008544088A JP5161789B2 JP 5161789 B2 JP5161789 B2 JP 5161789B2 JP 2008544088 A JP2008544088 A JP 2008544088A JP 2008544088 A JP2008544088 A JP 2008544088A JP 5161789 B2 JP5161789 B2 JP 5161789B2
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- 239000000203 mixture Substances 0.000 title claims description 46
- 230000004907 flux Effects 0.000 title claims description 40
- 229910000679 solder Inorganic materials 0.000 title claims description 16
- 238000005476 soldering Methods 0.000 title claims description 14
- 238000000034 method Methods 0.000 title claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 57
- 229920000642 polymer Polymers 0.000 claims description 53
- 125000005647 linker group Chemical group 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 230000002265 prevention Effects 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 12
- 125000002947 alkylene group Chemical group 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 6
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical group [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 claims description 3
- 230000009194 climbing Effects 0.000 claims description 2
- -1 methoxy, ethoxy, butoxy, octyloxy, Methoxyethoxy Chemical group 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 14
- 238000006116 polymerization reaction Methods 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 8
- 229940125904 compound 1 Drugs 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 229940125782 compound 2 Drugs 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- GRJRKPMIRMSBNK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctan-1-ol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F GRJRKPMIRMSBNK-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 description 3
- 230000003449 preventive effect Effects 0.000 description 3
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 description 2
- 239000007877 V-601 Substances 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 1
- PDCBZHHORLHNCZ-UHFFFAOYSA-N 1,4-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(C(F)(F)F)C=C1 PDCBZHHORLHNCZ-UHFFFAOYSA-N 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 description 1
- 125000002373 5 membered heterocyclic group Chemical group 0.000 description 1
- 125000004070 6 membered heterocyclic group Chemical group 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 125000005529 alkyleneoxy group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid group Chemical group C(C=CC1=CC=CC=C1)(=O)O WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 125000005499 phosphonyl group Chemical group 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000985 reactive dye Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3613—Polymers, e.g. resins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/015—Fluoropolymer, e.g. polytetrafluoroethylene [PTFE]
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、電気接点を有する電子部品またはプリント基板等の電子部材のはんだ付けの際に、はんだ用フラックスの這い上がりを防止するための前処理剤として用いられるフラックス這い上がり防止組成物に関する。また本発明は、該組成物から形成された被膜を有するはんだ用電子部品またはプリント基板などの電子部材、該組成物を用いるはんだ付け方法、さらに、はんだ付けされた上記電子部材を含む電気製品に関する。 The present invention relates to a flux creeping-up preventing composition used as a pretreatment agent for preventing solder flux from creeping up when an electronic component having electrical contacts or an electronic member such as a printed circuit board is soldered. The present invention also relates to an electronic component such as an electronic component for soldering or a printed board having a coating formed from the composition, a soldering method using the composition, and an electric product including the soldered electronic component. .
プリント基板に各種部品をはんだ付けしたり、ICソケットにICをはんだ付けする際には、予め、はんだの接着性を向上させるためのフラックス処理が施される。一般のフラックスは、溶媒中に酸性成分を含む腐食剤である。このため、コネクタ、スイッチ、ボリュ−ム、半固定抵抗等の電子部品の電気接点部分、またはプリント基板のはんだ付けが不要な部分などにフラックスが浸透あるいは付着することは望ましくなく、これを防ぐ必要がある。特に、電子部品のスルーホール部分などで起きる、フラックスが毛細管現象等により這い上がる「フラックスの這い上がり」と呼ばれる現象により、はんだ付けの不要な部分にまでフラックスが付着あるいは浸透し、腐食を起こすことを防ぐ必要がある。 When various components are soldered to the printed circuit board or the IC is soldered to the IC socket, a flux treatment for improving the adhesiveness of the solder is performed in advance. A general flux is a corrosive agent containing an acidic component in a solvent. For this reason, it is not desirable for flux to permeate or adhere to electrical contact parts of electronic parts such as connectors, switches, volumes, semi-fixed resistors, or parts that do not require soldering on printed circuit boards. There is. In particular, due to the phenomenon called "flux scooping up" that occurs in the through-hole part of electronic parts, etc., due to the capillary phenomenon, the flux adheres to or penetrates to parts that are not soldered, causing corrosion. Need to prevent.
このため、はんだ付けに先立って、フラックス這い上がりを防止するための前処理が行われている。この前処理に用いられるフラックス這い上がり防止剤は、通常、フラックスの溶媒に対し撥溶媒性のあるポリマ−を含む組成物である。従来、フラックスの溶媒は典型的にIPAであることから、撥IPA性がフラックス這い上がり防止性能の目安となる指標として使用されている。そのため、フラックス這い上がり防止剤の有効成分として、撥IPA性の高い、ポリフルオロアルキル基含有重合体が使用されてきた。 For this reason, prior to soldering, pre-treatment for preventing flux creeping is performed. The flux creep-up preventing agent used in this pretreatment is usually a composition containing a polymer having a solvent repellency with respect to the flux solvent. Conventionally, since the flux solvent is typically IPA, IPA repellency has been used as an index of the flux creep-up prevention performance. Therefore, a polyfluoroalkyl group-containing polymer having high IPA repellency has been used as an active ingredient of the flux creeping-up preventing agent.
このような従来のフラックス這い上がり防止剤の重合体としては、下記式(a11)で表されるポリフルオロアルキル基含有(メタ)アクリレ−トを用いた重合体が使用されている(特許文献1参照)。
CH2=C(R11)OCO−Q11−Rf1 (a11)
ただし、式中の記号は以下の意味を示す。
R11:水素原子またはメチル基
Q11:2価連結基
Rf1:炭素数4〜14のポリフルオロアルキル基
なお本明細書中、(メタ)アクリレ−トとは、アクリル酸エステルおよびメタクリル酸エステルの両方またはどちらか一方を表す。
CH 2 = C (R 11) OCO-Q 11 -R f1 (a11)
However, the symbols in the formulas have the following meanings.
R 11 : hydrogen atom or methyl group Q 11 : divalent linking group R f1 : polyfluoroalkyl group having 4 to 14 carbon atoms In this specification, (meth) acrylate means acrylic acid ester and methacrylic acid ester Represents either or both.
米国環境保護庁(USEPA)は、野生動物や人の血液を含め、種々の環境から検出されるパ−フロオロオクタン酸(PFOA)の安全性に関する予備リスク調査報告書を2003年3月に公開した。さらに、2006年1月には、PFOAとその類縁物質、およびこれらの前駆体物質の環境中への排出削減と製品中の含有量削減計画への参加をフッ素樹脂メ−カ−等に提唱している。 US Environmental Protection Agency (USEPA) published preliminary risk study report on safety of perfluorooctanoic acid (PFOA) detected in various environments, including wild animals and human blood, in March 2003 did. Furthermore, in January 2006, PFOA and related substances, as well as participation in fluorocarbon resin manufacturers, etc., were proposed to participate in a plan to reduce the emissions of these precursor substances into the environment and their contents in products. ing.
パ−フルオロアルキル基の炭素数が6以下になると、生体および環境へのリスクが大きく低下する。しかしながら、重合体中のパ−フルオロアルキル基に起因する、疎水性、疎油性などの性能は、パ−フルオロアルキル基の炭素数が8以上であると高いが、炭素数が6以下であると著しく低下する。これは、炭素数が8以上のパ−フルオロアルキル基が結晶性を持つためと言われている。フラックス這い上がり防止剤の性能の指標として重要な撥IPA性も、パ−フロオロアルキル基の炭素数が6以下になると、急激に低下する。 When the carbon number of the perfluoroalkyl group is 6 or less, the risk to the living body and the environment is greatly reduced. However, the performance such as hydrophobicity and oleophobicity caused by the perfluoroalkyl group in the polymer is high when the carbon number of the perfluoroalkyl group is 8 or more, but the number of carbons is 6 or less. It drops significantly. This is said to be because a perfluoroalkyl group having 8 or more carbon atoms has crystallinity. The IPA repellency, which is important as an index of the performance of the flux creep-up preventing agent, also decreases rapidly when the carbon number of the perfluoroalkyl group is 6 or less.
本発明は、生体および環境への影響が少ない炭素数が6以下のポリフルオロアルキル基を有する不飽和化合物から導かれる重合単位を含有する重合体であるが、従来のポリフルオロアルキル基の炭素数が8以上の不飽和化合物から導かれる重合単位を含有する重合体を含むフラックス這い上がり防止剤と同等の性能を有し、フラックス這い上がり防止性能が高い、はんだ用フラックス這い上がり防止組成物の提供を目的とする。 The present invention is a polymer containing a polymer unit derived from an unsaturated compound having a polyfluoroalkyl group having 6 or less carbon atoms, which has little influence on the living body and the environment. Of a flux scooping prevention composition for a solder having a performance equivalent to that of a flux scooping prevention agent comprising a polymer containing a polymer unit derived from an unsaturated compound having a molecular weight of 8 or more and having a high flux scooping prevention performance With the goal.
上記のような諸問題に鑑み、本発明は、生体および環境への影響が少ない炭素数が6以下のポリフルオロアルキル基を有する不飽和化合物から導かれる重合単位を含有する重合体であるが、該重合体中に、ウレタン結合を導入することによって、従来のポリフルオロアルキル基の炭素数が8以上の不飽和化合物から導かれる重合単位を含有する重合体を含むフラックス這い上がり防止剤と同等の性能を有するフラックス這い上がり防止剤の提供を可能とした。 In view of the above problems, the present invention is a polymer containing a polymer unit derived from an unsaturated compound having a polyfluoroalkyl group having 6 or less carbon atoms, which has little influence on the living body and the environment. By introducing a urethane bond into the polymer, the conventional polyfluoroalkyl group is equivalent to a flux creeping-up preventing agent containing a polymer containing a polymer unit derived from an unsaturated compound having 8 or more carbon atoms. It has become possible to provide a flux scooping prevention agent having performance.
本発明は、下記式(a)で表される不飽和化合物の少なくとも1種から導かれる重合単位を含有する重合体を含む、はんだ用フラックス這い上がり防止組成物である。本明細書においては、式(a)で表される化合物を化合物(a)と記し、他の式で表される化合物も同様に記す。
ただし、式中の記号は以下の意味を示す。
R1:水素原子またはメチル基
Q1、Q2:それぞれ独立して、単結合または2価の連結基
Rf:炭素−炭素原子間に挿入されたエ−テル性酸素原子を含んでいてもよい炭素数1〜6のポリフルオロアルキル基The present invention is a solder flux creeping-up composition comprising a polymer containing a polymer unit derived from at least one unsaturated compound represented by the following formula (a). In the present specification, the compound represented by the formula (a) is referred to as a compound (a), and the compounds represented by other formulas are also described in the same manner.
However, the symbols in the formulas have the following meanings.
R 1 : hydrogen atom or methyl group Q 1 , Q 2 : each independently a single bond or a divalent linking group R f : even if it contains an etheric oxygen atom inserted between carbon-carbon atoms Good C1-6 polyfluoroalkyl group
化合物(a)としては、Q1が単結合または−Z−(Y)n−で表される2価の連結基(ただし、Zは単結合、−O−、または−NH−であり、Yは炭素数1〜6の直鎖アルキレン基、アミノ基、スルホニル基、またはこれらの組合せであり、nは0または1の整数を意味する。)であり、Q2が単結合または炭素数1〜6の直鎖のアルキレン基であるものが好ましい。As the compound (a), Q 1 is a single bond or a divalent linking group represented by —Z— (Y) n — (wherein Z is a single bond, —O—, or —NH—, Is a straight-chain alkylene group having 1 to 6 carbon atoms, an amino group, a sulfonyl group, or a combination thereof, n is an integer of 0 or 1, and Q 2 is a single bond or 1 to 1 carbon atoms. Those having 6 linear alkylene groups are preferred.
化合物(a)としては、下記化合物(a1)が好ましい。
ただし、式中の記号は以下の意味を示す。
R1、Rf:前記と同じ
p、q:それぞれ独立して0〜6の整数As the compound (a), the following compound (a1) is preferable.
However, the symbols in the formulas have the following meanings.
R 1 , R f : same as above p, q: each independently an integer of 0-6
本発明の組成物は、重合体中の前記式(a)または(a1)で表される化合物から導かれる重合単位の割合が50質量%以上であることが好ましい。 In the composition of the present invention, the proportion of the polymer units derived from the compound represented by the formula (a) or (a1) in the polymer is preferably 50% by mass or more.
また、本発明は、電子部材のはんだ付けする箇所の一部または全部に、上記いずれかの組成物からなる被膜を有し、はんだ用フラックス這い上がり防止性能を有する電子部材を含む。 Moreover, this invention includes the electronic member which has the film which consists of one of the said compositions in part or all of the location to which the electronic member is soldered, and has the flux climbing prevention performance for solder.
また、本発明は、電子部材のはんだ付けする箇所の一部または全部に、上記のいずれかの組成物からなる被膜を形成し、該被膜の一部または全部をはんだ用フラックスで塗布後、はんだ付けする、電子部材のはんだ付け方法を含み、該方法ではんだ付けされた電子部材を含む電気製品も含む。 The present invention also provides a method of forming a film made of any of the above-described compositions on a part or all of a part to be soldered of an electronic member, applying a part or all of the film with a soldering flux, And an electronic product including the electronic member soldered by the method.
本発明は、フラックス這い上がり防止組成物において、重合体中の炭素数が8以上のポリフルオロアルキル基の含有量を抑えて、生体および環境への安全性を確保するだけではなく、ポリフルオロアルキル基の鎖長の減少による這い上がり防止性能の低下を抑え、従来品と同程度の性能を維持することを可能にした。 The present invention provides a composition for preventing flux creep-up, not only by suppressing the content of polyfluoroalkyl groups having 8 or more carbon atoms in the polymer to ensure safety to living bodies and the environment, but also to polyfluoroalkyl. Suppression of the creeping prevention performance due to the decrease in the chain length of the group is suppressed, and it is possible to maintain the same level of performance as conventional products.
本発明のはんだ用フラックスの這い上がり防止組成物(「這い上がり防止剤」とも記す)は、被膜成分として、下記式(a)で表される不飽和化合物の少なくとも1種から導かれる重合単位を含有する重合体を含有する。
ただし、式中の記号は以下の意味を示す。
R1:水素原子またはメチル基
Q1、Q2:それぞれ独立して、単結合または2価の連結基
Rf:炭素−炭素原子間に挿入されたエ−テル性酸素原子を含んでいてもよい炭素数1〜6のポリフルオロアルキル基The composition for preventing creeping up of the solder flux of the present invention (also referred to as “scooping-up preventing agent”) has a polymer unit derived from at least one of unsaturated compounds represented by the following formula (a) as a film component. Contains the containing polymer.
However, the symbols in the formulas have the following meanings.
R 1 : hydrogen atom or methyl group Q 1 , Q 2 : each independently a single bond or a divalent linking group R f : even if it contains an etheric oxygen atom inserted between carbon-carbon atoms Good C1-6 polyfluoroalkyl group
ポリフルオロアルキル基は、アルキル基の水素原子の2個以上がフッ素原子に置換された基を意味し、このアルキル基の炭素−炭素結合間に挿入されたエ−テル性酸素原子を含むものであってもよい。
ポリフルオロアルキル基は、エーテル性酸素原子を含まない基であることが好ましい。
本明細書において、ポリフルオロアルキル基またはRf基の表記は、炭素−炭素結合間に挿入されたエ−テル性酸素原子を含むポリフルオロアルキル基の上位概念にあたるものとして、特に断わりのない限り、該酸素原子を含まないおよび含む両方のポリフルオロアルキル基の総称を意味する。The polyfluoroalkyl group means a group in which two or more hydrogen atoms of an alkyl group are substituted with fluorine atoms, and includes an etheric oxygen atom inserted between carbon-carbon bonds of the alkyl group. There may be.
The polyfluoroalkyl group is preferably a group not containing an etheric oxygen atom.
In the present specification, the notation of a polyfluoroalkyl group or R f group is a superordinate concept of a polyfluoroalkyl group containing an etheric oxygen atom inserted between carbon-carbon bonds, unless otherwise specified. And a generic term for both polyfluoroalkyl groups not containing and containing the oxygen atom.
上記ポリフルオロアルキル基(Rf基)は、炭素数1〜6のアルキル基に対応するフッ素置換数2以上の基であり、直鎖構造または分岐構造のいずれであってもよい。例えば、メチル、エチル、プロピル、ブチル、ペンチル、ヘキシルなどの直鎖または分岐構造のアルキル基に対応する部分フルオロ置換またはパ−フルオロ置換アルキル基などが挙げられる。分岐構造のポリフルオロアルキル基としては、イソプロピル基、3−メチルブチル基のパ−フルオロ置換アルキル基などが挙げられる。The polyfluoroalkyl group (R f group) is a group having 2 or more fluorine substituents corresponding to an alkyl group having 1 to 6 carbon atoms, and may have either a linear structure or a branched structure. Examples thereof include partially fluoro-substituted or perfluoro-substituted alkyl groups corresponding to linear or branched alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl and the like. Examples of the branched polyfluoroalkyl group include an isopropyl group and a perfluoro-substituted alkyl group of 3-methylbutyl group.
Rf基は直鎖構造または分岐構造のいずれであってもよいが、Rf基のパッキングを上げる観点からRf基は直鎖構造が好ましい。同様の理由から、分岐構造である場合には、分岐部分がRf基の末端部分に存在する場合が好ましい。
また、Rf基は、実質的に全フッ素置換されたパ−フルオロアルキル基が好ましく、特に主鎖の鎖長(側鎖を含まない炭素数)が1〜6のRf基であることが好ましい。The R f group may have either a linear structure or a branched structure, but the R f group preferably has a linear structure from the viewpoint of increasing the packing of the R f group. For the same reason, in the case of a branched structure, it is preferable that the branched portion is present at the terminal portion of the R f group.
Further, the R f group is substantially all fluorine-substituted Pas - that fluoroalkyl group is preferable, the R f group with a chain length of the main chain (carbon number does not include the side chain) is 1 to 6 preferable.
式中のQ1およびQ2は単結合または2価の連結基である。Q1が単結合の場合、Q1の両端に存在するC(=O)の炭素原子とN−Hの窒素原子とが直接結合することを意味する。同様に、Q2が単結合の場合は、Q2の両端に存在する酸素原子とRfの炭素原子とが直接結合することを意味する。Q1およびQ2は単結合または2価の連結基であれば適宜選択可能であり、これらに限定されるものではない。Q 1 and Q 2 in the formula are a single bond or a divalent linking group. When Q 1 is a single bond, it means that a carbon atom of C (═O) present at both ends of Q 1 and a nitrogen atom of N—H are directly bonded. Similarly, when Q 2 is a single bond, it means that the oxygen atoms present at both ends of Q 2 and the carbon atom of R f are directly bonded. Q 1 and Q 2 can be appropriately selected as long as they are a single bond or a divalent linking group, and are not limited thereto.
2価の連結基としては、−O−、−S−、−NH−、−SO2−、−PO2−、−CH=CH−、−CH=N−、−N=N−、−N(O)=N−、−COO−、−COS−、−CONH−、−COCH2−、−O−CH2CH2−、−CH2CH2−、−CH2−、−CH2NH−、−CH2−、−CO−、−CH=CH−COO−、−CH=CH−CO−、直鎖状もしくは分岐状のアルキレン基またはアルケニレン基、アルキレンオキシ基、2価の4、5、6または7員環置換基、またそれらから構成される縮合置換基、6員環芳香族基、4ないし6員環の飽和または不飽和の脂肪族基、5または6員環複素環基、またはそれらの縮合環、これら2価の連結基の組合せから構成される基が挙げられる。Examples of the divalent linking group, -O -, - S -, - NH -, - SO 2 -, - PO 2 -, - CH = CH -, - CH = N -, - N = N -, - N (O) = N -, - COO -, - COS -, - CONH -, - COCH 2 -, - O-CH 2 CH 2 -, - CH 2 CH 2 -, - CH 2 -, - CH 2 NH- , —CH 2 —, —CO—, —CH═CH—COO—, —CH═CH—CO—, linear or branched alkylene group or alkenylene group, alkyleneoxy group, divalent 4, 5, 6- or 7-membered ring substituents, condensed substituents composed thereof, 6-membered aromatic groups, 4- to 6-membered saturated or unsaturated aliphatic groups, 5- or 6-membered heterocyclic groups, or Examples thereof include a group composed of a condensed ring thereof and a combination of these divalent linking groups.
上記の連結基は、置換基を有していてもよく、置換基の例としては、ハロゲン原子(F、Cl、Br、I)、シアノ基、アルコキシ基(メトキシ、エトキシ、ブトキシ、オクチルオキシ、メトキシエトキシなど)、アリ−ロキシ基(フェノキシなど)、アルキルチオ基(メチルチオ、エチルチオなど)、アシル基(アセチル、プロピオニル、ベンゾイルなど)、スルホニル基(メタンスルホニル、ベンゼンスルホニルなど)、アシルオキシ基(アセトキシ、ベンゾイルオキシなど)、スルホニルオキシ基(メタンスルホニルオキシ、トルエンスルホニルオキシなど)、ホスホニル基(ジエチルホスホニルなど)、アミド基(アセチルアミノ、ベンゾイルアミノなど)、カルバモイル基(N,N−ジメチルカルバモイル、N−フェニルカルバモイルなど)、アルキル基(メチル、エチル、プロピル、イソプロピル、シクロプロピル、ブチル、2−カルボキシエチル、ベンジルなど)、アリ−ル基(フェニル、トルイルなど)、複素環基(ピリジル、イミダゾリル、フラニルなど)、アルケニル基(ビニル、1−プロペニルなど)、アルコキシアシルオキシ基(アセチルオキシ、ベンゾイルオキシなど)、アルコキシカルボニル基(メトキシカルボニル、エトキシカルボニルなど)、および重合性基(ビニル基、アクリロイル基、メタクロイル基、シリル基、桂皮酸残基など)などが挙げられる。 The linking group may have a substituent. Examples of the substituent include a halogen atom (F, Cl, Br, I), a cyano group, an alkoxy group (methoxy, ethoxy, butoxy, octyloxy, Methoxyethoxy), aryloxy groups (phenoxy, etc.), alkylthio groups (methylthio, ethylthio, etc.), acyl groups (acetyl, propionyl, benzoyl, etc.), sulfonyl groups (methanesulfonyl, benzenesulfonyl, etc.), acyloxy groups (acetoxy, Benzoyloxy etc.), sulfonyloxy groups (methanesulfonyloxy, toluenesulfonyloxy etc.), phosphonyl groups (diethylphosphonyl etc.), amide groups (acetylamino, benzoylamino etc.), carbamoyl groups (N, N-dimethylcarbamoyl, N -Phenylcarbamo ), Alkyl groups (methyl, ethyl, propyl, isopropyl, cyclopropyl, butyl, 2-carboxyethyl, benzyl, etc.), aryl groups (phenyl, toluyl, etc.), heterocyclic groups (pyridyl, imidazolyl, furanyl, etc.) ), Alkenyl groups (vinyl, 1-propenyl, etc.), alkoxyacyloxy groups (acetyloxy, benzoyloxy, etc.), alkoxycarbonyl groups (methoxycarbonyl, ethoxycarbonyl, etc.), and polymerizable groups (vinyl group, acryloyl group, methacryloyl group) , A silyl group, a cinnamic acid residue, etc.).
Q1は、−Z−(Y)n−(Zは、単結合、−O−または−NH−であり、Yは炭素数1〜6のアルキレン基、アミノ基、スルホニル基、またはこれらの組合せから得られる2価の連結基、nは0または1の整数)で表される2価の連結基であることが好ましい。Q2は、単結合または炭素数1〜6の直鎖のアルキレン基であることが好ましい。Q 1 is —Z— (Y) n — (Z is a single bond, —O— or —NH—, and Y is an alkylene group having 1 to 6 carbon atoms, an amino group, a sulfonyl group, or a combination thereof. It is preferable that it is a divalent linking group represented by the following formula: n is an integer of 0 or 1. Q 2 is preferably a single bond or a linear alkylene group having 1 to 6 carbon atoms.
好適な化合物(a)は、下記構造式(a1)で表されるものである。特にRfが炭素数1〜6の直鎖のパ−フルオロアルキル基(RF)である構造の化合物が好適である。
ただし、式中の記号は以下の意味を示す。
p、q:それぞれ独立して0〜6の整数
R1、Rf:前記と同じA suitable compound (a) is represented by the following structural formula (a1). In particular, a compound having a structure in which R f is a linear perfluoroalkyl group (R F ) having 1 to 6 carbon atoms is suitable.
However, the symbols in the formulas have the following meanings.
p, q: each independently an integer of 0-6 R 1 , R f : the same as above
具体的には、
CH2=CH−COO−(CH2)2−NHCOO−(CH2)2−C6F13、
CH2=C(CH3)−COO−(CH2)2−NHCOO−(CH2)2−C6F13
などが例示される。In particular,
CH 2 = CH-COO- (CH 2) 2 -NHCOO- (CH 2) 2 -C 6 F 13,
CH 2 = C (CH 3) -COO- (CH 2) 2 -NHCOO- (CH 2) 2 -C 6 F 13
Etc. are exemplified.
本発明に係る共重合体は、上記化合物(a)、好ましくは(a1)から導かれる単位の1種を含有するが、2種以上含有していてもよい。
また、重合体中の上記化合物(a)、好ましくは(a1)の全量から導かれる単位の含有量は、好ましくは50質量%以上であり、より好ましくは80質量%以上であり、さらに好ましくは実質100質量%である。化合物(a)、好ましくは(a1)の含有量が上記範囲内であると、共重合体のフラックスの這い上がり防止性能が良好である。
なお、本発明に係る重合体において、各重合単位の含有量は、実質的に、重合仕込み量とみなすことができる。The copolymer according to the present invention contains one type of unit derived from the compound (a), preferably (a1), but may contain two or more types.
The content of the unit derived from the total amount of the compound (a), preferably (a1) in the polymer is preferably 50% by mass or more, more preferably 80% by mass or more, and still more preferably. It is substantially 100% by mass. When the content of the compound (a), preferably (a1) is within the above range, the creeping-up performance of the copolymer flux is good.
In the polymer according to the present invention, the content of each polymerization unit can be substantially regarded as a polymerization charge amount.
本発明に係る重合体は、上記のような化合物(a)、好ましくは(a1)から導かれる単位とともに、これら以外の化合物(b)から導かれる重合単位を1種または2種以上含んでいても構わない。化合物(b)は、上記(a)または(a1)と共重合体を形成しうる他の化合物であれば特に限定されない。 The polymer according to the present invention contains one or more polymer units derived from the compound (a), preferably the unit derived from (a1) and the other compound (b). It doesn't matter. The compound (b) is not particularly limited as long as it is another compound capable of forming a copolymer with the above (a) or (a1).
化合物(b)としては、例えば、重合性の不飽和基を有する化合物が挙げられる。具体的には、アクリル酸、メタクリル酸、(メタ)アクリルレ−ト等のポリオレフィン系不飽和エステル、ビニル基を有する化合物、ビニル基を有するシラン化合物、スチレン化合物、エポキシ基を有する不飽和エステル、アミノ基と重合性不飽和基を有する化合物、アクリル酸ジエステル等の(メタ)アクリル酸のポリエステル、および置換アミノ基と重合性不飽和基を有する化合物などが挙げられる。 Examples of the compound (b) include compounds having a polymerizable unsaturated group. Specifically, polyolefin unsaturated esters such as acrylic acid, methacrylic acid, (meth) acrylate, compounds having vinyl groups, silane compounds having vinyl groups, styrene compounds, unsaturated esters having epoxy groups, amino And a compound having a group and a polymerizable unsaturated group, a polyester of (meth) acrylic acid such as acrylic acid diester, and a compound having a substituted amino group and a polymerizable unsaturated group.
化合物(b)の例1:下記式で表されるシラン化合物
ただし、式中の記号は下記の意味を示す。
R2:水素原子またはメチル基
Q3:単結合または2価の連結基
R3、R4およびR5:それぞれ独立してヒドロキシ基または加水分解可能な官能基
s:1〜3の整数
t、u:それぞれ独立して0または1の整数、ただし、(4−s−t−u)は1以上Example of compound (b) 1: Silane compound represented by the following formula
However, the symbol in a formula shows the following meaning.
R 2 : hydrogen atom or methyl group Q 3 : single bond or divalent linking group R 3 , R 4 and R 5 : each independently a hydroxy group or a hydrolyzable functional group s: an integer t of 1 to 3, u: each independently an integer of 0 or 1, provided that (4-s-t-u) is 1 or more
Q3の2価の連結基としては、前記Q1、Q2と同様のものが挙げられる。Q3としては、単結合または−Z2−(Y2)n−(Zは、単結合、−COO−または−CONH−であり、Y2は2価の連結基、nは0または1の整数)で表わされる2価の連結基であることが好ましい。好ましいY2としては、アルキレン基、アミノ基、スルホニル基、またはこれらの組み合わせから得られる2価の連結基が挙げられ、より好ましくは、Y2が炭素数1〜6の直鎖のアルキレン基である。Examples of the divalent linking group for Q 3 include the same groups as those described above for Q 1 and Q 2 . Q 3 is a single bond or —Z 2 — (Y 2 ) n— (Z is a single bond, —COO— or —CONH—, Y 2 is a divalent linking group, and n is 0 or 1. It is preferably a divalent linking group represented by an integer). Preferred Y 2 includes an alkylene group, an amino group, a sulfonyl group, or a divalent linking group obtained from a combination thereof, and more preferably Y 2 is a linear alkylene group having 1 to 6 carbon atoms. is there.
R3、R4およびR5の加水分解可能な官能基としては、アルコキシ基、ハロゲン原子、アミノ基などが挙げられ、特にアルコキシ基が好ましい。アルコキシ基としては炭素数1〜5が好ましく、特に炭素数1〜3が好ましい。
(4−s−t−u)は1が好ましい。Examples of the hydrolyzable functional group for R 3 , R 4 and R 5 include an alkoxy group, a halogen atom and an amino group, and an alkoxy group is particularly preferable. As an alkoxy group, C1-C5 is preferable and C1-C3 is especially preferable.
(4-s-t-u) is preferably 1.
化合物(b)の例2:下記式で表されるスチレン化合物
ただし、式中の記号は下記の意味を示す。
R6:−H、−OH、−CH3、−Cl、−CHO、−COOH、−CH2OH、−CH2Cl、−CH2NH2、−CH2N(CH3)2、−CH2N(CH3)3Cl、−CH2NH3Cl、−CH2CN、−CH2COOH、−CH2N(CH2COOH)2、−CH2SH、−CH2SO3Na、−CH2OCOCH3 Example 2 of compound (b): Styrene compound represented by the following formula
However, the symbol in a formula shows the following meaning.
R 6: -H, -OH, -CH 3, -Cl, -CHO, -COOH, -CH 2 OH, -CH 2 Cl, -CH 2 NH 2, -CH 2 N (CH 3) 2, -CH 2 N (CH 3 ) 3 Cl, —CH 2 NH 3 Cl, —CH 2 CN, —CH 2 COOH, —CH 2 N (CH 2 COOH) 2 , —CH 2 SH, —CH 2 SO 3 Na, — CH 2 OCOCH 3
化合物(b)の例3:下記式で表される(メタ)アクリレ−ト
ただし、式中の記号は下記の意味を示す。
R7:水素原子またはメチル基
R8:−H、−CH3、−CH2CH2OH、−CH2CH2N(CH3)2、−(CH2)mH (m=2〜20)、−CH2CH(CH3)2、−CH2−C(CH3)2−OCO−Ph、−(CH2CH2O)mH(m=2〜20)、−CH2Ph、−CH2CH2OPh、−CH2N(CH3)3Cl、−CH2CH2O−PO(OH)2、−[Si(CH3)2O]mH(m=2〜20)、−(CH2CH2O)mCH3(m=2〜20)、−(CH2)2−NCO、
However, the symbol in a formula shows the following meaning.
R 7 : hydrogen atom or methyl group R 8 : —H, —CH 3 , —CH 2 CH 2 OH, —CH 2 CH 2 N (CH 3 ) 2 , — (CH 2 ) m H (m = 2 to 20) ), - CH 2 CH (CH 3) 2, -CH 2 -C (CH 3) 2 -OCO-Ph, - (CH 2 CH 2 O) m H (m = 2~20), - CH 2 Ph, -CH 2 CH 2 OPh, -CH 2 N (CH 3) 3 Cl, -CH 2 CH 2 O-PO (OH) 2, - [Si (CH 3) 2 O] m H (m = 2~20) , - (CH 2 CH 2 O ) m CH 3 (m = 2~20), - (CH 2) 2 -NCO,
化合物(b)の例4:下記式で表される化合物
ただし、式中の記号は下記の意味を示す。
R9:水素原子またはメチル基
R10:−NHCH2OH、−NHCH2SO3H、−NHC(CH3)2CH2−CO−CH3、−CmH2m+1(m=2〜20)、−NH2 Example 4 of compound (b): Compound represented by the following formula
However, the symbol in a formula shows the following meaning.
R 9 : hydrogen atom or methyl group R 10 : —NHCH 2 OH, —NHCH 2 SO 3 H, —NHC (CH 3 ) 2 CH 2 —CO—CH 3 , —C m H 2m + 1 (m = 2 to 20) , -NH 2
化合物(b)の例5:下記式で表される化合物
化合物(b)の例6:下記式で表される化合物
ただし、式中の記号は下記の意味を示す。
R11:水素原子またはメチル基。Example 6 of compound (b): Compound represented by the following formula
However, the symbol in a formula shows the following meaning.
R 11 is a hydrogen atom or a methyl group.
化合物(b)の例7:下記式で表される化合物
ただし、式中の記号は下記の意味を示す。
R12:水素原子またはメチル基
Q4:単結合または2価の連結基
Rf:炭素数1〜6のポリフルオロアルキル基Example 7 of Compound (b): Compound represented by the following formula
However, the symbol in a formula shows the following meaning.
R 12 : hydrogen atom or methyl group Q 4 : single bond or divalent linking group R f : polyfluoroalkyl group having 1 to 6 carbon atoms
Q4の2価の連結基としては、前記Q1、Q2と同様のものが挙げられる。Q4としては、−Z3−(Y3)n−(Z3は、単結合、−O−または−NH−であり、Y3は2価の連結基、nは0または1の整数)で表される2価の連結基であることが好ましい。好ましいY3の例としては、アルキレン基、アミノ基、スルホニル基、またはこれらの組合せから得られる2価の連結基が挙げられ、より好ましくは、Y3が炭素数1〜6の直鎖のアルキレン基である。Examples of the divalent linking group for Q 4 include the same groups as those described above for Q 1 and Q 2 . As Q 4 , —Z 3 — (Y 3 ) n — (Z 3 is a single bond, —O— or —NH—, Y 3 is a divalent linking group, and n is an integer of 0 or 1) It is preferable that it is a bivalent coupling group represented by these. Examples of preferable Y 3 include a divalent linking group obtained from an alkylene group, an amino group, a sulfonyl group, or a combination thereof, and more preferably, Y 3 is a linear alkylene having 1 to 6 carbon atoms. It is a group.
化合物(b)の例8:下記式で表される(メタ)アクリレ−ト
ただし、式中の記号は下記の意味を示す。
R13:水素原子またはメチル基
R14:有機基(ただし、ポリフルオロアルキル基を除く)
r:1〜4の整数Example 8 of compound (b): (Meth) acrylate represented by the following formula
However, the symbol in a formula shows the following meaning.
R 13 : hydrogen atom or methyl group R 14 : organic group (excluding polyfluoroalkyl group)
r: an integer from 1 to 4
本発明の係る共重合体は、上記のような化合物(b)から導かれる単位を、その種類によっても異なるが、50質量%以下、好ましくは20質量%以下の量で含むことができる。 The copolymer according to the present invention can contain units derived from the compound (b) as described above in an amount of 50% by mass or less, preferably 20% by mass or less, depending on the type.
本発明において、重合体の分子量が適度に大きければ、十分に這い上がり防止性能を発揮することができるが、一方、分子量が余りにも大きすぎると溶媒への溶解性が悪くなる。そのため、重合体の分子量は、重量平均分子量(Mw)で、通常、1×103〜1×107が好ましく、特に1×105〜1×106が好ましい。In the present invention, if the molecular weight of the polymer is moderately large, it is possible to exhibit a sufficient creeping prevention performance. On the other hand, if the molecular weight is too large, the solubility in a solvent becomes poor. Therefore, the molecular weight of the polymer is usually a weight average molecular weight (Mw), preferably 1 × 10 3 to 1 × 10 7 , particularly preferably 1 × 10 5 to 1 × 10 6 .
本発明に係る重合体は、上記のような化合物(a)と、付加的な化合物(b)から導かれる単位を含む以外は、重合形態などについては特に制限されない。重合形態は、ランダム、ブロック、グラフトなどのいずれでもよく、特に制限されないが、通常、ランダム共重合体が好ましい。 The polymer according to the present invention is not particularly limited with respect to the polymerization form and the like except that it contains a unit derived from the compound (a) and the additional compound (b) as described above. The polymerization form may be any of random, block, graft and the like, and is not particularly limited, but usually a random copolymer is preferred.
その製造方法についても特に制限されないが、本発明では、通常、各化合物中の不飽和基に基づき付加重合させることができる。重合に際しては、公知の不飽和化合物の付加重合条件を適宜に採択して行うことができる。たとえば重合開始源としては、特に限定されないが、有機過酸化物、アゾ化合物、過硫酸塩等の通常の開始剤が利用できる。 The production method is not particularly limited, but in the present invention, addition polymerization can usually be performed based on an unsaturated group in each compound. The polymerization can be carried out by appropriately adopting known addition polymerization conditions for unsaturated compounds. For example, the polymerization initiation source is not particularly limited, and usual initiators such as organic peroxides, azo compounds and persulfates can be used.
本発明に係る重合体は、重合する際に、前記化合物(a)および前記化合物(b)以外に、本発明の効果を損ねない範囲において、その他の成分を含有していても良い。例としては、重合開始剤はもちろんであるが、重合調整剤、重合触媒、反応性の染料や帯電防止剤等が挙げられる。
このようなその他の成分の重合体中における含有率は10質量%以下であることが好ましく、5質量%以下であることがより好ましく、1質量%以下であることがさらに好ましい。The polymer according to the present invention may contain other components in addition to the compound (a) and the compound (b) as long as the effects of the present invention are not impaired. Examples include polymerization initiators, polymerization regulators, polymerization catalysts, reactive dyes and antistatic agents as well as polymerization initiators.
The content of such other components in the polymer is preferably 10% by mass or less, more preferably 5% by mass or less, and further preferably 1% by mass or less.
上記重合体を含む本発明の組成物(這い上がり防止剤)は、通常、液状形態である。このため、共重合体を後述する溶媒を重合媒体とする溶液重合で製造し、重合により液状組成物を直接調製することは好ましい態様である。重合原料の化合物が、塩化ビニルなどのガスである場合には、圧力容器を用いて、加圧下に連続供給してもよい。 The composition of the present invention containing the above-mentioned polymer (creaking prevention agent) is usually in a liquid form. For this reason, it is a preferred embodiment that the copolymer is produced by solution polymerization using a solvent described later as a polymerization medium, and the liquid composition is directly prepared by polymerization. When the polymerization raw material compound is a gas such as vinyl chloride, it may be continuously supplied under pressure using a pressure vessel.
組成物を形成する溶媒は、重合体を溶解または分散できるものであればよく、特に限定されず、各種有機溶媒、水、またはこれらの混合媒体などが挙げられる。特にフッ素系溶媒に溶解しやすく、ハイドロクロロフルオロカ−ボン(HCFC)およびパ−フルロカ−ボン(PFC)の使用も可能である。社会的環境問題を考慮すると、ハイドロフルオロカ−ボン(HFC)またはハイドロフルオロエ−テル(HFE)などが好ましい。使用可能なフッ素系溶媒の具体例を以下に示すが、これらに限定されるものではない。 The solvent for forming the composition is not particularly limited as long as it can dissolve or disperse the polymer, and examples thereof include various organic solvents, water, or a mixed medium thereof. In particular, it is easily dissolved in a fluorinated solvent, and hydrochlorofluorocarbon (HCFC) and perflurocarbon (PFC) can be used. In consideration of social environmental problems, hydrofluorocarbon (HFC) or hydrofluoroether (HFE) is preferred. Specific examples of usable fluorine-based solvents are shown below, but are not limited thereto.
m−キシレンヘキサフルオリド(以下、m−XHFと記す。)
p−キシレンヘキサフルオリド(以下、p−XHFと記す。)
CF3CH2CF2CH3
CF3CH2CF2H
C6F13OCH3
C6F13OC2H5
C3F7OCH3
C2F7OC2H5
C6F13H
CF2HCF2CH2OCF2CF2H
CF3CFHCFHCF2CH3
CF3(OCF2CF2)n(OCF2)mOCF2H
C3F17OCH3
C7F15OCH3
C4F9OCH3
C4F9OC2H5
C4F9CH2CH3
CF2CH2OCF2CF2CF2H
上記式中、m、nはいずれも1〜20を表す。m-xylene hexafluoride (hereinafter referred to as m-XHF)
p-Xylene hexafluoride (hereinafter referred to as p-XHF)
CF 3 CH 2 CF 2 CH 3
CF 3 CH 2 CF 2 H
C 6 F 13 OCH 3
C 6 F 13 OC 2 H 5
C 3 F 7 OCH 3
C 2 F 7 OC 2 H 5
C 6 F 13 H
CF 2 HCF 2 CH 2 OCF 2 CF 2 H
CF 3 CFHCHFHCF 2 CH 3
CF 3 (OCF 2 CF 2 ) n (OCF 2 ) m OCF 2 H
C 3 F 17 OCH 3
C 7 F 15 OCH 3
C 4 F 9 OCH 3
C 4 F 9 OC 2 H 5
C 4 F 9 CH 2 CH 3
CF 2 CH 2 OCF 2 CF 2 CF 2 H
In the above formula, m and n both represent 1-20.
本発明の這い上がり防止剤は、通常、上記重合体を好ましくは0.01〜20質量%、より好ましくは0.05〜5質量%の濃度で含む。重合体の濃度がこの範囲内であれば、這い上がり防止性能を十分に発揮でき、組成物の安定性も良好である。なお這い上がり防止剤の上記重合体濃度は、最終的濃度であればよく、例えば這い上がり防止剤を重合組成物として直接調製する場合には、重合直後の重合体組成物の重合体濃度(固形分濃度)が20質量%を超えていてもなんら差し支えない。高濃度の重合組成物は、最終的に上記好ましい濃度となるように適宜に希釈することができる。 The anti-cracking agent of the present invention usually contains the above polymer in a concentration of preferably 0.01 to 20% by mass, more preferably 0.05 to 5% by mass. If the concentration of the polymer is within this range, the creeping prevention performance can be sufficiently exhibited, and the stability of the composition is also good. The polymer concentration of the scooping inhibitor may be a final concentration. For example, when the scooping inhibitor is directly prepared as a polymerization composition, the polymer concentration of the polymer composition immediately after polymerization (solid The partial concentration) may exceed 20% by mass. The high-concentration polymerization composition can be appropriately diluted so that the final desired concentration is obtained.
本発明の這い上がり防止剤は、組成物の安定性、フラックス這い上がり防止性能または外観等に悪影響を与えない範囲であれば、前記した以外の他の成分を含んでいてもよい。このような他の成分としては、例えば被膜表面の腐食を防止するためのpH調整剤、防錆剤、組成物を希釈して使用する場合に液中の重合体の濃度管理をする目的や未処理部品との区別をするための染料、染料の安定剤、難燃剤、消泡剤、または帯電防止剤等が挙げられる。また、同様に、例えば化合物(a)を含有しない化合物(b)の共重合体を併有しても良い。 The creep-up preventing agent of the present invention may contain other components than those described above as long as they do not adversely affect the stability of the composition, the flux creep-up preventing performance or the appearance. Such other components include, for example, pH control agents, rust preventives for preventing corrosion of the coating surface, and the purpose of controlling the concentration of the polymer in the liquid when the composition is used diluted. Examples thereof include dyes for distinguishing them from treated parts, dye stabilizers, flame retardants, antifoaming agents, and antistatic agents. Similarly, for example, a copolymer of compound (b) not containing compound (a) may be included.
本発明では、電子部材の表面のはんだ付けする箇所の一部または全部に、上記のような這い上がり防止剤の被膜を形成し、該被膜の一部または全部をはんだ用フラックスで処理した後、はんだ付けする、電子部材のはんだ付け方法が提供される。この際には、這い上がり防止剤を目的および用途に応じて、任意の濃度に希釈し、電子部材に被覆することができる。被覆方法としては、一般的な被覆加工方法が採用できる。例えば、浸漬塗布、スプレ−塗布、または本発明の組成物を充填したエアゾ−ル缶による塗布等の方法がある。 In the present invention, a coating film of the scooping-up preventing agent as described above is formed on a part or all of the soldering portion of the surface of the electronic member, and after treating a part or all of the coating film with a soldering flux, An electronic member soldering method for soldering is provided. In this case, the scooping-up preventing agent can be diluted to an arbitrary concentration according to the purpose and application and coated on the electronic member. As a coating method, a general coating method can be employed. For example, there are methods such as dip coating, spray coating, and coating with an aerosol can filled with the composition of the present invention.
電子部材としては、具体的に、コネクタ、スイッチ、ボリュ−ム、または半固定抵抗等の電気接点を有する電子部品、電気接点を有するプリント基板などが挙げられる。本発明の這い上がり防止剤で被覆される箇所としては、プリント基板にコネクタ等の電子部品をはんだ付けする際に、フラックスの這い上がりが起こりうる箇所が挙げられる。より詳しくは、プリント基板に取り付けるコネクタ等の電子部品の付け根部分、プリント基板の電子部品本体が実装される側の基板表面、または電子部品を取り付けるためのプリント基板に設けられたスル−ホ−ル等が挙げられる。また、電子部品またはプリント基板の表面全体に被覆してもよく、上記以外の被覆方法も採用できる。例えば、被覆効率のよい全浸漬または半浸漬による方法も採用できる。 Specific examples of the electronic member include a connector, a switch, a volume, an electronic component having an electrical contact such as a semi-fixed resistor, and a printed circuit board having an electrical contact. Examples of the location covered with the scooping preventive agent of the present invention include a location where a flux scooping may occur when an electronic component such as a connector is soldered to a printed circuit board. More specifically, a base portion of an electronic component such as a connector attached to the printed circuit board, a surface of the printed circuit board on which the electronic component main body is mounted, or a through hole provided on the printed circuit board for attaching the electronic component. Etc. Moreover, you may coat | cover the whole surface of an electronic component or a printed circuit board, and can also employ | adopt coating methods other than the above. For example, a method of full immersion or semi-immersion with good coating efficiency can be employed.
這い上がり防止剤塗布後は、溶媒の沸点以上の温度で乾燥を行うことがより好ましい。無論、被処理部品の材質などにより、加熱乾燥が困難な場合には、加熱を回避して乾燥すべきである。なお、加熱条件は、塗布する組成物の組成や、塗布面積等に応じて選択すればよい。 It is more preferable to perform drying at a temperature equal to or higher than the boiling point of the solvent after the scooping-up preventing agent is applied. Of course, when heating and drying are difficult due to the material of the parts to be processed, etc., heating should be avoided to dry. In addition, what is necessary is just to select heating conditions according to the composition of the composition to apply | coat, an application area, etc.
本発明の這い上がり防止剤は、電子部品またはプリント基板の表面に被膜を形成させ、はんだ用フラックスの這い上がりを防止する。したがって本発明により、フラックスによる腐食が防止された電子部品またはプリント基板が提供される。 The scooping preventive agent of the present invention forms a film on the surface of an electronic component or a printed circuit board and prevents scooping of the solder flux. Therefore, the present invention provides an electronic component or a printed circuit board in which corrosion due to flux is prevented.
上記により被膜(乾燥)が表面に形成された電子部品またはプリント基板は、次にはんだ用フラックスで処理され、その後、はんだ付けが行われる。はんだ付けの方法は特に制限されることなく、従来公知の方法に従って実施される。
フラックス及びはんだの種類についても、特に制限されることはなく、電子部品のはんだ付けに常用されているものが使用可能である。The electronic component or printed circuit board on which the coating (dried) is formed as described above is then treated with a soldering flux, and then soldered. The soldering method is not particularly limited, and is performed according to a conventionally known method.
The types of flux and solder are not particularly limited, and those commonly used for soldering electronic components can be used.
そして該電子部品またはプリント基板は種々の電気製品の材料として用いられる。該電気製品は、フラックスによる腐食が原因で起こる障害が防止された、優れた品質の電気製品である。該電気製品の具体例としては、コンピュ−タ用機器、テレビ、オ−ディオ用機器(ラジオカセット、コンパクトディスク、ミニディスク)等に用いられる機器用、携帯電話などが挙げられる。 The electronic component or printed circuit board is used as a material for various electric products. The electrical product is an excellent quality electrical product in which a failure caused by corrosion due to flux is prevented. Specific examples of the electrical products include devices for computers, televisions, audio devices (radio cassettes, compact discs, minidiscs), mobile phones, and the like.
以下に本発明を具体的に説明するが、本発明は以下の実施例に限定されるものではない。なお、特に断わりのない限り、以下の実施例の記載において「%」で表示されるものは「質量%」を表すものとする。 The present invention will be specifically described below, but the present invention is not limited to the following examples. Unless otherwise specified, what is indicated by “%” in the description of the following examples represents “mass%”.
〔不飽和化合物の合成・調達〕
[ウレタン結合とポリフルオロアルキル基を有する不飽和化合物1の合成]
フラスコに、メタキシレンヘキサフロオリド(m−XHF)を41.8g、2−(パ−フルオロヘキシル)エタノ−ル(純度98.9%)を12.9g、トリエチレンジアミンを0.04g、フェノチアジンを1mg加え、よく攪拌した。そこに、2−イソシアナトエチルアクリレ−ト(純度99.7%)を5.0g滴下した。滴下後、40℃で一晩反応させた(転化率97.5%)。得られた溶液を0.5μmのフィルタ−で加圧濾過して、表1に示す構造の化合物1の30質量%のm−XHF溶液を得た。[Synthesis and procurement of unsaturated compounds]
[Synthesis of unsaturated compound 1 having urethane bond and polyfluoroalkyl group]
Into the flask, 41.8 g of metaxylene hexafluoride (m-XHF), 12.9 g of 2- (perfluorohexyl) ethanol (purity 98.9%), 0.04 g of triethylenediamine, 0.04 g of phenothiazine 1 mg was added and stirred well. Thereto was dropped 5.0 g of 2-isocyanatoethyl acrylate (purity 99.7%). After dripping, it was made to react at 40 degreeC overnight (conversion rate 97.5%). The obtained solution was pressure filtered through a 0.5 μm filter to obtain a 30% by mass m-XHF solution of the compound 1 having the structure shown in Table 1.
[ウレタン結合とポリフルオロアルキル基を有する不飽和化合物2の合成]
フラスコに、m−XHFを39.0g、2−(パ−フルオロヘキシル)エタノ−ル(純度98.9%)を11.7g、トリエチレンジアミンを0.040g、およびフェノチアジンを1mg加え、よく攪拌した。そこに、2−イソシアナトエチルメタクリレ−ト(純度99.4%)を5.0g滴下した。40℃で一晩反応させた(転化率97.5%)。得られた溶液を0.5μmのフィルタ−で加圧濾過して、表1に示す構造の化合物2の30質量%のm−XHF溶液を得た。[Synthesis of unsaturated compound 2 having urethane bond and polyfluoroalkyl group]
To the flask, 39.0 g of m-XHF, 11.7 g of 2- (perfluorohexyl) ethanol (purity 98.9%), 0.040 g of triethylenediamine, and 1 mg of phenothiazine were added and stirred well. . Thereto was dropped 5.0 g of 2-isocyanatoethyl methacrylate (purity 99.4%). The reaction was carried out overnight at 40 ° C. (conversion 97.5%). The obtained solution was pressure filtered through a 0.5 μm filter to obtain a 30% by mass m-XHF solution of the compound 2 having the structure shown in Table 1.
[ポリフルオロアルキル基を有する不飽和化合物(比較化合物1)の合成]
2−(パ−フルオロヘキシル)エタノ−ル(純度98.9%)を200.2g、アクリル酸を45.5、シクロヘキサン80.1g、およびパラトルエンスルホン酸・一水和物を5.2g加え、80℃で8時間反応(脱水留去)を行った。その後、中和と水洗を行った後、蒸留で表1に示す構造の比較化合物1(純度99.4%)を得た。[Synthesis of unsaturated compound having polyfluoroalkyl group (Comparative Compound 1)]
Add 20.2 g of 2- (perfluorohexyl) ethanol (purity 98.9%), 45.5 g of acrylic acid, 80.1 g of cyclohexane, and 5.2 g of paratoluenesulfonic acid monohydrate. The reaction (dehydration distillation) was performed at 80 ° C. for 8 hours. Then, after neutralizing and washing with water, the comparative compound 1 (purity 99.4%) having the structure shown in Table 1 was obtained by distillation.
[ポリフルオロアルキル基を有する不飽和化合物(比較化合物2)の調達]
表1に示す構造の比較化合物2(比較化合物1のアクリル酸がメタクリル酸に変ったもの)を市場から入手した。純度は99.8%であった。[Procurement of unsaturated compounds having a polyfluoroalkyl group (Comparative Compound 2)]
Comparative compound 2 having a structure shown in Table 1 (comparative compound 1 in which acrylic acid was changed to methacrylic acid) was obtained from the market. The purity was 99.8%.
〔重合体組成物の調製〕
[重合体組成物1、2の調製]
密閉容器に、化合物1または2を100質量部、開始剤V−601[和光純薬工業(株)製]を1質量部、および溶剤としてm−XHFを399質量部、それぞれ仕込み、70℃で26時間反応を行い、重合体1または2を含む、重合体組成物1または2を得た。(Preparation of polymer composition)
[Preparation of polymer compositions 1 and 2]
In a sealed container, 100 parts by mass of Compound 1 or 2; 1 part by mass of initiator V-601 [manufactured by Wako Pure Chemical Industries, Ltd.]; and 399 parts by mass of m-XHF as a solvent were charged at 70 ° C. The reaction was performed for 26 hours to obtain a polymer composition 1 or 2 containing the polymer 1 or 2.
[比較重合体組成物1、2の調製]
密閉容器に、比較化合物1または2を100質量部、開始剤V−601[和光純薬工業(株)製]を1質量部、および溶剤としてm−XHFを399質量部)、それぞれ仕込み、70℃で26時間反応を行い、比較重合体1または2を含む、比較重合体組成物1または2を得た。[Preparation of Comparative Polymer Compositions 1 and 2]
In a sealed container, 100 parts by mass of Comparative Compound 1 or 2, 1 part by mass of initiator V-601 [manufactured by Wako Pure Chemical Industries, Ltd.], and 399 parts by mass of m-XHF as a solvent) were charged, respectively. The reaction was carried out at 26 ° C. for 26 hours to obtain a comparative polymer composition 1 or 2 containing the comparative polymer 1 or 2.
[実施例1〜2、比較例1〜2]
[防止組成物の調製]
重合体組成物1および2、ならびに、比較重合体組成物1および2をそれぞれ1g採取し、110℃で2時間乾燥させた後、固形分を秤量して固形分(重合体)濃度(質量%)を求めた。その後、m−XHFを用いて重合組成物1および2、ならびに、比較重合体組成物1および2の固形分濃度の各々が0.1質量%になるように希釈し、フラックス這い上がり防止組成物1および2、ならびに、比較防止組成物1および2を得た。[Examples 1-2, Comparative Examples 1-2]
[Preparation of prevention composition]
1 g of each of the polymer compositions 1 and 2 and the comparative polymer compositions 1 and 2 was collected and dried at 110 ° C. for 2 hours, and then the solid content was weighed to determine the solid content (polymer) concentration (mass%). ) Thereafter, using m-XHF, the polymer compositions 1 and 2 and the comparative polymer compositions 1 and 2 are each diluted so that the solid content concentration is 0.1% by mass, and the flux scooping-up preventing composition 1 and 2 and comparative prevention compositions 1 and 2 were obtained.
[接触角の測定]
ガラス板を防止剤組成物1および2、ならびに、比較防止剤組成物1および2の各々に、常温で1分間浸漬後、取出し、110℃で5分間乾燥して、這い上がり防止剤の被膜を有するガラス板を得た。
該ガラス板に、2−プロパノ−ル(IPA)を滴下して接触角の測定を行った。結果を表3に示した。接触角の測定には、液滴式投影型接触角計[協和界面科学(株)製]を用いた。[Measurement of contact angle]
The glass plate is immersed in each of the inhibitor compositions 1 and 2 and the comparative inhibitor compositions 1 and 2 at room temperature for 1 minute, then taken out and dried at 110 ° C. for 5 minutes to form a scooping inhibitor film. A glass plate was obtained.
2-propanol (IPA) was dropped onto the glass plate, and the contact angle was measured. The results are shown in Table 3. For the measurement of the contact angle, a drop-type projection contact angle meter (manufactured by Kyowa Interface Science Co., Ltd.) was used.
上記のように、本発明の組成物は、IPAの接触角が大きく、高い撥IPA性を有する。これから、フラックス這い上がり防止剤としての高い性能を有するものと考えられる。 As described above, the composition of the present invention has a large IPA contact angle and high IPA repellency. From this, it is thought that it has the high performance as a flux creeping-up prevention agent.
Claims (7)
R1:水素原子またはメチル基
Q1、Q2:それぞれ独立して、単結合または2価の連結基
Rf:炭素−炭素原子間に挿入されたエ−テル性酸素原子を含んでいてもよい炭素数1〜6のポリフルオロアルキル基A solder flux creeping-up composition comprising a polymer containing a polymer unit derived from at least one unsaturated compound represented by the following formula (a).
R 1 : hydrogen atom or methyl group Q 1 , Q 2 : each independently a single bond or a divalent linking group R f : even if it contains an etheric oxygen atom inserted between carbon-carbon atoms Good C1-6 polyfluoroalkyl group
R1、Rf:前記と同じ
p、q:それぞれ独立して0〜6の整数The composition according to claim 1 or 2, wherein the compound represented by the formula (a) is an unsaturated compound represented by the following formula (a1).
R 1 , R f : same as above p, q: each independently an integer of 0-6
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JP2008544088A JP5161789B2 (en) | 2006-11-17 | 2007-09-13 | Solder flux creeping-up composition, electronic member for solder coated with the composition, method for soldering the member, and electrical product |
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JP2006311641 | 2006-11-17 | ||
JP2006311641 | 2006-11-17 | ||
JP2008544088A JP5161789B2 (en) | 2006-11-17 | 2007-09-13 | Solder flux creeping-up composition, electronic member for solder coated with the composition, method for soldering the member, and electrical product |
PCT/JP2007/067823 WO2008059654A1 (en) | 2006-11-17 | 2007-09-13 | Composition for preventing solder flux scrambling, electronic member for soldering coated with the composition, method of soldering the member, and electrical product |
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JPWO2008059654A1 JPWO2008059654A1 (en) | 2010-02-25 |
JP5161789B2 true JP5161789B2 (en) | 2013-03-13 |
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JP (1) | JP5161789B2 (en) |
CN (1) | CN101541471A (en) |
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WO2010073493A1 (en) * | 2008-12-26 | 2010-07-01 | 株式会社村田製作所 | Method for producing ceramic electronic part, and ceramic electronic part |
KR101730676B1 (en) * | 2009-08-20 | 2017-04-26 | 에이지씨 세이미 케미칼 가부시키가이샤 | Fluoroalkyl group-containing n-substituted(meth)acrylamide compound, polymer thereof, and use thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6010694A (en) * | 1983-06-30 | 1985-01-19 | 石井 銀弥 | Method of soldering printed circuit board |
JPS6049859A (en) * | 1983-08-30 | 1985-03-19 | Asahi Glass Co Ltd | Agent for preventing creeping up of flux for soldering |
JPH07201501A (en) * | 1993-12-28 | 1995-08-04 | Dainippon Ink & Chem Inc | Method of preventing penetration of flux into electronic component |
JPH1098253A (en) * | 1996-09-24 | 1998-04-14 | Nof Corp | Diffusion preventing agent for soldering flux |
JPH11154783A (en) * | 1997-09-16 | 1999-06-08 | Seimi Chem Co Ltd | Composition for preventing creeping up of flux for soldering |
JP2001135926A (en) * | 1999-11-02 | 2001-05-18 | Seimi Chem Co Ltd | Solder flux creep-up preventing agent composition, and application thereof |
-
2007
- 2007-09-13 CN CNA2007800427414A patent/CN101541471A/en active Pending
- 2007-09-13 JP JP2008544088A patent/JP5161789B2/en not_active Expired - Fee Related
- 2007-09-13 WO PCT/JP2007/067823 patent/WO2008059654A1/en active Application Filing
- 2007-11-13 TW TW96142876A patent/TW200843892A/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6010694A (en) * | 1983-06-30 | 1985-01-19 | 石井 銀弥 | Method of soldering printed circuit board |
JPS6049859A (en) * | 1983-08-30 | 1985-03-19 | Asahi Glass Co Ltd | Agent for preventing creeping up of flux for soldering |
JPH07201501A (en) * | 1993-12-28 | 1995-08-04 | Dainippon Ink & Chem Inc | Method of preventing penetration of flux into electronic component |
JPH1098253A (en) * | 1996-09-24 | 1998-04-14 | Nof Corp | Diffusion preventing agent for soldering flux |
JPH11154783A (en) * | 1997-09-16 | 1999-06-08 | Seimi Chem Co Ltd | Composition for preventing creeping up of flux for soldering |
JP2001135926A (en) * | 1999-11-02 | 2001-05-18 | Seimi Chem Co Ltd | Solder flux creep-up preventing agent composition, and application thereof |
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JPWO2008059654A1 (en) | 2010-02-25 |
WO2008059654A1 (en) | 2008-05-22 |
TW200843892A (en) | 2008-11-16 |
CN101541471A (en) | 2009-09-23 |
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